KR100205729B1 - Manufacture of cathode-ray tube - Google Patents

Abstract

[purpose]

Provided is a cathode ray tube manufacturing method of improving the adhesive strength of a conductive antireflection film deposited on a face panel portion surface.

[Configuration]

Encapsulating an electron gun in the bulb 1 having the conductive thin film 2a deposited on the surface of the face panel portion 1a to form a cathode ray tube 3, and then washing and drying the surface of the face panel portion 1a; A step of uniformly and thinly applying the silicate hydrolyzate solution 2ca to which the surfactant was applied to the entire surface of the face thin film portion 1a on the conductive thin film 2a, and the low refractive index thin film 2c by low temperature firing of the solution 2ca. Hardening | curing and depositing and forming the electroconductive antireflective film 2 which consists of the electroconductive thin film 2a and the low refractive index thin film 2c on the surface of the face panel part 1a.

Description

Cathode Ray Tube Manufacturing Method

The present invention relates to a cathode ray tube manufacturing method in which a conductive antireflection film is deposited on a surface of a face panel.

The outer surface of the cathode ray tube face surface becomes blurred when external light such as indoor lighting is reflected. In addition, static electricity is generated when the power supply is turned on or off, and discharged when the viewer approaches, which causes discomfort and easily adheres to dust. Therefore, it has conventionally been known to form a conductive thin film and a low refractive index thin film on the outer surface of a face panel and to provide a conductive antireflection film to reduce reflected light caused by interference of light and to prevent charging.

An example of the thin film formation will be described with reference to FIG. 2.

First, as shown in FIG. 2A, a conductive thin film 2a containing tin oxide (SnO 2) as a main component is formed on the outer surface of the face panel portion 1a of the bulb 1 by CVD. Since this CVD process heats the bulb 1 at 450 degreeC or more, it is performed before making the inside of the bulb 1 into a vacuum. Next, the electron gun is combined into the bulb 1, and the cathode ray tube 3 is formed using the inside of the bulb 1 as a major.

Next, as shown in FIG. 2B, the surface of the conductive thin film 2a is of course washed, followed by wiping off moisture or stain with a brush 4 and drying. As shown in FIG. 2C, the bulb 1 is heated to about 40 ° C, and the silicate hydrolyzate solution 2ba is dropped on the conductive thin film 2a from the nozzle 5.

As shown in FIG. 2D, the bulb 1 is rotated to apply a thin film of the solution 2ba to the entire surface of the face panel, and then baked at a low temperature (for example, 250 ° C) to cover the low refractive index thin film 2b. It adheres to and forms and the electroconductive antireflection film 2 is obtained.

In the above-described method, when the low refractive index thin film 2b is deposited, the silicate hydrolyzate and the OH groups contained in each of the conductive thin film 2a are dehydrated in the firing step, and both adhere to each other. There are relatively few OH groups in the air, and the adhesive strength of the film decreases due to the presence of air in the micro-gap between the membrane molecules. In this case, if the high temperature firing at 350 to 450 ° C. after the solution is applied, the reaction of the OH group is promoted to improve the film adhesive strength. Since the gas is released and adheres to the electron gun and its electron-emitting characteristics deteriorate, high temperature firing is impossible and sufficient film strength cannot be obtained.

1A to 1D are respective process charts showing examples of the cathode ray tube manufacturing method according to the present invention.

1E is an enlarged cross-sectional view of a main portion of the face panel portion surface illustrating an operation example of the present invention.

2A to 2D are angular process diagrams showing an example of a conventional cathode ray tube manufacturing method.

* Explanation of symbols for main parts of the drawings

1 bulb 1a face panel

2: conductive antireflection film 2a: conductive thin film (tin oxide thin film)

2e: low refractive index thin film 3: cathode ray tube

[Means for solving the problem]

The present invention encloses an electron gun in a bulb in which a conductive thin film is formed on a surface of a face panel, and makes a major inside, and forms a cathode ray tube, and then washes and dries the surface of the face panel with water, and a surfactant. Applying the silicate hydrolyzate solution to the front face of the conductive thin film uniformly and thinly, and calcining the solution at low temperature to purify the low refractive film, and using the conductive thin film and the low refractive index thin film on the face panel surface. And depositing a conductive antireflection film, wherein the silicate hydrolyzate solution to which the surfactant is added is calcined at a low temperature of 250 ° C or less.

[Action]

According to the above technical means, when a surfactant is added to the silicate hydrolyzate solution to deposit and form a low refractive index thin film on the conductive thin film, the wettability (oiliness) of the silicate hydrolyzate is improved by adding the surfactant. It enters into a minute gap, and each of the OH groups of the conductive thin film and the silicate hydrolyzate reacts to increase the reaction area with respect to the adhesion, and the low refractive index thin film is firmly adhered to the conductive thin film.

EXAMPLE

Example 1

Example 1 of the cathode ray tube manufacturing method which concerns on this invention is demonstrated below with reference to FIG. The same reference numerals are used for the same parts as those shown in FIG. 2, and the description thereof will be omitted. The difference is that a surfactant such as ethylene oxide propylene oxide block polymer (trade name: Pluronic) is added to the silicate hydrolyzate solution, which is a solution of the material for forming the low refractive index thin film 2c. That is, as shown in FIG. 1a, first, a tin oxide (SnO₂) thin film 2a, which is a conductive thin film, is deposited to a thickness of 16 nm by surface CVD of the face panel portion 1a of the bulb 1, as shown in FIG. The electron gun is assembled and the inside thereof is vacuumed to form the cathode ray tube 3.

Next, as shown in FIG. 1B, the surface of the tin oxide thin film 2a is washed with water, wiped and dried, and then the bulb 1 is heated to about 40 DEG C as shown in FIG. 1C, and the tin oxide thin film ( On 2a), a solution 2ca in which 0.01% by weight of pluronic acid is added to the ethyl silicate hydrolyzate ethanol solution (1.3% by weight of silica solid content) is added dropwise from the nozzle 5.

Then, as shown in FIG. 1D, the bulb 1 is rotated at 150 rpm for 1 minute to apply a thin solution 2ca to the entire surface of the face panel portion, and then baked at 180 ° C. for 20 minutes to obtain a low refractive index. A thin film 2c is deposited on the entire surface in a thickness of 125 nm to obtain a conductive antireflection film 2.

According to the above constitution, since the wettability of the silicate hydrolyzate solution 2ca is improved by applying pluronic, the tin oxide thin film 2a formed on the surface of the face panel portion 1a as shown in FIG. 1E. The solution (2ca) enters the fine gap S of the. Doing so increases the contact area between the tin oxide thin film 2a and the low refractive index thin film 2c, thereby firmly adhering and improving film adhesion strength. In addition, even if there are oily spots on the tin oxide thin film 2a, since the surfactant has a lipophilic property (oil-friendly property), the surfactant has good familiarity with the low refractive index thin film 2c, and the film quality is improved, and the appearance is poor. This decreases, in particular the improved yield. According to the measurement, it was confirmed that there was about three times the friction resistance compared with the conventional, that is, the film adhesive strength improved about three times.

Example 2

The difference from Example 1 is that the ethyl silicate hydrolyzate solution (2ca) added with the surfactant is applied by the spray method. It baked for 20 minutes at 250 degreeC like Example 1, and obtained about 3 times the film strength compared with the past.

According to the present invention, since a low refractive index thin film was formed by applying a solution made of a silicate hydrolyzate to which a surfactant was added on the conductive thin film on the face of the face panel portion of the cathode ray tube, the low refractive index thin film and the conductive thin film were firmly bonded at low temperature firing. The film adhesion strength is also obtained, and the intimacy between the low refractive index thin film and the conductive thin film is also good, and the film quality is improved, and the apparent yield is particularly improved.

Claims (3)

A cathode ray tube manufacturing method comprising applying a silicate hydrolyzate solution on a conductive thin film formed on an outer surface of a face panel and then heating to form a low refractive index thin film, wherein the surfactant is added to the silicate hydrolyzate solution and applied simultaneously. Method of producing a cathode ray tube, characterized in that the heating to a temperature of less than 250 ℃. The cathode ray tube manufacturing method according to claim 1, wherein the conductive thin film has tin oxide (SnO₂) or indium oxide (In₂O₃) as a main component. The cathode ray tube manufacturing method according to claim 2, wherein the conductive thin film is formed by a CVD method.