JPWO2023119790A1 - - Google Patents

Info

Publication number
JPWO2023119790A1
JPWO2023119790A1 JP2023569075A JP2023569075A JPWO2023119790A1 JP WO2023119790 A1 JPWO2023119790 A1 JP WO2023119790A1 JP 2023569075 A JP2023569075 A JP 2023569075A JP 2023569075 A JP2023569075 A JP 2023569075A JP WO2023119790 A1 JPWO2023119790 A1 JP WO2023119790A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023569075A
Other languages
Japanese (ja)
Other versions
JPWO2023119790A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023119790A1 publication Critical patent/JPWO2023119790A1/ja
Publication of JPWO2023119790A5 publication Critical patent/JPWO2023119790A5/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/16Optical objectives specially designed for the purposes specified below for use in conjunction with image converters or intensifiers, or for use with projectors, e.g. objectives for projection TV
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/18Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0804Catadioptric systems using two curved mirrors
    • G02B17/0816Catadioptric systems using two curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0836Catadioptric systems using more than three curved mirrors
    • G02B17/0848Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
JP2023569075A 2021-12-21 2022-10-04 Pending JPWO2023119790A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021207312 2021-12-21
PCT/JP2022/037159 WO2023119790A1 (ja) 2021-12-21 2022-10-04 光学系、画像投写装置および撮像装置

Publications (2)

Publication Number Publication Date
JPWO2023119790A1 true JPWO2023119790A1 (https=) 2023-06-29
JPWO2023119790A5 JPWO2023119790A5 (https=) 2024-09-02

Family

ID=86901911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023569075A Pending JPWO2023119790A1 (https=) 2021-12-21 2022-10-04

Country Status (5)

Country Link
US (1) US20240319485A1 (https=)
EP (1) EP4455756A4 (https=)
JP (1) JPWO2023119790A1 (https=)
CN (1) CN118435094A (https=)
WO (1) WO2023119790A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4065461B2 (ja) * 1996-02-15 2008-03-26 キヤノン株式会社 ズーム光学系及びそれを用いた撮像装置
JP4648690B2 (ja) * 2004-11-30 2011-03-09 オリンパス株式会社 光学系
JP6993251B2 (ja) 2018-02-01 2022-01-13 リコーインダストリアルソリューションズ株式会社 投射光学系および画像表示装置
JP2020024377A (ja) 2018-07-27 2020-02-13 セイコーエプソン株式会社 投写光学系および投写型画像表示装置
JP7124521B2 (ja) 2018-07-30 2022-08-24 セイコーエプソン株式会社 投写光学系および投写型画像表示装置
JP7148334B2 (ja) 2018-09-07 2022-10-05 リコーインダストリアルソリューションズ株式会社 投射光学系及び画像投射装置
JP7340789B2 (ja) * 2019-05-29 2023-09-08 パナソニックIpマネジメント株式会社 光学系、画像投写装置および撮像装置

Also Published As

Publication number Publication date
US20240319485A1 (en) 2024-09-26
EP4455756A4 (en) 2025-05-07
CN118435094A (zh) 2024-08-02
EP4455756A1 (en) 2024-10-30
WO2023119790A1 (ja) 2023-06-29

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240527

A621 Written request for application examination

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Effective date: 20250902