JPWO2022181432A1 - - Google Patents

Info

Publication number
JPWO2022181432A1
JPWO2022181432A1 JP2023502328A JP2023502328A JPWO2022181432A1 JP WO2022181432 A1 JPWO2022181432 A1 JP WO2022181432A1 JP 2023502328 A JP2023502328 A JP 2023502328A JP 2023502328 A JP2023502328 A JP 2023502328A JP WO2022181432 A1 JPWO2022181432 A1 JP WO2022181432A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023502328A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022181432A1 publication Critical patent/JPWO2022181432A1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • H01L21/2003Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
    • H01L21/2015Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate the substrate being of crystalline semiconductor material, e.g. lattice adaptation, heteroepitaxy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
    • H01L33/32Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Led Devices (AREA)
JP2023502328A 2021-02-25 2022-02-17 Pending JPWO2022181432A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021028698 2021-02-25
PCT/JP2022/006333 WO2022181432A1 (ja) 2021-02-25 2022-02-17 希土類添加窒化物半導体素子とその製造方法、半導体led、半導体レーザー

Publications (1)

Publication Number Publication Date
JPWO2022181432A1 true JPWO2022181432A1 (ja) 2022-09-01

Family

ID=83049344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023502328A Pending JPWO2022181432A1 (ja) 2021-02-25 2022-02-17

Country Status (2)

Country Link
JP (1) JPWO2022181432A1 (ja)
WO (1) WO2022181432A1 (ja)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4292600B2 (ja) * 1998-09-11 2009-07-08 ソニー株式会社 GaN系半導体発光素子およびその製造方法
JP5388041B2 (ja) * 2009-05-07 2014-01-15 国立大学法人大阪大学 赤色発光半導体素子および赤色発光半導体素子の製造方法
JP6450061B2 (ja) * 2011-12-07 2019-01-09 国立大学法人大阪大学 赤色発光半導体素子とその製造方法
WO2014030516A1 (ja) * 2012-08-23 2014-02-27 国立大学法人大阪大学 窒化物半導体素子用基板とその製造方法、および赤色発光半導体素子とその製造方法
JP6222684B2 (ja) * 2013-03-08 2017-11-01 国立大学法人大阪大学 赤色発光半導体素子とその製造方法
TWI716986B (zh) * 2018-09-03 2021-01-21 國立大學法人大阪大學 氮化物半導體裝置與其基板及添加稀土類元素之氮化物層的形成方法,以及紅色發光裝置

Also Published As

Publication number Publication date
WO2022181432A1 (ja) 2022-09-01

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