JPWO2023190061A5 - - Google Patents
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- JPWO2023190061A5 JPWO2023190061A5 JP2024512286A JP2024512286A JPWO2023190061A5 JP WO2023190061 A5 JPWO2023190061 A5 JP WO2023190061A5 JP 2024512286 A JP2024512286 A JP 2024512286A JP 2024512286 A JP2024512286 A JP 2024512286A JP WO2023190061 A5 JPWO2023190061 A5 JP WO2023190061A5
- Authority
- JP
- Japan
- Prior art keywords
- formula
- group
- resin composition
- composition according
- repeating unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011342 resin composition Substances 0.000 claims 13
- 239000004642 Polyimide Substances 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 7
- 229920001721 polyimide Polymers 0.000 claims 7
- 239000002243 precursor Substances 0.000 claims 7
- 150000001875 compounds Chemical class 0.000 claims 6
- 125000000962 organic group Chemical group 0.000 claims 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 4
- 239000010410 layer Substances 0.000 claims 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical group C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims 1
- 230000001588 bifunctional effect Effects 0.000 claims 1
- 239000004202 carbamide Substances 0.000 claims 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000011229 interlayer Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022053206 | 2022-03-29 | ||
| PCT/JP2023/011590 WO2023190061A1 (ja) | 2022-03-29 | 2023-03-23 | 樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023190061A1 JPWO2023190061A1 (enrdf_load_stackoverflow) | 2023-10-05 |
| JPWO2023190061A5 true JPWO2023190061A5 (enrdf_load_stackoverflow) | 2024-12-13 |
Family
ID=88202093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024512286A Pending JPWO2023190061A1 (enrdf_load_stackoverflow) | 2022-03-29 | 2023-03-23 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2023190061A1 (enrdf_load_stackoverflow) |
| KR (1) | KR20240157719A (enrdf_load_stackoverflow) |
| TW (1) | TW202349117A (enrdf_load_stackoverflow) |
| WO (1) | WO2023190061A1 (enrdf_load_stackoverflow) |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2524705B2 (ja) * | 1986-06-10 | 1996-08-14 | 旭化成工業株式会社 | 感光性組成物 |
| JP2826940B2 (ja) * | 1992-07-22 | 1998-11-18 | 旭化成工業株式会社 | ｉ線露光用感光性組成物 |
| JP2826978B2 (ja) * | 1995-05-22 | 1998-11-18 | 旭化成工業株式会社 | ｉ線露光用組成物 |
| JP6245180B2 (ja) * | 2012-12-21 | 2017-12-13 | 日立化成デュポンマイクロシステムズ株式会社 | ポリイミド前駆体樹脂組成物 |
| TWI634135B (zh) * | 2015-12-25 | 2018-09-01 | 日商富士軟片股份有限公司 | 樹脂、組成物、硬化膜、硬化膜的製造方法及半導體元件 |
| CN115185157A (zh) * | 2016-03-31 | 2022-10-14 | 旭化成株式会社 | 感光性树脂组合物、固化浮雕图案的制造方法和半导体装置 |
| CN113614130B (zh) * | 2019-03-22 | 2024-05-03 | 富士胶片株式会社 | 固化性树脂组合物、固化膜、层叠体、固化膜的制造方法及半导体器件 |
| KR102637928B1 (ko) * | 2019-03-27 | 2024-02-21 | 후지필름 가부시키가이샤 | 경화성 수지 조성물, 경화막, 적층체, 경화막의 제조 방법, 및, 반도체 디바이스 |
| WO2021020344A1 (ja) * | 2019-08-01 | 2021-02-04 | 東レ株式会社 | 感光性樹脂組成物、感光性シート、硬化膜、硬化膜の製造方法、層間絶縁膜および電子部品 |
| JP7588957B2 (ja) | 2020-01-30 | 2024-11-25 | 旭化成株式会社 | ネガ型感光性樹脂組成物、並びにこれを用いたポリイミド及び硬化レリーフパターンの製造方法 |
| JP7640227B2 (ja) * | 2020-01-30 | 2025-03-05 | 旭化成株式会社 | 感光性樹脂組成物、硬化レリーフパターン及びその製造方法 |
| JP7530736B2 (ja) * | 2020-04-20 | 2024-08-08 | 旭化成株式会社 | 感光性樹脂組成物、硬化レリーフパターンの製造方法、硬化レリーフパターン、半導体装置及び表示体装置 |
| KR102740154B1 (ko) * | 2020-08-26 | 2024-12-10 | 후지필름 가부시키가이샤 | 경화성 수지 조성물, 경화물, 적층체, 경화물의 제조 방법, 및, 반도체 디바이스 |
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2023
- 2023-03-23 KR KR1020247032415A patent/KR20240157719A/ko active Pending
- 2023-03-23 JP JP2024512286A patent/JPWO2023190061A1/ja active Pending
- 2023-03-23 WO PCT/JP2023/011590 patent/WO2023190061A1/ja active Application Filing
- 2023-03-25 TW TW112111323A patent/TW202349117A/zh unknown