JPWO2020008434A5 - - Google Patents

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JPWO2020008434A5
JPWO2020008434A5 JP2020564588A JP2020564588A JPWO2020008434A5 JP WO2020008434 A5 JPWO2020008434 A5 JP WO2020008434A5 JP 2020564588 A JP2020564588 A JP 2020564588A JP 2020564588 A JP2020564588 A JP 2020564588A JP WO2020008434 A5 JPWO2020008434 A5 JP WO2020008434A5
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conductive coating
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絶縁ガラス(IG)ユニットであって、
それぞれが内部主表面及び外部主表面を有する第1及び第2の基材であって、前記第1の基材の前記内部主表面が、前記第2の基材の前記内部主表面に面している、第1及び第2の基材と、
前記第1及び第2の基材を互いに対して実質的に平行に離間した関係に維持し、それらの間に間隙を画定するスペーサシステムと、
前記第1の基材と前記第2の基材との間に介在する動的に制御可能なシェードであって、
前記第1の基材の前記内部主表面上に直接又は間接的に設けられた第1導電コーティングと、
前記第1導電コーティング上に直接又は間接的に設けられた誘電体膜又は絶縁体膜と、
第2導電コーティングを支持するポリマー材料を含むシャッタであって、前記ポリマー材料がシャッタ閉位置として機能し、且つシャッタ開位置として機能するように後退可能であり、前記第2導電コーティングが、Mo及び/又はTiを含む薄膜層を含む、シャッタと、を含むシェードと、を備え、
前記第1導電コーティング及び第2導電コーティングが、前記シャッタ開位置と前記シャッタ閉位置との間で前記ポリマー材料を駆動するために電位差を選択的に設定するように制御可能な電源に電気的に接続可能であり、
Mo及び/又はTiを含む前記薄膜層の上に、且つ前記ポリマー材料の反対側の表面上に腐食低減層が設けられている、絶縁ガラス(IG)ユニット。
Insulated glass (IG) unit,
The first and second base materials each have an inner main surface and an outer main surface, and the inner main surface of the first base material faces the inner main surface of the second base material. With the first and second base materials
A spacer system that maintains the first and second substrates substantially parallel to each other and defines a gap between them.
A dynamically controllable shade intervening between the first substrate and the second substrate.
With the first conductive coating directly or indirectly provided on the internal main surface of the first substrate,
A dielectric film or an insulator film directly or indirectly provided on the first conductive coating,
A shutter containing a polymer material that supports a second conductive coating, the polymer material being retractable to function as a shutter closed position and a shutter open position, wherein the second conductive coating is Mo and / Or a shutter comprising a thin film layer containing Ti, and a shade comprising.
The first conductive coating and the second conductive coating are electrically controlled to a power source that can be controlled to selectively set a potential difference to drive the polymer material between the shutter open position and the shutter closed position. Can be connected and
An insulating glass (IG) unit provided with a corrosion reduction layer on the thin film layer containing Mo and / or Ti and on the surface opposite to the polymer material.
前記第2導電コーティング中の薄膜層(単数又は複数)は、開いた位置と閉じた位置との間で、Alを含む層のみを含む第2導電コーティングを有するシャッタのものよりも大きいばね力で前記シャッタを移動させるように選択及び形成される、請求項1に記載のIGユニット。 The thin film layer (s) in the second conductive coating has a greater spring force between the open and closed positions than that of a shutter with a second conductive coating containing only a layer containing Al. The IG unit according to claim 1, which is selected and formed so as to move the shutter. 前記腐食低減層が、Al、Ti、及び/又はステンレス鋼を含む、請求項1に記載のIGユニット。 The IG unit according to claim 1, wherein the corrosion reducing layer comprises Al, Ti, and / or stainless steel. 前記腐食低減層がAlを含む、請求項3に記載のIGユニット。 The IG unit according to claim 3, wherein the corrosion reducing layer contains Al. 前記腐食低減層が、375nm未満の厚さを有する、請求項3に記載のIGユニット。 The IG unit according to claim 3, wherein the corrosion reduction layer has a thickness of less than 375 nm. Mo及び/又はTiを含む前記薄膜層と前記ポリマー材料との間に下地層が設けられ、前記下地層は、下地層が存在しない状況と比較して、前記第2導電コーティングの応力プロファイルを変更するように形成されている、請求項1に記載のIGユニット。 An underlayer is provided between the thin film layer containing Mo and / or Ti and the polymer material, and the underlayer modifies the stress profile of the second conductive coating as compared to the situation where no underlayer is present. The IG unit according to claim 1, which is formed so as to perform the above-mentioned method. 前記下地層が、前記第2導電コーティングの前記応力プロファイルを正味引張から正味圧縮に変化させるように形成される、請求項6に記載のIGユニット。 The IG unit according to claim 6, wherein the base layer is formed so as to change the stress profile of the second conductive coating from net tension to net compression. 前記下地層がAlを含む薄膜層である、請求項6に記載のIGユニット。 The IG unit according to claim 6, wherein the base layer is a thin film layer containing Al. 前記下地層が、375nm未満の厚さを有する、請求項6に記載のIGユニット。 The IG unit according to claim 6, wherein the base layer has a thickness of less than 375 nm. 前記腐食低減層及び前記下地層は両方とも、Alを含み、375nm未満の集合的厚さを有する薄膜層である、請求項6に記載のIGユニット。 The IG unit according to claim 6, wherein both the corrosion reduction layer and the base layer are thin film layers containing Al and having an aggregate thickness of less than 375 nm. Mo及び/又はTiを含む前記薄膜層と前記ポリマー材料との間に設けられた下地層を更に含み、前記下地層は、下地層が存在しない状況と比較して、前記第2導電コーティングの応力プロファイルを変更するように形成されている、請求項1に記載のIGユニット。 Further including an underlayer provided between the thin film layer containing Mo and / or Ti and the polymer material, the underlayer is the stress of the second conductive coating as compared to the situation where the underlayer is absent. The IG unit according to claim 1, which is formed to change the profile. 前記下地層が、前記第2導電コーティングの前記応力プロファイルを正味引張から正味圧縮に変化させるように形成されている、請求項11に記載のIGユニット。 11. The IG unit of claim 11, wherein the underlying layer is formed to change the stress profile of the second conductive coating from net tension to net compression. 絶縁ガラス(IG)ユニットであって、
それぞれが内部主表面及び外部主表面を有する第1及び第2の基材であって、前記第1の基材の前記内部主表面が、前記第2の基材の前記内部主表面に面している、第1及び第2の基材と、
前記第1及び第2の基材を互いに対して実質的に平行に離間した関係に維持し、それらの間に間隙を画定するためのスペーサシステムと、
前記第1の基材と前記第2の基材との間に介在する動的に制御可能なシェードであって、
前前記第1の基材の前記内部主表面上に直接又は間接的に設けられた第1導電コーティングと、
前前記第1導電コーティング上に直接又は間接的に設けられた誘電体膜又は絶縁体膜と、
前第2導電コーティングを支持するポリマー材料を含むシャッタであって、前記ポリマー材料がシャッタ閉位置として機能し、且つシャッタ開位置として機能するように後退可能であり、前記第2導電コーティングが1つ以上の薄膜層を含み、前記第2導電コーティング中の前記薄膜層(複数可)は、前記開放位置と前記閉位置との間で、Alを含む層のみを含む第2導電コーティングを有するシャッタのものよりも大きいばね力で前記シャッタを移動させるように選択及び形成される、シャッタと、を含むシェードと、を備え、
前記第1導電コーティング及び第2導電コーティングは、前記シャッタ開位置とシャッタ閉位置との間で前記ポリマー材料を相応に駆動するために電位差を選択的に設定するように制御可能な電源に電気的に接続可能であり、
第2導電コーティング中の前記薄膜層の上に、且つ前記ポリマー材料の反対側の表面上に腐食低減層が設けられている、絶縁ガラス(IG)ユニット。
Insulated glass (IG) unit,
The first and second base materials each have an inner main surface and an outer main surface, and the inner main surface of the first base material faces the inner main surface of the second base material. With the first and second base materials
A spacer system for maintaining the first and second substrates substantially parallel to each other and defining gaps between them.
A dynamically controllable shade intervening between the first substrate and the second substrate.
The first conductive coating directly or indirectly provided on the inner main surface of the first base material.
With the dielectric film or insulator film directly or indirectly provided on the first conductive coating,
A shutter containing a polymer material that supports a pre-second conductive coating, the polymer material being retractable to function as a shutter closed position and a shutter open position, with one second conductive coating. The thin film layer (s) in the second conductive coating including the above thin film layer is a shutter having a second conductive coating containing only a layer containing Al between the open position and the closed position. A shade comprising a shutter, which is selected and formed to move the shutter with a spring force greater than that of the one.
The first conductive coating and the second conductive coating are electrically connected to a power source that can be controlled to selectively set a potential difference to appropriately drive the polymer material between the shutter open position and the shutter closed position. Can be connected to
An insulating glass (IG) unit provided with a corrosion reduction layer on the thin film layer in the second conductive coating and on the surface opposite the polymer material.
前記第2導電コーティングが金属を含む層を含み、その上に直接的又は間接的に前記腐食低減層が設けられている、請求項13に記載のIGユニット。 The IG unit according to claim 13, wherein the second conductive coating includes a layer containing a metal, and the corrosion reducing layer is directly or indirectly provided on the layer. 前記腐食低減層が、Al、Ti、及び/又はステンレス鋼を含む、請求項13に記載のIGユニット。 13. The IG unit according to claim 13, wherein the corrosion reducing layer comprises Al, Ti, and / or stainless steel. 金属を含む層と前記ポリマー材料との間に下地層が設けられ、前記下地層は、下地層が存在しない状況と比較して、前記第2導電コーティングの前記応力プロファイルが正味引張から正味圧縮に変化するように、第2導電コーティングの応力プロファイルを変更するように形成される、請求項14に記載のIGユニット。 A base layer is provided between the layer containing the metal and the polymer material, and the stress profile of the second conductive coating changes from net tension to net compression in the base layer as compared to the situation where the base layer does not exist. 14. The IG unit according to claim 14, which is formed to change the stress profile of the second conductive coating so as to change. 前記第2導電コーティングが金属を含む層を含み、前記金属を含む層と前記ポリマー材料との間に下地層が設けられ、前記下地層は、前記第2導電コーティングの応力プロファイルが正味引張から正味圧縮に変化するように、前記第2導電コーティングの応力プロファイルを変更するように形成されている、請求項13に記載のIGユニット。 The second conductive coating comprises a layer containing a metal, an underlayer is provided between the metal-containing layer and the polymer material, and the underlayer has a net tensile to net stress profile of the second conductive coating. 13. The IG unit according to claim 13, which is formed to change the stress profile of the second conductive coating so as to change to compression. 絶縁ガラス(IG)ユニットの製造方法であって、
それぞれが内部主表面及び外部主表面を有する、第1及び第2の基材を提供する工程と、
前記第1の基材の前記内部主表面上に直接又は間接的に第1導電コーティングを形成する工程と、
前記第1導電コーティング上に直接又は間接的に誘電体膜又は絶縁体膜を提供する工程と、
前記誘電体又は絶縁体膜に隣接して、第2導電コーティングを支持するポリマー材料を含むシャッタを配置する工程であって、使用中のポリマー材料が、シャッタ閉位置として機能するように伸長可能であり、且つシャッタ開位置として機能するように後退可能であり、前記第2導電コーティング中の前記薄膜層(複数可)は、前記シャッタを前記開放位置と前記閉位置との間で移動させるように選択及び形成され、前記第2導電コーティング及び/又は前記第2導電コーティング自体の中の前記薄膜層は、Alよりも大きい弾性率及びより低いCTEを有する、工程と、
前記第1導電コーティング及び第2導電コーティングを電源に電気的に接続する工程であって、前記第1導電コーティング、誘電体膜又は絶縁体膜、及びシャッタが、前記電源と関連して制御可能な動的シェードを少なくとも部分的に形成して、電位差を選択的に設定し、それに応じて、前記シャッタ開位置と前記シャッタ閉鎖位置との間で前記ポリマー材料を駆動する、工程と、
前記第1及び第2の基材を、前記IGユニットを作製する際に、前記第1及び第2の基材の前記内面が互いに対向するように、前記第1及び第2の基材を互いに実質的に平行に離間させた関係でスペーサシステムに関連して互いに接続する工程であって、前記第1及び第2の基材の間に間隙が画定され、前記間隙内の前記第1の基材と前記第2の基材との間に前記動的シェードが介在し、第2導電コーティング中の前記薄膜層の上に、且つ前記ポリマー材料の反対側の表面上に腐食低減層が設けられている、工程と、を含む、方法。
It is a manufacturing method of an insulating glass (IG) unit.
A step of providing first and second substrates, each having an inner main surface and an outer main surface.
A step of directly or indirectly forming a first conductive coating on the inner main surface of the first base material,
A step of directly or indirectly providing a dielectric film or an insulator film on the first conductive coating,
In the step of arranging a shutter containing a polymer material supporting the second conductive coating adjacent to the dielectric or insulator film, the polymer material in use can be stretched to function as a shutter closing position. Yes, and retractable to function as a shutter open position, the thin film layer (s) in the second conductive coating so as to move the shutter between the open position and the closed position. The process, wherein the thin film layer selected and formed and within the second conductive coating and / or the second conductive coating itself has a greater modulus of elasticity and a lower CTE than Al.
In a step of electrically connecting the first conductive coating and the second conductive coating to a power source, the first conductive coating, a dielectric film or an insulator film, and a shutter can be controlled in relation to the power source. A step of forming a dynamic shade at least partially to selectively set the potential difference and thereby driving the polymeric material between the shutter open position and the shutter closed position.
When the IG unit is made of the first and second base materials, the first and second base materials are placed on each other so that the inner surfaces of the first and second base materials face each other. A step of connecting to each other in connection with a spacer system in a substantially parallel spacing, wherein a gap is defined between the first and second substrates and the first group in the gap. The dynamic shade is interposed between the material and the second substrate, and a corrosion reducing layer is provided on the thin film layer in the second conductive coating and on the surface opposite to the polymer material. The process, including the method.
前記第2導電コーティングが、金属を含む層を含む、請求項18に記載の方法。 18. The method of claim 18, wherein the second conductive coating comprises a layer comprising a metal. 前記第2導電コーティングが、Ni、W、Mo、Ti、又はTaを含む層を含む、請求項18に記載の方法。 18. The method of claim 18, wherein the second conductive coating comprises a layer comprising Ni, W, Mo, Ti, or Ta. 前記第2導電コーティングが、Alを含む層上に提供されるMoを含む層を含む、請求項18に記載の方法。 18. The method of claim 18, wherein the second conductive coating comprises a layer containing Mo provided on top of the layer containing Al. 前記ポリマー材料が、PENを含む、請求項21に記載の方法。 21. The method of claim 21, wherein the polymer material comprises PEN. 前記ポリマー材料が、PIを含む、請求項21に記載の方法。 21. The method of claim 21, wherein the polymeric material comprises PI. 絶縁ガラス(IG)ユニット内で動的シェードを操作する方法であって、
請求項18に記載の方法に従って作製されたIGユニットを有する工程と、
前記シャッタ開位置と前記シャッタ閉位置との間で前記ポリマー材料を移動させるために、前記電源を選択的に作動させる工程と、を含む、方法。
A method of manipulating dynamic shades within an insulating glass (IG) unit.
A step having an IG unit manufactured according to the method of claim 18.
A method comprising the step of selectively actuating the power source to move the polymeric material between the shutter open position and the shutter closed position.
JP2020564588A 2018-07-06 2019-07-05 Potential Driven Shade with Improved Coil Strength, Method of Manufacture, and Method of Operation Active JP7232267B2 (en)

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US16/028,593 2018-07-06
US16/028,593 US10858884B2 (en) 2018-07-06 2018-07-06 Electric potentially-driven shade with improved coil strength, and/or method of making the same
PCT/IB2019/055760 WO2020008434A1 (en) 2018-07-06 2019-07-05 Electric potentially-driven shade with improved coil strength, method of making the same and method of operating the same

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JPWO2020008434A5 true JPWO2020008434A5 (en) 2022-06-07
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