JPWO2023032075A1 - - Google Patents

Info

Publication number
JPWO2023032075A1
JPWO2023032075A1 JP2023544869A JP2023544869A JPWO2023032075A1 JP WO2023032075 A1 JPWO2023032075 A1 JP WO2023032075A1 JP 2023544869 A JP2023544869 A JP 2023544869A JP 2023544869 A JP2023544869 A JP 2023544869A JP WO2023032075 A1 JPWO2023032075 A1 JP WO2023032075A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023544869A
Other versions
JPWO2023032075A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023032075A1 publication Critical patent/JPWO2023032075A1/ja
Publication of JPWO2023032075A5 publication Critical patent/JPWO2023032075A5/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2023544869A 2021-09-01 2021-09-01 Pending JPWO2023032075A1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/032121 WO2023032075A1 (ja) 2021-09-01 2021-09-01 荷電粒子ビーム装置

Publications (2)

Publication Number Publication Date
JPWO2023032075A1 true JPWO2023032075A1 (ja) 2023-03-09
JPWO2023032075A5 JPWO2023032075A5 (ja) 2024-03-13

Family

ID=85410988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023544869A Pending JPWO2023032075A1 (ja) 2021-09-01 2021-09-01

Country Status (2)

Country Link
JP (1) JPWO2023032075A1 (ja)
WO (1) WO2023032075A1 (ja)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05217536A (ja) * 1992-02-03 1993-08-27 Hitachi Ltd 電子顕微鏡の絞り装置
JP5509239B2 (ja) * 2004-09-29 2014-06-04 株式会社日立ハイテクノロジーズ イオンビーム加工装置及び加工方法
JP5378185B2 (ja) * 2009-12-08 2013-12-25 株式会社日立ハイテクノロジーズ 集束イオンビーム装置、及び集束イオンビーム加工方法

Also Published As

Publication number Publication date
WO2023032075A1 (ja) 2023-03-09

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20231207

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20231207