JPWO2022153995A1 - - Google Patents
Info
- Publication number
- JPWO2022153995A1 JPWO2022153995A1 JP2022518876A JP2022518876A JPWO2022153995A1 JP WO2022153995 A1 JPWO2022153995 A1 JP WO2022153995A1 JP 2022518876 A JP2022518876 A JP 2022518876A JP 2022518876 A JP2022518876 A JP 2022518876A JP WO2022153995 A1 JPWO2022153995 A1 JP WO2022153995A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G39/00—Compounds of molybdenum
- C01G39/02—Oxides; Hydroxides
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G41/00—Compounds of tungsten
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021004119 | 2021-01-14 | ||
JP2021167851 | 2021-10-13 | ||
PCT/JP2022/000655 WO2022153995A1 (ja) | 2021-01-14 | 2022-01-12 | 酸化還元反応により導電性を示す下地導電層用材料並びにそれを用いた製造プロセス、デバイス、めっき品、めっき品の製造方法及びコーティング液 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022153995A1 true JPWO2022153995A1 (ru) | 2022-07-21 |
Family
ID=82446281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022518876A Pending JPWO2022153995A1 (ru) | 2021-01-14 | 2022-01-12 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPWO2022153995A1 (ru) |
WO (1) | WO2022153995A1 (ru) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS458301B1 (ru) * | 1966-08-26 | 1970-03-25 | ||
US3457106A (en) * | 1966-12-21 | 1969-07-22 | Ppg Industries Inc | Metal-tungsten bronze films |
JPS5010818B1 (ru) * | 1968-09-30 | 1975-04-24 | ||
AU622650B2 (en) * | 1988-03-03 | 1992-04-16 | Blasberg-Oberflachentechnik Gmbh | New through-hole plated printed circuit board and process for manufacturing same |
JPH02254172A (ja) * | 1989-03-28 | 1990-10-12 | Hitachi Ltd | 金属または金属酸化物薄膜の製造方法 |
JP2990955B2 (ja) * | 1992-06-02 | 1999-12-13 | 東陶機器株式会社 | 銅メタライズ法 |
US5324537A (en) * | 1993-07-06 | 1994-06-28 | Ford Motor Company | Gaseous doping of tungsten oxide |
JP3337802B2 (ja) * | 1993-12-28 | 2002-10-28 | 日本リーロナール株式会社 | 酸化銅(i)コロイドの金属化によるダイレクトプレーティング方法 |
JP2002287171A (ja) * | 2001-03-23 | 2002-10-03 | Akira Fujishima | 光反応性部材、光透過性部材および装飾品 |
JP4632580B2 (ja) * | 2001-06-26 | 2011-02-16 | 奥野製薬工業株式会社 | 樹脂基材上への導電性皮膜の形成法 |
JP7430483B2 (ja) * | 2017-11-10 | 2024-02-13 | 旭化成株式会社 | 導電性パターン領域付構造体及びその製造方法 |
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2022
- 2022-01-12 WO PCT/JP2022/000655 patent/WO2022153995A1/ja active Application Filing
- 2022-01-12 JP JP2022518876A patent/JPWO2022153995A1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2022153995A1 (ja) | 2022-07-21 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20220324 |