JPWO2023218876A1 - - Google Patents

Info

Publication number
JPWO2023218876A1
JPWO2023218876A1 JP2024520328A JP2024520328A JPWO2023218876A1 JP WO2023218876 A1 JPWO2023218876 A1 JP WO2023218876A1 JP 2024520328 A JP2024520328 A JP 2024520328A JP 2024520328 A JP2024520328 A JP 2024520328A JP WO2023218876 A1 JPWO2023218876 A1 JP WO2023218876A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024520328A
Other languages
Japanese (ja)
Other versions
JPWO2023218876A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023218876A1 publication Critical patent/JPWO2023218876A1/ja
Publication of JPWO2023218876A5 publication Critical patent/JPWO2023218876A5/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2024520328A 2022-05-13 2023-04-18 Pending JPWO2023218876A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022079629 2022-05-13
PCT/JP2023/015488 WO2023218876A1 (ja) 2022-05-13 2023-04-18 アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物

Publications (2)

Publication Number Publication Date
JPWO2023218876A1 true JPWO2023218876A1 (https=) 2023-11-16
JPWO2023218876A5 JPWO2023218876A5 (https=) 2025-01-10

Family

ID=88730271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024520328A Pending JPWO2023218876A1 (https=) 2022-05-13 2023-04-18

Country Status (2)

Country Link
JP (1) JPWO2023218876A1 (https=)
WO (1) WO2023218876A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118440295B (zh) * 2024-05-28 2025-05-27 广东三求光固材料股份有限公司 不饱和二元酸改性的碱溶性环氧丙烯酸树脂及其制备方法和应用

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001053890A1 (fr) * 2000-01-17 2001-07-26 Showa Highpolymer Co., Ltd. Composition de resine photosensible
WO2009025190A1 (ja) * 2007-08-21 2009-02-26 Nippon Kayaku Kabushiki Kaisha 反応性カルボキシレート化合物、それを用いた活性エネルギー線硬化型樹脂組成物、およびその用途
JP2009116110A (ja) * 2007-11-07 2009-05-28 Taiyo Ink Mfg Ltd 光硬化性樹脂組成物及びその硬化物パターン、並びに該硬化物パターンを具備するプリント配線板
JP2012159657A (ja) * 2011-01-31 2012-08-23 Asahi Kasei E-Materials Corp 光硬化型樹脂組成物及びそれを用いたパターン形成された基材の製造方法、並びに該基材を備える電子部品
WO2022107508A1 (ja) * 2020-11-19 2022-05-27 Dic株式会社 酸基を有する(メタ)アクリレート樹脂、硬化性樹脂組成物、硬化物、絶縁材料及びレジスト部材

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001053890A1 (fr) * 2000-01-17 2001-07-26 Showa Highpolymer Co., Ltd. Composition de resine photosensible
WO2009025190A1 (ja) * 2007-08-21 2009-02-26 Nippon Kayaku Kabushiki Kaisha 反応性カルボキシレート化合物、それを用いた活性エネルギー線硬化型樹脂組成物、およびその用途
JP2009116110A (ja) * 2007-11-07 2009-05-28 Taiyo Ink Mfg Ltd 光硬化性樹脂組成物及びその硬化物パターン、並びに該硬化物パターンを具備するプリント配線板
JP2012159657A (ja) * 2011-01-31 2012-08-23 Asahi Kasei E-Materials Corp 光硬化型樹脂組成物及びそれを用いたパターン形成された基材の製造方法、並びに該基材を備える電子部品
WO2022107508A1 (ja) * 2020-11-19 2022-05-27 Dic株式会社 酸基を有する(メタ)アクリレート樹脂、硬化性樹脂組成物、硬化物、絶縁材料及びレジスト部材

Also Published As

Publication number Publication date
WO2023218876A1 (ja) 2023-11-16

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