JPWO2023210378A1 - - Google Patents
Info
- Publication number
- JPWO2023210378A1 JPWO2023210378A1 JP2024517982A JP2024517982A JPWO2023210378A1 JP WO2023210378 A1 JPWO2023210378 A1 JP WO2023210378A1 JP 2024517982 A JP2024517982 A JP 2024517982A JP 2024517982 A JP2024517982 A JP 2024517982A JP WO2023210378 A1 JPWO2023210378 A1 JP WO2023210378A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Combustion & Propulsion (AREA)
- Materials Engineering (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022074712 | 2022-04-28 | ||
PCT/JP2023/014916 WO2023210378A1 (ja) | 2022-04-28 | 2023-04-12 | 化合物、組成物、表面処理剤、物品の製造方法、及び物品 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2023210378A1 true JPWO2023210378A1 (enrdf_load_stackoverflow) | 2023-11-02 |
Family
ID=88518458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2024517982A Pending JPWO2023210378A1 (enrdf_load_stackoverflow) | 2022-04-28 | 2023-04-12 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPWO2023210378A1 (enrdf_load_stackoverflow) |
WO (1) | WO2023210378A1 (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024214748A1 (ja) * | 2023-04-10 | 2024-10-17 | ダイキン工業株式会社 | シラン化合物 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06267731A (ja) * | 1993-03-12 | 1994-09-22 | Daikin Ind Ltd | 表面改質された磁性粒子、その製造方法及びそれを含有する磁性流体 |
JP2006131509A (ja) * | 2004-11-02 | 2006-05-25 | Sharp Corp | シラン化ペンタセン前駆化合物の製造方法及びそれを用いた有機薄膜 |
WO2014111980A1 (ja) * | 2013-01-16 | 2014-07-24 | 独立行政法人科学技術振興機構 | 自己組織化膜形成材料として有用なトリプチセン誘導体、その製造方法、それを用いた膜、及びその製造方法 |
WO2019151462A1 (ja) * | 2018-02-02 | 2019-08-08 | 株式会社シード | 重合性トリプチセン誘導体化合物を構成成分として含む高分子化合物 |
WO2021060042A1 (ja) * | 2019-09-25 | 2021-04-01 | 富士フイルム株式会社 | 化合物、組成物、膜、構造体及び電子デバイス |
WO2023282114A1 (ja) * | 2021-07-09 | 2023-01-12 | 東京エレクトロン株式会社 | パターン形成方法、及びプラズマ処理方法 |
-
2023
- 2023-04-12 JP JP2024517982A patent/JPWO2023210378A1/ja active Pending
- 2023-04-12 WO PCT/JP2023/014916 patent/WO2023210378A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2023210378A1 (ja) | 2023-11-02 |