JPWO2020008436A5 - - Google Patents

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JPWO2020008436A5
JPWO2020008436A5 JP2020564711A JP2020564711A JPWO2020008436A5 JP WO2020008436 A5 JPWO2020008436 A5 JP WO2020008436A5 JP 2020564711 A JP2020564711 A JP 2020564711A JP 2020564711 A JP2020564711 A JP 2020564711A JP WO2020008436 A5 JPWO2020008436 A5 JP WO2020008436A5
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main surface
shutter
roughened
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conductive film
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絶縁ガラス（ＩＧ）ユニットであって、
それぞれが内部主表面及び外部主表面を有する第１及び第２の基材であって、前記第１の基材の前記内部主表面が、前記第２の基材の前記内部主表面に面している、第１及び第２の基材と、
前記第１及び第２の基材を互いに対して実質的に平行に離間した関係に維持し、それらの間に間隙を画定するためのスペーサシステムと、
前記第１の基材と前記第２の基材との間に介在する動的に制御可能なシェードであって、
前記第１の基材の前記内部主表面上に直接又は間接的に設けられた第１導電膜と、
前記第１導電膜上に直接又は間接的に設けられた誘電体膜又は絶縁体膜と、
第２導電膜を支持するポリマー材料を含むシャッタであって、前記ポリマー材料が、シャッタ閉位置として機能するように伸長可能であり、且つシャッタ開位置として機能するように後退可能であり、ポリマー材料の第１主表面及び／又は第２主表面が、粗面化及び／又はテクスチャ加工されており、対応するように粗面化及び／又はテクスチャ加工された第１主表面及び／又は第２主表面を有していないシャッタと比較して、前記シャッタからの全反射の低減に寄与し、及び／又は拡散反射を促進し、前記第１主表面が前記第２導電コーティングに面している、シャッタと、を含む、シェードと、を備え、
前記第１導電膜及び第２導電膜は、前記シャッタ開位置と閉位置との間で前記ポリマー材料を相応に駆動するために電位差を選択的に設定するように制御可能な電源に電気的に接続可能である、絶縁ガラス（ＩＧ）窓ユニット。 Insulated glass (IG) unit,
The first and second base materials each have an inner main surface and an outer main surface, and the inner main surface of the first base material faces the inner main surface of the second base material. With the first and second base materials
A spacer system for maintaining the first and second substrates substantially parallel to each other and defining gaps between them.
A dynamically controllable shade intervening between the first substrate and the second substrate.
With the first conductive film provided directly or indirectly on the inner main surface of the first base material,
A dielectric film or an insulator film directly or indirectly provided on the first conductive film,
A shutter containing a polymer material that supports the second conductive film, wherein the polymer material can be extended to function as a shutter closed position and retractable to function as a shutter open position, and is a polymer material. The first main surface and / or the second main surface of the above is roughened and / or textured, and the first main surface and / or the second main surface is correspondingly roughened and / or textured. Compared to a shutter having no surface, it contributes to the reduction of total reflection from the shutter and / or promotes diffuse reflection, and the first main surface faces the second conductive coating. With a shutter, including a shade,
The first and second conductive films are electrically connected to a power source that can be controlled to selectively set a potential difference to appropriately drive the polymer material between the shutter open position and the shutter closed position. Insulated glass (IG) window unit that can be connected. 前記第２導電膜の粗面化及び／若しくはテクスチャ加工された上面が、３．２μｍ未満の粗さ（Ｒａ）を有する、請求項１に記載のＩＧユニット。 The IG unit according to claim 1, wherein the roughened and / or textured upper surface of the second conductive film has a roughness (Ra) of less than 3.2 μm. 前記ポリマー基材の両方の主表面が、粗面化及び／又はテクスチャ加工されている、請求項１に記載のＩＧユニット。 The IG unit according to claim 1, wherein both main surfaces of the polymer substrate are roughened and / or textured. 前記第１主表面が粗面化及び／又はテクスチャ加工されるが、前記第２主表面はされていない、請求項１に記載のＩＧユニット。 The IG unit according to claim 1, wherein the first main surface is roughened and / or textured, but the second main surface is not. 前記第２主表面が粗面化及び／又はテクスチャ加工されるが、前記第１主表面はされていない、請求項１に記載のＩＧユニット。 The IG unit according to claim 1, wherein the second main surface is roughened and / or textured, but the first main surface is not. 前記第１主表面及び／又は第２主表面が、既定のパターンでテクスチャ加工を有するようにパターン化されている、請求項１に記載のＩＧユニット。 The IG unit according to claim 1, wherein the first main surface and / or the second main surface is patterned so as to have texture processing in a predetermined pattern. 前記既定のパターンが、前記ポリマー材料にわたって延在するフラクタルパターンを含む、請求項６に記載のＩＧユニット。 The IG unit of claim 6, wherein the predetermined pattern comprises a fractal pattern that extends over the polymer material. 前記既定のパターンが、前記ポリマー材料に付与されるテクスチャ加工の特徴に関して少なくとも部分的に定義される、請求項６に記載のＩＧユニット。 The IG unit of claim 6, wherein the predetermined pattern is at least partially defined with respect to the texture processing characteristics imparted to the polymer material. 絶縁ガラス（ＩＧ）ユニットの製造方法であって、
それぞれが内部主表面及び外部主表面を有する、第１及び第２の基材を提供する工程と、
前記第１の基材の前記内部主表面上に直接又は間接的に第１導電膜を形成する工程と、
前記第１導電膜上に直接又は間接的に誘電体膜又は絶縁体膜を提供する工程と、
前記誘電体膜又は絶縁体膜に隣接して、第２導電膜を支持するポリマー材料を含むシャッタを配置する工程であって、使用中の前記ポリマー材料は、シャッタ閉位置として機能するように伸長可能であり、且つシャッタ開位置として機能するように後退可能であり、ポリマー材料の第１主表面及び／又は第２主表面が粗面化及び／又はテクスチャ加工されており、対応するように粗面化及び／又はテクスチャ加工された第１主表面及び／又は第２主表面を有していないシャッタと比較して、前記シャッタからの全反射の低減に寄与し、及び／又は拡散反射を促進し、前記第１主表面が前記第２導電コーティングに面している、工程と、
前記第１導電膜及び第２導電膜を電源に電気的に接続する工程であって、前記第１導電膜、誘電体膜又は絶縁体膜、及びシャッタが、前記電源と関連して制御可能な動的シェードを少なくとも部分的に形成して、電位差を選択的に設定し、それに応じて、前記シャッタ開位置と前記シャッタ閉鎖位置との間で前記ポリマー材料を駆動する、工程と、
前記第１及び第２の基材を、前記ＩＧユニットを作製する際に、前記第１及び第２の基材の前記内面が互いに対向するように、前記第１及び第２の基材を互いに実質的に平行に離間させた関係でスペーサシステムに関連して互いに接続する工程であって、前記第１及び第２の基材の間に間隙が画定され、前記間隙内の前記第１の基材と前記第２の基材との間に前記動的シェードが介在する、工程と、を含む、方法。 It is a manufacturing method of an insulating glass (IG) unit.
A step of providing first and second substrates, each having an inner main surface and an outer main surface.
A step of directly or indirectly forming a first conductive film on the internal main surface of the first base material, and a step of forming the first conductive film.
A step of directly or indirectly providing a dielectric film or an insulator film on the first conductive film,
In a step of arranging a shutter containing a polymer material supporting the second conductive film adjacent to the dielectric film or the insulator film, the polymer material in use is elongated so as to function as a shutter closing position. It is possible and retractable to function as a shutter open position, and the first and / or second main surface of the polymer material is roughened and / or textured and correspondingly roughened. Contributes to reducing total reflections from said shutters and / or promotes diffuse reflections compared to shutters that do not have surfaced and / or textured first and / or second main surfaces. The process, wherein the first main surface faces the second conductive coating.
In the step of electrically connecting the first conductive film and the second conductive film to the power source, the first conductive film, the dielectric film or the insulator film, and the shutter can be controlled in relation to the power source. A step of forming a dynamic shade at least partially to selectively set the potential difference and thereby driving the polymer material between the shutter open position and the shutter closed position.
When the IG unit is made of the first and second base materials, the first and second base materials are placed on each other so that the inner surfaces of the first and second base materials face each other. A step of connecting to each other in connection with a spacer system in a substantially parallel spacing, wherein a gap is defined between the first and second substrates and the first group in the gap. A method comprising the steps of interposing the dynamic shade between the material and the second substrate. 前記第２導電膜の粗面化及び／若しくはテクスチャ加工された上面が、３．２μｍ未満の粗さ（Ｒａ）を有する、請求項９に記載の方法。 The method according to claim 9, wherein the roughened and / or textured upper surface of the second conductive film has a roughness (Ra) of less than 3.2 μm. 前記ポリマー基材の両方の主表面が、粗面化及び／又はテクスチャ加工される、請求項９に記載の方法。 9. The method of claim 9, wherein both main surfaces of the polymer substrate are roughened and / or textured. 前記第１主表面及び前記第２主表面のうちの１つのみが粗面化及び／又はテクスチャ加工される、請求項９に記載の方法。 The method of claim 9, wherein only one of the first main surface and the second main surface is roughened and / or textured. 前記第１主表面及び／又は前記第２主表面が、既定のパターンでテクスチャ加工を有するようにパターン化される、請求項９に記載の方法。 9. The method of claim 9, wherein the first main surface and / or the second main surface is patterned to have texture processing in a predetermined pattern. 前記既定のパターンが、前記ポリマー材料に付与されるテクスチャ加工の特徴に関して少なくとも部分的に定義される、請求項１３に記載の方法。 13. The method of claim 13, wherein the predetermined pattern is at least partially defined with respect to the texture processing characteristics imparted to the polymeric material. 前記既定のパターンが、カレンダー加工中に前記ポリマー材料に付与される、請求項１３に記載の方法。 13. The method of claim 13, wherein the predetermined pattern is applied to the polymeric material during calendar processing. 前記第１主表面がテクスチャ加工され、且つ／又は粗面化され、前記第２導電層が、前記第１主表面に対して概ね共形であるように形成される、請求項９に記載の方法。 The ninth aspect of the present invention, wherein the first main surface is textured and / or roughened, and the second conductive layer is formed so as to be substantially conformal to the first main surface. Method. 絶縁ガラス（ＩＧ）ユニットの製造方法であって、
それぞれが内部主表面及び外部主表面を有する、第１及び第２の基材を有する工程であって、前記第１の基材の前記内部主表面が、前記第２の基材の前記内部主表面に面しており、
前記第１の基材の前記内部主表面上に直接又は間接的に第１導電膜が形成され、前記第１導電膜上に直接又は間接的に誘電体膜又は絶縁体膜が設けられ、
前記誘電体膜又は絶縁体膜に隣接してシャッタが配置され、前記シャッタは、第２導電膜を支持するポリマー材料を含み、使用中の前記ポリマー材料は、シャッタ閉位置として機能するように伸長可能であり、且つシャッタ開位置として機能するように後退可能であり、ポリマー材料の第１主表面及び／又は第２主表面は、粗面化及び／又はテクスチャ加工されており、対応するように粗面化され、及び／又はテクスチャ加工された第１主表面及び／又は第２主表面を有していないシャッタと比較して、前記シャッタからの全反射の低減に寄与し、及び／又は拡散反射を促進し、前記第１主表面は前記第２の導電コーティングに面しており、
前記第１及び第２導電膜が電源に電気的に接続可能であり、前記第１導電膜、誘電体膜又は絶縁体膜、及びシャッタが、前記電源と関連して制御可能な動的シェードを少なくとも部分的に形成して、電位差を選択的に設定し、それに応じて、前記シャッタ開位置と前記シャッタ閉位置との間で前記ポリマー材料を駆動する、工程と、
前記第１及び第２の基材を、前記ＩＧユニットを作製する際に、前記第１及び第２の基材の前記内面が互いに対向するように、前記第１及び第２の基材を互いに実質的に平行に離間させた関係でスペーサシステムに関連して互いに接続する工程であって、前記第１及び第２の基材の間に間隙が画定され、前記間隙内の前記第１の基材と前記第２の基材との間に前記動的シェードが介在する、工程と、を含む、方法。 It is a manufacturing method of an insulating glass (IG) unit.
A step having first and second substrates, each having an inner main surface and an outer main surface, wherein the inner main surface of the first substrate is the internal main of the second substrate. Facing the surface,
The first conductive film is directly or indirectly formed on the internal main surface of the first substrate, and the dielectric film or the insulator film is directly or indirectly provided on the first conductive film.
A shutter is placed adjacent to the dielectric or insulator membrane, the shutter contains a polymer material that supports the second conductive film, and the polymer material in use is stretched to function as a shutter closed position. Possible and retractable to function as a shutter open position, the first and / or second main surface of the polymer material is roughened and / or textured to accommodate. Contributes to reducing total reflection from said shutter and / or diffuses compared to shutters that do not have a roughened and / or textured first and / or second main surface. To promote reflection, the first main surface faces the second conductive coating.
The first and second conductive films are electrically connectable to a power source, and the first conductive film, a dielectric film or an insulator film, and a shutter provide a controllable dynamic shade in connection with the power source. A step of forming at least partially to selectively set the potential difference and thereby driving the polymer material between the shutter open position and the shutter closed position.
When the IG unit is made of the first and second base materials, the first and second base materials are placed on each other so that the inner surfaces of the first and second base materials face each other. A step of connecting to each other in connection with a spacer system in a substantially parallel spacing, wherein a gap is defined between the first and second substrates and the first group in the gap. A method comprising the steps of interposing the dynamic shade between the material and the second substrate. 前記ポリマー基材の両方の主表面が、粗面化及び／又はテクスチャ加工される、請求項１７に記載の方法。 17. The method of claim 17, wherein both main surfaces of the polymer substrate are roughened and / or textured. 前記第１主表面及び／又は前記第２主表面が、既定のパターンでテクスチャ加工を有するようにパターン化され、前記既定のパターンが、前記ポリマー材料に付与されるテクスチャ加工の特徴に関して少なくとも部分的に定義される、請求項１７に記載の方法。 The first main surface and / or the second main surface is patterned to have texture processing in a predetermined pattern, and the predetermined pattern is at least partial with respect to the texture processing characteristics imparted to the polymer material. 17. The method of claim 17. 前記既定のパターンが、カレンダー加工中に前記ポリマー材料に付与される、請求項１９に記載の方法。 19. The method of claim 19, wherein the predetermined pattern is applied to the polymeric material during calendar processing. 前記第１主表面がテクスチャ加工及び／又は粗面化され、前記第２導電層が、前記第１主表面に対して概ね共形であるように形成される、請求項１９に記載の方法。 19. The method of claim 19, wherein the first main surface is textured and / or roughened, and the second conductive layer is formed so as to be substantially conformal to the first main surface. 絶縁ガラス（ＩＧ）ユニット内で動的シェードを操作する方法であって、
請求項１９に記載の方法に従って作製されたＩＧユニットを有する工程と、
前記シャッタ開位置と前記シャッタ閉位置との間で前記ポリマー材料を移動させるために、前記電源を選択的に作動させる工程と、を含む、方法。 A method of manipulating dynamic shades within an insulating glass (IG) unit.
A step having an IG unit manufactured according to the method of claim 19.
A method comprising the step of selectively actuating the power source to move the polymeric material between the shutter open position and the shutter closed position.
JP2020564711A 2018-07-06 2019-07-05 Potential Driven Shade Including Shutters Supporting Surface Modified Conductive Coatings, Methods of Manufacture, and Methods of Operation Active JP7185707B2 (en)

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Application Number Priority Date Filing Date Title
US16/028,578 2018-07-06
US16/028,578 US10927592B2 (en) 2018-07-06 2018-07-06 Electric potentially-driven shade with surface-modified polymer, and/or method of making the same
PCT/IB2019/055764 WO2020008436A1 (en) 2018-07-06 2019-07-05 Electric potentially-driven shade including shutter supporting surface-modified conductive coating, methods of making the same and method of operating the same

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JP2021529145A JP2021529145A (en) 2021-10-28
JPWO2020008436A5 true JPWO2020008436A5 (en) 2022-06-07
JP7185707B2 JP7185707B2 (en) 2022-12-07

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