KR100353023B1 - Composition of detergent for screen mask - Google Patents
Composition of detergent for screen mask Download PDFInfo
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- KR100353023B1 KR100353023B1 KR1020000013148A KR20000013148A KR100353023B1 KR 100353023 B1 KR100353023 B1 KR 100353023B1 KR 1020000013148 A KR1020000013148 A KR 1020000013148A KR 20000013148 A KR20000013148 A KR 20000013148A KR 100353023 B1 KR100353023 B1 KR 100353023B1
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- South Korea
- Prior art keywords
- present
- cleaning
- screen mask
- composition
- weight
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract description 35
- 239000003599 detergent Substances 0.000 title description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 25
- 239000012188 paraffin wax Substances 0.000 claims abstract description 15
- 235000019441 ethanol Nutrition 0.000 claims abstract description 13
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 claims abstract description 11
- 238000004140 cleaning Methods 0.000 abstract description 67
- 238000000034 method Methods 0.000 abstract description 28
- 230000000694 effects Effects 0.000 abstract description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 48
- 238000005406 washing Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000565 sealant Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 5
- 239000012459 cleaning agent Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 210000002249 digestive system Anatomy 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- YGSFNCRAZOCNDJ-UHFFFAOYSA-N propan-2-one Chemical compound CC(C)=O.CC(C)=O YGSFNCRAZOCNDJ-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/263—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/24—Hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- C11D2111/22—
Abstract
본 발명은 스크린 마스크 세정용 조성물에 관한 것으로, 디에틸렌글리콜모노에틸에테르 80 ~ 95중량%, 에틸알콜(ethyl alcohol) 5 ~ 12중량% 및 노말 파라핀 (normal paraffin) 1 ~ 8중량%을 함유하는 본 발명 스크린 마스크 세정용 조성물은 세정효과가 우수하고 단시간에 많은 양을 처리할 수 있으며 인체에 무해한 뛰어난 효과가 있다.The present invention relates to a screen mask cleaning composition, containing 80 to 95% by weight of diethylene glycol monoethyl ether, 5 to 12% by weight of ethyl alcohol and 1 to 8% by weight of normal paraffin (normal paraffin) The screen mask cleaning composition of the present invention has an excellent cleaning effect and can process a large amount in a short time, and has an excellent effect that is harmless to the human body.
Description
본 발명은 스크린 마스크 세정용 조성물에 관한 것이다. 더욱 상세하게는, 노말 파라핀(normal paraffin), 에틸알콜(ethyl alcohol) 및 디에틸렌글리콜모노에틸에테르를 함유하는 스크린 마스크 세정용 조성물에 관한 것이다.The present invention relates to a screen mask cleaning composition. More specifically, the present invention relates to a screen mask cleaning composition containing normal paraffin, ethyl alcohol, and diethylene glycol monoethyl ether.
첨단 전자산업 LCD 사업부에서 스크린 마스크 씰 프린트(screen mask sealprint)공정 및 쇼트 프린트(short print) 공정에서 기존의 세정방법은 아세톤을 사용하여 작업자가 수작업함으로써 아세톤의 체내 소화기관을 통해 흡입되어 중추신경 장해를 야기하는 등 작업환경이 매우 열악하였고 공정의 수작업으로 인하여 생산성도 떨어졌다. 따라서 세정 설비의 자동화가 요구되었고 자동화를 갖추기 위해서는 우수한 세척제가 필요하였다. 이러한 요구에 따라 외국의 세정설비와 세척제가 도입되었으나 설비의 잦은 고장과 우수한 세척제의 국산화가 이루어 지지 않아 다시 최초의 수작업에 의한 세정작업을 시행하지 않을 수 없었다.Existing cleaning methods in screen mask sealprint process and short print process in high-tech LCD business are inhaled through acetone's internal digestive system by the operator by using acetone. The working environment was very poor and the productivity decreased due to the manual process. Therefore, the automation of the cleaning equipment was required, and in order to be equipped with automation, an excellent cleaning agent was needed. In response to these demands, foreign cleaning facilities and cleaning agents were introduced. However, due to the frequent failure of the facilities and the localization of the excellent cleaning agents, the first manual cleaning was forced.
상기와 같은 문제점을 해결하기 위해 본 발명자는 노말 파라핀(normal paraffin), 에틸알콜(ethyl alcohol) 및 디에틸렌글리콜모노에틸에테르를 함유하는 스크린 마스크(screen mask) 세정용 조성물을 제조하였으며 이 세정용 조성물을 사용하여 씰 프린트(seal print) 또는 쇼트 프린트(short print) 세정 설비의 자동화를 이룩함으로써 현장 작업자의 인체 유해성에 대한 안전성을 높이고 계획한 생산량을 단기간에 달성하여 본 발명을 완성하였다.In order to solve the above problems, the present inventors manufactured a screen mask cleaning composition containing normal paraffin, ethyl alcohol and diethylene glycol monoethyl ether. By using the automated printing of the seal print (short print) or short print (short print) cleaning facility to increase the safety of the human operator of the field workers and to achieve the planned production in a short time to complete the present invention.
따라서, 본 발명의 목적은 노말 파라핀(normal paraffin), 에틸알콜(ethyl alcohol) 및 디에틸렌글리콜모노에틸에테르를 함유하는 스크린 마스크(screen mask) 세정용 조성물을 제공함에 있다.Accordingly, an object of the present invention is to provide a screen mask cleaning composition containing normal paraffin, ethyl alcohol, and diethylene glycol monoethyl ether.
본 발명의 상기 목적은 디에틸렌글리콜모노에틸에테르(diethylene glycol monoethyl ether) 및 노말 파라핀(normal paraffin)과 디메틸 포름알데하이드(dimethyl formaldehyde) 또는 모노에틸렌글리콜디메틸에테르 (monoethylene glycol methyl ether)를 함유하는 본 발명 스크린 마스크 세정용 조성물을 제조하고 LCD 제조공정 중 유리기판을 인쇄용 페이스트로 씰-프린트 또는 쇼트-프린트로 인쇄 후 세척과정에서 상기 제조한 본 발명 스크린 마스크 세정용 조성물을 분사하거나 담금법으로 처리함으로써 달성하였다.The object of the present invention is diethylene glycol monoethyl ether (diethylene glycol monoethyl ether) and the normal paraffin (normal paraffin) and dimethyl formaldehyde (dimethyl formaldehyde) or monoethylene glycol dimethyl ether (monoethylene glycol methyl ether) containing It was achieved by preparing a screen mask cleaning composition and spraying or immersing the screen mask cleaning composition of the present invention prepared in the cleaning process after printing the glass substrate with a printing paste in a seal-print or a short-print during the LCD manufacturing process. .
이하, 본 발명의 구성을 설명한다.Hereinafter, the configuration of the present invention will be described.
도 1은 본 발명 스크린 마스크 세정용 조성물이 씰버(silver)와 씰버를 연결시켜주는 결합(bind)의 연결고리를 단절시켜 세정의 효과를 얻을 수 있음을 나타낸 개략도이다.Figure 1 is a schematic diagram showing that the screen mask cleaning composition of the present invention can obtain the effect of cleaning by disconnecting the connection ring (bind) connecting the sealer (silver) and the sealer.
도 2는 상판유리에 인쇄하여 액정의 누수를 방지하는 씰-프린트(seal-print) 공정을 나타낸다.FIG. 2 shows a seal-print process for printing on top glass to prevent leakage of liquid crystals.
도 3은 하판유리에 내부 갭(gap) 및 전기적 단락을 만들기 위한 쇼트-프린트 (short-print) 공정을 나타낸다.FIG. 3 shows a short-print process for making internal gaps and electrical shorts in the bottom pane.
본 발명은 디에틸렌글리콜모노에틸에테르, 에틸알콜(ethyl alcohol) 및 노말파라핀(normal paraffin)을 함유하는 본 발명 스크린 마스크 세정용 조성물을 제조하는 단계; 상기 제조한 본 발명 스크린 마스크 세정용 조성물을 LCD 제조공정 중 씰-프린팅(seal-printing)한 후 세척과정에 적용시키는 단계; 및 본 발명 스크린 마스크 세정용 조성물을 LCD 제조공정 중 쇼트-프린팅(short-printing) 후 세척과정에 적용시키는 단계로 구성된다.The present invention comprises the steps of preparing a screen mask cleaning composition of the present invention containing diethylene glycol monoethyl ether, ethyl alcohol (ethyl alcohol) and normal paraffin (normal paraffin); Applying to the cleaning process after seal-printing of the screen mask cleaning composition of the present invention prepared in the LCD manufacturing process; And applying the screen mask cleaning composition of the present invention to a cleaning process after short-printing during the LCD manufacturing process.
본 발명에서 디에틸렌글리콜모노에틸에테르는 당업계에서 통상 사용하는 에틸셀루솔브류의 한가지 종류이며 그 밖에 통상 당업계에서 사용하고 있는 성분을 사용할 수 있다.In the present invention, diethylene glycol monoethyl ether is one kind of ethyl cellosolves commonly used in the art, and other components commonly used in the art may be used.
본 발명에서 에틸알콜은 디메틸포름알데하이드 또는 모노에틸렌글리콜디메틸에테르로 대체하여 사용할 수 있으며 그 밖에 통상 당업계에서 사용하고 있는 성분을 사용할 수 있다.Ethyl alcohol in the present invention can be used in place of dimethyl formaldehyde or monoethylene glycol dimethyl ether, and other components that are commonly used in the art can be used.
본 발명 스크린 마스크 세정용 조성물의 디에틸렌글리콜모노에틸에테르 함유량은 80 ~ 95중량%이며, 바람직하게는 85 ~ 90중량%이다.Diethylene glycol monoethyl ether content of the screen mask cleaning composition of this invention is 80 to 95 weight%, Preferably it is 85 to 90 weight%.
본 발명 스크린 마스크 세정용 조성물의 에틸알콜 함유량은 5 ~ 12중량%이며, 바람직하게는 8 ~ 10중량%이다.The ethyl alcohol content of the screen mask cleaning composition of the present invention is 5 to 12% by weight, preferably 8 to 10% by weight.
본 발명 스크린 마스크 세정용 조성물의 노말 파라핀 함유량은 1 ~ 8중량%이며 바람직하게는 2 ~ 5중량%이다.The normal paraffin content of the screen mask cleaning composition of the present invention is 1 to 8% by weight, preferably 2 to 5% by weight.
본 발명 스크린 마스크용 조성물은 씰-프린팅 공정 중 세척과정에서 실런트(Sealant)의 특수변성 에폭시(epoxy) 수지 또는 고순도 알루미나 및 실리카 성분과는 반응하지 않고 특수 잠재성 경화제 성분이 본 발명 스크린 세정용 조성물의 디메틸글리콜모노에틸에테르 성분에 용해되며 이 과정에서 노말 파라핀(Nornal paraffin)과 에틸알콜 성분으로서 대체되는 디메틸포름알데하이드는 이러한 작용을 가속화시켜 세정효능을 증진시킨다. 따라서, 노말 파라핀과 에틸알콜 성분으로서 대체되는 디메틸포름알데하이드 성분의 부족할 경우 분자의 활성이 떨어짐으로 본 발명 스크린 마스크 세정용 조성물과 특수 잠재성 경화제 및 용제와의 반응효과도 둔화된다. 이때 용액내부는 실리카 및 특수변성 에폭시 수지의 포화상태로 세정용액의 색깔이 투명하다가 유백색으로 불투명해지며 이는 실런트 성분이 과포화 되는 시점임을 나타낸다. 과포화되는 시점에서 본 발명 스크린 마스크용 세정용 조성물을 교체해 주어야 효과를 최대로 얻을 수 있으며 용액의 교체주기가 빠를수록 세정효과도 향상된다. 이때 부분교체도 가능하다.The screen mask composition of the present invention does not react with the sealant's specially modified epoxy resin or high-purity alumina and silica components in the cleaning process of the seal-printing process. Dimethyl glycol, which is dissolved in the dimethyl glycol monoethyl ether component and is replaced by normal paraffin and ethyl alcohol in this process, accelerates this action and enhances the cleaning effect. Accordingly, when the dimethylformaldehyde component replaced with the normal paraffin and the ethyl alcohol component is insufficient, the activity of the molecule is lowered, thereby reducing the reaction effect of the screen mask cleaning composition of the present invention with a special latent curing agent and a solvent. At this time, the inside of the solution is saturated with silica and specially modified epoxy resin, and the color of the cleaning solution becomes transparent and becomes opaque, indicating that the sealant component is oversaturated. At the time of oversaturation, the cleaning composition for the screen mask of the present invention should be replaced to obtain the maximum effect. The faster the replacement cycle of the solution, the better the cleaning effect. Partial replacement is also possible.
본 발명 스크린 마스크 세정용 조성물은 쇼트-프린팅(short-printing) 공정 중 세척과정에서 씰버(Silver)와는 단독적으로 아무런 반응도 하지 않는다. 따라서 본 발명 스크린 마스크 세정용 조성물 자체가 스크린 마스크(Screen mask)의 제조공정에 직접적인 영향은 미치지 않는다. 단지 쇼트 프린트의 씰버는 자체로만 결합되어 있지 않고 씰버와 씰버를 연결시켜주는 결합(bind)의 연결고리를 단절시켜 세정의 효과를 얻는다. 따라서 씰버는 본 발명 스크린 마스크 세정용 조성물에 화합물의 형태로 용해되어 존재하지 않고 씰버는 본 발명 스크린 마스크 세정용 조성물내에 용해되어 반응이 이루어지며 이 과정에서 Ag성분은 자연스럽게 해리되어 본 발명 스크린 마스크 세정용 조성물 용액내에서 혼합물의 형태로 확산, 침전된다. 이 과정은 도 1에 나타낸 바와 같다.The screen mask cleaning composition of the present invention does not react alone with the sealer during the cleaning process during the short-printing process. Therefore, the screen mask cleaning composition of the present invention does not directly affect the manufacturing process of the screen mask. The sealer of the short print is not only bonded by itself, but the cleaning effect is obtained by breaking the linkage of the bond connecting the sealer and the sealer. Therefore, the sealer is not present in the screen mask cleaning composition of the present invention, dissolved in the form of a compound, and the sealer is dissolved in the screen mask cleaning composition of the present invention to react. In the solution composition solution, it is diffused and precipitated in the form of a mixture. This process is as shown in FIG.
본 발명 스크린 세정용 조성물은 스프레이(spray)를 이용한 분사식 세정과 담금(dipping) 처리에 의한 침전식 세정이 모두 가능하며 특히 스프레이 세정은 세정설비의 자동화로 사람이 직접 수작업함으로 야기되는 각종 안전사고를 예방할 수 있고, 단시간내에 많은 량을 세정함으로써 노동력을 절감하고 생산효율을 증가시키고 동일한 조건에서 균일한 작업을 함으로써 공정상의 문제점을 쉽게 파악하여 제조(process)시에 안정성을 높힐 수 있는 효과가 있으며, 또 침지법에 의해 야기될 수 있는 세정 대상물의 외분 손상을 예방할 수 있고 작업의 정밀성을 높일 수 있다.The screen cleaning composition of the present invention is capable of both spray cleaning using a spray and precipitation cleaning by dipping, and in particular, the spray cleaning can be used for various safety accidents caused by manual labor by the automation of the cleaning equipment. It can prevent, reduce the labor force by increasing the amount of cleaning in a short time, increase the production efficiency, and work uniformly under the same conditions, so that it is easy to identify the problems in the process and increase the stability during the manufacturing process. In addition, it is possible to prevent external damage of the cleaning object which may be caused by the dipping method and to improve the precision of the work.
본 발명 스크린 마스크 세정용 조성물은 장기간 보관하여도 상태 변화 없이 안정하며 철, 비철 등 모든 금속에 사용 가능하다.The screen mask cleaning composition of the present invention is stable without change of state even after long-term storage and can be used for all metals such as iron and nonferrous metals.
본 발명 스크린 마스크 세정용 조성물은 20L 통(pail) 또는 200L 드럼(drum)단위로 포장하여 상품화할 수 있다.The screen mask cleaning composition of the present invention may be commercialized by packaging in a 20L drum or a 200L drum unit.
이하, 본 발명의 구체적인 방법을 실시예를 들어 상세히 설명하고자 하지만본 발명의 권리범위는 이들 실시예에만 한정되는 것은 아니다.Hereinafter, the specific method of the present invention will be described in detail with reference to Examples, but the scope of the present invention is not limited only to these Examples.
실시예 1: 본 발명 스크린 마스크 세정용 조성물 제조Example 1: Preparation of the present invention screen mask cleaning composition
디에틸렌글리콜에틸에테르 90중량%, 노말 파라핀 2중량%, 에틸알콜 성분을 대신하여 디메틸포름알데하이드 3중량%와 모노에틸렌글리콜디메틸에테르 5중량%를 혼합, 교반하여 스크린 마스크 세정용 조성물을 제조하였다.In place of 90% by weight of diethylene glycol ethyl ether, 2% by weight of normal paraffin, and ethyl alcohol components, 3% by weight of dimethylformaldehyde and 5% by weight of monoethylene glycol dimethyl ether were mixed and stirred to prepare a screen mask cleaning composition.
시험예 1: 씰-프린팅 후 본 발명 스크린 마스크 세정용 조성물 적용Test Example 1 Application of the Screen Mask Cleaning Composition of the Present Invention After Seal-Printing
씰-프린트 공정은 세그 판넬(seg panel)과 CDM 판넬(panal) 사이에 접착제를 프린트하여 액정이 들어갈 수 있는 영역을 만들어 주는 것으로 사진현상의 원리를 이용하여 스크린 마스크에 에폭시 수지인 실런트를 사출시키는 공정이다. 즉, 도 2에 나타낸 바와 같이 80℃에서 인쇄용 실런트를 유리기판에 스퀴지 고무를 사용하여 인쇄하였다. 이는 상판 유리에 인쇄하여 액정의 누수를 방지하기 위해 제품 표면에 인쇄하는 것으로 인쇄되고 남은 실런트는 본 발명 스크린 마스크 세정용 조성물을 분사하여 세척하였다. 동일한 방법으로 공지의 아세톤을 사용하여 세척을 실시하고 세정소요시간, 품종교체시간, 세정횟수 및 세정 정도 등을 조사하고 본 발명 세정제로 세척한 경우와 비교하였다. 실험결과, 표 1에 나타낸 바와 같이 세정소요시간은 본 발명 세정제가 10분, 아세톤의 경우는 45 ~ 50분, 품종 교체시간은 본 발명 세정제는 15분, 아세톤은 60 ~ 65분, 세정 정도는 본 발명 세정제가 15 ~ 25㎛, 아세톤은 50 ~ 60㎛이였으며 본 발명 세정제는 환경에 전혀 악영향을 미치지않았으며 생산성도 15% 올랐다.The seal-print process creates an area where liquid crystal can enter by printing an adhesive between a segment panel and a CDM panel. The sealant, which is an epoxy resin, is injected into the screen mask using the principle of photographic phenomenon. It is a process. That is, as shown in Fig. 2, the printing sealant was printed on a glass substrate using a squeegee rubber at 80 ° C. This is printed by printing on the upper surface of the glass in order to prevent the leakage of the liquid crystal printed on the product surface and the remaining sealant was washed by spraying the composition for screen mask cleaning of the present invention. In the same manner, the washing was carried out using acetone known in the same manner, and the washing time, varietal replacement time, washing frequency and degree of washing were examined and compared with the washing with the present invention. As a result, as shown in Table 1, the cleaning time is 10 minutes for the present invention, 45 to 50 minutes for the acetone, the variety change time is 15 minutes for the present invention, 60 to 65 minutes for the acetone, The detergent of the present invention was 15 to 25㎛, acetone was 50 to 60㎛ and the detergent of the present invention did not adversely affect the environment at all and the productivity was increased by 15%.
시험예 2: 쇼트-프린팅 후 본 발명 스크린 마스크 세정용 조성물 적용Test Example 2 Application of the Screen Mask Cleaning Composition of the Present Invention After Shot-Printing
쇼트 프린팅 공정은 세그먼트(segment) 전극을 배설한 표시엽축의 기판 위에 미리 공통(common) 전극 전사용 단자를 설치해 놓고 이 단자위에 도전성 접착제를 인쇄하는 작업이다. 이 공정은 일액성 연경화성수지로 은(Ag)을 주성분으로 한 씰버페이스트를 사용하는 것만 다르고 작업방법은 상기 시험예 1의 씰-프린팅과 동일하다. 즉, 도 3에 나타낸 바와 같이 인쇄용 실런트를 유리기판에 스퀴지 고무를 사용하여 인쇄하였다. 이는 하판 유리에 인쇄하여 내부 갭(GAP) 및 전기적 단락을 시키기 위해 제품 표면에 인쇄하는 것으로 인쇄되고 남은 실런트는 본 발명 스크린 마스크 세정용 조성물을 분사하여 세척하였다. 동일한 방법으로 공지의 아세톤을 사용하여 세척을 실시하고 세정소요시간, 품종교체시간, 세정횟수 및 세정 정도 등을 조사하고 본 발명 세정제로 세척한 경우와 비교하였다. 실험결과, 표 2에 나타낸 바와 같이 세정소요시간은 본 발명 세정제가 10분, 아세톤의 경우는 45 ~ 50분,품종 교체시간은 본 발명 세정제는 15분, 아세톤은 60 ~ 65분, 세정 정도는 본 발명 세정제가 25 ~ 35㎛, 아세톤은 50 ~ 60㎛이였으며 본 발명 세정제는 환경에 전혀 악영향을 미치지 않았으며 생산성도 15% 올랐다.In the short printing process, a common electrode transfer terminal is installed in advance on a substrate on a display leaf axis in which a segment electrode is disposed, and a conductive adhesive is printed on the terminal. This process is different from the one-component soft-curable resin, which uses a seal paste mainly composed of silver (Ag), and the working method is the same as the seal-printing of Test Example 1. That is, as shown in Fig. 3, the printing sealant was printed on a glass substrate using squeegee rubber. It was printed by printing on the bottom glass to print on the surface of the product for internal gap (GAP) and electrical short and the remaining sealant was cleaned by spraying the composition for screen mask cleaning of the present invention. In the same manner, the washing was carried out using acetone known in the same manner, and the washing time, varietal replacement time, washing frequency and degree of washing were examined and compared with the washing with the present invention. As a result, as shown in Table 2, the cleaning time was 10 minutes for the present invention and 45 to 50 minutes for the acetone, and the replacement time was 15 minutes for the present invention and 60 to 65 minutes for the acetone. The detergent of the present invention was 25 ~ 35㎛, acetone was 50 ~ 60㎛ and the detergent of the present invention did not adversely affect the environment at all and the productivity was also increased by 15%.
이상, 상기 실시예에서 살펴본 바와 같이 디에틸렌글리콜모노에틸에테르 80 ~ 95중량%, 에틸알콜 5 ~ 12중량% 및 노말 파라핀 1 ~ 8중량%을 함유하는 본 발명 스크린 마스크 세정용 조성물은 세정효과가 우수하고 단시간에 많은 양을 처리할 수 있으며 인체에 무해한 뛰어난 효과가 있으므로 세정제 산업상 매우 유용한 발명인 것이다.As described above, the screen mask cleaning composition of the present invention containing 80 to 95% by weight of diethylene glycol monoethyl ether, 5 to 12% by weight of ethyl alcohol, and 1 to 8% by weight of normal paraffin has a cleaning effect. It is a very useful invention for the detergent industry because it is excellent and can process a large amount in a short time and has an excellent effect that is harmless to the human body.
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| KR880002258A (en) * | 1986-07-18 | 1988-04-30 | 이또오 다께오 | Rinse treatment method of substrate |
| KR960031587A (en) * | 1995-02-17 | 1996-09-17 | 오리시타 요이치 | How to clean parts |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR880002258A (en) * | 1986-07-18 | 1988-04-30 | 이또오 다께오 | Rinse treatment method of substrate |
| KR960031587A (en) * | 1995-02-17 | 1996-09-17 | 오리시타 요이치 | How to clean parts |
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