JPWO2022107508A1 - - Google Patents
Info
- Publication number
- JPWO2022107508A1 JPWO2022107508A1 JP2022516671A JP2022516671A JPWO2022107508A1 JP WO2022107508 A1 JPWO2022107508 A1 JP WO2022107508A1 JP 2022516671 A JP2022516671 A JP 2022516671A JP 2022516671 A JP2022516671 A JP 2022516671A JP WO2022107508 A1 JPWO2022107508 A1 JP WO2022107508A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020192338 | 2020-11-19 | ||
PCT/JP2021/037986 WO2022107508A1 (ja) | 2020-11-19 | 2021-10-14 | 酸基を有する(メタ)アクリレート樹脂、硬化性樹脂組成物、硬化物、絶縁材料及びレジスト部材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2022107508A1 true JPWO2022107508A1 (ja) | 2022-05-27 |
JPWO2022107508A5 JPWO2022107508A5 (ja) | 2022-11-24 |
Family
ID=81708958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022516671A Pending JPWO2022107508A1 (ja) | 2020-11-19 | 2021-10-14 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2022107508A1 (ja) |
TW (1) | TW202229390A (ja) |
WO (1) | WO2022107508A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023218876A1 (ja) * | 2022-05-13 | 2023-11-16 | 株式会社日本触媒 | アルカリ可溶性樹脂、感光性樹脂組成物及びその硬化物 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06256441A (ja) * | 1993-03-10 | 1994-09-13 | Nippon Kayaku Co Ltd | 樹脂組成物及びその硬化物 |
JPH06324490A (ja) * | 1993-05-10 | 1994-11-25 | Nippon Kayaku Co Ltd | レジストインキ組成物及びその硬化物 |
JP2000214584A (ja) * | 1999-01-27 | 2000-08-04 | Taiyo Ink Mfg Ltd | 光硬化性・熱硬化性樹脂組成物とこれを用いて形成したソルダ―レジスト皮膜や樹脂絶縁層を有するプリント配線板 |
JP2002040647A (ja) * | 2000-07-31 | 2002-02-06 | Taiyo Ink Mfg Ltd | レジストインキ組成物 |
JP2005115187A (ja) * | 2003-10-10 | 2005-04-28 | Nippon Kayaku Co Ltd | 感光性樹脂組成物及びその硬化物の製造法 |
JP2014115365A (ja) * | 2012-12-07 | 2014-06-26 | Nippon Kayaku Co Ltd | 活性エネルギー線硬化型樹脂組成物、及びそれを用いた表示素子用スペーサー及び/またはカラーフィルター保護膜 |
WO2020059500A1 (ja) * | 2018-09-18 | 2020-03-26 | 日本化薬株式会社 | 反応性ポリカルボン酸樹脂混合物、それを用いた活性エネルギー線硬化型樹脂組成物およびその硬化物、並びに反応性エポキシカルボキシレート樹脂混合物 |
-
2021
- 2021-10-14 JP JP2022516671A patent/JPWO2022107508A1/ja active Pending
- 2021-10-14 WO PCT/JP2021/037986 patent/WO2022107508A1/ja active Application Filing
- 2021-11-12 TW TW110142163A patent/TW202229390A/zh unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06256441A (ja) * | 1993-03-10 | 1994-09-13 | Nippon Kayaku Co Ltd | 樹脂組成物及びその硬化物 |
JPH06324490A (ja) * | 1993-05-10 | 1994-11-25 | Nippon Kayaku Co Ltd | レジストインキ組成物及びその硬化物 |
JP2000214584A (ja) * | 1999-01-27 | 2000-08-04 | Taiyo Ink Mfg Ltd | 光硬化性・熱硬化性樹脂組成物とこれを用いて形成したソルダ―レジスト皮膜や樹脂絶縁層を有するプリント配線板 |
JP2002040647A (ja) * | 2000-07-31 | 2002-02-06 | Taiyo Ink Mfg Ltd | レジストインキ組成物 |
JP2005115187A (ja) * | 2003-10-10 | 2005-04-28 | Nippon Kayaku Co Ltd | 感光性樹脂組成物及びその硬化物の製造法 |
JP2014115365A (ja) * | 2012-12-07 | 2014-06-26 | Nippon Kayaku Co Ltd | 活性エネルギー線硬化型樹脂組成物、及びそれを用いた表示素子用スペーサー及び/またはカラーフィルター保護膜 |
WO2020059500A1 (ja) * | 2018-09-18 | 2020-03-26 | 日本化薬株式会社 | 反応性ポリカルボン酸樹脂混合物、それを用いた活性エネルギー線硬化型樹脂組成物およびその硬化物、並びに反応性エポキシカルボキシレート樹脂混合物 |
Also Published As
Publication number | Publication date |
---|---|
TW202229390A (zh) | 2022-08-01 |
WO2022107508A1 (ja) | 2022-05-27 |
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