JPWO2023112330A1 - - Google Patents

Info

Publication number
JPWO2023112330A1
JPWO2023112330A1 JP2023567498A JP2023567498A JPWO2023112330A1 JP WO2023112330 A1 JPWO2023112330 A1 JP WO2023112330A1 JP 2023567498 A JP2023567498 A JP 2023567498A JP 2023567498 A JP2023567498 A JP 2023567498A JP WO2023112330 A1 JPWO2023112330 A1 JP WO2023112330A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023567498A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023112330A1 publication Critical patent/JPWO2023112330A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2023567498A 2021-12-17 2021-12-17 Pending JPWO2023112330A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/046825 WO2023112330A1 (en) 2021-12-17 2021-12-17 Si membrane structure used to produce pellicle, and method for producing pellicle

Publications (1)

Publication Number Publication Date
JPWO2023112330A1 true JPWO2023112330A1 (en) 2023-06-22

Family

ID=86773958

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023567498A Pending JPWO2023112330A1 (en) 2021-12-17 2021-12-17

Country Status (2)

Country Link
JP (1) JPWO2023112330A1 (en)
WO (1) WO2023112330A1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7456932B2 (en) * 2003-07-25 2008-11-25 Asml Netherlands B.V. Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
JP6753703B2 (en) * 2016-02-19 2020-09-09 エア・ウォーター株式会社 Method for manufacturing compound semiconductor substrate, pellicle film, and compound semiconductor substrate
KR101900720B1 (en) * 2017-11-10 2018-09-20 주식회사 에스앤에스텍 Pellicle for Extreme Ultraviolet(EUV) Lithography and Method for fabricating the same

Also Published As

Publication number Publication date
WO2023112330A1 (en) 2023-06-22

Similar Documents

Publication Publication Date Title
BR112023005462A2 (en)
BR112023012656A2 (en)
BR112021014123A2 (en)
BR112022009896A2 (en)
BR112023009656A2 (en)
BR112022024743A2 (en)
BR112023006729A2 (en)
BR102021018859A2 (en)
BR102021015500A2 (en)
BR112023008622A2 (en)
BR112023011738A2 (en)
BR112023016292A2 (en)
BR112023004146A2 (en)
JPWO2023112330A1 (en)
BR112023011610A2 (en)
BR112023011539A2 (en)
BR112023008976A2 (en)
BR102021020147A2 (en)
BR102021018926A2 (en)
BR102021018167A2 (en)
BR102021017576A2 (en)
BR102021016551A2 (en)
BR102021016375A2 (en)
BR102021016176A2 (en)
BR102021016200A2 (en)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240222

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240909

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241004