JPWO2021005671A1 - - Google Patents

Info

Publication number
JPWO2021005671A1
JPWO2021005671A1 JP2021530366A JP2021530366A JPWO2021005671A1 JP WO2021005671 A1 JPWO2021005671 A1 JP WO2021005671A1 JP 2021530366 A JP2021530366 A JP 2021530366A JP 2021530366 A JP2021530366 A JP 2021530366A JP WO2021005671 A1 JPWO2021005671 A1 JP WO2021005671A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021530366A
Other versions
JP7150993B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021005671A1 publication Critical patent/JPWO2021005671A1/ja
Application granted granted Critical
Publication of JP7150993B2 publication Critical patent/JP7150993B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Tubes For Measurement (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2021530366A 2019-07-08 2019-07-08 荷電粒子線装置 Active JP7150993B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/026926 WO2021005671A1 (ja) 2019-07-08 2019-07-08 荷電粒子線装置

Publications (2)

Publication Number Publication Date
JPWO2021005671A1 true JPWO2021005671A1 (ja) 2021-01-14
JP7150993B2 JP7150993B2 (ja) 2022-10-11

Family

ID=74113947

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021530366A Active JP7150993B2 (ja) 2019-07-08 2019-07-08 荷電粒子線装置

Country Status (5)

Country Link
US (1) US20220359150A1 (ja)
JP (1) JP7150993B2 (ja)
DE (1) DE112019007309T5 (ja)
TW (1) TWI748527B (ja)
WO (1) WO2021005671A1 (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007035386A (ja) * 2005-07-26 2007-02-08 Ebara Corp 電子線装置及び該装置を用いたデバイス製造方法
JP2008078058A (ja) * 2006-09-25 2008-04-03 Ebara Corp 電子線装置及びこれを用いたパターン評価方法
JP2011192498A (ja) * 2010-03-15 2011-09-29 Hitachi High-Technologies Corp 検査装置および検査方法
JP2013232422A (ja) * 2007-02-22 2013-11-14 Applied Materials Israel Ltd 高スループットｓｅｍツール
JP2018535525A (ja) * 2015-11-30 2018-11-29 エルメス マイクロビジョン, インコーポレーテッドHermes Microvision Inc. 複数の荷電粒子ビームの装置
JP2019036403A (ja) * 2017-08-10 2019-03-07 株式会社ニューフレアテクノロジー 画像取得装置の光学系調整方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070116260A (ko) 2005-03-22 2007-12-07 가부시키가이샤 에바라 세이사꾸쇼 전자선장치
US8067732B2 (en) * 2005-07-26 2011-11-29 Ebara Corporation Electron beam apparatus
JP5963453B2 (ja) * 2011-03-15 2016-08-03 株式会社荏原製作所 検査装置
US10037877B1 (en) * 2017-06-29 2018-07-31 Axcelis Technologies, Inc Ion implantation system having beam angle control in drift and deceleration modes
DE112018006761B4 (de) * 2018-03-30 2023-06-15 Hitachi High-Tech Corporation Einen strahl geladener teilchen anwendende vorrichtung

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007035386A (ja) * 2005-07-26 2007-02-08 Ebara Corp 電子線装置及び該装置を用いたデバイス製造方法
JP2008078058A (ja) * 2006-09-25 2008-04-03 Ebara Corp 電子線装置及びこれを用いたパターン評価方法
JP2013232422A (ja) * 2007-02-22 2013-11-14 Applied Materials Israel Ltd 高スループットｓｅｍツール
JP2011192498A (ja) * 2010-03-15 2011-09-29 Hitachi High-Technologies Corp 検査装置および検査方法
JP2018535525A (ja) * 2015-11-30 2018-11-29 エルメス マイクロビジョン, インコーポレーテッドHermes Microvision Inc. 複数の荷電粒子ビームの装置
JP2019036403A (ja) * 2017-08-10 2019-03-07 株式会社ニューフレアテクノロジー 画像取得装置の光学系調整方法

Also Published As

Publication number Publication date
TW202103206A (zh) 2021-01-16
JP7150993B2 (ja) 2022-10-11
WO2021005671A1 (ja) 2021-01-14
DE112019007309T5 (de) 2022-03-31
US20220359150A1 (en) 2022-11-10
TWI748527B (zh) 2021-12-01

Similar Documents

Publication Publication Date Title
BR112021017339A2 (ja)
BR112021018450A2 (ja)
BR112021017939A2 (ja)
BR112021017892A2 (ja)
AU2020104490A4 (ja)
BR112021017738A2 (ja)
BR112021017782A2 (ja)
BR112021018168A2 (ja)
BR112021017728A2 (ja)
BR112021018452A2 (ja)
BR112021017355A2 (ja)
BR112021017703A2 (ja)
BR112021018102A2 (ja)
BR112021017637A2 (ja)
BR112021018250A2 (ja)
BR112021018084A2 (ja)
BR112021018093A2 (ja)
BR112021018484A2 (ja)
BR112021017732A2 (ja)
BR112021017949A2 (ja)
BR112021017983A2 (ja)
AT524962A5 (ja)
BR112019016136A2 (ja)
BR112021016821A2 (ja)
BR112021017847A2 (ja)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20211214

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220906

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220909

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20220927

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220928

R150 Certificate of patent or registration of utility model

Ref document number: 7150993

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150