KR100272254B1 - Apparatus for collecting particles - Google Patents

Abstract

PURPOSE: An apparatus for collecting particles is provided to decide a permissible value of particles included in a gas by measuring correctly a volume of organic particles. CONSTITUTION: A standard volume cell(120) includes a gas inflow hole(121) connected with a gas supply line(100), the first valve(123) installed in the gas inflow hole(121), an exhaust hole(127) for exhausting gas, and the second valve(129) for opening and shutting the exhaust hole(127). A collection cover(130) has the first plate(131) for generating a speed difference of a moving fluid of gas. The first collection portion(140) includes the first stage(143) for loading a wafer and the second plate(147) for generating the speed difference of the moving fluid of the gas. The second collection portion(150) includes the second stage(153) combined with the first collection portion(140), a cooling trap installed at a lower portion of the second stage(153), the third plate(157) for generating the speed difference of the moving fluid of the gas, an exhaust hole(161) for exhausting the gas, and the second collection portion(150) having the third valve(162).

Description

Apparatus for collecting particles

The present invention relates to a particle collecting device, and more specifically, to collect organic particles having small particles and present in gaseous form at room temperature compared to metal particles, a particle collecting device structure and a gas volume measurement in which a cooling device is installed inside a stage. It is about a method.

In general, a particle collecting device is installed in a gas pipe for supplying gas to a facility and is used for the purpose of improving wafer yield by grasping the type of particles contained in the gas.

For example, the particle collecting device is installed in an inert gas pipe which is not toxic, and collects metal particles and organic particles existing in the gas flowing through the gas pipe on the wafer by size. However, since the organic particles present in the gas exist in the gas state at room temperature, it is difficult to collect the organic particles using the particle collecting device, so it is difficult to accurately determine the type of particles, and the volume of the particle collecting device is not known so that the particles are contained in the gas. The disadvantage is that the amount of particles is not known so that the amount of particles contained in the gas is not known.

1 is a cross-sectional view schematically showing a conventional particle collecting device.

As shown, the cylindrical particle collecting device 10 is combined with a collecting cover 20 for introducing gas into the particle collecting device 10 and the collecting cover 20, and among the gas introduced into the particle collecting device 20. Composed of a first collecting unit 30 for collecting particles having a relatively large particle, and a second collecting unit 40 coupled with the first collecting unit 30 to collect particles having relatively small particles among particles present in the gas. It is.

In the center of the upper surface of the collecting cover 20 is formed a gas inlet 21 which is connected to the gas supply line (1) for introducing gas into the particle collecting device 10, and in the predetermined region inside the collecting cover 20 The first plate 23 is coupled, and a first orifice 25 is formed at the center of the first plate 23 to generate a gas flow rate difference. Here, the lower portion of the collecting cover 20 is open so that an upper end of the first collecting unit 30 is inserted into a predetermined region in the opening of the collecting cover 20, and then the first collecting unit 30 is coupled to the collecting cover 20. do.

The first stage support 31 having a predetermined height protrudes from the center of the upper surface of the first collecting unit 30 inserted into the collecting cover 10, and the wafer 53 is disposed on the upper surface of the first state support 31. ) Is coupled to the first stage 33, the upper surface of the first dust collecting part 30 around the center of the first stage 33 and the first stage support 31 and the first stage support 31. The first through hole 35 is formed in the predetermined region to allow gas to flow. In addition, a second plate 37 is screwed into the lower predetermined region of the first stage support 31, and a second orifice 39 having a diameter smaller than the first orifice 25 is formed at the center of the second plate 37. Formed. Here, the lower part of the first collecting part 30 is opened so that the upper end of the second collecting part 40 is inserted into the opening of the first collecting part 30 in a predetermined region, and then the second collecting part 30 is collected in the first collecting part 30. The unit 40 is coupled.

In the center of the upper surface of the second collecting unit 40 inserted into the first collecting unit 30, a second stage support 41 protruding to a predetermined height is formed, and the upper surface of the second stationary support 41 is formed. The second stage 43 is coupled to the second stage 43 and the center of the second stage 43 and the second stage support 41 and the second stage support 41 to the center of the second dust collecting part 40 in a predetermined region The second through hole 45 is formed to allow gas to flow. In addition, a third plate 47 is screwed into a predetermined region under the second stage support 41, and a third orifice 49 having a diameter smaller than that of the second orifice 39 is formed at the center of the third plate 47. In the center of the lower surface of the second collecting part 40, an exhaust port 50 for exhausting the gas introduced into the particle collecting device 10 is formed. Here, reference numeral 51 denotes a portion of the gas introduced into the particle collecting device 10 outside the particle collecting device 10 or the orifices 25, 39, 49 and the through holes 35 and 45. O-ring to prevent leakage.

Referring to the operation of the conventional particle collecting device configured as described above are as follows.

First, when the gas inlet 21 of the particle collecting device 10 is connected to a predetermined region of the inert gas supply line 1, some of the gas flowing along the gas supply line 1 passes through the gas inlet 21. Flows into (10). The gas introduced into the particle collecting device 10 passes through the first orifice 25 formed at the center of the first plate 23 and is located between the first plate 23 and the upper surface of the first collecting unit 30. It flows into the empty space 27. Thereafter, the gas introduced into the empty space 27 is formed between the second plate 37 and the upper surface of the second collecting part 40 through the first through hole 35 and the second orifice 39. It flows into the empty space 38. At this time, the flow rate of the gas passing through the second orifice 39 is faster than the flow rate when passing through the first orifice 25. That is, since the diameter of the second orifice 39 is smaller than that of the first orifice 25, the flow rate difference is increased in the second orifice 39, which causes particles having a relatively large size among the particles contained in the gas. Particles (about 1 mu m in diameter) are adsorbed onto the upper surface of the wafer 53 lying on the first stage 33 and sampled.

Subsequently, the gas passing through the second orifice 39 generates a flow velocity difference based on the same principle as described above, and thus, the particles having a relatively smaller particle size (about 0.1 diameter than the particles of the particles collected in the first collecting part 30) are generated. Particles) are adsorbed and sampled on the upper surface of the wafer 54 lying on the second stage 43.

In this way, the gas passing through the third orifice 49 is exhausted to the outside through the exhaust port 50 formed in the lower portion of the second collecting part 40.

However, among the particles included in the gas, since the particles are smaller than the metal particles and exist in a gaseous state at room temperature, it is difficult to collect organic particles using a particle collecting device as in the prior art.

In addition, since the volume of the particle collecting device into which the gas is introduced is not known, there is a problem in that the amount of particles contained in the gas introduced into the particle collecting device cannot be analyzed (relative quantity), so that an acceptable range of particles cannot be determined. .

Accordingly, an object of the present invention is to collect the organic particles present in the gaseous state at room temperature, and to accurately measure the volume of gas introduced into the particle collecting device to determine the allowable range of the particles contained in the gas, the standard volume in the particle collecting device It is to provide a particle collecting device structure and a gas volume measurement method provided with a vessel and a cooling device.

1 is a cross-sectional view schematically showing the structure of a conventional particle collecting device,

2A is a cross-sectional view schematically showing the structure of the particle collecting device according to the present invention, Figure 2B is a view showing a cooling trap.

<Explanation of symbols for main parts of drawing>

120: standard volume container 130: collection cover

131: first plate 133: first orifice

140: first collecting unit 141: first stage support

143: first stage 147: second plate

149: second orifice 150: second collecting part

151: second stage support 153: second stage

154: cooling trap 157: third plate

159: third orifice 161: exhaust port

In order to achieve the above object, the present invention provides a standard volume vessel connected to a gas supply line for measuring the inflow of gas, and a portion of the standard volume vessel connected to the standard volume vessel, the bottom surface of which is opened, and a predetermined portion of the inner wall of the standard volume vessel. A collecting cover provided with a first plate for generating a flow velocity difference of the gas introduced therein, and a predetermined upper portion is introduced into the collecting cover through a lower surface of the collecting cover to be coupled to the collecting cover, and the lower surface is opened and a predetermined upper portion is formed. And a first collecting part comprising a first stage on which a wafer for collecting particles contained in the gas is placed, and a second plate provided on a predetermined portion of the inner wall to generate a flow rate difference of the gas, and a lower surface of the first collecting part. Through a predetermined portion of the upper end is introduced into the first collecting portion is coupled to the second collecting portion and formed in the predetermined upper portion It is installed in the second stage and the lower surface of the second stage where particles of particles smaller than the particles of the particles and the wafer collecting organic particles are placed, and installed in a predetermined portion of the inner wall and a cooling trap for solidifying the organic particles in a solid state. And a second collecting part including a third plate for generating a flow rate difference of the air and an exhaust port formed at a predetermined portion on the lower surface to exhaust the gas introduced therein.

For example, the standard volume vessel is a gas inlet connected to a gas line, a first on-off valve installed at a predetermined portion of the gas inlet to open and close the gas inlet, and a pressure installed at a predetermined portion of the standard volume vessel to indicate the pressure of the gas. A gauge, a discharge port for discharging gas existing in the standard volume container toward the collecting cover, and a second opening / closing valve installed at a predetermined portion of the discharge port to open and close the discharge port.

Hereinafter, a particle collecting device according to the present invention will be described with reference to the accompanying drawings.

2 is a cross-sectional view schematically showing the structure of a particle collecting device according to the present invention.

As shown, the particle collecting device 110 is composed of a standard volume cell 120 for measuring the volume of the gas and a collecting container 111 for collecting the particles contained in the gas by size. It is. Here, the collecting container 111 is coupled to the collecting cover 130 for introducing gas into the collecting container 111 and the collecting cover 130 to collect particles having relatively large particles among the particles introduced into the collecting container 111. The first collecting unit 140 and the second collecting unit 140 are combined with the first collecting unit 140 to collect particles having relatively small particles among the particles present in the gas.

In the center of the upper surface of the standard volume container 120, a gas inlet 121 is connected to the gas supply line 100 to introduce a gas, and a gas inlet 121 is formed to open and close the gas inlet 121 in a predetermined region. The first opening / closing valve 123 is installed, and a gauge 125 for measuring the pressure of the gas is installed at the side of the standard volume container 120. In addition, a standard volume vessel vent 127 is formed at a lower center of the standard volume vessel 120 to introduce a gas contained in the standard volume vessel 120 into the collection cover 130. The second opening / closing valve 129 is provided in a predetermined region.

In addition, a collection cover 130 is connected to the standard volume vessel exhaust port 127. The first plate 131 is coupled to a predetermined region inside the collection cover 130, and a first orifice 133 is formed at the center of the first plate 131 to generate a gas flow rate difference. Here, the lower portion of the collecting cover 130 is open so that the upper end of the first collecting unit 140 is inserted into a predetermined region in the opening of the collecting cover 130, and then the first collecting unit 140 is coupled to the collecting cover 130. do.

In the center of the upper surface of the first collecting unit 140 inserted into the collecting cover 130, the first stage support 141 protrudes at a predetermined height, and the wafer 183 is disposed on the upper surface of the first state support 141. ) Is coupled to the first stage 143, the upper part of the first collecting unit 140 around the center of the first stage 143 and the first stage support 141 and the first stage support 141. The first through hole 145 is formed in a certain region of the surface to allow gas to flow. In addition, a second plate 147 is screwed into the lower predetermined region of the first stage support 141, and a second orifice 149 having a diameter smaller than that of the first orifice 133 is formed at the center of the second plate 147. Formed. Here, the lower part of the first collecting part 140 is opened so that the upper end of the second collecting part 150 is inserted into the opening of the first collecting part 140, and then the first collecting part 140 and the second collecting part 140 are collected. The unit 150 is coupled.

In the center of the upper surface of the second collecting unit 150 inserted into the first collecting unit 140, a second stage support 151 protruding to a predetermined height is formed, and the upper surface of the second state holding unit 151 is formed. The second stage 153 is coupled to each other, and a cooling trap 154 for cooling the organic particles is installed in the lower part of the upper plate 153a of the second stage 153 as shown in FIG. 2B. In addition, a second through hole may allow gas to flow in a predetermined region of the upper surface of the second collecting unit 150 around the center of the second stage 153 and the second stage support 151 and the second stage support 151. 155 is formed, the third plate 157 is screwed in a predetermined region below the second stage support 151, the third diameter of the third plate 157 is smaller than the second orifice 149 in the center Orifice 159 is formed. In addition, an exhaust port 161 is formed at the center of the lower surface of the second collecting unit 150 to exhaust gas introduced into the collecting container 111, and a third opening / closing valve 162 is formed at a predetermined region of the exhaust opening 161. The exhaust port 161 is connected to a vacuum pump (not shown). Here, reference numeral 171 denotes a gas flowing into the collection container 111 leaks to the outside of the collection container 111 or to portions other than the orifices 133, 149 and 159 and the through holes 145 and 155. O-ring to prevent it.

Referring to the operation of the conventional particle collecting device configured as described above are as follows.

First, when the gas inlet 121 of the particle collecting device 110 is connected to a predetermined region of the inert gas supply line 100, some of the gas flowing along the gas supply line 100 passes through the gas inlet 121. Flows into 110. The gas introduced into the particle collecting device 110 passes through the first orifice 133 formed at the center of the first plate 131 through the standard volume container 120 to pass through the first plate 131 and the first collecting part. 140 is introduced into the empty space 137 between the upper surface. Thereafter, the gas introduced into the empty space 137 passes through the first through hole 145 and the second orifice 149 and is formed between the second plate 147 and the upper surface of the second collecting part 150. Flows into the empty space 148. At this time, the flow rate of the gas passing through the second orifice 149 is faster than the gas flow rate when passing through the first orifice 133. That is, since the second orifice 149 is smaller than the diameter of the first orifice 133, a flow rate difference is generated in the second orifice 149, which causes particles having a relatively large particle size among particles contained in the gas. (About 1 mu m in diameter) is adsorbed and sampled on the upper surface of the wafer 173 lying on the first stage 143.

The gas passing through the second orifice 149 is also generated by the same principle as described above. As a result, particles that are relatively smaller than those of the particles collected by the first collecting unit 140, that is, organic particles that are smaller in particle size and present in a gaseous state at room temperature than particles and metal particles having a diameter of about 0.1 μm or less among metal particles are present. The upper surface of the wafer 174 lying on the second stage 153 is collected. Here, when liquid nitrogen of about −196 ° C. is supplied to the cooling trap 154 installed on the lower surface of the second stage 153 in order to collect organic particles existing in a gaseous state at room temperature, the liquid nitrogen may be reduced by the low temperature of liquid nitrogen. The boiling point of the organic particles is lowered, which causes the organic particles to condense into a solid state and be collected on the wafer 174.

As such, the gas passing through the third orifice 159 is exhausted to the outside through the exhaust port 161 formed under the second collecting unit 150.

On the other hand, if necessary, the amount of particles contained in the gas is measured to collect the particles, and the particles-collected wafers 173 and 174 are put into a predetermined analysis facility, for example, GC / MS or ion chromatography. By analyzing how many ppm of particles are present in the gas entering the particle collecting device 110, it is used to determine the allowable particle allowance remaining in the gas.

Here, the volume of the particle collecting device 110 contained in the gas can be obtained by the ideal gas state equation described in <Equation 1> below.

<Equation 1>

P1V1 = P2VT and VT = V1 + V2 in <Equation 1>.

(Where P1 is the pressure of the gas contained in the standard volume vessel, V1 is the volume of the standard volume vessel, P2 is the pressure of the gas contained in the whole particle collection device, and V2 is the volume of the collection vessel.)

In order to obtain P1 and P2 shown in <Equation 1>, first, the second opening / closing valve 129 is closed and the first opening / closing valve 123 is opened to introduce a predetermined amount of gas into the standard volume container 120. Thereafter, the first opening / closing valve 123 is closed and then the gauge 125 installed in the standard volume container 120 is read to obtain the pressure of the standard volume container 120, that is, P1. When the pressure of P1 is obtained as described above, the third on-off valve 162 is closed and the second on-off valve 129 is opened, and then the entire particle collecting device is obtained by using the gauge 125 installed in the standard volume container 120. The pressure of the gas contained in the 110, that is, P2 can be obtained. Here, V1 is easily obtained because it is the volume of the standard volume container 120.

As such, when the values of P1, V1, and P2 are obtained, the value of VT can be obtained. When the value of VT is obtained, the volume (amount of gas) of the collecting container 111, that is, the value of V2 can be obtained.

Once the volume of the collecting container 111 is obtained, the types of particles collected on the surface of the wafer by moving the wafers 173 and 174 to the general equipment for analyzing the quantity of particles as described above, that is, the GC / MS equipment or the ion chromatography equipment. And quantification.

Therefore, since the amount of particles is measured by knowing the amount of gas introduced into the particle collecting device 110, the quantity of particles contained in the gas can be known.

As described above, the present invention has an effect of collecting organic particles existing in a gaseous state at room temperature by providing a cooling trap on a lower surface of the second stage.

In addition, by combining a standard volume container on the top of the particle collecting vessel, it is possible to know the amount of gas introduced into the particle collecting device, thereby measuring the amount of particles contained in the gas, thereby determining the allowable range of the particles. There is.

Claims (3)

A gas inlet connected to a gas supply line, a first opening / closing valve installed at a predetermined portion of the gas inlet to open and close the gas inlet, a pressure gauge indicating a pressure of the gas introduced therein, and discharging the gas introduced into a predetermined place; A standard volume container configured to measure a volume of the gas for quantitative analysis of particles contained in the gas, which is composed of a second opening / closing valve installed at a predetermined portion of the outlet and opening and closing the outlet; A collecting cover having an upper end connected to the standard volume container and having a lower surface opened, and having a first plate provided at a predetermined portion of the inner surface to generate a flow rate difference of the gas introduced from the standard volume container; The upper portion of the upper portion through the lower surface of the collecting cover is introduced into the collecting cover is coupled to the collecting cover, the lower surface is opened, the upper portion is formed a predetermined portion to place the wafer to collect the particles contained in the gas A first collecting part including a first stage and a second plate provided at a predetermined portion of an inner surface to generate a flow rate difference of the gas; And A predetermined upper end portion is introduced into the first collecting portion through a lower surface of the first collecting portion, is coupled to the first collecting portion, is formed at a predetermined upper portion, and is formed from particles of the particles collected at the first collecting portion. A second stage on which particles of small particles and a wafer collecting organic particles are placed; a cooling trap provided on a lower surface of the second stage to solidify the organic particles in a solid state; A second plate configured to generate a flow rate difference between the second plate, an exhaust port formed at a predetermined portion of the lower surface to exhaust the gas introduced therein, and a third open / close valve provided at a predetermined portion of the exhaust opening to open and close the exhaust opening; Particle collecting device comprising a collecting unit. The particle collecting device of claim 1, wherein liquid nitrogen is introduced into the cooling trap. According to claim 1, Orifices for generating a flow rate difference of the gas is formed in the predetermined portion of the first plate, the second plate and the third plate, respectively, wherein the diameter of the orifice is the first plate in the first plate Particle collecting device, characterized in that the smaller down to 3 plates.

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