JPWO2023032083A1 - - Google Patents
Info
- Publication number
- JPWO2023032083A1 JPWO2023032083A1 JP2023544876A JP2023544876A JPWO2023032083A1 JP WO2023032083 A1 JPWO2023032083 A1 JP WO2023032083A1 JP 2023544876 A JP2023544876 A JP 2023544876A JP 2023544876 A JP2023544876 A JP 2023544876A JP WO2023032083 A1 JPWO2023032083 A1 JP WO2023032083A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2021/032145 WO2023032083A1 (ja) | 2021-09-01 | 2021-09-01 | 荷電粒子ビーム装置及び荷電粒子ビーム装置の調整方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2023032083A1 true JPWO2023032083A1 (ja) | 2023-03-09 |
Family
ID=85410929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023544876A Pending JPWO2023032083A1 (ja) | 2021-09-01 | 2021-09-01 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPWO2023032083A1 (ja) |
WO (1) | WO2023032083A1 (ja) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60136141A (ja) * | 1983-12-23 | 1985-07-19 | Hitachi Ltd | 荷電粒子照射装置 |
JPH06349435A (ja) * | 1993-06-04 | 1994-12-22 | Hitachi Ltd | 電子顕微鏡の自動可動絞り装置 |
JP5033314B2 (ja) * | 2004-09-29 | 2012-09-26 | 株式会社日立ハイテクノロジーズ | イオンビーム加工装置及び加工方法 |
JP4789260B2 (ja) * | 2006-08-23 | 2011-10-12 | エスアイアイ・ナノテクノロジー株式会社 | 荷電粒子ビーム装置及びアパーチャの軸調整方法 |
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2021
- 2021-09-01 JP JP2023544876A patent/JPWO2023032083A1/ja active Pending
- 2021-09-01 WO PCT/JP2021/032145 patent/WO2023032083A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2023032083A1 (ja) | 2023-03-09 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231211 |