JPWO2021079420A1 - - Google Patents

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Publication number
JPWO2021079420A1
JPWO2021079420A1 JP2021553194A JP2021553194A JPWO2021079420A1 JP WO2021079420 A1 JPWO2021079420 A1 JP WO2021079420A1 JP 2021553194 A JP2021553194 A JP 2021553194A JP 2021553194 A JP2021553194 A JP 2021553194A JP WO2021079420 A1 JPWO2021079420 A1 JP WO2021079420A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021553194A
Other languages
Japanese (ja)
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JP7133724B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2021079420A1 publication Critical patent/JPWO2021079420A1/ja
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Publication of JP7133724B2 publication Critical patent/JP7133724B2/en
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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645Radiofrequency discharges
    • H05H1/466Radiofrequency discharges using capacitive coupling means, e.g. electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
JP2021553194A 2019-10-22 2019-10-22 Plasma generator and plasma processing method Active JP7133724B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/041419 WO2021079420A1 (en) 2019-10-22 2019-10-22 Plasma generation device and plasma processing method

Publications (2)

Publication Number Publication Date
JPWO2021079420A1 true JPWO2021079420A1 (en) 2021-04-29
JP7133724B2 JP7133724B2 (en) 2022-09-08

Family

ID=75619936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021553194A Active JP7133724B2 (en) 2019-10-22 2019-10-22 Plasma generator and plasma processing method

Country Status (4)

Country Link
EP (1) EP4050973A4 (en)
JP (1) JP7133724B2 (en)
CN (1) CN114586473A (en)
WO (1) WO2021079420A1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS3621622Y1 (en) * 1959-02-03 1961-08-21
JP2005302681A (en) * 2003-05-14 2005-10-27 Sekisui Chem Co Ltd Plasma processing device
JP2015144078A (en) * 2014-01-31 2015-08-06 富士機械製造株式会社 Air-pressure plasma generator
WO2016194138A1 (en) * 2015-06-02 2016-12-08 富士機械製造株式会社 Plasma generating device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE29911974U1 (en) 1999-07-09 2000-11-23 Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen Plasma nozzle
CN103370765B (en) * 2010-12-23 2016-09-07 六号元素有限公司 Control the doping of diamond synthesis material
GB201021870D0 (en) * 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
US9960017B2 (en) * 2014-09-16 2018-05-01 Fuji Machine Mfg. Co., Ltd. Plasma gas jetting device
WO2017056185A1 (en) * 2015-09-29 2017-04-06 富士機械製造株式会社 Plasma generating device
JP6678232B2 (en) * 2016-03-14 2020-04-08 株式会社Fuji Plasma generator
DE102016125699A1 (en) * 2016-12-23 2018-06-28 Plasmatreat Gmbh A nozzle assembly, apparatus for producing an atmospheric plasma jet, use thereof, method for plasma treatment of a cloth or a plastic film, plasma-treated nonwoven fabric and use thereof
EP3357879A1 (en) * 2017-02-07 2018-08-08 Heraeus Quarzglas GmbH & Co. KG Gas distribution element for use in semiconductor manufacture and method for producing a gas distribution element
JP6890689B2 (en) * 2018-01-30 2021-06-18 株式会社Fuji Plasma processing machine
JP6713039B2 (en) * 2018-12-26 2020-06-24 株式会社Fuji Plasma gas irradiation device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS3621622Y1 (en) * 1959-02-03 1961-08-21
JP2005302681A (en) * 2003-05-14 2005-10-27 Sekisui Chem Co Ltd Plasma processing device
JP2015144078A (en) * 2014-01-31 2015-08-06 富士機械製造株式会社 Air-pressure plasma generator
WO2016194138A1 (en) * 2015-06-02 2016-12-08 富士機械製造株式会社 Plasma generating device

Also Published As

Publication number Publication date
CN114586473A (en) 2022-06-03
EP4050973A1 (en) 2022-08-31
WO2021079420A1 (en) 2021-04-29
EP4050973A4 (en) 2022-11-09
JP7133724B2 (en) 2022-09-08

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