KR0115169Y1 - Plasma cvd apparatus - Google Patents
Plasma cvd apparatus Download PDFInfo
- Publication number
- KR0115169Y1 KR0115169Y1 KR91014239U KR910014239U KR0115169Y1 KR 0115169 Y1 KR0115169 Y1 KR 0115169Y1 KR 91014239 U KR91014239 U KR 91014239U KR 910014239 U KR910014239 U KR 910014239U KR 0115169 Y1 KR0115169 Y1 KR 0115169Y1
- Authority
- KR
- South Korea
- Prior art keywords
- plasma cvd
- cvd apparatus
- plasma
- cvd
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR91014239U KR0115169Y1 (en) | 1991-08-31 | 1991-08-31 | Plasma cvd apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR91014239U KR0115169Y1 (en) | 1991-08-31 | 1991-08-31 | Plasma cvd apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
KR0115169Y1 true KR0115169Y1 (en) | 1998-04-15 |
Family
ID=19318736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR91014239U KR0115169Y1 (en) | 1991-08-31 | 1991-08-31 | Plasma cvd apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0115169Y1 (en) |
-
1991
- 1991-08-31 KR KR91014239U patent/KR0115169Y1/en not_active IP Right Cessation
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Legal Events
Date | Code | Title | Description |
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A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20010912 Year of fee payment: 5 |
|
LAPS | Lapse due to unpaid annual fee |