JPWO2023166653A1 - - Google Patents
Info
- Publication number
- JPWO2023166653A1 JPWO2023166653A1 JP2023519145A JP2023519145A JPWO2023166653A1 JP WO2023166653 A1 JPWO2023166653 A1 JP WO2023166653A1 JP 2023519145 A JP2023519145 A JP 2023519145A JP 2023519145 A JP2023519145 A JP 2023519145A JP WO2023166653 A1 JPWO2023166653 A1 JP WO2023166653A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16J—PISTONS; CYLINDERS; SEALINGS
- F16J13/00—Covers or similar closure members for pressure vessels in general
- F16J13/02—Detachable closure members; Means for tightening closures
- F16J13/04—Detachable closure members; Means for tightening closures attached with a bridge member
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Pressure Vessels And Lids Thereof (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/009105 WO2023166653A1 (en) | 2022-03-03 | 2022-03-03 | Vacuum processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023166653A1 true JPWO2023166653A1 (en) | 2023-09-07 |
| JP7450119B2 JP7450119B2 (en) | 2024-03-14 |
Family
ID=87883269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023519145A Active JP7450119B2 (en) | 2022-03-03 | 2022-03-03 | Vacuum processing equipment |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7450119B2 (en) |
| WO (1) | WO2023166653A1 (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6224131Y2 (en) * | 1981-06-10 | 1987-06-19 | ||
| KR100512740B1 (en) | 2003-06-19 | 2005-09-07 | 삼성전자주식회사 | Reaction Apparatus |
| JP2011179531A (en) | 2010-02-26 | 2011-09-15 | Canon Anelva Corp | Lid opening/closing device and vacuum device |
| JP2012087923A (en) | 2010-10-15 | 2012-05-10 | Fukuhara Co Ltd | Vacuum chamber and method for holding vacuum |
| JP7360305B2 (en) | 2019-11-13 | 2023-10-12 | 株式会社日立ハイテク | Vacuum processing equipment |
-
2022
- 2022-03-03 WO PCT/JP2022/009105 patent/WO2023166653A1/en active Application Filing
- 2022-03-03 JP JP2023519145A patent/JP7450119B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP7450119B2 (en) | 2024-03-14 |
| WO2023166653A1 (en) | 2023-09-07 |
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