JPWO2022149341A1 - - Google Patents

Info

Publication number
JPWO2022149341A1
JPWO2022149341A1 JP2022573929A JP2022573929A JPWO2022149341A1 JP WO2022149341 A1 JPWO2022149341 A1 JP WO2022149341A1 JP 2022573929 A JP2022573929 A JP 2022573929A JP 2022573929 A JP2022573929 A JP 2022573929A JP WO2022149341 A1 JPWO2022149341 A1 JP WO2022149341A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022573929A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022149341A1 publication Critical patent/JPWO2022149341A1/ja
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2022573929A 2021-01-07 2021-11-05 Pending JPWO2022149341A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021001685 2021-01-07
PCT/JP2021/040758 WO2022149341A1 (ja) 2021-01-07 2021-11-05 位置合わせ方法、積層体の製造方法、位置合わせ装置、積層体製造装置、及び積層体

Publications (1)

Publication Number Publication Date
JPWO2022149341A1 true JPWO2022149341A1 (ja) 2022-07-14

Family

ID=82357410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022573929A Pending JPWO2022149341A1 (ja) 2021-01-07 2021-11-05

Country Status (4)

Country Link
US (1) US20240042674A1 (ja)
EP (1) EP4276406A1 (ja)
JP (1) JPWO2022149341A1 (ja)
WO (1) WO2022149341A1 (ja)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7804994B2 (en) * 2002-02-15 2010-09-28 Kla-Tencor Technologies Corporation Overlay metrology and control method
NL1036351A1 (nl) * 2007-12-31 2009-07-01 Asml Netherlands Bv Alignment system and alignment marks for use therewith cross-reference to related applications.
JP5409237B2 (ja) * 2009-09-28 2014-02-05 キヤノン株式会社 パターン検出装置、その処理方法及びプログラム
JP6864443B2 (ja) * 2016-08-04 2021-04-28 旭化成株式会社 位置合わせ方法、インプリント方法およびインプリント装置
JP6987363B2 (ja) 2018-12-11 2021-12-22 株式会社オンダ製作所 管体接続装置及び座部材

Also Published As

Publication number Publication date
EP4276406A1 (en) 2023-11-15
WO2022149341A1 (ja) 2022-07-14
US20240042674A1 (en) 2024-02-08

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