JPWO2018084133A1 - UV processing unit - Google Patents

Abstract

An object of the present invention is to provide an ultraviolet treatment apparatus capable of partially treating the surface to be treated of the object with high reliability. An ultraviolet lamp for emitting ultraviolet light and an ultraviolet light transmitting window member are provided, and ultraviolet light from the ultraviolet light lamp is disposed opposite to the ultraviolet light transmitting window member via the ultraviolet light transmitting window member in a separated manner. An ultraviolet processing apparatus for irradiating an area to be processed of the object to be processed, the apparatus having a shape corresponding to the shape of a processing prohibited area other than the area to be processed on the object to be processed; A light shielding member facing the processing prohibited area and separated from the object to be processed, and the light shielding member is configured to purge gas in a gap between the light shielding member and the object to be processed. It is characterized in that a purge gas supply port for supplying is provided.

Description

  The present invention relates to an ultraviolet treatment apparatus, and more particularly to an ultraviolet treatment apparatus suitably used to partially treat the surface of an object with ultraviolet light.

Conventionally, an ultraviolet processing apparatus is used in various fields, and specifically, for example, is used as a light processing apparatus that performs a light cleaning process (dry cleaning process) on the surface of a nanoimprint template.
As shown in FIG. 8, a certain type of UV processing apparatus used as a light processing apparatus is provided with a housing 71 provided with a UV transparent window member 73 made of quartz glass on the upper wall 71A. An ultraviolet lamp 80 is disposed inside the housing 71 (see, for example, Patent Document 1). The ultraviolet light transmitting window member 73 is provided to close the opening formed in the upper wall 71A of the housing 71, and the peripheral edge portion is fixed by a frame-shaped fixing plate 78. Inside the housing 71, a gas flow path forming member 75 through which the cooling gas flows is provided. In this ultraviolet treatment apparatus, two rectangular cylindrical gas flow path forming members 75 are provided in contact with the inner surface of the upper wall 71A of the housing 71 and the inner surfaces of the both side walls 71B and 71C of the housing 71. . The internal space of each gas flow path forming member 75 is continuous with the gas supply port 74 opened around the ultraviolet light transmitting window member 73 on the upper surface of the housing 71.
In this ultraviolet treatment apparatus, the template for nanoimprint, which is the object to be treated W, is held by the template holding mechanism 79, whereby the object to be treated W is separated from the ultraviolet ray permeable window member 73. It is arranged to face 73. Then, light (ultraviolet light) from the ultraviolet lamp 80 is applied to the surface to be processed Wa (specifically, the surface of the nanoimprint template) of the object to be processed W through the ultraviolet light transmissive window member 73. Further, while the light from the ultraviolet lamp 80 is irradiated to the processing surface Wa of the processing object W, that is, during the light cleaning processing, the cooling gas is the processing object W and the ultraviolet light transmitting window member 73. Supply to the gap between The cooling gas is introduced into the interior of each gas flow path forming member 75 from a gas supply source (not shown). The cooling gas introduced into the gas flow path forming member 75 is supplied to the gap between the object to be processed W and the ultraviolet ray transmitting window member 73 through the gas supply port 74. Then, the processing gas W and the ultraviolet ray transmitting window member 73 are cooled by circulating the cooling gas through the gap. In particular, in the case where a gas that generates ozone by being irradiated with ultraviolet light (hereinafter, also referred to as "ozone generating source gas") is used as the cooling gas, the cooling gas is irradiated with ultraviolet light. Produces ozone. As a result, on the surface to be treated Wa, the light cleaning treatment is performed by the action of the ultraviolet rays reaching the surface to be treated Wa and the action of the generated ozone.
By performing the light cleaning process in this manner, residues such as a photocurable resin attached to the surface of the nanoimprinting template, specifically to the stamp portion (pattern portion), are removed.

JP, 2011-155160, A

In the manufacturing process of the touch panel, the manufacturing process of the biochip, the manufacturing process of the semiconductor, etc., it is necessary to selectively treat only a part of the surface of the object to be treated.
Specifically, in the process of manufacturing a touch panel and the process of manufacturing a biochip, a hydrophilic region (activated region) having hydrophilicity and a hydrophobic region (non-activated) are provided on the surface of the object to be treated. Region) must be formed. That is, on the surface of the object to be treated, there is a region to be treated requiring the cleaning process and a treatment prohibited region not requiring the cleaning process. In addition, even when the reticle with a pellicle (photomask with a protective protective film) is cleaned in the semiconductor manufacturing process, the surface of the object to be treated does not require the region to be treated that requires the cleaning and the cleaning treatment. There is a processing prohibited area.

Thus, when it is necessary to selectively treat only a part of the surface of the object to be treated, if the entire surface of the object to be treated is irradiated with light (ultraviolet light) from an ultraviolet lamp, the treatment is prohibited. There is a problem that processing is performed also in the area.
In addition, even when the light shielding member is provided so that the light (ultraviolet light) from the ultraviolet lamp is not irradiated to the processing prohibited area, the ultraviolet lamp from the ultraviolet lamp on the processing area (the space on the processing area) The ozone generated by the light diffuses on the processing prohibited area. For this reason, there is also a problem that undesired processing is performed even in the processing prohibited area. Such a problem is significant when using an ozone generation source gas as the cooling gas.

  The present invention has been made based on the above circumstances, and an object thereof is to provide an ultraviolet treatment apparatus capable of partially treating the surface of an object with high reliability. .

The ultraviolet processing apparatus of the present invention comprises an ultraviolet lamp for emitting ultraviolet light and an ultraviolet transparent window member, and the ultraviolet light from the ultraviolet lamp is transmitted through the ultraviolet transparent window member to the ultraviolet transparent window. An ultraviolet processing apparatus for irradiating a processing target area of an object to be processed, which is disposed opposite to a member separately from the member,
A light blocking member for blocking light from the ultraviolet lamp, which has a shape corresponding to the shape of a processing prohibited area other than the processing area in the processing object, faces the processing prohibited area, and the processing object It is provided to be separated,
The light shielding member is provided with a purge gas supply port for supplying a purge gas to a gap between the light shielding member and the object to be processed.

  In the ultraviolet processing apparatus of the present invention, the light shielding member has a main light shielding plate portion having a shape corresponding to the shape of the processing prohibited area, and an outer peripheral position on a surface facing the processing prohibited area of the main light shielding plate portion. In the above, it is preferable to have a frame-shaped peripheral wall portion protruding toward the object to be processed, which is formed to extend over the entire circumference of the outer peripheral edge of the main light shielding plate portion.

In the ultraviolet treatment apparatus of the present invention, the gas supply port is formed to open at the peripheral wall portion of the light shielding member, or the gas supply port faces the object to be processed of the light shielding member. It may be configured to be open at the surface.
In the case where the gas supply port is formed to open at the surface of the light shielding member facing the object to be treated, the object to be treated is located between the gas supply port and the object to be treated. Preferably, a gas flow control plate is provided opposite to the processing prohibited area on the surface of the object.

In the ultraviolet treatment apparatus of the present invention, the object to be treated is a plate having a convex portion on the surface, and a region including the convex portion forming region on the surface of the object to be treated is a treatment prohibited region. Yes,
The object to be processed is preferably disposed via a gap with the open end face of the peripheral wall portion in a state where the convex portion is positioned in a space surrounded by the peripheral wall portion of the light shielding member.

In such a configuration, the ultraviolet light transmissive window member is provided at a position where the lamp chamber in which the ultraviolet lamp is disposed and the processing chamber in which the object to be treated is disposed face the ultraviolet lamp. Divided by the bulkhead,
The light shielding member is provided in the processing chamber at a position on the surface of the partition close to the ultraviolet ray transmitting window member.
It is preferable that a processing chamber housing defining the processing chamber be provided with a processing atmosphere gas supply port for supplying a processing atmosphere gas into the processing chamber.

The processing atmosphere gas is preferably the same type of gas as the purge gas, and an inert gas can be used as the processing atmosphere gas and the purge gas.
Furthermore, as the processing atmosphere gas, it is possible to use a gas that generates ozone by being irradiated with the light from the ultraviolet lamp.

In the ultraviolet treatment apparatus of the present invention, the light shielding member having a shape corresponding to the shape of the processing prohibited area in the object to be processed is provided to be separated from the processing object and to face the processing prohibited area. It is possible to prevent the light from the ultraviolet lamp from being irradiated to the processing prohibited area. Further, the light shielding member is provided with a purge gas supply port. For this reason, in the gap between the light shielding member and the object to be treated, the gas supplied from the gas supply port is overflowed from the gap to form the ambient atmosphere of the light shielding member with respect to the gap. Inflow can be prevented. As a result, ozone generated by the action of light (ultraviolet light) from the ultraviolet lamp in the atmosphere around the light shielding member can be prevented from flowing into the gap between the light shielding member and the object to be treated.
Therefore, according to the ultraviolet treatment apparatus of the present invention, the ultraviolet rays are not irradiated to the treatment prohibited area on the surface of the object to be processed, and the generated ozone does not come in contact with the treatment prohibited area. Unwanted surface treatment can be avoided for the treatment prohibited area. That is, since the intended surface treatment can be performed only on the region to be treated on the surface of the object to be treated, the surface of the object to be treated can be partially treated with high reliability.

It is sectional drawing for description which shows the outline of an example of a structure of the 1st ultraviolet processing apparatus of this invention with a to-be-processed object. It is a top view for description which shows the structure of the processing chamber in the 1st ultraviolet processing device of FIG. It is a perspective view for description which shows the structure of the light-shielding member in the 1st ultraviolet processing device of FIG. It is the (a) top view which shows the outline of a structure of the to-be-processed object processed by the ultraviolet treatment apparatus of FIG. 1, (a) It is the sectional view on the AA line in (b) (a). It is explanatory drawing which shows the flow of purge gas in the ultraviolet-ray processing apparatus of FIG. It is explanatory drawing which shows the principal part of the other example of a structure of the ultraviolet-ray processing apparatus of this invention with a to-be-processed object. It is explanatory drawing which shows the principal part of the further another example of a structure of the ultraviolet-ray processing apparatus of this invention with a to-be-processed object. It is sectional drawing for description which shows an example of a structure of the conventional ultraviolet processing apparatus with a to-be-processed object.

  Hereinafter, embodiments of the present invention will be described in detail.

(First UV treatment device)
FIG. 1 is a cross-sectional view for explaining the outline of an example of the configuration of the first ultraviolet treatment apparatus of the present invention together with the object to be treated, and FIG. 2 shows the process chamber of the first ultraviolet treatment apparatus of FIG. FIG. 3 is an explanatory plan view showing a configuration, and FIG. 3 is an explanatory perspective view showing a configuration of a light shielding member in the first ultraviolet treatment apparatus of FIG. Moreover, FIG. 4 is explanatory drawing which shows roughly the structure of the to-be-processed object processed by the ultraviolet-ray processing apparatus of FIG.
The first ultraviolet processing apparatus 10 is, for example, a reticle with a pellicle (photomask with a protective protective film) as the workpiece W, and is used to partially process the surface of the reticle with a pellicle. Specifically, in the first ultraviolet processing apparatus 10, at least the area provided with the pellicle on the surface of the reticle with pellicle is set as the process prohibited area, and the area other than the process prohibited area is selectively dry cleaned. Used.

As shown in FIGS. 4A and 4B, the workpiece W has, for example, vertical and horizontal dimensions smaller than the vertical and horizontal dimensions of the reticle W1 in the central region of the surface of the square flat reticle W1. A rectangular flat thin film pellicle W2 elongated in one direction is provided, and has a rectangular flat thin film convex portion Wb formed of the pellicle W2 on the surface. Hereinafter, the one direction is referred to as “longitudinal direction”, and the direction orthogonal to the one direction in a plane along the surface of the reticle W1 is referred to as “width direction”.
In the workpiece W of this example, a longitudinal direction including a region where the pellicle W2 is formed on the surface of the workpiece W and a rectangular thin annular region on the surface of the reticle W1 surrounding the periphery of the region where the pellicle W2 is formed. The rectangular area extending in the direction is designated as the processing prohibited area T1. Further, each of the rectangular strip-shaped areas positioned on both sides in the width direction of the processing prohibited area T1 on the surface of the reticle W1 is taken as a processing area T2 (surface to be processed Wa). The two rectangular strip-shaped regions that constitute the processing region T2 are regions that include side edges that extend in the longitudinal direction of the processing object W. In FIG. 4, the processing prohibition region T1 indicates a region surrounded by a dashed dotted line, and the processing region T2 indicates a region surrounded by a dashed dotted line.
The vertical and horizontal dimensions of the reticle W1 are, for example, 152 mm × 152 mm, and the dimension in the width direction (lateral direction in FIG. 4A) of the processing region T2 is, for example, 15 mm. The dimension of the longitudinal direction (vertical direction in FIG. 4A) of the processing area T2 is, for example, 136 mm.

The first ultraviolet treatment apparatus 10 includes a lamp chamber housing 11 having a rectangular parallelepiped box shape which is long in one direction orthogonal to the opening direction, which is open at one side (upper side in FIG. 1). Hereinafter, for the sake of convenience, the opening direction of the lamp chamber housing 11 is referred to as the upper direction, and the one direction is defined as the longitudinal direction, and the direction perpendicular to the one direction in the plane perpendicular to the opening direction is defined as the width direction.
A rectangular flat partition wall 13 is airtightly provided on the opening end surface of the lamp chamber housing 11 so as to close the opening.
A processing chamber case 21 having a rectangular frame shape whose upper opening is closed by a cover member 23 having a rectangular flat plate shape is disposed on the upper surface of the partition wall 13. Thus, the processing chamber S1 in which the object W is disposed. Is formed. In the processing chamber case 21 in this example, the dimension in the longitudinal direction is smaller than the dimension in the longitudinal direction of the lamp chamber 11, and the dimension in the width direction is the same as the dimension in the width direction of the lamp chamber 11. ing. In the processing chamber case 21, the position of the outer surface of one end wall 22 </ b> A extending in the width direction located on one end side in the longitudinal direction extends in the width direction located on one end side in the longitudinal direction of the lamp chamber case 11 Are arranged in alignment with the position of the outer surface of the end wall of the Further, the position of the outer surface of each of the pair of side walls 22B and 22D extending in the longitudinal direction coincides with the position of the outer surface of each of the pair of side walls 12A and 12B extending in the longitudinal direction of the lamp chamber housing 11. .
A loading / unloading port (not shown) for carrying in / out the object W to / from the processing chamber S1 is provided on one end wall 22A of the processing chamber case 21. A shutter (not shown) is provided at the loading / unloading port.

  In the partition wall 13, two rectangular flat rectangular ultraviolet transparent windows made of, for example, quartz glass are provided at positions adjacent to the side walls 22 B and 22 D of the processing chamber housing 21 in the portion defining the processing chamber S 1. The members 15A and 15B are provided in a posture in which the light incident surface and the light emission surface extend horizontally in the longitudinal direction. Further, each of the ultraviolet ray transmitting window members 15A and 15B is provided at a position closer to one end wall 22A of the processing chamber housing 21 than the longitudinal center position of the processing chamber S1.

  The internal space of the lamp chamber housing 11 is airtightly divided into three spaces arranged in the width direction by two partition walls 17A and 17B. One partition wall 17A is arranged to extend in the longitudinal direction parallel to one side wall 12A of the lamp chamber housing 11 at a position on the inner side in the width direction from the position of the one ultraviolet transparent window member 15A. It is set up. In addition, the other partition wall 17B extends in the longitudinal direction in parallel to the other side wall 12B of the lamp chamber housing 11 at a position inward in the width direction from the position where the other ultraviolet light transmitting window member 15B is provided. Are located in In the first ultraviolet treatment apparatus 10, the space located at the center in the width direction is the irradiation distance adjustment mechanism accommodation chamber S4, and the spaces located on both sides in the width direction are the lamp chambers S2 and S3, respectively. It is done.

In each lamp chamber S2 and S3, circular rod-like ultraviolet lamps 40A and 40B face the corresponding ultraviolet-transmissive window members 15A and 15B, respectively, with the lamp axis (central axis) extending horizontally in the longitudinal direction. It is arranged.
Further, each lamp chamber S2, S3 is provided with an inert gas purge means (not shown) for purging the interior of the lamp chamber S2, S3 with an inert gas such as nitrogen gas, for example.
The ultraviolet lamps 40A and 40B in the example of this figure are of the same kind and the same shape, respectively. The ultraviolet lamps 40A and 40B are arranged such that the distances from the corresponding ultraviolet transparent window members 15A and 15B are equal.

  A shaft driving source 19 constituting an irradiation distance adjustment mechanism described later is disposed in the irradiation distance adjustment mechanism storage chamber S4, and the object W is moved in the vertical direction by the irradiation distance adjustment mechanism. The separation distance between the surface to be treated Wa of the object to be treated W and the light emitting surface of the ultraviolet ray transmitting window members 15A and 15B (the irradiation distance of the ultraviolet ray to the object to be treated W) is adjusted.

The processing chamber housing 21 is provided with a processing atmosphere gas supply port 28 for supplying a processing atmosphere gas required to process the workpiece W into the processing chamber S1. The processing atmosphere gas supply port 28 is formed by a through hole formed in the other end wall 22C extending in the width direction positioned on the other end side in the longitudinal direction of the processing chamber housing 21. The processing atmosphere gas supply port 28 is formed at a position closer to the one side wall 22B than the widthwise center position.
A processing atmosphere gas supply unit (not shown) provided outside the processing chamber S1 is connected to the processing atmosphere gas supply port 28.
In the example of this figure, an exhaust pipe 27 for exhausting ozone generated in the process of processing the object W is provided in the processing chamber S1 so as to extend along the other side wall 22D of the processing chamber housing 21. ing. The exhaust pipe 27 is provided outside the processing chamber S1 via an exhaust port 29 formed of a through hole formed at a position close to the other side wall 22D of the other end wall 22C of the processing chamber case 21. It is connected to ozone exhausting means (not shown).

As the processing atmosphere gas, an appropriate one may be used depending on the type of the object to be processed W and the like.
For example, in the case where the action of ozone is used to treat the object to be treated W, a gas (ozone generation source gas) in which ozone is generated by irradiation of ultraviolet rays is used as the treatment atmosphere gas. Here, as a specific example of the ozone generation source gas, for example, oxygen gas and CDA (Clean Dry Air) can be exemplified. When the action of ozone is not used to treat the object W, an inert gas such as nitrogen gas is used as the treatment atmosphere gas. By using an inert gas as the processing atmosphere gas, the ultraviolet irradiation amount to the object to be processed W is caused by absorption of the ultraviolet (vacuum ultraviolet) contained in the light from the ultraviolet lamps 40A and 40B into oxygen. It is possible to suppress the decrease.
Further, as the processing atmosphere gas, a mixed gas of at least two of oxygen gas, CDA and inert gas can also be used.

  As the processing atmosphere gas supply means, an appropriate one may be used according to the type of the processing atmosphere gas and the like.

  The supply conditions of the processing atmosphere gas by the processing atmosphere gas supply means include the type of the processing atmosphere gas, the processing atmosphere condition required in the processing chamber S1, the volume of the processing chamber S1, and the ultraviolet light transmissive window members 15A and 15B. And the distance between the object W and the object to be processed W.

Further, in the processing chamber S1, an object holding member for holding the object W in a state of being vertically separated from the ultraviolet light transmitting window members 15A and 15B is disposed.
The object holding member in this example is constituted by four mounting tables 25 respectively arranged at positions on the outer side in the longitudinal direction of both ends of the ultraviolet light transmitting window members 15A and 15B. Each mounting table 25 has an L-shaped appearance, and a mounting surface 25A is formed by a flat upper surface of a prismatic support portion extending in the longitudinal direction. The mounting surface 25A of each mounting table 25 is located on the same horizontal surface. Therefore, the object W to be processed is supported by the mounting surface 25A of the four mounting tables 25 so that the object to be processed W corresponds to the light exit surface of the ultraviolet light transmissive window members 15A and 15B to which the surface Wa to be processed corresponds. And the UV transparent window members 15A and 15B with a gap extending in parallel with each other.

In the ultraviolet treatment apparatus 10, the object holding member is disposed movably in the vertical direction by the irradiation distance adjusting mechanism.
The irradiation distance adjusting mechanism is constituted by, for example, a lifter, and extends in the width direction to be opposed to each other at the positions on the longitudinal outer side of each of both ends of the ultraviolet transmitting window members 15A and 15B in the processing chamber S1. And two long rectangular column-shaped mounting table fixing members 26 arranged in the above. One end of each mounting table fixing member 26 is positioned at the widthwise position where one ultraviolet transmitting window member 15A is disposed, and the other end is provided with the other ultraviolet transmitting window member 15B. It is located at the specified widthwise position. The mounting table 25 is fixed to each of both ends of the upper surface of each mounting table fixing member 26 in a posture in which the mounting surface 25A faces upward.
One end of a columnar shaft 34 is fixed at a substantially central position on the lower surface of each mounting table fixing member 26. Each shaft 34 is provided so as to extend in the vertical direction through a shaft through hole (not shown) formed in the partition wall 13. Each shaft 34 is vertically driven by a shaft drive source 19 disposed in the irradiation distance adjustment mechanism accommodation chamber S4.
In this irradiation distance adjustment mechanism, the respective surfaces 34 are moved in synchronization with each other, and the processing surface Wa of the processing object W and the ultraviolet light are maintained while the posture of the processing object W is maintained. The distance from the light emitting surface of the transmissive window members 15A and 15B is adjusted.

  Each shaft 34 is covered with a stretchable stainless steel bellows (not shown). One end of the bellows is airtightly joined to the lower surface of the mounting table fixing member 26, and the other end is airtightly joined to the upper surface of the partition wall 13. Thereby, the gas (processing atmosphere gas) constituting the atmosphere in the processing chamber S1 flows out into the irradiation distance adjustment mechanism accommodation chamber S4 through the shaft through hole, or the inside of the irradiation distance adjustment mechanism accommodation chamber S4. It is possible to prevent the gas constituting the atmosphere from flowing into the processing chamber S1 through the shaft through holes.

  In the above-described ultraviolet processing apparatus, a substantially rectangular plate-shaped light shielding member 30 for shielding the light from the ultraviolet lamps 40A and 40B is disposed in the processing chamber S1, and the light shielding member 30 and the partition 13 are provided. Thus, the light shielding mechanism is configured to prevent the light from the ultraviolet lamps 40A and 40B from being irradiated to the processing prohibition region T1.

The light shielding member 30 may have a rectangular planar shape corresponding to the shape of the processing prohibited area T1 in the workpiece W as shown in FIGS. 1 to 3, but the processing prohibited area It is formed to extend over the entire periphery of the outer peripheral edge of the main light shielding plate portion 31 at the outer peripheral edge position of the flat main light shielding plate portion 31 positioned to face T1 and the upper surface of the main light shielding plate portion 31 It is preferable to be configured to have a frame-shaped peripheral wall portion 32 protruding toward the workpiece W.
In the example of this figure, the light shielding member 30 is formed in a rectangular region between the two ultraviolet light transmitting window members 15A and 15B on the upper surface of the partition wall 13 (hereinafter, also referred to as "region between window members"). The peripheral wall portion 32 is positioned above the upper surface of the partition wall 13 so as to face the processing prohibited area T1 on the surface of the processing object W in a state of being separated from the surface of the processing object W It is arranged.
Therefore, since the light shielding member 30 has the peripheral wall portion 32, the peripheral wall portion 32 can surround the convex portion Wb of the object to be processed W included in the processing prohibited region T1, the light shielding member 30 Provides a superior light blocking function. Also, the degree of freedom in the design of the first ultraviolet treatment apparatus 10 is increased. Specifically, the degree of freedom of the arrangement position of the purge gas supply port 33 described later is increased, and the separation distance between the main light shielding plate portion 31 and the workpiece W can be increased.
In the example of this figure, the main light-shielding plate portion 31 has the vertical and horizontal dimensions equal to the vertical and horizontal dimensions of the processing prohibition region T1.

  Further, the height of the peripheral wall portion 32 in the light shielding member 30 is appropriately determined according to the projection height of the pellicle W2 (the thickness of the pellicle W2) with respect to the surface of the reticle W1 and the arrangement position of the purge gas supply port 33 described later. . The height of the peripheral wall portion 32 is, for example, 4.5 mm.

The light shielding member 30 has a light shielding property to the light from the ultraviolet lamps 40A and 40B, and is made of a material having ultraviolet resistance and, if necessary, ozone resistance.
Specific examples of the material of the light shielding member 30 include stainless steel (SUS) and the like.
When the light shielding member 30 is made of stainless steel (SUS), the thickness of the main light shielding plate portion 31 and the peripheral wall portion 32 is, for example, 0.5 to 1.5 mm.

Further, as shown in FIG. 3, in the peripheral wall portion 32 of the light shielding member 30, a gap formed between the main light shielding plate portion 31 of the light shielding member 30 and the object W (hereinafter referred to as “purge space A purge gas supply port 33 for supplying a purge gas to the fuel cell is formed.
In the example of this figure, the purge gas supply port 33 is formed by a rectangular notch and is formed in the other end wall portion 32C extending in the width direction positioned on the other end side in the longitudinal direction of the peripheral wall portion 32. ing. Specifically, in order to avoid the interference between the purge gas supply pipe 38 piped in the processing chamber S1 and the shaft 34 in the irradiation distance adjustment mechanism, the purge gas supply port 33 is a center position in the width direction of the other end wall portion 32C. It is formed at a position closer to one side wall portion 32B. The purge gas supply pipe 38 is piped so as not to interfere with the mounting table fixing member 26 disposed on the other end side (upper side in FIG. 2) in the irradiation distance adjusting mechanism. In the example of this figure, one end of the purge gas supply pipe 38 is located in the purge gas supply port 33, and the other end is provided in the through hole 24 formed in the other end wall 22C of the processing chamber housing 21. It is connected to one end of the tube coupling member 39. A gas pipe (not shown) connected to a purge gas supply means (not shown) is connected to the other end of the pipe coupling member 39.

As the purge gas, an appropriate one can be used in consideration of the type of the processing atmosphere gas according to the type of the processing object W, etc. However, basically, as the purge gas, from the viewpoint of processing efficiency, It is preferable to use the same kind of gas as that constituting the processing atmosphere gas.
As a purge gas, an oxygen gas and an ozone generating gas such as CDA, an inert gas such as nitrogen gas, or a mixed gas thereof exemplified as the processing atmosphere gas can be used.

As the purge gas supply means, an appropriate one may be used depending on the type of purge gas and the like.
The supply conditions of the purge gas by the purge gas supply means are, in general, the purge gas supply port 33 while overflowing the purge gas from the gap between the open end face of the peripheral wall 32 and the surface of the object W in the purge space Sp. So that the distance between the upper surface of the main light shielding plate 31 and the surface of the object to be processed W and the open end face of the peripheral wall 32 and the object can be made to flow in the longitudinal direction from one to the end wall portion 32A. It is appropriately determined in consideration of the size of the distance from the surface of the processing object W, the supply conditions of the processing atmosphere gas, and the like. In FIG. 3, the flow direction (overall flow direction) of the purge gas supplied from the purge gas supply port 33 is indicated by an arrow.

As the ultraviolet lamps 40A and 40B, various known lamps can be used as long as they emit ultraviolet light, and appropriate lamps are used according to the type of the object W to be processed and the type of the atmosphere gas for processing. Be
Specific examples of the ultraviolet lamps 40A and 40B include a mercury lamp, and a xenon excimer lamp (Xe ₂ excimer lamp) that emits light (vacuum ultraviolet light) having a peak wavelength (central wavelength) of 172 nm and a peak wavelength (central wavelength). An excimer lamp such as a krypton chloride excimer lamp (KrCl excimer lamp) that emits 222 nm light (ultraviolet light) may, for example, be mentioned.
In the example of this figure, rod-like xenon excimer lamps that emit light with a peak wavelength of 172 nm are used as the ultraviolet lamps 40A and 40B.

  As described above, in the first ultraviolet processing apparatus 10, the workpiece W is held by the four mounting table members 25. Thereby, in the state where the object W to be processed is positioned in the purge space Sp surrounded by the peripheral wall portion 32 of the light shielding member 30, the convex portion Wb formed by the pellicle W2 on the surface thereof A rectangular thin annular region on the surface of the reticle W1 constituting the portion is disposed via a gap with the opening end surface of the peripheral wall portion 32 of the light shielding member 30.

The separation distance between the workpiece W and the ultraviolet transmissive window members 15A and 15B is appropriately determined according to the type of the ultraviolet lamps 40A and 40B and the type of the processing atmosphere gas.
The separation distance between the surface to be processed Wa of the object to be processed W and the light emitting surface of the corresponding ultraviolet ray transmitting window members 15A and 15B is, for example, 2 mm. Here, the light emitting surface of one ultraviolet ray transmitting window member 15A and the light emitting surface of the other ultraviolet ray transmitting window member 15B are located at the same level position.
Moreover, it is preferable that the separation distance between the rectangular thin annular region on the surface of the object to be processed W and the open end face of the peripheral wall portion 32 be 0.5 to 1.5 mm. The distance between the surface of the pellicle W2) and the upper surface of the main light shielding plate portion 31 is preferably 1 to 2.5 mm.

In the first ultraviolet treatment apparatus 10, the workpiece W is disposed at a desired position in the processing chamber S1 by the loading and unloading robot. Specifically, first, the shutter at the loading / unloading port in the processing chamber S1 is opened, and the workpiece W is loaded from the loading / unloading port into the processing chamber S1 by the loading / unloading robot, and four mounting table members 25 Is placed on each of the placement surfaces 25A. Next, each of the mounting table fixing members 26 is moved upward by the irradiation distance adjusting mechanism, and the mounting table fixing members 26 are moved up to the uppermost position. Then, after the loading and unloading robot is retracted from the processing chamber S1, the shutter is closed. Next, each of the mounting table fixing members 26 is moved downward by the irradiation distance adjusting mechanism to lower each of the mounting table fixing members 26 to a desired position. Specifically, for example, the irradiation distance to the workpiece W is, for example, 2 mm.
Thus, in the processing chamber S1 in which the object to be processed W is disposed, nitrogen gas is supplied through the processing atmosphere gas supply port 28, and nitrogen gas is supplied through the purge gas supply port 33. Thus, nitrogen purge is performed so that the oxygen concentration in the processing chamber S1 is 1 to 10 vol% O ₂ . Here, the flow rate of nitrogen gas supplied from the processing atmosphere gas supply port 28 is, for example, 15 L / min, and the flow rate of nitrogen gas supplied via the purge gas supply port 33 is, for example, 5 L / min.
Thereafter, in a state where the supply of nitrogen gas from the processing atmosphere gas supply port 28 and the purge gas supply port 33 is continued, the ultraviolet lamps 40A and 40B have, for example, a radiation emittance of 10 mW / in the ultraviolet transparent window members 15A and 15B. be lit simultaneously under the condition that the cm ^2. In this manner, the light (ultraviolet light) from the ultraviolet lamps 40A and 40B is applied to the processing surface Wa of the processing object W through the ultraviolet transmitting window members 15A and 15B, thereby processing the processing object W Is done. Here, the ultraviolet irradiation conditions are such that the irradiation time is, for example, 5 to 600 seconds, and the integrated light amount is 50 to 6000 mJ / cm ² .
When the ultraviolet irradiation processing is completed, each of the mounting table fixing members 26 is moved upward by the irradiation distance adjusting mechanism so that each of the mounting table fixing members 26 is lifted to the uppermost position, and the ozone exhausting means is used. A gas (a processing atmosphere gas containing ozone generated in the process of processing the workpiece W) constituting the atmosphere of the processing chamber S1 is exhausted through the exhaust pipe 27. Thereafter, the shutter of the loading / unloading port in the processing chamber S1 is opened, and the processed object W is unloaded from the processing chamber S1 from the loading / unloading port by the loading / unloading robot.

Thus, in the first ultraviolet processing apparatus 10, since the light shielding member 30 having a shape corresponding to the shape of the processing prohibited area T1 in the object to be processed W is provided, ultraviolet light can be applied to the processing prohibited area T1. It is possible to prevent the light from the lamps 40A and 40B from being irradiated. Further, as shown in FIG. 5, in the purge space Sp, the purge gas (indicated by the solid arrows in FIG. 5) supplied from the purge gas supply port 33 is shown on the opening end face of the peripheral wall 32 and the surface of the object W By flowing out of the purge space Sp through the gap between the rectangular thin annular region, it is possible to prevent the inflow of the processing atmosphere gas that constitutes the ambient atmosphere of the light shielding member 30 into the purge space Sp. . Therefore, even when the ozone generating gas is used as the processing atmosphere gas, the processing atmosphere gas is irradiated with ultraviolet light (indicated by white arrows in FIG. 5) from the ultraviolet lamps 40A and 40B. The generated ozone can be prevented from flowing into the purge space Sp.
Therefore, according to the first ultraviolet treatment apparatus 10, the ultraviolet rays are not irradiated to the treatment prohibited area T1 on the surface Wa of the object W, and the generated ozone contacts the treatment prohibited area T1. Since there is no problem, it can be avoided that the undesired surface treatment is performed on the processing prohibited area T1. That is, since the desired surface treatment can be performed only on the processing target region T2 on the surface of the processing object W, the surface of the processing object W can be partially processed with high reliability.

  Further, in the first ultraviolet treatment apparatus 10, since the light shielding member 30 has the main light shielding plate portion 31 and the peripheral wall portion 32, the light shielding member 30 can obtain an excellent light shielding function. Further, the first ultraviolet treatment apparatus 10 is considered to have a large degree of freedom in design.

(Second UV treatment device)
FIG. 6 is an explanatory view showing the main part of another example of the configuration of the ultraviolet treatment apparatus of the present invention together with the object to be treated. In FIG. 6, (a) is a plan view for explanation showing the positional relationship between the light shielding member and the gas flow control plate as viewed from the lower surface side of the light shielding member, and (b) is a cross section perpendicular to the longitudinal direction. FIG.
The second ultraviolet processing apparatus is different from the first in FIG. 1 except that the arrangement position of the purge gas supply port 53 in the light shielding member 50 is different, and the gas flow control plate 55 is provided in the purge space Sp. The same configuration as that of the ultraviolet processing apparatus 10 of FIG. Then, like the first ultraviolet processing apparatus 10, the second ultraviolet processing apparatus treats the surface of the reticle with the pellicle with the object to be processed W as a reticle with a pellicle (photomask with a protective protective film). Used for Specifically, the second ultraviolet processing apparatus is a rectangular region extending in the longitudinal direction (left and right direction in FIG. 6A) provided with at least the pellicle W2 on the surface of the reticle with pellicle as the object to be processed W Is designated as the processing prohibited area T1, and is used to selectively dry wash the rectangular belt-like processed areas T2 positioned on both sides in the width direction of the processing prohibited area T1 on the surface of the reticle W1 in the exposed state. Be

The light shielding member 50 in the second ultraviolet treatment device has the same configuration as the light shielding member 30 in the first ultraviolet treatment device 10, and has a flat main light shielding plate portion 51 and an upper surface of the main light shielding plate portion 31. And a frame-like peripheral wall 52 projecting toward the object to be processed W, which is formed to extend over the entire periphery of the outer peripheral edge of the main light shielding plate 51 at the outer peripheral edge position of The main light shielding plate portion 51 has a rectangular shape corresponding to the shape of the processing prohibited area T1 of the object to be processed W, and is provided at a position facing the processing prohibited area T1 of the object to be processed W.
In the light shielding member 50, a through hole opened on the surface of the light shielding member 50 facing the object to be processed W, that is, the upper surface of the main light shielding plate portion 51 is formed to extend in the thickness direction of the main light shielding plate portion 51. Thus, the purge gas supply port 53 is configured. In the example of this figure, the through-hole which comprises the purge gas supply port 53 is circular shape, for example, Comprising: It forms in the center position of the main light-shielding plate part 51. As shown in FIG.

  As described above, in the second ultraviolet processing apparatus, the gas flow control plate 55 for controlling the flow direction of the purge gas supplied from the purge gas supply port 53 is provided in the purge space Sp. Specifically, the gas flow control plate 55 is for preventing the purge gas supplied from the purge gas supply port 53 from being directly sprayed to the processing prohibited area of the workpiece W.

The gas flow control plate 55 is supported by the spacers 56 disposed at the four corners of the main light shielding plate portion 51, and the main light shielding plate portion 51 extends parallel to the main light shielding plate portion 51 in the purge space Sp. It is disposed via the upper surface of 51 and a gap. A gap through which the purge gas flows is formed between the side peripheral surface of the gas flow control plate 55 and the inner surface of the peripheral wall portion 52 of the light shielding member 50.
In the example of this figure, the workpiece W is positioned with a gap between the convex portion Wb on the surface thereof and the gas flow control plate 55 at a position immediately above the gas flow control plate 55 in the purge space Sp, It is arranged. The gas flow control plate 55 is formed of a rectangular flat body having the same vertical and horizontal dimensions as the vertical and horizontal dimensions of the surface of the pellicle W 2 in the object to be processed W. The whole of is covered.
The gas flow control plate 55 is made of, for example, a metal such as stainless steel (SUS) and aluminum, and has a thickness of, for example, 0.5 to 1.5 mm.
Further, the distance between the upper surface of the main light shielding plate portion 51 and the lower surface of the gas flow control plate 55 in the light shielding member 50 is, for example, 1 to 2.5 mm. The distance between the convex portion Wb and the surface of the convex portion Wb (the surface of the pellicle W2) is, for example, 1 to 1.5 mm.

  In the second ultraviolet processing apparatus, the object to be processed W is disposed at a predetermined position in the processing chamber by the loading / unloading robot as in the first ultraviolet processing apparatus 10, and the light cleaning process is performed in the processing chamber After that, the processed object W is unloaded by the loading and unloading robot.

In the second ultraviolet treatment apparatus, since the light shielding member 50 is provided, it is possible to prevent the light from the ultraviolet lamp from being irradiated to the treatment prohibited area of the object to be treated W. Further, the purge gas supplied from the purge gas supply port 53 into the purge space Sp is purged through the gap between the opening end face of the peripheral wall 52 and the area of the surface of the workpiece W where the pellicle W1 is exposed. By overflowing from Sp, it is possible to prevent the processing atmosphere gas that constitutes the ambient atmosphere of the light shielding member 30 from flowing into the purge space Sp. Therefore, in the processing chamber, even if ozone is generated as the processing atmosphere gas is irradiated with light from the ultraviolet lamp, ozone is prevented from flowing into the purge space Sp. it can.
Therefore, according to the second ultraviolet treatment apparatus, the ultraviolet rays are not irradiated to the treatment prohibited area T1 on the surface of the object to be processed W, and the generated ozone may also contact the treatment prohibited area T1. Because there is not, it can be avoided that the undesired surface treatment is performed on the processing prohibited area T1. That is, since the desired surface treatment can be performed only on the processing target region T2 on the surface of the processing object W, the surface of the processing object W can be partially processed with high reliability.

In the second ultraviolet treatment apparatus, the gas flow control plate 55 is provided between the main light shielding plate portion 51 of the light shielding member 50 and the object W in the purge space Sp. For this reason, the purge gas supplied from the purge gas supply port 53 provided in the main light shielding plate portion 51 is not directly sprayed to the processing prohibited area T1 of the workpiece W. Further, by providing the purge gas supply port 53 in the main light shielding plate portion 51, the processing atmosphere gas constituting the atmosphere around the light shielding member 50 can be more reliably prevented from flowing into the purge space Sp. can do.
Specifically, in the first ultraviolet irradiation device 10 according to FIG. 1, in the purge space Sp, the purge gas is generally formed in the other end wall portion 32C of the peripheral wall portion 32. It flows longitudinally from the supply port 33 toward one end wall portion 32A. For this reason, there is a possibility that the processing atmosphere gas may be caught from the gap between the opening end face of the peripheral wall portion 32 and the object W by the flow of the purge gas, and the generated ozone may flow into the purge space Sp. . Thus, in the second ultraviolet treatment apparatus, the purge gas supplied from the purge gas supply port 53 has the flowing direction of the purge gas indicated by the white arrow in FIGS. 6A and 6B. In the purge space Sp, the gas flows radially toward the peripheral wall 52 along the gas flow control plate 55. Therefore, the processing atmosphere gas containing the generated ozone can be reliably prevented from being caught by the flow of the purge gas and flowing into the purge space Sp.

(Third UV treatment device)
FIG. 7 is an explanatory view showing the main parts of still another example of the configuration of the ultraviolet ray processing apparatus of the present invention. In FIG. 7, (a) is a plan view for explanation showing the positional relationship between the light shielding member and the object to be treated, viewed from the lower surface side of the light shielding member, and (b) is a cross section perpendicular to the longitudinal direction. It is an enlarged view which shows.
The third ultraviolet treatment apparatus has the same configuration as the first ultraviolet treatment apparatus 10 according to FIG. 1 except that the configuration of the light shielding member is different and the arrangement position of the purge gas supply port in the light shielding member is different.
The third ultraviolet treatment apparatus is used, for example, to partially treat the surface of the object W to be treated which is a plate-like body having a flat surface. In the workpiece W in the example of this figure, a long rectangular central region extending in the longitudinal direction (left and right direction in FIG. 7A) on the surface of the workpiece W is taken as the processing prohibited region T1, A rectangular strip-shaped area positioned on both sides in the width direction of the prohibited area T1 is a processing area T2.

The light shielding member 60 in the third ultraviolet treatment apparatus is formed of a flat plate having a rectangular shape corresponding to the shape of the processing prohibited area T1 of the object to be processed W.
In the light shielding member 60, a through hole opened on the surface of the light shielding member 60 facing the object to be processed W, that is, the upper surface is formed to extend in the thickness direction, and the purge gas supply port 63 is thereby configured. . In the example of this figure, the through-hole which comprises the purge gas supply port 63 is circular shape, for example, Comprising: It forms in the center position of the light-shielding member 60. As shown in FIG.
The thickness of the light shielding member 60 is 0.5 to 1.5 mm.

  In the third ultraviolet processing apparatus, the object to be processed W is disposed at a predetermined position in the processing chamber by the loading / unloading robot as in the first ultraviolet processing apparatus 10, and the light cleaning process is performed in the processing chamber After that, the processed object W is unloaded by the loading and unloading robot. Here, the to-be-processed object W is arrange | positioned so that the separation distance of the surface and the upper surface of the light-shielding member 60 may be 0.5-1.5 mm, for example.

Thus, in the third ultraviolet processing apparatus, since the light shielding member 60 is provided, it is possible to prevent the light from the ultraviolet lamp from being irradiated to the processing prohibited area T1 of the object W to be processed. . Further, the purge gas supplied from the purge gas supply port 63 into the purge space Sp flows along the upper surface of the light shielding member 60 and overflows from the purge space Sp, whereby the processing atmosphere gas flows into the purge space Sp. Can be prevented. Therefore, in the processing chamber, even if ozone is generated as the processing atmosphere gas is irradiated with light from the ultraviolet lamp, ozone is prevented from flowing into the purge space Sp. it can.
Therefore, according to the third ultraviolet treatment apparatus, the ultraviolet light is not irradiated to the treatment prohibited area T1 on the surface of the object to be processed W, and the generated ozone may be brought into contact with the treatment prohibited area T1. Because there is not, it can be avoided that the undesired surface treatment is performed on the processing prohibited area T1. That is, since the desired surface treatment can be performed only on the processing target region T2 on the surface of the processing object W, the surface of the processing object W can be partially processed with high reliability.

  Further, in the third ultraviolet treatment apparatus, the purge gas supply port 63 is formed at a substantially central position of the light shielding member 60. Therefore, as indicated by arrows in FIGS. 7A and 7B, the flow direction of the purge gas is indicated by the arrows, the purge gas supplied from the purge gas supply port 63 is directed toward the outer peripheral edge of the light shielding member 60 in the purge space Sp. Flow radially. Therefore, the processing atmosphere gas containing the generated ozone can be further reliably prevented from being caught by the flow of the purge gas and flowing into the purge space Sp.

As mentioned above, although embodiment of this invention was described, this invention is not limited to said embodiment, A various change can be added.
For example, the structure of the whole ultraviolet processing apparatus is not limited to what is shown in FIGS. 1-7, A various structure is employable.
Further, the first ultraviolet processing apparatus and the second ultraviolet processing apparatus are not limited to the reticle with a pellicle (photomask with a protective protective film), and can be applied to various types that require ultraviolet irradiation processing. .

DESCRIPTION OF SYMBOLS 10 1st ultraviolet processing apparatus 11 lamp chamber housing 12A, 12B Side wall 13 Partition 15A, 15B Ultraviolet transmission window member 17A, 17B Division partition 19 Shaft drive source 21 Processing chamber housing 22A, 22C End wall 22B, 22D Side wall 23 Cover member 24 through hole 25 mounting table 25A mounting surface 26 mounting table fixing member 27 exhaust pipe 28 atmosphere gas supply port for processing 29 exhaust port 30 light shielding member 31 main light shielding plate 32 peripheral wall 32A, 32C end wall 32B side wall 33 Purge gas supply port 34 Shaft 38 Purge gas supply pipe 39 Tube connection member 40A, 40B Ultraviolet lamp 50 Light shielding member 51 Main light shielding plate portion 52 Main wall shielding plate portion 53 Purge gas supply port 55 Gas flow control plate 56 Spacer 60 Light shielding member 63 Purge gas supply port 71 Body 71A upper wall 71B, 71C side wall 73 ultraviolet ray transmitting window member 74 gas Supply port 75 Gas flow path forming member 78 Fixing plate 79 Template holding mechanism 80 UV lamp W Object to be processed Wa Surface to be processed Wb Convex part W1 Reticle W2 Pellicle T1 Processing prohibited area T2 Processing area S1 Processing chamber S2, S3 Lamp chamber S4 Irradiation distance adjustment mechanism storage chamber Sp Purge space

Claims (10)

An ultraviolet lamp for emitting ultraviolet light and an ultraviolet light transmitting window member are provided, and ultraviolet light from the ultraviolet light lamp is disposed opposite to the ultraviolet light transmitting window member via the ultraviolet light transmitting window member in a separated manner. It is an ultraviolet processing apparatus irradiated to the to-be-processed area | region of the to-be-processed object, Comprising:
A light blocking member for blocking light from the ultraviolet lamp, which has a shape corresponding to the shape of a processing prohibited area other than the processing area in the processing object, faces the processing prohibited area, and the processing object It is provided to be separated,
The ultraviolet processing apparatus according to claim 1, wherein the light shielding member is provided with a purge gas supply port for supplying a purge gas to a gap between the light shielding member and the object to be processed.   The light shielding member has a main light shielding plate portion having a shape corresponding to the shape of the processing prohibited region, and an outer peripheral edge of the main light shielding plate portion at an outer peripheral position on a surface of the main light shielding plate portion facing the processing prohibited region. The ultraviolet treatment apparatus according to claim 1, further comprising: a frame-like peripheral wall portion protruding toward the object to be processed, which is formed to extend over the entire circumference of the frame.   The ultraviolet processing apparatus according to claim 2, wherein the gas supply port is formed to open at a peripheral wall portion of the light shielding member.   The ultraviolet processing apparatus according to claim 1, wherein the gas supply port is formed to open at a surface of the light shielding member facing the object to be processed.   5. The ultraviolet processing apparatus according to claim 4, wherein a gas flow control plate is provided between the gas supply port and the object to be processed, facing a processing prohibited area on the surface of the object. . The to-be-processed object is a plate-like thing which has a convex part on the surface, Comprising: The area | region containing the convex part formation area in the surface of the said to-be-processed object is made into the process prohibition area | region.
The object to be treated is disposed in a space between the opening end face of the peripheral wall portion and the space in a state where the convex portion is positioned in a space surrounded by the peripheral wall portion of the light shielding member. The ultraviolet treatment apparatus as described in 2. The lamp chamber in which the ultraviolet lamp is disposed, and the processing chamber in which the object to be treated is disposed are partitioned by a partition wall provided with the ultraviolet ray transmitting window member at a position facing the ultraviolet lamp,
The light shielding member is provided in the processing chamber at a position on the surface of the partition close to the ultraviolet ray transmitting window member.
2. The ultraviolet light according to claim 1, wherein a processing atmosphere casing for forming the processing chamber is provided with a processing atmosphere gas supply port for supplying a processing atmosphere gas into the processing chamber. Processing unit.   8. The ultraviolet treatment apparatus according to claim 7, wherein the processing atmosphere gas is the same type of gas as the purge gas.   9. The ultraviolet treatment apparatus according to claim 8, wherein the processing atmosphere gas and the purge gas are inert gases. 9. The ultraviolet processing apparatus according to claim 7, wherein the processing atmosphere gas is a gas that generates ozone by being irradiated with the light from the ultraviolet lamp.

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