JPWO2024122346A1 - - Google Patents
Info
- Publication number
- JPWO2024122346A1 JPWO2024122346A1 JP2024562674A JP2024562674A JPWO2024122346A1 JP WO2024122346 A1 JPWO2024122346 A1 JP WO2024122346A1 JP 2024562674 A JP2024562674 A JP 2024562674A JP 2024562674 A JP2024562674 A JP 2024562674A JP WO2024122346 A1 JPWO2024122346 A1 JP WO2024122346A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022195716 | 2022-12-07 | ||
| PCT/JP2023/042018 WO2024122346A1 (ja) | 2022-12-07 | 2023-11-22 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024122346A1 true JPWO2024122346A1 (https=) | 2024-06-13 |
Family
ID=91379252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024562674A Pending JPWO2024122346A1 (https=) | 2022-12-07 | 2023-11-22 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2024122346A1 (https=) |
| TW (1) | TW202437013A (https=) |
| WO (1) | WO2024122346A1 (https=) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4306069A1 (de) * | 1993-03-01 | 1994-09-08 | Basf Ag | Strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen mit verbessertem Kontrast |
| JP2000298345A (ja) * | 1999-04-14 | 2000-10-24 | Toray Ind Inc | ポジ型感放射線性組成物 |
| JP6097611B2 (ja) * | 2013-03-25 | 2017-03-15 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
-
2023
- 2023-11-22 JP JP2024562674A patent/JPWO2024122346A1/ja active Pending
- 2023-11-22 WO PCT/JP2023/042018 patent/WO2024122346A1/ja not_active Ceased
- 2023-12-05 TW TW112147161A patent/TW202437013A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024122346A1 (ja) | 2024-06-13 |
| TW202437013A (zh) | 2024-09-16 |