JPWO2023095769A1 - - Google Patents

Info

Publication number
JPWO2023095769A1
JPWO2023095769A1 JP2023563685A JP2023563685A JPWO2023095769A1 JP WO2023095769 A1 JPWO2023095769 A1 JP WO2023095769A1 JP 2023563685 A JP2023563685 A JP 2023563685A JP 2023563685 A JP2023563685 A JP 2023563685A JP WO2023095769 A1 JPWO2023095769 A1 JP WO2023095769A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023563685A
Other versions
JPWO2023095769A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023095769A1 publication Critical patent/JPWO2023095769A1/ja
Publication of JPWO2023095769A5 publication Critical patent/JPWO2023095769A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2023563685A 2021-11-24 2022-11-22 Pending JPWO2023095769A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021190273 2021-11-24
PCT/JP2022/043116 WO2023095769A1 (ja) 2021-11-24 2022-11-22 反射型フォトマスクブランク及び反射型フォトマスク

Publications (2)

Publication Number Publication Date
JPWO2023095769A1 true JPWO2023095769A1 (ja) 2023-06-01
JPWO2023095769A5 JPWO2023095769A5 (ja) 2024-06-13

Family

ID=86539435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023563685A Pending JPWO2023095769A1 (ja) 2021-11-24 2022-11-22

Country Status (2)

Country Link
JP (1) JPWO2023095769A1 (ja)
WO (1) WO2023095769A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240006594A (ko) 2022-07-05 2024-01-15 에이지씨 가부시키가이샤 반사형 마스크 블랭크, 반사형 마스크, 반사형 마스크 블랭크의 제조 방법 및 반사형 마스크의 제조 방법
WO2024029409A1 (ja) * 2022-08-03 2024-02-08 Ａｇｃ株式会社 反射型マスクブランク及び反射型マスク

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2019225737A1 (ja) * 2018-05-25 2021-06-10 Hoya株式会社 反射型マスクブランク、反射型マスク、並びに反射型マスク及び半導体装置の製造方法
JP7250511B2 (ja) * 2018-12-27 2023-04-03 Hoya株式会社 反射型マスクブランク、反射型マスク、及び半導体装置の製造方法
KR20240033148A (ko) * 2019-10-29 2024-03-12 에이지씨 가부시키가이샤 반사형 마스크 블랭크 및 반사형 마스크
JPWO2021132111A1 (ja) * 2019-12-27 2021-07-01

Also Published As

Publication number Publication date
WO2023095769A1 (ja) 2023-06-01
TW202336519A (zh) 2023-09-16

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Legal Events

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Effective date: 20240325

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