KR0124007Y1 - Exposure plate structure for eliminating dag of panel - Google Patents

Abstract

The present invention relates to an exposure stand face plate structure for removing a dag of a panel, wherein the panel 20 is provided in an exposure stand 50 including a light source unit 30 and a face plate 40 so as to expose an inner circumferential surface of the panel 20. The transparent member 60 is formed around the opening 41 of the face plate 40 to allow the light to pass through. The dag applied to the actual surface and the edge of the panel 20 is easily removed. It is to be done.

Description

Exposed table faceplate structure for panel dag removal

1 is a perspective view of a conventional faceplate used to expose a panel.

Figure 2 is a perspective view showing the face plate structure of the present invention.

3 is a cross-sectional view taken along the line AA ′ of FIG. 2.

Figure 4 is an operating state diagram showing performing the exposure by applying the face plate according to the present invention.

* Explanation of symbols for main parts of the drawings

20 panel 30 light source

40: face plate 41: opening

42: coupling groove 50: exposure table

60: seeing member 61: projection

The present invention relates to an exposure stage for exposing to a panel used in a CRT, and more particularly to an exposure stage for removing a dag of a real surface and an edge except for an effective surface of a panel applied during a screen process of the panel. It relates to a face plate structure.

In general, the CRT consists of various parts, among which the front panel of the CRT is equipped with a panel. This panel is completed through several processes, and there is a screen process for forming a three-color fluorescent film of the screen portion of the CRT. This screen process can be divided into a black coating process (abbreviated as BC) and a screen coating (SCREEN COATING).

The BC process is a process that is applied to the inner surface of a panel of antireflective black paint to obtain a clear image by absorbing unnecessary light emission only between scattering electrons generated between phosphor stripes and absorbing external light to clarify the contrast ratio of bright and dark areas. In addition, the SC process sequentially applies three-color phosphors (BLUE, GREEN, RED) representing colors to the holes between the formed BC stripes, and on top of them, an organic resin for preventing damage to the phosphor particles by aluminum and improving the specularity of aluminum. It is a process of apply | coating a film | membrane.

In the conventional method of performing the BC process, first, a resist liquid is applied to the inner circumferential surface of the panel, the effective surface of the inner circumferential surface is exposed, and then the resist liquid is developed, and then a dag is applied, followed by a sulfuric acid (SULFAMIN ACID). ) And the dag was developed. However, when performing the exposure operation, the panel to be exposed is first placed on the face plate 10 as shown in FIG. 1 of the accompanying drawings, and the lower part is exposed to light by a light source. At this time, the face plate 10 is formed in the center to the opening 11 of a predetermined size to receive the light of the light source. The opening 11 was intended to reach only the effective surface of the inner circumferential surface of the panel when passing through the light of the light source and shot on the inner circumferential surface of the panel. Therefore, the exposure process is not performed on the real surface and the edge part of a panel. Thus, by applying a resist solution and a dag and rotating the panel for even distribution of the applied liquid of the panel by a separate machine, the applied liquid is applied to the effective surface of the panel as well as the actual surface and the edge portion. Therefore, when the dag is applied and then the sulfuric acid is added and the developing operation is performed, the resist liquid and the stripe of the exposed portion are separated and removed, but remain on the actual surface and the edge of the panel as it is. Therefore, when the next process is performed, the process of removing various liquids on the surface and the edge of the panel must be passed again, thereby increasing the number of labors and increasing the manufacturing cost accordingly.

Therefore, the present invention was devised to solve the above problems, and by changing the structure of the face plate used during the exposure of the panel to be exposed to the actual surface and the edge portion of the panel to remove the various liquids attached to the actual surface and the edge portion It is an object of the present invention to provide a method and apparatus for enabling the same.

The present invention for achieving the above object is characterized in that the transparent member is formed on the inner circumferential surface of the panel around the opening of the face plate used in the exposure process.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

The present invention, in the exposure table 50 composed of the light source unit 30 and the face plate 40 to expose the inner peripheral surface of the panel 20, the opening 41 of the face plate 40 can be placed on the panel 20 Peripheral member 60 is formed of a glass member through which light can pass.

As shown in FIG. 3, the see-through member 60 has protrusions 61 formed at one side thereof, and a coupling groove 42 is formed at the corresponding face plate 40 to be bound to each other.

The operation and effects of the present invention configured as described above are as follows.

In performing the BC process of the panel 20, first, a resist liquid is applied to the inner circumferential surface of the panel 20, and then the panel 20 is rotated, followed by exposure treatment, wherein the present invention is illustrated in the accompanying drawings. As shown in FIG. 4, the transparent member 60 is formed around the opening 41 of the face plate 40 so that the light emitted from the light source unit 30 is opened as shown in FIG. 4. 41, as well as through the see-through member 60 is able to shoot up to the effective surface (B) and the actual surface (C) and the edge (D) of the inner peripheral surface of the panel 20 placed on the face plate 40. Then, the resist solution is developed, the dag is applied, the sulfuric acid is added, and the dag is developed. Then, the dag of the area where the resist solution is applied is detached from the applied dag on the effective surface B of the panel 20. Moreover, the dag of the real surface C and the edge part D of the panel 20 is also detached simultaneously. Therefore, it is not necessary to perform a separate dag removal process.

As described above, the present invention is provided with a see-through member on the face plate of the exposure table, so that the unnecessary dag applied to the inner surface can be easily removed by performing exposure over the entire surface of the panel.

Claims (3)

In the exposure table 50 which consists of the light source part 30 and the face plate 40 so that the inner peripheral surface of the panel 20 may be exposed, around the opening 41 of the face plate 40 on which the panel 20 may be placed. Face plate structure for removing the dag of the pattern, characterized in that the see-through member 60 through which light can pass. The panel according to claim 1, wherein the see-through member (60) is made of glass material. According to claim 1, wherein the projection member 60 is a projection 61 is formed on one side as shown in Figure 3 and the corresponding face plate 40 is formed in the coupling groove 42 is to be bound to each other An exposure table face plate structure for removing the dag of the panel.