JPWO2018173136A1 - Hydrogen gas supply apparatus and method - Google Patents

Hydrogen gas supply apparatus and method Download PDF

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JPWO2018173136A1
JPWO2018173136A1 JP2019506596A JP2019506596A JPWO2018173136A1 JP WO2018173136 A1 JPWO2018173136 A1 JP WO2018173136A1 JP 2019506596 A JP2019506596 A JP 2019506596A JP 2019506596 A JP2019506596 A JP 2019506596A JP WO2018173136 A1 JPWO2018173136 A1 JP WO2018173136A1
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hydrogen gas
pressure
refrigerant
hydrogen
temperature
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JP6845918B2 (en
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暁子 遠藤
静一 藤川
尚久 牧平
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Iwatani Corp
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/32Hydrogen storage
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/50Fuel cells

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Abstract

いわゆる水素ステーションにおいて、極低温の液化水素を目標の所定温度の水素ガスに直接変えて供給する。液化水素貯槽の液化水素LH2を所定温度の水素ガスGH2にしてディスペンサに供給する水素ガス供給装置において、液化水素を昇圧しながら送り出す液化水素ポンプと、送り出された液化水素から所定温度の水素ガスを生成するガス化装置を備える。ガス化装置は、ある特定圧力での沸点が水素ガスを前述の所定温度に昇温する温度である液状の冷媒Rが封入されて液相部と気相部を有する冷媒槽と、冷媒槽の中を通る昇温熱交換路と、冷媒槽内における冷媒の圧力を前述の特定圧力に調整する圧力調整手段を有する。In a so-called hydrogen station, cryogenic liquefied hydrogen is directly changed to hydrogen gas having a predetermined target temperature and supplied. In a hydrogen gas supply device that supplies liquefied hydrogen LH2 in a liquefied hydrogen storage tank to hydrogen gas GH2 having a predetermined temperature and supplies the dispenser to the dispenser, a liquefied hydrogen pump that pumps the liquefied hydrogen while increasing the pressure, and a hydrogen gas having a predetermined temperature from the fed liquefied hydrogen. A gasifying device is provided. The gasifier includes a refrigerant tank having a liquid phase part and a gas phase part in which a liquid refrigerant R having a boiling point at a specific pressure and a temperature at which the temperature of hydrogen gas is raised to the above-described predetermined temperature. A temperature rising heat exchange path passing through the inside and pressure adjusting means for adjusting the pressure of the refrigerant in the refrigerant tank to the above-mentioned specific pressure are provided.

Description

この発明は、たとえば燃料電池自動車(FCV)などの水素ガスタンクに水素ガスを充填するための水素ステーションに設置される水素ガス供給装置に関する。   The present invention relates to a hydrogen gas supply device installed in a hydrogen station for filling a hydrogen gas tank such as a fuel cell vehicle (FCV) with hydrogen gas.

燃料電池自動車の水素ガスタンクには、水素ガスが高圧で充填される。   A hydrogen gas tank of a fuel cell vehicle is filled with hydrogen gas at a high pressure.

しかし、水素ガスの充填に際しては断熱圧縮による温度上昇が起こる。またそもそも水素ガスは一般的なガスと異なり、断熱膨張させるとジュールトムソン効果により温度が上昇する性質がある。   However, a temperature rise occurs due to adiabatic compression when filling with hydrogen gas. In the first place, unlike general gases, hydrogen gas has the property that the temperature rises due to the Joule-Thompson effect when adiabatic expansion occurs.

このような性質の水素ガスを充填する水素ガスタンクは、軽量化のため強化プラスチック(FRP)で形成されており、耐久性を考慮して使用温度の上限が85℃に設定されている。   A hydrogen gas tank filled with hydrogen gas having such a property is formed of reinforced plastic (FRP) for weight reduction, and the upper limit of the use temperature is set to 85 ° C. in consideration of durability.

このため、充填する水素ガスの温度管理をして、充填中に水素ガスタンク内のガス温度の過上昇を防止する必要がある。充填に先立って水素ガスを低温にしておくことはプレクールと称されている。−40℃〜−33℃が圧縮水素充填技術基準(JPEC−S0003(2012))で規定されるプレクールの温度範囲である。   For this reason, it is necessary to control the temperature of the hydrogen gas to be filled to prevent an excessive increase in the gas temperature in the hydrogen gas tank during filling. It is called precooling to keep hydrogen gas at a low temperature prior to filling. −40 ° C. to −33 ° C. is the precooling temperature range defined by the compressed hydrogen filling technical standard (JPEC-S0003 (2012)).

このようなプレクールは、高圧水素ガスを貯蔵した貯蔵槽から水素ガスを供給する場合はもちろんのこと、低圧液化水素貯槽を有する水素ステーションで水素ガスを供給する場合も必要であった。   Such a pre-cooling was necessary not only when supplying hydrogen gas from a storage tank storing high-pressure hydrogen gas, but also when supplying hydrogen gas at a hydrogen station having a low-pressure liquefied hydrogen storage tank.

たとえば下記特許文献1に開示された燃料用水素ガス充填装置は、液化水素貯留槽から導出した液化水素を昇圧ポンプで昇圧・圧送し、熱交換器で目標の所定温度よりも高い常温の水素ガスにする水素供給ラインと、低温の水素ガスが流れるバイパスラインを備え、常温の水素ガスと低温の水素ガスを流量調整弁の開閉制御で混合して、混合ガスのガス温度が目標の所定温度となるようにしている。流量調整は、計測した必要部位の温度に基づいてなされる。   For example, a hydrogen gas filling apparatus for fuel disclosed in Patent Document 1 below pressurizes and pumps liquefied hydrogen derived from a liquefied hydrogen storage tank with a booster pump, and normal temperature hydrogen gas higher than a predetermined target temperature with a heat exchanger A hydrogen supply line and a bypass line through which low-temperature hydrogen gas flows, and normal-temperature hydrogen gas and low-temperature hydrogen gas are mixed by opening / closing control of the flow control valve, so that the gas temperature of the mixed gas becomes the target predetermined temperature. It is trying to become. The flow rate is adjusted based on the measured temperature of the necessary part.

しかし温度に基づいて水素ガスの流量を変更させて温度調整する構成であるため、ばらつきが出やすく、温度を安定させにくい。   However, since the temperature is adjusted by changing the flow rate of the hydrogen gas based on the temperature, variations tend to occur and it is difficult to stabilize the temperature.

特開2012−167767号公報JP 2012-167767 A

そこでこの発明は、低温の液化水素を目標の所定温度(冷却温度)の水素ガスに直接変えて供給できるようにすることを主な目的とする。   In view of this, the main object of the present invention is to make it possible to supply low-temperature liquefied hydrogen by directly changing it to hydrogen gas having a predetermined target temperature (cooling temperature).

そのための手段は、液化水素貯槽の液化水素を所定温度の水素ガスにしてディスペンサに供給する水素ガス供給装置であって、前記液化水素貯槽内の液化水素を昇圧しながら送り出す液化水素ポンプと、前記液化水素ポンプで送り出された液化水素から前記所定温度の水素ガスを生成するガス化装置を備え、前記ガス化装置が、ある特定圧力での沸点が水素ガスを前記所定温度に昇温する温度である液状の冷媒が封入されて液相部と気相部を有する冷媒槽と、前記冷媒槽の中を通る昇温熱交換路と、前記冷媒槽内における前記冷媒の圧力を前記特定圧力に調整する圧力調整手段を有する水素ガス供給装置である。   Means therefor is a hydrogen gas supply device that supplies liquefied hydrogen in a liquefied hydrogen storage tank to hydrogen gas at a predetermined temperature and supplies the dispenser to the dispenser, wherein the liquefied hydrogen pump sends out the liquefied hydrogen in the liquefied hydrogen storage tank while increasing the pressure, and A gasifier that generates hydrogen gas at a predetermined temperature from liquefied hydrogen sent out by a liquefied hydrogen pump, wherein the gasifier has a boiling point at a specific pressure at a temperature at which the hydrogen gas is raised to the predetermined temperature; A refrigerant tank in which a liquid refrigerant is sealed and having a liquid phase part and a gas phase part, a temperature rising heat exchange path passing through the refrigerant tank, and a pressure of the refrigerant in the refrigerant tank are adjusted to the specific pressure. This is a hydrogen gas supply device having pressure adjusting means.

この構成では、液化水素ポンプが液化水素貯槽の液化水素を液体のまま昇圧して送り出し、液化水素を導入したガス化装置が液化水素を水素ガスにする。ガス化装置の冷媒槽内の冷媒は、圧力調整手段によって、水素ガスを所定温度に昇温する温度を沸点とする特定圧力に調整される。圧力調整手段による圧力調整は、冷媒の気化量を調整して行うとよい。冷媒の気化量の調整は、圧力調整弁を用いて自動的に行うほか、圧力計や温度計での計測値に基づいて、圧力や温度が特定圧力に対応する値よりも低い場合に弁の開度を上げて気化量を増やし、逆に高い場合に開度を下げて気化量を下げるというように、弁を開閉して行うことができる。この圧力調整により、冷媒が気化する際の潜熱変化で冷媒の温度が一定になり、昇温熱交換路を通る液化水素は所定温度の水素ガスになって、ディスペンサに供給される。   In this configuration, the liquefied hydrogen pump pressurizes and sends out the liquefied hydrogen in the liquefied hydrogen storage tank as a liquid, and the gasifier into which the liquefied hydrogen is introduced turns the liquefied hydrogen into hydrogen gas. The refrigerant in the refrigerant tank of the gasifier is adjusted by the pressure adjusting means to a specific pressure whose boiling point is the temperature at which the hydrogen gas is heated to a predetermined temperature. The pressure adjustment by the pressure adjusting means may be performed by adjusting the vaporization amount of the refrigerant. Adjustment of the vaporization amount of the refrigerant is performed automatically using the pressure adjustment valve, and when the pressure or temperature is lower than the value corresponding to the specific pressure based on the measured value of the pressure gauge or thermometer, The valve can be opened and closed so that the amount of vaporization is increased by increasing the opening, and the amount of vaporization is decreased by decreasing the opening when the opening is high. Due to this pressure adjustment, the temperature of the refrigerant becomes constant due to the latent heat change when the refrigerant is vaporized, and the liquefied hydrogen passing through the temperature rising heat exchange path becomes hydrogen gas of a predetermined temperature and is supplied to the dispenser.

この発明によれば、低温の液化水素を目標の所定温度の水素ガスに直接変えてして供給できるので、非常に効率が良い。   According to the present invention, since low-temperature liquefied hydrogen can be directly changed to hydrogen gas having a predetermined target temperature and supplied, it is very efficient.

水素ガス供給設備の説明図。Explanatory drawing of hydrogen gas supply equipment. 他の例に係る水素ガス供給設備の説明図。Explanatory drawing of the hydrogen gas supply equipment which concerns on another example. 他の例に係る水素ガス供給設備の説明図。Explanatory drawing of the hydrogen gas supply equipment which concerns on another example. 他の例に係る水素ガス供給設備の説明図。Explanatory drawing of the hydrogen gas supply equipment which concerns on another example. 他の例に係る冷媒槽の説明図。Explanatory drawing of the refrigerant tank which concerns on another example.

この発明を実施するための一形態を、以下図面を用いて説明する。
図1は、水素ガス供給装置を用いた水素ガス充填設備11、具体的には主に燃料電池自動車Xへの水素ガス(GH)供給を行う、いわゆる水素ステーションの説明図である。
An embodiment for carrying out the present invention will be described below with reference to the drawings.
FIG. 1 is an explanatory diagram of a so-called hydrogen station that supplies hydrogen gas (GH 2 ) to a hydrogen gas filling facility 11 using a hydrogen gas supply device, specifically, mainly to a fuel cell vehicle X.

この水素ガス充填設備11は、液化水素(LH)を貯留する液化水素貯槽12の液化水素を所定温度の水素ガスにしてディスペンサ13に供給するものである。より端的にいえば、水素ガスを冷却することなく昇温するだけで所定温度の水素ガスにして供給する装置である。The hydrogen gas filling equipment 11 supplies liquefied hydrogen in a liquefied hydrogen storage tank 12 for storing liquefied hydrogen (LH 2 ) to a dispenser 13 as hydrogen gas at a predetermined temperature. More simply, it is an apparatus that supplies hydrogen gas at a predetermined temperature simply by raising the temperature without cooling.

このための構成として水素ガス充填設備11は、液化水素貯槽12内の液化水素を昇圧しながら送り出す液化水素ポンプ14と、液化水素ポンプ14で送り出された液化水素から所定温度の水素ガスを生成するガス化装置15を備える。ガス化装置15を通ってディスペンサ13に接続される経路が昇温流路Aである。   As a configuration for this purpose, the hydrogen gas filling equipment 11 generates a hydrogen gas having a predetermined temperature from the liquefied hydrogen pump 14 that sends out the liquefied hydrogen in the liquefied hydrogen storage tank 12 while increasing the pressure, and the liquefied hydrogen sent out by the liquefied hydrogen pump 14. A gasifier 15 is provided. A path connected to the dispenser 13 through the gasifier 15 is a temperature raising flow path A.

図1に示した例の水素ガス充填設備11は、昇温流路Aから分岐した蓄圧流路Bを併設している。これは、水素充填が時間面において短い間隔で連続的に行われることなく充填間隔があく場合に、水素ガスを溜めておけるようにするためである。   The hydrogen gas filling equipment 11 in the example shown in FIG. 1 is provided with a pressure accumulation channel B branched from the temperature rising channel A. This is because the hydrogen gas can be stored when the filling interval is long without the hydrogen filling being continuously performed at short intervals.

蓄圧流路Bは、昇温流路Aの分岐点Cから順に、液化水素を気化させて高圧の水素ガスとする高圧の送ガス蒸発器16と、高圧で常温の水素ガスを溜める蓄圧器17を備えている。   The accumulator B is, in order from the branch point C of the temperature raising channel A, a high-pressure gas evaporator 16 that vaporizes liquefied hydrogen to form high-pressure hydrogen gas, and an accumulator 17 that accumulates hydrogen gas at normal temperature at high pressure. It has.

蓄圧器17より先は、プレクール流路Dであり、ディスペンサ13に接続されている。プレクール流路Dは蓄圧器17から送り出される常温の水素ガスを前述の所定温度に冷却する経路である。   The precooling flow path D is ahead of the pressure accumulator 17 and is connected to the dispenser 13. The precool channel D is a path for cooling the normal temperature hydrogen gas sent out from the pressure accumulator 17 to the predetermined temperature.

液化水素を昇温流路Aか蓄圧流路Bのいずれに流すかの切り替えを行うため、分岐点Cとガス化装置15との間と、分岐点Cと送ガス蒸発器16との間に、それぞれ切り替え用開閉弁18,19が設けられている。   In order to switch whether the liquefied hydrogen flows through the temperature rising channel A or the pressure accumulating channel B, between the branch point C and the gasifier 15 and between the branch point C and the gas feed evaporator 16. , Switching on / off valves 18 and 19 are provided, respectively.

ガス化装置15について説明すると、ガス化装置15は、ある特定圧力での沸点が水素ガスを所定温度に昇温する温度である液状の冷媒Rが封入されて液相部Raと気相部Rbを有する冷媒槽21と、冷媒槽21の中を通る昇温熱交換路22と、冷媒槽21内における冷媒Rの圧力を特定圧力に調整する圧力調整手段23を有している。言い換えれば、冷媒Rの特定圧力での沸点は、水素ガスを昇温する目的の温度である所定温度にふさわしい温度、つまり所定温度と同一か、それに近い温度である。   The gasifier 15 will be described. The gasifier 15 includes a liquid phase portion Ra and a gas phase portion Rb in which a liquid refrigerant R having a boiling point at a specific pressure is a temperature at which hydrogen gas is heated to a predetermined temperature. A refrigerant tank 21, a temperature rising heat exchange path 22 passing through the refrigerant tank 21, and a pressure adjusting means 23 for adjusting the pressure of the refrigerant R in the refrigerant tank 21 to a specific pressure. In other words, the boiling point of the refrigerant R at a specific pressure is a temperature suitable for a predetermined temperature that is a target temperature for raising the hydrogen gas, that is, a temperature that is the same as or close to the predetermined temperature.

水素ガスを供給する所定温度、つまり目標温度は、−40℃〜−33℃程度であるので、冷媒槽21に封入される冷媒Rには、たとえば二酸化炭素(CO)を使用する。二酸化炭素は、0.9MPaでの沸点が−40℃である。Since the predetermined temperature for supplying hydrogen gas, that is, the target temperature is about −40 ° C. to −33 ° C., for example, carbon dioxide (CO 2 ) is used as the refrigerant R sealed in the refrigerant tank 21. Carbon dioxide has a boiling point of −40 ° C. at 0.9 MPa.

冷媒槽21内には、冷媒Rが前述の特定圧力で封入されることによって、冷媒槽21の下部には冷媒Rの液相部Raが、上部には冷媒Rの気相部Rbができる。この冷媒槽21は、互いに連通された昇温槽21aと冷却槽21bの二室を有し、一方の昇温槽21aに昇温流路Aの一部である前述の昇温熱交換路22を有し、この昇温熱交換路22の一部が昇温熱交換部22aである。他方の冷却槽21bには、前述のプレクール流路Dの一部である冷却路24を有し、この冷却路24の一部が冷却用熱交換部24aである。プレクール流路Dにおける蓄圧器17と冷媒槽21の間には、ガス供給用開閉弁25が備えられている。   In the refrigerant tank 21, the refrigerant R is sealed at the above-described specific pressure, so that a liquid phase portion Ra of the refrigerant R is formed in the lower part of the refrigerant tank 21 and a gas phase part Rb of the refrigerant R is formed in the upper part. This refrigerant tank 21 has two chambers of a temperature rising tank 21a and a cooling tank 21b that are communicated with each other, and the temperature rising heat exchange path 22 that is a part of the temperature rising path A is provided in one temperature rising tank 21a. And a part of the temperature rising heat exchange path 22 is a temperature rising heat exchanging part 22a. The other cooling tank 21b has a cooling path 24 that is a part of the precooling flow path D described above, and a part of the cooling path 24 is a cooling heat exchanging portion 24a. Between the pressure accumulator 17 and the refrigerant tank 21 in the precool channel D, a gas supply opening / closing valve 25 is provided.

前述の圧力調整手段23は、気化器23aと圧力調整器23bを備えている。具体的には、冷媒槽21の上部と下部を冷媒槽21の外で接続する調圧通路23cを備え、この調圧通路23c上に、気化器23aと圧力調整器23bが備えられている。気化器23aは、通過する冷媒Rを熱交換により気化して冷媒槽21内に送り込み、冷媒槽21内の冷媒Rの圧力を高める。圧力調整器23bは、例えばダイヤフラム弁などの公知の圧力調整弁で構成され、冷媒槽21内の圧力に応じて開度調整を行い、特定圧力に満たないときに冷媒Rを通過させる。冷媒槽21内の圧力が高まれば冷媒Rの沸点が高まることに伴い温度は上昇し、圧力が下がれば冷媒Rの沸点は下がり温度も低下する。   The pressure adjusting means 23 includes a vaporizer 23a and a pressure regulator 23b. Specifically, a pressure regulation passage 23c that connects the upper and lower parts of the refrigerant tank 21 outside the refrigerant tank 21 is provided, and a vaporizer 23a and a pressure regulator 23b are provided on the pressure regulation path 23c. The vaporizer 23 a vaporizes the refrigerant R passing through it by heat exchange and sends it into the refrigerant tank 21 to increase the pressure of the refrigerant R in the refrigerant tank 21. The pressure regulator 23b is composed of a known pressure regulating valve such as a diaphragm valve, for example, and adjusts the opening according to the pressure in the refrigerant tank 21, and allows the refrigerant R to pass when the specific pressure is not reached. If the pressure in the refrigerant tank 21 increases, the temperature increases as the boiling point of the refrigerant R increases, and if the pressure decreases, the boiling point of the refrigerant R decreases and the temperature also decreases.

冷媒槽21の上部には安全弁26が設けられている。この安全弁26は内部の圧力が過剰に上昇した場合に冷媒Rを放出する機能を有する。   A safety valve 26 is provided above the refrigerant tank 21. The safety valve 26 has a function of releasing the refrigerant R when the internal pressure rises excessively.

前述の液化水素ポンプ14、切り替え用開閉弁18,19、圧力調整手段23、ガス供給用開閉弁25などの駆動制御に必要な部材は、図示しない制御部で駆動制御される。制御部による制御で、液化水素を昇圧してガス化装置15に送り出し、ガス化装置15において冷媒Rの圧力を特定圧力に調整した冷媒槽21の中に液化水素を通して温度上昇させて所定温度の水素ガスを生成し、生成した水素ガスをディスペンサ13に供給する昇温供給と、液化水素を昇圧して送ガス蒸発器16に送り出して、蓄圧器17に水素ガスを溜めて、蓄圧器17内の常温で高圧の水素ガスをガス化装置15の冷媒槽21の中に通して所定温度の水素ガスにプレクールしてディスペンサ13に供給するプレクール供給が選択的に行われる。   Members required for drive control such as the liquefied hydrogen pump 14, the switching on-off valves 18 and 19, the pressure adjusting means 23, and the gas supply on-off valve 25 are driven and controlled by a control unit (not shown). Under the control of the control unit, the pressure of liquefied hydrogen is increased and sent to the gasifier 15, and the temperature of the refrigerant R is adjusted to a specific pressure in the gasifier 15 to increase the temperature through the liquefied hydrogen and reach a predetermined temperature. A temperature rising supply for generating hydrogen gas and supplying the generated hydrogen gas to the dispenser 13, and increasing the pressure of liquefied hydrogen and sending it to the gas evaporator 16, storing the hydrogen gas in the pressure accumulator 17, The precool supply is selectively performed in which the high-pressure hydrogen gas at normal temperature is passed through the refrigerant tank 21 of the gasifier 15 and precooled to a predetermined temperature to be supplied to the dispenser 13.

以上のような構成の水素ガス充填設備11では、次のようにして水素ガスの充填が行われる。   In the hydrogen gas filling facility 11 having the above-described configuration, hydrogen gas is filled as follows.

まず、ガス化装置15の冷媒槽21内の冷媒Rについて、圧力調整手段23が冷媒Rの圧力を自動的に一定に制御する。冷媒Rである二酸化炭素は、圧力が0.9MPaであるときに沸点が−40℃であるので、圧力調整手段23は冷媒槽21内の冷媒Rの圧力を0.9MPaに調整する。圧力調整は、気化器23aを通って冷媒槽21内に送り込まれる冷媒Rの量を、冷媒槽21内の圧力に基づいて圧力調整器23bが開度調整により制御して行う。圧力調整器23bの開度を上げれば冷媒槽21内の圧力が増加して冷媒Rの温度が上昇し、逆に圧力調整器23bを閉にすれば冷媒槽21内の圧力が低下して冷媒Rの温度が下がる。   First, for the refrigerant R in the refrigerant tank 21 of the gasifier 15, the pressure adjusting means 23 automatically controls the pressure of the refrigerant R to be constant. Since carbon dioxide as the refrigerant R has a boiling point of −40 ° C. when the pressure is 0.9 MPa, the pressure adjusting means 23 adjusts the pressure of the refrigerant R in the refrigerant tank 21 to 0.9 MPa. The pressure adjustment is performed by controlling the amount of the refrigerant R sent into the refrigerant tank 21 through the vaporizer 23 a by the pressure regulator 23 b by adjusting the opening degree based on the pressure in the refrigerant tank 21. If the opening degree of the pressure regulator 23b is increased, the pressure in the refrigerant tank 21 increases and the temperature of the refrigerant R rises. Conversely, if the pressure regulator 23b is closed, the pressure in the refrigerant tank 21 decreases and the refrigerant is reduced. The temperature of R decreases.

具体的には、冷媒Rの圧力が調整値である0.9MPaよりも高い場合には、圧力調整器23bを閉にし、気化器23aを通って冷媒槽21内に入る冷媒Rの量を減らして圧力を下げる。逆に、冷媒Rの圧力が調整値よりも低い場合には、圧力調整器23bが調整値との圧力差に基づいて開度を上げて、気化器23aを通って冷媒槽21内に入る冷媒Rの量を増やして圧力を上げる。このような調圧によって、冷媒Rの温度は、潜熱変化する沸点温度に保たれる。つまり温度変化を伴わない潜熱を利用して冷媒Rの温度は、二酸化炭素の沸点である−40℃に、一定に保たれる。   Specifically, when the pressure of the refrigerant R is higher than the adjustment value of 0.9 MPa, the pressure regulator 23b is closed and the amount of the refrigerant R entering the refrigerant tank 21 through the vaporizer 23a is reduced. To reduce the pressure. Conversely, when the pressure of the refrigerant R is lower than the adjustment value, the pressure regulator 23b increases the opening based on the pressure difference from the adjustment value, and enters the refrigerant tank 21 through the vaporizer 23a. Increase the amount of R to increase the pressure. By such pressure regulation, the temperature of the refrigerant R is kept at the boiling point temperature where the latent heat changes. In other words, the temperature of the refrigerant R is kept constant at −40 ° C., which is the boiling point of carbon dioxide, using latent heat without temperature change.

したがって、液化水素ポンプ14の駆動によって冷媒槽21の昇温槽21a内の昇温熱交換路22を通る液化水素または水素ガスは、−40℃程度まで温度が上昇し、昇温流路Aを通ってディスペンサ13に供給され、燃料電池自動車Xの水素ガスタンクXaに充填される。冷媒Rの温度が−40℃であるので、水素ガスの流量などの条件にもよるが、充填中の水素ガスタンクXa内の水素ガス温度を−40℃〜−33℃程度の所定の範囲の温度にできる。   Accordingly, the liquefied hydrogen or hydrogen gas passing through the temperature rising heat exchange path 22 in the temperature rising tank 21a of the refrigerant tank 21 by driving the liquefied hydrogen pump 14 rises to about −40 ° C. and passes through the temperature rising path A. Are supplied to the dispenser 13 and filled in the hydrogen gas tank Xa of the fuel cell vehicle X. Since the temperature of the refrigerant R is −40 ° C., depending on conditions such as the flow rate of hydrogen gas, the temperature of the hydrogen gas in the hydrogen gas tank Xa during filling is within a predetermined range of −40 ° C. to −33 ° C. Can be.

冷媒Rは昇温熱交換路22を通る液化水素の冷熱を奪い、温度変化を生じるが、圧力調整手段23が冷媒槽21内の圧力を一定に保つので、液化水素のガス化と昇温は一定の状態になされる。   The refrigerant R takes away the cold heat of the liquefied hydrogen passing through the temperature rising heat exchange path 22 and causes a temperature change. However, since the pressure adjusting means 23 keeps the pressure in the refrigerant tank 21 constant, the gasification and temperature rising of the liquefied hydrogen are constant. Is made.

一方、蓄圧流路Bを通って蓄圧器17に貯められた水素ガスをディスペンサ13から供給するために、プレクール流路Dのガス供給用開閉弁25を開けると、高圧で常温の水素ガスは蓄圧器17から出て、プレクール流路Dを通り、冷媒槽21の冷却槽21bにおける冷却路24を流れる。冷却路24は前述の昇温槽21aでの場合同様に、冷媒Rの温度が一定の−40℃に保たれているので、冷却路24を通り、冷却用熱交換部24aを通る水素ガスは−40度まで冷却され、ディスペンサ13に供給されて、燃料電池自動車Xの水素ガスタンクXaに充填される。この場合も前述と同様に、冷媒Rの温度が−40℃であるので、充填中の水素ガスタンクXa内の水素ガス温度を−40℃〜−33℃程度の所定の範囲の温度にできる。   On the other hand, when the gas supply on / off valve 25 of the precool channel D is opened to supply the hydrogen gas stored in the pressure accumulator 17 through the pressure accumulation channel B from the dispenser 13, the hydrogen gas at high pressure and room temperature is accumulated. It exits from the vessel 17, passes through the precooling flow path D, and flows through the cooling path 24 in the cooling tank 21 b of the refrigerant tank 21. As in the case of the heating tank 21a, the cooling path 24 is maintained at a constant temperature of −40 ° C., so that the hydrogen gas passing through the cooling path 24 and passing through the cooling heat exchange section 24a is It is cooled to −40 degrees, supplied to the dispenser 13, and filled in the hydrogen gas tank Xa of the fuel cell vehicle X. Also in this case, since the temperature of the refrigerant R is −40 ° C. as described above, the hydrogen gas temperature in the hydrogen gas tank Xa being filled can be set to a temperature in a predetermined range of about −40 ° C. to −33 ° C.

以上のように、冷却温度は、温度計での検知結果に基づいて制御する場合は異なり、冷媒Rが気化する際の潜熱を利用するので一定に保て、所定の温度範囲への温度上昇や冷却が安定して行える。しかも、潜熱利用を冷媒Rの圧力制御によって行うので、電気も必要なく自動ででき、構成が至って簡素である。その上、冷媒Rを循環させるポンプは必要なく、消費電力を削減でき、省エネを実現することもできる。また水素ガス充填設備11の簡素化や小型化が可能である。   As described above, when the cooling temperature is controlled based on the detection result of the thermometer, the latent heat generated when the refrigerant R evaporates is used, so that the cooling temperature is kept constant and the temperature rises to a predetermined temperature range. Cooling can be performed stably. Moreover, since the latent heat is used by controlling the pressure of the refrigerant R, electricity can be automatically generated without necessity, and the configuration is simple and simple. In addition, there is no need for a pump for circulating the refrigerant R, power consumption can be reduced, and energy saving can be realized. In addition, the hydrogen gas filling facility 11 can be simplified and downsized.

特に昇温流路Aでは極低温の液化水素を直接、目的の温度に温度上昇して供給するので、水素ガスを冷却する必要はなく、非常に効率が良い。   In particular, in the temperature raising channel A, the cryogenic liquefied hydrogen is directly heated to the target temperature and supplied, so that it is not necessary to cool the hydrogen gas, which is very efficient.

また、蓄圧器17を併設して、昇温して供給する経路(昇温流路A)と、プレクールして供給する経路(蓄圧流路B及びプレクール流路D)の2系統での水素ガス供給を可能にしているので、時間面で充填間隔があく場合でも有効に水素ガスの充填ができる。   Further, hydrogen gas is provided in two systems, ie, a path that supplies the accumulator 17 with a temperature rise (temperature increase flow path A) and a path that supplies the precool (pressure accumulation path B and precool flow path D). Since the supply is enabled, hydrogen gas can be effectively filled even when there is a filling interval in terms of time.

しかも、水素ガスをプレクールして供給する場合には従来、プレクーラーが必要であったが、ガス化装置15の冷媒槽21の中に冷却用熱交換部24aを備えて、ガス化装置15をプレクールに利用するので、冷熱の有効利用(冷熱の回収)ができて、プレクーラーを不要にできる。この点でも水素ガス充填設備11の簡素化や小型化ができ、メンテナンスも容易である。   In addition, when hydrogen gas is precooled and supplied, a precooler has been conventionally required. However, the refrigerant tank 21 of the gasifier 15 is provided with a heat exchanger 24a for cooling, and the gasifier 15 is provided. Since it is used for pre-cooling, it is possible to effectively use cold energy (cold heat recovery) and eliminate the need for a pre-cooler. Also in this respect, the hydrogen gas filling equipment 11 can be simplified and downsized, and maintenance is easy.

そのうえ、冷媒Rの温度は冷媒Rの圧力を調整することで一定に保ち、温度変化を伴わない沸点における冷媒Rの潜熱を利用するので、冷媒Rの温度を精度よく制御できる。この結果、水素ガスの適切な温度管理ができる。
前述した冷熱の回収に関して付言すると、回収できる冷熱量は、おおよそ次のように、中型の冷凍機を賄える程度となる。
回収できる冷熱量の概算は、次の式で得られる。
In addition, the temperature of the refrigerant R is kept constant by adjusting the pressure of the refrigerant R, and the latent heat of the refrigerant R at the boiling point without temperature change is used. Therefore, the temperature of the refrigerant R can be accurately controlled. As a result, appropriate temperature control of hydrogen gas can be performed.
If it adds about the collection | recovery of the cold heat mentioned above, the amount of cold heat | fever which can be collect | recovered will be a grade which can cover a medium-sized refrigerator as follows.
The approximate amount of cold energy that can be recovered is obtained by the following equation.

Figure 2018173136
Figure 2018173136

−150℃の液化水素を−40℃の水素ガスに温度調整する場合であって、液化水素ポンプ14の能力を80kg/hrとしたとき、上の式より、34.7kW程度の冷熱を回収できることになる。2割程度の損失が発生し得るが、前述の冷熱は、その損失を考慮しても、前述のように中型の冷凍機を賄える値である。   When the temperature of liquefied hydrogen at −150 ° C. is adjusted to hydrogen gas at −40 ° C. and the capacity of the liquefied hydrogen pump 14 is 80 kg / hr, the cold energy of about 34.7 kW can be recovered from the above formula. become. Although a loss of about 20% can occur, the above-described cold heat is a value that can cover a medium-sized refrigerator as described above even when the loss is taken into consideration.

以下、他の例を説明する。この説明において、前述の構成と同一の部位については同一の符号を付してその詳しい説明を省略する。   Other examples will be described below. In this description, the same parts as those described above are denoted by the same reference numerals, and detailed description thereof is omitted.

図2に示した水素ガス充填設備11は、昇温流路Aのみを有する構成であり、図1の例と比較すると、蓄圧流路Bとプレクール流路Dを有しない点で相違する。このため、冷媒槽21は、昇温槽21aのみを有する。   The hydrogen gas filling equipment 11 shown in FIG. 2 is configured to have only the temperature raising channel A, and is different from the example of FIG. 1 in that it does not have the pressure accumulation channel B and the precool channel D. For this reason, the refrigerant tank 21 has only the temperature raising tank 21a.

この構成の水素ガス充填設備11では、水素ガスを充填する燃料電池自動車Xが多数存在し、充填間隔が短い場合に好適に使用できる。   The hydrogen gas filling facility 11 having this configuration can be suitably used when there are a large number of fuel cell automobiles X filled with hydrogen gas and the filling interval is short.

図3に示した水素ガス充填設備11は、既存の水素ガス充填設備31、つまり液化水素貯槽12の液化水素を気化させて低圧の水素ガスとする低圧の送ガス蒸発器32と、低圧の水素ガスを昇圧するコンプレッサ33と、昇圧された水素ガスを溜める蓄圧器17と、蓄圧器17から送り出される水素ガスをプレクールするプレクーラー(図示せず)と、ディスペンサ13を備えた水素ガスを供給する設備に有効利用した構成である。すなわち、液化水素貯槽12と送ガス蒸発器32との間に分岐を設けて昇温流路Aを形成するとともに、プレクーラーは廃して、プレクール流路Dを形成している。   The hydrogen gas filling equipment 11 shown in FIG. 3 includes an existing hydrogen gas filling equipment 31, that is, a low-pressure gas evaporator 32 that vaporizes liquefied hydrogen in the liquefied hydrogen storage tank 12 to form low-pressure hydrogen gas, and a low-pressure hydrogen A compressor 33 that boosts the gas, a pressure accumulator 17 that stores the boosted hydrogen gas, a precooler (not shown) that precools the hydrogen gas delivered from the pressure accumulator 17, and a hydrogen gas that includes a dispenser 13 are supplied. It is a configuration that is effectively used for equipment. That is, a branch is provided between the liquefied hydrogen storage tank 12 and the gas feed evaporator 32 to form the temperature rising channel A, and the precooler is eliminated to form the precool channel D.

この構成の水素ガス充填設備11では、図1の水素ガス充填設備11と同様の作用を有する。   The hydrogen gas filling equipment 11 having this configuration has the same operation as the hydrogen gas filling equipment 11 of FIG.

図4に示した水素ガス充填設備11は、冷熱の有効利用を図った構成である。つまり、ガス化装置15の圧力調整手段が、ブラインを封入したブライン貯留部35と、ブライン貯留部35から出てブライン貯留部35に戻るブライン冷却路36と、ブライン冷却路36に形成されてガス化装置15の冷媒槽21の中に位置する一次熱交換部36aと、ブライン冷却路36に設けられて冷媒槽21内における冷媒Rの圧力を特定圧力に調整する圧力調整器37を備え、ブライン貯留部35に冷熱利用のための二次熱交換部38が備えられている。   The hydrogen gas filling equipment 11 shown in FIG. 4 is configured to effectively use cold heat. That is, the pressure adjusting means of the gasifier 15 is formed in the brine reservoir 35 filled with brine, the brine cooling path 36 that exits from the brine reservoir 35 and returns to the brine reservoir 35, and the brine cooling path 36. A primary heat exchanging part 36a located in the refrigerant tank 21 of the gasification apparatus 15, and a pressure regulator 37 provided in the brine cooling path 36 for adjusting the pressure of the refrigerant R in the refrigerant tank 21 to a specific pressure, The storage unit 35 is provided with a secondary heat exchange unit 38 for use of cold energy.

ブライン貯留部35は冷媒槽21の冷却槽21bに併設され、適宜のブラインが貯留されている。ブライン冷却路36の一次熱交換部36aは、冷媒槽21の冷却槽21b内において冷却槽21b内の冷媒Rとブラインとの間で熱交換を行う。圧力調整器37は、冷媒槽21に備えた圧力計37aに基づいて、一次熱交換部36aを通るブラインの量を調整する。二次熱交換部38には、冷熱を必要とする適宜の流体を通す。この流体は、例えば配管冷却や適宜の冷凍機などに使用される流体である。   The brine storage unit 35 is provided in the cooling tank 21b of the refrigerant tank 21 and stores appropriate brine. The primary heat exchange unit 36 a of the brine cooling path 36 performs heat exchange between the refrigerant R in the cooling tank 21 b and the brine in the cooling tank 21 b of the refrigerant tank 21. The pressure regulator 37 adjusts the amount of brine passing through the primary heat exchange unit 36 a based on the pressure gauge 37 a provided in the refrigerant tank 21. An appropriate fluid that requires cooling is passed through the secondary heat exchange unit 38. This fluid is, for example, a fluid used for pipe cooling or an appropriate refrigerator.

この構成の水素ガス充填設備11では、水素ガス充填設備11に関するもののほか、水素ガス充填設備11に関わりないものにも、冷熱を有効利用できる。   In the hydrogen gas filling facility 11 having this configuration, cold heat can be effectively used not only for the hydrogen gas filling facility 11 but also for those not related to the hydrogen gas filling facility 11.

図5は、水素ガス充填設備11のガス化装置15に用いられる冷媒槽21の他の例を示している。これは、図2に示した一槽のみからなる冷媒槽21(昇温槽21a)を冷媒槽21の基本構造として、これを複数段にした構成である。つまり、冷媒槽21(昇温槽21a)が一層のみであると、冷媒温度を目標とする温度にするだけであるが、複数段にして、上流側の層に冷熱を蓄積させておくと、冷熱を長時間保持できる。   FIG. 5 shows another example of the refrigerant tank 21 used in the gasifier 15 of the hydrogen gas filling facility 11. This is a configuration in which the refrigerant tank 21 (temperature raising tank 21a) including only one tank shown in FIG. In other words, if there is only one refrigerant tank 21 (temperature raising tank 21a), the refrigerant temperature is only set to the target temperature, but if multiple stages are used to accumulate cold heat in the upstream layer, Can keep cold heat for a long time.

図5では冷媒槽21を上槽27と下槽28の上下2段で構成した例を示している。上槽27には、前述と同様に調圧通路29を備え、調圧通路29に熱交換器29aと圧力調整器29bを備える。熱交換器29aは下槽28の内部に位置させる。圧力調整器29bは下槽28の内部に備えた圧力計29cの計測結果に基づいて開度を調整する。   FIG. 5 shows an example in which the refrigerant tank 21 is composed of upper and lower two stages of an upper tank 27 and a lower tank 28. The upper tank 27 includes a pressure adjusting passage 29 as described above, and the pressure adjusting passage 29 includes a heat exchanger 29a and a pressure regulator 29b. The heat exchanger 29a is positioned inside the lower tank 28. The pressure adjuster 29b adjusts the opening degree based on the measurement result of the pressure gauge 29c provided in the lower tank 28.

下槽28にも、調圧通路23cを備え、この調圧通路23cに気化器23aと圧力調整器23bを備える。この圧力調整器23bは、下槽28の冷媒Rの圧力に基づいて開度を調整する。   The lower tank 28 is also provided with a pressure adjusting passage 23c, and the pressure adjusting passage 23c is provided with a vaporizer 23a and a pressure regulator 23b. The pressure adjuster 23 b adjusts the opening degree based on the pressure of the refrigerant R in the lower tank 28.

このような構成の冷媒槽21では、例えば下槽28の冷媒Rの温度が所望する−34℃よりも上がった場合には、上槽27の冷媒Rから冷熱を取るべく、上槽27の圧力調整器29bが下槽28内の圧力計29cの計測結果に基づいて開度を上げる。逆に下槽28の冷媒Rの温度が下がった場合には、下槽28の圧力調整器23bが開度を上げて、下槽28内の圧力を高める。   In the refrigerant tank 21 having such a configuration, for example, when the temperature of the refrigerant R in the lower tank 28 is higher than a desired −34 ° C., the pressure in the upper tank 27 is used to take cold heat from the refrigerant R in the upper tank 27. The adjuster 29b increases the opening based on the measurement result of the pressure gauge 29c in the lower tank 28. On the contrary, when the temperature of the refrigerant R in the lower tank 28 is lowered, the pressure regulator 23b of the lower tank 28 increases the opening degree to increase the pressure in the lower tank 28.

この構成の冷媒槽21を有した水素ガス充填設備11では、冷熱を長い間ためておくことができ、例えば予備の冷凍機を使う必要がないなどの利点を有する。冷媒槽21は前述のように2段にするほか、3段以上にすることもできる。   The hydrogen gas filling equipment 11 having the refrigerant tank 21 having this configuration has an advantage that cold heat can be stored for a long time, for example, it is not necessary to use a spare refrigerator. As described above, the refrigerant tank 21 may have two or more stages.

以上の構成はこの発明を実施するための一形態であって、この発明は前述の構成のみに限定されるものではなく、その他の構成を採用することができる。   The above configuration is one form for carrying out the present invention, and the present invention is not limited to the above configuration, and other configurations can be adopted.

たとえば、冷媒Rとしては、二酸化炭素のほかに、たとえば0.01MPaでの沸点が−42.09℃であるプロパンや、0.04MPaでの沸点が−47.6℃であるプロピレンなども使用できる。   For example, as the refrigerant R, in addition to carbon dioxide, for example, propane having a boiling point of 0.01 MPa at −42.09 ° C., propylene having a boiling point of −47.6 ° C. at 0.04 MPa, and the like can be used. .

11…水素ガス充填設備
12…液化水素貯槽
13…ディスペンサ
14…液化水素ポンプ
15…ガス化装置
17…蓄圧器
21…冷媒槽
22…昇温熱交換路
23…圧力調整手段
23a…気化器
23b…圧力調整器
24a…冷却用熱交換部
35…ブライン貯槽
36…ブライン冷却路
36a…一次熱交換部
37…圧力調整器
38…二次熱交換部
A…昇温流路
B…蓄圧流路
D…プレクール流路
R…冷媒
Ra…液相部
Rb…気相部
DESCRIPTION OF SYMBOLS 11 ... Hydrogen gas filling equipment 12 ... Liquefied hydrogen storage tank 13 ... Dispenser 14 ... Liquefied hydrogen pump 15 ... Gasifier 17 ... Accumulator 21 ... Refrigerant tank 22 ... Temperature rising heat exchange path 23 ... Pressure adjustment means 23a ... Vaporizer 23b ... Pressure Adjuster 24a ... Heat exchange section for cooling 35 ... Brine storage tank 36 ... Brine cooling path 36a ... Primary heat exchange section 37 ... Pressure regulator 38 ... Secondary heat exchange section A ... Temperature rising flow path B ... Accumulation flow path D ... Precool Flow path R ... Refrigerant Ra ... Liquid phase part Rb ... Gas phase part

Claims (8)

液化水素貯槽の液化水素を所定温度の水素ガスにしてディスペンサに供給する水素ガス供給装置であって、
前記液化水素貯槽内の液化水素を昇圧しながら送り出す液化水素ポンプと、前記液化水素ポンプで送り出された液化水素から前記所定温度の水素ガスを生成するガス化装置を備え、
前記ガス化装置が、ある特定圧力での沸点が水素ガスを前記所定温度に昇温する温度である液状の冷媒が封入されて液相部と気相部を有する冷媒槽と、
前記冷媒槽の中を通る昇温熱交換路と、
前記冷媒槽内における前記冷媒の圧力を前記特定圧力に調整する圧力調整手段を有する
水素ガス供給装置。
A hydrogen gas supply device that supplies liquefied hydrogen in a liquefied hydrogen storage tank to a dispenser as hydrogen gas at a predetermined temperature,
A liquefied hydrogen pump that sends out the liquefied hydrogen in the liquefied hydrogen storage tank while increasing the pressure, and a gasifier that generates hydrogen gas at the predetermined temperature from the liquefied hydrogen sent out by the liquefied hydrogen pump,
A refrigerant tank having a liquid phase part and a gas phase part sealed with a liquid refrigerant whose boiling point at a specific pressure is a temperature at which hydrogen gas is heated to the predetermined temperature;
A heated heat exchange path passing through the refrigerant tank;
A hydrogen gas supply device comprising pressure adjusting means for adjusting the pressure of the refrigerant in the refrigerant tank to the specific pressure.
前記圧力調整手段が気化器と圧力調整器を備えた
請求項1に記載の水素ガス供給装置。
The hydrogen gas supply apparatus according to claim 1, wherein the pressure adjusting means includes a vaporizer and a pressure regulator.
前記ガス化装置の前記冷媒槽の中に冷却用熱交換部を備えた
請求項1または請求項2に記載の水素ガス供給装置。
The hydrogen gas supply device according to claim 1, wherein a cooling heat exchange section is provided in the refrigerant tank of the gasifier.
水素ガスをためる蓄圧器と前記ディスペンサを接続するプレクール流路が設けられ、
前記プレクール流路に、前記ガス化装置の前記冷媒槽の中で熱交換する冷却用熱交換部が形成された
請求項1または請求項2に記載の水素ガス供給装置。
A pre-cooling channel connecting the pressure accumulator storing hydrogen gas and the dispenser is provided;
3. The hydrogen gas supply device according to claim 1, wherein a cooling heat exchanging portion for exchanging heat in the refrigerant tank of the gasifier is formed in the precool channel.
前記圧力調整手段が、ブラインを封入したブライン貯留部と、前記ブライン貯留部から出て前記ブライン貯留部に戻るブライン冷却路と、前記ブライン冷却路に形成されて前記ガス化装置の前記冷媒槽の中に位置する一次熱交換部と、前記ブライン冷却路に設けられて前記冷媒槽内における前記冷媒の圧力を前記特定圧力に調整する圧力調整器を備え、
前記ブライン貯留部に、冷熱利用のための二次熱交換部が備えられた
請求項1に記載の水素ガス供給装置。
The pressure adjusting means includes a brine reservoir filled with brine, a brine cooling path that exits from the brine reservoir and returns to the brine reservoir, and is formed in the brine cooling path of the refrigerant tank of the gasifier. A primary heat exchanging unit located inside, and a pressure regulator provided in the brine cooling path to adjust the pressure of the refrigerant in the refrigerant tank to the specific pressure,
The hydrogen gas supply device according to claim 1, wherein the brine storage unit includes a secondary heat exchange unit for use of cold energy.
液化水素を所定温度の水素ガスにしてディスペンサに供給する水素ガス供給方法であって、
液化水素を昇圧してガス化装置に送り出し、
前記ガス化装置において、ある特定圧力での沸点が水素ガスを前記所定温度に昇温する温度である液状の冷媒が封入されて液相部と気相部を有する冷媒槽内の前記冷媒の圧力を前記特定圧力に調整して、
液化水素を前記冷媒槽の中に通して前記所定温度の水素ガスを生成し、
生成した水素ガスを前記ディスペンサに供給する
水素ガス供給方法。
A hydrogen gas supply method for supplying liquefied hydrogen to a dispenser as hydrogen gas at a predetermined temperature,
Pressurize the liquefied hydrogen and send it to the gasifier,
In the gasifier, the pressure of the refrigerant in a refrigerant tank having a liquid phase part and a gas phase part sealed with a liquid refrigerant whose boiling point at a specific pressure is a temperature at which hydrogen gas is heated to the predetermined temperature Is adjusted to the specific pressure,
Passing liquefied hydrogen through the refrigerant tank to produce hydrogen gas at the predetermined temperature,
A hydrogen gas supply method for supplying the generated hydrogen gas to the dispenser.
蓄圧器から前記ディスペンサに供給される水素ガスを、前記ガス化装置の前記冷媒槽の中に通してプレクールする
請求項6に記載の水素ガス供給方法。
The hydrogen gas supply method according to claim 6, wherein the hydrogen gas supplied from the pressure accumulator to the dispenser is precooled through the refrigerant tank of the gasifier.
液化水素を所定温度の水素ガスにする液化水素のガス化装置であって、
ある特定圧力での沸点が水素ガスを前記所定温度に昇温する温度である液状の冷媒が封入されて液相部と気相部を有する冷媒槽と、
前記冷媒槽の中を通る昇温熱交換路と、
前記冷媒槽内における前記冷媒の圧力を前記特定圧力に調整する圧力調整手段を備えた
液化水素のガス化装置。
A liquefied hydrogen gasifier that converts liquefied hydrogen into hydrogen gas at a predetermined temperature,
A refrigerant tank having a liquid phase part and a gas phase part sealed with a liquid refrigerant whose boiling point at a certain pressure is a temperature at which hydrogen gas is heated to the predetermined temperature;
A heated heat exchange path passing through the refrigerant tank;
A liquefied hydrogen gasifier comprising pressure adjusting means for adjusting the pressure of the refrigerant in the refrigerant tank to the specific pressure.
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