JPWO2022044743A1 - - Google Patents
Info
- Publication number
- JPWO2022044743A1 JPWO2022044743A1 JP2022545602A JP2022545602A JPWO2022044743A1 JP WO2022044743 A1 JPWO2022044743 A1 JP WO2022044743A1 JP 2022545602 A JP2022545602 A JP 2022545602A JP 2022545602 A JP2022545602 A JP 2022545602A JP WO2022044743 A1 JPWO2022044743 A1 JP WO2022044743A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020144179 | 2020-08-28 | ||
| PCT/JP2021/028993 WO2022044743A1 (en) | 2020-08-28 | 2021-08-04 | Photocurable composition for imprinting |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022044743A1 true JPWO2022044743A1 (en) | 2022-03-03 |
Family
ID=80355048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022545602A Pending JPWO2022044743A1 (en) | 2020-08-28 | 2021-08-04 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2022044743A1 (en) |
| TW (1) | TW202219188A (en) |
| WO (1) | WO2022044743A1 (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4100529B2 (en) * | 1998-12-05 | 2008-06-11 | 大日本印刷株式会社 | Liquid crystal display device and manufacturing method thereof |
| JP4862033B2 (en) * | 2007-12-19 | 2012-01-25 | 旭化成株式会社 | Light-absorbing mold, photosensitive resin pattern forming method using the mold, and printing plate manufacturing method |
| JP2012130906A (en) * | 2010-11-30 | 2012-07-12 | Dainippon Printing Co Ltd | Method for curing photocurable resin composition, and method of manufacturing relief pattern |
| US10696849B2 (en) * | 2017-08-08 | 2020-06-30 | International Business Machines Corporation | Tailorable surface topology for antifouling coatings |
| KR102549487B1 (en) * | 2018-01-17 | 2023-06-30 | 닛산 가가쿠 가부시키가이샤 | Photocurable composition for imprint |
-
2021
- 2021-08-04 TW TW110128805A patent/TW202219188A/en unknown
- 2021-08-04 WO PCT/JP2021/028993 patent/WO2022044743A1/en active Application Filing
- 2021-08-04 JP JP2022545602A patent/JPWO2022044743A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TW202219188A (en) | 2022-05-16 |
| WO2022044743A1 (en) | 2022-03-03 |