KR0160382B1 - Gas and power error supply alarm system of semiconductor manufacture - Google Patents

Abstract

The present invention relates to a gas and power abnormality supply alarm device of a semiconductor manufacturing system that detects when an abnormality occurs in an amount of gas or a high frequency power supplied to perform a process.

Gas and power abnormality supply alarm device of the semiconductor manufacturing system according to the present invention, in the semiconductor manufacturing system configured to supply the reaction gas and the high frequency power for the process performance from the gas supply source and the high frequency power supply to the process chamber, the reaction gas to the process chamber Detecting means for detecting the gas flow amount and the high frequency power supply of the supply line for supplying the supply, and when the supply amount of the reaction gas and the high frequency power detected by the detection means is determined to be above or below the predetermined upper limit and lower limit level, Comparing means for outputting the determination signal according to the characterized in that it comprises a warning means for the alarm operation in accordance with the determination signal output from the comparison determination means.

According to the present invention, it is possible to maximize the workability and productivity of the semiconductor manufacturing system, it is possible to prevent the waste of materials due to defects, there is an effect that can be expected to reduce the cost as much.

Description

Gas and power abnormality supply alarm device of semiconductor manufacturing system

1 is a view showing an embodiment of a gas and power abnormality supply alarm device of a semiconductor manufacturing system according to the present invention.

* Explanation of symbols for main parts of the drawings

10: process chamber 12: gas supply source

14: RF power supply 16, 17: sensor

18: power detector 20, 22, 24: A / D converter

26, 28, 30: display unit 32, 34, 36: comparison unit

38, 40, 42: light emitting unit 44: buzzer

46: alarm unit Q1 to Q3: transistor

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing system, and more particularly, to a gas and power abnormality supply alarm device of a semiconductor manufacturing system which detects when an abnormal supply occurs in an amount of gas or a high frequency power supplied to perform a process. .

In general, a process chamber for manufacturing a semiconductor device is separately configured to perform processes such as oxidation, etching, diffusion, plasma reaction, and ion implantation, and gas is supplied to supply the reaction gas for performing the corresponding process to each of these process chambers. The system is configured and configured to apply high frequency voltage.

The process chamber is configured to perform a predetermined process according to an operation command of a host computer. However, these facilities, especially dry etching facilities, are not provided with a function to check and alarm itself when the reaction gas or electric power is not supplied normally and is outside the permitted limits.

Due to this problem, a large quality accident can be caused, which is caused by the operator's failure to set the process conditions, the regulator's pressure setting error, or the unsealing of the gas container. Or, as a matter of equipment, even if the gas is not supplied in the required amount due to the malfunction of the flow regulator, a quality accident may occur even when the process chamber is misjudged to operate normally.

MEANS TO SOLVE THE PROBLEM As a result of trying to solve the above-mentioned conventional problem, the present inventors came to mind this invention.

It is an object of the present invention to provide a gas and power abnormality supply alarm device of a semiconductor manufacturing system that detects and alarms when a normal gas supply and a high frequency power supply are not provided to a facility for manufacturing a semiconductor device.

The gas and power abnormality supply alarm device of the semiconductor manufacturing system according to the present invention is a semiconductor manufacturing system configured to supply reaction gas and high frequency power for process performance from a gas supply source and a high frequency power source to a process chamber, and react with the process chamber. A detection means for detecting a gas flow amount and a high frequency power supply amount of a supply line for supplying a gas, and a supply amount of the reaction gas and the high frequency power detected by the detection means is compared with a predetermined upper limit and lower limit level and then judged to be above or below Comparing means for outputting the determination signal according to the characterized in that it comprises a warning means for the alarm operation in accordance with the determination signal output from the comparison determination means.

The detecting means may include gas quantity sensing means for sensing the amount of gas flowing in the supply line and power quantity sensing means for detecting the amount of power supplied from the high frequency power source to the process chamber.

Preferably, the detecting means further comprises an analog / digital converter for converting the analog signal output from the gas amount sensing means and the power amount sensing means into a digital signal.

And, it is preferable that the display means for displaying the corresponding amount by inputting a signal detecting the gas amount or the high frequency power amount from the detection means is preferably configured.

The comparison judging means sets a supply reference range of the reaction gas supply amount, and outputs a determination signal according to the gas amount comparison decision means when the gas flow amount input from the detection means deviates from the upper limit or the lower limit of the reference range. It may include a high frequency power amount comparison determination means for setting the power supply reference range of the amount of power and outputs a determination signal according to the high frequency power supply input from the detection means is out of the upper limit or the lower limit of the reference range.

In addition, the upper limit or lower limit light emitting means for determining the amount of gas or the high frequency power supplied from the comparison determining means and outputting a determination signal which is output according to the upper limit or the lower limit of the reference range may be further configured.

The alarm means may include a switching means for switching a constant voltage according to a determination signal output from the comparison determining means, and an alarm unit for alarming by a constant voltage applied according to a switching operation of the switching means.

The buzzer for outputting the buzzer sound by the constant voltage applied according to the switching operation of the switching means may be further configured.

The alarm means may be configured to perform an alarm operation by logically combining the determination signal for the supply amount of the gas and the high frequency power output from the comparison determination means, and specifically, the supply amount of the gas and the high frequency power. And an alarm unit configured to amplify a signal that is logically combined and output from the NOA gate, and an alarm unit configured to alarm according to the amplified signal level.

The alarm means preferably includes a reset switch for resetting the alarm operation.

Hereinafter, a preferred embodiment of a gas and power abnormality supply alarm device of a semiconductor manufacturing system according to the present invention will be described in detail with reference to the accompanying drawings.

Referring to FIG. 1, an embodiment of the present invention provides a process chamber 10 for manufacturing a semiconductor device, such that a plurality of reaction gases for a process, that is, gases such as O ₂ and CF ₄ , are supplied through a supply line. 12 is connected, and the RF power source 14 is connected to supply a high frequency power (also referred to as 'RF (Radio Frequency) power') for the operation of the process chamber 10.

In the supply line, sensors 16 and 17 are configured to sense the amount of reaction gas supplied to the process chamber 10. The RF power supplied to the process chamber 10 is configured to be detected by the power detector 18.

Each reaction gas supply amount supplied to the process chamber 10 is sensed by each sensor 16 and 17, and the sensing signal is an analog / digital converter (hereinafter referred to as an 'A / D converter') (20). , 22). The amount of RF power supplied from the power detector 18 to the process chamber 10 is sensed, and the sensed signal is configured to be input to the A / D converter 24.

Each of the A / D converters 20, 22, and 24 converts the analog signal sensing the gas supply amount and the power amount into a digital signal, respectively, and outputs the converted digital signal. The sensing signal converted into the digital signal is displayed in each of the display units 26, 28, and 30. It is configured to display the amount sensed as entered. In addition, the output signals of the A / D converters 20, 22, and 24 are configured to be input to the comparators 32, 34, and 36, and each comparator 32, 34, and 36 has an input signal pre-internally. It is configured to judge whether it is within a specified specific range and apply the determination signal according to the base of each transistor Q1, Q2, Q3. In addition, the light emitters 38, 40, and 42 are connected to the comparators 32, 34, and 36, respectively, and emit light when gas and RF power are supplied within a range set by a determination signal output after performing the comparison determination operation. It is configured to.

The collectors of the transistors Q1, Q2, and Q3 are configured such that the constant voltage Vcc is applied through the resistors R1, R2, and R3, and the buzzer is switched according to the switching operations of the transistors Q1, Q2, and Q3. A constant voltage Vcc is applied to the 44 or the alarm unit 46 to generate a buzzer sound or perform an alarm operation.

The alarm operation of the alarm unit 46 may be performed by the operator outputting a display message to the host computer that controls the process for each process chamber or by generating a separate alarm sound.

In the above-described configuration, the sensors 16 and 17 and the A / D converters 20, 22 and 24 are configured as detection means, and the transistors Q1, Q2 and Q3, the buzzer 44 and the alarm unit 46 are alarmed. It consists of means. In addition, the NOR gate and the amplifier may be mixed to operate the buzzer 44 or the alarm unit 46 according to the determination signals output from the comparators 32, 34, and 36.

The operation and effects of the embodiment according to the present invention configured as described above will be described.

For example, in order to perform dry etching, O ₂ 220 SCCM and CF ₄ 90 SCCM are supplied to the process chamber 10, and after the gas is supplied, the inside of the process chamber 10 is set to a predetermined pressure condition, and the pressure is set. RF power is applied after about 300W.

At this time, the amount of gas or RF power to be supplied is preset in the comparison unit 32, 34, and 36 in a predetermined range, and the comparison unit 32, 34 and 36 is allowed for the gas or RF power to be supplied, respectively, as set. The upper limit level and the lower limit level within the range are determined.

Therefore, when O ₂ and CF ₄ are supplied to the process chamber 10 for the dry etching process, the amounts are sensed by the respective sensors 16 and 17 and input to the A / D converters 20 and ₂₂ , and RF power is supplied. When supplied, the amount is sensed by the power detector 18 and input to the A / D converter 24 as an analog signal. Then, each A / D converter 20, 22, 24 converts the input analog signal into a digital signal, and then outputs to the display units 26, 28, 30 to output the amount of reaction gas or RF power currently supplied. The display is displayed for the operator to check, and the digital signals are input to the comparators 32, 34, and 36.

When digital signals are input from each of the A / D converters 20, 22, and 24, the comparing units 32, 34, and 36 respectively set the amount of each gas and the amount of RF power currently supplied as the input signals. It is checked whether it is inside, and a discrimination signal is output accordingly. If the amount of each gas and the amount of RF power that are currently supplied are above or below the set range, the comparing units 32, 34, and 36 vary the signals applied to the light emitting units 38, 40, and 42, respectively. Turn off 38,40,42).

When the range exceeds or falls below the preset range, the comparison units 32, 34, and 36 turn the determination signal high to the bases of the transistors Q1, Q2, and Q3, and turn them on. If any one of the transistors Q1, Q2, and Q3 is turned on, the constant voltage Vcc is applied to the buzzer 44 and the alarm unit 46, so that the buzzer 44 generates a buzzer sound and the alarm unit 46 sets the alarm. Perform the action.

That is, if light emission, buzzer sound or other alarm action is performed when driving the process chamber to perform a specific process, for example, dry etching, the operator can immediately confirm that the process is abnormal, and accordingly, each reaction gas By checking the bomber end supplying the regulator, adjusting the regulator to adjust the gas supply amount, and checking the RF power supply, appropriate action can be taken.

Therefore, if an operator makes an error in the setting of a process condition or a pressure setting of a regulator and detects that the gas is not normally supplied, the operator automatically detects this and transmits an alarm to the operator, thereby preventing a quality error by preventing a process error. In addition, the alarm operation may be performed to take appropriate measures in the same manner when gas is not supplied because the bombadan is not opened.

In addition, since the alarm operation is performed even when the gas is not normally supplied due to the problem of the facility, the operator can prevent the quality defect by checking the facility according to the alarm.

Therefore, it is possible to maximize the workability and productivity of the semiconductor manufacturing system, it is possible to prevent the waste of materials due to defects, there is an effect that can be expected to reduce the cost as much.

Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications belong to the appended claims.

Claims (13)

A semiconductor manufacturing system configured to supply reactive gas and high frequency power for a process performance from a gas supply source and a high frequency power source to a process chamber, wherein the detection detects a gas flow amount and a high frequency power supply amount of a supply line for supplying a reactive gas to the process chamber. Way; Comparison determination means for comparing the supply amount of the reaction gas and the high frequency power detected by the detection means with a preset upper limit and lower limit level and outputting a determination signal accordingly when it is determined to be above or below; And alarm means for alarm operation in accordance with a determination signal output from the comparison determination means. Gas and power abnormality supply alarm device of a semiconductor manufacturing system, characterized in that comprises a. 2. The apparatus of claim 1, wherein the detecting means comprises: gas amount sensing means installed in the supply line to sense an amount of gas flowing; Power amount sensing means for detecting an amount of power supplied from the high frequency power source to the process chamber; Gas and power abnormality supply alarm device of the semiconductor manufacturing system, characterized in that comprises a. The gas and power of the semiconductor manufacturing system according to claim 2, wherein the detection means further comprises an analog / digital converter for converting the analog signal output from the gas amount sensing means and the power amount sensing means into a digital signal, respectively. Oversupply Alarm. The gas and power abnormality supply of the semiconductor manufacturing system as claimed in claim 1, 2 or 3, further comprising a display means for inputting a signal detecting the gas amount from the detection means and displaying the corresponding amount. Alarm device. 4. The gas and power abnormality of the semiconductor manufacturing system according to claim 1, 2 or 3, further comprising display means for inputting a signal detecting a high frequency power amount from the detection means and displaying the corresponding amount. Supply alarm. The gas quantity of claim 1, wherein the comparison judging means sets a supply reference range of the reaction gas supply amount and outputs a determination signal according to the amount of gas flow input from the detection means outside the upper or lower limit of the reference range. Comparative determination means; High frequency power amount comparison determining means for setting a supply reference range of the high frequency power amount and outputting a determination signal according to the high frequency power supply amount input from the detection means outside the upper limit or the lower limit of the reference range; Gas and power abnormality supply alarm device of the semiconductor manufacturing system, characterized in that comprises a. The method of claim 1 or 6, wherein the upper limit light emitting means for emitting light by determining the amount of gas supplied from the comparison determination means and out of the upper limit of the reference range is applied according to the determination signal output according to the Gas and power abnormality supply alarm device of semiconductor manufacturing system. The method of claim 1 or claim 6, characterized in that the lower limit light emitting means for emitting light by determining the amount of high-frequency power supplied from the comparison determination means and when the deviation is out of the lower limit of the reference range is applied according to the output of the determination signal Gas and power abnormality supply alarm device of the semiconductor manufacturing system. 2. The apparatus of claim 1, wherein the alarm means comprises: switching means for switching a constant voltage according to a determination signal output from the comparison determination means; And an alarm unit operating an alarm by a constant voltage applied according to the switching operation of the switching means. Gas and power abnormality supply alarm device of the semiconductor manufacturing system, characterized in that comprises a. 10. The gas and power abnormality supply alarm device according to claim 9, wherein the alarm means further comprises a buzzer for outputting a buzzer sound by a constant voltage applied according to the switching operation of the switching means. The semiconductor manufacturing system according to claim 1, wherein the alarm means is configured to perform an alarm operation by logically combining a determination signal for a supply amount of gas and high frequency power output from the comparison determination means. Gas and power supply alarm. 12. The apparatus of claim 11, wherein the alarm means comprises: a noah gate to which a determination signal for supplying the gas and the high frequency power is input; An amplifier for amplifying a signal output by being logic-combined at the noah gate; And an alarm unit operating an alarm according to the amplified signal level. Gas and power abnormality supply alarm device of the semiconductor manufacturing system, characterized in that comprises a. The gas and power abnormality supply alarm device of the semiconductor manufacturing system according to claim 1, wherein the alarm means comprises a reset switch for resetting the alarm operation.