JPWO2025094282A1 - - Google Patents
Info
- Publication number
- JPWO2025094282A1 JPWO2025094282A1 JP2025554397A JP2025554397A JPWO2025094282A1 JP WO2025094282 A1 JPWO2025094282 A1 JP WO2025094282A1 JP 2025554397 A JP2025554397 A JP 2025554397A JP 2025554397 A JP2025554397 A JP 2025554397A JP WO2025094282 A1 JPWO2025094282 A1 JP WO2025094282A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/039303 WO2025094282A1 (ja) | 2023-10-31 | 2023-10-31 | 感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2025094282A1 true JPWO2025094282A1 (https=) | 2025-05-08 |
| JPWO2025094282A5 JPWO2025094282A5 (https=) | 2026-03-16 |
Family
ID=95582518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025554397A Pending JPWO2025094282A1 (https=) | 2023-10-31 | 2023-10-31 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP4675350A1 (https=) |
| JP (1) | JPWO2025094282A1 (https=) |
| KR (1) | KR20260011754A (https=) |
| CN (1) | CN120981769A (https=) |
| WO (1) | WO2025094282A1 (https=) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013195712A (ja) | 2012-03-19 | 2013-09-30 | Hitachi Chemical Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP5904890B2 (ja) * | 2012-07-02 | 2016-04-20 | 富士フイルム株式会社 | 感光性転写材料、硬化膜の製造方法、有機ｅｌ表示装置の製造方法、液晶表示装置の製造方法および静電容量型入力装置の製造方法 |
| WO2021221025A1 (ja) * | 2020-04-30 | 2021-11-04 | 富士フイルム株式会社 | 構造体の製造方法、及び、構造体 |
| JP7743301B2 (ja) * | 2021-12-27 | 2025-09-24 | 富士フイルム株式会社 | 蒸着マスク製造用感光性転写材料、及び、蒸着マスクの製造方法 |
| JP2023097347A (ja) * | 2021-12-27 | 2023-07-07 | 富士フイルム株式会社 | 蒸着マスクの製造方法 |
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2023
- 2023-10-31 WO PCT/JP2023/039303 patent/WO2025094282A1/ja active Pending
- 2023-10-31 CN CN202380096538.4A patent/CN120981769A/zh active Pending
- 2023-10-31 EP EP23957610.1A patent/EP4675350A1/en active Pending
- 2023-10-31 JP JP2025554397A patent/JPWO2025094282A1/ja active Pending
- 2023-10-31 KR KR1020257041999A patent/KR20260011754A/ko active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2025094282A1 (ja) | 2025-05-08 |
| EP4675350A1 (en) | 2026-01-07 |
| KR20260011754A (ko) | 2026-01-23 |
| CN120981769A (zh) | 2025-11-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20251211 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20251211 |