JPWO2021161965A1 - - Google Patents

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Publication number
JPWO2021161965A1
JPWO2021161965A1 JP2022500405A JP2022500405A JPWO2021161965A1 JP WO2021161965 A1 JPWO2021161965 A1 JP WO2021161965A1 JP 2022500405 A JP2022500405 A JP 2022500405A JP 2022500405 A JP2022500405 A JP 2022500405A JP WO2021161965 A1 JPWO2021161965 A1 JP WO2021161965A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022500405A
Other versions
JP7332780B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021161965A1 publication Critical patent/JPWO2021161965A1/ja
Application granted granted Critical
Publication of JP7332780B2 publication Critical patent/JP7332780B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials For Photolithography (AREA)
JP2022500405A 2020-02-13 2021-02-08 感光性フィルム、及び感光性フィルムの製造方法 Active JP7332780B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2020022546 2020-02-13
JP2020022546 2020-02-13
JP2020172153 2020-10-12
JP2020172153 2020-10-12
JP2020207810 2020-12-15
JP2020207810 2020-12-15
PCT/JP2021/004621 WO2021161965A1 (ja) 2020-02-13 2021-02-08 感光性フィルム、及び感光性フィルムの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021161965A1 true JPWO2021161965A1 (ja) 2021-08-19
JP7332780B2 JP7332780B2 (ja) 2023-08-23

Family

ID=77292230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022500405A Active JP7332780B2 (ja) 2020-02-13 2021-02-08 感光性フィルム、及び感光性フィルムの製造方法

Country Status (3)

Country Link
JP (1) JP7332780B2 (ja)
CN (1) CN115087927A (ja)
WO (1) WO2021161965A1 (ja)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653132A (ja) * 1992-07-31 1994-02-25 Nippon Telegr & Teleph Corp <Ntt> 有機薄膜の製造方法及び有機薄膜作製装置
JP2007264187A (ja) * 2006-03-28 2007-10-11 Toppan Printing Co Ltd 塗布装置および塗布方法
JP2008233778A (ja) * 2007-03-23 2008-10-02 Fujifilm Corp 離画壁用感光性樹脂膜の形成方法、感光性転写材料、離画壁付基板、カラーフィルタ及びその製造方法、並びに表示装置
JP2010198032A (ja) * 2003-03-28 2010-09-09 Hoya Corp マスクブランクス及び転写用マスク
WO2018047688A1 (ja) * 2016-09-09 2018-03-15 東レ株式会社 樹脂組成物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653132A (ja) * 1992-07-31 1994-02-25 Nippon Telegr & Teleph Corp <Ntt> 有機薄膜の製造方法及び有機薄膜作製装置
JP2010198032A (ja) * 2003-03-28 2010-09-09 Hoya Corp マスクブランクス及び転写用マスク
JP2007264187A (ja) * 2006-03-28 2007-10-11 Toppan Printing Co Ltd 塗布装置および塗布方法
JP2008233778A (ja) * 2007-03-23 2008-10-02 Fujifilm Corp 離画壁用感光性樹脂膜の形成方法、感光性転写材料、離画壁付基板、カラーフィルタ及びその製造方法、並びに表示装置
WO2018047688A1 (ja) * 2016-09-09 2018-03-15 東レ株式会社 樹脂組成物

Also Published As

Publication number Publication date
JP7332780B2 (ja) 2023-08-23
WO2021161965A1 (ja) 2021-08-19
CN115087927A (zh) 2022-09-20

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