KR0129428B1 - Semiconductor device for element isolation and manufacturing method thereof - Google Patents

Semiconductor device for element isolation and manufacturing method thereof

Info

Publication number
KR0129428B1
KR0129428B1 KR93026507A KR930026507A KR0129428B1 KR 0129428 B1 KR0129428 B1 KR 0129428B1 KR 93026507 A KR93026507 A KR 93026507A KR 930026507 A KR930026507 A KR 930026507A KR 0129428 B1 KR0129428 B1 KR 0129428B1
Authority
KR
South Korea
Prior art keywords
manufacturing
semiconductor device
element isolation
isolation
semiconductor
Prior art date
Application number
KR93026507A
Other languages
Korean (ko)
Other versions
KR940016812A (en
Inventor
Komori Shigeki
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of KR940016812A publication Critical patent/KR940016812A/en
Application granted granted Critical
Publication of KR0129428B1 publication Critical patent/KR0129428B1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/763Polycrystalline semiconductor regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Element Separation (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
KR93026507A 1992-01-17 1993-12-04 Semiconductor device for element isolation and manufacturing method thereof KR0129428B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP656792 1992-01-17
JP92-326457 1992-12-07
JP04326457A JP3092834B2 (en) 1992-01-17 1992-12-07 Semiconductor device for element isolation and method of manufacturing the same

Publications (2)

Publication Number Publication Date
KR940016812A KR940016812A (en) 1994-07-25
KR0129428B1 true KR0129428B1 (en) 1998-04-06

Family

ID=11641917

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1019920025292A KR960013780B1 (en) 1992-01-17 1992-12-23 Semiconductor device and the manufacturing method of device isolation
KR93026507A KR0129428B1 (en) 1992-01-17 1993-12-04 Semiconductor device for element isolation and manufacturing method thereof

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1019920025292A KR960013780B1 (en) 1992-01-17 1992-12-23 Semiconductor device and the manufacturing method of device isolation

Country Status (2)

Country Link
JP (1) JP3092834B2 (en)
KR (2) KR960013780B1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100474591B1 (en) * 2002-04-23 2005-03-08 주식회사 하이닉스반도체 Method for fabricating dram cell transistor having trench isolation structure
JP5616720B2 (en) 2010-08-30 2014-10-29 セイコーインスツル株式会社 Semiconductor device and manufacturing method thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05144933A (en) * 1991-11-19 1993-06-11 Hitachi Ltd Semiconductor device and its manufacture

Also Published As

Publication number Publication date
KR930017147A (en) 1993-08-30
JPH05259270A (en) 1993-10-08
JP3092834B2 (en) 2000-09-25
KR960013780B1 (en) 1996-10-10
KR940016812A (en) 1994-07-25

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20071026

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee