JPWO2019189717A1 - Method for producing tetrahydronaphthylurea derivative - Google Patents
Method for producing tetrahydronaphthylurea derivative Download PDFInfo
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- JPWO2019189717A1 JPWO2019189717A1 JP2020511064A JP2020511064A JPWO2019189717A1 JP WO2019189717 A1 JPWO2019189717 A1 JP WO2019189717A1 JP 2020511064 A JP2020511064 A JP 2020511064A JP 2020511064 A JP2020511064 A JP 2020511064A JP WO2019189717 A1 JPWO2019189717 A1 JP WO2019189717A1
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 103
- PLSFSIDDNZKALV-UHFFFAOYSA-N 1,2,3,4-tetrahydronaphthalen-1-ylurea Chemical class C1=CC=C2C(NC(=O)N)CCCC2=C1 PLSFSIDDNZKALV-UHFFFAOYSA-N 0.000 title description 8
- 150000001875 compounds Chemical class 0.000 claims abstract description 201
- 239000002904 solvent Substances 0.000 claims description 155
- 238000006243 chemical reaction Methods 0.000 claims description 152
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 117
- -1 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl Chemical group 0.000 claims description 110
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 84
- 239000010936 titanium Substances 0.000 claims description 80
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 70
- 229910052719 titanium Inorganic materials 0.000 claims description 68
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 66
- 239000011259 mixed solution Substances 0.000 claims description 64
- 125000001424 substituent group Chemical group 0.000 claims description 55
- 238000000034 method Methods 0.000 claims description 53
- 239000000243 solution Substances 0.000 claims description 45
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 claims description 36
- 239000007853 buffer solution Substances 0.000 claims description 33
- 239000003054 catalyst Substances 0.000 claims description 32
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 30
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 claims description 27
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 claims description 27
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 27
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 27
- 125000003545 alkoxy group Chemical group 0.000 claims description 26
- 238000010992 reflux Methods 0.000 claims description 26
- 125000005843 halogen group Chemical group 0.000 claims description 24
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 22
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 19
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 19
- 239000003795 chemical substances by application Substances 0.000 claims description 18
- 125000004454 (C1-C6) alkoxycarbonyl group Chemical group 0.000 claims description 16
- 125000005392 carboxamide group Chemical group NC(=O)* 0.000 claims description 15
- 239000003446 ligand Substances 0.000 claims description 15
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 239000004202 carbamide Substances 0.000 claims description 13
- 150000007530 organic bases Chemical class 0.000 claims description 13
- LJCZNYWLQZZIOS-UHFFFAOYSA-N 2,2,2-trichlorethoxycarbonyl chloride Chemical compound ClC(=O)OCC(Cl)(Cl)Cl LJCZNYWLQZZIOS-UHFFFAOYSA-N 0.000 claims description 12
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 12
- 238000007789 sealing Methods 0.000 claims description 12
- 125000005236 alkanoylamino group Chemical group 0.000 claims description 11
- 239000000460 chlorine Substances 0.000 claims description 11
- 125000004797 2,2,2-trichloroethoxy group Chemical group ClC(CO*)(Cl)Cl 0.000 claims description 10
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 10
- PFKFTWBEEFSNDU-UHFFFAOYSA-N carbonyldiimidazole Chemical compound C1=CN=CN1C(=O)N1C=CN=C1 PFKFTWBEEFSNDU-UHFFFAOYSA-N 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 10
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 9
- 239000003960 organic solvent Substances 0.000 claims description 8
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 claims description 7
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 7
- 239000004327 boric acid Substances 0.000 claims description 7
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 7
- 229960005235 piperonyl butoxide Drugs 0.000 claims description 7
- IKNCGYCHMGNBCP-UHFFFAOYSA-N propan-1-olate Chemical compound CCC[O-] IKNCGYCHMGNBCP-UHFFFAOYSA-N 0.000 claims description 7
- XOFZPIYYMJUNRG-UHFFFAOYSA-N (4-methylphenyl) carbonochloridate Chemical compound CC1=CC=C(OC(Cl)=O)C=C1 XOFZPIYYMJUNRG-UHFFFAOYSA-N 0.000 claims description 6
- AHWALFGBDFAJAI-UHFFFAOYSA-N phenyl carbonochloridate Chemical compound ClC(=O)OC1=CC=CC=C1 AHWALFGBDFAJAI-UHFFFAOYSA-N 0.000 claims description 6
- 239000002798 polar solvent Substances 0.000 claims description 6
- UCPYLLCMEDAXFR-UHFFFAOYSA-N triphosgene Chemical compound ClC(Cl)(Cl)OC(=O)OC(Cl)(Cl)Cl UCPYLLCMEDAXFR-UHFFFAOYSA-N 0.000 claims description 5
- RPQYCMCKMNBEGL-UHFFFAOYSA-N CC=1C=CC(=NC1C=1C=NC(=NC1)C)C1=CC=CC=C1 Chemical compound CC=1C=CC(=NC1C=1C=NC(=NC1)C)C1=CC=CC=C1 RPQYCMCKMNBEGL-UHFFFAOYSA-N 0.000 claims description 4
- 229940069078 citric acid / sodium citrate Drugs 0.000 claims description 4
- 125000002962 imidazol-1-yl group Chemical group [*]N1C([H])=NC([H])=C1[H] 0.000 claims description 4
- 125000004784 trichloromethoxy group Chemical group ClC(O*)(Cl)Cl 0.000 claims description 4
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims description 3
- HCUYBXPSSCRKRF-UHFFFAOYSA-N diphosgene Chemical compound ClC(=O)OC(Cl)(Cl)Cl HCUYBXPSSCRKRF-UHFFFAOYSA-N 0.000 claims description 3
- 239000008055 phosphate buffer solution Substances 0.000 claims description 3
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 claims description 2
- NXLNNXIXOYSCMB-UHFFFAOYSA-N (4-nitrophenyl) carbonochloridate Chemical compound [O-][N+](=O)C1=CC=C(OC(Cl)=O)C=C1 NXLNNXIXOYSCMB-UHFFFAOYSA-N 0.000 claims 2
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 87
- 150000003839 salts Chemical class 0.000 description 71
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 57
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 55
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 54
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 48
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 45
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 45
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 42
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 38
- 230000036961 partial effect Effects 0.000 description 35
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 33
- 230000003287 optical effect Effects 0.000 description 29
- 239000000872 buffer Substances 0.000 description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 28
- 238000006467 substitution reaction Methods 0.000 description 25
- NLZXHRIIPLQJIX-UHFFFAOYSA-N 1,1-dimethyl-2h-naphthalene Chemical compound C1=CC=C2C(C)(C)CC=CC2=C1 NLZXHRIIPLQJIX-UHFFFAOYSA-N 0.000 description 24
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 24
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 23
- 239000002253 acid Substances 0.000 description 22
- 238000003786 synthesis reaction Methods 0.000 description 22
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 21
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 20
- 239000012046 mixed solvent Substances 0.000 description 20
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 19
- 239000002585 base Substances 0.000 description 19
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 18
- 239000000126 substance Substances 0.000 description 18
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 18
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 16
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 16
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 16
- 239000012044 organic layer Substances 0.000 description 16
- 239000008363 phosphate buffer Substances 0.000 description 16
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 16
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 15
- 238000005160 1H NMR spectroscopy Methods 0.000 description 14
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 14
- 125000000217 alkyl group Chemical group 0.000 description 14
- 230000002829 reductive effect Effects 0.000 description 14
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 14
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 13
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 12
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 12
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 12
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 12
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 12
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 12
- 235000001014 amino acid Nutrition 0.000 description 11
- 150000001413 amino acids Chemical class 0.000 description 11
- 230000014759 maintenance of location Effects 0.000 description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 11
- 230000035484 reaction time Effects 0.000 description 11
- 239000011734 sodium Substances 0.000 description 11
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 10
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 10
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 10
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 10
- 0 CC(C)(CC(C1N)O)C2=C1C=CC(C)(*)C=C2 Chemical compound CC(C)(CC(C1N)O)C2=C1C=CC(C)(*)C=C2 0.000 description 9
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 9
- 150000007524 organic acids Chemical class 0.000 description 9
- 238000004704 ultra performance liquid chromatography Methods 0.000 description 9
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 8
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 8
- 230000002378 acidificating effect Effects 0.000 description 8
- 238000010575 fractional recrystallization Methods 0.000 description 8
- 229910000027 potassium carbonate Inorganic materials 0.000 description 8
- 229910000029 sodium carbonate Inorganic materials 0.000 description 8
- 239000012312 sodium hydride Substances 0.000 description 8
- 229910000104 sodium hydride Inorganic materials 0.000 description 8
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 8
- SZVVOKIABLDILY-UHFFFAOYSA-N CC=1C=C(C(=NC=1C=1C=NC(=NC=1)C)C1=CC=CC=C1)N Chemical compound CC=1C=C(C(=NC=1C=1C=NC(=NC=1)C)C1=CC=CC=C1)N SZVVOKIABLDILY-UHFFFAOYSA-N 0.000 description 7
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 7
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 7
- 235000011054 acetic acid Nutrition 0.000 description 7
- 239000003153 chemical reaction reagent Substances 0.000 description 7
- 238000001914 filtration Methods 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 125000001153 fluoro group Chemical group F* 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 238000009776 industrial production Methods 0.000 description 7
- 150000007529 inorganic bases Chemical class 0.000 description 7
- DVSDBMFJEQPWNO-UHFFFAOYSA-N methyllithium Chemical compound C[Li] DVSDBMFJEQPWNO-UHFFFAOYSA-N 0.000 description 7
- 150000007522 mineralic acids Chemical class 0.000 description 7
- 229910052708 sodium Inorganic materials 0.000 description 7
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 7
- 235000017557 sodium bicarbonate Nutrition 0.000 description 7
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 7
- DCTOHCCUXLBQMS-UHFFFAOYSA-N 1-undecene Chemical compound CCCCCCCCCC=C DCTOHCCUXLBQMS-UHFFFAOYSA-N 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 6
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 6
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 6
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 150000008282 halocarbons Chemical class 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 239000000543 intermediate Substances 0.000 description 6
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 6
- YNESATAKKCNGOF-UHFFFAOYSA-N lithium bis(trimethylsilyl)amide Chemical compound [Li+].C[Si](C)(C)[N-][Si](C)(C)C YNESATAKKCNGOF-UHFFFAOYSA-N 0.000 description 6
- 229940098779 methanesulfonic acid Drugs 0.000 description 6
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C213/00—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
- C07C213/04—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reaction of ammonia or amines with olefin oxides or halohydrins
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C215/00—Compounds containing amino and hydroxy groups bound to the same carbon skeleton
- C07C215/42—Compounds containing amino and hydroxy groups bound to the same carbon skeleton having amino groups or hydroxy groups bound to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton
- C07C215/44—Compounds containing amino and hydroxy groups bound to the same carbon skeleton having amino groups or hydroxy groups bound to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton bound to carbon atoms of the same ring or condensed ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
Abstract
式(I)で表される化合物の新規な製造方法を提供する。本願発明は、式(I)で表される化合物の製造方法、及び式(I)で表される化合物を製造の為の中間体である式(EP−1)で表される化合物並びに式(AM−X)で表される化合物の製造方法が提供される。Provided is a novel method for producing a compound represented by the formula (I). The present invention describes a method for producing a compound represented by the formula (I), a compound represented by the formula (EP-1) which is an intermediate for producing the compound represented by the formula (I), and a formula ( A method for producing a compound represented by AM-X) is provided.
Description
本発明は、下記Scheme 7の式(I)で表されるトロポミオシン受容体キナーゼA(TrkA)阻害作用を有するテトラヒドロナフチルウレア誘導体の製造方法、及び式(I)で表される化合物を製造する為の中間体である式(EP−1)で表される化合物並びに式(AM−X)で表される化合物の製造方法に関する。 The present invention is for producing a method for producing a tetrahydronaphthylurea derivative having a tropomyosin receptor kinase A (TrkA) inhibitory action represented by the following Cheme 7 formula (I), and for producing a compound represented by the formula (I). The present invention relates to a compound represented by the formula (EP-1), which is an intermediate of the above, and a method for producing a compound represented by the formula (AM-X).
式(I)で表されるテトラヒドロナフチルウレア誘導体は、式(AM−1)で表されるアミノ化合物、及び式(AM−2−RRS)で表されるアミン塩を用いる、ウレア化反応により製造されている(Scheme 1)(特許文献1)。 The tetrahydronaphthylurea derivative represented by the formula (I) is produced by a urea conversion reaction using an amino compound represented by the formula (AM-1) and an amine salt represented by the formula (AM-2-RRS). (Scheme 1) (Patent Document 1).
式(AM−2−RRS)で表わされるアミン塩は、(Scheme 2)に示すように、式(TH−1)で表わされる化合物を出発原料として、2工程を経て得られる式(RAM−2)で表わされる化合物を、D−酒石酸により式(RAM−2−S)で表わされる塩へ変換した後、分別再結晶により製造ができる。 As shown in (Scheme 2), the amine salt represented by the formula (AM-2-RRS) is obtained through two steps using the compound represented by the formula (TH-1) as a starting material (RAM-2). ) Is converted to a salt represented by the formula (RAM-2-S) with D-tartaric acid, and then the compound can be produced by fractional recrystallization.
前記分別再結晶を用いる製造法は、式(AM−2−RRS)が光学純度の高い化合物として得られる点で優れているものの、分割後の他の異性体(例えば、(1S,2S)体、等)の再利用が難しい点が課題であり、式(I)で表わされる化合物の大量合成又は工業的生産においては、その改良製法が求められる。即ち、式(I)で表わされる化合物の大量合成もしくは工業的生産を考えた場合には、式(AM−2−RRS)で表わされるアミン塩を用いる製造方法とは異なる新規な製造方法を見出すことが求められており、特に、式(AM−2−RRS)で表わされるアミン塩に代わるScheme 1のウレア化反応で使用し得るアミン塩であって、式(AM−2−RRS)に比べて分別再結晶後の他の異性体の再利用が容易な化合物が求められている。 Although the production method using the fractional recrystallization is excellent in that the formula (AM-2-RRS) can be obtained as a compound having high optical purity, other isomers after division (for example, (1S, 2S)) are obtained. , Etc.) is a problem that it is difficult to reuse the compound, and an improved production method thereof is required for mass synthesis or industrial production of the compound represented by the formula (I). That is, when considering mass synthesis or industrial production of the compound represented by the formula (I), a novel manufacturing method different from the manufacturing method using an amine salt represented by the formula (AM-2-RRS) is found. In particular, it is an amine salt that can be used in the urea conversion reaction of Cheme 1 instead of the amine salt represented by the formula (AM-2-RRS), and is compared with the formula (AM-2-RRS). There is a demand for a compound that can easily reuse other isomers after fractional recrystallization.
式(AM−2−RRS)で表わされるアミン塩の等価体の1つである、下記式(AM−X)においてp=0の化合物である、(1R,2R)−1−アミノ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−2−オールは、国際公開第2014/078454(p165、IntermediateX2)にて、その製造方法が開示されている。しかし、当該製造方法は、式(RAM−2)で表わされる化合物のキラルカラムを用いたカラム分割方法であることから、当該方法を用いた場合でも対応する異性体(式(AM−Y))の再利用が出来ない点で、当該製法も前記課題が解決できていない製法であり、又、式(AM−X)で表わされる化合物を大量合成又は工業的生産できる製造方法ではない(Schem 3)。(特許文献2) (1R, 2R) -1-amino-4, which is one of the equivalents of the amine salt represented by the formula (AM-2-RRS) and is a compound having p = 0 in the following formula (AM-X). A method for producing 4-dimethyl-1,2,3,4-tetrahydronaphthalene-2-ol is disclosed in International Publication No. 2014/078454 (p165, IntermediateX2). However, since the production method is a column division method using a chiral column of the compound represented by the formula (RAM-2), the corresponding isomer (formula (AM-Y)) can be obtained even when the method is used. In that it cannot be reused, the production method is also a production method for which the above-mentioned problems have not been solved, and is not a production method capable of mass-synthesizing or industrially producing a compound represented by the formula (AM-X) (Schem 3). .. (Patent Document 2)
よって、式(AM−X)で表わされる化合物を高収率かつ高光学純度で大量合成する製造方法は、未だ知られてないことから、式(AM−X)で表わされる化合物を短工程、高い化学収率、かつ高い光学純度で大量合成する製造方法を見出すことができれば、上記課題が解決できると考えられる。更に(Scheme 4)に示される、式(AM−X)で表される化合物を用いる新規製造方法により、式(I)の化合物を大量又は工業的生産レベルで得ることが可能となり、その方法が望まれていた。 Therefore, since a production method for mass-synthesizing the compound represented by the formula (AM-X) in high yield and high optical purity is not yet known, the compound represented by the formula (AM-X) can be prepared in a short step. It is considered that the above-mentioned problems can be solved if a manufacturing method for mass synthesis with high chemical yield and high optical purity can be found. Further, a new production method using a compound represented by the formula (AM-X) represented by (Scheme 4) makes it possible to obtain the compound of the formula (I) in a large amount or at an industrial production level. It was desired.
[Scheme 4中、p、R1、Y及び環Aは、後述する本発明の第1の態様中に定義されている基と同じ基である][In Schema 4, p, R 1 , Y and ring A are the same groups as those defined in the first aspect of the invention described below].
下記(Scheme 5)に示されるように、式(AM−X)で表わされる化合物の合成中間体になり得る式(EP−1)で表わされる化合物の合成法が、Chemistry Letters,(11),P2231-4,1992年(非特許文献1)、又はBulletin of the Chemical Society of Japan,67(8),p2248-56,1994年(非特許文献2)に開示されている。しかし、当該合成法は、酸素ガス、マンガン触媒を用いた酸化反応であり大量合成に好適ではなく、更に、化学収率が35%と低く、光学純度も63%と医薬品原料として用いるには低いことから、式(AM−X)で表わされる化合物の大量合成もしくは工業的生産においては、本反応条件は用いられない。又、式(EP−1)を用いた式(AM−X)への不斉アミノヒドロキシル化反応は、知られていない。(但し、前記式(AM−X)、(EP−1)、及び式(REP−1)においてp=0である) As shown in the following (Scheme 5), a method for synthesizing a compound represented by the formula (EP-1), which can be a synthetic intermediate for the compound represented by the formula (AM-X), is Chemistry Letters, (11), It is disclosed in P2231-4, 1992 (Non-Patent Document 1), or Bulletin of the Chemical Society of Japan, 67 (8), p2248-56, 1994 (Non-Patent Document 2). However, the synthesis method is an oxidation reaction using an oxygen gas or a manganese catalyst and is not suitable for mass synthesis. Furthermore, the chemical yield is as low as 35% and the optical purity is as low as 63%, which is low for use as a pharmaceutical raw material. Therefore, this reaction condition is not used in the mass synthesis or industrial production of the compound represented by the formula (AM-X). Moreover, the asymmetric aminohydroxylation reaction to the formula (AM-X) using the formula (EP-1) is not known. (However, p = 0 in the above formulas (AM-X), (EP-1), and formula (REP-1))
尚、本発明の式(TH−1)で表わされる化合物とは異なるが、式(TH−2)で表わされる化合物(式(TH−1)において、P=0、1,2−ジヒドロナフタレン環の1位のジメチル基を除去した化合物)に対して、過酸化水素及びチタン触媒を用いる酸化反応が、Synlett,20,p3545-3547,2006年(非特許文献3)、又はSynlett,15,p2445-2447,2007年(非特許文献4)に開示されている(Scheme 6)。 Although different from the compound represented by the formula (TH-1) of the present invention, the compound represented by the formula (TH-2) (in the formula (TH-1), P = 0, 1,2-dihydronaphthalene ring). The oxidation reaction using hydrogen peroxide and a titanium catalyst with respect to the compound from which the dimethyl group at the 1-position of the above was removed was Synlett, 20, p3545-3547, 2006 (Non-Patent Document 3), or Synlett, 15, p2445. -2447, disclosed in 2007 (Non-Patent Document 4) (Scheme 6).
式(I)で表されるテトラヒドロナフチルウレア誘導体の大量合成もしくは工業的生産に適した効率的な製造方法、とりわけ、当該誘導体の大量合成もしくは工業的生産するにあたり、前記式(RAM−2)で表される化合物の分別再結晶法を経由する式(I)で表される化合物の製造方法とは異なる、即ち、式(AM−X)で表される化合物を用いる、式(I)で表される化合物の新規な製造方法の提供、及び式(AM−X)で表される化合物を高化学収率かつ高光学純度で大量合成する製造方法の提供を目的とする。 An efficient production method suitable for mass synthesis or industrial production of the tetrahydronaphthylurea derivative represented by the formula (I), particularly in the mass synthesis or industrial production of the derivative, the above formula (RAM-2) is used. It is represented by the formula (I), which is different from the method for producing the compound represented by the formula (I) via the fractional recrystallization method of the represented compound, that is, the compound represented by the formula (AM-X) is used. An object of the present invention is to provide a novel production method for the compound to be used, and a production method for mass-synthesizing a compound represented by the formula (AM-X) with high chemical yield and high optical purity.
本発明者らは、上記の課題を解決すべく、鋭意研究を重ねてきた。その結果、下記(Scheme 7)にて、式(TH−1)で表される化合物を出発物質とし、過酸化水素を酸素源とする、チタン触媒を用いる、不斉エポキシ化反応を行うことで、式(EP−1)で表わされる望む立体配置を有するエポキシ化合物を高化学収率かつ高光学純度で得られることを見出した。又、続く、アミノヒドロキシル化反応により式(AM−X)で表される化合物を、高化学収率かつ高光学純度で得られることを見出した。これら連続する反応により、式(AM−X)の化合物の異性体の生成を抑制できた、式(AM−X)の化合物の製造方法を見出した。更に、式(AM−1)で表されるアミノ化合物から導かれる式(CB−1)の化合物とのウレア化反応により、化学収率良く、高い光学純度で、短工程にて、かつ容易に下記式(I)で表されるテトラヒドロナフチルウレア誘導体を製造する方法を見出し、これら知見に基づいて本発明を完成するに至った。 The present inventors have conducted extensive research in order to solve the above problems. As a result, in the following (Scheme 7), an asymmetric epoxidation reaction is carried out using a compound represented by the formula (TH-1) as a starting material, hydrogen peroxide as an oxygen source, and a titanium catalyst. , It has been found that an epoxy compound having a desired configuration represented by the formula (EP-1) can be obtained with a high chemical yield and high optical purity. Further, it has been found that the compound represented by the formula (AM-X) can be obtained with high chemical yield and high optical purity by the subsequent aminohydroxylation reaction. We have found a method for producing a compound of formula (AM-X), which can suppress the formation of isomers of the compound of formula (AM-X) by these continuous reactions. Furthermore, due to the urea conversion reaction with the compound of the formula (CB-1) derived from the amino compound represented by the formula (AM-1), the chemical yield is good, the optical purity is high, the process is short, and the process is easy. A method for producing a tetrahydronaphthylurea derivative represented by the following formula (I) has been found, and the present invention has been completed based on these findings.
[Scheme 7中、p、R1、Yは及び環Aは、後述する本発明の第1の態様中に定義されている基と同じ基である][In Schema 7, p, R 1 , Y and ring A are the same groups as those defined in the first aspect of the invention described below].
本明細書において環Aの構造は下記式:5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基である。
In the present specification, the structure of ring A is the following formula: 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl group.
本発明は、式(I)で表されるトロポミオシン受容体キナーゼA(TrkA)阻害作用を有するテトラヒドロナフチルウレア誘導体の製造方法、及び式(AM−X)で表される(1R,2R)−1−アミノ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−2−オール誘導体の高収率かつ高光学純度で大量合成する製造方法に関する。本発明は、下記式(I)で表されるトロポミオシン受容体キナーゼA(TrkA)阻害作用を有するテトラヒドロナフチルウレア誘導体の製造に使用される中間体を、化学収率良く、高い光学活性純度で、短工程、容易、かつ工業的に有利な方法で製造する新規な方法を提供することができ、産業上の有用性が高い。 The present invention relates to a method for producing a tetrahydronaphthylurea derivative having a tropomyosin receptor kinase A (TrkA) inhibitory action represented by the formula (I), and (1R, 2R) -1 represented by the formula (AM-X). The present invention relates to a production method for mass-synthesizing a −amino-4,4-dimethyl-1,2,3,4-tetrahydronaphthalene-2-ol derivative with high yield and high optical purity. The present invention uses an intermediate used in the production of a tetrahydronaphthylurea derivative having a tropomyosin receptor kinase A (TrkA) inhibitory action represented by the following formula (I) with good chemical yield and high optical activity purity. It is possible to provide a novel method for manufacturing in a short process, easily, and in an industrially advantageous method, and is highly industrially useful.
本発明は、以下の態様に示される下記式(I)で表されるテトラヒドロナフチルウレア誘導体、式(AM−X)で表される(1R,2R)−1−アミノ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−2−オール誘導体、及び式(EP−1)で表されるエポキシ誘導体の製造方法に関する。より具体的に、本発明の例示的な態様は、以下の〔1〕〜〔5〕のとおりであり得る。 The present invention is a tetrahydronaphthylurea derivative represented by the following formula (I) represented by the following embodiment, represented by the formula (AM-X) (1R, 2R) -1-amino-4,4-dimethyl-. The present invention relates to a method for producing a 1,2,3,4-tetrahydronaphthalene-2-ol derivative and an epoxy derivative represented by the formula (EP-1). More specifically, exemplary embodiments of the present invention may be as follows [1]-[5].
〔1〕下記(Scheme 7)中[(Scheme 7)中、p、R1、Y、及び環Aは、後述する本発明の第1の態様中に定義されている基と同じ基であり;各工程の反応条件は、後述する本発明の第1の態様中の各工程の反応条件と同じである]の、式(I)で表される化合物の製造方法。[1] In the following (Scheme 7) [(Scheme 7), p, R 1 , Y, and ring A are the same groups as those defined in the first aspect of the present invention described later; The reaction conditions of each step are the same as the reaction conditions of each step in the first aspect of the present invention described later], the method for producing a compound represented by the formula (I).
〔2〕下記(Scheme 8)中[(Scheme 8)中、p及びR1は、後述する本発明の第2の態様中に定義されている基と同じ基であり;各工程の反応条件は、後述する本発明の第2の態様中の各工程の反応条件と同じである]の、式(AM−X)で表される化合物の製造方法。[2] In (Scheme 8) below [In (Scheme 8), p and R 1 are the same groups as those defined in the second aspect of the present invention described later; the reaction conditions of each step are , The same as the reaction conditions of each step in the second aspect of the present invention described later], a method for producing a compound represented by the formula (AM-X).
〔3〕下記(Scheme 9)中[(Scheme 9)中、p、及びR1は、後述する本発明の第3の態様中に定義されている基と同じ基であり;各工程の反応条件は、後述する本発明の第3の態様中の各工程の反応条件と同じである]の、式(EP−1)で表される化合物の製造方法。[3] In the following (Scheme 9) [(Scheme 9), p, and R 1 are the same groups as those defined in the third aspect of the present invention described later; reaction conditions of each step. Is the same as the reaction conditions of each step in the third aspect of the present invention described later], the method for producing a compound represented by the formula (EP-1).
〔4〕下記(Scheme 10)中[(Scheme 10)中、p及びR1は、後述する本発明の第4の態様中に定義されている基と同じ基であり;各工程の反応条件は、後述する本発明の第4の態様中の各工程の反応条件と同じである]の、式(AM−X)で表される化合物の製造方法。[4] In (Scheme 10) below [In (Scheme 10), p and R 1 are the same groups as those defined in the fourth aspect of the present invention described later; the reaction conditions of each step are , The same as the reaction conditions of each step in the fourth aspect of the present invention described later], a method for producing a compound represented by the formula (AM-X).
〔5〕下記(Scheme 4)中[(Scheme 4)中、p、R1、Y及び環Aは、後述する本発明の第5の態様中に定義されている基と同じ基であり;各工程の反応条件は、後述する本発明の第5の態様中の各工程の反応条件と同じである]の、式(I)で表される化合物の製造方法。[5] in the following (Scheme 4) in [(Scheme 4), p, R 1, Y and Ring A is the same group as the group defined in the fifth aspect of the present invention to be described later; the The reaction conditions of the steps are the same as the reaction conditions of each step in the fifth aspect of the present invention described later], the method for producing a compound represented by the formula (I).
[本発明の態様]
本発明の例示的な態様は、より具体的には、以下の態様[1]〜[5]のとおりであり得る。
[1]本発明の第1の態様は、下記式(I):[Aspects of the present invention]
More specifically, the exemplary embodiment of the present invention can be as follows [1] to [5].
[1] The first aspect of the present invention is the following formula (I):
[式(I)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基であり;環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基である]で表される化合物の製造方法であって、以下の工程:
(1)下記式(TH−1):[In formula (I), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy. C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C 2- It is a substituent selected from 7 alkanoylamino group, carboxamide group, and C 1-6 alkoxycarbonyl group; ring A is 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-. 3-Il group], which is a method for producing a compound represented by the following steps:
(1) The following formula (TH-1):
[式(TH−1)中、p及びR1は、前記式(I)中の定義と同じである]で表される化合物と、チタン触媒(例えば、四塩化チタン、四臭化チタン、チタンアルコキシド(チタンテトラメトキシド、チタンテトラエトキシド、チタンテトラノルマルプロポキシド(Ti(OCH2CH2CH3)4)、チタンテトライソプロポキシド(Ti(OCH(CH3)2)4)、チタンテトラノルマルブトキシド(Ti(OCH2CH2CH2CH3)4)、チタンテトラターシャリーブトキシド(Ti(OC(CH3)3)4)、等)と、配位子としての下記式(LG−1):In the formula (TH-1), p and R 1 are the same as the definitions in the formula (I)], and a titanium catalyst (for example, titanium tetrachloride, titanium tetrabromide, titanium). Alkoxide (Titanium Tetramethoxyde, Titanium Tetraethoxydo, Titanium Tetranormal Propoxide (Ti (OCH 2 CH 2 CH 3 ) 4 ), Titanium Tetraisopropoxide (Ti (OCH (CH 3 ) 2 ) 4 ), Titanium Tetra Normal butoxide (Ti (OCH 2 CH 2 CH 2 CH 3 ) 4 ), Titanium tetraterlybutoxide (Ti (OC (CH 3 ) 3 ) 4 ), etc.) and the following formula as a ligand (LG-1) ):
である、3,3’’−((((1R,2R)−シクロヘキサン−1,2−ジイル)ビス(アザネジル))ビス(メチレン))ビス(2’−メトキシ−[1,1’−ビフェニル]−2−オール)[CAS番号:928769−12−4]と、過酸化水素水(例えば、約30〜60%濃度)と、緩衝液(例えば、クエン酸/NaOH緩衝液、クエン酸/クエン酸ナトリウム緩衝液、リン酸緩衝液、KH2PO4/NaOH緩衝液、トリス(ヒドロキシメチル)アミノメタン(Tris)/HCl緩衝液、ホウ酸/NaOH緩衝液、ホウ酸Na/HCl緩衝液、等)とを、溶媒(例えば、反応に関与しない溶媒、好ましくは有機溶媒、より好ましくは、ジクロロメタン、1,2−ジクロロエタン、クロロベンゼン、フルオロベンゼン等のハロゲン化炭化水素系溶媒、ベンゼン、トルエン等の芳香族炭化水素系溶媒、酢酸エチル等のエステル系溶媒、テトラヒドロフラン等のエーテル系溶媒、アセトニトリル等ニトリル系溶媒)中に加えて混合溶液(1)を得る工程、(2)前記混合溶液(1)を、反応温度(外温)30℃〜50℃の範囲、好ましくは、35〜45℃の範囲の温度で反応を行い、下記式(EP−1):3,3''-((((1R, 2R) -cyclohexane-1,2-diyl) bis (azaneyl)) bis (methylene)) bis (2'-methoxy- [1,1'-biphenyl) ] -2-ol) [CAS number: 928769-12-4], hydrogen peroxide solution (eg, about 30-60% concentration), and buffer solution (eg, citrate / NaOH buffer, citrate / quen). Sodium acid acid buffer, phosphate buffer, KH 2 PO 4 / NaOH buffer, Tris (hydroxymethyl) aminomethane (Tris) / HCl buffer, boric acid / NaOH buffer, Na borate / HCl buffer, etc. ), And a solvent (for example, a solvent not involved in the reaction, preferably an organic solvent, more preferably a halogenated hydrocarbon solvent such as dichloromethane, 1,2-dichloroethane, chlorobenzene, fluorobenzene, etc., and an aroma such as benzene, toluene). A step of obtaining a mixed solution (1) by adding it to a group hydrocarbon solvent, an ester solvent such as ethyl acetate, an ether solvent such as tetrahydrofuran, and a nitrile solvent such as acetonitrile, (2) the mixed solution (1). The reaction was carried out at a reaction temperature (outside temperature) of 30 ° C. to 50 ° C., preferably a temperature in the range of 35 to 45 ° C., and the following formula (EP-1):
[式(EP−1)中、p及びR1は、前記式(I)中の定義と同じである]で表される化合物を得る工程、(3)前記式(EP−1)で表される化合物をアンモニア水に加え、前記式(EP−1)で表される化合物とアンモニア水とを含む混合溶液(3)を得る工程、(4)前記混合溶液(3)を、0℃から前記混合溶液(3)が還流する温度までの間のいずれかの温度で反応を行い、下記式(AM−X):A step of obtaining a compound represented by [in the formula (EP-1), p and R 1 are the same as the definitions in the above formula (I)], (3) represented by the above formula (EP-1). To obtain a mixed solution (3) containing the compound represented by the formula (EP-1) and aqueous ammonia, (4) the mixed solution (3) was added from 0 ° C. to the above-mentioned compound. The reaction was carried out at any temperature up to the temperature at which the mixed solution (3) refluxed, and the following formula (AM-X):
[式(AM−X)中、p及びR1は、前記式(I)中の定義と同じである]で表される化合物を得る工程、
(5)下記式(AM−1):The step of obtaining the compound represented by [in the formula (AM-X), p and R 1 are the same as the definitions in the above formula (I)].
(5) The following formula (AM-1):
[式(AM−1)中、環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基である]で表わされる化合物と、トリホスゲン、ホスゲン、クロロギ酸トリクロロメチル、2,2,2−トリクロロエチルクロロホルメート、クロロギ酸フェニル、クロロギ酸p−ニトロフェニル、クロロギ酸p−トリル、N,N´−カルボニルジイミダゾール、及びN,N´−ジスクシンイミジルカルボナート等から選ばれるウレア化剤と、塩基とを、溶媒に加えて混合溶液(5)を得る工程、(6)前記混合溶液(5)を、0℃から前記混合溶液(5)が還流する温度までの間のいずれかの温度で反応を行い、下記式(CB−1): [In the formula (AM-1), ring A is a 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl group], and triphosgene. Hosgene, trichloromethyl chlorophosphate, 2,2,2-trichloroethylchloroformate, phenylchlorophosphate, p-nitrophenyl chloroate, p-tolyl chlorogitate, N, N'-carbonyldiimidazole, and N, N' A step of adding a urelating agent selected from −discusin imidazole carbonate or the like and a base to a solvent to obtain a mixed solution (5), (6) the mixed solution (5) from 0 ° C. to the mixed solution. The reaction was carried out at any temperature up to the temperature at which (5) refluxed, and the following formula (CB-1):
[式(CB−1)中、環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基であり;Yは、トリクロロメトキシ基、塩素原子、2,2,2−トリクロロエトキシ基、フェノキシ基、p−ニトロフェノキシ基、p−メチルフェノキシ基、イミダゾール−1−イル基、(2,5−ジオキソピロリジン−1−イル)オキシ基、等から選ばれる基である]で表わされる化合物を得る工程、(7)前記工程(4)で得られる式(AM−X)で表わされる化合物と、前記式(CB−1)で表わされる化合物と、塩基とを、溶媒に加えて混合溶液(7)を得る工程、及び
(8)前記混合溶液(7)を、0℃から前記混合溶液(7)が還流する温度までの間のいずれかの温度で反応を行い、式(I)で表される化合物を得る工程、を含む製造方法である。
ここで、上記式(AM−1)は、以下に示す5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−アミンである。[In formula (CB-1), ring A is a 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl group; Y is a trichloromethoxy group, chlorine. Atom, 2,2,2-trichloroethoxy group, phenoxy group, p-nitrophenoxy group, p-methylphenoxy group, imidazol-1-yl group, (2,5-dioxopyrrolidine-1-yl) oxy group, The compound represented by the above formula (CB-1) and the compound represented by the formula (AM-X) obtained in the step (7) of the step (4) and the step of obtaining the compound represented by the above formula (CB-1). And (8) the step of adding the base to the solvent to obtain the mixed solution (7), and (8) the mixed solution (7) from 0 ° C. to the temperature at which the mixed solution (7) is refluxed. This is a production method including a step of carrying out a reaction at the temperature of (I) to obtain a compound represented by the formula (I).
Here, the above formula (AM-1) is 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-amine shown below.
[1−1−1]前記態様[1]の工程(1)において、過酸化水素水の量は、式(TH−1)1等量に対して、好ましくは、1.5〜10等量の範囲であり;より好ましくは、1.5〜5等量の範囲であり;特に好ましくは、1.5又は5.0等量である。ここで、「等量」とは、モル比で1:1であることを意味する。即ち、式(TH−1)1等量に対して、過酸化水素水の量が1.5〜10等量の場合は、過酸化水素水の量が、モル比で1:1.5〜1:10を意味する。 [1-1-1] In the step (1) of the above aspect [1], the amount of hydrogen peroxide solution is preferably 1.5 to 10 equivalents with respect to 1 equivalent of the formula (TH-1). In the range of; more preferably in the range of 1.5 to 5 equivalents; particularly preferably in the range of 1.5 or 5.0 equivalents. Here, "equal amount" means that the molar ratio is 1: 1. That is, when the amount of hydrogen peroxide solution is 1.5 to 10 equivalents with respect to 1 equivalent of the formula (TH-1), the amount of hydrogen peroxide solution is 1: 1.5 to the molar ratio. It means 1:10.
[1−1−2]前記態様[1]の工程(1)において、過酸化水素水の濃度は、約30%のものを用いることが好ましい。 [1-1-2] In the step (1) of the above aspect [1], it is preferable to use a hydrogen peroxide solution having a concentration of about 30%.
[1−2−1]前記態様[1]の工程(1)において、チタン触媒は、好ましくは、チタンテトラメトキシド、チタンテトラエトキシド、チタンテトラノルマルプロポキシド、チタンテトライソプロポキシド、チタンテトラノルマルブトキシド、又はチタンテトラターシャリーブトキシドであり;より好ましくは、チタンテトライソプロポキシドである。 [1-2-1] In the step (1) of the above aspect [1], the titanium catalyst is preferably titanium tetramethoxyde, titanium tetraethoxydo, titanium tetranormal propoxide, titanium tetraisopropoxide, titanium tetra. It is normal buttoxide, or titanium tetraterlary butoxide; more preferably titanium tetraisopropoxide.
[1−2−2]前記態様[1]の工程(1)において、チタン触媒の量は、好ましくは、式(TH−1)に対し0.1〜10mol%の範囲であり;より好ましくは1.0〜5.0mol%の範囲であり;特に好ましくは、1.0、3.0、又は5.0mol%である。 [1-2-2] In the step (1) of the above aspect [1], the amount of the titanium catalyst is preferably in the range of 0.1 to 10 mol% with respect to the formula (TH-1); more preferably. It is in the range of 1.0 to 5.0 mol%; particularly preferably 1.0, 3.0, or 5.0 mol%.
[1−3]前記態様[1]の工程(1)において、配位子は、式(TH−1)に対して、好ましくは、0.1〜12mol%の範囲であり;より好ましくは1.2〜6.0mol%の範囲であり;特に好ましくは、1.2、3.6、又は6.0mol%である。 [1-3] In the step (1) of the above aspect [1], the ligand is preferably in the range of 0.1 to 12 mol% with respect to the formula (TH-1); more preferably 1 It is in the range of .2 to 6.0 mol%; particularly preferably 1.2, 3.6, or 6.0 mol%.
[1−4]前記態様[1]の工程(1)において、溶媒は、好ましくは反応に関与しない溶媒であり、より好ましくは、有機溶媒であり、さらに好ましくは、ジクロロメタン、1,2−ジクロロエタン、クロロベンゼン、フルオロベンゼン等のハロゲン化炭化水素系溶媒、トルエン等の芳香族炭化水素系溶媒、酢酸エチル等のエステル系溶媒、テトラヒドロフラン等のエーテル系溶媒であり;より好ましくは、ジクロロメタンである。 [1-4] In the step (1) of the above aspect [1], the solvent is preferably a solvent that does not participate in the reaction, more preferably an organic solvent, and further preferably dichloromethane, 1,2-dichloroethane. , A halogenated hydrocarbon solvent such as chlorobenzene and fluorobenzene, an aromatic hydrocarbon solvent such as toluene, an ester solvent such as ethyl acetate, and an ether solvent such as tetrahydrofuran; more preferably dichloromethane.
[1−5]前記態様[1]の工程(1)において、溶媒(反応に関与しない溶媒)の量は、式(TH−1)の質量に対して、好ましくは、1〜20倍量の範囲であり;より好ましくは、5〜20倍量の範囲であり;特に好ましくは、5又は20倍量である。 [1-5] In the step (1) of the above aspect [1], the amount of the solvent (solvent not involved in the reaction) is preferably 1 to 20 times the mass of the formula (TH-1). It is in the range; more preferably in the range of 5 to 20 times the amount; particularly preferably in the range of 5 or 20 times the amount.
[1−6−1]前記態様[1]の工程(1)において、緩衝液は、好ましくは、クエン酸/NaOH緩衝液、クエン酸/クエン酸ナトリウム緩衝液、ホウ酸/NaOH緩衝液、リン酸緩衝液、KH2PO4/NaOH緩衝液であり;より好ましくは、リン酸緩衝液、KH2PO4/NaOH緩衝液であり;特に好ましくはリン酸緩衝液である。当該緩衝液によって、反応溶液等のpHを調製することができる。
[1−6−2]前記態様[1]の工程(1)において、反応溶液のpHは、好ましくは、pH=7.4〜8.0であり;より好ましくは、pH=7.4、又はpH=8.0である。[1-6-1] In the step (1) of the above aspect [1], the buffer solution is preferably citric acid / NaOH buffer solution, citric acid / sodium citrate buffer solution, boric acid / NaOH buffer solution, phosphorus. Acid buffer, KH 2 PO 4 / NaOH buffer; more preferably phosphate buffer, KH 2 PO 4 / NaOH buffer; particularly preferably phosphate buffer. The pH of the reaction solution or the like can be adjusted with the buffer solution.
[1-6-2] In the step (1) of the above aspect [1], the pH of the reaction solution is preferably pH = 7.4 to 8.0; more preferably pH = 7.4, Or pH = 8.0.
[1−7−1]前記態様[1]の工程(2)において、反応時間は、好ましくは、20時間以下であり;より好ましくは4.0時間以下である。 [1-7-1] In the step (2) of the above aspect [1], the reaction time is preferably 20 hours or less; more preferably 4.0 hours or less.
[1−8−1]前記態様[1]の工程(4)の反応は、好ましくは、封管反応瓶を用いる封管反応である。 [1-8-1] The reaction in step (4) of the above aspect [1] is preferably a sealing reaction using a sealing reaction bottle.
[1−8−2]前記態様[1−8−1]の封管反応の反応温度は、好ましくは、100℃である。 [1-8-2] The reaction temperature of the sealed tube reaction of the above aspect [1-8-1] is preferably 100 ° C.
[1−8−3]前記態様[1−8−1]の封管反応の好ましい反応時間は2時間である。 [1-8-3] The preferable reaction time of the sealing reaction of the above aspect [1-8-1] is 2 hours.
[1−9]前記態様[1]の工程(5)において、ウレア化剤は、好ましくは、クロロギ酸フェニル、クロロギ酸p−トリル、又は2,2,2−トリクロロエチルクロロホルメートであり;より好ましくは、2,2,2−トリクロロエチルクロロホルメートである。 [1-9] In the step (5) of the above aspect [1], the urea agent is preferably phenylchloroformate, p-tolyl chloroformate, or 2,2,2-trichloroethylchloroformate; More preferably, it is 2,2,2-trichloroethylchloroformate.
[1−10]前記態様[1]の工程(5)において、塩基は、好ましくは、ピリジン、トリエチルアミン、又はN,N−ジイソプロピルエチルアミン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン(DBU)、等の有機塩基、炭酸水素ナトリウム、炭酸ナトリウム、又は炭酸カリウム等の無機塩基、カリウムtert−ブトキシド、ナトリウムtert−ブトキシド、等の金属アルコキシド、水素化ナトリウム、水素化カリウム、又は水素化カルシウム等の水素化金属化合物、メチルリチウム、又はブチルリチウム等のアルキルリチウム、リチウムヘキサメチルジシラジド、又はリチウムジイソプロピルアミド等のリチウムアミド、又は、それらの混合物等であり;より好ましくは、ピリジンである。 [1-10] In the step (5) of the above aspect [1], the base is preferably pyridine, triethylamine, or N, N-diisopropylethylamine, 1,8-diazabicyclo [5.4.0] -7-. Organic bases such as undecene (DBU), inorganic bases such as sodium hydrogen carbonate, sodium carbonate, or potassium carbonate, metal alkoxides such as potassium tert-butoxide, sodium tert-butoxide, etc., sodium hydride, potassium hydride, or hydrogen. Metal hydride compounds such as calcium hydride, alkyl lithium such as methyl lithium or butyl lithium, lithium amides such as lithium hexamethyldisilazide, or lithium diisopropylamide, or mixtures thereof; more preferably pyridine. Is.
[1−11]前記態様[1]の工程(5)において、溶媒は、好ましくは、ジメチルホルムアミド、ジメチルアセトアミド、ジメチルスルホキシド、N−メチルピロリドン、又はアセトニトリル、等の非プロトン性極性溶媒、ジエチルエーテル、テトラヒドロフラン、ジメトキシエタン、又は1,4−ジオキサン等のエーテル系溶媒、酢酸エチル、又は酢酸プロピル等のエステル系溶媒、ジクロロメタン、クロロホルム、又は1,2−ジクロロエタン等の塩素系溶媒、又は、それらの混合溶媒等であり;より好ましくは、1,2−ジクロロエタンである。 [1-11] In the step (5) of the above aspect [1], the solvent is preferably an aproton polar solvent such as dimethylformamide, dimethylacetamide, dimethylsulfoxide, N-methylpyrrolidone, or acetonitrile, diethyl ether. , Tetrahydrofuran, dimethoxyethane, or ether solvent such as 1,4-dioxane, ester solvent such as ethyl acetate or propyl acetate, chlorine solvent such as dichloromethane, chloroform, or 1,2-dichloroethane, or theirs. It is a mixed solvent or the like; more preferably 1,2-dichloroethane.
[1−12]前記態様[1]の工程(6)において、式(CB−1)中のYは、好ましくは、フェノキシ基、p−メチルフェノキシ基、又は2,2,2−トリクロロエトキシ基であり;より好ましくは、2,2,2−トリクロロエトキシ基である。 [1-12] In the step (6) of the above aspect [1], Y in the formula (CB-1) is preferably a phenoxy group, a p-methylphenoxy group, or a 2,2,2-trichloroethoxy group. More preferably, it is a 2,2,2-trichloroethoxy group.
[1−13]前記態様[1]の工程(7)において、溶媒は、好ましくは、ジメチルホルムアミド、ジメチルアセトアミド、ジメチルスルホキシド、N−メチルピロリドン、又はアセトニトリル、等の非プロトン性極性溶媒、ジエチルエーテル、テトラヒドロフラン、ジメトキシエタン、又は1,4−ジオキサン等のエーテル系溶媒、酢酸エチル、又は酢酸プロピル等のエステル系溶媒、ジクロロメタン、クロロホルム、又は1,2−ジクロロエタン等の塩素系溶媒、又は、それらの混合溶媒等であり;より好ましくは、N−メチルピロリドン及びジメチルスルホキシドである。 [1-13] In the step (7) of the above aspect [1], the solvent is preferably an aproton polar solvent such as dimethylformamide, dimethylacetamide, dimethylsulfoxide, N-methylpyrrolidone, or acetonitrile, diethyl ether. , Tetrahydrofuran, dimethoxyethane, or ether solvent such as 1,4-dioxane, ester solvent such as ethyl acetate or propyl acetate, chlorine solvent such as dichloromethane, chloroform, or 1,2-dichloroethane, or theirs. A mixed solvent or the like; more preferably N-methylpyrrolidone and dimethyl sulfoxide.
[1−14]前記態様[1]の工程(7)において、塩基は、好ましくは、ピリジン、トリエチルアミン、又はN,N−ジイソプロピルエチルアミン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン(DBU)、等の有機塩基、炭酸水素ナトリウム、炭酸ナトリウム、又は炭酸カリウム等の無機塩基、カリウムtert−ブトキシド、ナトリウムtert−ブトキシド、等の金属アルコキシド、水素化ナトリウム、水素化カリウム、又は水素化カルシウム等の水素化金属化合物、メチルリチウム、又はブチルリチウム等のアルキルリチウム、リチウムヘキサメチルジシラジド、又はリチウムジイソプロピルアミド等のリチウムアミド、又は、それらの混合物等であり;より好ましくは、トリエチルアミン及び1,8−ジアザビシクロ[5.4.0]−7−ウンデセン(DBU)である。 [1-14] In the step (7) of the above aspect [1], the base is preferably pyridine, triethylamine, or N, N-diisopropylethylamine, 1,8-diazabicyclo [5.4.0] -7-. Organic bases such as undecene (DBU), inorganic bases such as sodium hydrogen carbonate, sodium carbonate, or potassium carbonate, metal alkoxides such as potassium tert-butoxide, sodium tert-butoxide, etc., sodium hydride, potassium hydride, or hydrogen. Metal hydride compounds such as calcium tert, alkyl lithium such as methyl lithium or butyl lithium, lithium amides such as lithium hexamethyldisilazide, or lithium diisopropylamide, or mixtures thereof; more preferably triethylamine. And 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
[1−15]前記態様[1]の各式中において、pは、好ましくは、0または1の整数であり、より好ましくは0の整数である。 [1-15] In each of the formulas of the above aspect [1], p is preferably an integer of 0 or 1, and more preferably an integer of 0.
[1−16]前記態様[1]の各式中において、R1は、好ましくは、ハロゲン原子、ヒドロキシC1-6アルキル基、C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基であり;より好ましくは、ハロゲン原子、又はC1-6アルコキシC1-6アルキル基であり;更に好ましくは、水素原子、フッ素原子、臭素原子、又はメトキシメチル基から選ばれる置換基が1〜2個置換しても良く;特に好ましくは、無置換である。[1-16] In each of the formulas of the above aspect [1], R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy group, and a C 1-6 alkoxy C 1-6. It is a substituent selected from an alkyl group, a carboxamide group, and a C 1-6 alkoxycarbonyl group; more preferably a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group; even more preferably a hydrogen atom. , Fluorine atom, bromine atom, or methoxymethyl group may be substituted with one or two substituents; particularly preferably unsubstituted.
[1−17]前記態様[1]の各式中において、R1の置換様式は、好ましくは、1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式(PH−1)ないし式(PH−4)で表わされる置換様式をとり;
2個の置換基がR1によって置換する場合の部分構造式は、下記部分構造式(PH−5)ないし式(PH−10))で表わされる置換様式をとり;
より好ましくは、1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式:
で表わされる置換様式をとり;より具体的な置換基との組み合わせとしては、下記部分構造式:
から選ばれる置換様式をとる。
2個の置換基がR1によって置換する場合(p=2)は、下記部分構造式:
で表わされる置換様式をとり;
より具体的な置換基との組み合わせとしては、下記部分構造式:
の置換様式をとる。[1-17] In each of the formulas of the above aspect [1], the substitution mode of R 1 is preferably the following partial structural formula (p = 1) when one substituent is substituted by R 1 (p = 1). It takes a substitution mode represented by PH-1) to the formula (PH-4);
When two substituents are substituted by R 1 , the partial structural formula takes the substitution mode represented by the following partial structural formulas (PH-5) to (PH-10));
More preferably, when one substituent is substituted by R 1 (p = 1), the following partial structural formula:
The substitution mode represented by is taken; as a combination with a more specific substituent, the following partial structural formula:
Take the replacement style chosen from.
When two substituents are substituted by R 1 (p = 2), the following partial structural formula:
Takes the substitution form represented by;
As a more specific combination with a substituent, the following partial structural formula:
Take the replacement form of.
[1−18]前記態様[1]の工程(1)において、好ましくは、過酸化水素水の量は、式(TH−1)1等量に対して、1.5〜5等量の範囲であり;チタン触媒の量は、式(TH−1)に対して、1.0〜5.0mol%の範囲であり;配位子は、式(TH−1)に対して、1.2〜6.0mol%の範囲であり;チタン触媒は、チタンテトライソプロポキシドであり;緩衝液は、リン酸緩衝液であり;溶媒(反応に関与しない溶媒)は、ジクロロメタンであり;溶媒(反応に関与しない溶媒)の量は、式(TH−1)の質量に対して、5〜20倍量の範囲であり;反応溶液のpHは、pH=7.4〜8.0であり;反応時間は、20時間以下である。 [1-18] In the step (1) of the above aspect [1], the amount of the hydrogen peroxide solution is preferably in the range of 1.5 to 5 equivalents with respect to 1 equivalent of the formula (TH-1). The amount of titanium catalyst is in the range of 1.0-5.0 mol% relative to formula (TH-1); the ligand is 1.2 relative to formula (TH-1). In the range of ~ 6.0 mol%; the titanium catalyst is titanium tetraisopropoxide; the buffer is a phosphate buffer; the solvent (solvent not involved in the reaction) is dichloromethane; the solvent (reaction). The amount of solvent not involved in the reaction is in the range of 5 to 20 times the mass of the formula (TH-1); the pH of the reaction solution is pH = 7.4 to 8.0; the reaction. The time is 20 hours or less.
[1−19]前記態様[1]の工程(1)において、より好ましくは、過酸化水素水の量は、式(TH−1)1等量に対し、1.5又は5.0等量であり;チタン触媒の量は式(TH−1)に対し、1.0又は3.0mol%であり;配位子は、式(TH−1)に対して、1.2又は3.6mol%であり;チタン触媒は、チタンテトライソプロポキシドであり;緩衝液は、リン酸緩衝液であり;溶媒(反応に関与しない溶媒)は、ジクロロメタンであり;溶媒(反応に関与しない溶媒)の量は、5倍量であり;反応溶液のpHは、pH=7.4又はpH=8.0であり;反応時間は、4時間以下である。 [1-19] In the step (1) of the above aspect [1], more preferably, the amount of the hydrogen peroxide solution is 1.5 or 5.0 equal to 1 equal amount of the formula (TH-1). The amount of titanium catalyst is 1.0 or 3.0 mol% relative to formula (TH-1); the ligand is 1.2 or 3.6 mol% relative to formula (TH-1). %; The titanium catalyst is titanium tetraisopropoxide; the buffer is a phosphate buffer; the solvent (solvent not involved in the reaction) is dichloromethane; the solvent (solvent not involved in the reaction) The amount is 5 times the amount; the pH of the reaction solution is pH = 7.4 or pH = 8.0; the reaction time is 4 hours or less.
[2]本発明の第2の態様は、下記式(AM−X): [2] A second aspect of the present invention is the following formula (AM-X):
[式(AM−X)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基である]で表される化合物の製造方法であって、以下の工程:
(1)下記式(TH−1):[In formula (AM-X), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group. , Hydroxy C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C A substituent selected from a 2-7 alkanoylamino group, a carboxamide group, and a C 1-6 alkoxycarbonyl group], which is a method for producing a compound represented by the following steps:
(1) The following formula (TH-1):
[式(TH−1)中、p及びR1は、前記式(AM−X)中の定義と同じである]で表される化合物と、チタン触媒(例えば、四塩化チタン、四臭化チタン、チタンアルコキシド(チタンテトラメトキシド、チタンテトラエトキシド、チタンテトラノルマルプロポキシド(Ti(OCH2CH2CH3)4)、チタンテトライソプロポキシド(Ti(OCH(CH3)2)4)、チタンテトラノルマルブトキシド(Ti(OCH2CH2CH2CH3)4)、チタンテトラターシャリーブトキシド(Ti(OC(CH3)3)4)、等)と、配位子としての下記式(LG−1):[In the formula (TH-1), p and R 1 are the same as the definitions in the above formula (AM-X)], and a titanium catalyst (for example, titanium tetrachloride, titanium tetrabromide). , Titanium alkoxide (Titanium tetramethoxyde, Titanium tetraethoxydo, Titanium tetranormal propoxide (Ti (OCH 2 CH 2 CH 3 ) 4 ), Titanium tetraisopropoxide (Ti (OCH (CH 3 ) 2 ) 4 ), Titanium Tetranormal Butoxide (Ti (OCH 2 CH 2 CH 2 CH 3 ) 4 ), Titanium Tetrater Shaributoxide (Ti (OC (CH 3 ) 3 ) 4 ), etc.) and the following formula (LG) as a ligand -1):
である、3,3’’−((((1R,2R)−シクロヘキサン−1,2−ジイル)ビス(アザネジル))ビス(メチレン))ビス(2’−メトキシ−[1,1’−ビフェニル]−2−オール)[CAS番号:928769−12−4]と、過酸化水素水(例えば、約30〜60%濃度)と、緩衝液(例えば、クエン酸/NaOH緩衝液、クエン酸/クエン酸ナトリウム緩衝液、リン酸緩衝液、KH2PO4/NaOH緩衝液、トリス(ヒドロキシメチル)アミノメタン(Tris)/HCl緩衝液、ホウ酸/NaOH緩衝液、ホウ酸Na/HCl緩衝液、等)とを、溶媒(例えば、反応に関与しない溶媒、好ましくは有機溶媒、より好ましくは、ジクロロメタン、1,2−ジクロロエタン、クロロベンゼン、フルオロベンゼン等のハロゲン化炭化水素系溶媒、ベンゼン、トルエン等の芳香族炭化水素系溶媒、酢酸エチル等のエステル系溶媒、テトラヒドロフラン等のエーテル系溶媒、アセトニトリル等ニトリル系溶媒)中に加えて混合溶液(1)を得る工程、
(2)前記混合溶液(1)を、反応温度(外温)30℃〜50℃の範囲、好ましくは、35〜45℃の範囲の温度で反応を行い、下記式(EP−1):3,3''-((((1R, 2R) -cyclohexane-1,2-diyl) bis (azaneyl)) bis (methylene)) bis (2'-methoxy- [1,1'-biphenyl) ] -2-ol) [CAS number: 928769-12-4], hydrogen peroxide solution (eg, about 30-60% concentration), and buffer solution (eg, citrate / NaOH buffer, citrate / quen). Sodium acid acid buffer, phosphate buffer, KH 2 PO 4 / NaOH buffer, Tris (hydroxymethyl) aminomethane (Tris) / HCl buffer, boric acid / NaOH buffer, Na borate / HCl buffer, etc. ), And a solvent (for example, a solvent not involved in the reaction, preferably an organic solvent, more preferably a halogenated hydrocarbon solvent such as dichloromethane, 1,2-dichloroethane, chlorobenzene, fluorobenzene, etc., and an aroma such as benzene, toluene). A step of obtaining a mixed solution (1) by adding it to a group hydrocarbon solvent, an ester solvent such as ethyl acetate, an ether solvent such as tetrahydrofuran, or a nitrile solvent such as acetonitrile.
(2) The mixed solution (1) is reacted at a reaction temperature (outside temperature) in the range of 30 ° C. to 50 ° C., preferably in the range of 35 to 45 ° C., and the following formula (EP-1):
[式(EP−1)中、p及びR1は、前記式(AM−X)中の定義と同じである]で表される化合物を得る工程、
(3)前記式(EP−1)で表される化合物をアンモニア水に加え、前記式(EP−1)で表される化合物とアンモニア水とを含む混合溶液を得る工程、及び
(4)前記混合溶液を、0℃から前記混合溶液(3)が還流する温度までの間のいずれかの温度で反応を行い、式(AM−X)で表される化合物を得る工程、を含む製造方法である。A step of obtaining a compound represented by [in formula (EP-1), p and R 1 are the same as the definitions in the above formula (AM-X)].
(3) A step of adding the compound represented by the formula (EP-1) to aqueous ammonia to obtain a mixed solution containing the compound represented by the formula (EP-1) and aqueous ammonia, and (4) the above. A production method comprising a step of reacting a mixed solution at any temperature between 0 ° C. and the temperature at which the mixed solution (3) refluxes to obtain a compound represented by the formula (AM-X). is there.
[2−1−1]前記態様[2]の工程(1)において、過酸化水素水の量は、式(TH−1)1等量に対して、好ましくは、1.5〜10等量の範囲であり;より好ましくは、1.5〜5等量の範囲であり;特に好ましくは、1.5又は5.0等量である。 [2-1-1] In the step (1) of the above aspect [2], the amount of hydrogen peroxide solution is preferably 1.5 to 10 equivalents with respect to 1 equivalent of the formula (TH-1). In the range of; more preferably in the range of 1.5 to 5 equivalents; particularly preferably in the range of 1.5 or 5.0 equivalents.
[2−1−2]前記態様[2]の工程(1)において、過酸化水素水の濃度は、約30%のものを用いることが好ましい。 [2-1-2] In the step (1) of the above aspect [2], it is preferable to use a hydrogen peroxide solution having a concentration of about 30%.
[2−2−1]前記態様[2]の工程(1)において、チタン触媒は、好ましくは、チタンテトラメトキシド、チタンテトラエトキシド、チタンテトラノルマルプロポキシド、チタンテトライソプロポキシド、チタンテトラノルマルブトキシド、又はチタンテトラターシャリーブトキシドであり;より好ましくは、チタンテトライソプロポキシドである。 [2-2-1] In the step (1) of the above aspect [2], the titanium catalyst is preferably titanium tetramethoxyde, titanium tetraethoxydo, titanium tetranormal propoxide, titanium tetraisopropoxide, titanium tetra. It is normal buttoxide, or titanium tetraterlary butoxide; more preferably titanium tetraisopropoxide.
[2−2−2]前記態様[2]の工程(1)において、チタン触媒の量は、好ましくは、式(TH−1)に対し0.1〜10mol%の範囲であり;より好ましくは1.0〜5.0mol%の範囲であり;特に好ましくは、1.0、3.0、又は5.0mol%である。 [2-2-2] In the step (1) of the above aspect [2], the amount of the titanium catalyst is preferably in the range of 0.1 to 10 mol% with respect to the formula (TH-1); more preferably. It is in the range of 1.0 to 5.0 mol%; particularly preferably 1.0, 3.0, or 5.0 mol%.
[2−3]前記態様[2]の工程(1)において、配位子は、式(TH−1)に対して、好ましくは、0.1〜12mol%の範囲であり;より好ましくは1.2〜6.0mol%の範囲であり;特に好ましくは、1.2、3.6、又は6.0mol%である。 [2-3] In the step (1) of the above aspect [2], the ligand is preferably in the range of 0.1 to 12 mol% with respect to the formula (TH-1); more preferably 1 It is in the range of .2 to 6.0 mol%; particularly preferably 1.2, 3.6, or 6.0 mol%.
[2−4]前記態様[2]の工程(1)において、溶媒は、好ましくは反応に関与しない溶媒であり、より好ましくは、有機溶媒であり、さらに好ましくは、ジクロロメタン、1,2−ジクロロエタン、クロロベンゼン、フルオロベンゼン等のハロゲン化炭化水素系溶媒、トルエン等の芳香族炭化水素系溶媒、酢酸エチル等のエステル系溶媒、テトラヒドロフラン等のエーテル系溶媒であり;より好ましくは、ジクロロメタンである。 [2-4] In the step (1) of the above aspect [2], the solvent is preferably a solvent that does not participate in the reaction, more preferably an organic solvent, and further preferably dichloromethane, 1,2-dichloroethane. , A halogenated hydrocarbon solvent such as chlorobenzene and fluorobenzene, an aromatic hydrocarbon solvent such as toluene, an ester solvent such as ethyl acetate, and an ether solvent such as tetrahydrofuran; more preferably dichloromethane.
[2−5]前記態様[2]の工程(1)において、溶媒(反応に関与しない溶媒)の量は、式(TH−1)の質量に対して、好ましくは、1〜20倍量の範囲であり;より好ましくは、5〜20倍量の範囲であり;特に好ましくは、5又は20倍量である。 [2-5] In the step (1) of the above aspect [2], the amount of the solvent (solvent not involved in the reaction) is preferably 1 to 20 times the mass of the formula (TH-1). It is in the range; more preferably in the range of 5 to 20 times the amount; particularly preferably in the range of 5 or 20 times the amount.
[2−6−1]前記態様[2]の工程(1)において、緩衝液は、好ましくは、クエン酸/NaOH緩衝液、クエン酸/クエン酸ナトリウム緩衝液、ホウ酸/NaOH緩衝液、リン酸緩衝液、KH2PO4/NaOH緩衝液であり;より好ましくは、リン酸緩衝液、KH2PO4/NaOH緩衝液であり;特に好ましくはリン酸緩衝液である。当該緩衝液によって、反応溶液等のpHを調製することができる。[2-6-1] In the step (1) of the above aspect [2], the buffer solution is preferably citric acid / NaOH buffer solution, citric acid / sodium citrate buffer solution, boric acid / NaOH buffer solution, or phosphorus. Acid buffer, KH 2 PO 4 / NaOH buffer; more preferably phosphate buffer, KH 2 PO 4 / NaOH buffer; particularly preferably phosphate buffer. The pH of the reaction solution or the like can be adjusted with the buffer solution.
[2−6−2]
前記態様[2]の工程(1)において、反応溶液のpHは、好ましくは、pH=7.4〜8.0であり;より好ましくは、pH=7.4、又はpH=8.0である。[2-6-2]
In step (1) of aspect [2], the pH of the reaction solution is preferably pH = 7.4 to 8.0; more preferably pH = 7.4, or pH = 8.0. is there.
[2−7]前記態様[2]の工程(2)において、反応時間は、好ましくは、20時間以下であり;より好ましくは4.0時間以下である。 [2-7] In the step (2) of the above aspect [2], the reaction time is preferably 20 hours or less; more preferably 4.0 hours or less.
[2−8−1]前記態様[2]の工程(2)の反応は、好ましくは、封管反応瓶を用いる封管反応である。 [2-8-1] The reaction in step (2) of the above aspect [2] is preferably a sealing reaction using a sealing reaction bottle.
[2−8−2]前記態様[2−8−1]の封管反応の反応温度は、好ましくは、100℃である。 [2-8-2] The reaction temperature of the sealed tube reaction of the above aspect [2-8-1] is preferably 100 ° C.
[2−8−3]前記態様[2−8−1]の封管反応の好ましい反応時間は2時間である。 [2-8-3] The preferable reaction time of the sealing reaction of the above aspect [2-8-1] is 2 hours.
[2−9]前記態様[2]の各式中において、pは、好ましくは、0または1の整数であり、より好ましくは0の整数である。 [2-9] In each of the formulas of the above aspect [2], p is preferably an integer of 0 or 1, and more preferably an integer of 0.
[2−10]前記態様[2]の各式中において、R1は、好ましくは、ハロゲン原子、ヒドロキシC1-6アルキル基、C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基であり;より好ましくは、ハロゲン原子、又はC1-6アルコキシC1-6アルキル基であり;更に好ましくは、水素原子、フッ素原子、臭素原子、又はメトキシメチル基から選ばれる置換基が1〜2個置換しても良く;特に好ましくは、無置換である。[2-10] In each of the formulas of the above aspect [2], R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy group, and a C 1-6 alkoxy C 1-6. It is a substituent selected from an alkyl group, a carboxamide group, and a C 1-6 alkoxycarbonyl group; more preferably a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group; even more preferably a hydrogen atom. , Fluorine atom, bromine atom, or methoxymethyl group may be substituted with one or two substituents; particularly preferably unsubstituted.
[2−11]前記態様[2]の各式中において、R1の置換様式は、好ましくは、1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式(PH−1)ないし式(PH−4)で表わされる置換様式をとり;[2-11] In each of the formulas of the above aspect [2], the substitution mode of R 1 is preferably the following partial structural formula (p = 1) when one substituent is substituted by R 1 (p = 1). It takes a substitution mode represented by PH-1) to the formula (PH-4);
2個の置換基がR1によって置換する場合の部分構造式は、下記部分構造式(PH−5)ないし式(PH−10))で表わされる置換様式をとり;When two substituents are substituted by R 1 , the partial structural formula takes the substitution mode represented by the following partial structural formulas (PH-5) to (PH-10));
より好ましくは、置換基が1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式:More preferably, when the substituent having one substituent is substituted by R 1 (p = 1), the following partial structural formula:
で表わされる置換様式をとり;より具体的な置換基との組み合わせとしては、下記部分構造
式:The substitution mode represented by is taken; as a combination with a more specific substituent, the following partial structural formula:
から選ばれる置換様式をとる。
2個の置換基がR1によって置換する場合(p=2)は、下記部分構造式:Take the replacement style chosen from.
When two substituents are substituted by R 1 (p = 2), the following partial structural formula:
で表わされる置換様式をとり;
より具体的な置換基との組み合わせとしては、下記部分構造式:Takes the substitution form represented by;
As a more specific combination with a substituent, the following partial structural formula:
の置換様式をとる。 Take the replacement form of.
[2−12]前記態様[2]の工程(1)において、好ましくは、過酸化水素水の量は、式(TH−1)1等量に対して、1.5〜5等量の範囲であり;チタン触媒の量は、式(TH−1)に対して、1.0〜5.0mol%の範囲であり;配位子は、式(TH−1)に対して、1.2〜6.0mol%の範囲であり;チタン触媒は、チタンテトライソプロポキシドであり;緩衝液は、リン酸緩衝液であり;溶媒(反応に関与しない溶媒)は、ジクロロメタンであり;溶媒(反応に関与しない溶媒)の量は、式(TH−1)の質量に対して、5〜20倍量の範囲であり;反応溶液のpHは、pH=7.4〜8.0であり;反応時間は、20時間以下である。 [2-12] In the step (1) of the above aspect [2], the amount of the hydrogen peroxide solution is preferably in the range of 1.5 to 5 equivalents with respect to 1 equivalent of the formula (TH-1). The amount of titanium catalyst is in the range of 1.0-5.0 mol% relative to formula (TH-1); the ligand is 1.2 relative to formula (TH-1). In the range of ~ 6.0 mol%; the titanium catalyst is titanium tetraisopropoxide; the buffer is a phosphate buffer; the solvent (solvent not involved in the reaction) is dichloromethane; the solvent (reaction). The amount of solvent not involved in the reaction is in the range of 5 to 20 times the mass of the formula (TH-1); the pH of the reaction solution is pH = 7.4 to 8.0; the reaction. The time is 20 hours or less.
[2−13]前記態様[2]の工程(1)において、より好ましくは、過酸化水素水の量は、式(TH−1)1等量に対し、1.5又は5.0等量であり;チタン触媒の量は式(TH−1)に対し、1.0又は3.0mol%であり;配位子は、式(TH−1)に対して、1.2又は3.6mol%であり;チタン触媒は、チタンテトライソプロポキシドであり;緩衝液は、リン酸緩衝液であり;溶媒(反応に関与しない溶媒)は、ジクロロメタンであり;溶媒(反応に関与しない溶媒)の量は、5倍量であり;反応溶液のpHは、pH=7.4又はpH=8.0であり;反応時間は、4時間以下である。 [2-13] In the step (1) of the above aspect [2], more preferably, the amount of the hydrogen peroxide solution is 1.5 or 5.0 equal to 1 equal amount of the formula (TH-1). The amount of titanium catalyst is 1.0 or 3.0 mol% relative to formula (TH-1); the ligand is 1.2 or 3.6 mol% relative to formula (TH-1). %; The titanium catalyst is titanium tetraisopropoxide; the buffer is a phosphate buffer; the solvent (solvent not involved in the reaction) is dichloromethane; the solvent (solvent not involved in the reaction) The amount is 5 times the amount; the pH of the reaction solution is pH = 7.4 or pH = 8.0; the reaction time is 4 hours or less.
[3]発明の第3の態様は、下記式(EP−1): [3] A third aspect of the invention is the following formula (EP-1):
[式(EP−1)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基である]で表される化合物の製造方法であって、以下の工程:
(1)下記式(TH−1):[In formula (EP-1), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group. , Hydroxy C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C A substituent selected from a 2-7 alkanoylamino group, a carboxamide group, and a C 1-6 alkoxycarbonyl group], which is a method for producing a compound represented by the following steps:
(1) The following formula (TH-1):
[式(TH−1)中、p及びR1は、前記式(AM−X)中の定義と同じである]で表される化合物と、チタン触媒(例えば、四塩化チタン、四臭化チタン、チタンアルコキシド(チタンテトラメトキシド、チタンテトラエトキシド、チタンテトラノルマルプロポキシド(Ti(OCH2CH2CH3)4)、チタンテトライソプロポキシド(Ti(OCH(CH3)2)4)、チタンテトラノルマルブトキシド(Ti(OCH2CH2CH2CH3)4)、チタンテトラターシャリーブトキシド(Ti(OC(CH3)3)4)、等)と、配位子としての下記式(LG−1):[In the formula (TH-1), p and R 1 are the same as the definitions in the above formula (AM-X)], and a titanium catalyst (for example, titanium tetrachloride, titanium tetrabromide). , Titanium alkoxide (Titanium tetramethoxyde, Titanium tetraethoxydo, Titanium tetranormal propoxide (Ti (OCH 2 CH 2 CH 3 ) 4 ), Titanium tetraisopropoxide (Ti (OCH (CH 3 ) 2 ) 4 ), Titanium Tetranormal Butoxide (Ti (OCH 2 CH 2 CH 2 CH 3 ) 4 ), Titanium Tetrater Shaributoxide (Ti (OC (CH 3 ) 3 ) 4 ), etc.) and the following formula (LG) as a ligand -1):
である、3,3’’−((((1R,2R)−シクロヘキサン−1,2−ジイル)ビス(アザネジル))ビス(メチレン))ビス(2’−メトキシ−[1,1’−ビフェニル]−2−オール)[CAS番号:928769−12−4]と、過酸化水素水(例えば、約30〜60%濃度)と、緩衝液(例えば、クエン酸/NaOH緩衝液、クエン酸/クエン酸ナトリウム緩衝液、リン酸緩衝液、KH2PO4/NaOH緩衝液、トリス(ヒドロキシメチル)アミノメタン(Tris)/HCl緩衝液、ホウ酸/NaOH緩衝液、ホウ酸Na/HCl緩衝液、等)とを、溶媒(例えば、反応に関与しない溶媒、好ましくは有機溶媒、より好ましくは、ジクロロメタン、1,2−ジクロロエタン、クロロベンゼン、フルオロベンゼン等のハロゲン化炭化水素系溶媒、ベンゼン、トルエン等の芳香族炭化水素系溶媒、酢酸エチル等のエステル系溶媒、テトラヒドロフラン等のエーテル系溶媒、アセトニトリル等ニトリル系溶媒)中に加えて混合溶液(1)を得る工程、(2)前記混合溶液(1)を、反応温度(外温)30℃〜50℃の範囲、好ましくは、35〜45℃の範囲の温度で反応を行い、式(EP−1)で表される化合物を得る工程を含む製造方法である。3,3''-((((1R, 2R) -cyclohexane-1,2-diyl) bis (azaneyl)) bis (methylene)) bis (2'-methoxy- [1,1'-biphenyl) ] -2-ol) [CAS number: 928769-12-4], hydrogen peroxide solution (eg, about 30-60% concentration), and buffer solution (eg, citrate / NaOH buffer, citrate / quen). Sodium acid acid buffer, phosphate buffer, KH 2 PO 4 / NaOH buffer, Tris (hydroxymethyl) aminomethane (Tris) / HCl buffer, boric acid / NaOH buffer, Na borate / HCl buffer, etc. ), And a solvent (for example, a solvent not involved in the reaction, preferably an organic solvent, more preferably a halogenated hydrocarbon solvent such as dichloromethane, 1,2-dichloroethane, chlorobenzene, fluorobenzene, etc., and an aroma such as benzene, toluene). A step of obtaining a mixed solution (1) by adding it to a group hydrocarbon solvent, an ester solvent such as ethyl acetate, an ether solvent such as tetrahydrofuran, and a nitrile solvent such as acetonitrile, (2) the mixed solution (1). , The reaction temperature (outside temperature) is in the range of 30 ° C. to 50 ° C., preferably in the range of 35 to 45 ° C., and the production method includes a step of obtaining a compound represented by the formula (EP-1). is there.
[3−1−1]前記態様[3]の工程(1)において、過酸化水素水の量は、式(TH−1)1等量に対して、好ましくは、1.5〜10等量の範囲であり;より好ましくは、1.5〜5等量の範囲であり;特に好ましくは、1.5又は5.0等量である。 [3-1-1] In the step (1) of the above aspect [3], the amount of hydrogen peroxide solution is preferably 1.5 to 10 equivalents with respect to 1 equivalent of the formula (TH-1). In the range of; more preferably in the range of 1.5 to 5 equivalents; particularly preferably in the range of 1.5 or 5.0 equivalents.
[3−1−2]前記態様[3]の工程(1)において、過酸化水素水の濃度は、約30%のものを用いることが好ましい。 [3-1-2] In the step (1) of the above aspect [3], it is preferable to use a hydrogen peroxide solution having a concentration of about 30%.
[3−2−1]前記態様[3]の工程(1)において、チタン触媒は、好ましくは、チタンテトラメトキシド、チタンテトラエトキシド、チタンテトラノルマルプロポキシド、チタンテトライソプロポキシド、チタンテトラノルマルブトキシド、又はチタンテトラターシャリーブトキシドであり;より好ましくは、チタンテトライソプロポキシドである。 [3-2-1] In the step (1) of the above aspect [3], the titanium catalyst is preferably titanium tetramethoxyde, titanium tetraethoxydo, titanium tetranormal propoxide, titanium tetraisopropoxide, titanium tetra. It is normal buttoxide, or titanium tetraterlary butoxide; more preferably titanium tetraisopropoxide.
[3−2−2]前記態様[3]の工程(1)において、チタン触媒の量は、好ましくは、式(TH−1)に対し0.1〜10mol%の範囲であり;より好ましくは1.0〜5.0mol%の範囲であり;特に好ましくは、1.0、3.0、又は5.0mol%である。 [3-2-2] In the step (1) of the above aspect [3], the amount of the titanium catalyst is preferably in the range of 0.1 to 10 mol% with respect to the formula (TH-1); more preferably. It is in the range of 1.0 to 5.0 mol%; particularly preferably 1.0, 3.0, or 5.0 mol%.
[3−3]前記態様[3]の工程(1)において、配位子は、式(TH−1)に対して、好ましくは、0.1〜12mol%の範囲であり;より好ましくは1.2〜6.0mol%の範囲であり;特に好ましくは、1.2、3.6、又は6.0mol%である。 [3-3] In the step (1) of the above aspect [3], the ligand is preferably in the range of 0.1 to 12 mol% with respect to the formula (TH-1); more preferably 1 It is in the range of .2 to 6.0 mol%; particularly preferably 1.2, 3.6, or 6.0 mol%.
[3−4]前記態様[3]の工程(1)において、溶媒は、好ましくは反応に関与しない溶媒であり、より好ましくは、有機溶媒であり、さらに好ましくは、ジクロロメタン、1,2−ジクロロエタン、クロロベンゼン、フルオロベンゼン等のハロゲン化炭化水素系溶媒、トルエン等の芳香族炭化水素系溶媒、酢酸エチル等のエステル系溶媒、テトラヒドロフラン等のエーテル系溶媒であり;より好ましくは、ジクロロメタンである。 [3-4] In the step (1) of the above aspect [3], the solvent is preferably a solvent that does not participate in the reaction, more preferably an organic solvent, and further preferably dichloromethane, 1,2-dichloroethane. , A halogenated hydrocarbon solvent such as chlorobenzene and fluorobenzene, an aromatic hydrocarbon solvent such as toluene, an ester solvent such as ethyl acetate, and an ether solvent such as tetrahydrofuran; more preferably dichloromethane.
[3−5]前記態様[3]の工程(1)において、溶媒(反応に関与しない溶媒)の量は、式(TH−1)の質量に対して、好ましくは、1〜20倍量の範囲であり;より好ましくは、5〜20倍量の範囲であり;特に好ましくは、5又は20倍量である。 [3-5] In the step (1) of the above aspect [3], the amount of the solvent (solvent not involved in the reaction) is preferably 1 to 20 times the mass of the formula (TH-1). It is in the range; more preferably in the range of 5 to 20 times the amount; particularly preferably in the range of 5 or 20 times the amount.
[3−6−1]前記態様[3]の工程(1)において、緩衝液は、好ましくは、クエン酸/NaOH緩衝液、クエン酸/クエン酸ナトリウム緩衝液、ホウ酸/NaOH緩衝液、リン酸緩衝液、KH2PO4/NaOH緩衝液であり;より好ましくは、リン酸緩衝液、KH2PO4/NaOH緩衝液であり;特に好ましくはリン酸緩衝液である。当該緩衝液によって、反応溶液等のpHを調製することができる。[3-6-1] In the step (1) of the above aspect [3], the buffer solution is preferably citric acid / NaOH buffer solution, citric acid / sodium citrate buffer solution, boric acid / NaOH buffer solution, or phosphorus. Acid buffer, KH 2 PO 4 / NaOH buffer; more preferably phosphate buffer, KH 2 PO 4 / NaOH buffer; particularly preferably phosphate buffer. The pH of the reaction solution or the like can be adjusted with the buffer solution.
[3−6−2]前記態様[3]の工程(1)において、反応溶液のpHは、好ましくは、pH=7.4〜8.0であり;より好ましくは、pH=7.4、又はpH=8.0である。 [3-6-2] In the step (1) of the above aspect [3], the pH of the reaction solution is preferably pH = 7.4 to 8.0; more preferably pH = 7.4, Or pH = 8.0.
[3−7]前記態様[3]の工程(2)において、反応時間は、好ましくは、20時間以下であり;より好ましくは4.0時間以下である。 [3-7] In the step (2) of the above aspect [3], the reaction time is preferably 20 hours or less; more preferably 4.0 hours or less.
[3−8]前記態様[3]の各式中において、pは、好ましくは、0または1の整数であり、より好ましくは0の整数である。 [3-8] In each of the formulas of the above aspect [3], p is preferably an integer of 0 or 1, and more preferably an integer of 0.
[3−9]前記態様[3]の各式中において、R1は、好ましくは、ハロゲン原子、ヒドロキシC1-6アルキル基、C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基であり;より好ましくは、ハロゲン原子、又はC1-6アルコキシC1-6アルキル基であり;更に好ましくは、水素原子、フッ素原子、臭素原子、又はメトキシメチル基から選ばれる置換基が1〜2個置換しても良く;特に好ましくは、無置換である。[3-9] In each of the formulas of the above aspect [3], R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy group, and a C 1-6 alkoxy C 1-6. It is a substituent selected from an alkyl group, a carboxamide group, and a C 1-6 alkoxycarbonyl group; more preferably a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group; even more preferably a hydrogen atom. , Fluorine atom, bromine atom, or methoxymethyl group may be substituted with one or two substituents; particularly preferably unsubstituted.
[3−10]前記態様[3]の各式中において、R1の置換様式は、好ましくは、1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式(PH−1)ないし式(PH−4)で表わされる置換様式をとり;[3-10] In each of the formulas of the above aspect [3], the substitution mode of R 1 is preferably the following partial structural formula (p = 1) when one substituent is substituted by R 1 (p = 1). It takes a substitution mode represented by PH-1) to the formula (PH-4);
2個の置換基がR1によって置換する場合の部分構造式は、下記部分構造式(PH−5)ないし式(PH−10))で表わされる置換様式をとり;When two substituents are substituted by R 1 , the partial structural formula takes the substitution mode represented by the following partial structural formulas (PH-5) to (PH-10));
より好ましくは、1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式:More preferably, when one substituent is substituted by R 1 (p = 1), the following partial structural formula:
で表わされる置換様式をとり;より具体的な置換基との組み合わせとしては、下記部分構造式: The substitution mode represented by is taken; as a combination with a more specific substituent, the following partial structural formula:
から選ばれる置換様式をとる。
2個の置換基がR1によって置換する場合(p=2)は、下記部分構造式:Take the replacement style chosen from.
When two substituents are substituted by R 1 (p = 2), the following partial structural formula:
で表わされる置換様式をとり;
より具体的な置換基との組み合わせとしては、下記部分構造式:
の置換様式をとる。Takes the substitution form represented by;
As a more specific combination with a substituent, the following partial structural formula:
Take the replacement form of.
[3−11]前記態様[3]の工程(1)において、好ましくは、過酸化水素水の量は、式(TH−1)1等量に対して、1.5〜5等量の範囲であり;チタン触媒の量は、式(TH−1)に対して、1.0〜5.0mol%の範囲であり;配位子は、式(TH−1)に対して、1.2〜6.0mol%の範囲であり;チタン触媒は、チタンテトライソプロポキシドであり;緩衝液は、リン酸緩衝液であり;溶媒(反応に関与しない溶媒)は、ジクロロメタンであり;溶媒(反応に関与しない溶媒)の量は、式(TH−1)の質量に対して、5〜20倍量の範囲であり;反応溶液のpHは、pH=7.4〜8.0であり;反応時間は、20時間以下である。 [3-11] In the step (1) of the above aspect [3], the amount of the hydrogen peroxide solution is preferably in the range of 1.5 to 5 equivalents with respect to 1 equivalent of the formula (TH-1). The amount of titanium catalyst is in the range of 1.0-5.0 mol% relative to formula (TH-1); the ligand is 1.2 relative to formula (TH-1). In the range of ~ 6.0 mol%; the titanium catalyst is titanium tetraisopropoxide; the buffer is a phosphate buffer; the solvent (solvent not involved in the reaction) is dichloromethane; the solvent (reaction). The amount of solvent not involved in the reaction is in the range of 5 to 20 times the mass of the formula (TH-1); the pH of the reaction solution is pH = 7.4 to 8.0; the reaction. The time is 20 hours or less.
[3−12]前記態様[3]の工程(1)において、より好ましくは、過酸化水素水の量は、式(TH−1)1等量に対し、1.5又は5.0等量であり;チタン触媒の量は式(TH−1)に対し、1.0又は3.0mol%であり;配位子は、式(TH−1)に対して、1.2又は3.6mol%であり;チタン触媒は、チタンテトライソプロポキシドであり;緩衝液は、リン酸緩衝液であり;溶媒(反応に関与しない溶媒)は、ジクロロメタンであり;溶媒(反応に関与しない溶媒)の量は、5倍量であり;反応溶液のpHは、pH=7.4又はpH=8.0であり;反応時間は、4時間以下である。 [3-12] In the step (1) of the above aspect [3], more preferably, the amount of the hydrogen peroxide solution is 1.5 or 5.0 equal to 1 equal amount of the formula (TH-1). The amount of titanium catalyst is 1.0 or 3.0 mol% relative to formula (TH-1); the ligand is 1.2 or 3.6 mol% relative to formula (TH-1). %; The titanium catalyst is titanium tetraisopropoxide; the buffer is a phosphate buffer; the solvent (solvent not involved in the reaction) is dichloromethane; the solvent (solvent not involved in the reaction) The amount is 5 times the amount; the pH of the reaction solution is pH = 7.4 or pH = 8.0; the reaction time is 4 hours or less.
[4]本発明の第4の態様は、下記式(AM−X):
[4] A fourth aspect of the present invention is the following formula (AM-X):
[式(AM−X)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基である]で表される化合物の製造方法であって、以下の工程:
(3)下記式(EP−1):[In formula (AM-X), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group. , Hydroxy C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C A substituent selected from a 2-7 alkanoylamino group, a carboxamide group, and a C 1-6 alkoxycarbonyl group], which is a method for producing a compound represented by the following steps:
(3) The following formula (EP-1):
[式(EP−1)中、p及びR1は、前記式(AM−X)中の定義と同じである]で表される化合物をアンモニア水に加え、前記式(EP−1)で表される化合物とアンモニア水とを含む混合溶液(3)を得る工程、及び
(4)前記混合溶液(3)を、0℃から前記混合溶液(3)が還流する温度までの間のいずれかの温度で反応を行い、式(AM−X)で表される化合物を得る工程、を含む製造方法である。The compound represented by [in the formula (EP-1), p and R 1 are the same as the definitions in the above formula (AM-X)] is added to aqueous ammonia and represented by the above formula (EP-1). Any one of the steps of obtaining a mixed solution (3) containing the compound to be used and aqueous ammonia, and (4) the mixed solution (3) from 0 ° C. to the temperature at which the mixed solution (3) is refluxed. It is a production method including a step of carrying out a reaction at temperature to obtain a compound represented by the formula (AM-X).
[4−1−1]前記態様[4]の工程(4)の反応は、好ましくは、封管反応瓶を用いる封管反応である。 [4-1-1] The reaction in step (4) of the above aspect [4] is preferably a sealing reaction using a sealing reaction bottle.
[4−1−2]前記態様[4−1−1]の封管反応の好ましい反応温度は100℃である。 [4-1-2] The preferable reaction temperature of the sealing tube reaction of the above aspect [4-1-1] is 100 ° C.
[4−1−3]前記態様[4−1−1]の封管反応の好ましい反応時間は2時間である。 [4-1-3] The preferable reaction time of the sealing reaction of the above aspect [4-1-1] is 2 hours.
[4−2]前記態様[4]の各式中において、pは、好ましくは、0または1の整数であり、より好ましくは0の整数である。 [4-2] In each of the formulas of the above aspect [4], p is preferably an integer of 0 or 1, and more preferably an integer of 0.
[4−3]前記態様[4]の各式中において、R1は、好ましくは、ハロゲン原子、ヒドロキシC1-6アルキル基、C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基であり;より好ましくは、ハロゲン原子、又はC1-6アルコキシC1-6アルキル基であり;更に好ましくは、水素原子、フッ素原子、臭素原子、又はメトキシメチル基から選ばれる置換基が1〜2個置換しても良く;特に好ましくは、無置換である。[4-3] In each of the formulas of the above aspect [4], R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy group, and a C 1-6 alkoxy C 1-6. It is a substituent selected from an alkyl group, a carboxamide group, and a C 1-6 alkoxycarbonyl group; more preferably a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group; even more preferably a hydrogen atom. , Fluorine atom, bromine atom, or methoxymethyl group may be substituted with one or two substituents; particularly preferably unsubstituted.
[4−4]前記態様[4]の各式中において、R1の置換様式は、好ましくは、1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式(PH−1)ないし式(PH−4)で表わされる置換様式をとり;[4-4] In each of the formulas of the above aspect [4], the substitution mode of R 1 is preferably the following partial structural formula (p = 1) when one substituent is substituted by R 1 (p = 1). It takes a substitution mode represented by PH-1) to the formula (PH-4);
2個の置換基がR1によって置換する場合(p=2)の部分構造式は、下記部分構造式(PH−5)ないし式(PH−10))で表わされる置換様式をとり;When two substituents are substituted by R 1 (p = 2), the partial structural formula takes the substitution mode represented by the following partial structural formulas (PH-5) to (PH-10));
より好ましくは、1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式:
More preferably, when one substituent is substituted by R 1 (p = 1), the following partial structural formula:
で表わされる置換様式をとり;より具体的な置換基との組み合わせとしては、下記部分構造式:
The substitution mode represented by is taken; as a combination with a more specific substituent, the following partial structural formula:
から選ばれる置換様式をとる。
2個の置換基がR1によって置換する場合(p=2)は、下記部分構造式:
Take the replacement style chosen from.
When two substituents are substituted by R 1 (p = 2), the following partial structural formula:
で表わされる置換様式をとり;
より具体的な置換基との組み合わせとしては、下記部分構造式:
の置換様式をとる。Takes the substitution form represented by;
As a more specific combination with a substituent, the following partial structural formula:
Take the replacement form of.
[5]本発明の第5の態様は、下記式(I):
[5] A fifth aspect of the present invention is the following formula (I):
[式(I)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基であり;環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基である]で表される化合物の製造方法であって、以下の工程:
(5)下記式(AM−1):[In formula (I), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy. C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C 2- It is a substituent selected from 7 alkanoylamino group, carboxamide group, and C 1-6 alkoxycarbonyl group; ring A is 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-. 3-Il group], which is a method for producing a compound represented by the following steps:
(5) The following formula (AM-1):
[式(AM−1)中、環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基である]で表わされる化合物と、トリホスゲン、ホスゲン、クロロギ酸トリクロロメチル、2,2,2−トリクロロエチルクロロホルメート、クロロギ酸フェニル、クロロギ酸p−ニトロフェニル、クロロギ酸p−トリル、N,N´−カルボニルジイミダゾール、及びN,N´−ジスクシンイミジルカルボナート等から選ばれるウレア化剤と、塩基とを、溶媒に加えて混合溶液(5)を得る工程、(6)前記混合溶液(5)を、0℃から前記混合溶液(5)が還流する温度までの間のいずれかの温度で反応を行い、下記式(CB−1): [In the formula (AM-1), ring A is a 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl group], and triphosgene. Hosgene, trichloromethyl chlorophosphate, 2,2,2-trichloroethylchloroformate, phenylchlorophosphate, p-nitrophenyl chloroate, p-tolyl chlorogitate, N, N'-carbonyldiimidazole, and N, N' A step of adding a urelating agent selected from −discusin imidazole carbonate or the like and a base to a solvent to obtain a mixed solution (5), (6) the mixed solution (5) from 0 ° C. to the mixed solution. The reaction was carried out at any temperature up to the temperature at which (5) refluxed, and the following formula (CB-1):
[式(CB−1)中、環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基であり;Yは、トリクロロメトキシ基、塩素原子、2,2,2−トリクロロエトキシ基、フェノキシ基、p−ニトロフェノキシ基、p−メチルフェノキシ基、イミダゾール−1−イル基、(2,5−ジオキソピロリジン−1−イル)オキシ基、等から選ばれる基である]で表わされる化合物を得る工程、
前記式(CB−1)で表わされる化合物と、
下記式(AM−X):[In formula (CB-1), ring A is a 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl group; Y is a trichloromethoxy group, chlorine. Atomic, 2,2,2-trichloroethoxy group, phenoxy group, p-nitrophenoxy group, p-methylphenoxy group, imidazol-1-yl group, (2,5-dioxopyrrolidin-1-yl) oxy group, The process of obtaining the compound represented by], which is a group selected from the above, etc.
The compound represented by the above formula (CB-1) and
The following formula (AM-X):
[式(AM−X)中、p及びR1は、前記式(I)中の定義と同じである]で表される化合物と、塩基とを、溶媒に加え混合溶液(7)を得る工程、及び
(8)前記混合溶液(7)を、0℃から前記混合溶液(7)が還流する温度までの間のいずれかの温度で反応を行い、式(I)で表される化合物を得る工程、を含む製造方法である。A step of adding a compound represented by [in the formula (AM-X), p and R 1 are the same as the definitions in the formula (I)] and a base to a solvent to obtain a mixed solution (7). , And (8) the mixed solution (7) is reacted at any temperature between 0 ° C. and the temperature at which the mixed solution (7) refluxes to obtain a compound represented by the formula (I). It is a manufacturing method including a step.
[5−1]前記態様[5]の工程(5)において、ウレア化剤は、好ましくは、クロロギ酸フェニル、クロロギ酸p−トリル、又は2,2,2−トリクロロエチルクロロホルメートであり;より好ましくは、2,2,2−トリクロロエチルクロロホルメートである。 [5-1] In step (5) of the above aspect [5], the urea agent is preferably phenylchloroformate, p-tolyl chloroformate, or 2,2,2-trichloroethylchloroformate; More preferably, it is 2,2,2-trichloroethylchloroformate.
[5−2]前記態様[5]の工程(5)において、塩基は、好ましくは、ピリジン、トリエチルアミン、又はN,N−ジイソプロピルエチルアミン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン(DBU)、等の有機塩基、炭酸水素ナトリウム、炭酸ナトリウム、又は炭酸カリウム等の無機塩基、カリウムtert−ブトキシド、ナトリウムtert−ブトキシド、等の金属アルコキシド、水素化ナトリウム、水素化カリウム、又は水素化カルシウム等の水素化金属化合物、メチルリチウム、又はブチルリチウム等のアルキルリチウム、リチウムヘキサメチルジシラジド、又はリチウムジイソプロピルアミド等のリチウムアミド、又は、それらの混合物等であり;より好ましくは、ピリジンである。 [5-2] In step (5) of the above aspect [5], the base is preferably pyridine, triethylamine, or N, N-diisopropylethylamine, 1,8-diazabicyclo [5.4.0] -7-. Organic bases such as undecene (DBU), inorganic bases such as sodium hydrogen carbonate, sodium carbonate, or potassium carbonate, metal alkoxides such as potassium tert-butoxide, sodium tert-butoxide, etc., sodium hydride, potassium hydride, or hydrogen. Metal hydride compounds such as calcium hydride, alkyl lithium such as methyl lithium or butyl lithium, lithium amides such as lithium hexamethyldisilazide, or lithium diisopropylamide, or mixtures thereof; more preferably pyridine. Is.
[5−3]前記態様[5]の工程(5)において、溶媒は、好ましくは、ジメチルホルムアミド、ジメチルアセトアミド、ジメチルスルホキシド、N−メチルピロリドン、又はアセトニトリル、等の非プロトン性極性溶媒、ジエチルエーテル、テトラヒドロフラン、ジメトキシエタン、又は1,4−ジオキサン等のエーテル系溶媒、酢酸エチル、又は酢酸プロピル等のエステル系溶媒、ジクロロメタン、クロロホルム、又は1,2−ジクロロエタン等の塩素系溶媒、又は、それらの混合溶媒等であり;より好ましくは、テトラヒドロフランである。 [5-3] In the step (5) of the above aspect [5], the solvent is preferably an aproton polar solvent such as dimethylformamide, dimethylacetamide, dimethylsulfoxide, N-methylpyrrolidone, or acetonitrile, diethyl ether. , Tetrahydrofuran, dimethoxyethane, or ether solvents such as 1,4-dioxane, ester solvents such as ethyl acetate or propyl acetate, chlorine solvents such as dichloromethane, chloroform, or 1,2-dichloroethane, or theirs. It is a mixed solvent or the like; more preferably tetrahydrofuran.
[5−4]前記態様[5]の工程(5)において、式(CB−1)中のYは、好ましくは、フェノキシ基、p−メチルフェノキシ基、又は2,2,2−トリクロロエトキシ基であり;より好ましくは、2,2,2−トリクロロエトキシ基である。 [5-4] In the step (5) of the above aspect [5], Y in the formula (CB-1) is preferably a phenoxy group, a p-methylphenoxy group, or a 2,2,2-trichloroethoxy group. More preferably, it is a 2,2,2-trichloroethoxy group.
[5−5]前記態様[5]の工程(7)において、溶媒は、好ましくは、ジメチルホルムアミド、ジメチルアセトアミド、ジメチルスルホキシド、N−メチルピロリドン、又はアセトニトリル、等の非プロトン性極性溶媒、ジエチルエーテル、テトラヒドロフラン、ジメトキシエタン、又は1,4−ジオキサン等のエーテル系溶媒、酢酸エチル、又は酢酸プロピル等のエステル系溶媒、ジクロロメタン、クロロホルム、又は1,2−ジクロロエタン等の塩素系溶媒、又は、それらの混合溶媒等であり;より好ましくは、N−メチルピロリドンである。 [5-5] In the step (7) of the above aspect [5], the solvent is preferably an aproton polar solvent such as dimethylformamide, dimethylacetamide, dimethylsulfoxide, N-methylpyrrolidone, or acetonitrile, diethyl ether. , Tetrahydrofuran, dimethoxyethane, or ether solvent such as 1,4-dioxane, ester solvent such as ethyl acetate or propyl acetate, chlorine solvent such as dichloromethane, chloroform, or 1,2-dichloroethane, or theirs. It is a mixed solvent or the like; more preferably N-methylpyrrolidone.
[5−6]前記態様[5]の(7)において、塩基は、好ましくは、ピリジン、トリエチルアミン、又はN,N−ジイソプロピルエチルアミン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン(DBU)、等の有機塩基、炭酸水素ナトリウム、炭酸ナトリウム、又は炭酸カリウム等の無機塩基、カリウムtert−ブトキシド、ナトリウムtert−ブトキシド、等の金属アルコキシド、水素化ナトリウム、水素化カリウム、又は水素化カルシウム等の水素化金属化合物、メチルリチウム、又はブチルリチウム等のアルキルリチウム、リチウムヘキサメチルジシラジド、又はリチウムジイソプロピルアミド等のリチウムアミド、又は、それらの混合物等であり;より好ましくは、トリエチルアミンである。 [5-6] In (7) of the above aspect [5], the base is preferably pyridine, triethylamine, or N, N-diisopropylethylamine, 1,8-diazabicyclo [5.4.0] -7-undecene. Organic bases such as (DBU), inorganic bases such as sodium hydrogencarbonate, sodium carbonate, or potassium carbonate, metal alkoxides such as potassium tert-butoxide, sodium tert-butoxide, sodium hydride, potassium hydride, or hydrogenation. Metal hydride compounds such as calcium, alkyl lithium such as methyl lithium or butyl lithium, lithium amides such as lithium hexamethyldisilazide, or lithium diisopropylamide, or mixtures thereof; more preferably with triethylamine. is there.
[5−7]前記態様[5]の各式中において、pは、好ましくは、0または1の整数であり、より好ましくは0の整数である。 [5-7] In each of the formulas of the above aspect [5], p is preferably an integer of 0 or 1, and more preferably an integer of 0.
[5−8]前記態様[5]の各式中において、R1は、好ましくは、ハロゲン原子、ヒドロキシC1-6アルキル基、C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基であり;より好ましくは、ハロゲン原子、又はC1-6アルコキシC1-6アルキル基であり;更に好ましくは、水素原子、フッ素原子、臭素原子、又はメトキシメチル基から選ばれる置換基が1〜2個置換しても良く;特に好ましくは、無置換である。[5-8] In each of the formulas of the above aspect [5], R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy group, and a C 1-6 alkoxy C 1-6. It is a substituent selected from an alkyl group, a carboxamide group, and a C 1-6 alkoxycarbonyl group; more preferably a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group; even more preferably a hydrogen atom. , Fluorine atom, bromine atom, or methoxymethyl group may be substituted with one or two substituents; particularly preferably unsubstituted.
[5−9]前記態様[5]の各式中において、R1の置換様式は、好ましくは、1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式(PH−1)ないし式(PH−4)で表わされる置換様式をとり;
[5-9] In each of the formulas of the above aspect [5], the substitution mode of R 1 is preferably the following partial structural formula (p = 1) when one substituent is substituted by R 1 (p = 1). It takes a substitution mode represented by PH-1) to the formula (PH-4);
2個の置換基がR1によって置換する場合の部分構造式は、下記部分構造式(PH−5)ないし式(PH−10))で表わされる置換様式をとり;
When two substituents are substituted by R 1 , the partial structural formula takes the substitution mode represented by the following partial structural formulas (PH-5) to (PH-10));
より好ましくは、1個の置換基がR1によって置換する場合(p=1)は、下記部分構造式:
More preferably, when one substituent is substituted by R 1 (p = 1), the following partial structural formula:
で表わされる置換様式をとり;より具体的な置換基との組み合わせとしては、下記部分構造式:
The substitution mode represented by is taken; as a combination with a more specific substituent, the following partial structural formula:
から選ばれる置換様式をとる。
2個の置換基がR1によって置換する場合(p=2)は、下記部分構造式:
Take the replacement style chosen from.
When two substituents are substituted by R 1 (p = 2), the following partial structural formula:
で表わされる置換様式をとり;
より具体的な置換基との組み合わせとしては、下記部分構造式:
の置換様式をとる。Takes the substitution form represented by;
As a more specific combination with a substituent, the following partial structural formula:
Take the replacement form of.
以下に、本発明の態様[1]〜[5]中の各置換基について具体的に説明する。本発明の化合物に関する説明において、例えば「C1-6」とは、構成炭素原子数が1から6であることを示し、特に断らない限り、直鎖、分枝鎖又は環状の基の総炭素原子数を表わす。鎖状の基と環状の基を含む基については「鎖と環の総炭素原子数」を意味する。Hereinafter, each substituent in aspects [1] to [5] of the present invention will be specifically described. In the description of the compounds of the present invention, for example, "C 1-6 " indicates that the number of constituent carbon atoms is 1 to 6, and unless otherwise specified, the total carbon of a linear, branched or cyclic group is used. Represents the number of atoms. A group containing a chain group and a cyclic group means "total number of carbon atoms in the chain and ring".
本明細書中、特に断りのない限り、「ハロゲン原子」としては、例えば、フッ素原子、塩素原子、臭素原子、又はヨウ素原子等が挙げられる。
本明細書中、特に断りのない限り、「ハロゲン化C1-6アルキル基」等における「ハロゲン化」とは、置換基として数個の、好ましくは1〜5個の前記「ハロゲン原子」を有していてもよいことを意味する。
本明細書中、特に断りのない限り、「シアノ化C1-6アルキル」等における「シアノ化」とは、置換基として数個の、好ましくは1〜5個の「シアノ基」を有していてもよいことを意味する。Unless otherwise specified in the present specification, examples of the "halogen atom" include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
In the present specification, unless otherwise specified, "halogenation" in "halogenated C 1-6 alkyl groups" and the like means several, preferably 1 to 5 "halogen atoms" as substituents. It means that you may have it.
In the present specification, unless otherwise specified, "cyanolation " in "Cyanated C 1-6 alkyl" and the like has several, preferably 1 to 5 "cyano groups" as substituents. It means that it may be.
本明細書中、特に断りのない限り、「C1-6アルキル基」としては、例えば、メチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、sec−ブチル、tert−ブチル、ペンチル、イソペンチル、ネオペンチル、又はヘキシル等の基が挙げられる。Unless otherwise specified, the "C 1-6 alkyl group" in the present specification includes, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl, neopentyl, and the like. Alternatively, a group such as hexyl can be mentioned.
本明細書中、特に断りのない限り、「ハロゲン化C1-6アルキル基」とは、前記「C1-6アルキル」が数個の、好ましくは1〜5個のハロゲン原子で任意に置換されている基を意味し、例えば、フルオロメチル、ジフルオロメチル、トリフルオロメチル、2,2,2−トリフルオロエチル、1,1,2,2−テトラフルオロエチル、又はペンタフルオロエチル等の基が挙げられる。Herein, unless otherwise indicated, the term "halogenated C 1-6 alkyl group", the "C 1-6 alkyl" is several, preferably substituted optionally with 1-5 halogen atoms Means that the group is, for example, a group such as fluoromethyl, difluoromethyl, trifluoromethyl, 2,2,2-trifluoroethyl, 1,1,2,2-tetrafluoroethyl, or pentafluoroethyl. Can be mentioned.
本明細書中、特に断りのない限り、「ヒドロキシC1-6アルキル基」とは、前記「C1-6アルキル」が数個の、好ましくは1〜5個の水酸基で任意に置換されている基を意味し、例えば、ヒドロキシメチル、2−ヒドロキシエチル、3−ヒドロキシプロピル、又は2,2−ジメチル−2−ヒドロキシエチル(=2−ヒドロキシ−2−メチルプロピル)等の基が挙げられる。
本明細書中、特に断りのない限り、「シアノ化C1-6アルキル基」とは、前記「C1-6アルキル」が数個の、好ましくは1〜5個のシアノで任意に置換されている基を意味し、例えば、シアノメチル、1−シアノエチル、又は2−シアノエチル等の基が挙げられる。In the present specification, unless otherwise specified, the "hydroxy C 1-6 alkyl group" means that the "C 1-6 alkyl" is optionally substituted with several, preferably 1 to 5 hydroxyl groups. Examples include groups such as hydroxymethyl, 2-hydroxyethyl, 3-hydroxypropyl, and 2,2-dimethyl-2-hydroxyethyl (= 2-hydroxy-2-methylpropyl).
In the present specification, unless otherwise specified, the "cyanolated C 1-6 alkyl group" is the above-mentioned "C 1-6 alkyl" optionally substituted with several, preferably 1 to 5 cyanos. Examples include groups such as cyanomethyl, 1-cyanoethyl, and 2-cyanoethyl.
本明細書中、特に断りのない限り、「C1-6アルコキシ基」とは、前記した「C1-6アルキル」が酸素原子に結合したアルコキシを表し、例えば、メトキシ、エトキシ、プロポキシ、イソプロポキシ、ブトキシ、イソブトキシ、sec-ブトキシ、tert−ブトキシ、ペンチルオキシ、又はヘキシルオキシ等の基が挙げられる。
本明細書中、特に断りのない限り、「ハロゲン化C1-6アルコキシ基」とは、前記した「ハロゲン化C1-6アルキル」が酸素原子に結合したハロゲン化アルコキシを表し、例えば、フルオロメトキシ、ジフルオロメトキシ、トリフルオロメトキシ、2,2,2−トリフルオロエトキシ、又は1,1,2,2−テトラフルオロエトキシ、ペンタフルオロエトキシ等の基が挙げられる。In the present specification, unless otherwise specified, the "C 1-6 alkoxy group" represents an alkoxy in which the above-mentioned "C 1-6 alkyl" is bonded to an oxygen atom, and examples thereof include methoxy, ethoxy, propoxy, and iso. Groups such as propoxy, butoxy, isobutoxy, sec-butoxy, tert-butoxy, pentyloxy, hexyloxy and the like can be mentioned.
Unless otherwise specified in the present specification, the "halogenated C 1-6 alkoxy group" represents a halogenated alkoxy in which the above-mentioned "halogenated C 1-6 alkyl" is bonded to an oxygen atom, for example, fluoro. Groups such as methoxy, difluoromethoxy, trifluoromethoxy, 2,2,2-trifluoroethoxy, or 1,1,2,2-tetrafluoroethoxy, pentafluoroethoxy and the like can be mentioned.
本明細書中、特に断りのない限り、「C1-6アルコキシC1-6アルキル基」とは、前記「C1-6アルコキシ」が前記「C1-6アルキル」に置換した基を意味する。本明細書中、特に断りのない限り、「C1-6アルコキシC1-6アルキル」としては、例えば、メトキシメチル、メトキシエチル、エトキシメチル、エトキシエチル、1,1−ジメトキシメチル、又は1,1−ジエトキシエチル等の基が挙げられる。In the present specification, unless otherwise specified, the "C 1-6 alkoxy C 1-6 alkyl group" means a group in which the "C 1-6 alkoxy" is replaced with the "C 1-6 alkyl". To do. Unless otherwise specified in the present specification, "C 1-6 alkoxy C 1-6 alkyl" includes, for example, methoxymethyl, methoxyethyl, ethoxymethyl, ethoxyethyl, 1,1-dimethoxymethyl, or 1, Groups such as 1-diethoxyethyl and the like can be mentioned.
本明細書中、特に断りのない限り、「モノ/ジC2-7アルカノイルアミノ基」とは、「アミノ基」の窒素原子上の一つ又は二つの水素原子が、後述する「C2-7アルカノイル基」で置換したアミノ基を意味し、例えば、アセトアミド、プロピオンアミド、ブチルアミド、イソブチルアミド、バレルアミド、イソバレルアミド、ピバルアミド、ヘキサンアミド、ヘプタンアミド、シクロプロパンカルボキサミド、シクロブタンカルボキサミド、シクロペンタンカルボキサミド、シクロヘキサンカルボキサミド、2−メチルシクロプロパンカルボキサミド、又はジアセトアミド等の基が挙げられる。
本明細書中、特に断りのない限り、「C2-7アルカノイル基」とは、前記「C1-6アルキル基」にカルボニル基が結合した、「C1-6アルキルカルボニル基」を意味し、例えば、アセチル、プロピオニル、ブチリル、イソブチリル、バレリル、イソバレリル、ピバロイル、ヘキサノイル、ヘプタノイル、シクロプロピルカルボニル、シクロブチルカルボニル、シクロペンチルカルボニル、シクロヘキシルカルボニル、シクロプロピルメチルカルボニル、又は2−メチルシクロプロピルカルボニル等の基が挙げられる。In the present specification, unless otherwise specified, the "mono / di C 2-7 alkanoylamino group" means that one or two hydrogen atoms on the nitrogen atom of the "amino group" are "C 2-" described later. It means an amino group substituted with "7 alkanoyl group", for example, acetamide, propionamide, butylamide, isobutyramide, barrelamide, isobarrelamide, pivalamide, hexaneamide, heptaneamide, cyclopropanecarboxamide, cyclobutanecarboxamide, cyclopentanecarboxamide, Examples thereof include groups such as cyclohexanecarboxamide, 2-methylcyclopropanecarboxamide, and diacetamide.
In the present specification, unless otherwise specified, the "C 2-7 alkanoyl group" means a "C 1-6 alkyl carbonyl group" in which a carbonyl group is bonded to the "C 1-6 alkyl group". , For example, groups such as acetyl, propionyl, butyryl, isobutyryl, valeryl, isovaleryl, pivaloyl, hexanoyl, heptanoyle, cyclopropylcarbonyl, cyclobutylcarbonyl, cyclopentylcarbonyl, cyclohexylcarbonyl, cyclopropylmethylcarbonyl, or 2-methylcyclopropylcarbonyl. Can be mentioned.
本明細書中、特に断りのない限り、「C1-6アルコキシカルボニル基」とは、「カルボキシ基(−COOH)」の水素原子が前記「C1-6アルキル基」に置換した基、即ち「エステル基」を意味し、例えば、メトキシカルボニル(メチルエステル)、エトキシカルボニル(エチルエステル)、又はtert−ブトキシカルボニル(tert−ブチルエステル)等の基が挙げられる。In the present specification, unless otherwise specified, the "C 1-6 alkoxycarbonyl group" is a group in which the hydrogen atom of the "carboxy group (-COOH) " is replaced with the "C 1-6 alkyl group", that is, It means "ester group", and examples thereof include groups such as methoxycarbonyl (methyl ester), ethoxycarbonyl (ethyl ester), and tert-butoxycarbonyl (tert-butyl ester).
本明細書前記態様中、特に断りのない限り、「ウレア化剤」としては、トリホスゲン、ホスゲン、クロロギ酸トリクロロメチル、2,2,2−トリクロロエチルクロロホルメート、クロロギ酸フェニル、クロロギ酸p−ニトロフェニル、クロロギ酸p−トリル、N,N´−カルボニルジイミダゾール、又はN,N´−ジスクシンイミジルカルボナート等が挙げられる。但し、上記に記載したウレア化剤に必ずしも限定されるわけではない。 In the above aspects of the present specification, unless otherwise specified, the "urea agent" includes triphosgene, phosgene, trichloromethylchloroformate, 2,2,2-trichloroethylchloroformate, phenylchloroformate, p-chloroformate. Examples thereof include nitrophenyl, p-tolyl chloroformate, N, N'-carbonyldiimidazole, and N, N'-disucciniimidazole carbonate. However, it is not necessarily limited to the urea agents described above.
本明細書前記態様中、特に断らない限り、「塩基」としては、例えば、ピリジン、トリエチルアミン、又はN,N−ジイソプロピルエチルアミン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン(DBU)、2,6−ルチジン、イミダゾール、トリブチルアミン、シクロヘキシルジメチルアミン、4−ジメチルアミノピリジン(DMAP)、N,N−ジメチルアニリン、1,5−ジアザビシクロ[4.3.0]−5−ノネン、1,4−ジアザビシクロ[2.2.2]オクタン、N−メチルピペリジン、N−メチルピロリジン、又はN−メチルモルホリン等の有機塩基、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化マグネシウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、炭酸カルシウム、炭酸水素ナトリウム、リン酸三カリウム、酢酸ナトリウム、又はフッ化セシウム等の無機塩基、ナトリウムメトキシド、ナトリウムエトキシド、カリウムtert−ブトキシド、ナトリウムtert−ブトキシド、等の金属アルコキシド、水素化ナトリウム、水素化カリウム、水素化カルシウム、又はナトリウムアミド、等の水素化金属化合物、メチルリチウム、n−ブチルリチウム、sec−ブチルリチウム、又はtert−ブチルリチウム等のアルキルリチウム、リチウムヘキサメチルジシラジド、又はリチウムジイソプロピルアミド等のリチウムアミド、又は、それらの混合物等が挙げられる。但し、上記に記載した塩基に必ずしも限定されるわけではない。これらの塩基は、単独で用いてもよく、又は適宜選択し二種以上の塩基を適宜の割合で混合して用いてもよい。 In the above embodiments, unless otherwise specified, the "base" includes, for example, pyridine, triethylamine, or N, N-diisopropylethylamine, 1,8-diazabicyclo [5.4.0] -7-undecene (DBU). ), 2,6-lutidine, imidazole, tributylamine, cyclohexyldimethylamine, 4-dimethylaminopyridine (DMAP), N, N-dimethylaniline, 1,5-diazabicyclo [4.3.0] -5-nonen, Organic bases such as 1,4-diazabicyclo [2.2.2] octane, N-methylpiperidin, N-methylpyrrolidin, or N-methylmorpholin, lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide, Inorganic bases such as lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, calcium carbonate, sodium hydrogencarbonate, tripotassium phosphate, sodium acetate, or cesium fluoride, sodium methoxydo, sodium ethoxydo, potassium tert-butoxide, sodium Metal alkoxides such as tert-butoxide, metal hydride compounds such as sodium hydride, potassium hydride, calcium hydride, or sodium amide, methyllithium, n-butyllithium, sec-butyllithium, or tert-butyllithium. Alkyllithium, lithium hexamethyldisilazide, lithium amide such as lithium diisopropylamide, or a mixture thereof. However, it is not necessarily limited to the bases described above. These bases may be used alone, or may be appropriately selected and used by mixing two or more kinds of bases in an appropriate ratio.
本明細書前記態様中、「溶媒」若しくは「反応に関与しない溶媒」は、例えば、水、シクロヘキサン、ヘキサン、ベンゼン、クロロベンゼン、トルエン、キシレン、メタノール、エタノール、1−プロパノール、2−プロパノール、tert−ブチルアルコール、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド、N−メチルピロリドン(NMP)、ヘキサメチルホスホリックトリアミド、1,3‐ジメチル‐2‐イミダゾリジノン、ジメチルスルホキシド(DMSO)、アセトニトリル、プロピオニトリル、ジエチルエーテル、ジイソプロピルエーテル、ジフェニルエーテル、メチルtert−ブチルエーテル(MTBE)、テトラヒドロフラン、2−メチルテトラヒドロフラン、1,4−ジオキサン、1,2−ジメトキシエタン、酢酸メチル、酢酸エチル、酢酸ブチル、アセトン、メチルエチルケトン、ジクロロメタン、クロロホルム、四塩化炭素、及び1,2−ジクロロエタン等から選ばれる当該反応に影響がでない溶媒が挙げられる。但し、上記に記載した溶媒に必ずしも限定されるわけではない。これらの溶媒は、溶媒は、一種の溶媒を単独で用いてもよく、又は適宜選択し二種以上の溶媒を適宜の割合で混合して用いてもよい。 In the above aspects, the "solvent" or "solvent not involved in the reaction" is, for example, water, cyclohexane, hexane, benzene, chlorobenzene, toluene, xylene, methanol, ethanol, 1-propanol, 2-propanol, tert-. Butyl alcohol, N, N-dimethylformamide (DMF), N, N-dimethylacetamide, N-methylpyrrolidone (NMP), hexamethylphosphoric triamide, 1,3-dimethyl-2-imidazolidinone, dimethyl sulfoxide ( DMSO), acetonitrile, propionitrile, diethyl ether, diisopropyl ether, diphenyl ether, methyl tert-butyl ether (MTBE), tetrahydrofuran, 2-methyl tetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane, methyl acetate, ethyl acetate , Butyl acetate, acetone, methyl ethyl ketone, dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane and the like, and examples thereof include solvents that do not affect the reaction. However, it is not necessarily limited to the solvents described above. As these solvents, one kind of solvent may be used alone, or two or more kinds of solvents may be appropriately selected and used in an appropriate ratio.
本明細書において、化合物の構造式中に不斉炭素がある場合、当該不斉炭素の近傍に立体配置を示すR又はSの記号を付す場合もある。例えば、下記式(AM−X)又は式(AM−Y)では、1位及び2位が不斉炭素であり、各式において当該不斉炭素の近傍にR又はSの記号を付している。
In the present specification, when there is an asymmetric carbon in the structural formula of the compound, the symbol R or S indicating the configuration may be added in the vicinity of the asymmetric carbon. For example, in the following formula (AM-X) or formula (AM-Y), the 1st and 2nd positions are asymmetric carbons, and in each formula, the symbol R or S is attached in the vicinity of the asymmetric carbon. ..
本明細書中の化合物(例えば、式(SM−2)、式(IM−6)、式(IM−7)、式(AM−1)、式(AM−X)、及び式(I)、等)は、置換基の種類によって、無機又は有機の酸との塩(酸付加塩)を形成する場合や、無機又は有機の塩基との塩を形成する場合がある。かかる塩としては、製薬学的に許容し得る塩であれば特に限定されないが、例えば、金属塩、アンモニウム塩、有機塩基との塩、無機酸との塩、有機酸との塩、塩基性、又は酸性アミノ酸との塩などが挙げられる。 Compounds herein (eg, formula (SM-2), formula (IM-6), formula (IM-7), formula (AM-1), formula (AM-X), and formula (I), Etc.) may form a salt with an inorganic or organic acid (acid addition salt) or a salt with an inorganic or organic base, depending on the type of substituent. The salt is not particularly limited as long as it is a pharmaceutically acceptable salt, and for example, a metal salt, an ammonium salt, a salt with an organic base, a salt with an inorganic acid, a salt with an organic acid, basicity, and the like. Alternatively, a salt with an acidic amino acid and the like can be mentioned.
金属塩の好適な例としては、例えば、リチウム塩、ナトリウム塩、カリウム塩、セシウム塩などのアルカリ金属塩、カルシウム塩、マグネシウム塩、バリウム塩などのアルカリ土類金属塩、アルミニウム塩などが挙げられる(例えば、モノ塩の他、二ナトリウム塩、二カリウム塩も含む)。有機塩基との塩の好適な例としては、例えば、メチルアミン、エチルアミン、t−ブチルアミン、t−オクチルアミン、ジエチルアミン、トリメチルアミン、トリエチルアミン、シクロヘキシルアミン、ジシクロヘキシルアミン、ジベンジルアミン、エタノールアミン、ジエタノールアミン、トリエタノールアミン、ピペリジン、モルホリン、ピリジン、ピコリン、リシン、アルギニン、オルニチン、エチレンジアミン、N−メチルグルカミン、グルコサミン、フェニルグリシンアルキルエステル、グアニジン、2,6−ルチジン、エタノールアミン、ジエタノールアミン、トリエタノールアミン、N,N'−ジベンジルエチレンジアミン等との塩が挙げられる。 Preferable examples of the metal salt include alkali metal salts such as lithium salt, sodium salt, potassium salt and cesium salt, alkaline earth metal salts such as calcium salt, magnesium salt and barium salt, and aluminum salt. (For example, in addition to monosalt, disodium salt and dipotassium salt are also included). Preferable examples of salts with organic bases include, for example, methylamine, ethylamine, t-butylamine, t-octylamine, diethylamine, trimethylamine, triethylamine, cyclohexylamine, dicyclohexylamine, dibenzylamine, ethanolamine, diethanolamine, tri. Ethanolamine, piperidine, morpholine, pyridine, picolin, lysine, arginine, ornithine, ethylenediamine, N-methylglucamine, glucosamine, phenylglycine alkyl ester, guanidine, 2,6-lutidine, ethanolamine, diethanolamine, triethanolamine, N , N'-dibenzylethylenediamine and the like.
無機酸との塩の好適な例としては、例えば、塩酸、臭化水素酸、よう化水素酸、硝酸、硫酸、リン酸等との塩が挙げられる。有機酸との塩の好適な例としては、例えば、ギ酸、酢酸、トリフルオロ酢酸、プロピオン酸、酪酸、吉草酸、エナント酸、カプリン酸、ミリスチン酸、パルミチン酸、ステアリン酸、乳酸、ソルビン酸、マンデル酸等の脂肪族モノカルボン酸等との塩、シュウ酸、マロン酸、コハク酸、フマル酸、マレイン酸、リンゴ酸、酒石酸等の脂肪族ジカルボン酸との塩、クエン酸等の脂肪族トリカルボン酸との塩、安息香酸、サリチル酸等の芳香族モノカルボン酸との塩、フタル酸等の芳香族ジカルボン酸の塩、桂皮酸、グリコール酸、ピルビン酸、オキシル酸、サリチル酸、N−アセチルシステイン等の有機カルボン酸との塩、メタンスルホン酸、ベンゼンスルホン酸、p−トルエンスルホン酸等の有機スルホン酸との塩、アスパラギン酸、グルタミン酸等の酸性アミノ酸類との酸付加塩が挙げられる。 Preferable examples of the salt with an inorganic acid include salts with hydrochloric acid, hydrobromic acid, hydroiodic acid, nitric acid, sulfuric acid, phosphoric acid and the like. Preferable examples of salts with organic acids include formic acid, acetic acid, trifluoroacetic acid, propionic acid, butyric acid, valeric acid, enanthic acid, capric acid, myristic acid, palmitic acid, stearic acid, lactic acid, sorbic acid, etc. Salts with aliphatic monocarboxylic acids such as mandelic acid, salts with aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, fumaric acid, maleic acid, malic acid, tartaric acid, and aliphatic tricarboxylic acids such as citric acid. Salts with acids, salts with aromatic monocarboxylic acids such as benzoic acid and salicylic acid, salts of aromatic dicarboxylic acids such as phthalic acid, cinnamic acid, glycolic acid, pyruvate, oxylic acid, salicylic acid, N-acetylcysteine, etc. Examples thereof include salts with organic carboxylic acids, salts with organic sulfonic acids such as methanesulfonic acid, benzenesulfonic acid and p-toluenesulfonic acid, and acid addition salts with acidic amino acids such as aspartic acid and glutamate.
塩基性アミノ酸との塩の好適な例としては、例えば、アルギニン、リジン、オルニチンなどとの塩が挙げられ、酸性アミノ酸との塩の好適な例としては、例えば、アスパラギン酸、グルタミン酸などとの塩が挙げられる。このうち、薬学的に許容し得る塩が好ましい。例えば、化合物内に酸性官能基を有する場合にはアルカリ金属塩(例、ナトリウム塩、カリウム塩など)、アルカリ土類金属塩(例、カルシウム塩、マグネシウム塩、バリウム塩など)などの無機塩、アンモニウム塩など、又、化合物内に塩基性官能基を有する場合には、例えば、塩酸、臭化水素酸、硝酸、硫酸、リン酸など無機酸との塩、又は酢酸、フタル酸、フマル酸、シュウ酸、酒石酸、マレイン酸、クエン酸、コハク酸、メタンスルホン酸、p−トルエンスルホン酸などの有機酸との塩が挙げられる。 Preferable examples of salts with basic amino acids include salts with arginine, lysine, ornithine and the like, and preferred examples of salts with acidic amino acids include salts with aspartic acid, glutamic acid and the like. Can be mentioned. Of these, pharmaceutically acceptable salts are preferable. For example, when the compound has an acidic functional group, an inorganic salt such as an alkali metal salt (eg, sodium salt, potassium salt, etc.), an alkaline earth metal salt (eg, calcium salt, magnesium salt, barium salt, etc.), When the compound has a basic functional group such as an ammonium salt, for example, a salt with an inorganic acid such as hydrochloric acid, hydrobromic acid, nitrate, sulfuric acid, phosphoric acid, or acetic acid, phthalic acid, fumaric acid, Examples thereof include salts with organic acids such as oxalic acid, tartaric acid, maleic acid, citric acid, succinic acid, methanesulfonic acid and p-toluenesulfonic acid.
前記塩は、常法に従い、例えば、本明細書中の化合物と適量の酸もしくは塩基を含む溶液を混合することにより目的の塩を形成させた後に分別濾取するか、もしくは該混合溶媒を留去することにより得ることができる。又、本明細書中の化合物又はその塩は、水、エタノール、グリセロール等の溶媒と溶媒和物を形成し得る。塩に関する総説として、Handbook of Pharmaceutical Salts: Properties, Selection, and Use、Stahl&Wermuth(Wiley-VCH、2002)が出版されており、本書に詳細な記載がなされている。 The salt is prepared according to a conventional method, for example, by mixing a solution containing an appropriate amount of acid or base with the compound described in the present specification to form a desired salt, and then the salt is separated and collected by filtration, or the mixed solvent is retained. It can be obtained by leaving. Further, the compound in the present specification or a salt thereof can form a solvate with a solvent such as water, ethanol, or glycerol. A review of salts, Handbook of Pharmaceutical Salts: Properties, Selection, and Use, Stahl & Wermuth (Wiley-VCH, 2002), has been published and is detailed in this book.
本明細書中の化合物は、非溶媒和形態もしくは溶媒和形態で存在することがあり得る。本明細書において、「溶媒和物」は、本明細書中の化合物と1種または複数の薬学的に許容される溶媒分子(例えば、水、エタノール等)を含む分子複合体を意味する。前記溶媒分子が水であるとき、特に「水和物」と言う。 The compounds herein may be present in non-solvate or solvate form. As used herein, "solvate" means a molecular complex comprising a compound herein and one or more pharmaceutically acceptable solvent molecules (eg, water, ethanol, etc.). When the solvent molecule is water, it is particularly referred to as "hydrate".
本明細書中の化合物が、幾何異性体(ジオメトリカルアイソマー)、配置異性体(コンフィギュレーショナルアイソマー)、互変異性体(トウトメリックアイソマー)、光学異性体(オプティカルアイソマー)、立体異性体(ジアステレオマー)、位置異性体(レジオアイソマー)、回転異性体(ロテイショナルアイソマー)などの異性体を有する場合がある。 The compounds in the present specification are geometric isomers (geometric isomers), configuration isomers (configuration isomers), tautomers (toomeric isomers), optical isomers (optical isomers), and stereoisomers (diastereomers). It may have isomers such as mer), positional isomer (regioisomer), and rotational isomer (rotational isomer).
本明細書中の化合物に、幾何異性体、配置異性体、立体異性体、配座異性体等が存在する場合には、公知の手段によりそれぞれを単離することができる。 When the compound in the present specification contains a geometric isomer, an arrangement isomer, a conformation isomer, a conformation isomer, or the like, each of them can be isolated by a known means.
本明細書中の化合物が、光学異性体、立体異性体、位置異性体、回転異性体、互変異性体を含有する場合には、自体公知の合成手法、分離手法により各々の異性体を単一の化合物として得ることができる。例えば、光学分割法としては、自体公知の方法、例えば、(1)分別再結晶法、(2)ジアステレオマー法、(3)キラルカラム法等が挙げられる。 When the compounds in the present specification contain optical isomers, stereoisomers, positional isomers, rotational isomers, and tautomers, each isomer is simply separated by a synthesis method and a separation method known per se. It can be obtained as one compound. For example, examples of the optical resolution method include methods known per se, such as (1) fractional recrystallization method, (2) diastereomer method, and (3) chiral column method.
(1)分別再結晶法:ラセミ体に対して光学分割剤をイオン結合させることにより結晶性のジアステレオマーを得た後、これを分別再結晶法によって分離し、所望により、中和工程を経てフリーの光学的に純粋な化合物を得る方法である。光学分割剤としては、例えば、(+)−マンデル酸、(−)−マンデル酸、(+)−酒石酸、(−)−酒石酸、(+)−1−フェネチルアミン、(−)−1−フェネチルアミン、シンコニン、(−)−シンコニジン、ブルシン等が挙げられる。 (1) Fractional recrystallization method: A crystalline diastereomer is obtained by ionic bonding an optical resolution agent to a racemate, which is separated by a fractional recrystallization method, and if desired, a neutralization step is performed. It is a method of obtaining a free optically pure compound. Examples of the optical resolution agent include (+)-mandelic acid, (-)-mandelic acid, (+)-tartaric acid, (-)-tartaric acid, (+)-1-phenethylamine, (-)-1-phenethylamine, and the like. Examples thereof include cinchonine, (-)-cinchonidine, brucine and the like.
(2)ジアステレオマー法:ラセミ体の混合物に光学分割剤を共有結合(反応)させ、ジアステレオマーの混合物とした後、これを通常の分離手段(例、分別再結晶、シリカゲルカラムクロマトグラフィー、HPLC(高速液体クロマトグラフィー)等)等を経て光学的に純粋なジアステレオマーへ分離した後、加水分解反応等の化学的な処理により、光学分割剤を除去することにより、光学的に純粋な光学異性体を得る方法である。例えば、本発明の化合物に分子内水酸基または1級、2級アミノ基を有する場合、該化合物と光学活性な有機酸(例、MTPA〔α−メトキシ−α−(トリフルオロメチル)フェニル酢酸〕、(−)−メントキシ酢酸等)等とを縮合反応に付すことにより、それぞれエステル体またはアミド体のジアステレオマーが得られる。一方、本発明の化合物にカルボキシ基が有る場合、該化合物と光学活性アミンまたはアルコール試薬とを縮合反応に付すことにより、それぞれアミド体またはエステル体のジアステレオマーが得られる。上記の分離された各ジアステレオマーは、酸加水分解または塩基性加水分解反応に付すことにより、元の化合物の光学異性体に変換される。 (2) Diastereomer method: An optical resolution agent is covalently bonded (reacted) to a mixture of racemic compounds to obtain a mixture of diastereomers, which is then subjected to conventional separation means (eg, fractional recrystallization, silica gel column chromatography). , HPLC (High Performance Liquid Chromatography), etc.), and then separated into optically pure diastereomers, and then optically pure by removing the optical resolution agent by chemical treatment such as hydrolysis reaction. This is a method for obtaining a good optical isomer. For example, when the compound of the present invention has an intramolecular hydroxyl group or a primary or secondary amino group, the compound and an optically active organic acid (eg, MTPA [α-methoxy-α- (trifluoromethyl) phenylacetic acid]], (-)-Mentoxyacetic acid, etc.) and the like are subjected to a condensation reaction to obtain ester or amide diastereomers, respectively. On the other hand, when the compound of the present invention has a carboxy group, diastereomers of amides or esters can be obtained by subjecting the compound to an optically active amine or alcohol reagent in a condensation reaction, respectively. Each of the above separated diastereomers is converted to an optical isomer of the original compound by subjecting it to an acid hydrolysis or a basic hydrolysis reaction.
(3)キラルカラム法:ラセミ体またはその塩をキラルカラム(光学異性体分離用カラム)でのクロマトグラフィーに付すことで、直接光学分割する方法である。例えば、高速液体クロマトグラフィー(High performance liquid chromatography:HPLC)の場合、ダイセル社製CHIRALシリーズ等のキラルカラムに光学異性体の混合物を添加し、水、種々の緩衝液(例、リン酸緩衝液)、有機溶媒(例、エタノール、メタノール、イソプロパノール、アセトニトリル、トリフルオロ酢酸、ジエチルアミン)を単独で、または混合した溶液として用いて、展開させることにより、光学異性体を分離することができる。また、例えば、ガスクロマトグラフィーの場合、CP−Chirasil−DeX CB(ジーエルサイエンス社製)等のキラルカラム使用して分離することができる。 (3) Chiral column method: A method of directly optical resolution by subjecting a racemate or a salt thereof to chromatography on a chiral column (column for separating optical isomers). For example, in the case of high performance liquid chromatography (HPLC), a mixture of optical isomers is added to a chiral column such as CHIRAL series manufactured by Daicel Co., Ltd., and water, various buffers (eg, phosphate buffer), Optical isomers can be separated by developing organic solvents (eg, ethanol, methanol, isopropanol, acetonitrile, trifluoroacetic acid, diethylamine) alone or as a mixed solution. Further, for example, in the case of gas chromatography, separation can be performed using a chiral column such as CP-Chirasil-DeX CB (manufactured by GL Sciences).
本明細書中の化合物は、結晶となり得る場合もある。結晶である場合、その結晶形が単一であっても結晶形混合物であっても良い。 The compounds herein may be crystalline. When it is a crystal, it may have a single crystal form or a mixture of crystal forms.
本明細書中の化合物は、薬学的に許容され得る共結晶または共結晶塩であってもよい。ここで、共結晶または共結晶塩とは、各々が異なる物理的特性(例えば、構造、融点、融解熱、吸湿性、溶解性および安定性等)を持つ、室温で二種またはそれ以上の独特な固体から構成される結晶性物質を意味する。共結晶または共結晶塩は、自体公知の共結晶化法に従い製造することができる。 The compounds herein may be pharmaceutically acceptable co-crystals or co-crystal salts. Here, a co-crystal or a co-crystal salt is unique to two or more at room temperature, each having different physical properties (eg, structure, melting point, heat of fusion, hygroscopicity, solubility and stability). It means a crystalline substance composed of a solid solid. The co-crystal or co-crystal salt can be produced according to a co-crystallization method known per se.
本明細書中の化合物には、同位元素(例えば、水素の同位体:2Hおよび3Hなど、炭素の同位体:11C、13C、および14Cなど、塩素の同位体:36Clなど、フッ素の同位体:18Fなど、ヨウ素の同位体:123Iおよび125Iなど、窒素の同位体:13Nおよび15Nなど、酸素の同位体:15O、17O、および18Oなど、リンの同位体:32Pなど、ならびに硫黄の同位体:35Sなど)で標識、又は置換された化合物も含まれる。The compounds herein include isotopes (eg, hydrogen isotopes: 2 H and 3 H, etc., carbon isotopes: 11 C, 13 C, and 14 C, etc., chlorine isotopes: 36 Cl, etc.) , Fluorine isotopes: 18 F, etc., Iodine isotopes: 123 I and 125 I, etc., Nitrogen isotopes: 13 N and 15 N, etc., Oxygen isotopes: 15 O, 17 O, and 18 O, etc. Also included are compounds labeled or substituted with phosphorus isotopes: 32 P, etc., and sulfur isotopes: 35 S, etc.).
ある種の同位元素(例えば、11C、18F、15O、および13Nなどの陽電子放出同位元素)で標識または置換された本発明の化合物は、例えば、陽電子断層法(Positron Emission Tomography;PET)において使用するトレーサー(PETトレーサー)として用いることができ、医療診断などの分野において有用である。The compounds of the present invention labeled or substituted with certain isotopes (eg, positron emitting isotopes such as 11 C, 18 F, 15 O, and 13 N) are, for example, positron emission tomography (PET). ) Can be used as a tracer (PET tracer), and is useful in fields such as medical diagnosis.
ある種の同位体標識で標識または置換された本発明の化合物は、薬物および/または基質の組織分布研究において有用である。例えば、3Hおよび14Cは、それらの標識または置換が容易であり、かつ検出手段が容易である点から、該研究目的において有用である。The compounds of the invention labeled or substituted with certain isotope labels are useful in studying the tissue distribution of drugs and / or substrates. For example, 3 H and 14 C are useful for the research purpose because they are easy to label or replace and easy to detect.
同位体標識された本発明の化合物は、当業者に知られている通常の技法によって、または後述の実施例に記載する合成方法に類似する方法によって得る事ができる。また、非標識化合物の代わりに、得られた同位体標識化合物を薬理実験に用いる事ができる。 Isotope-labeled compounds of the invention can be obtained by conventional techniques known to those of skill in the art or by methods similar to the synthetic methods described in Examples below. Moreover, the obtained isotope-labeled compound can be used for pharmacological experiments instead of the unlabeled compound.
本明細書前記態様中又は本明細書中の製造方法において、「0℃から前記混合溶液・・・が還流する温度までの間のいずれかの温度」「0℃から溶媒が還流する温度までの間のいずれかの温度」等の記載が意味する処は、それぞれ、0℃から各混合溶液(溶媒)が還流する温度迄の範囲内の任意の温度(一定温度)を意味する。
なお、本明細書において、特に断らない限り、「室温」とは、実験室、研究室等の温度の意味であり、通常約1℃から約30℃、好ましくは通常約5℃から約30℃、より好ましくは通常約15℃から約25℃、更に好ましくは20±3℃の温度を示すものとする。In the above aspect of the present specification or in the production method in the present specification, "any temperature between 0 ° C. and the temperature at which the mixed solution ... Refluxes" and "from 0 ° C. to the temperature at which the solvent refluxes." Where the description such as "any temperature in between" means, it means an arbitrary temperature (constant temperature) within the range from 0 ° C. to the temperature at which each mixed solution (solvent) refluxs.
In the present specification, unless otherwise specified, "room temperature" means the temperature of a laboratory, a laboratory, etc., and is usually about 1 ° C. to about 30 ° C., preferably about 5 ° C. to about 30 ° C. , More preferably usually from about 15 ° C to about 25 ° C, even more preferably 20 ± 3 ° C.
本発明の製造方法において、使用する溶媒は、一種の溶媒を単独で用いてもよく、又は反応条件により適宜選択し二種以上の溶媒を適宜の割合で混合して用いてもよい。
本発明の製造方法において、化合物の抽出、乾燥、精製等の工程は、周知の方法で適宜行い得る。
本発明の製造方法において、各工程における反応時間は、特に断らない限り、反応が十分に進行する時間であればよく、適宜選択し得る。In the production method of the present invention, one kind of solvent may be used alone, or two or more kinds of solvents may be appropriately selected according to the reaction conditions and used in an appropriate ratio.
In the production method of the present invention, steps such as compound extraction, drying, and purification can be appropriately performed by a well-known method.
In the production method of the present invention, the reaction time in each step may be appropriately selected as long as the reaction proceeds sufficiently unless otherwise specified.
[製造方法A]本発明中の式(TH−1)で表される化合物の製造方法:
以下に、本発明における、式(TH−1)[式(TH−1)中のp及びR1の定義は、態様[1]中の式(I)の定義と同じである]で表される化合物の製造方法について詳細に説明する。式(TH−1) で表される化合物及びその溶媒和物は、市販化合物又は市販化合物から文献公知の製造方法により容易に得ることが出来る化合物を出発原料若しくは合成中間体として、既知の一般的化学的な製造方法を組み合わせることで容易に製造することが可能であり、例えば、以下に示す代表的な製造方法に従い製造することができる。
[製造方法A]中、RAは、特に断らない限り、メチル基、エチル基、プロピル基、tert−ブチル基等のC1-6アルキル基、フェニル基、又はベンジル基である。[Production Method A] Method for producing a compound represented by the formula (TH-1) in the present invention:
Hereinafter, in the present invention, it is represented by the formula (TH-1) [ the definition of p and R 1 in the formula (TH-1) is the same as the definition of the formula (I) in the embodiment [1]]. The method for producing the compound will be described in detail. The compound represented by the formula (TH-1) and a mixture thereof are generally known as starting materials or synthetic intermediates from commercially available compounds or compounds that can be easily obtained from commercially available compounds by a production method known in the literature. It can be easily produced by combining chemical production methods, and for example, it can be produced according to the following typical production methods.
In [Production Method A], RA is a C 1-6 alkyl group such as a methyl group, an ethyl group, a propyl group, a tert-butyl group, a phenyl group, or a benzyl group unless otherwise specified.
<工程1> 式(SM−1)[式(SM−1)の化合物は、市販化合物、又は市販化合物から文献公知の製造方法により製造できる化合物である]で表される化合物を用いて、文献公知の方法、例えば、『実験化学講座 第4版 22 有機合成IV 酸・アミノ酸・ペプチド、1−82頁、1992年、丸善』等に記載された方法に準じて、塩酸、硫酸、塩化チオニル、塩化アセチル等の酸性試薬存在下、メタノール、エタノール、2−プロパノール等の溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い、式(IM−1)で表される化合物を製造することができる。
又、式(SM−1)で表される化合物を用い、文献公知の方法、例えば、『シンセッティク コミュニケーションズ(Synthetic Communications)、31(14)、2177−2183頁、2001年』等に記載された方法に準じて、アルキルハライド剤(例えば、ヨウ化メチル、ヨウ化エチル等)存在下、炭酸カリウム、炭酸ナトリウム、水酸化カリウム、水酸化ナトリウム等の塩基存在下、N,N−ジメチルホルムアミド、ジメチルスルホキシド、N−メチルピロリドン等の極性溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い、式(IM−1)で表される化合物を製造することができる。<Step 1> A compound represented by the formula (SM-1) [the compound of the formula (SM-1) is a commercially available compound or a compound that can be produced from a commercially available compound by a production method known in the literature] is used in the literature. According to a known method, for example, a method described in "Experimental Chemistry Course 4th Edition 22 Organic Synthetic IV Acids / Amino Acids / Peptides, pp. 1-82, 1992, Maruzen", etc., hydrochloric acid, sulfuric acid, thionyl chloride, etc. In the presence of an acidic reagent such as acetyl chloride, the reaction was carried out using a solvent such as methanol, ethanol or 2-propanol at any temperature between 0 ° C. and the temperature at which the solvent refluxed, and the formula (IM-1) was used. The compound represented by can be produced.
Further, a method known in the literature using a compound represented by the formula (SM-1), for example, the method described in "Synthetic Communications, 31 (14), pp. 2177-2183, 2001" and the like. N, N-dimethylformamide, dimethyl sulfoxide in the presence of alkyl halide agents (eg, methyl iodide, ethyl iodide, etc.) and bases such as potassium carbonate, sodium carbonate, potassium hydroxide, sodium hydroxide, etc. , N-Methylpyrrolidone or the like, the reaction can be carried out at any temperature between 0 ° C. and the temperature at which the solvent refluxes to produce the compound represented by the formula (IM-1). it can.
又、式(SM−1)で表される化合物を用い、文献公知の方法、例えば、『ケミカル アンド ファーマシューティカル ブレティン (Chemical & Pharmaceutical Bulletin)、29(5)、1475−1478頁、1981年』等に記載された方法に準じて、ジアゾメタン、トリメチルシリルジアゾメタン等のメチル化剤、エーテル、メタノール等の反応に関与しない溶媒、又はこれらの混合溶媒中、0℃から室温で反応を行い、式(IM−1)で表される化合物を製造することができる。 又、式(SM−1)で表わされる化合物及びアルコール(例えば、メタノール、エタノール、ベンジルアルコール等)を用い、文献公知の方法、例えば、『実験化学講座 第4版 22 有機合成IV 酸・アミノ酸・ペプチド、191−309頁、1992年、丸善』等に記載された方法に準じて、1,3−ジシクロヘキシルカルボジイミド(DCC)、1−エチル−3−(3’−ジメチルアミノプロピル)カルボジイミド塩酸塩(WSC・HCl)、1−ヒドロキシベンゾトリアゾール(HOBT)、ベンゾトリアゾール−1−イロキシトリス(ジメチルアミノ)ホスホニウムヘキサフルオロホスフェイト(BOP試薬)、ビス(2−オキソ−3−オキサゾリジニル)ホスフィニッククロリド(BOP−Cl)、2−クロロ−1,3−ジメチルイミダゾリニウムヘキサフルオロホスフェイト(CIP)、4−(4,6−ジメトキシ−1,3,5−トリアジン−2−イル)−4−メチルモルホリニウムクロリド(DMTMM)、ポリリン酸(PPA)、2−(1H−7−アザベンゾトリアゾール−1−イル)−1,1,3,3−テトラメチルウロニウム ヘキサフルオロホスフェート メタンアミニウム(HATU)、(1−シアノ−2−エトキシ−2−オキソエチリデンアミノオキシ)ジメチルアミノ−モルホリノ−カルベニウムヘキサフルオロホスフェート(COMU)等の縮合剤の存在下、ジクロロメタン、クロロホルム、ジエチルエーテル、テトラヒドロフラン、トルエン、ベンゼン、N,N−ジメチルホルムアミド、N−メチルピロリドン等反応に関与しない溶媒中、もしくはこれらの混合溶媒を用いて、トリエチルアミン、ピリジン等の塩基の存在下又は非存在下、0℃から溶媒が還流する温度までの間のいずれかの温度で反応させることにより、式(IM−1)で表わされる化合物を製造することができる。 Further, using a compound represented by the formula (SM-1), a method known in the literature, for example, "Chemical & Pharmaceutical Bulletin, 29 (5), 1475-1478, 1981". In accordance with the method described in the above, the reaction is carried out at 0 ° C. to room temperature in a methylating agent such as diazomethane or trimethylsilyldiazomethane, a solvent not involved in the reaction such as ether or methanol, or a mixed solvent thereof, and the formula (IM) is used. The compound represented by -1) can be produced. Further, using a compound represented by the formula (SM-1) and an alcohol (for example, methanol, ethanol, benzyl alcohol, etc.), a method known in the literature, for example, "Experimental Chemistry Course 4th Edition 22 Organic Synthetic IV Acids / Amino Acids / Peptide, pp. 191-309, 1992, Maruzen, et al., 1,3-Dicyclohexylcarbodiimide (DCC), 1-ethyl-3- (3'-dimethylaminopropyl) carbodiimide hydrochloride ( WSC / HCl), 1-hydroxybenzotriazole (HOBT), benzotriazole-1-iroxytris (dimethylamino) phosphonium hexafluorophosphate (BOP reagent), bis (2-oxo-3-oxazolidinyl) phosphinic chloride (BOP) -Cl), 2-chloro-1,3-dimethylimidazolinium hexafluorophosphate (CIP), 4- (4,6-dimethoxy-1,3,5-triazine-2-yl) -4-methylmol Holinium chloride (DTMMM), polyphosphate (PPA), 2- (1H-7-azabenzotriazole-1-yl) -1,1,3,3-tetramethyluronium hexafluorophosphate methaneaminium (HATU) , (1-Cyano-2-ethoxy-2-oxoethylideneaminooxy) in the presence of condensing agents such as dimethylamino-morpholino-carbenium hexafluorophosphate (COMU), dichloromethane, chloroform, diethyl ether, tetrahydrofuran, toluene, benzene , N, N-dimethylformamide, N-methylpyrrolidone, etc. The solvent is refluxed from 0 ° C. in the presence or absence of a base such as triethylamine or pyridine using a solvent not involved in the reaction or a mixed solvent thereof. The compound represented by the formula (IM-1) can be produced by reacting at any temperature up to the temperature.
又、式(SM−1)で表わされる化合物を、文献公知の方法、例えば、『ジャーナル・オブ・ザ・アメリカン・ケミカル・ソサエティ(Journal of the American Chemical Society)、109(24)、p7488−7494、1987年』等に記載された方法に準じて、トリエチルアミン、N,N−ジイソプロピルエチルアミン、N,N−ジメチルアミノピリジン等の塩基の存在もしくは非存在下、塩化チオニル、塩化オキサリル、塩化ホスホリル、塩化スルフリル、三塩化リン、五塩化リン、三臭化リン等のハロゲン化剤と、1,4−ジオキサン、テトラヒドロフラン、1,2−ジメトキシエタン、ベンゼン、トルエン、ジクロロメタン、1,2−ジクロロエタン、クロロホルム等の反応に不活性な溶媒、もしくはこれらの混合溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い酸ハライドに変換した後に、アルコール(例えば、メタノール、エタノール、ベンジルアルコール等)を用いて、文献公知の方法、例えば、『実験化学講座 第4版 22 有機合成IV酸・アミノ酸・ペプチド、144−146頁、1992年、丸善』等に記載された方法に準じて、トリエチルアミン、N,N−ジイソプロピルエチルアミン、ピリジン、4−ジメチルアミノピリジン等の塩基の存在下、ジクロロメタン、クロロホルム、1,2−ジクロロエタン、ジエチルエーテル、テトラドロフラン、1,4−ジオキサン、1,2−ジメトキシエタン、トルエン、ベンゼン、N,N−ジメチルホルムアミド、N−メチルピロリドン等反応に関与しない溶媒中、もしくはこれらの混合溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応させることにより、式(IM−1)で表わされる化合物を同様に製造することができる。 Further, the compound represented by the formula (SM-1) can be used in a method known in the literature, for example, "Journal of the American Chemical Society", 109 (24), p7488-7494. , 1987, etc., in the presence or absence of bases such as triethylamine, N, N-diisopropylethylamine, N, N-dimethylaminopyridine, etc., thionyl chloride, oxalyl chloride, phosphoryl chloride, chloride. Halogen agents such as sulfryl, phosphorus trichloride, phosphorus pentachloride, phosphorus tribromide, 1,4-dioxane, tetrahydrofuran, 1,2-dimethoxyethane, benzene, toluene, dichloromethane, 1,2-dichloroethane, chloroform and the like. After the reaction is carried out at any temperature between 0 ° C. and the temperature at which the solvent is refluxed using a solvent inert to the above reaction or a mixed solvent thereof to convert to acid halide, alcohol (for example, methanol, for example, methanol, etc., is used. Methods known in the literature using (ethanol, benzyl alcohol, etc.), for example, the methods described in "Experimental Chemistry Course 4th Edition 22 Organic Synthetic IV Acids / Amino Acids / Peptides, pp. 144-146, 1992, Maruzen" and the like. According to the above, in the presence of a base such as triethylamine, N, N-diisopropylethylamine, pyridine, 4-dimethylaminopyridine, dichloromethane, chloroform, 1,2-dichloroethane, diethyl ether, tetradrofuran, 1,4-dioxane, 1,2-Dimethoxyethane, toluene, benzene, N, N-dimethylformamide, N-methylpyrrolidone, etc. In a solvent not involved in the reaction, or using a mixed solvent of these, from 0 ° C. to the temperature at which the solvent returns. By reacting at any of the above temperatures, the compound represented by the formula (IM-1) can be produced in the same manner.
<工程2>[製造方法A]<工程1>で得られる式(IM−1)で表される化合物を用いて、文献公知の方法、例えば、『実験化学講座 第4版 25、有機合成VII、有機金属試薬による合成、13−19頁、59−72頁、1992年、丸善』等に記載された方法に準じて、Grignard試薬(例えば、メチルマグネシウムクロリド、メチルマグネシウムブロミド、エチルマグネシウムブロミド、等)、もしくはアルキル金属試薬(例えば、メチルリチウム、等)の存在下、ジエチルエーテル、1,4−ジオキサン、テトラヒドロフラン、2−メチルテトラヒドロフラン、1,2−ジメトキシエタン、ベンゼン、トルエン、キシレン等の反応に不活性な溶媒、もしくはこれらの混合溶媒を用いて、−78℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い、式(IM−2)で表される化合物を製造することができる。 <Step 2> [Production Method A] Using the compound represented by the formula (IM-1) obtained in <Step 1>, a method known in the literature, for example, "Experimental Chemistry Course 4th Edition 25, Organic Synthesis VII" , Synthetic with Organic Metal Reagents, pp. 13-19, pp. 59-72, 1992, Maruzen, etc., and Grignard Reagents (eg, Methyl Magnesium Chloride, Methyl Magnesium Bromide, Ethyl Magnesium Bromide, etc.) ), Or in the presence of alkyl metal reagents (eg, methyllithium, etc.), in the reaction of diethyl ether, 1,4-dioxane, tetrahydrofuran, 2-methyl tetrahydrofuran, 1,2-dimethoxyethane, benzene, toluene, xylene, etc. Using an inert solvent or a mixed solvent thereof, the reaction is carried out at any temperature between −78 ° C. and the temperature at which the solvent refluxes to produce a compound represented by the formula (IM-2). be able to.
<工程3> [製造方法A]<工程2>で得られる式(IM−2)で表される化合物を用いて、文献公知の方法、例えば、『Tetrahedron Letters,54(32),p4330−4332,2013年』等に記載された方法に準じて、酸として、トリフルオロメタンスルホン酸、五酸化二リン、五塩化リン、硫酸、リン酸、ビスマス(III)トリフルオロメタンスルホネート等の酸試薬存在下、ジクロロメタン、クロロホルム、シクロヘキサン、ベンゼン、トルエン、キシレン、ジエチルエーテル、2−プロパノール、水等の反応に不活性な溶媒、もしくはこれらの混合溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い、式(IM−3)で表される化合物を製造することができる。 <Step 3> [Production Method A] Using the compound represented by the formula (IM-2) obtained in <Step 2>, a method known in the literature, for example, "Tetrahedron Reagents, 54 (32), p4330-4332". , 2013 ”, etc., in the presence of acid reagents such as trifluoromethanesulfonic acid, diphosphorus pentoxide, phosphorus pentachloride, sulfuric acid, phosphoric acid, bismuth (III) trifluoromethanesulfonate, etc. Using a solvent inert to the reaction such as dichloromethane, chloroform, cyclohexane, benzene, toluene, xylene, diethyl ether, 2-propanol, water, etc., or a mixed solvent thereof, from 0 ° C. to the temperature at which the solvent refluxes. The reaction can be carried out at any temperature to produce the compound represented by the formula (IM-3).
<工程4> [製造方法A]<工程3>で得られる式(IM−3)で表される化合物を用いて、文献公知の方法、例えば、『Chemistry Letters,70(10),p1042−1043,2013年』等に記載された方法に準じて、オキソン(登録商標)(DuPont)、tert−ブチルヒドロペルオキシド(TBHP)、過マンガン酸カリウム、二酸化マンガン、クロム酸等の酸化剤存在下、ジクロロメタン、クロロホルム、四塩化炭素、ベンゼン、アセトニトリル、tert−ブチルアルコール、水等の反応に不活性な溶媒、もしくはこれらの混合溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い、式(IM−4)で表される化合物を製造することができる。 <Step 4> [Production Method A] Using the compound represented by the formula (IM-3) obtained in <Step 3>, a method known in the literature, for example, "Chemistry Letters, 70 (10), p1042-1043". , 2013, etc., in the presence of oxidizing agents such as Oxone® (DuPont), tert-butyl hydroperoxide (TBHP), potassium permanganate, manganese dioxide, chromium acid, etc. , Chloroform, carbon tetrachloride, benzene, acetonitrile, tert-butyl alcohol, water and other reaction-inert solvents, or a mixed solvent of these, from 0 ° C. to the temperature at which the solvent refluxes. The reaction can be carried out at temperature to produce a compound represented by the formula (IM-4).
<工程5> [製造方法A]<工程4>で得られる式(IM−4)で表される化合物を用いて、文献公知の方法、例えば、『実験化学講座 第4版 26 有機合成VIII 不斉合成・還元・糖・標識化合物、234−245頁、1992年、丸善』等に記載された方法に準じて、水素化ホウ素ナトリウム、水素化ホウ素リチウム、水素化ジイソブチルアルミニウム(DIBAH)、水素化リチウムアルミニウム(LAH)、ボラン−テトラヒドロフラン(BH3・THF)、ボラン−ジメチルスルフィド(BH3・Me2S)等の還元剤存在下、ジエチルエーテル、テトラヒドロフラン、1,2−ジメトキシエタン、1,4−ジオキサン、メタノール、エタノール、2−プロパノール等の溶媒(反応に関与しない溶媒)、もしくはこれらの混合溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い、式(IM−5)で表される化合物を製造することができる。<Step 5> [Production Method A] Using the compound represented by the formula (IM-4) obtained in <Step 4>, a method known in the literature, for example, "Experimental Chemistry Course 4th Edition 26 Organic Synthesis VIII Non-compliance" Synthetic synthesis / reduction / sugar / labeling compounds, pp. 234-245, 1992, Maruzen, etc., according to the methods described in "Sodium hydride, lithium hydride, diisobutylaluminum hydride (DIBAH), hydrogenation". In the presence of reducing agents such as lithium aluminum (LAH), borane-tetrahydrofuran (BH 3 · THF), bolan-dimethylsulfide (BH 3 · Me 2 S), diethyl ether, tetrahydrofuran, 1,2-dimethoxyethane, 1,4 -The reaction is carried out at any temperature between 0 ° C. and the temperature at which the solvent returns using a solvent such as dioxane, methanol, ethanol, 2-propanol (solvent not involved in the reaction) or a mixed solvent thereof. , The compound represented by the formula (IM-5) can be produced.
<工程6> [製造方法A]<工程5>で得られる式(IM−5)で表される化合物を用いて、文献公知の方法、例えば、『国際公開2014/078454号パンフレット』等に記載された方法に準じて、酸として、p−トルエンスルホン酸等の酸試薬存在下、ジクロロメタン、1,2−ジクロロエタン、クロロホルム、ベンゼン、トルエン、キシレン、1,2−ジメトキシエタン等の反応に不活性な溶媒、もしくはこれらの混合溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い、式(TH−1)で表される化合物を製造することができる。 <Step 6> [Production Method A] Using the compound represented by the formula (IM-5) obtained in <Step 5>, a method known in the literature, for example, "International Publication No. 2014/078454" is described. Inactive to reactions of dichloromethane, 1,2-dichloroethane, chloroform, benzene, toluene, xylene, 1,2-dimethoxyethane, etc. as an acid in the presence of an acid reagent such as p-toluenesulfonic acid, according to the above method. The compound represented by the formula (TH-1) can be produced by carrying out the reaction at any temperature between 0 ° C. and the temperature at which the solvent refluxes using a different solvent or a mixed solvent thereof. ..
[製造方法B]本発明中の式(AM−1)で表される化合物の製造方法:
以下に、本発明における、式(AM−1)で表される化合物の製造方法について詳細に説明する。式(AM−1) で表される化合物及びその溶媒和物は、市販化合物又は市販化合物から文献公知の製造方法により容易に得ることが出来る化合物を出発原料若しくは合成中間体として、既知の一般的化学的な製造方法を組み合わせることで容易に製造することが可能であり、例えば、以下に示す代表的な製造方法に従い製造することができる。
下記製造方法中、[B]は、ボロン酸、ボロン酸エステル、又はボロン酸N−メチルイミノ二酢酸(MIDA)エステル等である。[Production Method B] Method for producing a compound represented by the formula (AM-1) in the present invention:
Hereinafter, the method for producing the compound represented by the formula (AM-1) in the present invention will be described in detail. The compound represented by the formula (AM-1) and its solvent mixture are generally known as starting materials or synthetic intermediates from commercially available compounds or compounds that can be easily obtained from commercially available compounds by a production method known in the literature. It can be easily produced by combining chemical production methods, and for example, it can be produced according to the following typical production methods.
In the following production method, [B] is boronic acid, boronic acid ester, boronic acid N-methyliminodiacetic acid (MIDA) ester or the like.
<工程1>式(SM−2)及び式(RG−1)[式(SM−2)及び式(RG−1)の化合物は、市販化合物、又は市販化合物から文献公知の製造方法により製造できる化合物である]で表わされる化合物を用いて、文献公知の方法、例えば、『実験化学講座 第5版 18 有機化合物の合成 VI −金属を用いる有機合成−、327‐352頁、2004年、丸善』、及び『Journal of Medicinal Chemistry、48(20)、p6326‐6339、2005年』に記載された方法に準じて、酢酸パラジウム(II)(Pd(OAc)2)、テトラキストリフェニルホスフィンパラジウム(Pd(PPh3)4)、ビス(トリフェニルホスフィン)パラジウム(II)クロリド(Pd(PPh3)2Cl2)、トリス(ジベンジリデンアセトン)ジパラジウム(Pd2(dba)3)、ビス(ジベンジリデンアセトン)パラジウム(Pd(dba)2)、[1,1’−ビス(ジフェニルホスフィノ)フェロセン]ジクロロパラジウム(II)(PdCl2(dppf))等のパラジウム触媒、トリフェニルホスフィン、トリス(tert−ブチル)ホスフィン、トリス(o−トリル)ホスフィン、2−ジシクロヘキシルホスフィノ−2’,6’−ジメトキシビフェニル、2−ジシクロヘキシルホスフィノ−2’,4’,6’−トリイソプロピルビフェニル等のホスフィン系試薬、及びトリエチルアミン、N,N−ジイソプロピルエチルアミン、リン酸カリウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の有機又は無機塩基存在下、トルエン(トルエン/水)、キシレン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン、1,2−ジメトキシエタン、アセトニトリル(アセトニトリル/水)、1,4−ジオキサン(1,4−ジオキサン/水)、テトラヒドロフラン(テトラヒドロフラン/水)、メタノール、エタノール(エタノール/水)、ジクロロメタン、1,2−ジクロロエタン、ジメトキシエタン(ジメトキシエタン/水)、水等の溶媒(反応に関与しない溶媒)、もしくはこれらの混合溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い、式(IM−6)で表される化合物を製造することができる。又はホスフィン系試薬の替わりにテトラメチルアンモニウムクロリド、テトラブチルアンモニウムクロリド等を用いて、同様の方法にて製造することができる。<Step 1> Formula (SM-2) and Formula (RG-1) [The compound of formula (SM-2) and formula (RG-1) can be produced from a commercially available compound or a commercially available compound by a production method known in the literature. Using the compound represented by], a method known in the literature, for example, "Experimental Chemistry Lecture 5th Edition 18 Synthesis of Organic Compounds VI-Organic Synthesis Using Metals-, pp. 327-352, 2004, Maruzen". , And "Journal of Medical Chemistry, 48 (20), p6326-6339, 2005", palladium (II) acetate (Pd (OAc) 2 ), tetrakistriphenylphosphine palladium (Pd (Pd). PPh 3 ) 4 ), bis (triphenylphosphine) palladium (II) chloride (Pd (PPh 3 ) 2 Cl 2 ), tris (dibenzylideneacetone) dipalladium (Pd 2 (dba) 3 ), bis (dibenzylideneacetone) ) Palladium (Pd (dba) 2 ), [1,1'-bis (diphenylphosphino) ferrocene] dichloropalladium (II) (PdCl 2 (dppf)) and other palladium catalysts, triphenylphosphine, tris (tert-butyl ) Phosphine, tris (o-tolyl) phosphine, 2-dicyclohexylphosphino-2', 6'-dimethoxybiphenyl, 2-dicyclohexylphosphino-2', 4', 6'-triisopropylbiphenyl and other phosphine solvents, And in the presence of organic or inorganic bases such as triethylamine, N, N-diisopropylethylamine, potassium phosphate, sodium carbonate, potassium carbonate, cesium carbonate, toluene (toluene / water), xylene, N, N-dimethylformamide, N, N -Didimethylacetamide, N-methylpyrrolidone, 1,2-dimethoxyethane, acetonitrile (acetrid / water), 1,4-dioxane (1,4-dioxane / water), tetrahydrofuran (tetrakis / water), methanol, ethanol (ethanol) / Water), dichloromethane, 1,2-dichloroethane, dimethoxyethane (dimethoxyetane / water), water and other solvents (solvents that do not participate in the reaction), or a mixed solvent of these, the temperature at which the solvent refluxes from 0 ° C. The reaction can be carried out at any temperature between the above and the above to produce the compound represented by the formula (IM-6). Alternatively, it can be produced by the same method using tetramethylammonium chloride, tetrabutylammonium chloride or the like instead of the phosphine-based reagent.
<工程2>[製造方法B]<工程1>で得られる式(IM−6)の化合物、及びN−ブロモスクシンイミド(NBS)を用いて、文献公知の方法、例えば、『国際公開2009/088103号パンフレット』に記載された方法に準じて、N−メチルピロリドン、ジメチルホルムアミド、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、アセトニトリル等の溶媒(反応に関与しない溶媒)、もしくはこれらの混合溶媒を用いて、0℃から溶媒が還流する温度までの間のいずれかの温度で反応を行い、式(IM−7)で表される化合物を製造することができる。
<工程3>[製造方法B]<工程2>で得られる式(IM−7)及び式(RG−2)[式(RG−2)の化合物は、市販化合物、又は市販化合物から文献公知の製造方法により製造できる化合物である]で表わされる化合物を用いて、上記[製造方法B]<工程1>に準じる反応を行い、式(AM−1)の化合物を製造することができる。<Step 2> [Production Method B] Using the compound of the formula (IM-6) obtained in <Step 1> and N-bromosuccinimide (NBS), a method known in the literature, for example, "International Publication 2009/088103" Solvents such as N-methylpyrrolidone, dimethylformamide, N, N-dimethylformamide, N, N-dimethylacetamide, acetonitrile (solvents not involved in the reaction), or a mixture thereof, according to the method described in "Pamphlet". Using a solvent, the reaction can be carried out at any temperature between 0 ° C. and the temperature at which the solvent refluxes to produce the compound represented by the formula (IM-7).
<Step 3> [Manufacturing Method B] The compounds of the formulas (IM-7) and (RG-2) [formula (RG-2) obtained in <Step 2> are commercially available compounds or known from commercially available compounds. The compound of the formula (AM-1) can be produced by carrying out the reaction according to the above [Production method B] <Step 1> using the compound represented by [It is a compound that can be produced by the production method].
上記、[製造方法A]又は[製造方法B]において、式(SM−1)、式(SM−2)、式(IM−1)、式(IM−2)、式(IM−3)、式(IM−4)、式(IM−5)、式(IM−6)、及び式(IM−7)の化合物は、塩を形成していてもよく、かかる塩としては、製薬学的に許容し得る塩であれば特に限定されないが、例えば、金属塩、アンモニウム塩、有機塩基との塩、無機酸との塩、有機酸との塩、塩基性、又は酸性アミノ酸との塩などが挙げられる。金属塩の好適な例としては、例えば、リチウム塩、ナトリウム塩、カリウム塩、セシウム塩などのアルカリ金属塩、カルシウム塩、マグネシウム塩、バリウム塩などのアルカリ土類金属塩、アルミニウム塩などが挙げられる(例えば、モノ塩の他、二ナトリウム塩、二カリウム塩も含む)。有機塩基との塩の好適な例としては、例えば、メチルアミン、エチルアミン、t−ブチルアミン、t−オクチルアミン、ジエチルアミン、トリメチルアミン、トリエチルアミン、シクロヘキシルアミン、ジシクロヘキシルアミン、ジベンジルアミン、エタノールアミン、ジエタノールアミン、トリエタノールアミン、ピペリジン、モルホリン、ピリジン、ピコリン、リシン、アルギニン、オルニチン、エチレンジアミン、N−メチルグルカミン、グルコサミン、フェニルグリシンアルキルエステル、グアニジン、2,6−ルチジン、エタノールアミン、ジエタノールアミン、トリエタノールアミン、N,N'−ジベンジルエチレンジアミン等との塩が挙げられる。無機酸との塩の好適な例としては、例えば、塩酸、臭化水素酸、よう化水素酸、硝酸、硫酸、リン酸等との塩が挙げられる。有機酸との塩の好適な例としては、例えば、ギ酸、酢酸、トリフルオロ酢酸、プロピオン酸、酪酸、吉草酸、エナント酸、カプリン酸、ミリスチン酸、パルミチン酸、ステアリン酸、乳酸、ソルビン酸、マンデル酸等の脂肪族モノカルボン酸等との塩、シュウ酸、マロン酸、コハク酸、フマル酸、マレイン酸、リンゴ酸、酒石酸等の脂肪族ジカルボン酸との塩、クエン酸等の脂肪族トリカルボン酸との塩、安息香酸、サリチル酸等の芳香族モノカルボン酸との塩、フタル酸等の芳香族ジカルボン酸の塩、桂皮酸、グリコール酸、ピルビン酸、オキシル酸、サリチル酸、N−アセチルシステイン等の有機カルボン酸との塩、メタンスルホン酸、ベンゼンスルホン酸、p−トルエンスルホン酸等の有機スルホン酸との塩、アスパラギン酸、グルタミン酸等の酸性アミノ酸類との酸付加塩が挙げられる。塩基性アミノ酸との塩の好適な例としては、例えば、アルギニン、リジン、オルニチンなどとの塩が挙げられ、酸性アミノ酸との塩の好適な例としては、例えば、アスパラギン酸、グルタミン酸などとの塩が挙げられる。このうち、薬学的に許容し得る塩が好ましい。例えば、化合物内に酸性官能基を有する場合にはアルカリ金属塩(例、ナトリウム塩、カリウム塩など)、アルカリ土類金属塩(例、カルシウム塩、マグネシウム塩、バリウム塩など)などの無機塩、アンモニウム塩など、又、化合物内に塩基性官能基を有する場合には、例えば、塩酸、臭化水素酸、硝酸、硫酸、リン酸など無機酸との塩、又は酢酸、フタル酸、フマル酸、シュウ酸、酒石酸、マレイン酸、クエン酸、コハク酸、メタンスルホン酸、p−トルエンスルホン酸などの有機酸との塩が挙げられる。 In the above [Manufacturing method A] or [Manufacturing method B], the formula (SM-1), the formula (SM-2), the formula (IM-1), the formula (IM-2), the formula (IM-3), The compounds of formula (IM-4), formula (IM-5), formula (IM-6), and formula (IM-7) may form salts, such salts pharmaceutically The salt is not particularly limited as long as it is an acceptable salt, and examples thereof include a metal salt, an ammonium salt, a salt with an organic base, a salt with an inorganic acid, a salt with an organic acid, a basic salt, or a salt with an acidic amino acid. Be done. Preferable examples of the metal salt include alkali metal salts such as lithium salt, sodium salt, potassium salt and cesium salt, alkaline earth metal salts such as calcium salt, magnesium salt and barium salt, and aluminum salt. (For example, in addition to monosalt, disodium salt and dipotassium salt are also included). Preferable examples of salts with organic bases include, for example, methylamine, ethylamine, t-butylamine, t-octylamine, diethylamine, trimethylamine, triethylamine, cyclohexylamine, dicyclohexylamine, dibenzylamine, ethanolamine, diethanolamine, tri. Ethanolamine, piperidine, morpholine, pyridine, picolin, lysine, arginine, ornithine, ethylenediamine, N-methylglucamine, glucosamine, phenylglycine alkyl ester, guanidine, 2,6-lutidine, ethanolamine, diethanolamine, triethanolamine, N , N'-dibenzylethylenediamine and the like. Preferable examples of the salt with an inorganic acid include salts with hydrochloric acid, hydrobromic acid, hydroiodic acid, nitric acid, sulfuric acid, phosphoric acid and the like. Preferable examples of salts with organic acids include formic acid, acetic acid, trifluoroacetic acid, propionic acid, butyric acid, valeric acid, enanthic acid, capric acid, myristic acid, palmitic acid, stearic acid, lactic acid, sorbic acid, etc. Salts with aliphatic monocarboxylic acids such as mandelic acid, salts with aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, fumaric acid, maleic acid, malic acid, tartaric acid, and aliphatic tricarboxylic acids such as citric acid. Salts with acids, salts with aromatic monocarboxylic acids such as benzoic acid and salicylic acid, salts of aromatic dicarboxylic acids such as phthalic acid, cinnamic acid, glycolic acid, pyruvate, oxylic acid, salicylic acid, N-acetylcysteine, etc. Examples thereof include salts with organic carboxylic acids, salts with organic sulfonic acids such as methanesulfonic acid, benzenesulfonic acid and p-toluenesulfonic acid, and acid addition salts with acidic amino acids such as aspartic acid and glutamate. Preferable examples of salts with basic amino acids include salts with arginine, lysine, ornithine and the like, and preferred examples of salts with acidic amino acids include salts with aspartic acid, glutamic acid and the like. Can be mentioned. Of these, pharmaceutically acceptable salts are preferable. For example, when the compound has an acidic functional group, an inorganic salt such as an alkali metal salt (eg, sodium salt, potassium salt, etc.), an alkaline earth metal salt (eg, calcium salt, magnesium salt, barium salt, etc.), When the compound has a basic functional group such as an ammonium salt, for example, a salt with an inorganic acid such as hydrochloric acid, hydrobromic acid, nitrate, sulfuric acid, phosphoric acid, or acetic acid, phthalic acid, fumaric acid, Examples thereof include salts with organic acids such as oxalic acid, tartaric acid, maleic acid, citric acid, succinic acid, methanesulfonic acid and p-toluenesulfonic acid.
また、上記、[製造方法A]又は[製造方法B]において、式(IM−1)、式(IM−2)、式(IM−3)、式(IM−4)、式(IM−5)、式(IM−6)、及び式(IM−7)の化合物は、反応液のままか粗製物として次の反応に用いることもできるが、常法に従って反応混合物から単離することもでき、それ自体が公知の手段、例えば、抽出、濃縮、中和、濾過、蒸留、再結晶、クロマトグラフィーなどの分離手段により容易に精製することができる。 Further, in the above [Manufacturing method A] or [Manufacturing method B], the formula (IM-1), the formula (IM-2), the formula (IM-3), the formula (IM-4), and the formula (IM-5) ), Formula (IM-6), and formula (IM-7) can be used in the next reaction as a reaction solution or as a crude product, but can also be isolated from the reaction mixture according to a conventional method. , It can be easily purified by means known per se, for example, separation means such as extraction, concentration, neutralization, filtration, distillation, recrystallization, chromatography and the like.
上記、[製造方法A]又は[製造方法B]において、製造方法中の反応条件については、特に断らない限り、以下の如きとする。反応温度は、−78℃から溶媒が還流する温度の範囲であれば、限定されない。又、反応時間は、特に断らない限り、反応が十分に進行する時間であれば、限定されない。
前記反応温度における、「−78℃から溶媒が還流する温度の範囲」の意味する処は、−78℃から反応に用いる溶媒(又は混合溶媒)が還流する温度迄の範囲内の温度を意味する。例えば、溶媒にメタノールを用いる場合、「−78℃から溶媒が還流する温度で」とは、−78℃からメタノールが還流する温度迄の範囲内の温度を意味する。また、同様に「−78℃から反応溶液が還流する温度で」とは、−78℃から反応溶液が還流する温度迄の範囲内の任意の温度を意味する。Unless otherwise specified, the reaction conditions in the above-mentioned [Manufacturing Method A] or [Manufacturing Method B] are as follows. The reaction temperature is not limited as long as it is in the range of −78 ° C. to the temperature at which the solvent refluxes. Further, the reaction time is not limited as long as the reaction proceeds sufficiently unless otherwise specified.
The meaning of "the range of the temperature at which the solvent refluxes from −78 ° C." in the reaction temperature means the temperature within the range from −78 ° C. to the temperature at which the solvent (or mixed solvent) used for the reaction refluxes. .. For example, when methanol is used as the solvent, "at a temperature at which the solvent refluxes from −78 ° C." means a temperature within the range from −78 ° C. to the temperature at which methanol refluxes. Similarly, “at a temperature at which the reaction solution refluxes from −78 ° C.” means an arbitrary temperature within the range from −78 ° C. to the temperature at which the reaction solution refluxes.
また、上記、[製造方法A]又は[製造方法B]の各工程は、無溶媒、あるいは反応前に原料化合物を適当な溶媒に溶解又は懸濁して行うことができる。前記溶媒としては、反応に関与しない溶媒が好ましく、例えば、水、シクロヘキサン、ヘキサン、ベンゼン、クロロベンゼン、トルエン、キシレン、メタノール、エタノール、1−プロパノール、2−プロパノール、tert−ブチルアルコール、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド、N−メチルピロリドン(NMP)、ヘキサメチルホスホリックトリアミド、1,3‐ジメチル‐2‐イミダゾリジノン、ジメチルスルホキシド、アセトニトリル、プロピオニトリル、ジエチルエーテル、ジイソプロピルエーテル、ジフェニルエーテル、メチルtert−ブチルエーテル(MTBE)、テトラヒドロフラン、2−メチルテトラヒドロフラン、1,4−ジオキサン、1,2−ジメトキシエタン、酢酸メチル、酢酸エチル、酢酸ブチル、アセトン、メチルエチルケトン、ジクロロメタン、クロロホルム、四塩化炭素、1,2−ジクロロエタン、トリエチルアミン、N,N−ジイソプロピルエチルアミン、ピリジン、ルチジン、無水酢酸、ギ酸、酢酸、プロピオン酸、トリフルオロ酢酸、メタンスルホン酸、塩酸、及び硫酸等が挙げられる。これらの溶媒は、単独で用いることも可能であり、又は反応条件により適宜選択し二種以上の溶媒を適宜の割合で混合して用いることも可能である。これらの溶媒は、反応条件に応じて適宜選択される。
本明細書の製造方法中、特に断らない限り、「溶媒」、「反応に関与しない溶媒」又は「反応に不活性な溶媒」と記載した場合、使用する溶媒は、一種の溶媒を単独で用いてもよく、又は反応条件により適宜選択し二種以上の溶媒を適宜の割合で混合して用いてもよいことを意味する。Further, each of the above steps of [Production Method A] or [Production Method B] can be carried out without a solvent or by dissolving or suspending the raw material compound in an appropriate solvent before the reaction. As the solvent, a solvent that does not participate in the reaction is preferable, and for example, water, cyclohexane, hexane, benzene, chlorobenzene, toluene, xylene, methanol, ethanol, 1-propanol, 2-propanol, tert-butyl alcohol, N, N- Dimethylformamide (DMF), N, N-dimethylacetamide, N-methylpyrrolidone (NMP), hexamethylphosphoric triamide, 1,3-dimethyl-2-imidazolidinone, dimethylsulfoxide, acetonitrile, propionitrile, diethyl Ether, diisopropyl ether, diphenyl ether, methyl tert-butyl ether (MTBE), tetrahydrofuran, 2-methyl tetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane, methyl acetate, ethyl acetate, butyl acetate, acetone, methyl ethyl ketone, dichloromethane, Chloroform, carbon tetrachloride, 1,2-dichloroethane, triethylamine, N, N-diisopropylethylamine, pyridine, lutidine, anhydrous acetic acid, formic acid, acetic acid, propionic acid, trifluoroacetic acid, methanesulfonic acid, hydrochloric acid, sulfuric acid and the like. Be done. These solvents can be used alone, or they can be appropriately selected depending on the reaction conditions and two or more kinds of solvents can be mixed and used in an appropriate ratio. These solvents are appropriately selected according to the reaction conditions.
Unless otherwise specified in the production method of the present specification, when the term "solvent", "solvent not involved in the reaction" or "solvent inert to the reaction" is described, one kind of solvent is used alone. It means that two or more kinds of solvents may be mixed and used in an appropriate ratio, which may be appropriately selected depending on the reaction conditions.
上記、[製造方法A]又は[製造方法B]の各工程で用いられる塩基(又は脱酸剤)としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化マグネシウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、炭酸カルシウム、炭酸水素ナトリウム、リン酸三カリウム、酢酸ナトリウム、フッ化セシウム、トリエチルアミン、N,N−ジイソプロピルエチルアミン、トリブチルアミン、シクロヘキシルジメチルアミン、ピリジン、ルチジン、4−ジメチルアミノピリジン(DMAP)、N,N−ジメチルアニリン、N−メチルピペリジン、N−メチルピロリジン、N−メチルモルホリン、1,5−ジアザビシクロ[4.3.0]−5−ノネン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン(DBU)、イミダゾール、ナトリウムメトキシド、ナトリウムエトキシド、カリウムtert−ブトキシド、ナトリウムtert−ブトキシド、水素化ナトリウム、水素化カリウム、ナトリウムアミド、リチウムジイソプロピルアミド、リチウムヘキサメチルジシラジド、メチルリチウム、n−ブチルリチウム、sec−ブチルリチウム、tert−ブチルリチウム等が挙げられる。但し、上記に記載したものに必ずしも限定されるわけではない。これらの塩基は、反応条件に応じて適宜選択される。 Examples of the base (or deoxidizing agent) used in each step of [Production Method A] or [Production Method B] include lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide, lithium carbonate, and the like. Sodium carbonate, potassium carbonate, cesium carbonate, calcium carbonate, sodium hydrogen carbonate, tripotassium phosphate, sodium acetate, cesium fluoride, triethylamine, N, N-diisopropylethylamine, tributylamine, cyclohexyldimethylamine, pyridine, lutidine, 4- Dimethylaminopyridine (DMAP), N, N-dimethylaniline, N-methylpiperidin, N-methylpyrrolidin, N-methylmorpholin, 1,5-diazabicyclo [4.3.0] -5-nonen, 1,4- Diazabicyclo [2.2.2] octane, 1,8-diazabicyclo [5.4.0] -7-undecene (DBU), imidazole, sodium methoxydo, sodium ethoxydo, potassium tert-butoxide, sodium tert-butoxide, Examples thereof include sodium hydride, potassium hydride, sodium amide, lithium diisopropylamide, lithium hexamethyldisilazide, methyl lithium, n-butyllithium, sec-butyllithium, tert-butyllithium and the like. However, it is not necessarily limited to those described above. These bases are appropriately selected according to the reaction conditions.
上記[製造方法A]又は[製造方法B]の各工程で用いられる酸、又は酸触媒は、例えば、塩酸、硫酸、硝酸、臭化水素酸、リン酸、酢酸、トリフルオロ酢酸、シュウ酸、フタル酸、フマル酸、酒石酸、マレイン酸、クエン酸、コハク酸、メタンスルホン酸、p−トルエンスルホン酸、10−カンファースルホン酸、三フッ化ホウ素エーテル錯体、ヨウ化亜鉛、無水塩化アルミニウム、無水塩化亜鉛、無水塩化鉄等が挙げられる。但し、上記に記載したものに必ずしも限定されるわけではない。これらの酸又は酸触媒は、反応条件に応じて適宜選択される。 The acid or acid catalyst used in each step of the above [Production Method A] or [Production Method B] is, for example, hydrochloric acid, sulfuric acid, nitric acid, hydrobromic acid, phosphoric acid, acetic acid, trifluoroacetic acid, oxalic acid, and the like. Phthalic acid, fumaric acid, tartaric acid, maleic acid, citric acid, succinic acid, methanesulfonic acid, p-toluenesulfonic acid, 10-campersulfonic acid, boron trifluoride ether complex, zinc iodide, aluminum anhydride, chloride anhydride. Examples include zinc and anhydrous iron chloride. However, it is not necessarily limited to those described above. These acids or acid catalysts are appropriately selected depending on the reaction conditions.
次に、本発明をさらに詳細に説明するために実施例をあげるが、これらの例は単なる実施であって、本発明を限定するものではなく、また本発明の範囲を逸脱しない範囲で変化させてもよい。 Next, examples will be given to explain the present invention in more detail, but these examples are merely embodiments, do not limit the present invention, and are changed without departing from the scope of the present invention. You may.
核磁気共鳴スペクトル(NMR)の測定には、JEOL JNM−ECX400 FT−NMR又はJEOL JNM−ECX300 FT−NMR(日本電子)を用いた。実施例中の1H−NMRデータにおいて1H−NMR(#)と記載した場合、JEOL JNM−ECX300 FT−NMR(日本電子)を用いて測定をしたことを意味する。液体クロマトグラフィー−質量分析スペクトル(LC−Mass)は以下の方法で測定した。[UPLC]Waters AQUITY UPLCシステム及びBEH C18カラム(2.1mm×50mm、1.7μm)(Waters)を用い、参考例ではアセトニトリル:0.05%トリフルオロ酢酸水溶液=5:95(0分)〜95:5(1.0分)〜95:5(1.6分)〜5:95(2.0分)の移動相及びグラジエント条件を、実施例ではアセトニトリル:10mM重炭酸アンモニウム水溶液(5%アセトニトリル)=5:95(0.5分)〜100:0(7.0分)〜100:0(7.5分)〜5:95(7.51分)の移動相およびグラジエント条件を用いた。超臨界流体液体クロマトグラフィー(SFC)による光学純度分析はWaters SFC UPC2および対応するキラルカラムを用いて実施した。JEOL JNM-ECX400 FT-NMR or JEOL JNM-ECX300 FT-NMR (JEOL Ltd.) was used for the measurement of the nuclear magnetic resonance spectrum (NMR). When 1 H-NMR (#) is described in the 1 H-NMR data in the examples, it means that the measurement was performed using JEOL JNM-ECX300 FT-NMR (JEOL Ltd.). Liquid chromatography-mass spectrometry spectrum (LC-Mass) was measured by the following method. [UPLC] Waters AQUITY UPLC system and BEH C18 column (2.1 mm × 50 mm, 1.7 μm) (Waters) are used, and in the reference example, acetonitrile: 0.05% aqueous trifluoroacetic acid solution = 5:95 (0 minutes) to The mobile phase and gradient conditions of 95: 5 (1.0 minutes) to 95: 5 (1.6 minutes) to 5:95 (2.0 minutes) were set, and in the examples, acetonitrile: 10 mM ammonium bicarbonate aqueous solution (5%). Acetonitrile) = 5:95 (0.5 min) to 100: 0 (7.0 min) to 100: 0 (7.5 min) to 5:95 (7.51 min) for mobile phase and gradient conditions There was. Optical purity analysis by supercritical fluid liquid chromatography (SFC) was performed using Waters SFC UPC2 and the corresponding chiral column.
1H−NMRデータ中、NMRシグナルのパターンで、sはシングレット、dはダブレット、tはトリプレット、qはカルテット、mはマルチプレット、brはブロード、Jはカップリング定数、Hzはヘルツ、CDCl3は重クロロホルム、DMSO−D6は重ジメチルスルホキシド、CD3ODは重メタノールを意味する。1H−NMRデータ中、水酸基(OH)、アミノ基(NH2)、カルボキシル基(COOH)のプロトン等、ブロードバンドであるため確認ができないシグナルについては、データに記載していない。 1 In 1 H-NMR data, the pattern of NMR signals, s is singlet, d is doublet, t is triplet, q is quartet, m is multiplet, br is broad, J is coupling constant, Hz is Hertz, CDCl 3 Means deuterated chloroform, DMSO-D 6 means deuterated dimethyl sulfoxide, and CD 3 OD means deuterated methanol. 1 In the 1 H-NMR data, signals that cannot be confirmed due to broadband, such as hydroxyl group (OH), amino group (NH 2 ), and carboxyl group (COOH) protons, are not described in the data.
LC−Massデータ中、Mは分子量、RTは保持時間、[M+H]+,[M+Na]+は分子イオンピークを意味する。
参考例、実施例、及び実験例中のLC−Mass測定条件は、Waters AQUITY UPLCシステムおよびBEH C18カラム(2.1mm×50mm、1.7μm)(Waters)を用い、アセトニトリル:0.05%トリフルオロ酢酸水溶液=5:95(0分)〜95:5(1.0分)〜95:5(1.6分)〜5:95(2.0分)の移動相およびグラジエントである。In the LC-Mass data, M means molecular weight, RT means retention time, and [M + H] + and [M + Na] + mean molecular ion peaks.
The LC-Mass measurement conditions in Reference Examples, Examples, and Experimental Examples were Waters AQUITY UPLC system and BEH C18 column (2.1 mm × 50 mm, 1.7 μm) (Waters), and acetonitrile: 0.05% tri. Aqueous fluoroacetic acid solution = 5:95 (0 min) to 95: 5 (1.0 min) to 95: 5 (1.6 min) to 5:95 (2.0 min) mobile phase and gradient.
参考例及び実施例中の「室温」は、通常約20〜25℃の温度を示すものとする。
(実施例2)の表中の溶媒の欄のDCMは、ジクロロメタン、DCEは、1,2−ジクロロエタンを意味する。“Room temperature” in Reference Examples and Examples usually indicates a temperature of about 20 to 25 ° C.
In the table of (Example 2), DCM in the solvent column means dichloromethane, and DCE means 1,2-dichloroethane.
(参考例1)1,1−ジメチル−1,2−ジヒドロナフタレン(式(TH−1)においてp=0の化合物)の合成法:
(Reference Example 1) Method for synthesizing 1,1-dimethyl-1,2-dihydronaphthalene (compound of p = 0 in the formula (TH-1)):
<工程1> 4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−1−オールの合成:
市販の4,4−ジメチル−3,4−ジヒドロナフタレン−1(2H)−オン(CAS番号:2979−69−3)(1.0g)のメタノール(10mL)溶液に、氷水冷下、水素化ホウ素ナトリウム(0.24g)を2回に分けて加え、室温で1時間攪拌した。減圧下にてメタノールを除去し、得られた残渣に1規定水酸化ナトリウム水溶液(30mL)と酢酸エチル(40mL)を加えて分配した。有機層を飽和食塩水(25mL)で洗浄し、硫酸ナトリウムで乾燥した後、減圧濃縮することにより標記化合物(1.0g)を淡黄色油状物として得た。<Step 1> Synthesis of 4,4-dimethyl-1,2,3,4-tetrahydronaphthalene-1-ol:
Hydrochlorite in a solution of commercially available 4,4-dimethyl-3,4-dihydronaphthalene-1 (2H) -one (CAS No .: 2979-69-3) (1.0 g) in methanol (10 mL) under ice-water cooling. Sodium borohydride (0.24 g) was added in two portions and stirred at room temperature for 1 hour. Methanol was removed under reduced pressure, and 1N aqueous sodium hydroxide solution (30 mL) and ethyl acetate (40 mL) were added to the obtained residue and partitioned. The organic layer was washed with saturated brine (25 mL), dried over sodium sulfate, and concentrated under reduced pressure to give the title compound (1.0 g) as a pale yellow oil.
1H−NMRデータ(δ:ppm)<300MHz>:(CDCl3) δ:7.43(1H,dd,J=8,2Hz),7.35(1H,dd,J=8,2Hz),7.30-7.17(2H,m),4.82-4.69(1H,m),2.16-2.04(1H,m),1.97-1.83(2H,m),1.74-1.54(1H,m),1.35(3H,s),1.26(3H,s).
MS-ESI(m/z)[M+H]+=159(-OH)、保持時間=1.04(分)。 1 1 H-NMR data (δ: ppm) <300MHz> :( CDCl 3 ) δ: 7.43 (1H, dd, J = 8,2Hz), 7.35 (1H, dd, J = 8,2Hz), 7.30-7.17 ( 2H, m), 4.82-4.69 (1H, m), 2.16-2.04 (1H, m), 1.97-1.83 (2H, m), 1.74-1.54 (1H, m), 1.35 (3H, s), 1.26 ( 3H, s).
MS-ESI (m / z) [M + H] + = 159 (-OH), retention time = 1.04 (minutes).
<工程2>1,1−ジメチル−1,2−ジヒドロナフタレンの合成:
(参考例1)<工程1>で得られた化合物(1.0g)とp−トルエンスルホン酸・1水和物(0.05g)のトルエン(10mL)溶液を90℃で1.5時間攪拌した。室温まで放冷後、酢酸エチル(40mL)と飽和炭酸水素化ナトリウム水溶液(30mL)を加えて分配した。有機層を飽和食塩水で洗浄し、有機層を硫酸ナトリウムで乾燥した後、乾燥した有機層をろ過後、得られた酢酸エチルを減圧下にて濃縮することにより標記化合物(0.86g)を黄色油状物として得た。<Step 2> Synthesis of 1,1-dimethyl-1,2-dihydronaphthalene:
(Reference Example 1) A solution of the compound (1.0 g) obtained in <Step 1> and p-toluenesulfonic acid / monohydrate (0.05 g) in toluene (10 mL) is stirred at 90 ° C. for 1.5 hours. did. After allowing to cool to room temperature, ethyl acetate (40 mL) and saturated aqueous sodium hydride solution (30 mL) were added and partitioned. The title compound (0.86 g) was obtained by washing the organic layer with saturated brine, drying the organic layer with sodium sulfate, filtering the dried organic layer, and concentrating the obtained ethyl acetate under reduced pressure. Obtained as a yellow oil.
1H−NMRデータ(δ:ppm)<400MHz>:(CDCl3)δ:7.30(1H,d,J=7Hz),7.22-7.12(2H,m),7.04(1H,dd,J=7,2Hz),6.48-6.43(1H,m),5.97-5.91(1H,m), 2.26(2H,dd,J=4,2Hz),1.28(6H,s).
MS-ESI(m/z)[M+H]+=159、保持時間=1.25(分)。 1 1 H-NMR data (δ: ppm) <400MHz> :( CDCl 3 ) δ: 7.30 (1H, d, J = 7Hz), 7.22-7.12 (2H, m), 7.04 (1H, dd, J = 7, 2Hz), 6.48-6.43 (1H, m), 5.97-5.91 (1H, m), 2.26 (2H, dd, J = 4,2Hz), 1.28 (6H, s).
MS-ESI (m / z) [M + H] + = 159, retention time = 1.25 (minutes).
(参考例2)5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−アミン(式(AM−1))の合成法:
(Reference Example 2) Synthesis method of 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-amine (formula (AM-1)):
<工程1> 5−メチル−2−フェニルピリジン−3−アミンの合成:
市販の2−クロロ−5−メチル−3−ピリジンアミン(CAS番号:34552−13−1)(1.0g)、フェニルボロニックアシッド(0.86g)およびテトラキストリフェニルホスフィンパラジウム(0.81g)を、エタノール(15mL)、トルエン(35mL)、および2規定炭酸カリウム水溶液(11mL)の混合溶媒に加え、窒素雰囲気下、100℃で18時間攪拌した。放冷後、撹拌して得られた反応液に酢酸エチルと水を加えて分配し、有機層を飽和食塩水で洗浄、硫酸ナトリウムで乾燥した。乾燥した有機層をろ過後、得られた酢酸エチルを減圧下にて留去し、得られた残渣をヘプタン/酢酸エチルの混合溶媒に溶解し、シリカゲルカラムクロマトグラフィー(移動相:ヘプタン/酢酸エチル=70:30−65:35−60:40)を通して得られた溶液を減圧下にて留去することで、標記化合物(1.2g)を無色固体として得た。<Step 1> Synthesis of 5-methyl-2-phenylpyridine-3-amine:
Commercially available 2-chloro-5-methyl-3-pyridineamine (CAS number: 34552-13-1) (1.0 g), phenylboronic acid (0.86 g) and tetrakistriphenylphosphine palladium (0.81 g). Was added to a mixed solvent of ethanol (15 mL), toluene (35 mL), and 2N aqueous potassium carbonate solution (11 mL), and stirred at 100 ° C. for 18 hours under a nitrogen atmosphere. After allowing to cool, ethyl acetate and water were added to the reaction solution obtained by stirring and distributed, and the organic layer was washed with saturated brine and dried over sodium sulfate. After filtering the dried organic layer, the obtained ethyl acetate was distilled off under reduced pressure, the obtained residue was dissolved in a mixed solvent of heptane / ethyl acetate, and silica gel column chromatography (mobile phase: heptane / ethyl acetate) was performed. The solution obtained through (= 70: 30-65: 35-60: 40) was distilled off under reduced pressure to obtain the title compound (1.2 g) as a colorless solid.
1H−NMRデータ(δ:ppm)<400MHz>:(CDCl3)δ:7.97(1H,s),7.69-7.63(2H,m),7.50-7.43(2H,m),7.42-7.33(1H,m),6.87(1H,s),3.79(2H,br s),2.29(3H,s)。
MS-ESI(m/z)[M+H]+=185、保持時間=0.58(分)。 1 1 H-NMR data (δ: ppm) <400MHz> :( CDCl 3 ) δ: 7.97 (1H, s), 7.69-7.63 (2H, m), 7.50-7.43 (2H, m), 7.42-7.33 (1H) , M), 6.87 (1H, s), 3.79 (2H, br s), 2.29 (3H, s).
MS-ESI (m / z) [M + H] + = 185, retention time = 0.58 (minutes).
<工程2> 6−ブロモ−5−メチル−2−フェニルピリジン−3−アミンの合成:
(参考例2)<工程1>で得られた化合物(0.19g)のN−メチルピロリドン(2.0mL)溶液にN−ブロモスクシンイミド(0.21g)を加え、室温で2時間攪拌した。反応液に水(2.0mL)を加え、tert−ブチルメチルエーテルで二回抽出、有機層を水で洗浄した。得られたtert−ブチルメチルエーテルを減圧下にて留去し、得られた残渣を、ヘプタン/酢酸エチルの混合溶媒に溶解し、シリカゲルカラムクロマトグラフィー(固定相:アミノ−シリカゲル、移動相:ヘプタン/酢酸エチル=90:10〜30:10)を通して得られた溶液を減圧下にて留去することで、標記化合物(0.20g)を褐色固体として得た。<Step 2> Synthesis of 6-bromo-5-methyl-2-phenylpyridine-3-amine:
(Reference Example 2) N-Bromosuccinimide (0.21 g) was added to a solution of the compound (0.19 g) obtained in <Step 1> in N-methylpyrrolidone (2.0 mL), and the mixture was stirred at room temperature for 2 hours. Water (2.0 mL) was added to the reaction mixture, the mixture was extracted twice with tert-butyl methyl ether, and the organic layer was washed with water. The obtained tert-butyl methyl ether was distilled off under reduced pressure, and the obtained residue was dissolved in a mixed solvent of heptane / ethyl acetate, and silica gel column chromatography (stationary phase: amino-silica gel, mobile phase: heptane) was performed. The solution obtained through / ethyl acetate = 90: 10-30: 10) was distilled off under reduced pressure to obtain the title compound (0.20 g) as a brown solid.
1H−NMRデータ(δ:ppm)<300MHz>:(CDCl3)δ:7.67-7.61(2H,m),7.50-7.42(2H,m),7.41-7.34(1H,m),6.93(1H,d,J=1Hz),3.81(2H,br s),2.34(3H,s)。
MS-ESI(m/z)[M+H]+=263,265、保持時間=1.02(分)。 1 1 H-NMR data (δ: ppm) <300MHz> :( CDCl 3 ) δ: 7.67-7.61 (2H, m), 7.50-7.42 (2H, m), 7.41-7.34 (1H, m), 6.93 (1H) , d, J = 1Hz), 3.81 (2H, br s), 2.34 (3H, s).
MS-ESI (m / z) [M + H] + = 263,265, retention time = 1.02 (minutes).
<工程3>5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−アミンの合成:
(参考例2)<工程2>で得られた化合物(0.40g)の1,2−ジメトキシエタン(10mL)と水(2.0mL)の混合溶液に、2−メチル−5−(4,4,5,5−テトラメチル−1,3,2−ジオキサボロラン−2−イル)ピリミジン(0.44g)、炭酸セシウム(1.5g)およびジクロロ[1,1‘ビス(ジフェニルホスフィノ)フェロセン]パラジウム ジクロロメタン付加物(0.12g)を加え80℃で4時間攪拌した。放冷後、反応液に水を加えた。反応液及び水の混合溶液中の不溶物をセライトパッドで濾別し、酢酸エチルで洗浄した。得られた濾液から有機層を分離し、水、飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。乾燥した有機層をろ過後、得られた酢酸エチルを減圧下にて留去し、得られた残渣をヘプタン/酢酸エチルの混合溶媒に溶解し、シリカゲルカラムクロマトグラフィー(固定相:アミノ−シリカゲル、移動相:ヘプタン/酢酸エチル=100:0〜50:50)を通して得られた溶液を減圧下にて留去することで、標記化合物(0.31g)を得た。<Step 3> Synthesis of 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-amine:
(Reference Example 2) 2-Methyl-5- (4,) in a mixed solution of 1,2-dimethoxyethane (10 mL) and water (2.0 mL) of the compound (0.40 g) obtained in <Step 2>. 4,5,5-Tetramethyl-1,3,2-dioxaborolan-2-yl) pyrimidin (0.44 g), cesium carbonate (1.5 g) and dichloro [1,1'bis (diphenylphosphino) ferrocene] Palladium dichloromethane adduct (0.12 g) was added, and the mixture was stirred at 80 ° C. for 4 hours. After allowing to cool, water was added to the reaction solution. The insoluble material in the mixed solution of the reaction solution and water was filtered off with a Celite pad and washed with ethyl acetate. The organic layer was separated from the obtained filtrate, washed successively with water and saturated brine, and dried over sodium sulfate. After filtering the dried organic layer, the obtained ethyl acetate was distilled off under reduced pressure, and the obtained residue was dissolved in a mixed solvent of heptane / ethyl acetate, and silica gel column chromatography (stationary phase: amino-silicaette, The title compound (0.31 g) was obtained by distilling off the solution obtained through the mobile phase: heptane / ethyl acetate = 100: 0 to 50:50) under reduced pressure.
1H−NMRデータ(δ:ppm)<300MHz>:(CDCl3)δ:8.96(2H,s),7.74-7.69(2H,m),7.53-7.46(2H,m),7.44-7.38(1H,m),7.02(1H,s),3.99(2H,br s),2.41(3H,s),1.64(3H,s)。
MS-ESI(m/z)[M+H]+=277(-OH)、保持時間=0.66(分)。 1 1 H-NMR data (δ: ppm) <300MHz> :( CDCl 3 ) δ: 8.96 (2H, s), 7.74-7.69 (2H, m), 7.53-7.46 (2H, m), 7.44-7.38 (1H) , m), 7.02 (1H, s), 3.99 (2H, br s), 2.41 (3H, s), 1.64 (3H, s).
MS-ESI (m / z) [M + H] + = 277 (-OH), retention time = 0.66 (minutes).
(実施例1)
2,2,2−トリクロロエチル (5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル)カルバメート(式(CB−1)においてY=2,2,2−トリクロロエトキシ基の化合物)の合成(前記態様中の工程(5)(6)):
(Example 1)
2,2,2-Trichloroethyl (5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl) carbamate (Y = 2,2 in formula (CB-1)) Synthesis of 2-trichloroethoxy group compound) (steps (5) and (6) in the above embodiment):
(参考例2)で得られた化合物(0.30g)の1,2−ジクロロエタン(100mL)溶液にピリジン(0.22mL)および2,2,2−トリクロロエチルクロロホルメート(0.36mL)を室温で加え、同温にて1時間攪拌した。撹拌して得られた反応液に炭酸水素ナトリウム水溶液を加え酢酸エチルで抽出し、有機層を水、飽和食塩水で順次洗浄し、得られた有機層を硫酸ナトリウムで乾燥した。減圧下溶媒を留去し得られた残渣をシリカゲルカラムクロマトグラフィー(固定相:アミノ−シリカゲル、移動相:ヘプタン/酢酸エチル=2:1)で精製し、標記化合物(0.41g)を白色固体として得た。
1H-NMR(#)(CDCl3) δ: 8.89 (2H, s), 8.41 (1H, br s), 7.67-7.61 (2H, m), 7.60-7.47 (3H, m), 7.06 (1H, br s), 4.86 (2H, s), 2.81 (3H, s), 2.50 (3H, s).
LCMS m/z [M+H]+=451、453、455.UPLC保持時間:1.12分Pyridine (0.22 mL) and 2,2,2-trichloroethylchloroformate (0.36 mL) were added to a solution of compound (0.30 g) obtained in (Reference Example 2) in 1,2-dichloroethane (100 mL). The mixture was added at room temperature and stirred at the same temperature for 1 hour. An aqueous sodium hydrogen carbonate solution was added to the reaction solution obtained by stirring, the mixture was extracted with ethyl acetate, the organic layer was washed successively with water and saturated brine, and the obtained organic layer was dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the obtained residue was purified by silica gel column chromatography (stationary phase: amino-silica gel, mobile phase: heptane / ethyl acetate = 2: 1) to obtain the title compound (0.41 g) as a white solid. Obtained as.
1 1 H-NMR (#) (CDCl 3 ) δ: 8.89 (2H, s), 8.41 (1H, br s), 7.67-7.61 (2H, m), 7.60-7.47 (3H, m), 7.06 (1H, 1H, br s), 4.86 (2H, s), 2.81 (3H, s), 2.50 (3H, s).
LCMS m / z [M + H] + = 451, 453, 455.UPLC retention time: 1.12 minutes
(実施例2)
(1aR,7bS)−3,3−ジメチル−1a,2,3,7b−テトラヒドロナフト[1,2−b]オキシレン(式(EP−1)においてp=0の化合物)の合成(前記態様中の工程(1)(2)):
(Example 2)
Synthesis of (1aR, 7bS) -3,3-dimethyl-1a, 2,3,7b-tetrahydronaphtho [1,2-b] oxirene (compound of p = 0 in formula (EP-1)) (in the above embodiment). Steps (1) (2)):
文献公知、例えば『国際公開第2006/087874号パンフレット』に記載された方法に準じて合成した配位子の、3,3’’−((((1R,2R)−シクロヘキサン−1,2−ジイル)ビス(アザネジル))ビス(メチレン))ビス(2’−メトキシ−[1,1’−ビフェニル]−2−オール):(CAS番号:928769−12−4) を、ジクロロメタン又は1,2−ジクロロエタンに溶解させた後、チタン触媒であるチタンテトライソプロポキシドを加え、15℃〜25℃で1時間撹拌した。撹拌した混合溶液に、(参考例1)で得られた化合物(式(TH−1)においてp=0の化合物)及びリン酸緩衝液を加えた。(以下、i室温反応する場合、又はii加熱反応する場合の条件に分けて記載する)。
[i室温反応する場合]その後、前記反応溶液に30%過酸化水素水を加え、室温で撹拌した。反応後、室温下にて飽和チオ硫酸ナトリウム水溶液を加え有機層と水層を分離し、水層をジクロロメタンで抽出した。有機層と抽出溶液の混合溶液を減圧下濃縮し、標記化合物の粗生成体を褐色油状物質として得た。
[ii加熱反応する場合]その後、当該反応溶液が還流する温度(ジクロロメタンの場合:外温が40℃±5℃、1,2−ジクロロエタンの場合:外温が60℃±5℃)に昇温させ、前記反応溶液に30%過酸化水素水を加え、更に反応溶液が還流する温度(ジクロロメタンの場合:外温が40℃±5℃、1,2−ジクロロエタンの場合:外温が60℃±5℃)で撹拌した。反応後、室温下にて飽和チオ硫酸ナトリウム水溶液を加え有機層と水層を分離し、水層をジクロロメタンで抽出した。有機層と抽出溶液の混合溶液を減圧下濃縮し、標記化合物の粗生成体を褐色油状物質として得た。3,3''-((((1R, 2R) -cyclohexane-1,2-) of a ligand known in the literature, for example, synthesized according to the method described in "International Publication No. 2006/087874". Diyl) bis (azanesil)) bis (methylene)) bis (2'-methoxy- [1,1'-biphenyl] -2-ol) :( CAS number: 928769-12-4), dichloromethane or 1,2 After dissolution in −dichloroethane, titanium tetraisopropoxide, which is a titanium catalyst, was added, and the mixture was stirred at 15 ° C. to 25 ° C. for 1 hour. The compound obtained in (Reference Example 1) (compound with p = 0 in the formula (TH-1)) and a phosphate buffer solution were added to the stirred mixed solution. (Hereinafter, the conditions for i-room temperature reaction or ii heating reaction will be described separately).
[I When reacting at room temperature] Then, 30% hydrogen peroxide solution was added to the reaction solution, and the mixture was stirred at room temperature. After the reaction, a saturated aqueous sodium thiosulfate solution was added at room temperature to separate the organic layer and the aqueous layer, and the aqueous layer was extracted with dichloromethane. The mixed solution of the organic layer and the extraction solution was concentrated under reduced pressure to obtain a crude product of the title compound as a brown oily substance.
[Ii When heating reaction] After that, the temperature is raised to the temperature at which the reaction solution refluxes (dichloromethane: external temperature: 40 ° C ± 5 ° C, 1,2-dichloroethane: external temperature: 60 ° C ± 5 ° C). Then, 30% hydrogen peroxide solution is added to the reaction solution, and the temperature at which the reaction solution refluxes (dichloromethane: outside temperature: 40 ° C. ± 5 ° C., 1,2-dichloroethane: outside temperature: 60 ° C. ± 5 ° C.). After the reaction, a saturated aqueous sodium thiosulfate solution was added at room temperature to separate the organic layer and the aqueous layer, and the aqueous layer was extracted with dichloromethane. The mixed solution of the organic layer and the extraction solution was concentrated under reduced pressure to obtain a crude product of the title compound as a brown oily substance.
上記反応を、下表の各種条件にて実施した(実施例2A〜2D;参考例2a〜2c)。
表A
なお、表A中の溶媒のDCEは1,2−ジクロロエタンを意味し、DCMはジクロロメタンを意味する。The above reaction was carried out under various conditions in the table below (Examples 2A to 2D; Reference Examples 2a to 2c).
Table A
The solvent DCE in Table A means 1,2-dichloroethane, and DCM means dichloromethane.
表B
なお、表B中の溶媒のDCEは1,2−ジクロロエタンを意味し、DCMはジクロロメタンを意味する。
参考例2aは、Synlett,20,p3545-3547,2006年(非特許文献3)に記載の反応条件下での反応であり、参考例2bは、Synlett,15,p2445-2447,2007年(非特許文献4)に記載の反応条件下での反応である。Table B
The solvent DCE in Table B means 1,2-dichloroethane, and DCM means dichloromethane.
Reference Example 2a is a reaction under the reaction conditions described in Synlett, 20, p3545-3547, 2006 (Non-Patent Document 3), and Reference Example 2b is Synlett, 15, p2445-2447, 2007 (Non-Patent Document 3). This is a reaction under the reaction conditions described in Patent Document 4).
上記表中の転化率は、反応により消失した反応物質(出発物質)の供給量に対する割合を意味する。即ち、転化率が高いほど、反応物質(出発物質)が消失しており、反応が進行していると解することができる。転嫁率の測定は、UPLCの220nmUVスペクトル強度から算出した。又、測定収率は、NMRから内部標準物質(テレフタル酸ジメチル)との比較により算出した。 The conversion rate in the above table means the ratio of the reactant (starting substance) disappeared by the reaction to the supply amount. That is, it can be understood that the higher the conversion rate, the more the reactant (starting substance) has disappeared, and the more the reaction is proceeding. The pass-through rate was measured from the 220 nm UV spectral intensity of the UPLC. The measured yield was calculated from NMR by comparison with an internal standard substance (dimethyl terephthalate).
[(1aR,7bS)−3,3−ジメチル−1a,2,3,7b−テトラヒドロナフト[1,2−b]オキシレンのデータ];
1H-NMR (CDCl3) δ: 7.42 (1H, dd, J = 8.0, 1.2 Hz), 7.37-7.30 (2H, m), 7.20 (1H, td, J = 7.2, 1.2 Hz), 3.86 (1H, d, J = 4.1 Hz), 3.73-3.71 (1H, m), 2.21 (1H, dd, J = 15.2, 2.8 Hz), 1.84 (1H, d, J = 15.2 Hz), 1.36 (3H, s), 1.31 (3H, s).
LCMS m/z [M+H]+=175、UPLC保持時間: 4.08分
光学純度分析:1% イソプロパノール (0.1%ジエチルアミン含有), 3.0mL/分, CHIRALCEL OD-H(4.6mm×150mm、5.0μm)(daicel), major 2.35, minor 2.20.[(1aR, 7bS) -3,3-dimethyl-1a, 2,3,7b-tetrahydronaphtho [1,2-b] oxirene data];
1 H-NMR (CDCl 3 ) δ: 7.42 (1H, dd, J = 8.0, 1.2 Hz), 7.37-7.30 (2H, m), 7.20 (1H, td, J = 7.2, 1.2 Hz), 3.86 (1H) , d, J = 4.1 Hz), 3.73-3.71 (1H, m), 2.21 (1H, dd, J = 15.2, 2.8 Hz), 1.84 (1H, d, J = 15.2 Hz), 1.36 (3H, s) , 1.31 (3H, s).
LCMS m / z [M + H] + = 175, UPLC retention time: 4.08 minutes
Optical purity analysis: 1% isopropanol (containing 0.1% diethylamine), 3.0 mL / min, CHIRALCEL OD-H (4.6 mm × 150 mm, 5.0 μm) (daicel), major 2.35, minor 2.20.
(実施例3)
(1R,2R)−1−アミノ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−2−オール(式(AM−X)においてp=0の化合物)の合成(前記態様中の工程(3)(4)):
(Example 3)
Synthesis of (1R, 2R) -1-amino-4,4-dimethyl-1,2,3,4-tetrahydronaphthalene-2-ol (compound of p = 0 in formula (AM-X)) (in the above embodiment). Steps (3) (4)):
(実施例2j)の方法で得られた(1aR,7bS)−3,3−ジメチル−1a,2,3,7b−テトラヒドロナフト[1,2−b]オキシレン(2.0g, 51%純度)のエタノール(5.1mL)溶液中に、25%アンモニア水(5.1mL)を加え、封管中100℃で2時間攪拌した。放冷後、反応液に水と飽和食塩水を加え、酢酸エチルで2回抽出した。有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥、濾過後に減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィー(固定相:アミノ−シリカゲル、移動相:ヘプタン/酢酸エチル=100:0〜0:100)で精製し、標記化合物(0.76g)を得た。
[(1R,2R)−1−アミノ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−2−オールのデータ];
1H-NMR (DMSO-D6) δ: 7.62-7.60 (1H, m), 7.29-7.26 (1H, m), 7.17-7.10 (2H, m), 4.79 (1H, d, J = 4.0 Hz) 3.49-3.40 (2H, m), 1.85 (2H, br s), 1.78 (1H, dd, J = 13.2, 2.8 Hz), 1.28 (3H, s), 1.23 (3H, s).
LCMS m/z [M+H]+=192、UPLC保持時間: 2.39分
光学純度分析:10% メタノール (0.1%ジエチルアミン含有), 3.0mL/分, CHIRALCEL OD-H(4.6mm×150mm、5.0μm)(daicel), major 1.90分, minor 2.32分. 鏡像体過剰率99%.
得られた、(1R,2R)−1−アミノ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−2−オールは、下記(実験例1)に示すように有機酸との付加塩・水和物を形成できる。(1aR, 7bS) -3,3-dimethyl-1a, 2,3,7b-tetrahydronaphtho [1,2-b] oxirene (2.0 g, 51% purity) obtained by the method of (Example 2j). 25% aqueous ammonia (5.1 mL) was added to a solution of ethanol (5.1 mL), and the mixture was stirred in a sealed tube at 100 ° C. for 2 hours. After allowing to cool, water and saturated brine were added to the reaction mixture, and the mixture was extracted twice with ethyl acetate. The organic layer was washed with saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (stationary phase: amino-silica gel, mobile phase: heptane / ethyl acetate = 100: 0 to 0: 100) to obtain the title compound (0.76 g).
[Data on (1R, 2R) -1-amino-4,4-dimethyl-1,2,3,4-tetrahydronaphthalene-2-ol];
1 1 H-NMR (DMSO-D 6 ) δ: 7.62-7.60 (1H, m), 7.29-7.26 (1H, m), 7.17-7.10 (2H, m), 4.79 (1H, d, J = 4.0 Hz) 3.49-3.40 (2H, m), 1.85 (2H, br s), 1.78 (1H, dd, J = 13.2, 2.8 Hz), 1.28 (3H, s), 1.23 (3H, s).
LCMS m / z [M + H] + = 192, UPLC retention time: 2.39 minutes Optical purity analysis: 10% methanol (containing 0.1% diethylamine), 3.0 mL / min, CHIRALCEL OD-H (4.6 mm × 150 mm, 5.0 μm) ) (Daicel), major 1.90 minutes, minor 2.32 minutes. Mirror body excess rate 99%.
The obtained (1R, 2R) -1-amino-4,4-dimethyl-1,2,3,4-tetrahydronaphthalene-2-ol was combined with an organic acid as shown in the following (Experimental Example 1). Can form additional salts and hydrates.
(実験例1)(1R,2R)−1−アミノ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−2−オール (2S,3S)−2,3−ジヒドロスクシネート 1水和物の合成
(実施例3)の方法で得られた化合物(9.5g)とD−(-)−酒石酸(7.4 g)をアセトニトリル(113mL)と水(12.5mL)の混合溶媒に溶解し、75℃で1時間加熱還流した。反応液を冷却し、室温で2時間撹拌後、析出した白色固体を濾取し、水とアセトニトリルの混合溶液で洗浄することで標記化合物(12g)を得た。
[(1R,2R)−1−アミノ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−2−オール (2S,3S)−2,3−ジヒドロスクシネート 1水和物のデータ];
1H-NMR (DMSO-D6) δ: 7.48 (1H, d, J = 7.4 Hz), 7.44 (1H, dd, J = 7.6, 1.0 Hz), 7.33 (1H, t, J = 7.6 Hz), 7.27 (1H, td, J = 7.4, 1.0 Hz), 4.06 (1H, d, J = 9.0 Hz), 3.96 (2H, s), 1.89 (1H, dd, J = 12.8, 3.4 Hz), 1.72 (1H, t, J = 12.8 Hz), 1.32 (3H, s), 1.27 (3H, s).
LCMS m/z [M+H]+= 192、UPLC保持時間: 2.43分
光学純度分析:10% メタノール (0.1%ジエチルアミン含有), 3.0mL/分, CHIRALCEL OD-H(4.6mm×150mm、5.0μm)(daicel), major 1.89分, minor 2.38分. 鏡像体過剰率100%.(Experimental Example 1) (1R, 2R) -1-amino-4,4-dimethyl-1,2,3,4-tetrahydronaphthalene-2-ol (2S, 3S) -2,3-dihydrosuccinate 1 Mixing the compound (9.5 g) and D- (-)-tartaric acid (7.4 g) obtained by the method of hydrate synthesis (Example 3) with acetonitrile (113 mL) and water (12.5 mL). It was dissolved in a solvent and heated to reflux at 75 ° C. for 1 hour. The reaction mixture was cooled, stirred at room temperature for 2 hours, and the precipitated white solid was collected by filtration and washed with a mixed solution of water and acetonitrile to obtain the title compound (12 g).
[(1R, 2R) -1-amino-4,4-dimethyl-1,2,3,4-tetrahydronaphthalene-2-ol (2S, 3S) -2,3-dihydrosuccinate monohydrate data];
1H-NMR (DMSO-D6) δ: 7.48 (1H, d, J = 7.4 Hz), 7.44 (1H, dd, J = 7.6, 1.0 Hz), 7.33 (1H, t, J = 7.6 Hz), 7.27 ( 1H, td, J = 7.4, 1.0 Hz), 4.06 (1H, d, J = 9.0 Hz), 3.96 (2H, s), 1.89 (1H, dd, J = 12.8, 3.4 Hz), 1.72 (1H, t , J = 12.8 Hz), 1.32 (3H, s), 1.27 (3H, s).
LCMS m / z [M + H] + = 192, UPLC retention time: 2.43 minutes
Optical purity analysis: 10% methanol (containing 0.1% diethylamine), 3.0 mL / min, CHIRALCEL OD-H (4.6 mm × 150 mm, 5.0 μm) (daicel), major 1.89 min, minor 2.38 min. 100%.
(実施例4)
1−((1R,2R)−2−ヒドロキシ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−1−イル)−3−(5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル)ウレア(式(I)においてp=0の化合物)の合成(前記態様中の工程(7)(8)):(Example 4)
1-((1R, 2R) -2-hydroxy-4,4-dimethyl-1,2,3,4-tetrahydronaphthalene-1-yl) -3- (5-methyl-6- (2-methylpyrimidine-) Synthesis of 5-yl) -2-phenylpyridine-3-yl) urea (compound of p = 0 in formula (I)) (steps (7) (8) in the above embodiment):
(実施例3)で得られた化合物(0.75g)と(実施例1)で得られた化合物(1.77g)のジメチルスルホキシド(10mL)溶液に、ジアザビシクロウンデセン(0.59mL)を加えて室温で一夜攪拌した。撹拌して得られた反応液に水(10mL)とエタノール(10mL)を加え、55℃で1時間攪拌した。撹拌して得られた反応液を冷却し、室温で3時間攪拌後、析出した沈殿を濾取し、水とエタノールの混合溶液で洗浄、減圧乾燥することにより標記化合物(1.59g、82%)を得た。
[1−((1R,2R)−2−ヒドロキシ−4,4−ジメチル−1,2,3,4−テトラヒドロナフタレン−1−イル)−3−(5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル)ウレアのデータ];
1H-NMR (DMSO-D6) δ: 8.94 (2H, s), 8.42 (1H, s), 7.79 (1H, br s), 7.65 (2H, d, J = 6.8 Hz), 7.52-7.43 (3H, m), 7.32 (1H, d, J = 6.8 Hz), 7.21-7.16 (4H, m), 4.94 (1H, d, J = 4.4 Hz), 4.58 (1H, t, J = 8.8 Hz), 3.75-3.68 (1H, m), 2.68 (3H, s), 2.43 (3H, s), 1.84 (1H, dd, J = 12.8, 3.6 Hz), 1.70 (1H, t, J = 12.0 Hz), 1.31 (3H, s), 1.23 (3H, s).
LCMS m/z [M+H]+=494.UPLC保持時間: 3.75分
光学純度分析:30% エタノール, 3.0mL/分, CHIRALPAK IC(4.6mm×150mm、5.0μm)(daicel), major 3.34分, minor 2.83分. 鏡像体過剰率100%.Diazabicycloundecene (0.59 mL) in a solution of the compound (0.75 g) obtained in (Example 3) and the compound (1.77 g) obtained in (Example 1) in dimethyl sulfoxide (10 mL). Was added and stirred overnight at room temperature. Water (10 mL) and ethanol (10 mL) were added to the reaction solution obtained by stirring, and the mixture was stirred at 55 ° C. for 1 hour. The reaction solution obtained by stirring is cooled, stirred at room temperature for 3 hours, the precipitated precipitate is collected by filtration, washed with a mixed solution of water and ethanol, and dried under reduced pressure to obtain the title compound (1.59 g, 82%). ) Was obtained.
[1-((1R, 2R) -2-hydroxy-4,4-dimethyl-1,2,3,4-tetrahydronaphthalene-1-yl) -3- (5-methyl-6- (2-methylpyrimidine)) -5-yl) -2-phenylpyridine-3-yl) urea data];
1 1 H-NMR (DMSO-D 6 ) δ: 8.94 (2H, s), 8.42 (1H, s), 7.79 (1H, br s), 7.65 (2H, d, J = 6.8 Hz), 7.52-7.43 ( 3H, m), 7.32 (1H, d, J = 6.8 Hz), 7.21-7.16 (4H, m), 4.94 (1H, d, J = 4.4 Hz), 4.58 (1H, t, J = 8.8 Hz), 3.75-3.68 (1H, m), 2.68 (3H, s), 2.43 (3H, s), 1.84 (1H, dd, J = 12.8, 3.6 Hz), 1.70 (1H, t, J = 12.0 Hz), 1.31 (3H, s), 1.23 (3H, s).
LCMS m / z [M + H] + = 494.UPLC retention time: 3.75 minutes Optical purity analysis: 30% ethanol, 3.0 mL / min, CHIRALPAK IC (4.6 mm × 150 mm, 5.0 μm) (daicel), major 3.34 minutes , minor 2.83 minutes. Mirror body excess rate 100%.
本発明によれば、式(I)で表される化合物を、短工程、かつ工業的生産に適した製造方法が提供される。また、式(I)で表される化合物の製造の為の中間体である式(AM−X)で表される化合物の有用な製造方法が提供される。 According to the present invention, there is provided a method for producing a compound represented by the formula (I) in a short process and suitable for industrial production. In addition, a useful method for producing a compound represented by the formula (AM-X), which is an intermediate for producing the compound represented by the formula (I), is provided.
Claims (12)
[式(I)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基であり;環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基である]で表される化合物の製造方法であって、以下の工程:
(1)下記式(TH−1):
[式(TH−1)中、p及びR1は、前記式(I)中の定義と同じである]で表される化合物と、チタン触媒と、下記式(LG−1):
で表わされる配位子と、過酸化水素水と、緩衝液とを、溶媒中に加えて混合溶液(1)を得る工程、
(2)前記混合溶液(1)を、外温30℃〜50℃の範囲の温度で反応を行い、下記式(EP−1):
[式(EP−1)中、p及びR1は、前記式(I)中の定義と同じである]で表される化合物を得る工程、
(3)前記式(EP−1)で表される化合物とアンモニア水とを含む混合溶液(3)を得る工程、
(4)前記混合溶液(3)を、0℃から前記混合溶液(3)が還流する温度までの間のいずれかの温度で反応を行い、下記式(AM−X):
[式(AM−X)中、p及びR1は、前記式(I)中の定義と同じである]で表される化合物を得る工程、
(5)下記式(AM−1):
[式(AM−1)中、環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基である]で表わされる化合物と、トリホスゲン、ホスゲン、クロロギ酸トリクロロメチル、2,2,2−トリクロロエチルクロロホルメート、クロロギ酸フェニル、クロロギ酸p−ニトロフェニル、クロロギ酸p−トリル、N,N´−カルボニルジイミダゾール、及びN,N´−ジスクシンイミジルカルボナートから選ばれるウレア化剤と、塩基とを、溶媒に加えて混合溶液(5)を得る工程、
(6)前記混合溶液(5)を、0℃から前記混合溶液(5)が還流する温度までの間のいずれかの温度で反応を行い、下記式(CB−1):
[式(CB−1)中、環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基であり;Yは、トリクロロメトキシ基、塩素原子、2,2,2−トリクロロエトキシ基、フェノキシ基、p−ニトロフェノキシ基、p−メチルフェノキシ基、イミダゾール−1−イル基、又は(2,5−ジオキソピロリジン−1−イル)オキシ基から選ばれる基である]で表わされる化合物を得る工程、
(7)前記式(AM−X)で表わされる化合物と、前記式(CB−1)で表わされる化合物と、塩基とを、溶媒に加えて混合溶液(7)を得る工程、及び
(8)前記混合溶液(7)を、0℃から前記混合溶液(7)が還流する温度までの間のいずれかの温度で反応を行い、式(I)で表される化合物を得る工程、
を含むことを特徴とする、製造方法。The following formula (I):
[In formula (I), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy. C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C 2- It is a substituent selected from 7 alkanoylamino group, carboxamide group, and C 1-6 alkoxycarbonyl group; ring A is 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-. 3-Il group], which is a method for producing a compound represented by the following steps:
(1) The following formula (TH-1):
[In the formula (TH-1), p and R 1 are the same as the definitions in the above formula (I)], the titanium catalyst, and the following formula (LG-1):
A step of adding a ligand represented by (1), a hydrogen peroxide solution, and a buffer solution to a solvent to obtain a mixed solution (1).
(2) The mixed solution (1) was reacted at an outside temperature in the range of 30 ° C. to 50 ° C., and the following formula (EP-1):
A step of obtaining a compound represented by [in formula (EP-1), p and R 1 are the same as the definitions in the above formula (I)].
(3) A step of obtaining a mixed solution (3) containing the compound represented by the formula (EP-1) and aqueous ammonia.
(4) The mixed solution (3) is reacted at any temperature between 0 ° C. and the temperature at which the mixed solution (3) refluxes, and the following formula (AM-X):
The step of obtaining the compound represented by [in the formula (AM-X), p and R 1 are the same as the definitions in the above formula (I)].
(5) The following formula (AM-1):
[In the formula (AM-1), ring A is a 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl group], and triphosgene. Phosgene, trichloromethyl chloroformate, 2,2,2-trichloroethyl chloroformate, phenyl chloroformate, p-nitrophenyl chloroformate, p-tolyl chloroformate, N, N'-carbonyldiimidazole, and N, N' -A step of adding a urea agent selected from dysuccinimidylcarbonate and a base to a solvent to obtain a mixed solution (5).
(6) The mixed solution (5) was reacted at any temperature between 0 ° C. and the temperature at which the mixed solution (5) refluxed, and the following formula (CB-1):
[In formula (CB-1), ring A is a 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl group; Y is a trichloromethoxy group, chlorine. Atomic, 2,2,2-trichloroethoxy group, phenoxy group, p-nitrophenoxy group, p-methylphenoxy group, imidazol-1-yl group, or (2,5-dioxopyrrolidine-1-yl) oxy group The process of obtaining the compound represented by], which is a group selected from
(7) A step of adding a compound represented by the formula (AM-X), a compound represented by the formula (CB-1), and a base to a solvent to obtain a mixed solution (7), and (8). A step of reacting the mixed solution (7) at any temperature between 0 ° C. and the temperature at which the mixed solution (7) refluxes to obtain a compound represented by the formula (I).
A manufacturing method comprising.
R1は、ハロゲン原子、又はC1-6アルコキシC1-6アルキル基であり、
工程(1)中のチタン触媒は、チタンテトラメトキシド、チタンテトラエトキシド、チタンテトラノルマルプロポキシド、チタンテトライソプロポキシド、チタンテトラノルマルブトキシド、又はチタンテトラターシャリーブトキシドであり、
工程(1)中の溶媒は、有機溶媒であり、
工程(1)中の緩衝液は、クエン酸/NaOH緩衝液、クエン酸/クエン酸ナトリウム緩衝液、ホウ酸/NaOH緩衝液、リン酸緩衝液、KH2PO4/NaOH緩衝液であり、
工程(5)中のウレア化剤は、クロロギ酸フェニル、クロロギ酸p−トリル、又は2,2,2−トリクロロエチルクロロホルメートであり、
工程(5)中の塩基は、有機塩基であり、
工程(5)中の溶媒は、非プロトン性極性溶媒であり、
式(CB−1)中のYは、フェノキシ基、p−メチルフェノキシ基、又は2,2,2−トリクロロエトキシ基であり、
工程(7)中の塩基は、有機塩基であり、
工程(7)中の溶媒は、非プロトン性極性溶媒である、
請求項1に記載の製造方法。In formula (I), p is 0 or 1,
R 1 is a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group.
The titanium catalyst in the step (1) is titanium tetramethoxydo, titanium tetraethoxydo, titanium tetranormal propoxide, titanium tetraisopropoxide, titanium tetranormal butoxide, or titanium tetraterlybutoxide.
The solvent in step (1) is an organic solvent.
The buffer solution in the step (1) is citric acid / NaOH buffer solution, citric acid / sodium citrate buffer solution, boric acid / NaOH buffer solution, phosphate buffer solution, KH 2 PO 4 / NaOH buffer solution.
The urea agent in step (5) is phenyl chloroformate, p-tolyl chloroformate, or 2,2,2-trichloroethylchloroformate.
The base in step (5) is an organic base and
The solvent in step (5) is an aprotic polar solvent.
Y in the formula (CB-1) is a phenoxy group, a p-methylphenoxy group, or a 2,2,2-trichloroethoxy group.
The base in step (7) is an organic base and
The solvent in step (7) is an aprotic polar solvent.
The manufacturing method according to claim 1.
工程(1)中のチタン触媒は、チタンテトライソプロポキシドであり、
工程(1)の溶媒は、ジクロロメタンであり、
工程(1)中の緩衝液は、リン酸緩衝液であり、
工程(5)中のウレア化剤は、2,2,2−トリクロロエチルクロロホルメートであり、
工程(5)中の塩基は、ピリジンであり、
工程(5)中の溶媒は、1,2−ジクロロエタンであり、
式(CB−1)中のYは、2,2,2−トリクロロエトキシ基であり、
工程(7)中の塩基は、ジアザビシクロウンデセンであり、
工程(7)中の溶媒は、ジメチルスルホキシドである、
請求項1に記載の製造方法。In formula (I), p is 0,
The titanium catalyst in step (1) is titanium tetraisopropoxide.
The solvent in step (1) is dichloromethane,
The buffer solution in step (1) is a phosphate buffer solution.
The urea agent in step (5) is 2,2,2-trichloroethylchloroformate.
The base in step (5) is pyridine,
The solvent in step (5) is 1,2-dichloroethane.
Y in the formula (CB-1) is a 2,2,2-trichloroethoxy group.
The base in step (7) is diazabicycloundecene,
The solvent in step (7) is dimethyl sulfoxide,
The manufacturing method according to claim 1.
[式(AM−X)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基である]で表される化合物の製造方法であって、以下の工程:
(1)下記式(TH−1):
[式(TH−1)中、p及びR1は、前記式(AM−X)中の定義と同じである]で表される化合物と、チタン触媒と、下記式(LG−1):
で表わされる配位子と、過酸化水素水と、緩衝液とを、溶媒中に加えて混合溶液(1)を得る工程、
(2)前記混合溶液(1)を、外温30℃〜50℃の範囲の温度で反応を行い、下記式(EP−1):
[式(EP−1)中、p及びR1は、前記式(AM−X)中の定義と同じである]で表される化合物を得る工程、
(3)前記式(EP−1)で表される化合物とアンモニア水とを含む混合溶液(3)を得る工程、及び
(4)前記混合溶液(3)を、0℃から前記混合溶液(3)が還流する温度までの間のいずれかの温度で反応を行い、前記式(AM−X)で表される化合物を得る工程、
を含むことを特徴とする、製造方法。The following formula (AM-X):
[In formula (AM-X), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group. , Hydroxy C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C A substituent selected from a 2-7 alkanoylamino group, a carboxamide group, and a C 1-6 alkoxycarbonyl group], which is a method for producing a compound represented by the following steps:
(1) The following formula (TH-1):
[In the formula (TH-1), p and R 1 are the same as the definitions in the above formula (AM-X)], the titanium catalyst, and the following formula (LG-1):
A step of adding a ligand represented by (1), a hydrogen peroxide solution, and a buffer solution to a solvent to obtain a mixed solution (1).
(2) The mixed solution (1) was reacted at an outside temperature in the range of 30 ° C. to 50 ° C., and the following formula (EP-1):
A step of obtaining a compound represented by [in formula (EP-1), p and R 1 are the same as the definitions in the above formula (AM-X)].
(3) A step of obtaining a mixed solution (3) containing the compound represented by the formula (EP-1) and aqueous ammonia, and (4) the mixed solution (3) is subjected to the mixed solution (3) from 0 ° C. ) Is carried out at any temperature up to the temperature at which reflux is carried out to obtain a compound represented by the above formula (AM-X).
A manufacturing method comprising.
[式(EP−1)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基である]で表される化合物の製造方法であって、以下の工程:
(1)下記式(TH−1):
[式(TH−1)中、p及びR1は、前記式(EP−1)中の定義と同じである]で表される化合物と、チタン触媒と、下記式(LG−1):
で表わされる配位子と、過酸化水素水と、緩衝液とを、溶媒中に加えて混合溶液(1)を得る工程、及び
(2)前記混合溶液(1)を、外温30℃〜50℃の範囲の温度で反応を行い、前記式(EP−1)で表される化合物を得る工程、
を含むことを特徴とする、製造方法。The following formula (EP-1):
[In formula (EP-1), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group. , Hydroxy C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C A substituent selected from a 2-7 alkanoylamino group, a carboxamide group, and a C 1-6 alkoxycarbonyl group], which is a method for producing a compound represented by the following steps:
(1) The following formula (TH-1):
[In the formula (TH-1), p and R 1 are the same as the definitions in the above formula (EP-1)], the titanium catalyst, and the following formula (LG-1):
A step of adding a ligand represented by (1), a hydrogen peroxide solution, and a buffer solution to a solvent to obtain a mixed solution (1), and (2) the mixed solution (1) having an outside temperature of 30 ° C. to A step of carrying out a reaction at a temperature in the range of 50 ° C. to obtain a compound represented by the above formula (EP-1).
A manufacturing method comprising.
[式(AM−X)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基である]で表される化合物の製造方法であって、以下の工程:
(3)下記式(EP−1):
[式(EP−1)中、p及びR1は、前記式(AM−X)中の定義と同じである]で表される化合物とアンモニア水とを含む混合溶液(3)を得る工程、及び
(4)前記混合溶液(3)を、0℃から前記混合溶液(3)が還流する温度までの間のいずれかの温度で反応を行い、前記式(AM−X)で表される化合物を得る工程、
を含むことを特徴とする、製造方法。The following formula (AM-X):
[In formula (AM-X), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group. , Hydroxy C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C A substituent selected from a 2-7 alkanoylamino group, a carboxamide group, and a C 1-6 alkoxycarbonyl group], which is a method for producing a compound represented by the following steps:
(3) The following formula (EP-1):
A step of obtaining a mixed solution (3) containing a compound represented by the formula (where p and R 1 are the same as those defined in the formula (AM-X)] and aqueous ammonia. And (4) the mixed solution (3) is reacted at any temperature between 0 ° C. and the temperature at which the mixed solution (3) is refluxed, and the compound represented by the above formula (AM-X) is reacted. The process of getting
A manufacturing method comprising.
[式(I)中、pは、0、1、及び2から選ばれる整数であり;R1は、ハロゲン原子、シアノ基、C1-6アルキル基、ハロゲン化C1-6アルキル基、ヒドロキシC1-6アルキル基、シアノ化C1-6アルキル基、C1-6アルコキシ基、ハロゲン化C1-6アルコキシ基、C1-6アルコキシC1-6アルキル基、モノ/ジC2-7アルカノイルアミノ基、カルボキサミド基、及びC1-6アルコキシカルボニル基から選ばれる置換基であり;環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基である]で表される化合物の製造方法であって、以下の工程:
(5)下記式(AM−1):
[式(AM−1)中、環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基である]で表わされる化合物と、トリホスゲン、ホスゲン、クロロギ酸トリクロロメチル、2,2,2−トリクロロエチルクロロホルメート、クロロギ酸フェニル、クロロギ酸p−ニトロフェニル、クロロギ酸p−トリル、N,N´−カルボニルジイミダゾール、及びN,N´−ジスクシンイミジルカルボナートから選ばれるウレア化剤と、塩基とを、溶媒に加えて混合溶液(5)を得る工程、
(6)前記混合溶液(5)を、0℃から前記混合溶液(5)が還流する温度までの間のいずれかの温度で反応を行い、下記式(CB−1):
[式(CB−1)中、環Aは、5−メチル−6−(2−メチルピリミジン−5−イル)−2−フェニルピリジン−3−イル基であり;Yは、トリクロロメトキシ基、塩素原子、2,2,2−トリクロロエトキシ基、フェノキシ基、p−ニトロフェノキシ基、p−メチルフェノキシ基、イミダゾール−1−イル基、(2,5−ジオキソピロリジン−1−イル)オキシ基、等から選ばれる基である]で表わされる化合物を得る工程、
(7)下記式(AM−X):
[式(AM−X)中、p及びR1は、前記式(I)中の定義と同じである]で表される化合物と、前記式(CB−1)で表わされる化合物と、塩基とを、溶媒に加えて混合溶液(7)を得る工程、及び
(8)前記混合溶液(7)を、0℃から前記混合溶液(7)が還流する温度までの間のいずれかの温度で反応を行い、式(I)で表される化合物を得る工程、
を含むことを特徴とする、製造方法。The following formula (I):
[In formula (I), p is an integer chosen from 0, 1, and 2; R 1 is a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy. C 1-6 alkyl group, cyanated C 1-6 alkyl group, C 1-6 alkoxy group, halogenated C 1-6 alkoxy group, C 1-6 alkoxy C 1-6 alkyl group, mono / di C 2- It is a substituent selected from 7 alkanoylamino group, carboxamide group, and C 1-6 alkoxycarbonyl group; ring A is 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-. 3-Il group], which is a method for producing a compound represented by the following steps:
(5) The following formula (AM-1):
[In the formula (AM-1), ring A is a 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl group], and triphosgene. Phosgene, trichloromethyl chloroformate, 2,2,2-trichloroethyl chloroformate, phenyl chloroformate, p-nitrophenyl chloroformate, p-tolyl chloroformate, N, N'-carbonyldiimidazole, and N, N' -A step of adding a urea agent selected from dysuccinimidylcarbonate and a base to a solvent to obtain a mixed solution (5).
(6) The mixed solution (5) was reacted at any temperature between 0 ° C. and the temperature at which the mixed solution (5) refluxed, and the following formula (CB-1):
[In formula (CB-1), ring A is a 5-methyl-6- (2-methylpyrimidine-5-yl) -2-phenylpyridine-3-yl group; Y is a trichloromethoxy group, chlorine. Atomic, 2,2,2-trichloroethoxy group, phenoxy group, p-nitrophenoxy group, p-methylphenoxy group, imidazol-1-yl group, (2,5-dioxopyrrolidin-1-yl) oxy group, The process of obtaining the compound represented by], which is a group selected from the above, etc.
(7) The following formula (AM-X):
In the formula (AM-X), p and R 1 are the same as the definitions in the formula (I)], the compound represented by the formula (CB-1), and the base. To obtain a mixed solution (7) by adding the mixture to a solvent, and (8) reacting the mixed solution (7) at any temperature between 0 ° C. and the temperature at which the mixed solution (7) refluxes. To obtain the compound represented by the formula (I).
A manufacturing method comprising.
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