JPWO2020262593A1 - - Google Patents
Info
- Publication number
- JPWO2020262593A1 JPWO2020262593A1 JP2020571866A JP2020571866A JPWO2020262593A1 JP WO2020262593 A1 JPWO2020262593 A1 JP WO2020262593A1 JP 2020571866 A JP2020571866 A JP 2020571866A JP 2020571866 A JP2020571866 A JP 2020571866A JP WO2020262593 A1 JPWO2020262593 A1 JP WO2020262593A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019122115 | 2019-06-28 | ||
| PCT/JP2020/025163 WO2020262593A1 (ja) | 2019-06-28 | 2020-06-26 | 外観検査装置及び外観検査方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2020262593A1 true JPWO2020262593A1 (enrdf_load_stackoverflow) | 2020-12-30 |
Family
ID=74061262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020571866A Pending JPWO2020262593A1 (enrdf_load_stackoverflow) | 2019-06-28 | 2020-06-26 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2020262593A1 (enrdf_load_stackoverflow) |
| CN (1) | CN114026409A (enrdf_load_stackoverflow) |
| WO (1) | WO2020262593A1 (enrdf_load_stackoverflow) |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06167460A (ja) * | 1992-05-29 | 1994-06-14 | Omron Corp | 検査装置 |
| JP3173874B2 (ja) * | 1992-06-24 | 2001-06-04 | 株式会社日立国際電気 | 外観検査装置 |
| DE112005001294T5 (de) * | 2004-06-04 | 2007-04-26 | Tokyo Seimitsu Co., Ltd. | Halbleiteroberflächenprüfungsvorrichtung sowie Beleuchtungsverfahren |
| JP4100376B2 (ja) * | 2004-06-30 | 2008-06-11 | オムロン株式会社 | 表面状態検査方法およびその装置、ならびに検査用画像の生成装置 |
| CN100386773C (zh) * | 2004-12-27 | 2008-05-07 | 欧姆龙株式会社 | 图像处理方法、基板检查方法和装置及检查数据制作方法 |
| CN100472205C (zh) * | 2005-02-21 | 2009-03-25 | 欧姆龙株式会社 | 基板检查方法和装置、及其检查逻辑设定方法和装置 |
| CN100582755C (zh) * | 2005-03-17 | 2010-01-20 | 欧姆龙株式会社 | 基板检查装置及其检查逻辑设定方法和检查逻辑设定装置 |
| JP2007240432A (ja) * | 2006-03-10 | 2007-09-20 | Omron Corp | 欠陥検査装置および欠陥検査方法 |
| JP2008009339A (ja) * | 2006-06-30 | 2008-01-17 | Toshiba Corp | パターンの検査装置、パターンの検査方法および半導体装置の製造方法 |
| JP5900187B2 (ja) * | 2012-06-27 | 2016-04-06 | 住友金属鉱山株式会社 | 表面傷検査装置及び表面傷検査方法 |
| JP6157135B2 (ja) * | 2013-02-07 | 2017-07-05 | オリンパス株式会社 | 光源撮像装置 |
| JP6265055B2 (ja) * | 2014-01-14 | 2018-01-24 | ソニー株式会社 | 発光装置、表示装置および照明装置 |
| JP6408259B2 (ja) * | 2014-06-09 | 2018-10-17 | 株式会社キーエンス | 画像検査装置、画像検査方法、画像検査プログラム及びコンピュータで読み取り可能な記録媒体並びに記録した機器 |
| JP2016118518A (ja) * | 2014-12-24 | 2016-06-30 | オムロンオートモーティブエレクトロニクス株式会社 | 外観検査装置 |
| JP2017198612A (ja) * | 2016-04-28 | 2017-11-02 | キヤノン株式会社 | 検査装置、検査システム、および物品製造方法 |
| JP6859627B2 (ja) * | 2016-08-09 | 2021-04-14 | 株式会社ジェイテクト | 外観検査装置 |
| JP6595708B2 (ja) * | 2016-11-14 | 2019-10-23 | 日本碍子株式会社 | 目封止ハニカム構造体の欠陥検査装置および欠陥検査方法 |
| JP6834843B2 (ja) * | 2017-08-10 | 2021-02-24 | オムロン株式会社 | 画像処理システム、設定支援装置および設定支援プログラム |
-
2020
- 2020-06-26 JP JP2020571866A patent/JPWO2020262593A1/ja active Pending
- 2020-06-26 WO PCT/JP2020/025163 patent/WO2020262593A1/ja not_active Ceased
- 2020-06-26 CN CN202080047072.5A patent/CN114026409A/zh not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| CN114026409A (zh) | 2022-02-08 |
| WO2020262593A1 (ja) | 2020-12-30 |