KR100256331B1 - 밀착성과 표면형상이 우수한 진공증착 아연도금강판 제조방법 - Google Patents
밀착성과 표면형상이 우수한 진공증착 아연도금강판 제조방법 Download PDFInfo
- Publication number
- KR100256331B1 KR100256331B1 KR1019950035675A KR19950035675A KR100256331B1 KR 100256331 B1 KR100256331 B1 KR 100256331B1 KR 1019950035675 A KR1019950035675 A KR 1019950035675A KR 19950035675 A KR19950035675 A KR 19950035675A KR 100256331 B1 KR100256331 B1 KR 100256331B1
- Authority
- KR
- South Korea
- Prior art keywords
- zinc
- steel sheet
- vacuum
- iron
- evaporation source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (3)
- 진공증착장치를 사용하여 강판상에 아연피막을 제조하는 방법에 있어서, 상기 강판상에 아연을 진공증착하기 전에, 전자빔가열 증발원을 사용하여 철을 10-120nm의 두께범위로 진공증착하는 것을 포함하여 이루어짐을 특징으로 하는 밀착성과 표면형상이 우수한 아연진공 증착 도금강판 제조방법.
- 제1항에 있어서, 상기 아연진공증착층의 두께는 5g/㎡이상인 것을 특징으로 하는 밀착성과 표면형상이 우수한 아연진공 증착 도금강판 제조방법.
- 제1항에 있어서, 상기 아연은 저항가열 증발원을 사용하여 진공증착됨을 특징으로 하는 밀착성과 표면형상이 우수한 아연진공 증착 도금강판 제조방법.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950035675A KR100256331B1 (ko) | 1995-10-16 | 1995-10-16 | 밀착성과 표면형상이 우수한 진공증착 아연도금강판 제조방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950035675A KR100256331B1 (ko) | 1995-10-16 | 1995-10-16 | 밀착성과 표면형상이 우수한 진공증착 아연도금강판 제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR970021366A KR970021366A (ko) | 1997-05-28 |
| KR100256331B1 true KR100256331B1 (ko) | 2000-05-15 |
Family
ID=19430355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950035675A Expired - Fee Related KR100256331B1 (ko) | 1995-10-16 | 1995-10-16 | 밀착성과 표면형상이 우수한 진공증착 아연도금강판 제조방법 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100256331B1 (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100311796B1 (ko) * | 1997-12-20 | 2001-11-15 | 이구택 | 철 증착 합금화 용융아연도금 강판의 제조방법 |
| KR20210054712A (ko) * | 2019-11-06 | 2021-05-14 | 주식회사 포스코 | 가공성이 우수한 아연계 도금강판 및 그 제조방법 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53106646A (en) * | 1977-03-01 | 1978-09-16 | Mitsubishi Heavy Ind Ltd | Method and apparatus for vacuum evaporation plating |
-
1995
- 1995-10-16 KR KR1019950035675A patent/KR100256331B1/ko not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53106646A (en) * | 1977-03-01 | 1978-09-16 | Mitsubishi Heavy Ind Ltd | Method and apparatus for vacuum evaporation plating |
Also Published As
| Publication number | Publication date |
|---|---|
| KR970021366A (ko) | 1997-05-28 |
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