JPWO2021065549A1 - - Google Patents
Info
- Publication number
- JPWO2021065549A1 JPWO2021065549A1 JP2021550612A JP2021550612A JPWO2021065549A1 JP WO2021065549 A1 JPWO2021065549 A1 JP WO2021065549A1 JP 2021550612 A JP2021550612 A JP 2021550612A JP 2021550612 A JP2021550612 A JP 2021550612A JP WO2021065549 A1 JPWO2021065549 A1 JP WO2021065549A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F220/56—Acrylamide; Methacrylamide
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019179963 | 2019-09-30 | ||
PCT/JP2020/035312 WO2021065549A1 (ja) | 2019-09-30 | 2020-09-17 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び、電子デバイスの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021065549A1 true JPWO2021065549A1 (ja) | 2021-04-08 |
Family
ID=75338062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021550612A Pending JPWO2021065549A1 (ja) | 2019-09-30 | 2020-09-17 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2021065549A1 (ja) |
TW (1) | TW202115133A (ja) |
WO (1) | WO2021065549A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024084970A1 (ja) * | 2022-10-21 | 2024-04-25 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000147774A (ja) * | 1998-11-13 | 2000-05-26 | Fuji Photo Film Co Ltd | ポジ型レジスト液 |
JP2003241382A (ja) * | 2002-02-22 | 2003-08-27 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
JP2012073508A (ja) * | 2010-09-29 | 2012-04-12 | Fujifilm Corp | 感活性光線性または感放射線性樹脂組成物、感活性光線性または感放射線性膜およびパターン形成方法 |
JP2014122949A (ja) * | 2012-12-20 | 2014-07-03 | Shin Etsu Chem Co Ltd | レジスト材料及びこれを用いたパターン形成方法 |
-
2020
- 2020-09-17 JP JP2021550612A patent/JPWO2021065549A1/ja active Pending
- 2020-09-17 WO PCT/JP2020/035312 patent/WO2021065549A1/ja active Application Filing
- 2020-09-25 TW TW109133183A patent/TW202115133A/zh unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000147774A (ja) * | 1998-11-13 | 2000-05-26 | Fuji Photo Film Co Ltd | ポジ型レジスト液 |
JP2003241382A (ja) * | 2002-02-22 | 2003-08-27 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
JP2012073508A (ja) * | 2010-09-29 | 2012-04-12 | Fujifilm Corp | 感活性光線性または感放射線性樹脂組成物、感活性光線性または感放射線性膜およびパターン形成方法 |
JP2014122949A (ja) * | 2012-12-20 | 2014-07-03 | Shin Etsu Chem Co Ltd | レジスト材料及びこれを用いたパターン形成方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2021065549A1 (ja) | 2021-04-08 |
TW202115133A (zh) | 2021-04-16 |
Similar Documents
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