JPWO2021002395A1 - - Google Patents

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Publication number
JPWO2021002395A1
JPWO2021002395A1 JP2021529167A JP2021529167A JPWO2021002395A1 JP WO2021002395 A1 JPWO2021002395 A1 JP WO2021002395A1 JP 2021529167 A JP2021529167 A JP 2021529167A JP 2021529167 A JP2021529167 A JP 2021529167A JP WO2021002395 A1 JPWO2021002395 A1 JP WO2021002395A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021529167A
Other versions
JP7374189B2 (ja
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Publication of JPWO2021002395A1 publication Critical patent/JPWO2021002395A1/ja
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Publication of JP7374189B2 publication Critical patent/JP7374189B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP2021529167A 2019-07-02 2020-07-01 ネガ型硬化性組成物、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス Active JP7374189B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019123650 2019-07-02
JP2019123650 2019-07-02
PCT/JP2020/025863 WO2021002395A1 (ja) 2019-07-02 2020-07-01 ネガ型硬化性組成物、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス

Publications (2)

Publication Number Publication Date
JPWO2021002395A1 true JPWO2021002395A1 (ja) 2021-01-07
JP7374189B2 JP7374189B2 (ja) 2023-11-06

Family

ID=74101307

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021529167A Active JP7374189B2 (ja) 2019-07-02 2020-07-01 ネガ型硬化性組成物、硬化膜、積層体、硬化膜の製造方法、及び、半導体デバイス

Country Status (2)

Country Link
JP (1) JP7374189B2 (ja)
WO (1) WO2021002395A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024024783A1 (ja) * 2022-07-29 2024-02-01 富士フイルム株式会社 転写フィルム、積層体の製造方法、積層体、半導体パッケージの製造方法
WO2024095885A1 (ja) * 2022-10-31 2024-05-10 富士フイルム株式会社 樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、及び、半導体デバイス

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008058636A (ja) * 2006-08-31 2008-03-13 Fujifilm Corp パターン形成材料及びパターン形成方法
JP2011017898A (ja) * 2009-07-09 2011-01-27 Toray Ind Inc 感光性カバーレイ
JP2011095355A (ja) * 2009-10-28 2011-05-12 Toray Ind Inc 感光性樹脂組成物
JP2017198977A (ja) * 2016-04-14 2017-11-02 旭化成株式会社 感光性樹脂組成物及び硬化レリーフパターンの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5136058B2 (ja) * 2005-11-01 2013-02-06 東亞合成株式会社 粘接着剤用光硬化型組成物、光硬化型粘接着シート、積層体及び接着シート
JP6984322B2 (ja) * 2017-11-01 2021-12-17 東レ株式会社 光重合性モノマー、それを用いた感光性樹脂組成物および感光性樹脂組成物の硬化膜

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008058636A (ja) * 2006-08-31 2008-03-13 Fujifilm Corp パターン形成材料及びパターン形成方法
JP2011017898A (ja) * 2009-07-09 2011-01-27 Toray Ind Inc 感光性カバーレイ
JP2011095355A (ja) * 2009-10-28 2011-05-12 Toray Ind Inc 感光性樹脂組成物
JP2017198977A (ja) * 2016-04-14 2017-11-02 旭化成株式会社 感光性樹脂組成物及び硬化レリーフパターンの製造方法

Also Published As

Publication number Publication date
WO2021002395A1 (ja) 2021-01-07
JP7374189B2 (ja) 2023-11-06
TW202110954A (zh) 2021-03-16

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