KR0115169Y1 - Plasma cvd apparatus - Google Patents

Plasma cvd apparatus Download PDF

Info

Publication number
KR0115169Y1
KR0115169Y1 KR91014239U KR910014239U KR0115169Y1 KR 0115169 Y1 KR0115169 Y1 KR 0115169Y1 KR 91014239 U KR91014239 U KR 91014239U KR 910014239 U KR910014239 U KR 910014239U KR 0115169 Y1 KR0115169 Y1 KR 0115169Y1
Authority
KR
South Korea
Prior art keywords
plasma cvd
cvd apparatus
plasma
cvd
Prior art date
Application number
KR91014239U
Other languages
Korean (ko)
Inventor
Jong-Up Shin
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Priority to KR91014239U priority Critical patent/KR0115169Y1/en
Application granted granted Critical
Publication of KR0115169Y1 publication Critical patent/KR0115169Y1/en

Links

KR91014239U 1991-08-31 1991-08-31 Plasma cvd apparatus KR0115169Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR91014239U KR0115169Y1 (en) 1991-08-31 1991-08-31 Plasma cvd apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR91014239U KR0115169Y1 (en) 1991-08-31 1991-08-31 Plasma cvd apparatus

Publications (1)

Publication Number Publication Date
KR0115169Y1 true KR0115169Y1 (en) 1998-04-15

Family

ID=19318736

Family Applications (1)

Application Number Title Priority Date Filing Date
KR91014239U KR0115169Y1 (en) 1991-08-31 1991-08-31 Plasma cvd apparatus

Country Status (1)

Country Link
KR (1) KR0115169Y1 (en)

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