JPWO2022045280A1 - - Google Patents
Info
- Publication number
- JPWO2022045280A1 JPWO2022045280A1 JP2022545722A JP2022545722A JPWO2022045280A1 JP WO2022045280 A1 JPWO2022045280 A1 JP WO2022045280A1 JP 2022545722 A JP2022545722 A JP 2022545722A JP 2022545722 A JP2022545722 A JP 2022545722A JP WO2022045280 A1 JPWO2022045280 A1 JP WO2022045280A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020144071 | 2020-08-28 | ||
PCT/JP2021/031456 WO2022045280A1 (ja) | 2020-08-28 | 2021-08-27 | フレキソ印刷版用水性現像液およびフレキソ印刷版の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022045280A1 true JPWO2022045280A1 (ja) | 2022-03-03 |
Family
ID=80353397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022545722A Pending JPWO2022045280A1 (ja) | 2020-08-28 | 2021-08-27 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20230221647A1 (ja) |
EP (1) | EP4205980A4 (ja) |
JP (1) | JPWO2022045280A1 (ja) |
CN (1) | CN116096575A (ja) |
WO (1) | WO2022045280A1 (ja) |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3884825D1 (de) * | 1987-02-16 | 1993-11-18 | Konishiroku Photo Ind | Entwickler für lichtempfindliche lithographische Druckplatte, gemeinschaftlich verarbeitungsfähig für den Negativ-Typ und den Positiv-Typ und Entwicklerzusammensetzung für lichtempfindliches Material. |
JPH07295238A (ja) * | 1994-04-22 | 1995-11-10 | Toyobo Co Ltd | 感光性樹脂版の現像方法 |
JP4342655B2 (ja) * | 1999-10-21 | 2009-10-14 | 多摩化学工業株式会社 | 感光性樹脂組成物用アルカリ現像液 |
JP4147312B2 (ja) | 2002-03-28 | 2008-09-10 | 旭化成ケミカルズ株式会社 | 感光性高分子用水性現像液組成物 |
JP4323206B2 (ja) | 2003-04-14 | 2009-09-02 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂用水性現像液 |
JP2005077464A (ja) * | 2003-08-28 | 2005-03-24 | Konica Minolta Medical & Graphic Inc | 平版印刷版の製版方法、平版印刷版用現像液及び画像形成方法 |
JP2009047927A (ja) * | 2007-08-20 | 2009-03-05 | Fujifilm Corp | 平版印刷版用現像処理液及び平版印刷版の製版方法 |
JP2009210809A (ja) * | 2008-03-04 | 2009-09-17 | Fuji Xerox Co Ltd | 液体マグネトグラフィー用現像剤、プロセスカートリッジ、及び画像形成装置 |
US11940735B2 (en) * | 2019-03-28 | 2024-03-26 | Toyobo Mc Corporation | Developer composition for flexographic printing plate, developer, and method of manufacturing printing original plate |
-
2021
- 2021-08-27 JP JP2022545722A patent/JPWO2022045280A1/ja active Pending
- 2021-08-27 CN CN202180052683.3A patent/CN116096575A/zh active Pending
- 2021-08-27 WO PCT/JP2021/031456 patent/WO2022045280A1/ja unknown
- 2021-08-27 EP EP21861701.7A patent/EP4205980A4/en active Pending
-
2023
- 2023-02-27 US US18/175,053 patent/US20230221647A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CN116096575A (zh) | 2023-05-09 |
EP4205980A4 (en) | 2024-03-20 |
EP4205980A1 (en) | 2023-07-05 |
WO2022045280A1 (ja) | 2022-03-03 |
US20230221647A1 (en) | 2023-07-13 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230221 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231205 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240202 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240528 |