JPWO2021079420A1 - - Google Patents
Info
- Publication number
- JPWO2021079420A1 JPWO2021079420A1 JP2021553194A JP2021553194A JPWO2021079420A1 JP WO2021079420 A1 JPWO2021079420 A1 JP WO2021079420A1 JP 2021553194 A JP2021553194 A JP 2021553194A JP 2021553194 A JP2021553194 A JP 2021553194A JP WO2021079420 A1 JPWO2021079420 A1 JP WO2021079420A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2019/041419 WO2021079420A1 (en) | 2019-10-22 | 2019-10-22 | Plasma generation device and plasma processing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2021079420A1 true JPWO2021079420A1 (en) | 2021-04-29 |
JP7133724B2 JP7133724B2 (en) | 2022-09-08 |
Family
ID=75619936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021553194A Active JP7133724B2 (en) | 2019-10-22 | 2019-10-22 | Plasma generator and plasma processing method |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP4050973A4 (en) |
JP (1) | JP7133724B2 (en) |
CN (1) | CN114586473A (en) |
WO (1) | WO2021079420A1 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS3621622Y1 (en) * | 1959-02-03 | 1961-08-21 | ||
JP2005302681A (en) * | 2003-05-14 | 2005-10-27 | Sekisui Chem Co Ltd | Plasma processing device |
JP2015144078A (en) * | 2014-01-31 | 2015-08-06 | 富士機械製造株式会社 | Air-pressure plasma generator |
WO2016194138A1 (en) * | 2015-06-02 | 2016-12-08 | 富士機械製造株式会社 | Plasma generating device |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE29911974U1 (en) | 1999-07-09 | 2000-11-23 | Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen | Plasma nozzle |
CN103370765B (en) * | 2010-12-23 | 2016-09-07 | 六号元素有限公司 | Control the doping of diamond synthesis material |
GB201021870D0 (en) * | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
US9960017B2 (en) * | 2014-09-16 | 2018-05-01 | Fuji Machine Mfg. Co., Ltd. | Plasma gas jetting device |
WO2017056185A1 (en) * | 2015-09-29 | 2017-04-06 | 富士機械製造株式会社 | Plasma generating device |
JP6678232B2 (en) * | 2016-03-14 | 2020-04-08 | 株式会社Fuji | Plasma generator |
DE102016125699A1 (en) * | 2016-12-23 | 2018-06-28 | Plasmatreat Gmbh | A nozzle assembly, apparatus for producing an atmospheric plasma jet, use thereof, method for plasma treatment of a cloth or a plastic film, plasma-treated nonwoven fabric and use thereof |
EP3357879A1 (en) * | 2017-02-07 | 2018-08-08 | Heraeus Quarzglas GmbH & Co. KG | Gas distribution element for use in semiconductor manufacture and method for producing a gas distribution element |
JP6890689B2 (en) * | 2018-01-30 | 2021-06-18 | 株式会社Fuji | Plasma processing machine |
JP6713039B2 (en) * | 2018-12-26 | 2020-06-24 | 株式会社Fuji | Plasma gas irradiation device |
-
2019
- 2019-10-22 CN CN201980101498.1A patent/CN114586473A/en active Pending
- 2019-10-22 WO PCT/JP2019/041419 patent/WO2021079420A1/en unknown
- 2019-10-22 EP EP19950060.4A patent/EP4050973A4/en active Pending
- 2019-10-22 JP JP2021553194A patent/JP7133724B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS3621622Y1 (en) * | 1959-02-03 | 1961-08-21 | ||
JP2005302681A (en) * | 2003-05-14 | 2005-10-27 | Sekisui Chem Co Ltd | Plasma processing device |
JP2015144078A (en) * | 2014-01-31 | 2015-08-06 | 富士機械製造株式会社 | Air-pressure plasma generator |
WO2016194138A1 (en) * | 2015-06-02 | 2016-12-08 | 富士機械製造株式会社 | Plasma generating device |
Also Published As
Publication number | Publication date |
---|---|
CN114586473A (en) | 2022-06-03 |
EP4050973A1 (en) | 2022-08-31 |
WO2021079420A1 (en) | 2021-04-29 |
EP4050973A4 (en) | 2022-11-09 |
JP7133724B2 (en) | 2022-09-08 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20211015 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220614 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220802 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220816 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220829 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7133724 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |