KR0152579B1 - 탄소-염소 결합의 염소가 환원된 실란 화합물의 제조방법 - Google Patents
탄소-염소 결합의 염소가 환원된 실란 화합물의 제조방법Info
- Publication number
- KR0152579B1 KR0152579B1 KR1019950038120A KR19950038120A KR0152579B1 KR 0152579 B1 KR0152579 B1 KR 0152579B1 KR 1019950038120 A KR1019950038120 A KR 1019950038120A KR 19950038120 A KR19950038120 A KR 19950038120A KR 0152579 B1 KR0152579 B1 KR 0152579B1
- Authority
- KR
- South Korea
- Prior art keywords
- methyldichlorosilane
- dichloromethyl
- hydrogen
- substituted
- yield
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 12
- 150000004756 silanes Chemical class 0.000 title description 2
- 239000001257 hydrogen Substances 0.000 claims abstract description 81
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 81
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 42
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 39
- 239000003054 catalyst Substances 0.000 claims abstract description 30
- -1 silane compound Chemical class 0.000 claims abstract description 14
- 239000000460 chlorine Substances 0.000 claims abstract description 12
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 12
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000005052 trichlorosilane Substances 0.000 claims abstract description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910000077 silane Inorganic materials 0.000 claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 42
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 28
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 22
- 238000006243 chemical reaction Methods 0.000 claims description 22
- 229910052697 platinum Inorganic materials 0.000 claims description 21
- 229910052763 palladium Inorganic materials 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 10
- 150000001875 compounds Chemical group 0.000 claims description 10
- ZBRJXVVKPBZPAN-UHFFFAOYSA-L nickel(2+);triphenylphosphane;dichloride Chemical compound [Cl-].[Cl-].[Ni+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 ZBRJXVVKPBZPAN-UHFFFAOYSA-L 0.000 claims description 9
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims description 9
- 125000001309 chloro group Chemical group Cl* 0.000 description 72
- XMNYHTVOHRUIEH-UHFFFAOYSA-N dichloro-(dichloromethyl)-methylsilane Chemical compound C[Si](Cl)(Cl)C(Cl)Cl XMNYHTVOHRUIEH-UHFFFAOYSA-N 0.000 description 68
- RQURIFHGCYGDMN-UHFFFAOYSA-N dichloro-methyl-(trichloromethyl)silane Chemical compound C[Si](Cl)(Cl)C(Cl)(Cl)Cl RQURIFHGCYGDMN-UHFFFAOYSA-N 0.000 description 47
- 238000006722 reduction reaction Methods 0.000 description 37
- XJTUNBKAWATELL-UHFFFAOYSA-N dichloromethyl(trimethyl)silane Chemical compound C[Si](C)(C)C(Cl)Cl XJTUNBKAWATELL-UHFFFAOYSA-N 0.000 description 30
- OICVMMJHLFRGHF-UHFFFAOYSA-N chloro-(dichloromethyl)-dimethylsilane Chemical compound C[Si](C)(Cl)C(Cl)Cl OICVMMJHLFRGHF-UHFFFAOYSA-N 0.000 description 29
- JAYBZWYBCUJLNQ-UHFFFAOYSA-N dichloro-(chloromethyl)-methylsilane Chemical compound C[Si](Cl)(Cl)CCl JAYBZWYBCUJLNQ-UHFFFAOYSA-N 0.000 description 24
- 238000009835 boiling Methods 0.000 description 13
- 238000004817 gas chromatography Methods 0.000 description 13
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical class C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 12
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- ITKVLPYNJQOCPW-UHFFFAOYSA-N chloro-(chloromethyl)-dimethylsilane Chemical class C[Si](C)(Cl)CCl ITKVLPYNJQOCPW-UHFFFAOYSA-N 0.000 description 6
- OOCUOKHIVGWCTJ-UHFFFAOYSA-N chloromethyl(trimethyl)silane Chemical compound C[Si](C)(C)CCl OOCUOKHIVGWCTJ-UHFFFAOYSA-N 0.000 description 6
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 6
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 6
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical class CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 6
- 239000005051 trimethylchlorosilane Substances 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000006227 byproduct Substances 0.000 description 4
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 4
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical group Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 4
- 125000004772 dichloromethyl group Chemical group [H]C(Cl)(Cl)* 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 238000005660 chlorination reaction Methods 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- NWKBSEBOBPHMKL-UHFFFAOYSA-N dichloro(methyl)silane Chemical class C[SiH](Cl)Cl NWKBSEBOBPHMKL-UHFFFAOYSA-N 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229940050176 methyl chloride Drugs 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical class ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 240000004307 Citrus medica Species 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001348 alkyl chlorides Chemical class 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000003899 bactericide agent Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- MIHBEVRKYFBXIK-UHFFFAOYSA-N chloro-(2-chloroethyl)-dimethylsilane Chemical class C[Si](C)(Cl)CCCl MIHBEVRKYFBXIK-UHFFFAOYSA-N 0.000 description 1
- ZCJSXNPBZLWTCC-UHFFFAOYSA-N chloro-(chloromethyl)-methylsilane Chemical class C[SiH](Cl)CCl ZCJSXNPBZLWTCC-UHFFFAOYSA-N 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 150000005171 halobenzenes Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000002638 heterogeneous catalyst Substances 0.000 description 1
- 239000002815 homogeneous catalyst Substances 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- KYHNNWWCXIOTKC-UHFFFAOYSA-L nickel(2+);trimethylphosphane;dichloride Chemical compound Cl[Ni]Cl.CP(C)C.CP(C)C KYHNNWWCXIOTKC-UHFFFAOYSA-L 0.000 description 1
- 150000004045 organic chlorine compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- INJPZIBAJPTHAP-UHFFFAOYSA-N trichloro(2,2-dichloroethyl)silane Chemical compound ClC(Cl)C[Si](Cl)(Cl)Cl INJPZIBAJPTHAP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/14—Preparation thereof from optionally substituted halogenated silanes and hydrocarbons hydrosilylation reactions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/127—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions not affecting the linkages to the silicon atom
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
Claims (5)
- 금속 또는 금속 화합물의 촉매하에 다음 일반식(Ⅱ)의 실란 화합물을 트리클로로실란과 반응시키는 것으로 이루어진 수소가 한 개 또는 두 개 이상 치환된 일반식(I)의 실란 화합물의 제조방법:상기식에서, R1, R2및 R3는 각각 독립적으로 염소 또는 메틸기이며, Z 및 Z'은 각각 독립적으로 수소 또는 염소이다.
- 제1항에 있어서, 금속 또는 금속 화합물의 촉매가 비스(트리페닐포스핀)디클로로니켈, 디아세테이트팔라듐, 디클로로팔라듐, 염화백금산, 알루미나에 흡착된 백금, 활성탄에 흡착된 백금 중에서 선택되는 제조방법.
- 제1항에 있어서, 트리클로로실란이 일반식(Ⅱ)의 화합물에 대해 몰비로 2-40배로 사용되는 제조방법.
- 제1또는 2항에 있어서, 촉매가 일반식(Ⅱ)의 화합물에 대해 0.01-20몰%의 양으로 사용되는 제조방법.
- 제1항에 있어서, 반응 온도가 50-200℃인 제조방법.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950038120A KR0152579B1 (ko) | 1995-10-30 | 1995-10-30 | 탄소-염소 결합의 염소가 환원된 실란 화합물의 제조방법 |
US08/640,503 US5608097A (en) | 1995-10-30 | 1996-05-01 | Process for preparation of silane compounds of which chlorine atoms of C-C1 bonds have been reduced |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950038120A KR0152579B1 (ko) | 1995-10-30 | 1995-10-30 | 탄소-염소 결합의 염소가 환원된 실란 화합물의 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970021082A KR970021082A (ko) | 1997-05-28 |
KR0152579B1 true KR0152579B1 (ko) | 1998-10-15 |
Family
ID=19431957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950038120A Expired - Fee Related KR0152579B1 (ko) | 1995-10-30 | 1995-10-30 | 탄소-염소 결합의 염소가 환원된 실란 화합물의 제조방법 |
Country Status (2)
Country | Link |
---|---|
US (1) | US5608097A (ko) |
KR (1) | KR0152579B1 (ko) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4510136A (en) * | 1981-06-24 | 1985-04-09 | E. I. Du Pont De Nemours And Company | Fungicidal 1,2,4-triazole derivatives |
US4956486A (en) * | 1990-03-07 | 1990-09-11 | Dow Corning Corporation | Removal of organic chloride from phenylchlorosilanes |
DE4240717A1 (de) * | 1992-12-03 | 1994-06-09 | Wacker Chemie Gmbh | Verfahren zur Entfernung von wasserstoffhaltigen Silanen aus Mehtylchlorsilanen |
-
1995
- 1995-10-30 KR KR1019950038120A patent/KR0152579B1/ko not_active Expired - Fee Related
-
1996
- 1996-05-01 US US08/640,503 patent/US5608097A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5608097A (en) | 1997-03-04 |
KR970021082A (ko) | 1997-05-28 |
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Legal Events
Date | Code | Title | Description |
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PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19951030 |
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E701 | Decision to grant or registration of patent right | ||
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Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19980519 |
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PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 19980629 Patent event code: PR07011E01D |
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