KR100408333B1 - Shower head having self aligned plate for dry etching apparatus and gas distributing method using the same - Google Patents

Shower head having self aligned plate for dry etching apparatus and gas distributing method using the same Download PDF

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Publication number
KR100408333B1
KR100408333B1 KR1020030036417A KR20030036417A KR100408333B1 KR 100408333 B1 KR100408333 B1 KR 100408333B1 KR 1020030036417 A KR1020030036417 A KR 1020030036417A KR 20030036417 A KR20030036417 A KR 20030036417A KR 100408333 B1 KR100408333 B1 KR 100408333B1
Authority
KR
South Korea
Prior art keywords
shower head
self aligned
dry etching
etching apparatus
gas inlet
Prior art date
Application number
KR1020030036417A
Other languages
Korean (ko)
Inventor
Dong Soo Kim
Original Assignee
Ans Inc
Dong Soo Kim
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ans Inc, Dong Soo Kim filed Critical Ans Inc
Priority to KR1020030036417A priority Critical patent/KR100408333B1/en
Application granted granted Critical
Publication of KR100408333B1 publication Critical patent/KR100408333B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32633—Baffles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: A shower head having a self aligned plate for a dry etching apparatus and a gas distributing method using the same are provided to be capable of preventing the generation of arc discharge in the shower head for improving jet uniformity. CONSTITUTION: A shower head is provided with a process gas inlet port(412a), an inner and outer gas inlet(412b,412c) connected with the gas inlet port for flowing process gas enough, a dividing barrier(413) for doubly or triply distributing the process gas supplied through the inner and outer gas inlet, and a pressurizing plenum(414) divided by the dividing barrier for forming a buffer space. The shower head further includes a plurality of SAGDPs(Self Aligned Gas Distribution Plates)(450) located at the lower portion of the pressurizing plenum. At this time, the SAGDPs are partially overlapped with each other.
KR1020030036417A 2003-06-05 2003-06-05 Shower head having self aligned plate for dry etching apparatus and gas distributing method using the same KR100408333B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020030036417A KR100408333B1 (en) 2003-06-05 2003-06-05 Shower head having self aligned plate for dry etching apparatus and gas distributing method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020030036417A KR100408333B1 (en) 2003-06-05 2003-06-05 Shower head having self aligned plate for dry etching apparatus and gas distributing method using the same

Publications (1)

Publication Number Publication Date
KR100408333B1 true KR100408333B1 (en) 2003-12-03

Family

ID=37422795

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030036417A KR100408333B1 (en) 2003-06-05 2003-06-05 Shower head having self aligned plate for dry etching apparatus and gas distributing method using the same

Country Status (1)

Country Link
KR (1) KR100408333B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101183141B1 (en) * 2005-08-29 2012-09-14 주성엔지니어링(주) Gas distribution plate and plasma generation apparatus comprising the same
KR20140121372A (en) * 2013-04-05 2014-10-15 노벨러스 시스템즈, 인코포레이티드 Cascade design showerhead for transient uniformity

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101183141B1 (en) * 2005-08-29 2012-09-14 주성엔지니어링(주) Gas distribution plate and plasma generation apparatus comprising the same
KR20140121372A (en) * 2013-04-05 2014-10-15 노벨러스 시스템즈, 인코포레이티드 Cascade design showerhead for transient uniformity
KR102244230B1 (en) * 2013-04-05 2021-04-26 노벨러스 시스템즈, 인코포레이티드 Cascade design showerhead for transient uniformity

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