JPWO2020169702A5 - - Google Patents
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- Publication number
- JPWO2020169702A5 JPWO2020169702A5 JP2021549215A JP2021549215A JPWO2020169702A5 JP WO2020169702 A5 JPWO2020169702 A5 JP WO2020169702A5 JP 2021549215 A JP2021549215 A JP 2021549215A JP 2021549215 A JP2021549215 A JP 2021549215A JP WO2020169702 A5 JPWO2020169702 A5 JP WO2020169702A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- group
- spin
- high carbon
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000203 mixture Substances 0.000 claims description 157
- 229910052799 carbon Inorganic materials 0.000 claims description 81
- 125000000217 alkyl group Chemical group 0.000 claims description 69
- 229920000642 polymer Polymers 0.000 claims description 59
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 53
- 125000003118 aryl group Chemical group 0.000 claims description 41
- 229910052739 hydrogen Inorganic materials 0.000 claims description 30
- 239000001257 hydrogen Substances 0.000 claims description 30
- 125000003545 alkoxy group Chemical group 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 27
- 238000000576 coating method Methods 0.000 claims description 26
- 239000011248 coating agent Substances 0.000 claims description 25
- 150000002736 metal compounds Chemical class 0.000 claims description 24
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 19
- 239000000654 additive Substances 0.000 claims description 17
- 230000000996 additive effect Effects 0.000 claims description 16
- 125000002947 alkylene group Chemical group 0.000 claims description 16
- 229920005862 polyol Polymers 0.000 claims description 16
- 150000003077 polyols Chemical class 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 14
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 12
- 229910052736 halogen Inorganic materials 0.000 claims description 12
- 150000002367 halogens Chemical class 0.000 claims description 12
- 150000002431 hydrogen Chemical class 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 125000005133 alkynyloxy group Chemical group 0.000 claims description 6
- -1 siloxanes Chemical class 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 6
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 5
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- 125000005157 alkyl carboxy group Chemical group 0.000 claims description 4
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 4
- 125000005577 anthracene group Chemical group 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 2
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 description 12
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000006117 anti-reflective coating Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 238000012876 topography Methods 0.000 description 3
- 150000004696 coordination complex Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- VFFFESPCCPXZOQ-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;oxirane Chemical compound C1CO1.OCC(CO)(CO)CO VFFFESPCCPXZOQ-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical group 0.000 description 1
- IYABWNGZIDDRAK-UHFFFAOYSA-N allene Chemical group C=C=C IYABWNGZIDDRAK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- 150000002576 ketones Chemical group 0.000 description 1
- 150000002596 lactones Chemical group 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962809072P | 2019-02-22 | 2019-02-22 | |
| US62/809,072 | 2019-02-22 | ||
| PCT/EP2020/054421 WO2020169702A1 (en) | 2019-02-22 | 2020-02-20 | Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022521531A JP2022521531A (ja) | 2022-04-08 |
| JPWO2020169702A5 true JPWO2020169702A5 (enrdf_load_stackoverflow) | 2023-02-24 |
| JP7610518B2 JP7610518B2 (ja) | 2025-01-08 |
Family
ID=69699858
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021549215A Active JP7610518B2 (ja) | 2019-02-22 | 2020-02-20 | 改善された貯蔵寿命を有するハードマスク及び充填材料として有用な無機酸化物成分及びアルキニルオキシ置換スピンオン炭素成分を含むスピンオン組成物 |
Country Status (8)
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024008372A (ja) | 2022-07-08 | 2024-01-19 | 信越化学工業株式会社 | 金属酸化膜形成用組成物、パターン形成方法、及び金属酸化膜形成方法 |
| IL305619A (en) | 2022-09-14 | 2024-04-01 | Shinetsu Chemical Co | Compound for forming metal-containing film, composition for forming metal-containing film, patterning process, and semiconductor photoresist material |
| JP2024068637A (ja) * | 2022-11-08 | 2024-05-20 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2024089633A (ja) | 2022-12-21 | 2024-07-03 | 信越化学工業株式会社 | 金属含有膜形成用重合体、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2024091495A (ja) * | 2022-12-22 | 2024-07-04 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2024097389A (ja) | 2023-01-06 | 2024-07-19 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2024097388A (ja) * | 2023-01-06 | 2024-07-19 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2024116024A (ja) | 2023-02-15 | 2024-08-27 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法 |
| JP2024122656A (ja) * | 2023-02-28 | 2024-09-09 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| EP4435516A1 (en) * | 2023-03-16 | 2024-09-25 | Shin-Etsu Chemical Co., Ltd. | Method for forming resist underlayer film and patterning process |
| JP2024175704A (ja) * | 2023-06-07 | 2024-12-19 | 信越化学工業株式会社 | 金属含有膜形成用組成物及びパターン形成方法 |
| JP2025032887A (ja) | 2023-08-28 | 2025-03-12 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2025032875A (ja) | 2023-08-28 | 2025-03-12 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、及びパターン形成方法 |
| JP2025099570A (ja) | 2023-12-22 | 2025-07-03 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法 |
| JP2025099887A (ja) | 2023-12-22 | 2025-07-03 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法 |
| JP2025102051A (ja) * | 2023-12-26 | 2025-07-08 | 信越化学工業株式会社 | 金属含有膜形成用化合物、金属含有膜形成用組成物、パターン形成方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3474054A (en) | 1966-09-13 | 1969-10-21 | Permalac Corp The | Surface coating compositions containing pyridine salts or aromatic sulfonic acids |
| US4251665A (en) | 1978-05-22 | 1981-02-17 | King Industries, Inc. | Aromatic sulfonic acid oxa-azacyclopentane adducts |
| US4200729A (en) | 1978-05-22 | 1980-04-29 | King Industries, Inc | Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts |
| US5187019A (en) | 1991-09-06 | 1993-02-16 | King Industries, Inc. | Latent catalysts |
| US8906590B2 (en) | 2011-03-30 | 2014-12-09 | Az Electronic Materials Usa Corp. | Antireflective coating composition and process thereof |
| WO2012145330A1 (en) * | 2011-04-18 | 2012-10-26 | The University Of British Columbia | Fluorene-9-bisphenol compounds and methods for their use |
| US9365510B2 (en) * | 2012-04-16 | 2016-06-14 | British Columbia Cancer Agency Branch | Aziridine bisphenol ethers and related compounds and methods for their use |
| US9315636B2 (en) | 2012-12-07 | 2016-04-19 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds, their compositions and methods |
| US9152051B2 (en) * | 2013-06-13 | 2015-10-06 | Az Electronics Materials (Luxembourg) S.A.R.L. | Antireflective coating composition and process thereof |
| US9296922B2 (en) * | 2013-08-30 | 2016-03-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use |
| US9274426B2 (en) * | 2014-04-29 | 2016-03-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Antireflective coating compositions and processes thereof |
| US9499698B2 (en) * | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
| JP6641879B2 (ja) * | 2015-03-03 | 2020-02-05 | Jsr株式会社 | レジスト下層膜形成用組成物、レジスト下層膜及びパターニングされた基板の製造方法 |
| JP6711104B2 (ja) * | 2015-04-24 | 2020-06-17 | Jsr株式会社 | レジスト下層膜形成方法及びパターン形成方法 |
| JP6712188B2 (ja) | 2015-07-13 | 2020-06-17 | 信越化学工業株式会社 | レジスト下層膜形成用組成物及びこれを用いたパターン形成方法 |
| JP6625934B2 (ja) * | 2015-07-14 | 2019-12-25 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及び化合物 |
-
2020
- 2020-02-20 CN CN202080013446.1A patent/CN113412533A/zh active Pending
- 2020-02-20 TW TW109105433A patent/TWI833908B/zh active
- 2020-02-20 SG SG11202106923XA patent/SG11202106923XA/en unknown
- 2020-02-20 US US17/423,528 patent/US11767398B2/en active Active
- 2020-02-20 KR KR1020217028140A patent/KR102843498B1/ko active Active
- 2020-02-20 JP JP2021549215A patent/JP7610518B2/ja active Active
- 2020-02-20 WO PCT/EP2020/054421 patent/WO2020169702A1/en unknown
- 2020-02-20 EP EP20707036.8A patent/EP3928348A1/en active Pending
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