JPWO2022138044A1 - - Google Patents

Info

Publication number
JPWO2022138044A1
JPWO2022138044A1 JP2022572045A JP2022572045A JPWO2022138044A1 JP WO2022138044 A1 JPWO2022138044 A1 JP WO2022138044A1 JP 2022572045 A JP2022572045 A JP 2022572045A JP 2022572045 A JP2022572045 A JP 2022572045A JP WO2022138044 A1 JPWO2022138044 A1 JP WO2022138044A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022572045A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022138044A1 publication Critical patent/JPWO2022138044A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • C08F20/24—Esters containing halogen containing perhaloalkyl radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022572045A 2020-12-25 2021-12-02 Pending JPWO2022138044A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020217962 2020-12-25
PCT/JP2021/044260 WO2022138044A1 (ja) 2020-12-25 2021-12-02 感放射線性組成物及びレジストパターン形成方法

Publications (1)

Publication Number Publication Date
JPWO2022138044A1 true JPWO2022138044A1 (zh) 2022-06-30

Family

ID=82159457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022572045A Pending JPWO2022138044A1 (zh) 2020-12-25 2021-12-02

Country Status (3)

Country Link
JP (1) JPWO2022138044A1 (zh)
TW (1) TW202229220A (zh)
WO (1) WO2022138044A1 (zh)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014178542A (ja) * 2013-03-15 2014-09-25 Fujifilm Corp パターン形成方法、組成物キット、及びレジスト膜、並びにこれらを用いた電子デバイスの製造方法、及び電子デバイス
KR102021301B1 (ko) * 2015-02-27 2019-09-16 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 감활성광선성 또는 감방사선성막을 구비한 마스크 블랭크, 패턴 형성 방법, 및 전자 디바이스의 제조 방법
JP6648726B2 (ja) * 2017-03-22 2020-02-14 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP7140075B2 (ja) * 2018-09-18 2022-09-21 信越化学工業株式会社 レジスト材料及びパターン形成方法
CN113366081B (zh) * 2019-01-28 2024-03-08 富士胶片株式会社 感光化射线性或感放射线性树脂组合物、抗蚀剂膜、图案形成方法及电子器件的制造方法

Also Published As

Publication number Publication date
TW202229220A (zh) 2022-08-01
WO2022138044A1 (ja) 2022-06-30

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Legal Events

Date Code Title Description
A621 Written request for application examination

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Effective date: 20240430