JPWO2024203408A1 - - Google Patents
Info
- Publication number
- JPWO2024203408A1 JPWO2024203408A1 JP2025510479A JP2025510479A JPWO2024203408A1 JP WO2024203408 A1 JPWO2024203408 A1 JP WO2024203408A1 JP 2025510479 A JP2025510479 A JP 2025510479A JP 2025510479 A JP2025510479 A JP 2025510479A JP WO2024203408 A1 JPWO2024203408 A1 JP WO2024203408A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/32—Wound capacitors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/012—Form of non-self-supporting electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
- H01G4/015—Special provisions for self-healing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/14—Organic dielectrics
- H01G4/18—Organic dielectrics of synthetic material, e.g. derivatives of cellulose
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023054323 | 2023-03-29 | ||
| JP2023054323 | 2023-03-29 | ||
| PCT/JP2024/010098 WO2024203408A1 (ja) | 2023-03-29 | 2024-03-14 | 金属化フィルムとその製造方法及びフィルムコンデンサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024203408A1 true JPWO2024203408A1 (https=) | 2024-10-03 |
| JP7793281B2 JP7793281B2 (ja) | 2026-01-05 |
Family
ID=92904691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025510479A Active JP7793281B2 (ja) | 2023-03-29 | 2024-03-14 | 金属化フィルムとその製造方法及びフィルムコンデンサ |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7793281B2 (https=) |
| CN (1) | CN119998904A (https=) |
| DE (1) | DE112024000150T5 (https=) |
| WO (1) | WO2024203408A1 (https=) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5579867A (en) * | 1978-12-11 | 1980-06-16 | Honshu Paper Co Ltd | Vacuum evaporation method |
| WO1987003419A1 (fr) * | 1985-11-30 | 1987-06-04 | Honshu Seishi Kabushiki Kaisha | Materiau de base metallise par du zinc pour condensateurs metallises et procede de production |
| JP2001279425A (ja) * | 2000-03-30 | 2001-10-10 | Matsushita Electric Ind Co Ltd | オイルマスキング装置およびこれを備えた真空蒸着器 |
-
2024
- 2024-03-14 WO PCT/JP2024/010098 patent/WO2024203408A1/ja not_active Ceased
- 2024-03-14 DE DE112024000150.5T patent/DE112024000150T5/de active Pending
- 2024-03-14 JP JP2025510479A patent/JP7793281B2/ja active Active
- 2024-03-14 CN CN202480004492.3A patent/CN119998904A/zh active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5579867A (en) * | 1978-12-11 | 1980-06-16 | Honshu Paper Co Ltd | Vacuum evaporation method |
| WO1987003419A1 (fr) * | 1985-11-30 | 1987-06-04 | Honshu Seishi Kabushiki Kaisha | Materiau de base metallise par du zinc pour condensateurs metallises et procede de production |
| JP2001279425A (ja) * | 2000-03-30 | 2001-10-10 | Matsushita Electric Ind Co Ltd | オイルマスキング装置およびこれを備えた真空蒸着器 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7793281B2 (ja) | 2026-01-05 |
| CN119998904A (zh) | 2025-05-13 |
| DE112024000150T5 (de) | 2025-06-18 |
| WO2024203408A1 (ja) | 2024-10-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
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| AA64 | Notification of invalidation of claim of internal priority (with term) |
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| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
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| A61 | First payment of annual fees (during grant procedure) |
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| R150 | Certificate of patent or registration of utility model |
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