JPWO2024210026A1 - - Google Patents
Info
- Publication number
- JPWO2024210026A1 JPWO2024210026A1 JP2025512521A JP2025512521A JPWO2024210026A1 JP WO2024210026 A1 JPWO2024210026 A1 JP WO2024210026A1 JP 2025512521 A JP2025512521 A JP 2025512521A JP 2025512521 A JP2025512521 A JP 2025512521A JP WO2024210026 A1 JPWO2024210026 A1 JP WO2024210026A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0093—Working by laser beam, e.g. welding, cutting or boring combined with mechanical machining or metal-working covered by other subclasses than B23K
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/04—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
- H10P90/12—Preparing bulk and homogeneous wafers
- H10P90/123—Preparing bulk and homogeneous wafers by grinding or lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Laser Beam Processing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023062838 | 2023-04-07 | ||
| PCT/JP2024/012499 WO2024210026A1 (ja) | 2023-04-07 | 2024-03-27 | 基板処理方法および基板処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024210026A1 true JPWO2024210026A1 (https=) | 2024-10-10 |
| JPWO2024210026A5 JPWO2024210026A5 (https=) | 2025-12-15 |
Family
ID=92971708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025512521A Pending JPWO2024210026A1 (https=) | 2023-04-07 | 2024-03-27 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2024210026A1 (https=) |
| KR (1) | KR20260002841A (https=) |
| CN (1) | CN120917546A (https=) |
| TW (1) | TW202443677A (https=) |
| WO (1) | WO2024210026A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119237912B (zh) * | 2024-12-05 | 2025-02-28 | 深圳爱仕特科技有限公司 | 一种能够对芯片晶圆精准定位的切割系统及其切割方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4986664A (en) * | 1984-02-07 | 1991-01-22 | International Technical Associates | System and process for controlled removal of material to produce a desired surface contour |
| US5953578A (en) * | 1998-09-08 | 1999-09-14 | Winbond Electronics Corp. | Global planarization method using plasma etching |
| JP3943869B2 (ja) | 2000-06-29 | 2007-07-11 | 信越半導体株式会社 | 半導体ウエーハの加工方法および半導体ウエーハ |
| JP6849382B2 (ja) * | 2016-10-17 | 2021-03-24 | 矢崎総業株式会社 | レーザ加工方法及びレーザ加工装置 |
| US20220184743A1 (en) * | 2019-04-05 | 2022-06-16 | Tokyo Electron Limited | Substrate processing system and substrate processing method |
| WO2022054611A1 (ja) * | 2020-09-09 | 2022-03-17 | 東京エレクトロン株式会社 | レーザー加工装置、及びレーザー加工方法 |
| TWI903014B (zh) * | 2021-01-21 | 2025-11-01 | 日商東京威力科創股份有限公司 | 基板加工方法及基板加工裝置 |
| JP7596191B2 (ja) * | 2021-03-24 | 2024-12-09 | 株式会社東京精密 | シリコンウエハの表面改質方法 |
| JP7798582B2 (ja) * | 2022-01-18 | 2026-01-14 | 株式会社東京精密 | 半導体ウエハ表面の平坦化装置 |
-
2024
- 2024-03-27 JP JP2025512521A patent/JPWO2024210026A1/ja active Pending
- 2024-03-27 CN CN202480021451.5A patent/CN120917546A/zh active Pending
- 2024-03-27 KR KR1020257037010A patent/KR20260002841A/ko active Pending
- 2024-03-27 WO PCT/JP2024/012499 patent/WO2024210026A1/ja not_active Ceased
- 2024-03-28 TW TW113111579A patent/TW202443677A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024210026A1 (ja) | 2024-10-10 |
| CN120917546A (zh) | 2025-11-07 |
| KR20260002841A (ko) | 2026-01-06 |
| TW202443677A (zh) | 2024-11-01 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250924 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250924 |