JPWO2022153995A1 - - Google Patents

Info

Publication number
JPWO2022153995A1
JPWO2022153995A1 JP2022518876A JP2022518876A JPWO2022153995A1 JP WO2022153995 A1 JPWO2022153995 A1 JP WO2022153995A1 JP 2022518876 A JP2022518876 A JP 2022518876A JP 2022518876 A JP2022518876 A JP 2022518876A JP WO2022153995 A1 JPWO2022153995 A1 JP WO2022153995A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022518876A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022153995A1 publication Critical patent/JPWO2022153995A1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G39/00Compounds of molybdenum
    • C01G39/02Oxides; Hydroxides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00Compounds of tungsten
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • C25D5/56Electroplating of non-metallic surfaces of plastics

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
JP2022518876A 2021-01-14 2022-01-12 Pending JPWO2022153995A1 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021004119 2021-01-14
JP2021167851 2021-10-13
PCT/JP2022/000655 WO2022153995A1 (ja) 2021-01-14 2022-01-12 酸化還元反応により導電性を示す下地導電層用材料並びにそれを用いた製造プロセス、デバイス、めっき品、めっき品の製造方法及びコーティング液

Publications (1)

Publication Number Publication Date
JPWO2022153995A1 true JPWO2022153995A1 (ru) 2022-07-21

Family

ID=82446281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022518876A Pending JPWO2022153995A1 (ru) 2021-01-14 2022-01-12

Country Status (2)

Country Link
JP (1) JPWO2022153995A1 (ru)
WO (1) WO2022153995A1 (ru)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS458301B1 (ru) * 1966-08-26 1970-03-25
US3457106A (en) * 1966-12-21 1969-07-22 Ppg Industries Inc Metal-tungsten bronze films
JPS5010818B1 (ru) * 1968-09-30 1975-04-24
AU622650B2 (en) * 1988-03-03 1992-04-16 Blasberg-Oberflachentechnik Gmbh New through-hole plated printed circuit board and process for manufacturing same
JPH02254172A (ja) * 1989-03-28 1990-10-12 Hitachi Ltd 金属または金属酸化物薄膜の製造方法
JP2990955B2 (ja) * 1992-06-02 1999-12-13 東陶機器株式会社 銅メタライズ法
US5324537A (en) * 1993-07-06 1994-06-28 Ford Motor Company Gaseous doping of tungsten oxide
JP3337802B2 (ja) * 1993-12-28 2002-10-28 日本リーロナール株式会社 酸化銅(i)コロイドの金属化によるダイレクトプレーティング方法
JP2002287171A (ja) * 2001-03-23 2002-10-03 Akira Fujishima 光反応性部材、光透過性部材および装飾品
JP4632580B2 (ja) * 2001-06-26 2011-02-16 奥野製薬工業株式会社 樹脂基材上への導電性皮膜の形成法
JP7430483B2 (ja) * 2017-11-10 2024-02-13 旭化成株式会社 導電性パターン領域付構造体及びその製造方法

Also Published As

Publication number Publication date
WO2022153995A1 (ja) 2022-07-21

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20220324