JPWO2022250145A1 - - Google Patents

Info

Publication number
JPWO2022250145A1
JPWO2022250145A1 JP2023524252A JP2023524252A JPWO2022250145A1 JP WO2022250145 A1 JPWO2022250145 A1 JP WO2022250145A1 JP 2023524252 A JP2023524252 A JP 2023524252A JP 2023524252 A JP2023524252 A JP 2023524252A JP WO2022250145 A1 JPWO2022250145 A1 JP WO2022250145A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023524252A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022250145A1 publication Critical patent/JPWO2022250145A1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32403—Treating multiple sides of workpieces, e.g. 3D workpieces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
JP2023524252A 2021-05-27 2022-05-27 Pending JPWO2022250145A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021089141 2021-05-27
PCT/JP2022/021765 WO2022250145A1 (ja) 2021-05-27 2022-05-27 プラズマ発生装置、プラズマ処理装置およびシームレスローラモールド用プラズマエッチング装置

Publications (1)

Publication Number Publication Date
JPWO2022250145A1 true JPWO2022250145A1 (ja) 2022-12-01

Family

ID=84228883

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023524252A Pending JPWO2022250145A1 (ja) 2021-05-27 2022-05-27

Country Status (5)

Country Link
US (1) US20240260165A1 (ja)
EP (1) EP4351281A1 (ja)
JP (1) JPWO2022250145A1 (ja)
CN (1) CN117397369A (ja)
WO (1) WO2022250145A1 (ja)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE788661A (fr) * 1971-10-05 1973-03-12 Lefe Corp Dispositif d'attaque d'une matiere par un gaz dans un champ electromagnetique
JP2000012296A (ja) * 1998-06-18 2000-01-14 Plasma System Corp プラズマ処理装置
JP4852189B2 (ja) * 1999-03-09 2012-01-11 株式会社日立製作所 プラズマ処理装置及びプラズマ処理方法
KR101220641B1 (ko) 2008-01-25 2013-01-10 아사히 가세이 가부시키가이샤 심리스 몰드의 제조 방법
JP2010131577A (ja) 2008-10-30 2010-06-17 Kanazawa Univ 微粒子の製造方法およびその製造装置
JP5564370B2 (ja) 2010-09-09 2014-07-30 株式会社日清製粉グループ本社 微粒子の製造装置および微粒子の製造方法
CN104359082A (zh) * 2014-10-17 2015-02-18 复旦大学 制造无机微结构led扩散器的方法

Also Published As

Publication number Publication date
EP4351281A1 (en) 2024-04-10
US20240260165A1 (en) 2024-08-01
WO2022250145A1 (ja) 2022-12-01
CN117397369A (zh) 2024-01-12

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