KR100244174B1 - Manufacturing method of barrier of plasma display panel - Google Patents

Abstract

The present invention relates to a method of manufacturing a partition wall of a plasma display panel. Forming a barrier rib, or injecting a photosensitive material into the surface of the glass substrate by ion exchange to form an ion exchange layer, and exposing and heat treating the ion exchange layer to crystallize, forming a mask pattern on a predetermined region on the crystallized ion exchange layer. Next, by forming the partition wall by etching the ion exchange layer crystallized using the mask pattern as a mask, it is possible to prevent deformation of the glass substrate and to simply form a fine partition wall, and to manufacture a low-cost, high-quality plasma display panel.

Description

Method of manufacturing partition wall of plasma display panel

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel (PDP), and more particularly to a method for manufacturing partition walls of a plasma display panel.

In general, a plasma display provides an image using light emitted from a plasma generated during gas discharge, and the discharged plasma is separated by a fine partition wall to constitute a unit cell.

An image is realized by selectively emitting light of a unit cell formed by a fine partition wall by a driving circuit. It is quite difficult to form a unit cell of about 100 μm on a glass substrate when fabricating an actual plasma display.

Recently, a screen print method, a sand blast method, a photosensitive paste method, an additive method, and the like are used to form a fine partition wall of such a plasma display.

Screen printing is a process in which glass paste is repeatedly printed and dried on a substrate about 7-8 times, dried, and then fired to form partition walls.

However, during mass production, the manufacturing time is very long and the partition wall precision is not good.

The sand blasting method is a process of coating and drying a glass paste on a substrate, and then removing a predetermined area of the glass paste by sanding and firing to manufacture a partition wall. Since the generated waste is pollutant, there is a burden of cost for the environmental treatment.

In addition, the photosensitive paste method is a process of coating and drying the photosensitive glass paste on a substrate, followed by etching, to form a partition wall by about 10 repetitive operations. This has the disadvantage of being longer.

The addition method is a process of applying and developing a register on a substrate, applying a glass paste between the developed resistors, drying and polishing, removing the resistor and firing to form a partition.

However, there is a disadvantage that a lot of manufacturing time and cost burden.

Except for the method of manufacturing a partition wall using photosensitive glass in the partition fabrication process as described above, most of the process methods use a soda-lime-based glass substrate, so the deformation problem of the glass substrate is very serious.

In addition, the bulkhead manufacturing process using a soda-lime-based glass substrate is applicable to the display of the general class, but not suitable for high-definition display.

For high-quality displays, the etching process using photosensitive paste or photosensitive glass substrate is most advantageous because the cell size is finer and the larger the ratio of the thickness to the height of the partition wall is, the better. .

The conventional method for manufacturing a partition wall of a plasma display panel has the following problems.

First, the manufacturing process is complicated, the manufacturing time is long, and the manufacturing cost is high.

Second, in the method of manufacturing a partition wall using a soda-lime-based glass substrate, not only the deformation problem of the glass substrate is serious but also not suitable for high-definition display.

In the method of manufacturing partition walls using photosensitive pastes and photosensitive glass substrates, although suitable for high-quality displays, the price is very expensive.

SUMMARY OF THE INVENTION The present invention has been made to solve such a problem, and has an object to provide a low-cost, high-quality plasma display panel partition wall manufacturing method that can easily obtain a fine partition wall surface treatment.

1A and 1B show concentration distributions for ions in the thickness direction of a glass substrate according to the present invention.

2A to 2F illustrate a process of fabricating a partition wall of a plasma display panel according to a first embodiment of the present invention.

3A to 3F illustrate a process of fabricating a partition wall of a plasma display panel according to a second embodiment of the present invention.

Explanation of symbols for main parts of the drawings

1: glass substrate 2: ion exchange layer

2a: crystallization layer 3: mask

4: mask pattern

The method for manufacturing a partition wall of a plasma display panel according to the present invention has a main feature of forming a partition wall by implanting a photosensitive material into the glass substrate surface by ion exchange and etching a predetermined region of the glass substrate.

Another feature of the present invention is a first step of forming an ion exchange layer by injecting a photosensitive material into the surface of the glass substrate by an ion exchange method, a second step of crystallizing a predetermined area of the ion exchange layer by exposure and heat treatment, and a crystallized region And a third step of forming a partition wall by etching.

Another feature of the present invention is a first step of forming an ion exchange layer by injecting a photosensitive material into the surface of the glass substrate by an ion exchange method, a second step of crystallizing the ion exchange layer by exposure and heat treatment, and on the crystallized ion exchange layer And a fourth step of forming a mask pattern in a predetermined region of the mask, and a fourth step of forming a partition by etching the ion exchange layer crystallized using the mask pattern as a mask.

Hereinafter, a method of manufacturing a partition wall of a plasma display panel according to the present invention having the above characteristics will be described with reference to the accompanying drawings.

First, the photosensitive glass will be described to help understand the basic principle of the present invention.

Photosensitive glass was developed by Corning, Inc., USA 40 years ago, and is a composition-based glass in which a small amount of a photosensitive agent such as Au, Ag, Cu, or the like is added to SiO ₂ -Li ₂ O-Al ₂ O ₃ -based glass.

When the glass is irradiated with ultraviolet light, Au, Ag, Cu, or the like, which are photosensitive ions present in the glass, become a metal atom, and a colloidal phase is formed.

The colloidal phase thus formed acts as a nucleus of the crystal phase, and when thermally treated at 450 to 600 ° C., precipitates Li ₂ O—SiO ₂ crystals.

The precipitated crystal phase can selectively remove only this part because the erosion of the acid solution is very fast.

In the present invention, only the surface of the conventional soda-lime-based glass substrate has the same characteristics as the photosensitive glass described above to manufacture the partition wall of the plasma display panel.

In order to make the surface of the soda-lime-based glass substrate such as photosensitive glass, the glass substrate is first immersed in a LiNO ₃ solution maintaining a temperature in the range of 300 to 500 ° C.

Then, ion exchange occurs between Na ⁺ ions, which are alkali components present in the glass component, and Li ⁺ ions, which are present in the LiNO ₃ solution, on the surface of the glass substrate. The reaction scheme is as follows.

A + B = B + A

Where A is an alkali ion in the glass and B is an ion in the solution.

That is, in the case of soda-lime-based glass, the Na ion component is about 13 w / o. When this is sufficiently exchanged with Li ⁺ ions in the LiNO ₃ solution, Na ⁺ ions on the surface of the glass almost disappear and Li ⁺ Substituted with ions, as shown in FIG. 1A, a concentration distribution for ions in the glass substrate thickness direction is generated.

Then, this was again immersed in AgNO ₃ solution maintaining a temperature in the range of 300 ~ 500 ℃ and exchange reaction between Na ⁺ ions, Li ⁺ ions in the glass substrate and Ag ⁺ ions in the AgNO ₃ solution as shown in the reaction scheme as shown in Figure 1b As shown in FIG. 2, concentration distribution for ions in the glass substrate thickness direction is achieved.

As such, although the LiNO ₃ solution and the AgNO ₃ solution may be used separately, the mixed solution of the two solutions may be used.

Using the above method, an ion exchange layer having a predetermined depth is formed on the surface of the glass substrate, and the thickness of the ion exchange layer can be adjusted according to the ion concentration in the ion exchange solution, the temperature of the ion exchange solution, and the ion exchange time.

For example, immersing a glass substrate in 50 mole% LiNO ₃ solution at about 450 ° C. for 12 hours can produce an ion exchange layer in which Na ⁺ ions and Li ⁺ ions are completely exchanged to a depth of about 200 μm.

In addition, when using a mixed solution of LiNO ₃ solution and AgNO ₃ solution, it is possible to control the thickness of the ion exchange layer by adjusting the composition ratio of the two solutions.

2A to 2F illustrate a process of fabricating a partition wall of a plasma display panel according to a first embodiment of the present invention. As shown in FIG. 2A, first, the glass substrate 1 is immersed in an ion exchange solution as described above. The ion exchange layer is formed in the surface of the glass substrate 1 by ion exchange of ions between the ion exchange solution and the glass substrate 1.

Subsequently, as shown in FIG. 2B, the glass substrate 1 on which the ion exchange layer 2 is formed is washed and dried, and then, as shown in FIG. 2C, the ion exchange layer 2 is formed using the mask 3. When ultraviolet rays are irradiated to a predetermined region of), Ag ⁺ ions, which are photosensitive materials of the ion exchange layer 2, which are irradiated with ultraviolet rays, are precipitated as neutral colloidal particles.

When this is heat-treated at a temperature of about 450 to 550 ° C., the SiO ₂ —LiO ₂ crystal phase is precipitated using the Ag colloidal particles as a nucleus to form a crystallization layer 2a in a predetermined region of the ion exchange layer 2.

As shown in FIG. 2E, since the crystallization layer 2a is well eroded in an acid solution, the ion exchange layer 2 having the crystallization layer 2a formed thereon is etched with an acid solution, as shown in FIG. 2F. To form bulkheads at regular intervals.

As described above, the plasma display panel can be manufactured by forming electrodes after forming the partition walls and forming dielectric layers on the entire substrate.

Unlike the conventional plasma display panel fabrication method, the barrier ribs may be manufactured first, and the electrode and the dielectric layer may be formed between the barrier ribs to prevent deformation of the glass substrate and to reduce the consumption of dielectric materials. Can be.

3A to 3F illustrate a process of fabricating a partition wall of a plasma display panel according to a second embodiment of the present invention. FIGS. 3A and 3B are the same as the first embodiment of the present invention, and thus description thereof will be omitted.

As shown in FIG. 3C, after irradiating the entire surface of the ion exchange layer 2 with ultraviolet light, and then heat treating at a temperature of about 450 to 550 ° C. as shown in FIG. 3D, a crystallized layer having a SiO ₂ —LiO ₂ crystal phase ( 2a).

3E, after the mask pattern 4 is formed in a predetermined region on the crystallization layer 2a, the exposed crystallization layer 2a is etched with an acid solution using the mask pattern 4 as a mask. As a result, as shown in FIG. 3F, partition walls of a predetermined interval are formed.

In the method of manufacturing a partition wall of a plasma display panel according to the present invention, the following effects are obtained.

Surface treatment of existing soda-lime-based glass substrates and the formation of fine barrier ribs through an etching process prevents deformation of the glass substrate and enables the formation of fine barrier ribs.

Claims (12)

Implanting a photosensitive material into the glass substrate surface by an ion exchange method; And forming a partition by etching a predetermined region of the glass substrate. The method of claim 1, wherein the glass substrate is soda-lime-based glass. The method of claim 1, wherein the photosensitive material is Ag ⁺ ions. A first step of forming an ion exchange layer by injecting a photosensitive material into the glass substrate surface by an ion exchange method; A second step of crystallizing a predetermined region of the ion exchange layer by exposure and heat treatment; And a third step of forming the partition by etching the crystallized region. The method of claim 4, wherein the glass substrate is soda-lime-based glass. The method of claim 4, wherein the photosensitive material is Ag ⁺ ions. The method of claim 4, wherein the first step Immersing the glass substrate in the LiNO ₃ solution at a predetermined temperature for a predetermined time to replace ions of the glass substrate with ions of the LiNO ₃ solution; And immersing the substituted glass substrate in an AgNO ₃ solution for a predetermined time at a predetermined temperature to replace the ions of the glass substrate with the ions of the AgNO ₃ solution. The method of claim 4, wherein the first step And immersing the glass substrate in a mixed solution of a LiNO ₃ solution and an AgNO ₃ solution at a predetermined temperature for substituting ions of the glass substrate and ions of the mixed solution. The method of claim 7, wherein the predetermined temperature is 300 ° C. to 500 ° C. 10. The method of claim 4, wherein the temperature during the heat treatment is 450 to 550 ° C. The method of claim 4, wherein the thickness of the ion exchange layer is controlled according to an ion concentration in the ion exchange solution, a temperature of the ion exchange solution, and an ion exchange time. A first step of forming an ion exchange layer by injecting a photosensitive material into the glass substrate surface by an ion exchange method; A second step of crystallizing the ion exchange layer by exposure and heat treatment; A third step of forming a mask pattern in a predetermined region on the crystallized ion exchange layer; And a fourth step of forming a partition by etching the ion exchange layer crystallized by using the mask pattern as a mask.

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