JPWO2022172736A1 - - Google Patents

Info

Publication number
JPWO2022172736A1
JPWO2022172736A1 JP2022581299A JP2022581299A JPWO2022172736A1 JP WO2022172736 A1 JPWO2022172736 A1 JP WO2022172736A1 JP 2022581299 A JP2022581299 A JP 2022581299A JP 2022581299 A JP2022581299 A JP 2022581299A JP WO2022172736 A1 JPWO2022172736 A1 JP WO2022172736A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022581299A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022172736A1 publication Critical patent/JPWO2022172736A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022581299A 2021-02-10 2022-01-24 Pending JPWO2022172736A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021019786 2021-02-10
PCT/JP2022/002365 WO2022172736A1 (ja) 2021-02-10 2022-01-24 感放射線性樹脂組成物及びパターン形成方法

Publications (1)

Publication Number Publication Date
JPWO2022172736A1 true JPWO2022172736A1 (ja) 2022-08-18

Family

ID=82838712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022581299A Pending JPWO2022172736A1 (ja) 2021-02-10 2022-01-24

Country Status (3)

Country Link
JP (1) JPWO2022172736A1 (ja)
TW (1) TW202233570A (ja)
WO (1) WO2022172736A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023048128A1 (ja) * 2021-09-24 2023-03-30 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、化合物及び酸発生剤

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5673670B2 (ja) * 2010-03-17 2015-02-18 Jsr株式会社 感放射線性樹脂組成物及びレジストパターン形成方法
WO2015174215A1 (ja) * 2014-05-12 2015-11-19 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス
JP7042613B2 (ja) * 2017-12-28 2022-03-28 東京応化工業株式会社 レジスト組成物、及びレジストパターン形成方法
JP7172975B2 (ja) * 2019-01-16 2022-11-16 信越化学工業株式会社 新規オニウム塩、化学増幅レジスト組成物、及びパターン形成方法

Also Published As

Publication number Publication date
WO2022172736A1 (ja) 2022-08-18
TW202233570A (zh) 2022-09-01

Similar Documents

Publication Publication Date Title
BR112023005462A2 (ja)
BR112023012656A2 (ja)
BR112021014123A2 (ja)
BR112022009896A2 (ja)
BR112023009656A2 (ja)
BR112022024743A2 (ja)
JPWO2022172736A1 (ja)
BR112023006729A2 (ja)
BR102021018859A2 (ja)
BR102021015500A2 (ja)
BR112023008622A2 (ja)
BR102020022030A2 (ja)
JPWO2023048128A1 (ja)
BR112023011738A2 (ja)
BR112023016292A2 (ja)
BR112023004146A2 (ja)
BR112023011610A2 (ja)
BR112023011539A2 (ja)
BR112023008976A2 (ja)
BR102021020147A2 (ja)
BR102021018926A2 (ja)
BR102021018167A2 (ja)
BR102021017576A2 (ja)
BR102021016837A2 (ja)
BR102021016551A2 (ja)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240430