JPWO2020234987A1 - - Google Patents
Info
- Publication number
- JPWO2020234987A1 JPWO2020234987A1 JP2021519929A JP2021519929A JPWO2020234987A1 JP WO2020234987 A1 JPWO2020234987 A1 JP WO2020234987A1 JP 2021519929 A JP2021519929 A JP 2021519929A JP 2021519929 A JP2021519929 A JP 2021519929A JP WO2020234987 A1 JPWO2020234987 A1 JP WO2020234987A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/248—Components associated with the control of the tube
- H01J2237/2482—Optical means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
- H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
- H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2019/020065 WO2020234987A1 (ja) | 2019-05-21 | 2019-05-21 | 荷電粒子線装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020234987A1 true JPWO2020234987A1 (enExample) | 2020-11-26 |
| JPWO2020234987A5 JPWO2020234987A5 (enExample) | 2022-01-18 |
| JP7108788B2 JP7108788B2 (ja) | 2022-07-28 |
Family
ID=73459313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021519929A Active JP7108788B2 (ja) | 2019-05-21 | 2019-05-21 | 荷電粒子線装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20220216032A1 (enExample) |
| JP (1) | JP7108788B2 (enExample) |
| KR (1) | KR102640025B1 (enExample) |
| DE (1) | DE112019007206B4 (enExample) |
| TW (1) | TWI748404B (enExample) |
| WO (1) | WO2020234987A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7686797B2 (ja) * | 2022-01-28 | 2025-06-02 | 株式会社日立ハイテク | 検査装置および膜質検査方法 |
| KR20240170944A (ko) * | 2022-09-27 | 2024-12-05 | 주식회사 히타치하이테크 | 검사 방법 및 하전 입자선 장치 |
| KR20250090336A (ko) * | 2022-12-20 | 2025-06-19 | 주식회사 히타치하이테크 | 시료의 특징량 도출 방법, 신호 처리 시스템을 조정하는 조정 방법 및 계측 시스템 |
| JP2024173322A (ja) * | 2023-06-02 | 2024-12-12 | 国立研究開発法人産業技術総合研究所 | 観察装置及び観察方法 |
| WO2025069195A1 (ja) * | 2023-09-26 | 2025-04-03 | 株式会社日立ハイテク | 荷電粒子ビーム装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003151483A (ja) * | 2001-11-19 | 2003-05-23 | Hitachi Ltd | 荷電粒子線を用いた回路パターン用基板検査装置および基板検査方法 |
| JP2006352026A (ja) * | 2005-06-20 | 2006-12-28 | Sony Corp | 半導体レーザ装置及び半導体レーザ装置の製造方法 |
| JP2012009247A (ja) * | 2010-06-24 | 2012-01-12 | Topcon Corp | 電子顕微鏡装置 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3805565B2 (ja) * | 1999-06-11 | 2006-08-02 | 株式会社日立製作所 | 電子線画像に基づく検査または計測方法およびその装置 |
| JP2007531876A (ja) * | 2004-04-02 | 2007-11-08 | カリフォルニア インスティテュート オブ テクノロジー | 超高速光電子顕微鏡のための方法およびシステム |
| DE102007041496B3 (de) | 2007-08-31 | 2009-02-26 | Johnson Controls Gmbh | Kopfstütze für ein Fahrzeug |
| JP5744629B2 (ja) * | 2011-06-03 | 2015-07-08 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡及び電子線を用いた撮像方法 |
| JP6289339B2 (ja) * | 2014-10-28 | 2018-03-07 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び情報処理装置 |
| WO2016143450A1 (ja) * | 2015-03-10 | 2016-09-15 | 株式会社荏原製作所 | 検査装置 |
| JP6788660B2 (ja) * | 2016-03-16 | 2020-11-25 | 株式会社日立ハイテク | 欠陥検査装置 |
| WO2019102603A1 (ja) * | 2017-11-27 | 2019-05-31 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置およびそれを用いた試料観察方法 |
| JP6998469B2 (ja) * | 2018-09-11 | 2022-01-18 | 株式会社日立ハイテク | 電子線装置 |
| JP7105368B2 (ja) * | 2019-03-27 | 2022-07-22 | 株式会社日立ハイテク | 荷電粒子線装置 |
| JP7148467B2 (ja) * | 2019-08-30 | 2022-10-05 | 株式会社日立ハイテク | 荷電粒子線装置 |
| JP7189103B2 (ja) * | 2019-08-30 | 2022-12-13 | 株式会社日立ハイテク | 荷電粒子線装置 |
| US20230274909A1 (en) * | 2020-09-28 | 2023-08-31 | Hitachi High-Tech Corporation | Charged Particle Beam Device |
| US12196802B2 (en) * | 2020-09-29 | 2025-01-14 | Hitachi High-Tech Corporation | Semiconductor inspection device and method for inspecting semiconductor sample |
-
2019
- 2019-05-21 DE DE112019007206.4T patent/DE112019007206B4/de active Active
- 2019-05-21 WO PCT/JP2019/020065 patent/WO2020234987A1/ja not_active Ceased
- 2019-05-21 JP JP2021519929A patent/JP7108788B2/ja active Active
- 2019-05-21 KR KR1020217034096A patent/KR102640025B1/ko active Active
- 2019-05-21 US US17/610,908 patent/US20220216032A1/en not_active Abandoned
-
2020
- 2020-04-10 TW TW109112246A patent/TWI748404B/zh active
-
2024
- 2024-07-12 US US18/771,126 patent/US20240363306A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003151483A (ja) * | 2001-11-19 | 2003-05-23 | Hitachi Ltd | 荷電粒子線を用いた回路パターン用基板検査装置および基板検査方法 |
| JP2006352026A (ja) * | 2005-06-20 | 2006-12-28 | Sony Corp | 半導体レーザ装置及び半導体レーザ装置の製造方法 |
| JP2012009247A (ja) * | 2010-06-24 | 2012-01-12 | Topcon Corp | 電子顕微鏡装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE112019007206T5 (de) | 2022-01-05 |
| TWI748404B (zh) | 2021-12-01 |
| US20220216032A1 (en) | 2022-07-07 |
| US20240363306A1 (en) | 2024-10-31 |
| KR102640025B1 (ko) | 2024-02-27 |
| DE112019007206B4 (de) | 2026-01-22 |
| TW202044311A (zh) | 2020-12-01 |
| JP7108788B2 (ja) | 2022-07-28 |
| WO2020234987A1 (ja) | 2020-11-26 |
| KR20210142703A (ko) | 2021-11-25 |
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