JPWO2012147874A1 - RESIN COMPOSITION FOR ELECTRONIC COMPONENT AND ELECTRONIC COMPONENT DEVICE - Google Patents
RESIN COMPOSITION FOR ELECTRONIC COMPONENT AND ELECTRONIC COMPONENT DEVICE Download PDFInfo
- Publication number
- JPWO2012147874A1 JPWO2012147874A1 JP2013512442A JP2013512442A JPWO2012147874A1 JP WO2012147874 A1 JPWO2012147874 A1 JP WO2012147874A1 JP 2013512442 A JP2013512442 A JP 2013512442A JP 2013512442 A JP2013512442 A JP 2013512442A JP WO2012147874 A1 JPWO2012147874 A1 JP WO2012147874A1
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- Prior art keywords
- group
- vinyl ether
- carbon atoms
- atom
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000011342 resin composition Substances 0.000 title claims abstract description 93
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 132
- -1 aromatic amine compound Chemical class 0.000 claims abstract description 131
- 150000001875 compounds Chemical class 0.000 claims abstract description 86
- 239000003822 epoxy resin Substances 0.000 claims abstract description 73
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 73
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 63
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 51
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 39
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 32
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 14
- 125000004429 atom Chemical group 0.000 claims abstract description 13
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 12
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 10
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 66
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 52
- 239000004065 semiconductor Substances 0.000 claims description 34
- 239000007788 liquid Substances 0.000 claims description 23
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 19
- 239000000047 product Substances 0.000 claims description 19
- 125000002947 alkylene group Chemical group 0.000 claims description 18
- 239000011256 inorganic filler Substances 0.000 claims description 17
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 17
- 238000007259 addition reaction Methods 0.000 claims description 16
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- PISLZQACAJMAIO-UHFFFAOYSA-N 2,4-diethyl-6-methylbenzene-1,3-diamine Chemical compound CCC1=CC(C)=C(N)C(CC)=C1N PISLZQACAJMAIO-UHFFFAOYSA-N 0.000 claims description 11
- 125000005647 linker group Chemical group 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 8
- 239000007795 chemical reaction product Substances 0.000 claims description 8
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 5
- 239000001257 hydrogen Substances 0.000 abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 5
- 229960000834 vinyl ether Drugs 0.000 description 61
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 40
- MWZJGRDWJVHRDV-UHFFFAOYSA-N 1,4-bis(ethenoxy)butane Chemical compound C=COCCCCOC=C MWZJGRDWJVHRDV-UHFFFAOYSA-N 0.000 description 28
- 239000002245 particle Substances 0.000 description 27
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 26
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 25
- LPYUENQFPVNPHY-UHFFFAOYSA-N 3-methoxycatechol Chemical compound COC1=CC=CC(O)=C1O LPYUENQFPVNPHY-UHFFFAOYSA-N 0.000 description 24
- PGSWEKYNAOWQDF-UHFFFAOYSA-N 3-methylcatechol Chemical compound CC1=CC=CC(O)=C1O PGSWEKYNAOWQDF-UHFFFAOYSA-N 0.000 description 24
- 239000003795 chemical substances by application Substances 0.000 description 24
- 150000002430 hydrocarbons Chemical group 0.000 description 24
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 22
- 150000001721 carbon Chemical group 0.000 description 20
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 18
- 125000003118 aryl group Chemical group 0.000 description 17
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 16
- 239000005011 phenolic resin Substances 0.000 description 16
- 125000000217 alkyl group Chemical group 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 15
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 14
- 239000004793 Polystyrene Substances 0.000 description 14
- 230000000694 effects Effects 0.000 description 14
- 229920002223 polystyrene Polymers 0.000 description 14
- 239000000126 substance Substances 0.000 description 14
- 239000000853 adhesive Substances 0.000 description 13
- 230000001070 adhesive effect Effects 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 13
- 238000002360 preparation method Methods 0.000 description 13
- 125000001424 substituent group Chemical group 0.000 description 13
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 12
- JRNGUTKWMSBIBF-UHFFFAOYSA-N naphthalene-2,3-diol Chemical compound C1=CC=C2C=C(O)C(O)=CC2=C1 JRNGUTKWMSBIBF-UHFFFAOYSA-N 0.000 description 12
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 11
- 229960001755 resorcinol Drugs 0.000 description 11
- 239000007787 solid Substances 0.000 description 11
- 238000012360 testing method Methods 0.000 description 11
- QVOHHWQAOFEPOQ-UHFFFAOYSA-N 1,3-bis(ethenoxy)butane Chemical compound C=COC(C)CCOC=C QVOHHWQAOFEPOQ-UHFFFAOYSA-N 0.000 description 10
- PJZLSMMERMMQBJ-UHFFFAOYSA-N 3,5-ditert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC(O)=C(O)C(C(C)(C)C)=C1 PJZLSMMERMMQBJ-UHFFFAOYSA-N 0.000 description 10
- ZBCATMYQYDCTIZ-UHFFFAOYSA-N 4-methylcatechol Chemical compound CC1=CC=C(O)C(O)=C1 ZBCATMYQYDCTIZ-UHFFFAOYSA-N 0.000 description 10
- 230000001133 acceleration Effects 0.000 description 10
- 229920002379 silicone rubber Polymers 0.000 description 10
- 239000004945 silicone rubber Substances 0.000 description 10
- 239000004593 Epoxy Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 150000002989 phenols Chemical class 0.000 description 9
- 229940079877 pyrogallol Drugs 0.000 description 9
- 238000007789 sealing Methods 0.000 description 9
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 150000004780 naphthols Chemical class 0.000 description 8
- 238000003860 storage Methods 0.000 description 8
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 7
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 description 7
- 125000005529 alkyleneoxy group Chemical group 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 7
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 7
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 7
- 229930003836 cresol Natural products 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 7
- 229960001553 phloroglucinol Drugs 0.000 description 7
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 7
- QOYBXUIKQOIDQO-UHFFFAOYSA-N 1,3-bis(ethenoxy)propane Chemical compound C=COCCCOC=C QOYBXUIKQOIDQO-UHFFFAOYSA-N 0.000 description 6
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 6
- JJRUAPNVLBABCN-UHFFFAOYSA-N 2-(ethenoxymethyl)oxirane Chemical compound C=COCC1CO1 JJRUAPNVLBABCN-UHFFFAOYSA-N 0.000 description 6
- 125000003342 alkenyl group Chemical group 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 238000009833 condensation Methods 0.000 description 6
- 229920001971 elastomer Polymers 0.000 description 6
- 125000003700 epoxy group Chemical group 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 229920001721 polyimide Polymers 0.000 description 6
- 230000035882 stress Effects 0.000 description 6
- CYIGRWUIQAVBFG-UHFFFAOYSA-N 1,2-bis(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOCCOC=C CYIGRWUIQAVBFG-UHFFFAOYSA-N 0.000 description 5
- QYIZSVDCOHZSOW-UHFFFAOYSA-N 1,2-bis(ethenoxy)-2-methylpropane Chemical compound C=COC(C)(C)COC=C QYIZSVDCOHZSOW-UHFFFAOYSA-N 0.000 description 5
- QDXYBNYKACUCOJ-UHFFFAOYSA-N 1,2-bis(ethenoxy)butane Chemical compound C=COC(CC)COC=C QDXYBNYKACUCOJ-UHFFFAOYSA-N 0.000 description 5
- ZXHDVRATSGZISC-UHFFFAOYSA-N 1,2-bis(ethenoxy)ethane Chemical compound C=COCCOC=C ZXHDVRATSGZISC-UHFFFAOYSA-N 0.000 description 5
- LXSVCBDMOGLGFA-UHFFFAOYSA-N 1,2-bis(ethenoxy)propane Chemical compound C=COC(C)COC=C LXSVCBDMOGLGFA-UHFFFAOYSA-N 0.000 description 5
- OWNPXWJVIZFPBK-UHFFFAOYSA-N 1,2-bis[2-[2-(2-ethenoxyethoxy)ethoxy]ethoxy]ethane Chemical compound C=COCCOCCOCCOCCOCCOCCOCCOC=C OWNPXWJVIZFPBK-UHFFFAOYSA-N 0.000 description 5
- YCADXCSWOBLSPP-UHFFFAOYSA-N 1,3-bis(ethenoxy)-2-methylpropane Chemical compound C=COCC(C)COC=C YCADXCSWOBLSPP-UHFFFAOYSA-N 0.000 description 5
- JOSFJABFAXRZJQ-UHFFFAOYSA-N 1,6-bis(ethenoxy)hexane Chemical compound C=COCCCCCCOC=C JOSFJABFAXRZJQ-UHFFFAOYSA-N 0.000 description 5
- UEIPWOFSKAZYJO-UHFFFAOYSA-N 1-(2-ethenoxyethoxy)-2-[2-(2-ethenoxyethoxy)ethoxy]ethane Chemical compound C=COCCOCCOCCOCCOC=C UEIPWOFSKAZYJO-UHFFFAOYSA-N 0.000 description 5
- WJSSGRNOLJPGNJ-UHFFFAOYSA-N 2,3-bis(ethenoxy)butane Chemical compound C=COC(C)C(C)OC=C WJSSGRNOLJPGNJ-UHFFFAOYSA-N 0.000 description 5
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 5
- 150000008065 acid anhydrides Chemical class 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000007822 coupling agent Substances 0.000 description 5
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 229920000058 polyacrylate Polymers 0.000 description 5
- 229920001451 polypropylene glycol Polymers 0.000 description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
- CGHMMUAOPPRRMX-UHFFFAOYSA-N 1,4-bis(ethenoxy)cyclohexane Chemical compound C=COC1CCC(OC=C)CC1 CGHMMUAOPPRRMX-UHFFFAOYSA-N 0.000 description 4
- DQNSRQYYCSXZDF-UHFFFAOYSA-N 1,4-bis(ethenoxymethyl)cyclohexane Chemical compound C=COCC1CCC(COC=C)CC1 DQNSRQYYCSXZDF-UHFFFAOYSA-N 0.000 description 4
- BJOSJQGXIADAIQ-UHFFFAOYSA-N 1,5-bis(ethenoxy)pentane Chemical compound C=COCCCCCOC=C BJOSJQGXIADAIQ-UHFFFAOYSA-N 0.000 description 4
- SAMJGBVVQUEMGC-UHFFFAOYSA-N 1-ethenoxy-2-(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOC=C SAMJGBVVQUEMGC-UHFFFAOYSA-N 0.000 description 4
- FOWNZLLMQHBVQT-UHFFFAOYSA-N 1-ethenoxy-2-[2-(2-ethenoxypropoxy)propoxy]propane Chemical compound C=COCC(C)OCC(C)OCC(C)OC=C FOWNZLLMQHBVQT-UHFFFAOYSA-N 0.000 description 4
- LTWYVVDBLJANBG-UHFFFAOYSA-N 1-ethenoxy-2-[2-[2-(2-ethenoxypropoxy)propoxy]propoxy]propane Chemical compound C=COCC(C)OCC(C)OCC(C)OCC(C)OC=C LTWYVVDBLJANBG-UHFFFAOYSA-N 0.000 description 4
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 4
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 229920000800 acrylic rubber Polymers 0.000 description 4
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 4
- 239000011258 core-shell material Substances 0.000 description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 4
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- 125000004957 naphthylene group Chemical group 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000005060 rubber Substances 0.000 description 4
- 230000035939 shock Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 3
- DSSAWHFZNWVJEC-UHFFFAOYSA-N 3-(ethenoxymethyl)heptane Chemical compound CCCCC(CC)COC=C DSSAWHFZNWVJEC-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- UMHKOAYRTRADAT-UHFFFAOYSA-N [hydroxy(octoxy)phosphoryl] octyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OP(O)(=O)OCCCCCCCC UMHKOAYRTRADAT-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 150000004982 aromatic amines Chemical class 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 125000000392 cycloalkenyl group Chemical group 0.000 description 3
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 3
- 125000005670 ethenylalkyl group Chemical group 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000005040 ion trap Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000005375 organosiloxane group Chemical group 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 230000000638 stimulation Effects 0.000 description 3
- 230000008646 thermal stress Effects 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- RXGICMXGYZYDTI-UHFFFAOYSA-N (3-ethenoxy-1-phenylprop-1-enyl)benzene Chemical compound C1(=CC=CC=C1)C(=CCOC=C)C1=CC=CC=C1 RXGICMXGYZYDTI-UHFFFAOYSA-N 0.000 description 2
- PJJJSPBDXSGONK-UHFFFAOYSA-N (E)-4-ethenoxypent-2-ene Chemical compound C(=C)OC(C=CC)C PJJJSPBDXSGONK-UHFFFAOYSA-N 0.000 description 2
- YKLWPGCWVBBCTO-HWKANZROSA-N (e)-1-ethenoxyprop-1-ene Chemical compound C\C=C\OC=C YKLWPGCWVBBCTO-HWKANZROSA-N 0.000 description 2
- FGTVHMDWJMWCOV-HWKANZROSA-N (e)-7-ethenoxyhept-2-ene Chemical compound C\C=C\CCCCOC=C FGTVHMDWJMWCOV-HWKANZROSA-N 0.000 description 2
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- NORWDHQOQKMHHH-UHFFFAOYSA-N 1-(1-ethenoxyethyl)cyclohexene Chemical compound C(=C)OC(C)C1=CCCCC1 NORWDHQOQKMHHH-UHFFFAOYSA-N 0.000 description 2
- ADGJQDAWLMKTFR-UHFFFAOYSA-N 1-(1-ethenoxyethyl)cyclopentene Chemical compound C(=C)OC(C)C1=CCCC1 ADGJQDAWLMKTFR-UHFFFAOYSA-N 0.000 description 2
- AYMDJPGTQFHDSA-UHFFFAOYSA-N 1-(2-ethenoxyethoxy)-2-ethoxyethane Chemical compound CCOCCOCCOC=C AYMDJPGTQFHDSA-UHFFFAOYSA-N 0.000 description 2
- UNMYKPSSIFZORM-UHFFFAOYSA-N 1-(2-ethenoxyethoxy)butane Chemical compound CCCCOCCOC=C UNMYKPSSIFZORM-UHFFFAOYSA-N 0.000 description 2
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- 229910001451 bismuth ion Inorganic materials 0.000 description 1
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- AHICWQREWHDHHF-UHFFFAOYSA-N chromium;cobalt;iron;manganese;methane;molybdenum;nickel;silicon;tungsten Chemical compound C.[Si].[Cr].[Mn].[Fe].[Co].[Ni].[Mo].[W] AHICWQREWHDHHF-UHFFFAOYSA-N 0.000 description 1
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- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
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- 125000005805 dimethoxy phenyl group Chemical group 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
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- HASCQPSFPAKVEK-UHFFFAOYSA-N dimethyl(phenyl)phosphine Chemical compound CP(C)C1=CC=CC=C1 HASCQPSFPAKVEK-UHFFFAOYSA-N 0.000 description 1
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- HTDKEJXHILZNPP-UHFFFAOYSA-N dioctyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OCCCCCCCC HTDKEJXHILZNPP-UHFFFAOYSA-N 0.000 description 1
- XMQYIPNJVLNWOE-UHFFFAOYSA-N dioctyl hydrogen phosphite Chemical compound CCCCCCCCOP(O)OCCCCCCCC XMQYIPNJVLNWOE-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
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- 238000004898 kneading Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000005699 methyleneoxy group Chemical group [H]C([H])([*:1])O[*:2] 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- LIBWSLLLJZULCP-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)aniline Chemical compound CCO[Si](OCC)(OCC)CCCNC1=CC=CC=C1 LIBWSLLLJZULCP-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- XPPWLXNXHSNMKC-UHFFFAOYSA-N phenylboron Chemical class [B]C1=CC=CC=C1 XPPWLXNXHSNMKC-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
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- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 229920001921 poly-methyl-phenyl-siloxane Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000003918 potentiometric titration Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
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- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical class NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical class S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- XAEWLETZEZXLHR-UHFFFAOYSA-N zinc;dioxido(dioxo)molybdenum Chemical compound [Zn+2].[O-][Mo]([O-])(=O)=O XAEWLETZEZXLHR-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
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- H01—ELECTRIC ELEMENTS
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00011—Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/0665—Epoxy resin
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
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- H—ELECTRICITY
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Abstract
本発明は、エポキシ樹脂と、芳香族アミン化合物と、硬化促進剤として、下記一般式(I)で表される構造部位を有する化合物群の中から選ばれる少なくとも1種の化合物と、を含有する電子部品用樹脂組成物を提供する。式中、L1は、炭素原子、水素原子及び酸素原子から構成される2価の基、又は2価の炭化水素基を示す。R1〜R3はそれぞれ独立に、炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる1種以上の原子から構成される1価の基、1価の炭化水素基、又は水素原子を示す。R4〜R7はそれぞれ独立に、炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる1種以上の原子から構成される1価の基、1価の炭化水素基、水酸基、又は水素原子を示す。またR4〜R7から選ばれる2つの基は互いに結合して環を形成してもよい。The present invention contains an epoxy resin, an aromatic amine compound, and at least one compound selected from the group of compounds having a structural moiety represented by the following general formula (I) as a curing accelerator. A resin composition for electronic parts is provided. In formula, L1 shows the bivalent group comprised from a carbon atom, a hydrogen atom, and an oxygen atom, or a bivalent hydrocarbon group. R1 to R3 each independently represents a monovalent group, a monovalent hydrocarbon group, or a hydrogen atom composed of one or more atoms selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom, and a sulfur atom. Show. R4 to R7 are each independently a monovalent group, a monovalent hydrocarbon group, a hydroxyl group, or hydrogen composed of one or more atoms selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom, and a sulfur atom. Indicates an atom. Two groups selected from R4 to R7 may be bonded to each other to form a ring.
Description
本発明は、電子部品用樹脂組成物及び電子部品装置に関する。 The present invention relates to a resin composition for electronic components and an electronic component device.
従来から、トランジスタ、IC等の電子部品装置の素子封止の分野では生産性、コストなどの面から樹脂封止が主流となり、エポキシ樹脂組成物が広く用いられている。この理由としては、エポキシ樹脂が作業性、成形性、電気特性、耐湿性、耐熱性、機械特性、インサート品との接着性などの諸特性にバランスがとれているためである。COB(Chip on Board)、COG(Chip on Glass)、TCP(Tape Carrier Package)等のベアチップ実装した半導体装置においては電子部品用液状樹脂組成物が封止材として広く使用されている。また、半導体素子をセラミック、ガラス/エポキシ樹脂、ガラス/イミド樹脂またはポリイミドフィルムなどを基板とする配線基板上に直接バンプ接続してなる半導体装置(フリップチップ)では、バンプ接続した半導体素子と配線基板の間隙(ギャップ)を充填するアンダーフィル材として電子部品用液状樹脂組成物が使用されている。これらの電子部品用液状樹脂組成物は電子部品を温湿度や機械的な外力から保護するために重要な役割を果たしている。 Conventionally, in the field of element sealing of electronic component devices such as transistors and ICs, resin sealing has been the mainstream in terms of productivity and cost, and epoxy resin compositions have been widely used. This is because the epoxy resin is balanced in various properties such as workability, moldability, electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesion to inserts. Liquid resin compositions for electronic components are widely used as sealing materials in semiconductor devices mounted on bare chips such as COB (Chip on Board), COG (Chip on Glass), and TCP (Tape Carrier Package). Further, in a semiconductor device (flip chip) in which a semiconductor element is directly bump-connected to a wiring board having a ceramic, glass / epoxy resin, glass / imide resin, or polyimide film as a substrate, the bump-connected semiconductor element and the wiring board A liquid resin composition for electronic parts is used as an underfill material for filling the gap. These liquid resin compositions for electronic parts play an important role in protecting electronic parts from temperature and humidity and mechanical external force.
フリップチップ実装を行なう場合、素子と基板はそれぞれ熱膨張係数が異なるため、接合部に熱応力が発生する。そのため接続信頼性の確保が重要な課題である。また、ベアチップは回路形成面が充分に保護されていないため、水分やイオン性不純物が浸入し易く耐湿信頼性の確保も重要な課題である。またチップ保護のために、チップ側面にフィレットを形成するが、アンダーフィル材とチップとの熱膨張差に起因した熱応力によって、樹脂にクラックを生じ、その結果として最悪の場合、チップを破壊する恐れがある。さらにアンダーフィル材の選定によっては温度サイクル試験などで繰り返し熱衝撃を受ける場合に接続部の保護が不充分なため、低サイクルで接合部が疲労破壊することがある。またアンダーフィル材中にボイドが存在すると、バンプの保護が不充分なため、同様に低サイクルで接合部が疲労破壊することがある。 When flip chip mounting is performed, the element and the substrate have different coefficients of thermal expansion, and thermal stress is generated at the joint. Therefore, ensuring connection reliability is an important issue. In addition, since the circuit forming surface of the bare chip is not sufficiently protected, moisture and ionic impurities are liable to enter, and ensuring moisture resistance reliability is also an important issue. In order to protect the chip, fillets are formed on the side of the chip, but the thermal stress caused by the difference in thermal expansion between the underfill material and the chip causes cracks in the resin, resulting in the worst case destroying the chip. There is a fear. Furthermore, depending on the selection of the underfill material, the joint may not be sufficiently protected when subjected to repeated thermal shocks in a temperature cycle test or the like, and the joint may be fatigued at low cycles. Further, if voids are present in the underfill material, the bumps are not sufficiently protected, and the joint portion may be similarly fatigued at low cycles.
上記状況の下、耐湿接着力、低応力性に優れた封止用エポキシ樹脂組成物、及びこれにより封止された素子を備えた信頼性(耐湿性、耐熱衝撃性)の高い電子部品装置を提供するため、(A)液状エポキシ樹脂、(B)液状芳香族アミンを含む硬化剤、(C)エラストマー、(D)界面活性剤を含有してなる封止用エポキシ樹脂組成物、及びこの封止用エポキシ樹脂組成物により封止された素子を備えた電子部品装置が開示されている(例えば、特許第3716237号公報参照)。 Under the above circumstances, an epoxy resin composition for sealing excellent in moisture-resistant adhesive strength and low stress resistance, and an electronic component device having high reliability (moisture resistance and thermal shock resistance) provided with an element sealed thereby In order to provide, (A) a liquid epoxy resin, (B) a curing agent containing a liquid aromatic amine, (C) an elastomer, (D) an epoxy resin composition for sealing containing a surfactant, and this sealing An electronic component device including an element sealed with a stopping epoxy resin composition is disclosed (for example, see Japanese Patent No. 3716237).
最近の素子の高集積度化、多機能化に伴いチップサイズが大きくなってきている一方、多ピン化によってバンプの小径化、狭ピッチ化、狭ギャップ化が進んでいる。さらに搭載機器の小型化に伴いチップ厚の薄型化が進んでおり、エラストマーと界面活性剤を添加したのみでは、電子部品装置の高い信頼性を確保することがますます難しくなってきている。 While the chip size has increased with the recent increase in the degree of integration and functionality of the device, the bump diameter has been reduced, the pitch has been reduced, and the gap has been reduced due to the increase in the number of pins. Furthermore, chip thickness has been reduced with the miniaturization of on-board equipment, and it has become increasingly difficult to ensure high reliability of electronic component devices only by adding an elastomer and a surfactant.
本発明は、このような事情に鑑みなされたもので、ポットライフが長く、ゲルタイムが速く硬化温度の低温化が可能な電子部品用樹脂組成物、並びにこれにより封止され、耐湿性及び耐温度サイクル性という信頼性に優れる電子部品装置を提供することを課題とする。 The present invention has been made in view of such circumstances, and has a long pot life, a fast gel time, and a resin composition for electronic components capable of lowering the curing temperature, as well as being sealed with moisture resistance and temperature resistance. It is an object of the present invention to provide an electronic component device that is excellent in reliability such as cycle performance.
本発明者らは、鋭意検討の結果、特定の硬化剤と硬化促進剤を含有する電子部品用樹脂組成物を見出した。本発明は以下の態様を包含する。 As a result of intensive studies, the present inventors have found a resin composition for electronic parts containing a specific curing agent and a curing accelerator. The present invention includes the following aspects.
<1> エポキシ樹脂と、芳香族アミン化合物と、下記一般式(I)で表される構造部位を有する化合物群の中から選ばれる少なくとも1種の化合物を含む硬化促進剤と、を含有する電子部品用樹脂組成物である。 <1> An electron containing an epoxy resin, an aromatic amine compound, and a curing accelerator containing at least one compound selected from the group of compounds having a structural moiety represented by the following general formula (I) It is a resin composition for parts.
(式中、L1は、炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基、又は炭素数1〜18の2価の炭化水素基を示す。
R1〜R3はそれぞれ独立に、炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる少なくとも1種の原子から構成される炭素数1〜18の1価の基、炭素数1〜18の1価の炭化水素基、又は水素原子を示す。
R4〜R7はそれぞれ独立に、炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる少なくとも1種の原子から構成される炭素数1〜18の1価の基、炭素数1〜18の1価の炭化水素基、水酸基、又は水素原子を示す。またR4〜R7から選ばれる隣接する2つの基は互いに結合して環を形成してもよい。)(Wherein, L 1 represents a carbon atom, a divalent group having 1 to 18 carbon atoms comprised of hydrogen atoms and oxygen atoms, or a divalent hydrocarbon group having 1 to 18 carbon atoms.
R 1 to R 3 are each independently a monovalent group having 1 to 18 carbon atoms composed of at least one atom selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom and a sulfur atom; -18 monovalent hydrocarbon groups or hydrogen atoms.
R 4 to R 7 are each independently a monovalent group having 1 to 18 carbon atoms composed of at least one atom selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom and a sulfur atom; -18 monovalent hydrocarbon groups, hydroxyl groups, or hydrogen atoms. Two adjacent groups selected from R 4 to R 7 may be bonded to each other to form a ring. )
<2> 前記硬化促進剤は、下記一般式(IIa)、(IIb)及び(IIc)のいずれかで表される化合物を含む前記<1>に記載の電子部品用樹脂組成物である。 <2> The said hardening accelerator is a resin composition for electronic components as described in said <1> containing the compound represented by either of the following general formula (IIa), (IIb), and (IIc).
(式中、L21は、炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基、又は炭素数1〜18の2価の炭化水素基を示す。R21〜R26はそれぞれ独立に、水素原子又は炭素数1〜18の1価の炭化水素基を示す。Arは、炭素数6〜18のm価の芳香族炭化水素基、又は少なくとも2つの炭素数6〜18の芳香族炭化水素基が単結合若しくは炭素数1〜12の直鎖状又は分岐鎖状のアルキレン基、カルボニル基及び酸素原子からなる群より選ばれる少なくとも1種からなる連結基で連結されて全体としてm価となる基を示す。mは2〜8の整数を示し、nは0〜20の整数を示す。) (Wherein, L 21 is a carbon atom, a divalent group having from 1 to 18 hydrogen atoms and carbon atoms composed of an oxygen atom, or .R 21 ~ for a divalent hydrocarbon group having 1 to 18 carbon atoms R 26 each independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 18 carbon atoms, Ar represents an m-valent aromatic hydrocarbon group having 6 to 18 carbon atoms, or at least two carbon atoms having 6 carbon atoms. -18 aromatic hydrocarbon groups are linked by a linking group consisting of at least one selected from the group consisting of a single bond or a linear or branched alkylene group having 1 to 12 carbon atoms, a carbonyl group and an oxygen atom. And m represents an integer of 2 to 8, m represents an integer of 2 to 8, and n represents an integer of 0 to 20.)
<3> 前記硬化促進剤は、下記一般式(III)で表される化合物を含む前記<1>に記載の電子部品用樹脂組成物である。 <3> The said hardening accelerator is a resin composition for electronic components as described in said <1> containing the compound represented by the following general formula (III).
(式中、L21は、炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基、又は炭素数1〜18の2価の炭化水素基を示す。R21〜R23はそれぞれ独立に、水素原子又は炭素数1〜18の1価の炭化水素基を示す。R27は、水素原子又は下記一般式(IIIa)若しくは一般式(IIIb)で表される基を示す。 (Wherein, L 21 is a carbon atom, a divalent group having from 1 to 18 hydrogen atoms and carbon atoms composed of an oxygen atom, or .R 21 ~ for a divalent hydrocarbon group having 1 to 18 carbon atoms R 23 each independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 18 carbon atoms, and R 27 represents a hydrogen atom or a group represented by the following general formula (IIIa) or general formula (IIIb). Show.
Arは、炭素数6〜18のm価の芳香族炭化水素基、又は2以上の炭素数6〜18の芳香族炭化水素基が単結合若しくは炭素数1〜12のアルキレン基、カルボニル基及び酸素原子からなる群より選ばれる少なくとも1種からなる連結基で連結されて全体としてm価となる基を示す。
mは1〜8の整数を示し、pは1〜8の整数を示し、m≧pである。)Ar represents an m-valent aromatic hydrocarbon group having 6 to 18 carbon atoms, or an aromatic hydrocarbon group having 2 or more carbon atoms having a single bond or an alkylene group having 1 to 12 carbon atoms, a carbonyl group, and oxygen. A group which is linked by at least one linking group selected from the group consisting of atoms and becomes m-valent as a whole is shown.
m represents an integer of 1 to 8, p represents an integer of 1 to 8, and m ≧ p. )
<4> 前記硬化促進剤は、フェノール性水酸基を有する化合物の少なくとも1種と、ビニルエーテル基を有する化合物の少なくとも1種との付加反応生成物である前記<1>〜<3>のいずれか1つに記載の電子部品用樹脂組成物である。 <4> The curing accelerator is any one of the above <1> to <3>, which is an addition reaction product of at least one compound having a phenolic hydroxyl group and at least one compound having a vinyl ether group. It is a resin composition for electronic components as described in one.
<5> 前記エポキシ樹脂は液状エポキシ樹脂である前記<1>〜<4>のいずれか1つに記載の電子部品用樹脂組成物である。 <5> The resin composition for electronic components according to any one of <1> to <4>, wherein the epoxy resin is a liquid epoxy resin.
<6> 前記芳香族アミン化合物は液状芳香族アミン化合物である前記<1>〜<5>のいずれか1つに記載の電子部品用樹脂組成物。 <6> The resin composition for electronic components according to any one of <1> to <5>, wherein the aromatic amine compound is a liquid aromatic amine compound.
<7> さらに無機充填剤を含有し、前記無機充填剤の含有率が電子部品用樹脂組成物の総質量中に50質量%以上80質量%以下の範囲である前記<1>〜<6>のいずれか1つに記載の電子部品用樹脂組成物である。 <7> The above <1> to <6>, further containing an inorganic filler, wherein the content of the inorganic filler is in the range of 50% by mass to 80% by mass in the total mass of the resin composition for electronic components. It is the resin composition for electronic components as described in any one of these.
<8> 前記芳香族アミン化合物は、3,3’−ジエチル−4,4’−ジアミノジフェニルメタン及びジエチルトルエンジアミンからなる群より選ばれる少なくとも一つを含有する前記<1>〜<7>のいずれか1つに記載の電子部品用樹脂組成物である。 <8> Any of the above <1> to <7>, wherein the aromatic amine compound contains at least one selected from the group consisting of 3,3′-diethyl-4,4′-diaminodiphenylmethane and diethyltoluenediamine. It is the resin composition for electronic components as described in any one.
<9> 半導体素子と、前記半導体素子の電極が形成された面と対向する面上に回路を有する無機又は有機の基板と、前記半導体素子と前記基板との間に挟持され、前記電極と前記回路とを電気的に接続するバンプと、前記半導体素子と前記基板との間隙に充填された前記<1>〜<8>のいずれか1つに記載の電子部品用樹脂組成物の硬化物と、を有する電子部品装置である。 <9> A semiconductor element, an inorganic or organic substrate having a circuit on a surface opposite to a surface on which the electrode of the semiconductor element is formed, and the semiconductor element and the substrate are sandwiched between the electrode and the electrode A bump for electrically connecting a circuit; and a cured product of the resin composition for electronic components according to any one of <1> to <8>, which is filled in a gap between the semiconductor element and the substrate. , An electronic component device.
本発明によれば、ポットライフが長く、ゲルタイムが速くて硬化温度の低温化が可能な電子部品用樹脂組成物、並びにこれにより封止され、耐湿性及び耐温度サイクル性という信頼性に優れる電子部品装置を提供することができる。 According to the present invention, a resin composition for electronic parts that has a long pot life, a fast gel time, and a low curing temperature, and an electron that is sealed by this and has excellent reliability such as moisture resistance and temperature cycle resistance. A component device can be provided.
本明細書において「工程」との語は、独立した工程だけではなく、他の工程と明確に区別できない場合であってもその工程の所期の目的が達成されれば、本用語に含まれる。また「〜」を用いて示された数値範囲は、「〜」の前後に記載される数値をそれぞれ最小値及び最大値として含む範囲を示す。さらに組成物中の各成分の量は、組成物中に各成分に該当する物質が複数存在する場合、特に断らない限り、組成物中に存在する当該複数の物質の合計量を意味する。 In this specification, the term “process” is not limited to an independent process, and is included in the term if the intended purpose of the process is achieved even when it cannot be clearly distinguished from other processes. . Moreover, the numerical range shown using "to" shows the range which includes the numerical value described before and behind "to" as a minimum value and a maximum value, respectively. Further, the amount of each component in the composition means the total amount of the plurality of substances present in the composition unless there is a specific notice when there are a plurality of substances corresponding to each component in the composition.
<電子部品用樹脂組成物>
本発明の電子部品用樹脂組成物は、(A)エポキシ樹脂の少なくとも1種と、(B)芳香族アミン化合物少なくとも1種と、下記一般式(I)で表される構造部位を有する化合物群の中から選ばれる少なくとも1種の化合物(以下、「特定硬化促進化合物」ともいう)を含む(C)硬化促進剤とを含有することを特徴とする。<Resin composition for electronic parts>
The resin composition for electronic parts of the present invention comprises (A) at least one epoxy resin, (B) at least one aromatic amine compound, and a compound group having a structural moiety represented by the following general formula (I) And (C) a curing accelerator containing at least one compound selected from the above (hereinafter also referred to as “specific curing accelerating compound”).
式中、L1は、炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基、又は炭素数1〜18の2価の炭化水素基を示す。R1〜R3はそれぞれ独立に、炭素原子、水素原子、酸素原子及び硫黄原子から選ばれる少なくとも1種から構成される炭素数1〜18の1価の基、炭素数1〜18の1価の炭化水素基、又は水素原子を示す。R4〜R7はそれぞれ独立に、炭素原子、水素原子、酸素原子及び硫黄原子から選ばれる少なくとも1種から構成される炭素数1〜18の1価の基、炭素数1〜18の1価の炭化水素基、水酸基、又は水素原子を示す。
またR4〜R7から選ばれる隣接する2つの基は互いに結合して環構造を形成してもよい。Wherein, L 1 represents a carbon atom, a divalent group having 1 to 18 carbon atoms comprised of hydrogen atoms and oxygen atoms, or a divalent hydrocarbon group having 1 to 18 carbon atoms. R 1 to R 3 are each independently a monovalent group having 1 to 18 carbon atoms composed of at least one selected from a carbon atom, a hydrogen atom, an oxygen atom and a sulfur atom, and a monovalent group having 1 to 18 carbon atoms. Represents a hydrocarbon group or a hydrogen atom. R 4 to R 7 are each independently a monovalent group having 1 to 18 carbon atoms composed of at least one selected from a carbon atom, a hydrogen atom, an oxygen atom and a sulfur atom, and a monovalent group having 1 to 18 carbon atoms. Represents a hydrocarbon group, a hydroxyl group, or a hydrogen atom.
Two adjacent groups selected from R 4 to R 7 may be bonded to each other to form a ring structure.
前記電子部品用樹脂組成物は、特定構造の化合物を含む硬化促進剤を含有することにより、ポットライフと狭ギャップでの流動性に優れ、成形時のボイドの発生を抑制するとともに、ゲルタイムが短縮され、硬化温度の低温化を可能にする。また、形成される硬化物は、吸湿による各種基材との接着力の低下が小さく、吸湿後においても各種基材との接着力が高い。さらにチップにかかる熱応力が低減される。よって、この電子部品用樹脂組成物を用いて電子部品を封止すれば、成形性、信頼性の高い電子部品装置を得ることができるので、その工業的価値は極めて大きい。 By containing a curing accelerator containing a compound having a specific structure, the resin composition for electronic parts has excellent pot life and fluidity in a narrow gap, suppresses the generation of voids during molding, and shortens the gel time. This makes it possible to lower the curing temperature. Moreover, the cured | curing material formed has the small fall of the adhesive force with various base materials by moisture absorption, and the adhesive strength with various base materials is high after moisture absorption. Furthermore, the thermal stress applied to the chip is reduced. Therefore, if an electronic component is sealed using this resin composition for electronic components, an electronic component device with high moldability and reliability can be obtained, and its industrial value is extremely high.
これは例えば以下のように考えることができる。前記特定硬化促進化合物においては、硬化促進作用を有するフェノール性水酸基にビニル基が付加してブロックされた状態であるため、保存安定性及び各種の信頼性に優れると考えられる。さらに硬化時には加熱によりビニル基が速やかに脱離するため、ゲルタイムが短縮され、硬化温度の低温化が図れるものと考えることができる。 This can be considered as follows, for example. The specific curing accelerating compound is considered to be excellent in storage stability and various reliability because it is blocked by adding a vinyl group to a phenolic hydroxyl group having a curing accelerating action. Further, since the vinyl group is rapidly desorbed by heating at the time of curing, it can be considered that the gel time is shortened and the curing temperature can be lowered.
前記電子部品用樹脂組成物は液状であることが好ましい。なお、本明細書において液状とは、常温(25℃)において液状であることを意味する。具体的には、25℃において、E型粘度計で測定される粘度が1000Pa・s以下であることを意味する。但し、本発明の電子部品用樹脂組成物が、反応などにより硬化した場合は、常温においても固体となる場合もある。尚、上記粘度は、E型粘度計EHD型(コーン角度3°、コーン直径28mm)を用いて、測定温度:25℃、サンプル容量:0.7ml、以下を参考に回転数をサンプルの想定される粘度に合わせて設定の上、測定開始から1分経過後の値を測定値とする。
(1)想定される粘度が100Pa・s以上1000Pa・s以下の場合:回転数0.5rpm
(2)想定される粘度が100Pa・s未満の場合:回転数5rpmThe resin composition for electronic parts is preferably liquid. In this specification, liquid means liquid at normal temperature (25 ° C.). Specifically, it means that the viscosity measured with an E-type viscometer is 1000 Pa · s or less at 25 ° C. However, when the resin composition for electronic parts of the present invention is cured by reaction or the like, it may become a solid even at room temperature. In addition, the viscosity is assumed to be a sample using an E-type viscometer EHD type (cone angle 3 °, cone diameter 28 mm), measurement temperature: 25 ° C., sample volume: 0.7 ml, and referring to the following. The value after one minute has elapsed from the start of measurement is set as the measured value.
(1) When the assumed viscosity is 100 Pa · s or more and 1000 Pa · s or less: Rotational speed: 0.5 rpm
(2) When the assumed viscosity is less than 100 Pa · s: 5 rpm
(A)エポキシ樹脂
本発明の電子部品用樹脂組成物は、少なくとも1種のエポキシ樹脂を含む。前記エポキシ樹脂は特に制限されず、通常用いられるエポキシ樹脂から適宜選択することができる。中でも1分子中に2個以上のエポキシ基を有するものであることが好ましく、1分子中に2個以上のエポキシ基を有し、常温において液状である液状エポキシ樹脂であることがより好ましい。(A) Epoxy resin The resin composition for electronic components of the present invention contains at least one epoxy resin. The epoxy resin is not particularly limited and can be appropriately selected from conventionally used epoxy resins. Among them, those having two or more epoxy groups in one molecule are preferable, and liquid epoxy resins having two or more epoxy groups in one molecule and liquid at normal temperature are more preferable.
エポキシ樹脂としては、電子部品用樹脂組成物で一般に使用されているエポキシ樹脂を用いることができる。前記エポキシ樹脂としては、例えば、ビスフェノールA、ビスフェノールF、ビスフェノールAD、ビスフェノールS、水添ビスフェノールA等のジグリシジルエーテルであるビスフェノール型エポキシ樹脂;オルソクレゾールノボラック型エポキシ樹脂を代表とするフェノール類とアルデヒド類を縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したエポキシ樹脂;フタル酸、ダイマー酸等の多塩基酸とエピクロルヒドリンの反応により得られるグリシジルエステル型エポキシ樹脂;p―アミノフェノール、ジアミノジフェニルメタン、イソシアヌル酸等のアミン化合物とエピクロルヒドリンの反応により得られるグリシジルアミン型エポキシ樹脂;オレフィン結合を過酢酸等の過酸により酸化して得られる線状脂肪族エポキシ樹脂、脂環族エポキシ樹脂などが挙げられる。これらは単独で用いても2種以上を組み合わせて用いてもよい。
中でも、流動性の観点からは、液状のビスフェノール型エポキシ樹脂が好ましい。また耐熱性、接着性及び流動性の観点からは、液状のグリシジルアミン型エポキシ樹脂が好ましい。As an epoxy resin, the epoxy resin generally used with the resin composition for electronic components can be used. Examples of the epoxy resin include bisphenol-type epoxy resins that are diglycidyl ethers such as bisphenol A, bisphenol F, bisphenol AD, bisphenol S, and hydrogenated bisphenol A; Epoxy resin obtained by epoxidizing a novolak resin obtained by condensation or co-condensation of alcohols; glycidyl ester type epoxy resin obtained by reaction of polybasic acid such as phthalic acid and dimer acid and epichlorohydrin; Glycidylamine-type epoxy resin obtained by reaction of amine compounds such as isocyanuric acid and epichlorohydrin; linear aliphatic epoxy obtained by oxidizing olefinic bonds with peracids such as peracetic acid Fat, such as alicyclic epoxy resins. These may be used alone or in combination of two or more.
Among these, from the viewpoint of fluidity, a liquid bisphenol type epoxy resin is preferable. From the viewpoint of heat resistance, adhesiveness and fluidity, liquid glycidylamine type epoxy resins are preferred.
前記液状エポキシ樹脂(好ましくは、液状のビスフェノール型エポキシ樹脂及び液状のグリシジルアミン型エポキシ樹脂からなる群より選ばれる少なくとも1種)は、いずれか1種を単独で用いても、2種以上を組合せて用いてもよい。液状エポキシ樹脂の含有率は、その性能を発揮するためにエポキシ樹脂全量中に、合わせて30質量%以上であることが好ましく、50質量%以上であることがより好ましく、70質量%以上であることがさらに好ましい。 The liquid epoxy resin (preferably at least one selected from the group consisting of a liquid bisphenol-type epoxy resin and a liquid glycidylamine-type epoxy resin) may be used alone or in combination of two or more. May be used. The content of the liquid epoxy resin is preferably 30% by mass or more, more preferably 50% by mass or more, and more preferably 70% by mass or more in the total amount of the epoxy resin in order to exhibit its performance. More preferably.
また前記電子部品用樹脂組成物は、本発明の効果が達成される範囲内であれば固形エポキシ樹脂を含んでいてもよい。電子部品用樹脂組成物が固形エポキシ樹脂を含む場合、固形エポキシ樹脂の含有率は、成形時の流動性の観点から、エポキシ樹脂全量中において70質量%以下であることが好ましく、50質量%以下であることがより好ましく、30質量%以下であることがさらに好ましい。なお、固形エポキシ樹脂とは常温(25℃)において固体状のエポキシ樹脂であることを意味する。 Moreover, the said resin composition for electronic components may contain the solid epoxy resin if it is in the range with which the effect of this invention is achieved. When the resin composition for electronic parts contains a solid epoxy resin, the content of the solid epoxy resin is preferably 70% by mass or less and 50% by mass or less in the total amount of the epoxy resin from the viewpoint of fluidity during molding. It is more preferable that it is 30% by mass or less. In addition, a solid epoxy resin means that it is a solid epoxy resin at normal temperature (25 degreeC).
前記エポキシ樹脂のエポキシ当量は特に制限されない。中でも、50以上5000以下であることが好ましく、70以上1000以下であることがより好ましく、70以上500以下であることがさらに好ましい。 The epoxy equivalent of the epoxy resin is not particularly limited. Especially, it is preferable that it is 50-5000, More preferably, it is 70-1000, More preferably, it is 70-500.
前記エポキシ樹脂の純度、特に加水分解性塩素量は、ICなど素子上のアルミ配線腐食に係わるため少ない方が好ましく、耐湿性の優れた電子部品用樹脂組成物を得るためには500ppm以下であることが好ましい。ここで、加水分解性塩素量とは試料のエポキシ樹脂1gをジオキサン30mlに溶解し、1M−KOHメタノール溶液5mlを添加して30分間、過熱還流後、電位差滴定により求めた値を尺度としたものである。 The purity of the epoxy resin, particularly the amount of hydrolyzable chlorine, is preferably less because it relates to corrosion of aluminum wiring on the IC and other elements, and is 500 ppm or less in order to obtain a resin composition for electronic parts having excellent moisture resistance. It is preferable. Here, the amount of hydrolyzable chlorine is a value obtained by dissolving 1 g of the epoxy resin of the sample in 30 ml of dioxane, adding 5 ml of 1M-KOH methanol solution, refluxing for 30 minutes and then potentiometric titration. It is.
前記電子部品用樹脂組成物中における、前記エポキシ樹脂の含有率は特に制限されない。例えば粘度及び強度の観点から、5質量%〜90質量%であることが好ましく、10質量%〜70質量%であることがより好ましい。 The content of the epoxy resin in the resin composition for electronic parts is not particularly limited. For example, from the viewpoint of viscosity and strength, it is preferably 5% by mass to 90% by mass, and more preferably 10% by mass to 70% by mass.
(B)芳香族アミン化合物
前記電子部品用樹脂組成物は、少なくとも1種の芳香族アミン化合物を含む。前記芳香族アミン化合物は、芳香族環基を有するアミン化合物を含むものであれば特に制限はない。中でも常温で液状の芳香族アミン化合物であることが好ましい。電子部品用樹脂組成物において、前記芳香族アミン化合物は、例えば硬化剤として機能する。(B) Aromatic amine compound The resin composition for electronic parts contains at least one aromatic amine compound. The aromatic amine compound is not particularly limited as long as it includes an amine compound having an aromatic ring group. Among them, an aromatic amine compound that is liquid at room temperature is preferable. In the resin composition for electronic parts, the aromatic amine compound functions as a curing agent, for example.
芳香族アミン化合物としては、ジエチルトルエンジアミン、1−メチル−3,5−ジエチル−2,4−ジアミノベンゼン、1−メチル−3,5−ジエチル−2,6−ジアミノベンゼン、1,3,5−トリエチル−2,6−ジアミノベンゼン、3,3’−ジエチル−4,4’−ジアミノジフェニルメタン、3,5,3’,5’−テトラメチル−4,4’−ジアミノジフェニルメタン等が挙げられる。 As aromatic amine compounds, diethyltoluenediamine, 1-methyl-3,5-diethyl-2,4-diaminobenzene, 1-methyl-3,5-diethyl-2,6-diaminobenzene, 1,3,5 -Triethyl-2,6-diaminobenzene, 3,3′-diethyl-4,4′-diaminodiphenylmethane, 3,5,3 ′, 5′-tetramethyl-4,4′-diaminodiphenylmethane and the like.
これらの芳香族アミン化合物は、例えば、市販品として、jERキュアW(三菱化学株式会社製、商品名)、カヤハードA−A、カヤハードA−B、カヤハードA−S(日本化薬株式会社製、商品名)、トートアミンHM−205(東都化成株式会社製、商品名)、アデカハードナーEH−101(旭電化工業株式会社製、商品名)、エポミックQ−640、エポミックQ−643(三井化学株式会社製、商品名)、DETDA80(Lonza社製、商品名)などが入手可能である。
これらの芳香族アミン化合物は、単独で用いても2種類以上を組み合わせて用いてもよい。These aromatic amine compounds are, for example, commercially available products such as jER Cure W (trade name, manufactured by Mitsubishi Chemical Corporation), Kayahard A-A, Kayahard AB, Kayahard AS (manufactured by Nippon Kayaku Co., Ltd., Product name), Totoamine HM-205 (trade name, manufactured by Toto Kasei Co., Ltd.), Adeka Hardener EH-101 (trade name, manufactured by Asahi Denka Kogyo Co., Ltd.), Epomic Q-640, Epomic Q-643 (Mitsui Chemicals, Inc.) Company name, product name), DETDA80 (Lonza company name, product name) and the like are available.
These aromatic amine compounds may be used alone or in combination of two or more.
前記芳香族アミン化合物のなかでも保存安定性の観点から、3,3’−ジエチル−4,4’−ジアミノジフェニルメタン及びジエチルトルエンジアミンからなる群より選ばれる少なくとも1種が好ましく、全芳香族アミン化合物中に、3,3’−ジエチル−4,4’−ジアミノジフェニルメタン及びジエチルトルエンジアミンからなる群より選ばれる少なくとも1種を20質量%以上含有することがより好ましく、全芳香族アミン化合物中に、3,3’−ジエチル−4,4’−ジアミノジフェニルメタン及びジエチルトルエンジアミンからなる群より選ばれる少なくとも1種を30質量%以上含有することがさらに好ましい。 Among the aromatic amine compounds, from the viewpoint of storage stability, at least one selected from the group consisting of 3,3′-diethyl-4,4′-diaminodiphenylmethane and diethyltoluenediamine is preferable. It is more preferable to contain 20% by mass or more of at least one selected from the group consisting of 3,3′-diethyl-4,4′-diaminodiphenylmethane and diethyltoluenediamine, and in the wholly aromatic amine compound, It is more preferable to contain 30% by mass or more of at least one selected from the group consisting of 3,3′-diethyl-4,4′-diaminodiphenylmethane and diethyltoluenediamine.
前記ジエチルトルエンジアミンとしては、3,5−ジエチルトルエン−2,4−ジアミン及び3,5−ジエチルトルエン−2,6−ジアミンが挙げられる。これらは単独で用いても混合物で用いてもよい。
特に、3,5−ジエチルトルエン−2,4−ジアミンを全芳香族アミン化合物中に60質量%以上含むことが好ましい。Examples of the diethyltoluenediamine include 3,5-diethyltoluene-2,4-diamine and 3,5-diethyltoluene-2,6-diamine. These may be used alone or in a mixture.
In particular, it is preferable that 60% by mass or more of 3,5-diethyltoluene-2,4-diamine is contained in the wholly aromatic amine compound.
前記芳香族アミン化合物の活性水素当量は特に制限されない。中でも30以上1000以下であることが好ましく、30以上500以下であることがより好ましく、30以上200以下であることが更に好ましい。 The active hydrogen equivalent of the aromatic amine compound is not particularly limited. Among these, it is preferably 30 or more and 1000 or less, more preferably 30 or more and 500 or less, and further preferably 30 or more and 200 or less.
前記電子部品用樹脂組成物は、本発明の効果が達成される範囲内であれば上記の芳香族アミン化合物に加えて、芳香族アミン化合物以外のアミン系硬化剤、フェノール性硬化剤、酸無水物等の電子部品用樹脂組成物で一般に使用されているその他の硬化剤を併用することができる。その他の硬化剤は、液状硬化剤であっても、固形硬化剤であってもよい。
その他の硬化剤を併用する場合、前記芳香族アミン化合物の含有率は、その性能を発揮するために、硬化剤全量中において60質量%以上とすることが好ましい。In the electronic component resin composition, in addition to the aromatic amine compound, an amine-based curing agent other than the aromatic amine compound, a phenolic curing agent, an acid anhydride, as long as the effects of the present invention are achieved. The other hardening | curing agent generally used with the resin composition for electronic components, such as a thing, can be used together. The other curing agent may be a liquid curing agent or a solid curing agent.
When other curing agents are used in combination, the content of the aromatic amine compound is preferably 60% by mass or more in the total amount of the curing agent in order to exhibit its performance.
前記電子部品用樹脂組成物に含まれる(A)エポキシ樹脂と(B)芳香族アミン化合物を含む硬化剤との当量比は特に制限はない。それぞれの未反応分を少なく抑えるために、エポキシ樹脂1.0当量に対して硬化剤を0.7当量以上1.8当量以下の範囲に設定することが好ましく、0.8当量以上1.6当量以下がより好ましく、1.0以上1.5当量以下が更に好ましい。 There is no particular limitation on the equivalent ratio of (A) the epoxy resin and (B) the curing agent containing the aromatic amine compound contained in the resin composition for electronic parts. In order to reduce the amount of each unreacted component, it is preferable to set the curing agent in the range of 0.7 equivalents or more and 1.8 equivalents or less with respect to 1.0 equivalent of the epoxy resin, and 0.8 equivalents or more and 1.6 equivalents or less. An equivalent or less is more preferable, and 1.0 or more and 1.5 equivalents or less are still more preferable.
(C)硬化促進剤
前記電子部品用樹脂組成物は、下記一般式(I)で表される構造部位を有する化合物群の中から選ばれる少なくとも1種の化合物(特定硬化促進化合物)を含む硬化促進剤を含有する。(C) Curing accelerator The resin composition for an electronic component includes at least one compound (specific curing accelerating compound) selected from the group of compounds having a structural moiety represented by the following general formula (I). Contains an accelerator.
式中、L1は、「炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基」又は「炭素数1〜18の2価の炭化水素基」を示す。R1〜R3はそれぞれ独立に、「炭素原子、水素原子、酸素原子及び硫黄原子から選ばれる少なくとも1種からから構成される炭素数1〜18の1価の基」、「炭素数1〜18の1価の炭化水素基」、又は「水素原子」を示す。R4〜R7はそれぞれ独立に、「炭素原子、水素原子、酸素原子及び硫黄原子から選ばれる少なくとも1種から構成される炭素数1〜18の1価の基」、「炭素数1〜18の1価の炭化水素基」、「水酸基」、又は「水素原子」を示す。
またR4〜R7からから選ばれる隣り合う2つの基は、互いに連結して飽和環又は不飽和環を形成してもよい。In the formula, L 1 represents “a divalent group having 1 to 18 carbon atoms composed of a carbon atom, a hydrogen atom and an oxygen atom” or “a divalent hydrocarbon group having 1 to 18 carbon atoms”. R 1 to R 3 each independently represents “a monovalent group having 1 to 18 carbon atoms composed of at least one selected from carbon atoms, hydrogen atoms, oxygen atoms and sulfur atoms”, “1 to 18 monovalent hydrocarbon group "or" hydrogen atom ". R 4 to R 7 are each independently a “monovalent group having 1 to 18 carbon atoms composed of at least one selected from a carbon atom, a hydrogen atom, an oxygen atom and a sulfur atom”, and “1 to 18 carbon atoms”. A monovalent hydrocarbon group ”,“ hydroxyl group ”, or“ hydrogen atom ”.
Two adjacent groups selected from R 4 to R 7 may be connected to each other to form a saturated ring or an unsaturated ring.
前記特定硬化促進化合物が、前記一般式(I)で表される構造部位を有することは、通常用いられる分析方法を用いて確認することができる。具体的には、核磁気共鳴(NMR)スペクトル、赤外線吸収(IR)スペクトル等を用いて確認することが可能である。 It can be confirmed that the specific curing accelerating compound has a structural moiety represented by the general formula (I) by using a commonly used analysis method. Specifically, it can be confirmed using a nuclear magnetic resonance (NMR) spectrum, an infrared absorption (IR) spectrum, or the like.
「炭素数1〜18の2価の炭化水素基」の具体例としては、炭素数1〜18の直鎖状又は分岐鎖状のアルキレン基;炭素数3〜18のシクロアルキレン基;炭素数2〜18の直鎖状又は分岐鎖状のアルケニレン基;炭素数3〜18のシクロアルケニレン基;フェニレン基、ビフェニレン基、ナフチレン基等の炭素数6〜18のアリーレン基などが挙げられる。
中でも、ポットライフの観点から、炭素数1〜12の直鎖状又は分岐鎖状のアルキレン基;炭素数3〜12のシクロアルキレン基;炭素数2〜12の直鎖状又は分岐鎖状のアルケニレン基;炭素数3〜12のシクロアルケニレン基;炭素数6〜12のアリーレン基が好ましく、炭素数1〜8の直鎖状又は分岐鎖状のアルキレン基;フェニレン基、ビフェニレン基、ナフチレン基等の炭素数6〜12のアリーレン基がより好ましく、炭素数1〜8の直鎖状又は分岐鎖状のアルキレン基がさらに好ましい。Specific examples of the “divalent hydrocarbon group having 1 to 18 carbon atoms” include a linear or branched alkylene group having 1 to 18 carbon atoms; a cycloalkylene group having 3 to 18 carbon atoms; A linear or branched alkenylene group having 18 to 18 carbon atoms; a cycloalkenylene group having 3 to 18 carbon atoms; an arylene group having 6 to 18 carbon atoms such as a phenylene group, a biphenylene group, or a naphthylene group.
Among these, from the viewpoint of pot life, a linear or branched alkylene group having 1 to 12 carbon atoms; a cycloalkylene group having 3 to 12 carbon atoms; a linear or branched alkenylene having 2 to 12 carbon atoms. Group: a C3-C12 cycloalkenylene group; a C6-C12 arylene group is preferable, a C1-C8 linear or branched alkylene group; a phenylene group, a biphenylene group, a naphthylene group, etc. An arylene group having 6 to 12 carbon atoms is more preferable, and a linear or branched alkylene group having 1 to 8 carbon atoms is more preferable.
また「炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基」の具体例としては、メチレンオキシ基、エチレンオキシ基、プロピレンオキシ基、ジエチレンオキシ基、ジプロピレンオキシ基、トリエチレンオキシ基、トリプロピレンオキシ基等の炭素数1〜18の直鎖状又は分岐鎖状のアルキレンオキシ基及び直鎖状又は分岐鎖状のオリゴアルキレンオキシ基などが挙げられる。
中でも、ポットライフの観点から、炭素数1〜12の直鎖状又は分岐鎖状のアルキレンオキシ基及び炭素数2〜12の直鎖状又は分岐鎖状のオリゴアルキレンオキシ基が好ましく、炭素数1〜8の直鎖状又は分岐鎖状のアルキレンオキシ基及び炭素数2〜8直鎖状又は分岐鎖状のオリゴアルキレンオキシ基がより好ましく、炭素数1〜8の直鎖状又は分岐鎖状のアルキレンオキシ基がさらに好ましい。Specific examples of the “C1-C18 divalent group composed of carbon atom, hydrogen atom and oxygen atom” include methyleneoxy group, ethyleneoxy group, propyleneoxy group, diethyleneoxy group, dipropyleneoxy group. A linear or branched alkyleneoxy group having 1 to 18 carbon atoms such as a group, a triethyleneoxy group or a tripropyleneoxy group, and a linear or branched oligoalkyleneoxy group.
Among these, from the viewpoint of pot life, a linear or branched alkyleneoxy group having 1 to 12 carbon atoms and a linear or branched oligoalkyleneoxy group having 2 to 12 carbon atoms are preferable, and the carbon number is 1 -8 linear or branched alkyleneoxy groups and 2 to 8 carbon linear or branched oligoalkyleneoxy groups are more preferred, linear or branched C1-8 linear or branched More preferred is an alkyleneoxy group.
「炭素数1〜18の1価の炭化水素基」の具体例としては、炭素数1〜18の直鎖状又は分岐鎖状のアルキル基、炭素数3〜18のシクロアルキル基、炭素数2〜18の直鎖状又は分岐鎖状のアルケニル基、炭素数3〜18のシクロアルケニル基、炭素数6〜18のアリール基などが挙げられる。
中でも、ポットライフの観点から、炭素数1〜18の直鎖状又は分岐鎖状のアルキル基、炭素数3〜18のシクロアルキル基、炭素数2〜18の直鎖状又は分岐鎖状のアルケニル基、炭素数3〜18のシクロアルケニル基及び炭素数6〜18のアリール基が好ましく、炭素数1〜12の直鎖状又は分岐鎖状のアルキル基、炭素数3〜12のシクロアルキル基、炭素数2〜12の直鎖状又は分岐鎖状のアルケニル基、炭素数3〜12のシクロアルケニル基及び炭素数6〜12のアリール基がより好ましく、炭素数1〜6の直鎖状又は分岐鎖状のアルキル基がさらに好ましい。Specific examples of the “monovalent hydrocarbon group having 1 to 18 carbon atoms” include a linear or branched alkyl group having 1 to 18 carbon atoms, a cycloalkyl group having 3 to 18 carbon atoms, and 2 carbon atoms. -18 linear or branched alkenyl group, C3-C18 cycloalkenyl group, C6-C18 aryl group, etc. are mentioned.
Among these, from the viewpoint of pot life, a linear or branched alkyl group having 1 to 18 carbon atoms, a cycloalkyl group having 3 to 18 carbon atoms, and a linear or branched alkenyl group having 2 to 18 carbon atoms. Group, a C3-C18 cycloalkenyl group and a C6-C18 aryl group are preferred, a C1-C12 linear or branched alkyl group, a C3-C12 cycloalkyl group, A linear or branched alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, and an aryl group having 6 to 12 carbon atoms are more preferable, and a linear or branched chain having 1 to 6 carbon atoms. A chain alkyl group is more preferable.
「炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる少なくとも1種の原子から構成される炭素数1〜18の1価の基」の具体例としては、メトキシ基、エチルオキシ基、プロピルオキシ基、2−プロピルオキシ基等の炭素数1〜18の直鎖状又は分岐鎖状のアルコキシ基;メトキシメチル基、フェノキシメチル基、メトキシフェニル基、ジメトキシフェニル基、ベンゾイルフェニル基、アセチルフェニル基、2−ヒドロキシフェニル基、2−ヒドロキシフェニルメチル基、2-ヒドロキシフェニルオキシ基、2−ヒドロキシフェニルメチルメチル基、2−ヒドロキシフェニルエチルメチル基、2−ヒドロキシフェニルチオ基、2−ヒドロキシフェニルスルホニル基、3−ヒドロキシフェニル基、3−ヒドロキシフェニルメチル基、3-ヒドロキシフェニルオキシ基、3−ヒドロキシフェニルメチルメチル基、3−ヒドロキシフェニルエチルメチル基、3−ヒドロキシフェニルチオ基、3−ヒドロキシフェニルスルホニル基、4−ヒドロキシフェニル基、4−ヒドロキシフェニルメチル基、4-ヒドロキシフェニルオキシ基、4−ヒドロキシフェニルメチルメチル基、4−ヒドロキシフェニルエチルメチル基、4−ヒドロキシフェニルチオ基、4−ヒドロキシフェニルスルホニル基等の炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる少なくとも1種の原子から構成される置換基により置換されたアルキル基、アリール基などが挙げられる。
中でも、ポットライフ及び速硬化性の観点から、メトキシ基、メトキシメチル基、フェノキシメチル基、2−ヒドロキシフェニル基、2−ヒドロキシフェニルメチル基、2-ヒドロキシフェニルオキシ基、2−ヒドロキシフェニルメチルメチル基、2−ヒドロキシフェニルエチルメチル基、2−ヒドロキシフェニルチオ基及び2−ヒドロキシフェニルスルホニル基が好ましく、メトキシ基、フェノキシメチル基、2−ヒドロキシフェニル基、2−ヒドロキシフェニルメチル基、2-ヒドロキシフェニルオキシ基及び2−ヒドロキシフェニルメチルメチル基がより好ましい。Specific examples of “monovalent group having 1 to 18 carbon atoms composed of at least one atom selected from the group consisting of carbon atom, hydrogen atom, oxygen atom and sulfur atom” include a methoxy group, an ethyloxy group, C1-C18 linear or branched alkoxy groups such as propyloxy group and 2-propyloxy group; methoxymethyl group, phenoxymethyl group, methoxyphenyl group, dimethoxyphenyl group, benzoylphenyl group, acetylphenyl Group, 2-hydroxyphenyl group, 2-hydroxyphenylmethyl group, 2-hydroxyphenyloxy group, 2-hydroxyphenylmethylmethyl group, 2-hydroxyphenylethylmethyl group, 2-hydroxyphenylthio group, 2-hydroxyphenylsulfonyl Group, 3-hydroxyphenyl group, 3-hydroxyphenylmethyl Group, 3-hydroxyphenyloxy group, 3-hydroxyphenylmethylmethyl group, 3-hydroxyphenylethylmethyl group, 3-hydroxyphenylthio group, 3-hydroxyphenylsulfonyl group, 4-hydroxyphenyl group, 4-hydroxyphenyl Carbon atom such as methyl group, 4-hydroxyphenyloxy group, 4-hydroxyphenylmethylmethyl group, 4-hydroxyphenylethylmethyl group, 4-hydroxyphenylthio group, 4-hydroxyphenylsulfonyl group, hydrogen atom, oxygen atom and Examples thereof include an alkyl group and an aryl group substituted with a substituent composed of at least one atom selected from the group consisting of sulfur atoms.
Among these, from the viewpoint of pot life and rapid curing, methoxy group, methoxymethyl group, phenoxymethyl group, 2-hydroxyphenyl group, 2-hydroxyphenylmethyl group, 2-hydroxyphenyloxy group, 2-hydroxyphenylmethylmethyl group 2-hydroxyphenylethylmethyl group, 2-hydroxyphenylthio group and 2-hydroxyphenylsulfonyl group are preferred, methoxy group, phenoxymethyl group, 2-hydroxyphenyl group, 2-hydroxyphenylmethyl group, 2-hydroxyphenyloxy And a 2-hydroxyphenylmethylmethyl group is more preferred.
L1は、ポットライフ及び速硬化性の観点から、炭素数1〜12の2価の炭化水素基並びに炭素原子、水素原子及び酸素原子から構成される炭素数1〜12の2価の基が好ましく、炭素数1〜8の直鎖状又は分岐鎖状のアルキレン基、フェニレン基、ビフェニレン基、ナフチレン基並びに炭素原子、水素原子及び酸素原子から構成される炭素数1〜8の2価の基がより好ましく、炭素数1〜8の直鎖状又は分岐鎖状のアルキレン基及び炭素数1〜8の直鎖状又は分岐鎖状のアルキレンオキシ基がさらに好ましく、炭素数1〜4の直鎖状又は分岐鎖状のアルキレン基であることが特に好ましい。L 1 is a divalent hydrocarbon group having 1 to 12 carbon atoms and a divalent group having 1 to 12 carbon atoms composed of a carbon atom, a hydrogen atom, and an oxygen atom from the viewpoint of pot life and rapid curing. Preferably, it is a C1-C8 linear or branched alkylene group, phenylene group, biphenylene group, naphthylene group, and a C1-C8 divalent group composed of a carbon atom, a hydrogen atom and an oxygen atom. Are more preferable, a linear or branched alkylene group having 1 to 8 carbon atoms and a linear or branched alkyleneoxy group having 1 to 8 carbon atoms are more preferable, and a linear chain having 1 to 4 carbon atoms. Particularly preferred is a linear or branched alkylene group.
R1〜R3はそれぞれ独立に、水素原子及び炭素数1〜12の1価の炭化水素基が好ましく、水素原子及び炭素数1〜6の直鎖状又は分岐鎖状のアルキル基がより好ましく、水素原子及び炭素数1〜3の直鎖状又は分岐鎖状のアルキル基がさらに好ましく、水素原子及びメチル基が特に好ましい。R 1 to R 3 are each independently preferably a hydrogen atom and a monovalent hydrocarbon group having 1 to 12 carbon atoms, more preferably a hydrogen atom and a linear or branched alkyl group having 1 to 6 carbon atoms. Further, a hydrogen atom and a linear or branched alkyl group having 1 to 3 carbon atoms are more preferable, and a hydrogen atom and a methyl group are particularly preferable.
R4〜R7はそれぞれ独立に、水素原子、水酸基、炭素数1〜12の1価の炭化水素基、並びに炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる少なくとも1種の原子から構成される炭素数1〜12の1価の基が好ましく、水素原子、水酸基、炭素数1〜6の直鎖状又は分岐鎖状のアルキル基、置換基を有してもよい炭素数6〜12のアリール基、炭素数1〜6の直鎖状又は分岐鎖状のアルコキシ基、置換基を有してもよい炭素数6〜12のアリールオキシ基、置換基を有してもよい炭素数6〜12のアリールアルキル基、置換基を有してもよい炭素数6〜12のアリールチオ基及び置換基を有してもよい炭素数6〜12のアリールスルホニル基がより好ましく、水素原子、水酸基、炭素数1〜4の直鎖状又は分岐鎖状のアルキル基、水酸基を有してもよい炭素数6〜9のアリール基、炭素数1〜4の直鎖状又は分岐鎖状のアルコキシ基、水酸基を有してもよい炭素数6〜9のアリールオキシ基、水酸基を有してもよい炭素数6〜9のアリールアルキル基、水酸基を有してもよい炭素数6〜9のアリールチオ基及び水酸基を有してもよい炭素数6〜9のアリールスルホニル基がさら好ましく、水素原子、水酸基、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、t−ブチル基、メトキシ基、エトキシ基、フェニル基、トリル基、フェノキシ基、2−ヒドロキシフェニル基、2−ヒドロキシフェニルメチル基、2-ヒドロキシフェニルオキシ基、2−ヒドロキシフェニルメチルメチル基、2−ヒドロキシフェニルエチルメチル基、2−ヒドロキシフェニルチオ基、及び2−ヒドロキシフェニルスルホニル基が特に好ましい。R 4 to R 7 are each independently at least one selected from the group consisting of a hydrogen atom, a hydroxyl group, a monovalent hydrocarbon group having 1 to 12 carbon atoms, and a carbon atom, a hydrogen atom, an oxygen atom, and a sulfur atom. C1-C12 monovalent group comprised from an atom is preferable, The carbon number which may have a hydrogen atom, a hydroxyl group, a C1-C6 linear or branched alkyl group, and a substituent It may have a 6-12 aryl group, a C1-C6 linear or branched alkoxy group, a C6-C12 aryloxy group which may have a substituent, and a substituent. An arylalkyl group having 6 to 12 carbon atoms, an arylthio group having 6 to 12 carbon atoms which may have a substituent and an arylsulfonyl group having 6 to 12 carbon atoms which may have a substituent are more preferable, and a hydrogen atom , Hydroxyl group, linear or branched chain having 1 to 4 carbon atoms An alkyl group, an aryl group having 6 to 9 carbon atoms which may have a hydroxyl group, a linear or branched alkoxy group having 1 to 4 carbon atoms, and an aryl having 6 to 9 carbon atoms which may have a hydroxyl group An oxy group, an arylalkyl group having 6 to 9 carbon atoms which may have a hydroxyl group, an arylthio group having 6 to 9 carbon atoms which may have a hydroxyl group, and an aryl having 6 to 9 carbon atoms which may have a hydroxyl group A sulfonyl group is more preferable, and a hydrogen atom, hydroxyl group, methyl group, ethyl group, propyl group, isopropyl group, butyl group, t-butyl group, methoxy group, ethoxy group, phenyl group, tolyl group, phenoxy group, 2-hydroxyphenyl. Group, 2-hydroxyphenylmethyl group, 2-hydroxyphenyloxy group, 2-hydroxyphenylmethylmethyl group, 2-hydroxyphenylethylmethyl group, 2-hydroxyphenyl group Niruchio group, and 2-hydroxyphenyl sulfonyl group are particularly preferred.
また一般式(I)で表される構造部位におけるR4〜R7のうち、酸素原子に対してオルト位に位置する基は、炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる少なくとも1種の原子から構成される炭素数1〜18の1価の基、又は水酸基が好ましく、炭素数1〜18の直鎖状又は分岐鎖状のアルコキシ基、2−ヒドロキシフェニル基、2−ヒドロキシフェニルメチル基、2-ヒドロキシフェニルオキシ基、2−ヒドロキシフェニルメチルメチル基、2−ヒドロキシフェニルチオ基、2−ヒドロキシフェニルスルホニル基、又は水酸基がより好ましい。
酸素原子のオルト位に特定の置換基を有することで、硬化促進性がより向上する傾向がある。In addition, among R 4 to R 7 in the structural moiety represented by the general formula (I), the group located in the ortho position with respect to the oxygen atom is selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom and a sulfur atom. A monovalent group having 1 to 18 carbon atoms or a hydroxyl group composed of at least one kind of atom, a linear or branched alkoxy group having 1 to 18 carbon atoms, 2-hydroxyphenyl group, 2 A -hydroxyphenylmethyl group, 2-hydroxyphenyloxy group, 2-hydroxyphenylmethylmethyl group, 2-hydroxyphenylthio group, 2-hydroxyphenylsulfonyl group, or hydroxyl group is more preferable.
By having a specific substituent at the ortho position of the oxygen atom, the curing acceleration tends to be further improved.
前記特定硬化促進化合物は、硬化促進性の観点から、下記一般式(IIa)、一般式(IIb)、及び一般式(IIc)のいずれかで表される化合物であることが好ましい。 The specific curing accelerating compound is preferably a compound represented by any one of the following general formula (IIa), general formula (IIb), and general formula (IIc) from the viewpoint of curing acceleration.
一般式(IIa)、一般式(IIb)及び一般式(IIc)中、L21は、「炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基」、又は「炭素数1〜18の2価の炭化水素基」を示す。R21〜R26はそれぞれ独立に、「水素原子」又は「炭素数1〜18の1価の炭化水素基」を示す。
Arは、「炭素数6〜18のm価の芳香族炭化水素基」又は「少なくとも2つの炭素数6〜18の芳香族炭化水素基が、単結合若しくは炭素数1〜12の直鎖状又は分岐鎖状のアルキレン基、カルボニル基及び酸素原子からなる群より選ばれる少なくとも1種からなる連結基で連結されて全体としてm価となる基」を示す。
mは2〜8の整数を示し、nは0〜20の整数を示す。In General Formula (IIa), General Formula (IIb), and General Formula (IIc), L 21 represents “a divalent group having 1 to 18 carbon atoms composed of a carbon atom, a hydrogen atom, and an oxygen atom”, or “ A divalent hydrocarbon group having 1 to 18 carbon atoms. R 21 to R 26 each independently represent a “hydrogen atom” or “a monovalent hydrocarbon group having 1 to 18 carbon atoms”.
Ar is an “m-valent aromatic hydrocarbon group having 6 to 18 carbon atoms” or “at least two aromatic hydrocarbon groups having 6 to 18 carbon atoms are a single bond or a straight chain having 1 to 12 carbon atoms, or A group that is linked by at least one linking group selected from the group consisting of a branched alkylene group, a carbonyl group, and an oxygen atom to be m-valent as a whole.
m represents an integer of 2 to 8, and n represents an integer of 0 to 20.
一般式(IIa)、一般式(IIb)及び一般式(IIc)における炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基、炭素数1〜18の2価の炭化水素基及び炭素数1〜18の1価の炭化水素基の詳細は、上記と同様である。 A divalent group having 1 to 18 carbon atoms composed of a carbon atom, a hydrogen atom and an oxygen atom in general formula (IIa), general formula (IIb) and general formula (IIc); The details of the hydrocarbon group and the monovalent hydrocarbon group having 1 to 18 carbon atoms are the same as described above.
L21は、ポットライフ及び速硬化性の観点から、炭素数1〜12の2価の炭化水素基、並びに炭素原子、水素原子及び酸素原子から構成される炭素数1〜12の2価の基が好ましく、炭素数1〜8の直鎖状又は分岐鎖状のアルキレン基、フェニレン基、ビフェニレン基、ナフチレン基並びに炭素原子、水素原子及び酸素原子から構成される炭素数1〜8の2価の基がより好ましく、炭素数1〜8の直鎖状又は分岐鎖状のアルキレン基及び炭素数1〜8の直鎖状又は分岐鎖状のアルキレンオキシ基がさらに好ましく、炭素数1〜4の直鎖状又は分岐鎖状のアルキレン基であることが特に好ましい。L 21 is a divalent hydrocarbon group having 1 to 12 carbon atoms, and a divalent group having 1 to 12 carbon atoms composed of a carbon atom, a hydrogen atom, and an oxygen atom, from the viewpoint of pot life and rapid curability. C1-C8 linear or branched alkylene group, phenylene group, biphenylene group, naphthylene group, and C1-C8 divalent composed of carbon atom, hydrogen atom and oxygen atom Group is more preferable, linear or branched alkylene group having 1 to 8 carbon atoms and linear or branched alkyleneoxy group having 1 to 8 carbon atoms are more preferable, and straight chain having 1 to 4 carbon atoms. A chain or branched alkylene group is particularly preferable.
R21〜R26はそれぞれ独立に、水素原子及び炭素数1〜12の1価の炭化水素基が好ましく、水素原子及び炭素数1〜6の直鎖状又は分岐鎖状のアルキル基がより好ましく、水素原子及び炭素数1〜3の直鎖状又は分岐鎖状のアルキル基がさらに好ましく、水素原子及びメチル基が特に好ましい。R 21 to R 26 are each independently preferably a hydrogen atom and a monovalent hydrocarbon group having 1 to 12 carbon atoms, more preferably a hydrogen atom and a linear or branched alkyl group having 1 to 6 carbon atoms. Further, a hydrogen atom and a linear or branched alkyl group having 1 to 3 carbon atoms are more preferable, and a hydrogen atom and a methyl group are particularly preferable.
Arがm価の芳香族炭化水素基を示す場合、Arは芳香族炭化水素化合物からm個の水素原子を取り除いて構成される基であり、水素原子が取り除かれる位置は特に制限されない。
m価の芳香族炭化水素基を構成する芳香族炭化水素化合物は、ポットライフと速硬化性の観点から、炭素数6〜18であることが好ましく、炭素数6〜15であることがより好ましく、炭素数6〜12であることがさらに好ましい。When Ar represents an m-valent aromatic hydrocarbon group, Ar is a group formed by removing m hydrogen atoms from an aromatic hydrocarbon compound, and the position at which the hydrogen atom is removed is not particularly limited.
The aromatic hydrocarbon compound constituting the m-valent aromatic hydrocarbon group preferably has 6 to 18 carbon atoms, more preferably 6 to 15 carbon atoms, from the viewpoint of pot life and fast curability. More preferably, it has 6 to 12 carbon atoms.
m価の芳香族炭化水素基を構成する芳香族炭化水素化合物として具体的には、ベンゼン、ナフタレン、アントラセン、フェナントレンなどを挙げることができる。
また前記芳香族炭化水素は、置換基を有していてもよい。置換基の具体例としては炭素数1〜18の直鎖状又は分岐鎖状のアルキル基、炭素数1〜18の直鎖状又は分岐鎖状のアルケニル基、水酸基、炭素数1〜18の直鎖状又は分岐鎖状のアルコキシ基、炭素数1〜18の直鎖状又は分岐鎖状のアルケニルオキシ基などを挙げることができる。置換基としては中でも、水酸基が好ましい。Specific examples of the aromatic hydrocarbon compound constituting the m-valent aromatic hydrocarbon group include benzene, naphthalene, anthracene, and phenanthrene.
The aromatic hydrocarbon may have a substituent. Specific examples of the substituent include a linear or branched alkyl group having 1 to 18 carbon atoms, a linear or branched alkenyl group having 1 to 18 carbon atoms, a hydroxyl group, and a straight chain having 1 to 18 carbon atoms. Examples thereof include a linear or branched alkoxy group and a linear or branched alkenyloxy group having 1 to 18 carbon atoms. Among these, a hydroxyl group is preferable as the substituent.
Arにおける2以上の芳香族炭化水素基が単結合若しくは炭素数1〜12の直鎖状又は分岐鎖状のアルキレン基、カルボニル基及び酸素原子からなる群より選ばれる少なくとも1種からなる連結基で連結され、前記芳香族炭化水素基が酸素原子との結合位置となるm価の基(以下、「m価の芳香族含有連結基」ともいう)は、2以上の芳香族炭化水素化合物が単結合若しくは前記連結基で連結されてなる芳香族環含有化合物の芳香族炭化水素基からm個の水素原子を取り除いて構成される基であり、水素原子が取り除かれる位置は特に限定されない。
芳香族環含有化合物を構成する芳香族炭化水素化合物は、前記m価の芳香族炭化水素基おける芳香族炭化水素化合物と同様である。The two or more aromatic hydrocarbon groups in Ar are a single bond or a linking group consisting of at least one selected from the group consisting of a linear or branched alkylene group having 1 to 12 carbon atoms, a carbonyl group and an oxygen atom. An m-valent group (hereinafter also referred to as “m-valent aromatic-containing linking group”) in which the aromatic hydrocarbon group becomes a bonding position with an oxygen atom is connected to two or more aromatic hydrocarbon compounds. This is a group constituted by removing m hydrogen atoms from an aromatic hydrocarbon group of an aromatic ring-containing compound connected by a bond or the linking group, and the position at which the hydrogen atom is removed is not particularly limited.
The aromatic hydrocarbon compound constituting the aromatic ring-containing compound is the same as the aromatic hydrocarbon compound in the m-valent aromatic hydrocarbon group.
2以上の芳香族炭化水素基を連結する連結基の具体例としては、単結合、メチレン基、エチレン基、プロピレン基等の炭素数1〜12の直鎖状又は分岐鎖状のアルキレン基;エチレンオキシ基、プロピレンオキシ基、ジエチレンオキシ基等の炭素数2〜12の直鎖状又は分岐鎖状のアルキレンオキシ基及びその重合体;酸素原子;カルボニルオキシ基;カルボニル基;並びにこれらの組み合わせを挙げることができる。
これらの中でも、ポットライフと速硬化性の観点から、単結合、炭素数1〜6の直鎖状又は分岐鎖状のアルキレン基、酸素原子、カルボニルオキシ基及びカルボニル基からなる群より選ばれる少なくとも1種であることが好ましい。Specific examples of the linking group for linking two or more aromatic hydrocarbon groups include a single bond, a linear or branched alkylene group having 1 to 12 carbon atoms such as a methylene group, an ethylene group, and a propylene group; ethylene C2-C12 linear or branched alkyleneoxy groups such as oxy group, propyleneoxy group and diethyleneoxy group and polymers thereof; oxygen atom; carbonyloxy group; carbonyl group; and combinations thereof be able to.
Among these, from the viewpoint of pot life and fast curing, at least selected from the group consisting of a single bond, a linear or branched alkylene group having 1 to 6 carbon atoms, an oxygen atom, a carbonyloxy group, and a carbonyl group. One type is preferable.
以下にArにおける芳香族含有連結基を構成する芳香族環含有化合物の具体例を示すが、本発明はこれらに限定されない。 Although the specific example of the aromatic ring containing compound which comprises the aromatic containing coupling group in Ar below is shown, this invention is not limited to these.
Arで表されるm価の芳香族含有連結基における結合位置は芳香族炭化水素基上である。以下にArで表される芳香族含有連結基の具体例を示すが本発明はこれらに限定されない。下記化学式中、「*」は結合位置を示す。 The bonding position in the m-valent aromatic-containing linking group represented by Ar is on the aromatic hydrocarbon group. Although the specific example of the aromatic containing coupling group represented by Ar below is shown, this invention is not limited to these. In the following chemical formula, “*” represents a bonding position.
またArにおける芳香族含有連結基は、置換基を有していてもよい。置換基の具体例としては炭素数1〜18の直鎖状又は分岐鎖状のアルキル基、炭素数2〜18の直鎖状又は分岐鎖状のアルケニル基、水酸基、炭素数1〜18の直鎖状又は分岐鎖状のアルコキシ基、炭素数2〜18の直鎖状又は分岐鎖状のアルケニルオキシ基などを挙げることができる。置換基としては中でも、炭素数1〜6の直鎖状又は分岐鎖状のアルキル基、炭素数1〜6の直鎖状又は分岐鎖状のアルケニル基及び水酸基からなる群より選ばれる少なくとも1種であることが好ましい。 The aromatic-containing linking group in Ar may have a substituent. Specific examples of the substituent include a linear or branched alkyl group having 1 to 18 carbon atoms, a linear or branched alkenyl group having 2 to 18 carbon atoms, a hydroxyl group, and a straight chain having 1 to 18 carbon atoms. Examples thereof include a linear or branched alkoxy group and a linear or branched alkenyloxy group having 2 to 18 carbon atoms. Among the substituents, at least one selected from the group consisting of a linear or branched alkyl group having 1 to 6 carbon atoms, a linear or branched alkenyl group having 1 to 6 carbon atoms, and a hydroxyl group. It is preferable that
一般式(IIa)、一般式(IIb)及び一般式(IIc)においては、速硬化性、低粘度性及びポットライフの観点から、mが2〜4の整数であり、nが0〜10の整数であることが好ましい。
また一般式(IIa)、一般式(IIb)及び一般式(IIc)にL21、R21〜R26及びArのいずれかが2以上存在する場合、2以上存在するL21、R21〜R26及びArは、それぞれ同一であっても異なっていてもよい。In General Formula (IIa), General Formula (IIb), and General Formula (IIc), m is an integer of 2 to 4 and n is 0 to 10 from the viewpoint of fast curability, low viscosity, and pot life. It is preferably an integer.
Moreover, when any one or more of L 21 , R 21 to R 26 and Ar are present in the general formula (IIa), the general formula (IIb) and the general formula (IIc), two or more L 21 and R 21 to R are present. 26 and Ar may be the same or different.
前記特定硬化促進化合物は、硬化促進性の観点から、一般式(III)で表される化合物であることもまた好ましい。 The specific curing accelerating compound is also preferably a compound represented by the general formula (III) from the viewpoint of curing acceleration.
一般式(III)におけるL21、R21〜R23、及びArは、一般式(IIa)、一般式(IIb)及び一般式(IIc)におけるL21、R21〜R23、及びArとそれぞれ同義であり、好ましい態様も同様である。
R27は、「水素原子」又は「下記一般式(IIIa)若しくは一般式(IIIb)で表される基」を示す。 L 21, R 21 ~R 23 in formula (III), and Ar have the general formula (IIa), L 21 in the general formula (IIb) and formula (IIc), R 21 ~R 23 , and Ar respectively It is synonymous and a preferable aspect is also the same.
R 27 represents “hydrogen atom” or “group represented by the following general formula (IIIa) or general formula (IIIb)”.
一般式(IIIa)及び一般式(IIIb)におけるR21〜R23及びArは、一般式(III)におけるR21〜R23及びArとそれぞれ同義であり、好ましい態様も同様である。mは1〜8の整数を示し、pは1〜8の整数を示し、m≧pである。速硬化性及びポッとライフの観点から、mが1〜5の整数であり、pが1〜5の整数であり、m≧pであることが好ましい。
一般式(III)において、L21、R21〜R23、R27及びArのいずれかが2以上存在する場合、2以上存在するL21、R21〜R23、R27及びArはそれぞれ同一であっても異なっていてもよい。Formula (IIIa) and formula (IIIb) in R 21 to R 23 and Ar are respectively the same meanings as R 21 to R 23 and Ar in formula (III), preferable embodiments thereof are also the same. m represents an integer of 1 to 8, p represents an integer of 1 to 8, and m ≧ p. From the viewpoint of fast curability and quick life, m is an integer of 1 to 5, p is an integer of 1 to 5, and preferably m ≧ p.
In the general formula (III), L 21, R 21 ~R 23, when any one of R 27 and Ar are present 2 or more, L 21 present 2 or more, R 21 ~R 23, R 27 and Ar are each identical Or different.
前記特定硬化促進化合物の重量平均分子量は特に制限されない。取扱性に優れた粘度を有する電子部品用樹脂組成物とする観点から、200〜20000であることが好ましく、300〜10000であることがより好ましく、300〜5000であることが更に好ましい。
なお、特定硬化促進化合物の重量平均分子量は、質量分析装置又はGPC法を用いた通常の方法で測定することができる。The weight average molecular weight of the specific curing accelerating compound is not particularly limited. From the viewpoint of obtaining a resin composition for electronic parts having a viscosity excellent in handleability, it is preferably 200 to 20,000, more preferably 300 to 10,000, and further preferably 300 to 5,000.
In addition, the weight average molecular weight of a specific hardening acceleration | stimulation compound can be measured by the normal method using a mass spectrometer or GPC method.
一般式(I)で表される構造部位を有する化合物(特定硬化促進化合物)は、例えば、フェノール性水酸基を有する化合物とビニルエーテル基を有する化合物とを付加反応させることで得ることができる。付加反応の反応条件は特に制限されない。例えば、50℃〜150℃の温度範囲で10分〜24時間程度反応させることによって得ることができる。また付加反応は窒素雰囲気下で行うこともできる。 The compound having a structural site represented by the general formula (I) (specific curing accelerating compound) can be obtained, for example, by subjecting a compound having a phenolic hydroxyl group and a compound having a vinyl ether group to an addition reaction. The reaction conditions for the addition reaction are not particularly limited. For example, it can be obtained by reacting in the temperature range of 50 ° C. to 150 ° C. for about 10 minutes to 24 hours. The addition reaction can also be performed in a nitrogen atmosphere.
さらに付加反応には、キシレン等の溶媒を用いてもよい。また付加反応は酸性リン酸エステル等の酸触媒により促進することもできる。なお、付加反応の反応終点は、残存するフェノール性水酸基を例えば、水酸化カリウムのエタノール溶液で滴定することにより決定できる。 Further, a solvent such as xylene may be used for the addition reaction. The addition reaction can also be promoted by an acid catalyst such as an acidic phosphate ester. The end point of the addition reaction can be determined by titrating the remaining phenolic hydroxyl group with, for example, an ethanol solution of potassium hydroxide.
フェノール性水酸基を有する化合物とビニルエーテル基を有する化合物とを付加反応させる際の仕込みモル比は、フェノール性水酸基を有する化合物及びビニルエーテル基を有する化合物の構造に応じて適宜選択することができる。
例えば、特定硬化促進化合物が一般式(IIa)、一般式(IIb)及び一般式(IIc)のいずれかで表される化合物である場合、フェノール性水酸基を有する化合物に、ビニルエーテル基を有する化合物としてビニルエーテル基を2つ有するジビニルエーテル化合物及びビニルエーテル基を1つ有するビニルアルキルエーテル化合物からなる群より選ばれる少なくとも1種を付加反応させることで、一般式(IIa)、一般式(IIb)及び一般式(IIc)のいずれかで表される化合物を得ることができる。ビニルエーテル基を有する化合物としては、ビニルエーテル基を2つ有するジビニルエーテル化合物を用いることが好ましい。
フェノール性水酸基を有する化合物とビニルエーテル化合物の仕込み量比は、フェノール性水酸基を有する化合物が有するフェノール性水酸基の総数mに応じて適宜選択することができる。例えばフェノール性水酸基の総数に対して0.55倍モル以上であることが好ましく、0.75〜4倍モルであることがより好ましい。The charged molar ratio when the compound having a phenolic hydroxyl group and the compound having a vinyl ether group are subjected to addition reaction can be appropriately selected according to the structures of the compound having a phenolic hydroxyl group and the compound having a vinyl ether group.
For example, when the specific curing accelerating compound is a compound represented by any one of the general formula (IIa), the general formula (IIb), and the general formula (IIc), the compound having a phenolic hydroxyl group is replaced with a compound having a vinyl ether group. By addition reaction of at least one selected from the group consisting of a divinyl ether compound having two vinyl ether groups and a vinyl alkyl ether compound having one vinyl ether group, general formula (IIa), general formula (IIb) and general formula A compound represented by any of (IIc) can be obtained. As the compound having a vinyl ether group, it is preferable to use a divinyl ether compound having two vinyl ether groups.
The charging amount ratio between the compound having a phenolic hydroxyl group and the vinyl ether compound can be appropriately selected according to the total number m of phenolic hydroxyl groups possessed by the compound having a phenolic hydroxyl group. For example, it is preferable that it is 0.55 times mole or more with respect to the total number of phenolic hydroxyl groups, and it is more preferable that it is 0.75-4 times mole.
また特定硬化促進化合物が一般式(III)で表される化合物である場合、フェノール性水酸基を有する化合物に、ビニルエーテル基を2つ有するジビニルエーテル化合物及びビニルエーテル基を1つ有するビニルアルキルエーテル化合物からなる群より選ばれる少なくとも1種を付加反応させることで、一般式(III)で表される化合物を得ることができる。ビニルエーテル基を有する化合物としては、ビニルエーテル基を1つ有するビニルアルキルエーテル化合物を用いることが好ましい。
フェノール性水酸基を有する化合物とビニルエーテル基を有する化合物の仕込み量比は、フェノール性水酸基を有する化合物が有するフェノール性水酸基の総数に応じて適宜選択することができる。例えばフェノール性水酸基の総数に対して1倍モルを超えていればよい。中でも1.1〜4倍モルであることが好ましく、1.2〜3倍モルであることがより好ましく、1.2〜2倍モルであることがさらに好ましい。When the specific curing accelerating compound is a compound represented by the general formula (III), the compound having a phenolic hydroxyl group is composed of a divinyl ether compound having two vinyl ether groups and a vinyl alkyl ether compound having one vinyl ether group. A compound represented by the general formula (III) can be obtained by addition reaction of at least one selected from the group. As the compound having a vinyl ether group, it is preferable to use a vinyl alkyl ether compound having one vinyl ether group.
The charging ratio of the compound having a phenolic hydroxyl group and the compound having a vinyl ether group can be appropriately selected according to the total number of phenolic hydroxyl groups possessed by the compound having a phenolic hydroxyl group. For example, it should just exceed 1 time mole with respect to the total number of phenolic hydroxyl groups. Among these, 1.1 to 4 times mol is preferable, 1.2 to 3 times mol is more preferable, and 1.2 to 2 times mol is more preferable.
さらにまたビニルエーテル化合物を、フェノール性水酸基を有する化合物に対して過剰に含むことによって、ビニルエーテル化合物が脱離しても平衡反応によりフェノール性水酸基がブロックされるため、保存安定性により優れる。また、過剰なビニルエーテル化合物により適切な分子量で重合反応が停止するため、粘度を所望の範囲内とすることも可能である。 Furthermore, when the vinyl ether compound is excessively contained with respect to the compound having a phenolic hydroxyl group, even if the vinyl ether compound is eliminated, the phenolic hydroxyl group is blocked by an equilibrium reaction, so that the storage stability is excellent. Further, since the polymerization reaction is stopped at an appropriate molecular weight due to an excess vinyl ether compound, the viscosity can be set within a desired range.
前記フェノール性水酸基を有する化合物としては、例えば、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、ピロガロール、フロログルシノール、2,2'−ビフェノール、4,4’−ビフェノール、ビスフェノールA、ビスフェノールF、フェニルフェノール、アミノフェノール等のフェノール化合物;α−ナフトール、β−ナフトール、1,2−ジヒドロキシナフタレン、2,3−ジヒドロキシナフタレン等のナフトール化合物;また前記フェノール化合物及びナフトール化合物の少なくとも1種と、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック型フェノール樹脂;前記フェノール化合物及及びナフトール化合物の少なくとも1種と、ジメトキシパラキシレンやビス(メトキシメチル)ビフェニルから合成されるフェノールアラルキル樹脂、ナフトールアラルキル樹脂等のアラルキル型フェノール樹脂;パラキシリレン変性フェノール樹脂及びメタキシリレン変性フェノール樹脂の少なくとも1種;メラミン変性フェノール樹脂;テルペン変性フェノール樹脂;フェノール化合物及びナフトール化合物の少なくとも1種と、ジシクロペンタジエンから共重合により合成される、ジシクロペンタジエン型フェノール樹脂及びジシクロペンタジエン型ナフトール樹脂;クロペンタジエン変性フェノール樹脂;多環芳香環変性フェノール樹脂;ビフェニル型フェノール樹脂;トリフェニルメタン型フェノール樹脂;並びにこれら2種以上を共重合して得たフェノール樹脂などが挙げられる。
フェノール性水酸基を有する化合物は、1種単独でも2種以上を組み合わせて用いてもよい。Examples of the compound having a phenolic hydroxyl group include phenol, cresol, xylenol, resorcin, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4-methylcatechol, 3-methoxycatechol, 3,5-di- Phenol compounds such as tert-butylcatechol, pyrogallol, phloroglucinol, 2,2′-biphenol, 4,4′-biphenol, bisphenol A, bisphenol F, phenylphenol, aminophenol; α-naphthol, β-naphthol, 1 , 2-dihydroxynaphthalene, naphthol compounds such as 2,3-dihydroxynaphthalene; and at least one of the above phenolic compounds and naphthol compounds, formaldehyde, acetaldehyde, propionaldehyde, A novolak-type phenol resin obtained by condensation or co-condensation with an aldehyde compound such as benzaldehyde and salicylaldehyde in the presence of an acidic catalyst; at least one of the phenol compound and the naphthol compound, dimethoxyparaxylene and bis (methoxymethyl) Aralkyl-type phenol resins such as phenol aralkyl resins and naphthol aralkyl resins synthesized from biphenyl; at least one of paraxylylene-modified phenol resin and metaxylylene-modified phenol resin; melamine-modified phenol resin; terpene-modified phenol resin; at least of phenol compound and naphthol compound A dicyclopentadiene type phenolic resin and a dicyclopentadiene type naphthol resin synthesized by copolymerization from one kind and dicyclopentadiene; Ropentajien modified phenol resin; polycyclic aromatic ring-modified phenolic resins; biphenyl type phenolic resins; triphenylmethane type phenol resins; etc. as well as phenolic resins obtained by copolymerizing two or more of these and the like.
The compounds having a phenolic hydroxyl group may be used singly or in combination of two or more.
これらの中でも、低粘度の観点からは、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、ピロガロール、フロログルシノール、2,2’−ビフェノール、4,4'−ビフェノール、ビスフェノールA、ビスフェノールF、フェニルフェノール及びアミノフェノール等のフェノール化合物、並びに、α−ナフトール、β−ナフトール及び1,2−ジヒドロキシナフタレン、2,3−ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも1種が好ましい。
また硬化促進性の観点からは、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、2,2’−ビフェノール、1,2−ジヒドロキシナフタレン、及び2,3−ジヒドロキシナフタレンからなる群より選ばれる少なくとも1種が好ましい。Among these, from the viewpoint of low viscosity, phenol, cresol, xylenol, resorcin, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4-methylcatechol, 3-methoxycatechol, 3,5-di-tert -Phenolic compounds such as butylcatechol, pyrogallol, phloroglucinol, 2,2'-biphenol, 4,4'-biphenol, bisphenol A, bisphenol F, phenylphenol and aminophenol, and α-naphthol, β-naphthol and At least one selected from the group consisting of naphthol compounds such as 1,2-dihydroxynaphthalene and 2,3-dihydroxynaphthalene is preferred.
From the viewpoint of curing acceleration, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4-methylcatechol, 3-methoxycatechol, 3,5-di-tert-butylcatechol, 2,2′-biphenol , 1,2-dihydroxynaphthalene, and at least one selected from the group consisting of 2,3-dihydroxynaphthalene are preferable.
またビニルエーテル基を有する化合物としては、例えば、メチルビニルエーテル、エチルビニルエーテル、プロピルビニルエーテル、1−プロペニルビニルエーテル、1,2−ジメチルプロピルビニルエーテル、ブチルビニルエーテル、イソブチルビニルエーテル、tert−ブチルビニルエーテル、1,3−ジメチルブチルビニルエーテル、2−エチルブチルビニルエーテル、ビニルヘキシルエーテル、イソヘキシルビニルエーテル、2−エチルヘキシルビニルエーテル、5−メチルヘキシルビニルエーテル、1−ペンチルヘキシルビニルエーテル、n−ヘプチルビニルエーテル、1−メチルヘプチルビニルエーテル、オクチルビニルエーテル、4−エチル−1−メチルオクチルビニルエーテル、2−メチルオクチルビニルエーテル、n−ノニルビニルエーテル、n−デシルビニルエーテル、ウンデシルビニルエーテル、ドデシルビニルエーテル、トリデシルビニルエーテル、テトラデシルビニルエーテル、ペンタデシルビニルエーテル、ヘキサデシルビニルエーテル、ヘプタデシルビニルエーテル、n−エイコシルビニルエーテル、ヘニコシルビニルエーテル、n−ドコシルビニルエーテル、トリコシルビニルエーテル、テトラコシルビニルエーテル、n−ペンチルビニルエーテル、イソペンチルビニルエーテル、オクタデシルビニルエーテル、6−メチルヘプチルビニルエーテル、sec−ブチルビニルエーテル、トリエチレングリコールメチルビニルエーテル、(1,5−ジメチル−1−ビニル−4−ヘキセニル)ビニルエーテル、ビニル(1−メチルエテニル)エーテル、1−メチルアリルビニルエーテル、2−メチルアリルビニルエーテル、ビニル2−ブテニルエーテル、2−ペンテニルビニルエーテル、cis−1−メチル−2−ブテニルビニルエーテル、trans−1−メチル−2−ブテニルビニルエーテル、1−エチルアリルビニルエーテル、1,3−ジメチル−2−ブテニルビニルエーテル、1−メチル−2−ヘキセニルビニルエーテル、フェニルビニルエーテル、(6−フェニル−2−ヘキセニル)ビニルエーテル、(2,2−ジメチルプロピル)ビニルエーテル、(1−エチルプロピル)ビニルエーテル、(1−イソプロピル−2−メチルプロピル)ビニルエーテル、p−フェニルベンジルビニルエーテル、ビニル(α−メチルベンジル)エーテル、フェネチルビニルエーテル、2−フェニルプロピルビニルエーテル、3−フェニルプロピルビニルエーテル、α,α−ジメチルベンジルビニルエーテル、ビニルベンズヒドリルエーテル、2−フェニルアリルビニルエーテル、1−メチル−2−フェニルアリルビニルエーテル、グリシジルビニルエーテル、アリルビニルエーテル、3−ヘキセニルビニルエーテル、4−ヘキセニルビニルエーテル、5−ヘキセニルビニルエーテル、1−ヘプテニルビニルエーテル、2−ヘプテニルビニルエーテル、3−ヘプテニルビニルエーテル、4−ヘプテニルビニルエーテル、5−ヘプテニルビニルエーテル、6−ヘプテニルビニルエーテル、1−オクテニルビニルエーテル、2−オクテニルビニルエーテル、3−オクテニルビニルエーテル、4−オクテニルビニルエーテル、5−オクテニルビニルエーテル、6−オクテニルビニルエーテル、7−オクテニルビニルエーテル、1−ノネニルビニルエーテル、2−ノネニルビニルエーテル、3−ノネニルビニルエーテル、4−ノネニルビニルエーテル、5−ノネニルビニルエーテル、6−ノネニルビニルエーテル、7−ノネニルビニルエーテル、8−ノネニルビニルエーテル、1−デセニルビニルエーテル、2−デセニルビニルエーテル、3−デセニルビニルエーテル、4−デセニルビニルエーテル、5−デセニルビニルエーテル、6−デセニルビニルエーテル、7−デセニルビニルエーテル、8−デセニルビニルエーテル、9−デセニルビニルエーテル、1−ウンデセニルビニルエーテル、2−ウンデセニルビニルエーテル、3−ウンデセニルビニルエーテル、4−ウンデセニルビニルエーテル、5−ウンデセニルビニルエーテル、6−ウンデセニルビニルエーテル、7−ウンデセニルビニルエーテル、8−ウンデセニルビニルエーテル、9−ウンデセニルビニルエーテル、10−ウンデセニルビニルエーテル、3,6−ジオキサ−1−デセン、1−ナフチルビニルエーテル、2−ナフチルビニルエーテル、o−トリルビニルエーテル、m−トリルビニルエーテル、p−トリルビニルエーテル、2,3−キシリルビニルエーテル、2,4−キシリルビニルエーテル、ベンジルビニルエーテル、シクロヘキシルビニルエーテル、4−n−ブチルシクロヘキシルビニルエーテル、ビニル(2−シクロヘキシリデンエチル)エーテル、4−[3−(2,2,4−トリメチル)ペンチル]−シクロヘキシルビニルエーテル、4−n−ドデシルシクロヘキシルビニルエーテル、4−シクロヘキシルシクロヘキシルビニルエーテル、ビニル(シクロヘキシルメチル)エーテル、1−シクロヘキシルエチルビニルエーテル、2−シクロヘキシルエチルビニルエーテル、2−デカヒドロナフチルビニルエーテル、2−シクロペンテニルビニルエーテル、2−シクロヘキセニルビニルエーテル、1−シクロペンテニルメチルビニルエーテル、1−シクロペンテニルエチルビニルエーテル、(1−シクロヘキセニルメチル)ビニルエーテル、[1−(1−シクロヘキセニル)エチル]ビニルエーテル、(3−メチル−1−シクロヘキセニル)メチルビニルエーテル、[(3,4−ジメチル−1−シクロヘキセニル)メチル]ビニルエーテル、[(3−メチル−4−エトキシ−1−シクロヘキセニル)メチル]ビニルエーテル、シクロヘプテニルメチルビニルエーテル、シクロオクテニルメチルビニルエーテル、2−シクロブチリデンエチルビニルエーテル、2−シクロペンチリデンエチルビニルエーテル、2−シクロヘキシリデン−1−メチルエチルビニルエーテル、2−シクロヘプチリデンエチルビニルエーテル、2−シクロオクチリデンエチルビニルエーテル、テルピネイルビニルエーテル、メンチルビニルエーテル、ノルボニルビニルエーテル、2−フリルビニルエーテル、3−フリルビニルエーテル、フルフリルビニルエーテル、テトラヒドロフルフリルビニルエーテル、2−チエニルビニルエーテル、3−チエニルビニルエーテル、2−テニルビニルエーテル、2−ピリジルビニルエーテル、3−ピリジルビニルエーテル、4−ピリジルビニルエーテル、2,6,8−トリメチルノニルビニルエーテル、酢酸2−(ビニルオキシ)エチル、3−メチル−2−ブテニルビニルエーテル、ビニル(3,3−ジフェニル−2−プロペニル)エーテル、N,N−ジメチル−2−(ビニルオキシ)エタンアミン、[2−(2−エトキシエトキシ)エチル]ビニルエーテル、ジビニルエーテル、エチレングリコールジビニルエーテル、ジエチレングリコールジビニルエーテル、トリエチレングリコールジビニルエーテル、テトラエチレングリコールジビニルエーテル、ヘプタエチレングリコールジビニルエーテル、1,3−プロパンジオールジビニルエーテル、プロピレングリコールジビニルエーテル、1,4−ブタンジオールジビニルエーテル、1,3−ブタンジオールジビニルエーテル、1,2−ブタンジオールジビニルエーテル、2,3−ブタンジオールジビニルエーテル、1−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,2−プロパンジオールジビニルエーテル、1,5−ペンタンジオールジビニルエーテル、1,6−ヘキサンジオールジビニルエーテル、シクロヘキサン−1,4−ジオールジビニルエーテル、シクロヘキサン−1,4−ジメタノールジビニルエーテル、p−キシレングリコールジビニルエーテル、トリプロピレングリコールジビニルエーテル、テトラプロピレングリコールジビニルエーテル、ポリプロピレングリコールジビニルエーテル、3−ビニロキシプロピルビニルエーテル、3,9−ジオキサ−1,10−ウンデカジエン、10−ビニロキシデシルビニルエーテル、12−ビニロキシオクタデシルビニルエーテル、ジプロピレングリコールジビニルエーテル、レゾルシノールジビニルエーテル、m−フェニレンビス(エチレングリコール)ジビニルエーテル、ビスフェノールAジビニルエーテル等の脂肪族ビニルエーテル化合物、脂環式ビニルエーテル化合物及び芳香族ビニルエーテル化合物などが挙げられる。 Examples of the compound having a vinyl ether group include methyl vinyl ether, ethyl vinyl ether, propyl vinyl ether, 1-propenyl vinyl ether, 1,2-dimethylpropyl vinyl ether, butyl vinyl ether, isobutyl vinyl ether, tert-butyl vinyl ether, 1,3-dimethylbutyl. Vinyl ether, 2-ethylbutyl vinyl ether, vinyl hexyl ether, isohexyl vinyl ether, 2-ethylhexyl vinyl ether, 5-methylhexyl vinyl ether, 1-pentylhexyl vinyl ether, n-heptyl vinyl ether, 1-methylheptyl vinyl ether, octyl vinyl ether, 4-ethyl -1-methyloctyl vinyl ether, 2-methyloctyl vinyl ether, n- Nil vinyl ether, n-decyl vinyl ether, undecyl vinyl ether, dodecyl vinyl ether, tridecyl vinyl ether, tetradecyl vinyl ether, pentadecyl vinyl ether, hexadecyl vinyl ether, heptadecyl vinyl ether, n-eicosyl vinyl ether, henicosyl vinyl ether, n-docosyl Vinyl ether, tricosyl vinyl ether, tetracosyl vinyl ether, n-pentyl vinyl ether, isopentyl vinyl ether, octadecyl vinyl ether, 6-methylheptyl vinyl ether, sec-butyl vinyl ether, triethylene glycol methyl vinyl ether, (1,5-dimethyl-1-vinyl -4-hexenyl) vinyl ether, vinyl (1-methylethenyl) ether 1-methylallyl vinyl ether, 2-methylallyl vinyl ether, vinyl 2-butenyl ether, 2-pentenyl vinyl ether, cis-1-methyl-2-butenyl vinyl ether, trans-1-methyl-2-butenyl vinyl ether, 1- Ethyl allyl vinyl ether, 1,3-dimethyl-2-butenyl vinyl ether, 1-methyl-2-hexenyl vinyl ether, phenyl vinyl ether, (6-phenyl-2-hexenyl) vinyl ether, (2,2-dimethylpropyl) vinyl ether, ( 1-ethylpropyl) vinyl ether, (1-isopropyl-2-methylpropyl) vinyl ether, p-phenylbenzyl vinyl ether, vinyl (α-methylbenzyl) ether, phenethyl vinyl ether, 2-phenylpropyl Pyrvinyl ether, 3-phenylpropyl vinyl ether, α, α-dimethylbenzyl vinyl ether, vinylbenzhydryl ether, 2-phenylallyl vinyl ether, 1-methyl-2-phenylallyl vinyl ether, glycidyl vinyl ether, allyl vinyl ether, 3-hexenyl vinyl ether, 4 -Hexenyl vinyl ether, 5-hexenyl vinyl ether, 1-heptenyl vinyl ether, 2-heptenyl vinyl ether, 3-heptenyl vinyl ether, 4-heptenyl vinyl ether, 5-heptenyl vinyl ether, 6-heptenyl vinyl ether, 1-octenyl vinyl ether 2-octenyl vinyl ether, 3-octenyl vinyl ether, 4-octenyl vinyl ether, 5-octenyl vinyl ether Ter, 6-octenyl vinyl ether, 7-octenyl vinyl ether, 1-nonenyl vinyl ether, 2-nonenyl vinyl ether, 3-nonenyl vinyl ether, 4-nonenyl vinyl ether, 5-nonenyl vinyl ether, 6-nonenyl vinyl ether, 7-nonenyl vinyl ether, 8-nonenyl vinyl ether, 1-decenyl vinyl ether, 2-decenyl vinyl ether, 3-decenyl vinyl ether, 4-decenyl vinyl ether, 5-decenyl vinyl ether, 6-decenyl Cenyl vinyl ether, 7-decenyl vinyl ether, 8-decenyl vinyl ether, 9-decenyl vinyl ether, 1-undecenyl vinyl ether, 2-undecenyl vinyl ether, 3-undecenyl vinyl ether, 4-undece Nilvinyl A 5-undecenyl vinyl ether, 6-undecenyl vinyl ether, 7-undecenyl vinyl ether, 8-undecenyl vinyl ether, 9-undecenyl vinyl ether, 10-undecenyl vinyl ether, 3,6-dioxa- 1-decene, 1-naphthyl vinyl ether, 2-naphthyl vinyl ether, o-tolyl vinyl ether, m-tolyl vinyl ether, p-tolyl vinyl ether, 2,3-xylyl vinyl ether, 2,4-xylyl vinyl ether, benzyl vinyl ether, cyclohexyl vinyl ether 4-n-butylcyclohexyl vinyl ether, vinyl (2-cyclohexylideneethyl) ether, 4- [3- (2,2,4-trimethyl) pentyl] -cyclohexyl vinyl ether, 4-n-dodecyl Cyclohexyl vinyl ether, 4-cyclohexyl cyclohexyl vinyl ether, vinyl (cyclohexyl methyl) ether, 1-cyclohexyl ethyl vinyl ether, 2-cyclohexyl ethyl vinyl ether, 2-decahydronaphthyl vinyl ether, 2-cyclopentenyl vinyl ether, 2-cyclohexenyl vinyl ether, 1-cyclo Pentenylmethyl vinyl ether, 1-cyclopentenylethyl vinyl ether, (1-cyclohexenylmethyl) vinyl ether, [1- (1-cyclohexenyl) ethyl] vinyl ether, (3-methyl-1-cyclohexenyl) methyl vinyl ether, [(3 4-dimethyl-1-cyclohexenyl) methyl] vinyl ether, [(3-methyl-4-ethoxy-1-cyclohexenyl) ) Methyl] vinyl ether, cycloheptenyl methyl vinyl ether, cyclooctenyl methyl vinyl ether, 2-cyclobutylidene ethyl vinyl ether, 2-cyclopentylidene ethyl vinyl ether, 2-cyclohexylidene-1-methylethyl vinyl ether, 2-cycloheptyl Ridenethyl vinyl ether, 2-cyclooctylidene ethyl vinyl ether, terpineyl vinyl ether, menthyl vinyl ether, norbornyl vinyl ether, 2-furyl vinyl ether, 3-furyl vinyl ether, furfuryl vinyl ether, tetrahydrofurfuryl vinyl ether, 2-thienyl vinyl ether, 3- Thienyl vinyl ether, 2-tenyl vinyl ether, 2-pyridyl vinyl ether, 3-pyridyl vinyl ether, -Pyridyl vinyl ether, 2,6,8-trimethylnonyl vinyl ether, 2- (vinyloxy) ethyl acetate, 3-methyl-2-butenyl vinyl ether, vinyl (3,3-diphenyl-2-propenyl) ether, N, N- Dimethyl-2- (vinyloxy) ethanamine, [2- (2-ethoxyethoxy) ethyl] vinyl ether, divinyl ether, ethylene glycol divinyl ether, diethylene glycol divinyl ether, triethylene glycol divinyl ether, tetraethylene glycol divinyl ether, heptaethylene glycol di Vinyl ether, 1,3-propanediol divinyl ether, propylene glycol divinyl ether, 1,4-butanediol divinyl ether, 1,3-butanediol divinyl Ether, 1,2-butanediol divinyl ether, 2,3-butanediol divinyl ether, 1-methyl-1,3-propanediol divinyl ether, 2-methyl-1,3-propanediol divinyl ether, 2-methyl- 1,2-propanediol divinyl ether, 1,5-pentanediol divinyl ether, 1,6-hexanediol divinyl ether, cyclohexane-1,4-diol divinyl ether, cyclohexane-1,4-dimethanol divinyl ether, p- Xylene glycol divinyl ether, tripropylene glycol divinyl ether, tetrapropylene glycol divinyl ether, polypropylene glycol divinyl ether, 3-vinyloxypropyl vinyl ether, 3,9-dioxa , 10-undecadiene, 10-vinyloxydecyl vinyl ether, 12-vinyloxyoctadecyl vinyl ether, dipropylene glycol divinyl ether, resorcinol divinyl ether, m-phenylene bis (ethylene glycol) divinyl ether, bisphenol A divinyl ether, etc. And alicyclic vinyl ether compounds and aromatic vinyl ether compounds.
そのなかでも保存安定性の観点からジビニルエーテル、エチレングリコールジビニルエーテル、ジエチレングリコールジビニルエーテル、トリエチレングリコールジビニルエーテル、テトラエチレングリコールジビニルエーテル、ヘプタエチレングリコールジビニルエーテル、1,3−プロパンジオールジビニルエーテル、プロピレングリコールジビニルエーテル、1,4−ブタンジオールジビニルエーテル、1,3−ブタンジオールジビニルエーテル、1,2−ブタンジオールジビニルエーテル、2,3−ブタンジオールジビニルエーテル、1−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,2−プロパンジオールジビニルエーテル、1,5−ペンタンジオールジビニルエーテル、1,6−ヘキサンジオールジビニルエーテル、シクロヘキサン−1,4−ジオールジビニルエーテル、シクロヘキサン−1,4−ジメタノールジビニルエーテル、p−キシレングリコールジビニルエーテル、トリプロピレングリコールジビニルエーテル、テトラプロピレングリコールジビニルエーテル、ポリプロピレングリコールジビニルエーテルといったビニルエーテル基を2つ有するジビニルエーテル化合物が好ましく、1,4−ブタンジオールジビニルエーテルがより好ましい。 Among these, from the viewpoint of storage stability, divinyl ether, ethylene glycol divinyl ether, diethylene glycol divinyl ether, triethylene glycol divinyl ether, tetraethylene glycol divinyl ether, heptaethylene glycol divinyl ether, 1,3-propanediol divinyl ether, propylene glycol Divinyl ether, 1,4-butanediol divinyl ether, 1,3-butanediol divinyl ether, 1,2-butanediol divinyl ether, 2,3-butanediol divinyl ether, 1-methyl-1,3-propanediol di Vinyl ether, 2-methyl-1,3-propanediol divinyl ether, 2-methyl-1,2-propanediol divinyl ether, 1,5-pentane All divinyl ether, 1,6-hexanediol divinyl ether, cyclohexane-1,4-diol divinyl ether, cyclohexane-1,4-dimethanol divinyl ether, p-xylene glycol divinyl ether, tripropylene glycol divinyl ether, tetrapropylene glycol A divinyl ether compound having two vinyl ether groups such as divinyl ether and polypropylene glycol divinyl ether is preferred, and 1,4-butanediol divinyl ether is more preferred.
また、合成後のハンドリングの観点からメチルビニルエーテル、エチルビニルエーテル、プロピルビニルエーテル、1−プロペニルビニルエーテル、1,2−ジメチルプロピルビニルエーテル、ブチルビニルエーテル、イソブチルビニルエーテル、tert−ブチルビニルエーテル、1,3−ジメチルブチルビニルエーテル、2−エチルブチルビニルエーテル、ビニルヘキシルエーテル、イソヘキシルビニルエーテル、2−エチルヘキシルビニルエーテル、5−メチルヘキシルビニルエーテル、1−ペンチルヘキシルビニルエーテル、n−ヘプチルビニルエーテル、1−メチルヘプチルビニルエーテル、オクチルビニルエーテル、4−エチル−1−メチルオクチルビニルエーテル、2−メチルオクチルビニルエーテル、n−ノニルビニルエーテル、n−デシルビニルエーテル、ウンデシルビニルエーテル、ドデシルビニルエーテル、トリデシルビニルエーテル、テトラデシルビニルエーテル、ペンタデシルビニルエーテル、ビニルヘキサデシルエーテル、ヘプタデシルビニルエーテル、n−エイコシルビニルエーテル、ヘニコシルビニルエーテル、n−ドコシルビニルエーテル、トリコシルビニルエーテル、テトラコシルビニルエーテル、n−ペンチルビニルエーテル、イソペンチルビニルエーテル、オクタデシルビニルエーテル、ビニル(6−メチルヘプチル)エーテル、ビニルsec−ブチルエーテル、トリエチレングリコールメチルビニルエーテル、(1,5−ジメチル−1−ビニル−4−ヘキセニル)ビニルエーテル、ビニル(1−メチルエテニル)エーテル、1−メチルアリルビニルエーテル、2−メチルアリルビニルエーテル、ビニル2−ブテニルエーテル、2−ペンテニルビニルエーテル、cis−1−メチル−2−ブテニルビニルエーテル、trans−1−メチル−2−ブテニルビニルエーテル、1−エチルアリルビニルエーテル、1,3−ジメチル−2−ブテニルビニルエーテル、1−メチル−2−ヘキセニルビニルエーテル、フェニルビニルエーテル、(6−フェニル−2−ヘキセニル)ビニルエーテル、(2,2−ジメチルプロピル)ビニルエーテル、(1−エチルプロピル)ビニルエーテル(1−イソプロピル−2−メチルプロピル)ビニルエーテル、p−フェニルベンジルビニルエーテル、ビニル(α−メチルベンジル)エーテル、フェネチルビニルエーテル、2−フェニルプロピルビニルエーテル、3−フェニルプロピルビニルエーテル、α,α−ジメチルベンジルビニルエーテル、ビニルベンズヒドリルエーテル、2−フェニルアリルビニルエーテル、1−メチル−2−フェニルアリルビニルエーテル、グリシジルビニルエーテル、アリルビニルエーテル、3−ヘキセニルビニルエーテル、4−ヘキセニルビニルエーテル、5−ヘキセニルビニルエーテル、1−ヘプテニルビニルエーテル、2−ヘプテニルビニルエーテル、3−ヘプテニルビニルエーテル、4−ヘプテニルビニルエーテル、5−ヘプテニルビニルエーテル、6−ヘプテニルビニルエーテル、1−オクテニルビニルエーテル、2−オクテニルビニルエーテル、3−オクテニルビニルエーテル、4−オクテニルビニルエーテル、5−オクテニルビニルエーテル、6−オクテニルビニルエーテル、7−オクテニルビニルエーテル、1−ノネニルビニルエーテル、2−ノネニルビニルエーテル、3−ノネニルビニルエーテル、4−ノネニルビニルエーテル、5−ノネニルビニルエーテル、6−ノネニルビニルエーテル、7−ノネニルビニルエーテル、8−ノネニルビニルエーテル、1−デセニルビニルエーテル、2−デセニルビニルエーテル、3−デセニルビニルエーテル、4−デセニルビニルエーテル、5−デセニルビニルエーテル、6−デセニルビニルエーテル、7−デセニルビニルエーテル、8−デセニルビニルエーテル、9−デセニルビニルエーテル、1−ウンデセニルビニルエーテル、2−ウンデセニルビニルエーテル、3−ウンデセニルビニルエーテル、4−ウンデセニルビニルエーテル、5−ウンデセニルビニルエーテル、6−ウンデセニルビニルエーテル、7−ウンデセニルビニルエーテル、8−ウンデセニルビニルエーテル、9−ウンデセニルビニルエーテル、10−ウンデセニルビニルエーテル、3,6−ジオキサ−1−デセン、1−ナフチルビニルエーテル、2−ナフチルビニルエーテル、o−トリルビニルエーテル、m−トリルビニルエーテル、p−トリルビニルエーテル、2,3−キシリルビニルエーテル、2,4−キシリルビニルエーテル、ベンジルビニルエーテル、シクロヘキシルビニルエーテル、4−n−ブチルシクロヘキシルビニルエーテル、2−シクロヘキシリデンエチルビニルエーテル、4−[3−(2,2,4−トリメチル)ペンチル]−シクロヘキシルビニルエーテル、4−n−ドデシルシクロヘキシルビニルエーテル、4−シクロヘキシルシクロヘキシルビニルエーテル、ビニル(シクロヘキシルメチル)エーテル、1−シクロヘキシルエチルビニルエーテル、2−シクロヘキシルエチルビニルエーテル、2−デカヒドロナフチルビニルエーテル、2−シクロペンテニルビニルエーテル、2−シクロヘキセニルビニルエーテル、1−シクロペンテニルメチルビニルエーテル、1−シクロペンテニルエチルビニルエーテル、(1−シクロヘキセニルメチル)ビニルエーテル、[1−(1−シクロヘキセニル)エチル]ビニルエーテル、(3−メチル−1−シクロヘキセニル)メチルビニルエーテル、[(3,4−ジメチル−1−シクロヘキセニル)メチル]ビニルエーテル、[(3−メチル−4−エトキシ−1−シクロヘキセニル)メチル]ビニルエーテル、シクロヘプテニルメチルビニルエーテル、シクロオクテニルメチルビニルエーテル、2−シクロブチリデンエチルビニルエーテル、2−シクロペンチリデンエチルビニルエーテル、2−シクロヘキシリデン−1−メチルエチルビニルエーテル、2−シクロヘプチリデンエチルビニルエーテル、2−シクロオクチリデンエチルビニルエーテル、テルピネイルビニルエーテル、メンチルビニルエーテル、ノルボニルビニルエーテル、2−フリルビニルエーテル、3−フリルビニルエーテル、フルフリルビニルエーテル、テトラヒドロフルフリルビニルエーテル、2−チエニルビニルエーテル、3−チエニルビニルエーテル、2−テニルビニルエーテル、2−ピリジルビニルエーテル、3−ピリジルビニルエーテル、4−ピリジルビニルエーテル、2,6,8−トリメチルノニルビニルエーテル、酢酸2−(ビニルオキシ)エチル、3−メチル−2−ブテニルビニルエーテル、ビニル(3,3−ジフェニル−2−プロペニル)エーテル、N,N−ジメチル−2−(ビニルオキシ)エタンアミン、[2−(2−エトキシエトキシ)エチル]ビニルエーテル、グリシジルビニルエーテルといったビニルエーテル基を1つ有するビニルエーテル化合物が好ましく、プロピルビニルエーテル、2−エチルヘキシルビニルエーテル、及びグリシジルビニルエーテルからなる群より選ばれるビニルエーテル基を1つ有するビニルエーテル化合物がより好ましい。 From the viewpoint of handling after synthesis, methyl vinyl ether, ethyl vinyl ether, propyl vinyl ether, 1-propenyl vinyl ether, 1,2-dimethylpropyl vinyl ether, butyl vinyl ether, isobutyl vinyl ether, tert-butyl vinyl ether, 1,3-dimethylbutyl vinyl ether, 2-ethylbutyl vinyl ether, vinylhexyl ether, isohexyl vinyl ether, 2-ethylhexyl vinyl ether, 5-methylhexyl vinyl ether, 1-pentylhexyl vinyl ether, n-heptyl vinyl ether, 1-methylheptyl vinyl ether, octyl vinyl ether, 4-ethyl-1 -Methyl octyl vinyl ether, 2-methyl octyl vinyl ether, n-nonyl vinyl ether N-decyl vinyl ether, undecyl vinyl ether, dodecyl vinyl ether, tridecyl vinyl ether, tetradecyl vinyl ether, pentadecyl vinyl ether, vinyl hexadecyl ether, heptadecyl vinyl ether, n-eicosyl vinyl ether, henicosyl vinyl ether, n-docosyl Vinyl ether, tricosyl vinyl ether, tetracosyl vinyl ether, n-pentyl vinyl ether, isopentyl vinyl ether, octadecyl vinyl ether, vinyl (6-methylheptyl) ether, vinyl sec-butyl ether, triethylene glycol methyl vinyl ether, (1,5-dimethyl- 1-vinyl-4-hexenyl) vinyl ether, vinyl (1-methylethenyl) ether, 1-methyl Ryl vinyl ether, 2-methylallyl vinyl ether, vinyl 2-butenyl ether, 2-pentenyl vinyl ether, cis-1-methyl-2-butenyl vinyl ether, trans-1-methyl-2-butenyl vinyl ether, 1-ethylallyl vinyl ether 1,3-dimethyl-2-butenyl vinyl ether, 1-methyl-2-hexenyl vinyl ether, phenyl vinyl ether, (6-phenyl-2-hexenyl) vinyl ether, (2,2-dimethylpropyl) vinyl ether, (1-ethyl) Propyl) vinyl ether (1-isopropyl-2-methylpropyl) vinyl ether, p-phenylbenzyl vinyl ether, vinyl (α-methylbenzyl) ether, phenethyl vinyl ether, 2-phenylpropyl vinyl ether Ter, 3-phenylpropyl vinyl ether, α, α-dimethylbenzyl vinyl ether, vinyl benzhydryl ether, 2-phenylallyl vinyl ether, 1-methyl-2-phenylallyl vinyl ether, glycidyl vinyl ether, allyl vinyl ether, 3-hexenyl vinyl ether, 4- Hexenyl vinyl ether, 5-hexenyl vinyl ether, 1-heptenyl vinyl ether, 2-heptenyl vinyl ether, 3-heptenyl vinyl ether, 4-heptenyl vinyl ether, 5-heptenyl vinyl ether, 6-heptenyl vinyl ether, 1-octenyl vinyl ether, 2-octenyl vinyl ether, 3-octenyl vinyl ether, 4-octenyl vinyl ether, 5-octenyl vinyl ether, 6-o Tenenyl vinyl ether, 7-octenyl vinyl ether, 1-nonenyl vinyl ether, 2-nonenyl vinyl ether, 3-nonenyl vinyl ether, 4-nonenyl vinyl ether, 5-nonenyl vinyl ether, 6-nonenyl vinyl ether, 7-nonenyl vinyl ether 8-nonenyl vinyl ether, 1-decenyl vinyl ether, 2-decenyl vinyl ether, 3-decenyl vinyl ether, 4-decenyl vinyl ether, 5-decenyl vinyl ether, 6-decenyl vinyl ether, 7 -Decenyl vinyl ether, 8-decenyl vinyl ether, 9-decenyl vinyl ether, 1-undecenyl vinyl ether, 2-undecenyl vinyl ether, 3-undecenyl vinyl ether, 4-undecenyl vinyl ether, 5- Eun Senyl vinyl ether, 6-undecenyl vinyl ether, 7-undecenyl vinyl ether, 8-undecenyl vinyl ether, 9-undecenyl vinyl ether, 10-undecenyl vinyl ether, 3,6-dioxa-1-decene, 1, -Naphtyl vinyl ether, 2-naphthyl vinyl ether, o-tolyl vinyl ether, m-tolyl vinyl ether, p-tolyl vinyl ether, 2,3-xylyl vinyl ether, 2,4-xylyl vinyl ether, benzyl vinyl ether, cyclohexyl vinyl ether, 4-n- Butyl cyclohexyl vinyl ether, 2-cyclohexylidene ethyl vinyl ether, 4- [3- (2,2,4-trimethyl) pentyl] -cyclohexyl vinyl ether, 4-n-dodecyl cyclohexyl vinyl Ether, 4-cyclohexylcyclohexyl vinyl ether, vinyl (cyclohexylmethyl) ether, 1-cyclohexylethyl vinyl ether, 2-cyclohexylethyl vinyl ether, 2-decahydronaphthyl vinyl ether, 2-cyclopentenyl vinyl ether, 2-cyclohexenyl vinyl ether, 1-cyclopentenyl Methyl vinyl ether, 1-cyclopentenylethyl vinyl ether, (1-cyclohexenylmethyl) vinyl ether, [1- (1-cyclohexenyl) ethyl] vinyl ether, (3-methyl-1-cyclohexenyl) methyl vinyl ether, [(3,4 -Dimethyl-1-cyclohexenyl) methyl] vinyl ether, [(3-methyl-4-ethoxy-1-cyclohexenyl) methyl] vinyl Ether, cycloheptenyl methyl vinyl ether, cyclooctenyl methyl vinyl ether, 2-cyclobutylidene ethyl vinyl ether, 2-cyclopentylidene ethyl vinyl ether, 2-cyclohexylidene-1-methyl ethyl vinyl ether, 2-cycloheptylidene ethyl vinyl ether 2-cyclooctylidene ethyl vinyl ether, terpineyl vinyl ether, menthyl vinyl ether, norbornyl vinyl ether, 2-furyl vinyl ether, 3-furyl vinyl ether, furfuryl vinyl ether, tetrahydrofurfuryl vinyl ether, 2-thienyl vinyl ether, 3-thienyl vinyl ether, 2-Tenyl vinyl ether, 2-pyridyl vinyl ether, 3-pyridyl vinyl ether, 4-pyridyl vinyl Ether, 2,6,8-trimethylnonyl vinyl ether, 2- (vinyloxy) ethyl acetate, 3-methyl-2-butenyl vinyl ether, vinyl (3,3-diphenyl-2-propenyl) ether, N, N-dimethyl- Vinyl ether compounds having one vinyl ether group such as 2- (vinyloxy) ethanamine, [2- (2-ethoxyethoxy) ethyl] vinyl ether, and glycidyl vinyl ether are preferred, and are selected from the group consisting of propyl vinyl ether, 2-ethylhexyl vinyl ether, and glycidyl vinyl ether. More preferred are vinyl ether compounds having one vinyl ether group.
前記特定硬化促進化合物は、電子部品用樹脂組成物の低粘度と保存安定性の観点から、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、ピロガロール、フロログルシノール、2,2’−ビフェノール、4,4'−ビフェノール、ビスフェノールA、ビスフェノールF、フェニルフェノール及びアミノフェノール等のフェノール化合物、並びに、α−ナフトール、β−ナフトール及び1,2−ジヒドロキシナフタレン、2,3−ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも1種のフェノール性水酸基を有する化合物と、ビニルエーテル基を2つ有するジビニルエーテル化合物の付加反応物であることが好ましく、
前記ビニルエーテル基を2つ有するジビニルエーテル化合物が、ジビニルエーテル、エチレングリコールジビニルエーテル、ジエチレングリコールジビニルエーテル、トリエチレングリコールジビニルエーテル、テトラエチレングリコールジビニルエーテル、ヘプタエチレングリコールジビニルエーテル、1,3−プロパンジオールジビニルエーテル、プロピレングリコールジビニルエーテル、1,4−ブタンジオールジビニルエーテル、1,3−ブタンジオールジビニルエーテル、1,2−ブタンジオールジビニルエーテル、2,3−ブタンジオールジビニルエーテル、1−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,2−プロパンジオールジビニルエーテル、1,5−ペンタンジオールジビニルエーテル、1,6−ヘキサンジオールジビニルエーテル、シクロヘキサン−1,4−ジオールジビニルエーテル、シクロヘキサン−1,4−ジメタノールジビニルエーテル、p−キシレングリコールジビニルエーテル、トリプロピレングリコールジビニルエーテル、テトラプロピレングリコールジビニルエーテル、及びポリプロピレングリコールジビニルエーテルからなる群より選ばれる少なくとも1種であることがより好ましく、
さらに硬化促進性の観点から、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、2,2’−ビフェノール、1,2−ジヒドロキシナフタレン、及び2,3−ジヒドロキシナフタレンからなる群より選ばれる少なくとも1種のフェノール性水酸基を有する化合物と、ジビニルエーテル、エチレングリコールジビニルエーテル、ジエチレングリコールジビニルエーテル、トリエチレングリコールジビニルエーテル、テトラエチレングリコールジビニルエーテル、ヘプタエチレングリコールジビニルエーテル、1,3−プロパンジオールジビニルエーテル、プロピレングリコールジビニルエーテル、1,4−ブタンジオールジビニルエーテル、1,3−ブタンジオールジビニルエーテル、1,2−ブタンジオールジビニルエーテル、2,3−ブタンジオールジビニルエーテル、1−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,2−プロパンジオールジビニルエーテル、1,5−ペンタンジオールジビニルエーテル、1,6−ヘキサンジオールジビニルエーテル、シクロヘキサン−1,4−ジオールジビニルエーテル、シクロヘキサン−1,4−ジメタノールジビニルエーテル、p−キシレングリコールジビニルエーテル、トリプロピレングリコールジビニルエーテル、テトラプロピレングリコールジビニルエーテル、及びポリプロピレングリコールジビニルエーテルからなる群より選ばれる少なくとも1種のビニルエーテル基を2つ有するジビニルエーテル化合物の付加反応物であることがさらに好ましい。The specific curing accelerating compound is phenol, cresol, xylenol, resorcin, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4-methylcatechol from the viewpoint of low viscosity and storage stability of the resin composition for electronic parts. , 3-methoxycatechol, 3,5-di-tert-butylcatechol, pyrogallol, phloroglucinol, 2,2′-biphenol, 4,4′-biphenol, bisphenol A, bisphenol F, phenylphenol, aminophenol, etc. A phenol compound, a compound having at least one phenolic hydroxyl group selected from the group consisting of naphthol compounds such as α-naphthol, β-naphthol and 1,2-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, and vinyl ether The is preferably an addition product of divinyl ether compounds having two,
The divinyl ether compound having two vinyl ether groups is divinyl ether, ethylene glycol divinyl ether, diethylene glycol divinyl ether, triethylene glycol divinyl ether, tetraethylene glycol divinyl ether, heptaethylene glycol divinyl ether, 1,3-propanediol divinyl ether. , Propylene glycol divinyl ether, 1,4-butanediol divinyl ether, 1,3-butanediol divinyl ether, 1,2-butanediol divinyl ether, 2,3-butanediol divinyl ether, 1-methyl-1,3- Propanediol divinyl ether, 2-methyl-1,3-propanediol divinyl ether, 2-methyl-1,2-propanediol divinyl Ether, 1,5-pentanediol divinyl ether, 1,6-hexanediol divinyl ether, cyclohexane-1,4-diol divinyl ether, cyclohexane-1,4-dimethanol divinyl ether, p-xylene glycol divinyl ether, tripropylene More preferably, it is at least one selected from the group consisting of glycol divinyl ether, tetrapropylene glycol divinyl ether, and polypropylene glycol divinyl ether,
Furthermore, from the viewpoint of curing acceleration, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4-methylcatechol, 3-methoxycatechol, 3,5-di-tert-butylcatechol, 2,2′-biphenol, A compound having at least one phenolic hydroxyl group selected from the group consisting of 1,2-dihydroxynaphthalene and 2,3-dihydroxynaphthalene, divinyl ether, ethylene glycol divinyl ether, diethylene glycol divinyl ether, triethylene glycol divinyl ether, Tetraethylene glycol divinyl ether, heptaethylene glycol divinyl ether, 1,3-propanediol divinyl ether, propylene glycol divinyl ether, 1,4-butanediol divinyl Ether, 1,3-butanediol divinyl ether, 1,2-butanediol divinyl ether, 2,3-butanediol divinyl ether, 1-methyl-1,3-propanediol divinyl ether, 2-methyl-1,3- Propanediol divinyl ether, 2-methyl-1,2-propanediol divinyl ether, 1,5-pentanediol divinyl ether, 1,6-hexanediol divinyl ether, cyclohexane-1,4-diol divinyl ether, cyclohexane-1, From the group consisting of 4-dimethanol divinyl ether, p-xylene glycol divinyl ether, tripropylene glycol divinyl ether, tetrapropylene glycol divinyl ether, and polypropylene glycol divinyl ether And more preferably an addition reaction product of divinyl ether compound two having at least one vinyl ether group barrel.
また前記特定硬化促進化合物は、電子部品用樹脂組成物の低粘度とハンドリング性の観点から、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、ピロガロール、フロログルシノール、2,2’−ビフェノール、4,4'−ビフェノール、ビスフェノールA、ビスフェノールF、フェニルフェノール及びアミノフェノール等のフェノール化合物、並びに、α−ナフトール、β−ナフトール及び1,2−ジヒドロキシナフタレン、2,3−ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも1種のフェノール性水酸基を有する化合物と、ビニルエーテル基を1つだけ有するビニルエーテル化合物の付加反応物であることが好ましく、
硬化促進性の観点から、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、2,2’−ビフェノール、1,2−ジヒドロキシナフタレン、及び2,3−ジヒドロキシナフタレンからなる群より選ばれる少なくとも1種のフェノール性水酸基を有する化合物と、ビニルエーテル基を1つだけ有するビニルエーテル化合物の付加反応物であることがより好ましい。The specific curing accelerating compounds are phenol, cresol, xylenol, resorcin, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4-methylcatechol from the viewpoint of low viscosity and handling properties of the resin composition for electronic parts. , 3-methoxycatechol, 3,5-di-tert-butylcatechol, pyrogallol, phloroglucinol, 2,2′-biphenol, 4,4′-biphenol, bisphenol A, bisphenol F, phenylphenol, aminophenol, etc. A phenol compound, a compound having at least one phenolic hydroxyl group selected from the group consisting of naphthol compounds such as α-naphthol, β-naphthol and 1,2-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, and vinyl Is preferably an addition product of a vinyl ether compound having the ether group only one
From the viewpoint of curing acceleration, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4-methylcatechol, 3-methoxycatechol, 3,5-di-tert-butylcatechol, 2,2′-biphenol, 1 More preferably, it is an addition reaction product of a compound having at least one phenolic hydroxyl group selected from the group consisting of 1,2-dihydroxynaphthalene and 2,3-dihydroxynaphthalene and a vinyl ether compound having only one vinyl ether group. .
前記電子部品用樹脂組成物は、低粘度と保存安定性の観点から、前記特定硬化促進化合物が、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、ピロガロール、フロログルシノール、2,2’−ビフェノール、4,4'−ビフェノール、ビスフェノールA、ビスフェノールF、フェニルフェノール及びアミノフェノール等のフェノール化合物、並びに、α−ナフトール、β−ナフトール及び1,2−ジヒドロキシナフタレン、2,3−ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも1種のフェノール性水酸基を有する化合物と、ビニルエーテル基を2つ有するジビニルエーテル化合物の付加反応物であり、その含有率がエポキシ樹脂の総質量に対して0.2質量%〜30質量%であることが好ましく、
前記特定硬化促進化合物が、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、ピロガロール、フロログルシノール、2,2’−ビフェノール、4,4'−ビフェノール、ビスフェノールA、ビスフェノールF、フェニルフェノール及びアミノフェノール等のフェノール化合物、並びに、α−ナフトール、β−ナフトール及び1,2−ジヒドロキシナフタレン、2,3−ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも1種のフェノール性水酸基を有する化合物と、ジビニルエーテル、エチレングリコールジビニルエーテル、ジエチレングリコールジビニルエーテル、トリエチレングリコールジビニルエーテル、テトラエチレングリコールジビニルエーテル、ヘプタエチレングリコールジビニルエーテル、1,3−プロパンジオールジビニルエーテル、プロピレングリコールジビニルエーテル、1,4−ブタンジオールジビニルエーテル、1,3−ブタンジオールジビニルエーテル、1,2−ブタンジオールジビニルエーテル、2,3−ブタンジオールジビニルエーテル、1−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,3−プロパンジオールジビニルエーテル、2−メチル−1,2−プロパンジオールジビニルエーテル、1,5−ペンタンジオールジビニルエーテル、1,6−ヘキサンジオールジビニルエーテル、シクロヘキサン−1,4−ジオールジビニルエーテル、シクロヘキサン−1,4−ジメタノールジビニルエーテル、p−キシレングリコールジビニルエーテル、トリプロピレングリコールジビニルエーテル、テトラプロピレングリコールジビニルエーテル、及びポリプロピレングリコールジビニルエーテルからなる群より選ばれる少なくとも1種であるビニルエーテル基を2つ有するジビニルエーテル化合物の付加反応物であり、その含有率がエポキシ樹脂の総質量に対して0.6質量%〜20質量%であることがより好ましい。In the resin composition for electronic parts, from the viewpoint of low viscosity and storage stability, the specific curing accelerating compound is phenol, cresol, xylenol, resorcin, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4- Methyl catechol, 3-methoxy catechol, 3,5-di-tert-butyl catechol, pyrogallol, phloroglucinol, 2,2'-biphenol, 4,4'-biphenol, bisphenol A, bisphenol F, phenylphenol and aminophenol And a compound having at least one phenolic hydroxyl group selected from the group consisting of naphthol compounds such as α-naphthol, β-naphthol and 1,2-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, and the like, Vinylue Is an addition reaction product of divinyl ether compound having two ether groups, preferably has a content of from 0.2% to 30% by weight based on the total weight of the epoxy resin,
The specific curing accelerator compound is phenol, cresol, xylenol, resorcin, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4-methylcatechol, 3-methoxycatechol, 3,5-di-tert-butylcatechol, Pyrogallol, phloroglucinol, 2,2′-biphenol, 4,4′-biphenol, phenolic compounds such as bisphenol A, bisphenol F, phenylphenol and aminophenol, and α-naphthol, β-naphthol and 1,2- A compound having at least one phenolic hydroxyl group selected from the group consisting of naphthol compounds such as dihydroxynaphthalene and 2,3-dihydroxynaphthalene, divinyl ether, ethylene glycol divinyl ether, diethylene group Coal divinyl ether, triethylene glycol divinyl ether, tetraethylene glycol divinyl ether, heptaethylene glycol divinyl ether, 1,3-propanediol divinyl ether, propylene glycol divinyl ether, 1,4-butanediol divinyl ether, 1,3-butane Diol divinyl ether, 1,2-butanediol divinyl ether, 2,3-butanediol divinyl ether, 1-methyl-1,3-propanediol divinyl ether, 2-methyl-1,3-propanediol divinyl ether, 2- Methyl-1,2-propanediol divinyl ether, 1,5-pentanediol divinyl ether, 1,6-hexanediol divinyl ether, cyclohexane-1,4-dioe Vinyl ether that is at least one selected from the group consisting of divinyl ether, cyclohexane-1,4-dimethanol divinyl ether, p-xylene glycol divinyl ether, tripropylene glycol divinyl ether, tetrapropylene glycol divinyl ether, and polypropylene glycol divinyl ether It is an addition reaction product of a divinyl ether compound having two groups, and the content is more preferably 0.6% by mass to 20% by mass with respect to the total mass of the epoxy resin.
さらに前記電子部品用樹脂組成物は、低粘度とハンドリング性の観点から、前記特定硬化促進化合物が、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、4−tert−ブチルカテコール、3−メチルカテコール、4−メチルカテコール、3−メトキシカテコール、3,5−ジ−tert−ブチルカテコール、ピロガロール、フロログルシノール、2,2’−ビフェノール、4,4'−ビフェノール、ビスフェノールA、ビスフェノールF、フェニルフェノール及びアミノフェノール等のフェノール化合物、並びに、α−ナフトール、β−ナフトール及び1,2−ジヒドロキシナフタレン、2,3−ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも1種のフェノール性水酸基を有する化合物と、ビニルエーテル基を1つだけ有するビニルエーテル化合物の付加反応物であり、その含有率がエポキシ樹脂の総質量に対して0.2質量%〜30質量%であることもまた好ましい。 Furthermore, in the resin composition for electronic parts, from the viewpoint of low viscosity and handling properties, the specific curing accelerating compound may be phenol, cresol, xylenol, resorcin, catechol, 4-tert-butylcatechol, 3-methylcatechol, 4- Methyl catechol, 3-methoxy catechol, 3,5-di-tert-butyl catechol, pyrogallol, phloroglucinol, 2,2'-biphenol, 4,4'-biphenol, bisphenol A, bisphenol F, phenylphenol and aminophenol A compound having at least one phenolic hydroxyl group selected from the group consisting of naphthol compounds such as α-naphthol, β-naphthol and 1,2-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, etc. Is an addition reaction product of a vinyl ether compound having a vinyl ether group only one, it is also preferable that content is 0.2% to 30% by weight based on the total weight of the epoxy resin.
前記電子部品用樹脂組成物は、本発明の効果が達成される範囲内であれば、特定硬化促進化合物に加えて、さらに従来公知のその他の硬化促進剤も併用することができる。その他の硬化促進剤としては、1,8−ジアザ−ビシクロ[5.4.0]ウンデセン−7、1,5−ジアザ−ビシクロ[4.3.0]ノネン、5、6−ジブチルアミノ−1,8−ジアザ−ビシクロ[5.4.0]ウンデセン−7等のシクロアミジン化合物;トリエチレンジアミン、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノール等の三級アミン化合物;2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール、2−フェニル−4−メチル−ヒドロキシイミダゾール、1−ベンジル−2−フェニルイミダゾール、1−ベンジル−2−メチルイミダゾール、2−フェニル−4,5−ジヒドロキシメチルイミダゾール、2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール、2,4−ジアミノ−6−(2’−メチルイミダゾリル−(1’))−エチル−s−トリアジン、2−ヘプタデシルイミダゾール等のイミダゾール化合物;トリブチルホスフィン等のトリアルキルホスフィン、ジメチルフェニルホスフィン等のジアルキルアリールホスフィン、メチルジフェニルホスフィン等のアルキルジアリールホスフィン、トリフェニルホスフィン、アルキル基置換トリフェニルホスフィン等の有機ホスフィン類;これらの化合物に無水マレイン酸、1,4−ベンゾキノン、2,5−トルキノン、1,4−ナフトキノン、2,3−ジメチルベンゾキノン、2,6−ジメチルベンゾキノン、2,3−ジメトキシ−5−メチル−1,4−ベンゾキノン、2,3−ジメトキシ−1,4−ベンゾキノン、フェニル−1,4−ベンゾキノン等のキノン化合物、ジアゾフェニルメタン、フェノール樹脂等のπ結合をもつ化合物を付加してなる分子内分極を有する化合物;並びにこれらの誘導体が挙げられる。さらには2−エチル−4−メチルイミダゾールテトラフェニルボレート、N−メチルモルホリンテトラフェニルボレート等のフェニルボロン塩などが挙げられる。また潜在性を有するその他の硬化促進剤として、常温固体のアミノ基を有する化合物をコアとして、常温固体のエポキシ化合物のシェルを被覆してなるコア−シェル粒子が挙げられ、市販品としてアミキュア(味の素株式会社製、商品名)、マイクロカプセル化されたアミンをビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂に分散させたノバキュア(旭化成ケミカルズ株式会社製、商品名)などが使用できる。 If the said resin composition for electronic components is in the range with which the effect of this invention is achieved, in addition to a specific hardening acceleration | stimulation compound, another conventionally well-known hardening accelerator can be used together. Other curing accelerators include 1,8-diaza-bicyclo [5.4.0] undecene-7, 1,5-diaza-bicyclo [4.3.0] nonene, 5,6-dibutylamino-1. , 8-diaza-bicyclo [5.4.0] undecene-7 and other cycloamidine compounds; triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol and other tertiary amine compounds 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-phenyl-4-methyl-hydroxyimidazole, 1-benzyl-2-phenylimidazole, 1 -Benzyl-2-methylimidazole, 2-phenyl-4,5-dihydride Ximethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2,4-diamino-6- (2′-methylimidazolyl- (1 ′))-ethyl-s-triazine, 2-heptadecylimidazole Imidazole compounds such as tributylphosphine, dialkylarylphosphine such as dimethylphenylphosphine, alkyldiarylphosphine such as methyldiphenylphosphine, triphenylphosphine, and organic phosphines such as triphenylphosphine substituted with an alkyl group; these compounds Maleic anhydride, 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3-dimethoxy-5-methyl-1, -Intramolecular polarization formed by adding a quinone compound such as benzoquinone, 2,3-dimethoxy-1,4-benzoquinone, phenyl-1,4-benzoquinone, or a compound having a π bond such as diazophenylmethane or phenol resin. Compounds; and derivatives thereof. Furthermore, phenylboron salts such as 2-ethyl-4-methylimidazole tetraphenylborate and N-methylmorpholine tetraphenylborate are exemplified. Other potential curing accelerators include core-shell particles in which a normal temperature solid amino group-containing compound is used as a core and a normal temperature solid epoxy compound shell is coated. Amicure (Ajinomoto Co., Inc.) is a commercially available product. Novacure (trade name, manufactured by Asahi Kasei Chemicals Co., Ltd.) in which a microencapsulated amine is dispersed in a bisphenol A type epoxy resin or a bisphenol F type epoxy resin can be used.
硬化促進剤の含有率は、硬化促進効果が達成される量であれば特に制限されるものではない。前記エポキシ樹脂の総質量に対して0.2質量%〜30質量%の範囲が好ましく、0.5質量%〜25質量%の範囲がより好ましく、6質量%〜20質量%の範囲がさらに好ましい。0.2質量%以上含有することで硬化促進剤の添加効果が充分に発揮することができ、結果として成形時のボイド発生の抑制や、反り低減効果を充分に得られやすくなる。30質量%以下であることで保存安定性により優れる。 The content of the curing accelerator is not particularly limited as long as the curing acceleration effect is achieved. The range of 0.2% by mass to 30% by mass is preferable with respect to the total mass of the epoxy resin, the range of 0.5% by mass to 25% by mass is more preferable, and the range of 6% by mass to 20% by mass is more preferable. . When the content is 0.2% by mass or more, the effect of adding the curing accelerator can be sufficiently exerted, and as a result, the generation of voids during molding and the effect of reducing warpage can be sufficiently obtained. It is more excellent in storage stability when it is 30% by mass or less.
(D)無機充填剤
前記電子部品用樹脂組成物は更に、熱膨張係数の低減などの観点から、無機充填剤の少なくとも1種を含むことが好ましい。無機充填剤としては、例えば、溶融シリカ、結晶シリカ等のシリカ、炭酸カルシウム、クレー、アルミナ、窒化珪素、炭化珪素、窒化ホウ素、珪酸カルシウム、チタン酸カリウム、窒化アルミ、ベリリア、ジルコニア、ジルコン、フォステライト、ステアタイト、スピネル、ムライト、チタニアなどがあり、これらの粉体、又はこれらを球形化したビーズの他、ガラス繊維などが挙げられる。さらに、難燃効果のある無機充填剤としては水酸化アルミニウム、水酸化マグネシウム、硼酸亜鉛、モリブデン酸亜鉛などが挙げられる。これらの中でも溶融シリカが好ましく、電子部品用樹脂組成物の微細間隙への流動性・浸透性の観点からは球形シリカがより好ましい。これらの無機充填剤は単独で用いても2種類以上を組み合わせて用いてもよい。(D) Inorganic filler It is preferable that the said resin composition for electronic components contains at least 1 sort (s) of an inorganic filler further from viewpoints, such as reduction of a thermal expansion coefficient. Examples of inorganic fillers include silica such as fused silica and crystalline silica, calcium carbonate, clay, alumina, silicon nitride, silicon carbide, boron nitride, calcium silicate, potassium titanate, aluminum nitride, beryllia, zirconia, zircon, phosphor. There are stellite, steatite, spinel, mullite, titania, and the like. In addition to these powders or beads obtained by spheroidizing these, glass fibers and the like can be mentioned. Furthermore, examples of the inorganic filler having a flame retardant effect include aluminum hydroxide, magnesium hydroxide, zinc borate, and zinc molybdate. Among these, fused silica is preferable, and spherical silica is more preferable from the viewpoint of fluidity and permeability into the fine gap of the resin composition for electronic components. These inorganic fillers may be used alone or in combination of two or more.
無機充填剤の体積平均粒径は、特に球形シリカの場合、0.1μm以上10μm以下の範囲が好ましく、体積平均粒径0.3μm以上5μm以下の範囲がより好ましく、0.5μm以上3μm以下の範囲がさらに好ましい。体積平均粒径が0.1μm以上とすることで液状樹脂への分散性に優れ、電子部品用樹脂組成物にチキソトロピック性が付与されにくく、流動特性に優れる効果が得られる。10μm以下とすることで、電子部品用樹脂組成物中での無機充填剤の沈降を低減でき、電子部品用樹脂組成物としての微細間隙への浸透性・流動性が向上してボイド・未充填を防止できる傾向がある。
体積平均粒径は、レーザー散乱回折法粒度分布測定装置により測定することができる。The volume average particle diameter of the inorganic filler is preferably in the range of 0.1 μm to 10 μm, more preferably in the range of 0.3 μm to 5 μm, and more preferably in the range of 0.5 μm to 3 μm, particularly in the case of spherical silica. A range is further preferred. When the volume average particle size is 0.1 μm or more, the dispersibility in the liquid resin is excellent, and thixotropic properties are hardly imparted to the resin composition for electronic parts, and an effect of excellent flow characteristics is obtained. By setting it to 10 μm or less, sedimentation of the inorganic filler in the resin composition for electronic parts can be reduced, and the permeability and fluidity to the fine gap as the resin composition for electronic parts are improved, resulting in voids / unfilled There is a tendency to be able to prevent.
The volume average particle diameter can be measured with a laser scattering diffraction particle size distribution analyzer.
無機充填剤の含有率は、電子部品用樹脂組成物の総質量中に50質量%以上80質量%以下の範囲に設定することが好ましい。無機充填剤の含有率は55質量%以上75質量%以下の範囲に設定することが好ましく、さらに好ましくは60質量%以上70質量%以下である。無機充填剤の含有率が50質量%以上であると、熱膨張係数の低減効果が得られやすい。また無機充填剤の含有率が80質量%を以下であると、電子部品用樹脂組成物の粘度が上昇を防ぎ、流動性・浸透性及びディスペンス性が良好となる。 The content of the inorganic filler is preferably set in the range of 50% by mass to 80% by mass in the total mass of the resin composition for electronic components. The content of the inorganic filler is preferably set in the range of 55% by mass to 75% by mass, and more preferably 60% by mass to 70% by mass. When the content of the inorganic filler is 50% by mass or more, an effect of reducing the thermal expansion coefficient is easily obtained. When the content of the inorganic filler is 80% by mass or less, the viscosity of the resin composition for electronic parts is prevented from increasing, and fluidity / penetration and dispensing properties are improved.
(E)その他添加剤
前記電子部品用樹脂組成物は、耐熱衝撃性向上、半導体素子への応力低減などの観点から各種可撓剤を含有することができる。可撓剤としては特に制限はないが、ゴム粒子が好ましい。可撓剤としては、スチレン−ブタジエンゴム(SBR)、ニトリル−ブタジエンゴム(NBR)、ブタジエンゴム(BR)、ウレタンゴム(UR)、アクリルゴム(AR)等のゴム粒子が挙げられる。なかでも耐熱性、耐湿性の観点からアクリルゴムからなるゴム粒子が好ましく、コアシェル型アクリル系重合体、すなわちコアシェル型アクリルゴム粒子がより好ましい。(E) Other additives The resin composition for electronic components can contain various flexible agents from the viewpoint of improving thermal shock resistance and reducing stress on the semiconductor element. Although there is no restriction | limiting in particular as a flexible agent, A rubber particle is preferable. Examples of the flexible agent include rubber particles such as styrene-butadiene rubber (SBR), nitrile-butadiene rubber (NBR), butadiene rubber (BR), urethane rubber (UR), and acrylic rubber (AR). Among these, rubber particles made of acrylic rubber are preferable from the viewpoint of heat resistance and moisture resistance, and core-shell type acrylic polymers, that is, core-shell type acrylic rubber particles are more preferable.
また、上記以外のゴム粒子としてシリコーンゴム粒子も好適に用いることができる。シリコーンゴム粒子としては、直鎖状のポリジメチルシロキサン、ポリメチルフェニルシロキサン、ポリジフェニルシロキサン等のポリオルガノシロキサンを架橋したシリコーンゴム粒子、表面がシリコーンレジンで被覆されたシリコーンゴム粒子、表面がエポキシ基で修飾されたシリコーンゴム粒子、乳化重合などで得られる固形シリコーン粒子のコアとアクリル樹脂等の有機重合体のシェルからなるコア−シェル重合体粒子などが挙げられる。 Silicone rubber particles can also be suitably used as rubber particles other than those described above. Silicone rubber particles include silicone rubber particles obtained by crosslinking polyorganosiloxanes such as linear polydimethylsiloxane, polymethylphenylsiloxane, and polydiphenylsiloxane, silicone rubber particles whose surfaces are coated with a silicone resin, and surfaces that are epoxy groups. And core-shell polymer particles comprising a core of solid silicone particles obtained by emulsion polymerization and a shell of an organic polymer such as an acrylic resin.
これらのシリコーンゴム粒子の形状は無定形であっても球形であっても使用することができるが、電子部品用樹脂組成物の成形性に関わる粘度を低く抑えるためには球形のものを用いることが好ましい。これらのシリコーンゴム粒子は東レ・ダウコーニング・シリコーン株式会社、信越化学工業株式会社などから市販品が入手可能である。 These silicone rubber particles can be used in an amorphous or spherical shape, but in order to keep the viscosity related to the moldability of the resin composition for electronic parts low, use a spherical one. Is preferred. These silicone rubber particles are commercially available from Toray Dow Corning Silicone Co., Ltd. and Shin-Etsu Chemical Co., Ltd.
シリコーンゴム粒子の体積平均粒径は、耐熱衝撃性向上、半導体素子への応力低減などの観点から、0.001μm以上100μm以下であることが好ましく、0.01μm以上50μm以下であることがより好ましく、0.05μm以上10μm以下であることが更に好ましい。 The volume average particle size of the silicone rubber particles is preferably 0.001 μm or more and 100 μm or less, more preferably 0.01 μm or more and 50 μm or less, from the viewpoint of improving thermal shock resistance and reducing stress on the semiconductor element. And more preferably 0.05 μm or more and 10 μm or less.
また前記電子部品用樹脂組成物は、必要に応じてシリコーン変性エポキシ樹脂を含有してもよい。シリコーン変性エポキシ樹脂は例えば、界面活性剤としての効果を有する。シリコーン変性エポキシ樹脂は、エポキシ基と反応する官能基を有するオルガノシロキサンとエポキシ樹脂との反応物として得ることができる。このシリコーン変性エポキシ樹脂は、常温で液状であることが好ましい。エポキシ基と反応する官能基を有するオルガノシロキサンとしては、アミノ基、カルボキシル基、水酸基、フェノール性水酸基、メルカプト基等の官能基を1分子中に1個以上有するジメチルシロキサン、ジフェニルシロキサン、メチルフェニルシロキサンなどが挙げられる。該オルガノシロキサンの重量平均分子量としては500以上5000以下の範囲が好ましい。重量平均分子量が500以上5000以下であると前記エポキシ樹脂との相溶性が適度であるためである。すなわち重量平均分子量が500以上であると、エポキシ樹脂と適度に相溶し、添加剤としての効果が適切に発揮される。重量平均分子量が5000以下であると、エポキシ樹脂に非相溶となることが抑えられ、シリコーン変性エポキシ樹脂が成形時に分離したり染み出したりするのを抑制し、接着性や外観に優れる。 Moreover, the said resin composition for electronic components may contain a silicone modified epoxy resin as needed. For example, the silicone-modified epoxy resin has an effect as a surfactant. The silicone-modified epoxy resin can be obtained as a reaction product of an organosiloxane having a functional group that reacts with an epoxy group and an epoxy resin. This silicone-modified epoxy resin is preferably liquid at normal temperature. Examples of the organosiloxane having a functional group that reacts with an epoxy group include dimethylsiloxane, diphenylsiloxane, and methylphenylsiloxane having one or more functional groups such as amino group, carboxyl group, hydroxyl group, phenolic hydroxyl group, and mercapto group in one molecule. Etc. The weight average molecular weight of the organosiloxane is preferably in the range of 500 or more and 5000 or less. This is because when the weight average molecular weight is 500 or more and 5000 or less, the compatibility with the epoxy resin is appropriate. That is, when the weight average molecular weight is 500 or more, it is appropriately compatible with the epoxy resin, and the effect as an additive is appropriately exhibited. When the weight average molecular weight is 5,000 or less, incompatibility with the epoxy resin is suppressed, the silicone-modified epoxy resin is prevented from being separated or exuded during molding, and the adhesiveness and appearance are excellent.
前記シリコーン変性エポキシ樹脂を得るためのエポキシ樹脂としては電子部品用樹脂組成物に含まれるエポキシ樹脂に相溶するものであれば特に制限はなく、電子部品用樹脂組成物に一般に使用されているエポキシ樹脂を用いることができる。例えば、ビスフェノールA、ビスフェノールF、ビスフェノールAD、ビスフェノールS、ナフタレンジオール、水添ビスフェノールA等のフェノール化合物とエピクロルヒドリンの反応により得られるグリシジルエーテル型エポキシ樹脂;オルソクレゾールノボラック型エポキシ樹脂をはじめとするフェノール化合物とアルデヒド化合物とを縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したノボラック型エポキシ樹脂;フタル酸、ダイマー酸等の多塩基酸とエピクロルヒドリンの反応により得られるグリシジルエステル型エポキシ樹脂;ジアミノジフェニルメタン、イソシアヌル酸等のポリアミンとエピクロルヒドリンの反応により得られるグリシジルアミン型エポキシ樹脂;オレフィン結合を過酢酸等の過酸で酸化して得られる線状脂肪族エポキシ樹脂、脂環族エポキシ樹脂などが挙げられる。これらを単独で用いても2種以上を組み合わせて用いてもよい。またこれらのエポキシ樹脂は常温で液状のものが好ましい。 The epoxy resin for obtaining the silicone-modified epoxy resin is not particularly limited as long as it is compatible with the epoxy resin contained in the resin composition for electronic components, and is an epoxy generally used for the resin composition for electronic components. Resin can be used. For example, glycidyl ether type epoxy resins obtained by reaction of phenol compounds such as bisphenol A, bisphenol F, bisphenol AD, bisphenol S, naphthalene diol, hydrogenated bisphenol A and epichlorohydrin; phenol compounds including orthocresol novolac type epoxy resins A novolak-type epoxy resin obtained by epoxidizing a novolak resin obtained by condensation or co-condensation of aldehyde with an aldehyde compound; a glycidyl ester-type epoxy resin obtained by reaction of a polybasic acid such as phthalic acid or dimer acid and epichlorohydrin; diaminodiphenylmethane; Glycidylamine-type epoxy resin obtained by reaction of polyamines such as isocyanuric acid and epichlorohydrin; obtained by oxidizing olefinic bonds with peracids such as peracetic acid Linear aliphatic epoxy resin, an alicyclic epoxy resin. These may be used alone or in combination of two or more. These epoxy resins are preferably liquid at room temperature.
シリコーン変性エポキシ樹脂の含有率は、電子部品用樹脂組成物の総質量中に、0.01質量%以上1.5質量%以下であることが好ましく、0.05質量%以上1質量%以下であることがより好ましい。シリコーン変性エポキシ樹脂の含有率が0.01質量%以上であると充分な添加効果が得られる傾向がある。またシリコーン変性エポキシ樹脂の含有率が1.5質量%以下であると、硬化時に硬化物表面からの染み出しの発生を防止し、接着力の低下を防止できる傾向がある。本発明の効果が得られる範囲であれば、シリコーン変性エポキシ樹脂以外にも、界面活性剤としての効果を持つ添加剤を含有することができる。 The content of the silicone-modified epoxy resin is preferably 0.01% by mass or more and 1.5% by mass or less, and 0.05% by mass or more and 1% by mass or less in the total mass of the resin composition for electronic components. More preferably. When the content of the silicone-modified epoxy resin is 0.01% by mass or more, a sufficient addition effect tends to be obtained. Further, when the content of the silicone-modified epoxy resin is 1.5% by mass or less, there is a tendency that it is possible to prevent exudation from the surface of the cured product at the time of curing and to prevent a decrease in adhesive force. As long as the effect of the present invention is obtained, an additive having an effect as a surfactant can be contained in addition to the silicone-modified epoxy resin.
前記電子部品用樹脂組成物は、必要に応じてカップリング剤を更に含有することができる。カップリング剤を含有することで、エポキシ樹脂と無機充填剤、又はエポキシ樹脂と電子部品の構成部材との界面接着をより強固にすることができる。これらのカップリング剤には特に制限はなく、従来公知のものを用いることができる。カップリング剤としては例えば、1級アミノ基、2級アミノ基、及び3級アミノ基から選ばれる少なくとも1種を有するシラン化合物、エポキシシラン、メルカプトシラン、アルキルシラン、ウレイドシラン、ビニルシラン等の各種シラン系化合物、チタン系化合物、アルミニウムキレート類、アルミニウム/ジルコニウム系化合物などが挙げられる。これらを具体的に例示すると、ビニルトリクロロシラン、ビニルトリエトキシシラン、ビニルトリス(β−メトキシエトキシ)シラン、γ−メタクリロキシプロピルトリメトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルメチルジメトキシシラン、ビニルトリアセトキシシラン、γ−メルカプトプロピルトリメトキシシラン、γ−アミノプロピルトリメトキシシラン、γ−アミノプロピルメチルジメトキシシラン、γ−アミノプロピルトリエトキシシラン、γ−アミノプロピルメチルジエトキシシラン、γ−アニリノプロピルトリメトキシシラン、γ−アニリノプロピルトリエトキシシラン、γ−(N,N−ジメチル)アミノプロピルトリメトキシシラン、γ−(N,N−ジエチル)アミノプロピルトリメトキシシラン、γ−(N,N−ジブチル)アミノプロピルトリメトキシシラン、γ−(N−メチル)アニリノプロピルトリメトキシシラン、γ−(N−エチル)アニリノプロピルトリメトキシシラン、γ−(N,N−ジメチル)アミノプロピルトリエトキシシラン、γ−(N,N−ジエチル)アミノプロピルトリエトキシシラン、γ−(N,N−ジブチル)アミノプロピルトリエトキシシラン、γ−(N−メチル)アニリノプロピルトリエトキシシラン、γ−(N−エチル)アニリノプロピルトリエトキシシラン、γ−(N,N−ジメチル)アミノプロピルメチルジメトキシシラン、γ−(N,N−ジエチル)アミノプロピルメチルジメトキシシラン、γ−(N,N−ジブチル)アミノプロピルメチルジメトキシシラン、γ−(N−メチル)アニリノプロピルメチルジメトキシシラン、γ−(N−エチル)アニリノプロピルメチルジメトキシシラン、N−(トリメトキシシリルプロピル)エチレンジアミン、N−(ジメトキシメチルシリルイソプロピル)エチレンジアミン、メチルトリメトキシシラン、ジメチルジメトキシシラン、メチルトリエトキシシラン、γ−クロロプロピルトリメトキシシラン、ヘキサメチルジシラン、ビニルトリメトキシシラン、γ−メルカプトプロピルメチルジメトキシシラン等のシラン系カップリング剤;イソプロピルトリイソステアロイルチタネート、イソプロピルトリス(ジオクチルパイロホスフェート)チタネート、イソプロピルトリス(N−アミノエチル−アミノエチル)チタネート、テトラオクチルビス(ジトリデシルホスファイト)チタネート、テトラ(2,2−ジアリルオキシメチル−1−ブチル)ビス(ジトリデシル)ホスファイトチタネート、ビス(ジオクチルパイロホスフェート)オキシアセテートチタネート、ビス(ジオクチルパイロホスフェート)エチレンチタネート、イソプロピルトリオクタノイルチタネート、イソプロピルジメタクリルイソステアロイルチタネート、イソプロピルトリドデシルベンゼンスルホニルチタネート、イソプロピルイソステアロイルジアクリルチタネート、イソプロピルトリス(ジオクチルホスフェート)チタネート、イソプロピルトリクミルフェニルチタネート、テトライソプロピルビス(ジオクチルホスファイト)チタネート等のチタネート系カップリング剤などが挙げられる。これらは1種を単独で用いても2種類以上を組み合わせて用いてもよい。 The resin composition for electronic parts may further contain a coupling agent as necessary. By containing the coupling agent, it is possible to further strengthen the interfacial adhesion between the epoxy resin and the inorganic filler, or between the epoxy resin and the component of the electronic component. There is no restriction | limiting in particular in these coupling agents, A conventionally well-known thing can be used. Examples of coupling agents include various silanes such as silane compounds having at least one selected from primary amino groups, secondary amino groups, and tertiary amino groups, epoxy silanes, mercapto silanes, alkyl silanes, ureido silanes, vinyl silanes, and the like. Compounds, titanium compounds, aluminum chelates, aluminum / zirconium compounds, and the like. Specific examples thereof include vinyltrichlorosilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, vinyltriacetoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropylmethyldimethoxysilane, γ -Aminopropyltriethoxysilane, γ-aminopropylmethyldiethoxysilane, γ-anilinopropyltrimethoxysilane, γ-anilinopropyltriethoxysilane, γ- (N, N-dimethyl) aminopropylto Methoxysilane, γ- (N, N-diethyl) aminopropyltrimethoxysilane, γ- (N, N-dibutyl) aminopropyltrimethoxysilane, γ- (N-methyl) anilinopropyltrimethoxysilane, γ- ( N-ethyl) anilinopropyltrimethoxysilane, γ- (N, N-dimethyl) aminopropyltriethoxysilane, γ- (N, N-diethyl) aminopropyltriethoxysilane, γ- (N, N-dibutyl) Aminopropyltriethoxysilane, γ- (N-methyl) anilinopropyltriethoxysilane, γ- (N-ethyl) anilinopropyltriethoxysilane, γ- (N, N-dimethyl) aminopropylmethyldimethoxysilane, γ -(N, N-diethyl) aminopropylmethyldimethoxysilane, γ- (N, N-dibutyl) amino Nopropylmethyldimethoxysilane, γ- (N-methyl) anilinopropylmethyldimethoxysilane, γ- (N-ethyl) anilinopropylmethyldimethoxysilane, N- (trimethoxysilylpropyl) ethylenediamine, N- (dimethoxymethylsilyl) Isopropyl) silane coupling agents such as ethylenediamine, methyltrimethoxysilane, dimethyldimethoxysilane, methyltriethoxysilane, γ-chloropropyltrimethoxysilane, hexamethyldisilane, vinyltrimethoxysilane, γ-mercaptopropylmethyldimethoxysilane; Isopropyl triisostearoyl titanate, isopropyl tris (dioctyl pyrophosphate) titanate, isopropyl tris (N-aminoethyl-aminoethyl) titanate, Traoctyl bis (ditridecyl phosphite) titanate, tetra (2,2-diallyloxymethyl-1-butyl) bis (ditridecyl) phosphite titanate, bis (dioctyl pyrophosphate) oxyacetate titanate, bis (dioctyl pyrophosphate) ethylene Titanate, isopropyl trioctanoyl titanate, isopropyl dimethacrylisostearoyl titanate, isopropyl tridodecylbenzenesulfonyl titanate, isopropyl isostearoyl diacryl titanate, isopropyl tris (dioctyl phosphate) titanate, isopropyl tricumyl phenyl titanate, tetraisopropyl bis (dioctyl phosphite) ) Titanate coupling agents such as titanate The These may be used alone or in combination of two or more.
また、本発明の電子部品用樹脂組成物には、必要に応じて下記一般式(1)又は(2)で表されるイオントラップ剤を更に含有することが好ましい。イオントラップ剤を更に含有することで、IC等の半導体素子の耐マイグレーション性、耐湿性及び高温放置特性をより向上させることができる。
Mg(1−x)Alx(OH)2(CO3)x/2・mH2O ・・・(1)
(0<x≦0.5、mは正の数)
BiOx(OH)y(NO3)z ・・・(2)
(0.9≦x≦1.1、 0.6≦y≦0.8、 0.2≦z≦0.4)Moreover, it is preferable that the resin composition for electronic parts of this invention further contains the ion trap agent represented by the following general formula (1) or (2) as needed. By further containing an ion trapping agent, it is possible to further improve the migration resistance, moisture resistance and high temperature storage characteristics of a semiconductor element such as an IC.
Mg (1-x) Al x (OH) 2 (CO 3 ) x / 2 · mH 2 O (1)
(0 <x ≦ 0.5, m is a positive number)
BiO x (OH) y (NO 3 ) z (2)
(0.9 ≦ x ≦ 1.1, 0.6 ≦ y ≦ 0.8, 0.2 ≦ z ≦ 0.4)
これらイオントラップ剤の含有率としては、前記電子部品用樹脂組成物の総質量中に0.1質量%以上3.0質量%以下が好ましく、さらに好ましくは0.3質量%以上1.5質量%以下である。イオントラップ剤の体積平均粒径は0.1μm以上3.0μm以下が好ましく、最大粒径は10μm以下が好ましい。なお、一般式(1)の化合物は市販品として協和化学工業株式会社製商品名DHT−4Aとして入手可能である。また、一般式(2)の化合物は市販品としてIXE500(東亞合成製商品名)として入手可能である。また必要に応じてその他の陰イオン交換体を添加することもできる。陰イオン交換体としては特に制限はなく、従来公知のものを用いることができる。たとえば、マグネシウム、アルミニウム、チタン、ジルコニウム、アンチモン等の含水酸化物などが挙げられ、これらを単独又は2種以上を組み合わせて用いることができる。 The content of these ion trapping agents is preferably 0.1% by mass or more and 3.0% by mass or less, more preferably 0.3% by mass or more and 1.5% by mass in the total mass of the resin composition for electronic parts. % Or less. The volume average particle size of the ion trapping agent is preferably 0.1 μm or more and 3.0 μm or less, and the maximum particle size is preferably 10 μm or less. In addition, the compound of General formula (1) is available as Kyowa Chemical Industry Co., Ltd. brand name DHT-4A as a commercial item. Moreover, the compound of General formula (2) is available as IXE500 (Toagosei product name) as a commercial item. Further, other anion exchangers can be added as necessary. There is no restriction | limiting in particular as an anion exchanger, A conventionally well-known thing can be used. Examples thereof include hydrated oxides such as magnesium, aluminum, titanium, zirconium, and antimony, and these can be used alone or in combination of two or more.
前記電子部品用樹脂組成物は、その他の添加剤として、染料、カーボンブラック等の着色剤、希釈剤、レベリング剤、消泡剤などを必要に応じて含有することができる。 The resin composition for electronic parts may contain a colorant such as a dye and carbon black, a diluent, a leveling agent, an antifoaming agent, and the like as other additives.
前記電子部品用樹脂組成物は、上記各種成分を均一に分散混合できるのであれば、いかなる手法を用いても調製できる。一般的な手法として、所定の配合量の成分を秤量し、らいかい機、ミキシングロール、プラネタリミキサなどを用いて混合、混練し、必要に応じて脱泡処理することによって得ることができる。 The resin composition for electronic parts can be prepared by any method as long as the above various components can be uniformly dispersed and mixed. As a general method, it can be obtained by weighing components of a predetermined blending amount, mixing and kneading using a raking machine, mixing roll, planetary mixer, etc., and defoaming treatment as necessary.
本発明の電子部品用樹脂組成物の25℃における粘度は、0.01Pa・s〜1000Pa・sであることが好ましく、0.1Pa・s〜200Pa・sであることがより好ましく、1Pa・s〜50Pa・sであることが更に好ましい。
電子部品用樹脂組成物の25℃における粘度は、E型粘度計(コーン角度3°、回転数5rpm)を用いて測定する。The resin composition for electronic parts of the present invention has a viscosity at 25 ° C. of preferably 0.01 Pa · s to 1000 Pa · s, more preferably 0.1 Pa · s to 200 Pa · s, and 1 Pa · s. More preferably, it is ˜50 Pa · s.
The viscosity at 25 ° C. of the resin composition for electronic parts is measured using an E-type viscometer (cone angle 3 °, rotation speed 5 rpm).
前記電子部品用樹脂組成物は、半導体素子と基板との間隙を封止するのに用いることができる。前記電子部品用樹脂組成物を用いて素子を封止する方法としては、例えば、ディスペンス方式、注型方式、印刷方式などが挙げられる。 The resin composition for electronic parts can be used to seal a gap between a semiconductor element and a substrate. Examples of a method for sealing an element using the resin composition for electronic parts include a dispensing method, a casting method, and a printing method.
<電子部品装置>
本発明の電子部品装置は、半導体素子と、前記半導体素子の電極が形成された面と対向する面上に回路を有する無機又は有機の基板と、前記半導体素子と前記基板との間に挟持され、前記電極と前記回路とを電気的に接続するバンプと、前記半導体素子と前記基板との間隙に充填された請求項1〜請求項8のいずれか1項に記載の電子部品用樹脂組成物の硬化物とを有する。
具体的に、前記電子部品装置は、半導体素子の電極が配置された面と、無機又は有機の基板の回路が配置された面とを対向させ、前記半導体素子の電極と前記基板の回路とをバンプを介して電気的に接続し、前記半導体素子と前記基板との間隙に前記電子部品用樹脂組成物を封止することで得ることができる。<Electronic component device>
An electronic component device of the present invention is sandwiched between a semiconductor element, an inorganic or organic substrate having a circuit on a surface opposite to a surface on which the electrode of the semiconductor element is formed, and the semiconductor element and the substrate. The resin composition for an electronic component according to any one of claims 1 to 8, which is filled in a gap between the bump that electrically connects the electrode and the circuit, and the gap between the semiconductor element and the substrate. And a cured product.
Specifically, in the electronic component device, the surface on which the electrode of the semiconductor element is disposed and the surface on which the circuit of the inorganic or organic substrate is disposed are opposed to each other, and the electrode of the semiconductor element and the circuit of the substrate are disposed. It can be obtained by electrically connecting via bumps and sealing the resin composition for electronic components in the gap between the semiconductor element and the substrate.
以下、本発明を実施例により具体的に説明するが、本発明はこれらの実施例に限定されるものではない。 EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.
電子部品用樹脂組成物の調製に際し、以下に示す材料を用意した。また以下に示すようにして、特定硬化促進化合物である硬化促進剤1〜13を調製した。
(エポキシ樹脂)
・エポキシ1:ビスフェノールFをエポキシ化して得られるエポキシ当量160の液状エポキシ樹脂(三菱化学株式会社製、商品名jER806)
・エポキシ2:アミノフェノールをエポキシ化して得られるエポキシ当量95の3官能液状エポキシ樹脂(三菱化学株式会社製、商品名jER630)In preparing the resin composition for electronic parts, the following materials were prepared. Moreover, the hardening accelerators 1-13 which are specific hardening acceleration | stimulation compounds were prepared as shown below.
(Epoxy resin)
Epoxy 1: Liquid epoxy resin having an epoxy equivalent of 160 obtained by epoxidizing bisphenol F (trade name jER806, manufactured by Mitsubishi Chemical Corporation)
Epoxy 2: Trifunctional liquid epoxy resin with an epoxy equivalent of 95 obtained by epoxidizing aminophenol (Mitsubishi Chemical Corporation, trade name jER630)
(硬化剤)
・芳香族アミン1:活性水素当量45のジエチルトルエンジアミン(液状の芳香族アミン化合物;三菱化学株式会社製、商品名jERキュアW)
・芳香族アミン2:活性水素当量63のジエチルジアミノジフェニルメタン(液状の芳香族アミン化合物;日本化薬株式会社製、商品名カヤハードA−A)
・脂肪族アミン:活性水素当量160のジェファーアミンT−403(液状の脂肪族アミン;三井化学ファイン株式会社製)
・酸無水物:酸無水物当量168の液状酸無水物(日立化成工業株式会社製、商品名HN5500)
・フェノール樹脂:水酸基当量141のアリル化フェノールノボラック樹脂(液状のフェノール樹脂;明和化成株式会社製、商品名MEH−8000H)(Curing agent)
Aromatic amine 1: Diethyltoluenediamine having an active hydrogen equivalent of 45 (liquid aromatic amine compound; manufactured by Mitsubishi Chemical Corporation, trade name jER Cure W)
Aromatic amine 2: diethyldiaminodiphenylmethane having an active hydrogen equivalent of 63 (liquid aromatic amine compound; manufactured by Nippon Kayaku Co., Ltd., trade name Kayahard AA)
Aliphatic amine: Jefferamine T-403 having an active hydrogen equivalent of 160 (liquid aliphatic amine; manufactured by Mitsui Chemicals Fine Co., Ltd.)
Acid anhydride: acid anhydride equivalent 168 liquid acid anhydride (manufactured by Hitachi Chemical Co., Ltd., trade name HN5500)
Phenol resin: Allylated phenol novolak resin having a hydroxyl group equivalent of 141 (liquid phenol resin; product name MEH-8000H, manufactured by Meiwa Kasei Co., Ltd.)
(その他の硬化促進剤)
・硬化促進剤14:2−フェニル−4−メチル−ヒドロキシイミダゾール
・硬化促進剤15:カテコール(CAT)
・硬化促進剤16:2,2'-ビフェノール(OBP)
(無機充填剤)
・シリカ:体積平均粒径1μmの球状溶融シリカ
(添加剤)
・シリコーンゴム粒子:ジメチル型固形シリコーンゴム粒子の表面がエポキシ基で修飾された体積平均粒径2μmの球状のシリコーンゴム粒子、
・シランカップリング剤:γ−グリシドキシプロピルトリメトキシシラン
・着色剤:カーボンブラック(三菱化学株式会社製、商品名MA−100)
・イオントラップ剤:ビスマス系イオントラップ剤(東亞合成株式会社製、商品名IXE−500)(Other curing accelerators)
Curing accelerator 14: 2-phenyl-4-methyl-hydroxyimidazole Curing accelerator 15: Catechol (CAT)
Curing accelerator 16: 2,2′-biphenol (OBP)
(Inorganic filler)
Silica: spherical fused silica (additive) with a volume average particle diameter of 1 μm
Silicone rubber particles: Spherical silicone rubber particles having a volume average particle diameter of 2 μm in which the surface of dimethyl type solid silicone rubber particles is modified with an epoxy group,
Silane coupling agent: γ-glycidoxypropyltrimethoxysilane Colorant: Carbon black (trade name MA-100, manufactured by Mitsubishi Chemical Corporation)
-Ion trap agent: Bismuth ion trap agent (manufactured by Toagosei Co., Ltd., trade name IXE-500)
以下で合成した硬化促進剤の重量平均分子量(Mw)は以下に示すとおりである。ここで、重量平均分子量(Mw)は、溶媒としてテトラヒドロフランを用いてGPC法によって求めたものであり、GPC法の詳細は次のとおりである。
装置名(ポンプ):日立製作所製 L−6200
カラム: TSKgelG2000HXL+TSKgelG5000HXL
検出器:RI 日立製作所製 L−3300(示差屈折計検出器)
カラム温度:30℃
溶離液:テトラヒドロフラン
流速:1ml/分
標準物質:ポリスチレンThe weight average molecular weight (Mw) of the curing accelerator synthesized below is as shown below. Here, the weight average molecular weight (Mw) is determined by GPC method using tetrahydrofuran as a solvent, and details of GPC method are as follows.
Device name (pump): Hitachi L-6200
Column: TSKgelG2000H XL + TSKgelG5000H XL
Detector: RI Hitachi L-3300 (differential refractometer detector)
Column temperature: 30 ° C
Eluent: Tetrahydrofuran Flow rate: 1 ml / min Standard substance: Polystyrene
(硬化促進剤1の調製)
フラスコに12.9gのカテコールと25.0gの1,4−ブタンジオールジビニルエーテルを仕込み(カテコールと1,4−ブタンジオールジビニルエーテルのモル比は1:1.5)、100℃で2時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤1を得た。硬化促進剤1の重量平均分子量はポリスチレン換算で526であった。(Preparation of curing accelerator 1)
A flask is charged with 12.9 g of catechol and 25.0 g of 1,4-butanediol divinyl ether (molar ratio of catechol to 1,4-butanediol divinyl ether is 1: 1.5) and reacted at 100 ° C. for 2 hours. By doing so, a curing accelerator 1 having a structural site represented by the general formula (I) was obtained. The weight average molecular weight of the curing accelerator 1 was 526 in terms of polystyrene.
(硬化促進剤2の調製)
フラスコに12.9gのレゾルシノールと25.0gの1,4−ブタンジオールジビニルエーテルを仕込み(レゾルシノールと1,4−ブタンジオールジビニルエーテルのモル比は1:1.5)、100℃で2時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤2を得た。硬化促進剤2の重量平均分子量はポリスチレン換算で2399であった。(Preparation of curing accelerator 2)
A flask is charged with 12.9 g of resorcinol and 25.0 g of 1,4-butanediol divinyl ether (molar ratio of resorcinol to 1,4-butanediol divinyl ether is 1: 1.5) and reacted at 100 ° C. for 2 hours. As a result, a curing accelerator 2 having a structural portion represented by the general formula (I) was obtained. The weight average molecular weight of the curing accelerator 2 was 2399 in terms of polystyrene.
(硬化促進剤3の調製)
フラスコに21.8gの2,2’-ビフェノールと25.0gの1,4−ブタンジオールジビニルエーテルを仕込み(2,2’-ビフェノールと1,4−ブタンジオールジビニルエーテルのモル比は1:1.5)、100℃で2時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤3を得た。硬化促進剤3の重量平均分子量はポリスチレン換算で816であった。(Preparation of curing accelerator 3)
The flask was charged with 21.8 g of 2,2′-biphenol and 25.0 g of 1,4-butanediol divinyl ether (the molar ratio of 2,2′-biphenol to 1,4-butanediol divinyl ether was 1: 1). .5), by causing a reaction at 100 ° C. for 2 hours, a curing accelerator 3 having a structural portion represented by the general formula (I) was obtained. The weight average molecular weight of the curing accelerator 3 was 816 in terms of polystyrene.
(硬化促進剤4の調製)
フラスコに19.7gのピロガロールと50.0gの1,4−ブタンジオールジビニルエーテルを仕込み(ピロガロールと1,4−ブタンジオールジビニルエーテルのモル比は1:2.25)、120℃で8時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤4を得た。硬化促進剤4の重量平均分子量はポリスチレン換算で1685であった。(Preparation of curing accelerator 4)
A flask was charged with 19.7 g of pyrogallol and 50.0 g of 1,4-butanediol divinyl ether (molar ratio of pyrogallol to 1,4-butanediol divinyl ether was 1: 2.25) and reacted at 120 ° C. for 8 hours. As a result, a curing accelerator 4 having a structural portion represented by the general formula (I) was obtained. The weight average molecular weight of the curing accelerator 4 was 1685 in terms of polystyrene.
(硬化促進剤5の調製)
フラスコに13.3gのレゾルシノールと25.0gのn−プロピルビニルエーテルを仕込み(レゾルシノールとn−プロピルビニルエーテルのモル比は1:2.4)、30分かけて常温から70℃まで上昇させた後、70℃で10時間反応させた。その後、ロータリーエバポレーターを用い、混合液から未反応のn−プロピルビニルエーテルを留去し、その後、真空ポンプにより真空乾燥することにより、一般式(I)で表される構造部位を有する硬化促進剤5を得た。硬化促進剤5の重量平均分子量はポリスチレン換算で448であった。(Preparation of curing accelerator 5)
The flask was charged with 13.3 g of resorcinol and 25.0 g of n-propyl vinyl ether (molar ratio of resorcinol to n-propyl vinyl ether was 1: 2.4) and raised from room temperature to 70 ° C. over 30 minutes. The reaction was carried out at 70 ° C. for 10 hours. Thereafter, using a rotary evaporator, unreacted n-propyl vinyl ether is distilled off from the mixed solution, and then vacuum-dried by a vacuum pump, whereby the curing accelerator 5 having a structural portion represented by the general formula (I) is obtained. Got. The weight average molecular weight of the curing accelerator 5 was 448 in terms of polystyrene.
(硬化促進剤6の調製)
フラスコに31.0gのカテコールと30.0gの1,4−ブタンジオールジビニルエーテルを仕込み(カテコールと1,4−ブタンジオールジビニルエーテルのモル比は1:0.75)、110℃で2時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤6を得た。硬化促進剤6の重量平均分子量はポリスチレン換算で1445であった。(Preparation of curing accelerator 6)
A flask was charged with 31.0 g of catechol and 30.0 g of 1,4-butanediol divinyl ether (molar ratio of catechol to 1,4-butanediol divinyl ether was 1: 0.75) and reacted at 110 ° C. for 2 hours. By doing so, a curing accelerator 6 having a structural portion represented by the general formula (I) was obtained. The weight average molecular weight of the curing accelerator 6 was 1445 in terms of polystyrene.
(硬化促進剤7の調製)
フラスコに38.7gのカテコールと50.0gの1,4−ブタンジオールジビニルエーテルを仕込み(カテコールと1,4−ブタンジオールジビニルエーテルのモル比は1:1)、100℃で2時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤7を得た。硬化促進剤7の重量平均分子量はポリスチレン換算で934であった。(Preparation of curing accelerator 7)
A flask is charged with 38.7 g of catechol and 50.0 g of 1,4-butanediol divinyl ether (molar ratio of catechol to 1,4-butanediol divinyl ether is 1: 1) and allowed to react at 100 ° C. for 2 hours. Thereby, the hardening accelerator 7 which has a structure site | part represented by general formula (I) was obtained. The weight average molecular weight of the curing accelerator 7 was 934 in terms of polystyrene.
(硬化促進剤8の調製)
フラスコに24.5gの4−tert−ブチルカテコールと21.0gの1,4−ブタンジオールジビニルエーテルを仕込み(4−tert−ブチルカテコールと1,4−ブタンジオールジビニルエーテルのモル比は1:1)、120℃で3時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤8を得た。硬化促進剤8の重量平均分子量はポリスチレン換算で1016であった。(Preparation of curing accelerator 8)
The flask was charged with 24.5 g of 4-tert-butylcatechol and 21.0 g of 1,4-butanediol divinyl ether (the molar ratio of 4-tert-butylcatechol and 1,4-butanediol divinyl ether was 1: 1). ) And 3 hours of reaction at 120 ° C. to obtain a curing accelerator 8 having a structural portion represented by the general formula (I). The weight average molecular weight of the curing accelerator 8 was 1016 in terms of polystyrene.
(硬化促進剤9の調製)
フラスコに21.8gの3−メチルカテコールと25.0gの1,4−ブタンジオールジビニルエーテルを仕込み(3−メチルカテコールと1,4−ブタンジオールジビニルエーテルのモル比は1:1)、120℃で2時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤9を得た。硬化促進剤9の重量平均分子量はポリスチレン換算で1132であった。(Preparation of curing accelerator 9)
A flask was charged with 21.8 g of 3-methylcatechol and 25.0 g of 1,4-butanediol divinyl ether (molar ratio of 3-methylcatechol to 1,4-butanediol divinyl ether was 1: 1), 120 ° C. Was allowed to react for 2 hours to obtain a curing accelerator 9 having a structural moiety represented by the general formula (I). The weight average molecular weight of the curing accelerator 9 was 1132 in terms of polystyrene.
(硬化促進剤10の調製)
フラスコに24.6gの3−メトキシカテコールと25.0gの1,4−ブタンジオールジビニルエーテルを仕込み(3−メトキシカテコールと1,4−ブタンジオールジビニルエーテルのモル比は1:1)、120℃で24時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤10を得た。硬化促進剤10の重量平均分子量はポリスチレン換算で1203であった。(Preparation of curing accelerator 10)
A flask is charged with 24.6 g of 3-methoxycatechol and 25.0 g of 1,4-butanediol divinyl ether (molar ratio of 3-methoxycatechol to 1,4-butanediol divinyl ether is 1: 1), 120 ° C. Was allowed to react for 24 hours to obtain a curing accelerator 10 having a structural moiety represented by the general formula (I). The weight average molecular weight of the curing accelerator 10 was 1203 in terms of polystyrene.
(硬化促進剤11の調製)
フラスコに20.8gの3,5−ジ−tert−ブチルカテコールと20.0gの1,4−ブタンジオールジビニルエーテルを仕込み(3,5−ジ−tert−ブチルカテコールと1,4−ブタンジオールジビニルエーテルのモル比は1:1.5)、120℃で2時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤11を得た。硬化促進剤11の重量平均分子量はポリスチレン換算で489であった。(Preparation of curing accelerator 11)
A flask was charged with 20.8 g of 3,5-di-tert-butylcatechol and 20.0 g of 1,4-butanediol divinyl ether (3,5-di-tert-butylcatechol and 1,4-butanediol divinyl ether). The molar ratio of vinyl ether was 1: 1.5), and the reaction was carried out at 120 ° C. for 2 hours to obtain a curing accelerator 11 having a structural site represented by the general formula (I). The weight average molecular weight of the curing accelerator 11 was 489 in terms of polystyrene.
(硬化促進剤12の調製)
フラスコに22.5gの2,3−ジヒドロキシナフタレンと30.0gの1,4−ブタンジオールジビニルエーテルを仕込み(2,3−ジヒドロキシナフタレンと1,4−ブタンジオールジビニルエーテルのモル比は1:1.5)、90℃で2時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤12を得た。硬化促進剤12の重量平均分子量はポリスチレン換算で963であった。(Preparation of curing accelerator 12)
The flask was charged with 22.5 g of 2,3-dihydroxynaphthalene and 30.0 g of 1,4-butanediol divinyl ether (the molar ratio of 2,3-dihydroxynaphthalene to 1,4-butanediol divinyl ether was 1: 1. .5), by causing a reaction at 90 ° C. for 2 hours, a curing accelerator 12 having a structural portion represented by the general formula (I) was obtained. The weight average molecular weight of the curing accelerator 12 was 963 in terms of polystyrene.
(硬化促進剤13の調製)
フラスコに9.6gのカテコールと30.0gのグリシジルビニルエーテルを仕込み(カテコールとグリシジルビニルエーテルのモル比は1:2)、120℃で12時間反応させることにより、一般式(I)で表される構造部位を有する硬化促進剤13を得た。硬化促進剤13の重量平均分子量はポリスチレン換算で202であった。(Preparation of curing accelerator 13)
A structure represented by the general formula (I) is prepared by charging 9.6 g of catechol and 30.0 g of glycidyl vinyl ether into a flask (molar ratio of catechol to glycidyl vinyl ether is 1: 2) and reacting at 120 ° C. for 12 hours. The hardening accelerator 13 which has a site | part was obtained. The weight average molecular weight of the curing accelerator 13 was 202 in terms of polystyrene.
<実施例1〜25、比較例1〜9>
下記表1〜表3に示す組成となるように各成分を配合し、三本ロール及び真空擂潰機にて混練分散した後、実施例1〜25及び比較例1〜9の電子部品用樹脂組成物を作製した。なお、表中の配合単位は特に記載のない限り質量部である。また「−」は未配号であることを示す。<Examples 1 to 25 and Comparative Examples 1 to 9>
After mixing each component so that it may become a composition shown in the following Table 1-Table 3, it knead | mixes and disperses with a three roll and a vacuum crusher, Resin for electronic components of Examples 1-25 and Comparative Examples 1-9 A composition was prepared. The blending units in the table are parts by weight unless otherwise specified. "-" Indicates unsigned.
得られた電子部品用樹脂組成物の評価結果について表4〜表6に示す。特性試験の試験方法を以下に説明する。なお、使用した電子部品用樹脂組成物の諸特性及び含浸時間、ボイドの観察、各種信頼性の評価は以下の方法及び条件で行った。 It shows in Table 4-Table 6 about the evaluation result of the obtained resin composition for electronic components. The test method of the characteristic test will be described below. The characteristics and impregnation time, void observation, and various reliability evaluations of the used resin composition for electronic parts were performed by the following methods and conditions.
信頼性の評価に使用した樹脂封止前の半導体装置の諸元は、チップサイズ20×20×0.55tmm(回路:アルミのデイジーチェーン接続、パッシベーション:ポリイミド膜HD4000、日立化成デュポンマイクロシステムズ製、商品名)、バンプ:はんだボール(Sn−Ag−Cu、直径80μm、7,744pin、)、バンプピッチ:190μm、基板:FR−5(ソルダーレジストSR7200、日立化成工業製、商品名、60×60×0.8tmm)、チップ/基板間のギャップ:50μmである。 The specifications of the semiconductor device before resin sealing used for the evaluation of reliability are as follows: chip size 20 × 20 × 0.55 tmm (circuit: daisy chain connection of aluminum, passivation: polyimide film HD4000, manufactured by Hitachi Chemical DuPont Microsystems, (Trade name), bump: solder ball (Sn-Ag-Cu, diameter 80 μm, 7,744 pin), bump pitch: 190 μm, substrate: FR-5 (solder resist SR7200, manufactured by Hitachi Chemical Co., Ltd., trade name, 60 × 60) × 0.8 tmm), chip / substrate gap: 50 μm.
半導体装置は、電子部品用樹脂組成物をディスペンス方式でアンダーフィルし、130℃または165℃の硬化温度で、2時間硬化することで作製した。また、各種試験片の硬化条件も同様な条件で行った。 The semiconductor device was produced by underfilling a resin composition for electronic components by a dispense method and curing at a curing temperature of 130 ° C. or 165 ° C. for 2 hours. The curing conditions for various test pieces were also the same.
(1)粘度(初期粘度)
電子部品用樹脂組成物を調製してから2時間以内に、25℃における粘度(Pa・s)を、(株)トキメック社(現在の東京計器(株)社)製E型粘度計EHD型(コーン角度3°、コーン直径30mm、回転数5rpm)を用いて、サンプル容量:0.7mlにて測定した。尚、測定開始から1分経過後の値を測定値とした。(1) Viscosity (initial viscosity)
Within 2 hours after preparing the resin composition for electronic parts, the viscosity (Pa · s) at 25 ° C. is measured by the E type viscometer EHD type manufactured by Tokimec Co., Ltd. (currently Tokyo Keiki Co., Ltd.) Measurement was performed at a sample volume of 0.7 ml using a cone angle of 3 °, a cone diameter of 30 mm, and a rotation speed of 5 rpm. The value after 1 minute from the start of measurement was taken as the measured value.
(2)ポットライフ
上記で得られた電子部品用樹脂組成物を25℃で24時間放置後、25℃における粘度を、E型粘度計(コーン角度3°、回転数5rpm)を用いて測定した(放置後粘度)。ポットライフ(%)は、((放置後粘度)−(初期粘度))/(初期粘度)×100で算出した。
尚、24時間放置後にゲル化していた場合は、測定不可とした。(2) Pot life After leaving the resin composition for electronic parts obtained above at 25 ° C. for 24 hours, the viscosity at 25 ° C. was measured using an E-type viscometer (cone angle 3 °, rotation speed 5 rpm). (Viscosity after standing). The pot life (%) was calculated by ((viscosity after standing) − (initial viscosity)) / (initial viscosity) × 100.
In addition, when it was gelled after being left for 24 hours, measurement was impossible.
(3)ゲルタイム
ゲル化試験機を用いて以下のようにしてゲルタイムを評価した。上記で得られた電子部品用樹脂組成物を165℃または130℃の熱板上に適量(約3ml)滴下した後、目視で観察し、流動性を失ってゲル状態になるまでの時間をゲルタイム(sec.)として測定した。(3) Gel time Gel time was evaluated as follows using a gelation tester. After a suitable amount (about 3 ml) of the resin composition for electronic parts obtained above was dropped on a hot plate at 165 ° C. or 130 ° C., it was observed visually, and the time until it lost fluidity and became a gel state was gel time. (Sec.).
(4)ガラス転移温度(Tg)
上記で得られた電子部品用樹脂組成物を所定条件で硬化して得た試験片(3mm×3mm×20mm)を熱機械分析装置TMAQ400(ティー・エイ・インスツルメント製)を用い、荷重15g、測定温度0℃〜200℃、昇温速度10℃/分の条件で、ガラス転移温度(Tg)を測定した。(4) Glass transition temperature (Tg)
A test piece (3 mm × 3 mm × 20 mm) obtained by curing the resin composition for electronic parts obtained above under a predetermined condition is used with a thermomechanical analyzer TMAQ400 (manufactured by TA Instruments), and a load of 15 g. The glass transition temperature (Tg) was measured under the conditions of a measurement temperature of 0 ° C. to 200 ° C. and a heating rate of 10 ° C./min.
(5)接着力
上記で得られた電子部品用樹脂組成物のポリイミド樹脂(PI)及び窒化ケイ素に対する接着力を以下のようにして評価した。
・SiN接着力
P−SiN付きウェハー(窒化ケイ素膜付きのp型シリコンウェハー、住友商事九州株式会社製)の表面に、電子部品用樹脂組成物を用いて成形された直径3mm高さ3mmの硬化物が形成された試験片を作製し、ボンドテスターDS100型(DAGE製)を用いて、ヘッドスピード50μm/sec、25℃の条件でせん断応力をかけ、硬化物がP−SiN付ウェハーから剥離する強度を測定した。この測定は、試験片成形直後、及び130℃、85%RHのHAST(Highly Accelerated Temperature and Humidity Stress Test)条件下で200h処理後の両方で行った。
・PI接着力
感光性ポリイミドHD4100(日立化成デュポンマイクロシステムズ製、商品名)の表面に、電子部品用樹脂組成物を用いて成形された直径3mm高さ3mmの硬化物が形成された試験片を作製し、ボンドテスターDS100型(DAGE製)を用いて、ヘッドスピード50μm/sec、25℃の条件においてせん断応力をかけ、硬化物が感光性ポリイミドから剥離する強度を測定した。この測定は、試験片成形直後、及び130℃、85%RHのHAST条件下で200h処理後の両方で行った。(5) Adhesive strength The adhesive strength of the resin composition for electronic parts obtained above to the polyimide resin (PI) and silicon nitride was evaluated as follows.
-SiN adhesive strength 3mm in diameter and 3mm in height formed on the surface of a wafer with P-SiN (p-type silicon wafer with silicon nitride film, manufactured by Sumitomo Corporation Kyushu Co., Ltd.) using a resin composition for electronic components A test piece on which an object was formed was prepared, and a bond tester DS100 type (manufactured by DAGE) was used to apply a shear stress under the conditions of a head speed of 50 μm / sec and 25 ° C., and the cured product was peeled from the wafer with P-SiN. The strength was measured. This measurement was performed both immediately after molding of the test piece and after treatment for 200 h under the condition of 130 ° C. and 85% RH HAST (Highly Accelerated Temperature and Humidity Stress Test).
-PI adhesive force A test piece in which a cured product having a diameter of 3 mm and a height of 3 mm formed using a resin composition for electronic parts was formed on the surface of photosensitive polyimide HD4100 (product name, manufactured by Hitachi Chemical DuPont Microsystems). A bond tester DS100 type (manufactured by DAGE) was used to apply shear stress under the conditions of a head speed of 50 μm / sec and 25 ° C., and the strength at which the cured product peeled from the photosensitive polyimide was measured. This measurement was performed both immediately after the test piece molding and after 200 h treatment under HAST conditions of 130 ° C. and 85% RH.
(6)含浸時間
樹脂封止前の半導体装置を110℃に加熱したホットプレート上に置き、デイスペンサーを用いて電子部品用樹脂組成物の所定量(約1ml)をチップの側面(1辺)に滴下し、樹脂組成物が対向する側面に浸透するまでの時間(sec.)を測定した。(6) Impregnation time The semiconductor device before resin sealing is placed on a hot plate heated to 110 ° C., and a predetermined amount (about 1 ml) of the resin composition for electronic components is applied to the side surface (one side) of the chip using a dispenser. The time (sec.) Until the resin composition penetrated into the opposite side surfaces was measured.
(7)ボイド観察
電子部品用樹脂組成物をアンダーフィル及び硬化して作製した半導体装置の内部を超音波探傷装置AT−5500(日立建機製)で観察し、ボイドの有無を調べた。(7) Void Observation The inside of the semiconductor device produced by underfilling and curing the resin composition for electronic components was observed with an ultrasonic flaw detector AT-5500 (manufactured by Hitachi Construction Machinery), and the presence or absence of voids was examined.
(8)チップ反り
電子部品用樹脂組成物をアンダーフィル及び硬化して作製した半導体装置のチップ対角線上の反り量(μm)を、室温にて表面粗さ測定器サーフコーダSE−2300(小坂研究所製)を用いて測定した。(8) Chip warpage The amount of warpage (μm) on the chip diagonal line of a semiconductor device produced by underfilling and curing a resin composition for electronic components was measured at room temperature using a surface roughness measuring device Surfcoder SE-2300 (Kosaka Research). ).
(9)耐温度サイクル性
電子部品用樹脂組成物をアンダーフィル及び硬化して作製した半導体装置を−55℃〜125℃、各30分のヒートサイクルで2000サイクル処理した。1000サイクルごとに導通試験を行いアルミ配線及びパッドの断線不良を調べ、不良パッケージ数/評価パッケージ数で評価した。(9) Temperature cycle resistance The semiconductor device produced by underfilling and curing the resin composition for electronic parts was subjected to 2000 cycles at −55 ° C. to 125 ° C. for 30 minutes in each heat cycle. Conductivity test was conducted every 1000 cycles to check for disconnection defects of aluminum wiring and pads, and evaluated by the number of defective packages / number of evaluation packages.
(10)耐湿信頼性
電子部品用樹脂組成物をアンダーフィル及び硬化して作製した半導体装置を130℃、85%RHのHAST条件下で200h処理後、アルミ配線及びパッドの断線有無を導通試験より確認し、不良パッケージ数/評価パッケージ数で評価した。(10) Moisture resistance reliability After a semiconductor device manufactured by underfilling and curing a resin composition for electronic components under a HAST condition of 130 ° C. and 85% RH for 200 hours, the presence or absence of disconnection of aluminum wiring and pads is determined from a continuity test. The number of defective packages / the number of evaluation packages was evaluated.
本発明における(C)成分である硬化促進剤を含まない比較例1〜3では、ゲルタイムが長く、またボイドが発生した。更に、130℃硬化において、硬化物の接着力が低いために、耐温度サイクル性及び耐湿信頼性に劣り、特に耐温度サイクル性が著しく劣っていた。
さらに(B)成分が脂肪族アミンである比較例4では、硬化促進剤を含有しない場合でもポットライフに劣り、また、半導体装置を作製する際には充填ができず、評価することができない評価項目があった。
また、(B)成分が酸無水物である比較例8及びフェノール樹脂である比較例9は硬化しなかった。
また、(C)成分が硬化促進剤6である比較例5では、ゲルタイムが短くなるものの、硬化物のTg及びHAST処理後の接着力が低下し、耐湿性が著しく低下した。また、半導体装置を作製する際には充填ができず、評価することができない評価項目があった。
また、(C)成分が硬化促進剤7及び8である比較例6及び7では、ゲルタイムが短くなるものの、ポットライフが悪化した。
これに対して、実施例1〜実施例25は、比較例1〜比較例3と比較してゲルタイムが短縮し、ボイドが発生せず、硬化物の接着力も向上し、耐温度サイクル性や耐湿性が向上した。特に、130℃硬化での接着力が向上し、耐温度サイクル性や耐湿性が向上しており、硬化温度を低く設定することでとチップ反り量が小さくすることも可能となった。また、比較例5と比較すると、HAST処理後の接着力が向上し、耐湿性に優れた半導体装置が得られた。また比較例6、7と比較すると、ポットライフが向上した。さらに比較例1〜9と比較して、成形性、及び信頼性のバランスに優れる半導体装置が得られた。In Comparative Examples 1 to 3 not containing the curing accelerator (C) component in the present invention, the gel time was long and voids were generated. Furthermore, in 130 degreeC hardening, since the adhesive force of hardened | cured material is low, it was inferior to temperature cycling resistance and moisture-proof reliability, and especially temperature cycling resistance was remarkably inferior.
Further, in Comparative Example 4 in which the component (B) is an aliphatic amine, the pot life is inferior even when the curing accelerator is not contained, and the evaluation cannot be performed because the semiconductor device cannot be filled and cannot be evaluated. There was an item.
Moreover, the comparative example 8 whose (B) component is an acid anhydride, and the comparative example 9 which is a phenol resin did not harden | cure.
Moreover, in Comparative Example 5 in which the component (C) is the curing accelerator 6, although the gel time was shortened, the adhesive strength after the Tg and HAST treatment of the cured product was reduced, and the moisture resistance was remarkably reduced. In addition, there are evaluation items that cannot be filled and evaluated when a semiconductor device is manufactured.
Moreover, in Comparative Examples 6 and 7 in which the component (C) is the curing accelerators 7 and 8, although the gel time was shortened, the pot life was deteriorated.
On the other hand, in Examples 1 to 25, the gel time is shortened compared to Comparative Examples 1 to 3, no voids are generated, the adhesive strength of the cured product is improved, and temperature cycle resistance and moisture resistance are improved. Improved. In particular, the adhesive strength at 130 ° C. curing has been improved, and the temperature cycle resistance and moisture resistance have been improved, and it has become possible to reduce the chip warpage by setting the curing temperature low. Further, when compared with Comparative Example 5, the adhesive strength after HAST treatment was improved, and a semiconductor device excellent in moisture resistance was obtained. Moreover, when compared with Comparative Examples 6 and 7, the pot life was improved. Furthermore, compared with Comparative Examples 1-9, the semiconductor device which was excellent in the balance of a moldability and reliability was obtained.
日本国特許出願2011−102355号の開示はその全体が参照により本明細書に取り込まれる。
本明細書に記載された全ての文献、特許出願、及び技術規格は、個々の文献、特許出願、及び技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書に参照により取り込まれる。The entire disclosure of Japanese Patent Application No. 2011-102355 is incorporated herein by reference.
All documents, patent applications, and technical standards mentioned in this specification are to the same extent as if each individual document, patent application, and technical standard were specifically and individually stated to be incorporated by reference, Incorporated herein by reference.
Claims (9)
(式中、L1は、炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基、又は炭素数1〜18の2価の炭化水素基を示す。
R1〜R3はそれぞれ独立に、炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる少なくとも1種の原子から構成される炭素数1〜18の1価の基、炭素数1〜18の1価の炭化水素基、又は水素原子を示す。
R4〜R7はそれぞれ独立に、炭素原子、水素原子、酸素原子及び硫黄原子からなる群より選ばれる少なくとも1種の原子から構成される炭素数1〜18の1価の基、炭素数1〜18の1価の炭化水素基、水酸基、又は水素原子を示す。またR4〜R7から選ばれる隣接する2つの基は互いに結合して環を形成してもよい。)Resin for electronic parts containing an epoxy resin, an aromatic amine compound, and a curing accelerator containing at least one compound selected from the group of compounds having a structural moiety represented by the following general formula (I) Composition.
(Wherein, L 1 represents a carbon atom, a divalent group having 1 to 18 carbon atoms comprised of hydrogen atoms and oxygen atoms, or a divalent hydrocarbon group having 1 to 18 carbon atoms.
R 1 to R 3 are each independently a monovalent group having 1 to 18 carbon atoms composed of at least one atom selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom and a sulfur atom; -18 monovalent hydrocarbon groups or hydrogen atoms.
R 4 to R 7 are each independently a monovalent group having 1 to 18 carbon atoms composed of at least one atom selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom and a sulfur atom; -18 monovalent hydrocarbon groups, hydroxyl groups, or hydrogen atoms. Two adjacent groups selected from R 4 to R 7 may be bonded to each other to form a ring. )
(式中、L21は、炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基、又は炭素数1〜18の2価の炭化水素基を示す。
R21〜R26はそれぞれ独立に、水素原子又は炭素数1〜18の1価の炭化水素基を示す。
Arは、炭素数6〜18のm価の芳香族炭化水素基、又は少なくとも2つの炭素数6〜18の芳香族炭化水素基が単結合若しくは炭素数1〜12の直鎖状又は分岐鎖状のアルキレン基、カルボニル基及び酸素原子からなる群より選ばれる少なくとも1種からなる連結基で連結されて全体としてm価となる基を示す。
mは2〜8の整数を示し、nは0〜20の整数を示す。)The resin composition for electronic components according to claim 1, wherein the curing accelerator includes a compound represented by any one of the following general formulas (IIa), (IIb), and (IIc).
(Wherein, L 21 represents a carbon atom, a divalent group having 1 to 18 carbon atoms comprised of hydrogen atoms and oxygen atoms, or a divalent hydrocarbon group having 1 to 18 carbon atoms.
R 21 to R 26 each independently represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 18 carbon atoms.
Ar is an m-valent aromatic hydrocarbon group having 6 to 18 carbon atoms, or at least two aromatic hydrocarbon groups having 6 to 18 carbon atoms are a single bond or a linear or branched chain having 1 to 12 carbon atoms. A group that is connected to at least one linking group selected from the group consisting of an alkylene group, a carbonyl group, and an oxygen atom to be m-valent as a whole.
m represents an integer of 2 to 8, and n represents an integer of 0 to 20. )
(式中、L21は、炭素原子、水素原子及び酸素原子から構成される炭素数1〜18の2価の基、又は炭素数1〜18の2価の炭化水素基を示す。
R21〜R23はそれぞれ独立に、水素原子又は炭素数1〜18の1価の炭化水素基を示す。
R27は、水素原子又は下記一般式(IIIa)若しくは一般式(IIIb)で表される基を示す。
Arは、炭素数6〜18のm価の芳香族炭化水素基、又は2以上の炭素数6〜18の芳香族炭化水素基が単結合若しくは炭素数1〜12のアルキレン基、カルボニル基及び酸素原子からなる群より選ばれる少なくとも1種からなる連結基で連結されて全体としてm価となる基を示す。
mは1〜8の整数を示し、pは1〜8の整数を示し、m≧pである。)The resin composition for electronic components according to claim 1, wherein the curing accelerator includes a compound represented by the following general formula (III).
(Wherein, L 21 represents a carbon atom, a divalent group having 1 to 18 carbon atoms comprised of hydrogen atoms and oxygen atoms, or a divalent hydrocarbon group having 1 to 18 carbon atoms.
R 21 to R 23 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 18 carbon atoms.
R 27 represents a hydrogen atom or a group represented by the following general formula (IIIa) or general formula (IIIb).
Ar represents an m-valent aromatic hydrocarbon group having 6 to 18 carbon atoms, or an aromatic hydrocarbon group having 2 or more carbon atoms having a single bond or an alkylene group having 1 to 12 carbon atoms, a carbonyl group, and oxygen. A group which is linked by at least one linking group selected from the group consisting of atoms and becomes m-valent as a whole is shown.
m represents an integer of 1 to 8, p represents an integer of 1 to 8, and m ≧ p. )
前記半導体素子の電極が形成された面と対向する面上に回路を有する無機又は有機の基板と、
前記半導体素子と前記基板との間に挟持され、前記電極と前記回路とを電気的に接続するバンプと、
前記半導体素子と前記基板との間隙に充填された請求項1〜請求項8のいずれか1項に記載の電子部品用樹脂組成物の硬化物と、
を有する電子部品装置。A semiconductor element;
An inorganic or organic substrate having a circuit on a surface facing the surface on which the electrodes of the semiconductor element are formed;
A bump sandwiched between the semiconductor element and the substrate and electrically connecting the electrode and the circuit;
The cured product of the resin composition for electronic components according to any one of claims 1 to 8, which is filled in a gap between the semiconductor element and the substrate.
An electronic component device.
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JP5747639B2 (en) * | 2011-04-28 | 2015-07-15 | 日立化成株式会社 | Liquid resin composition for electronic components and electronic component device |
JP6521787B2 (en) * | 2015-08-05 | 2019-05-29 | キヤノン株式会社 | Liquid discharge head and method of manufacturing the same |
JP7279333B2 (en) * | 2018-10-17 | 2023-05-23 | 株式会社レゾナック | Additive for curable resin composition, curable resin composition and electronic component device |
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JP2001270976A (en) * | 1999-04-13 | 2001-10-02 | Hitachi Chem Co Ltd | Epoxy resin composition for sealing and electronic device |
JP2003292580A (en) * | 2002-03-29 | 2003-10-15 | Nof Corp | Epoxy resin composition for sealing semiconductor |
JP2005255935A (en) * | 2004-03-15 | 2005-09-22 | Dainippon Ink & Chem Inc | Epoxy resin composition and its cured product |
JP2006077167A (en) * | 2004-09-10 | 2006-03-23 | Shin Etsu Chem Co Ltd | Liquid epoxy resin composition and semiconductor device |
JP2008111106A (en) * | 2006-10-06 | 2008-05-15 | Hitachi Chem Co Ltd | Liquid resin composition for sealing electronic parts and electronic component device using the same |
WO2010073559A1 (en) * | 2008-12-25 | 2010-07-01 | 住友ベークライト株式会社 | Liquid resin composition and semiconductor device |
JP2011190440A (en) * | 2010-02-18 | 2011-09-29 | Hitachi Chem Co Ltd | Liquid resin composition for electronic part, and electronic part device |
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US7982322B2 (en) * | 2006-10-06 | 2011-07-19 | Hitachi Chemical Co., Ltd. | Liquid resin composition for electronic part sealing, and electronic part apparatus utilizing the same |
JP2008214548A (en) * | 2007-03-06 | 2008-09-18 | Sumitomo Bakelite Co Ltd | Liquid epoxy resin composition and semiconductor device using it |
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JP2001270976A (en) * | 1999-04-13 | 2001-10-02 | Hitachi Chem Co Ltd | Epoxy resin composition for sealing and electronic device |
JP2003292580A (en) * | 2002-03-29 | 2003-10-15 | Nof Corp | Epoxy resin composition for sealing semiconductor |
JP2005255935A (en) * | 2004-03-15 | 2005-09-22 | Dainippon Ink & Chem Inc | Epoxy resin composition and its cured product |
JP2006077167A (en) * | 2004-09-10 | 2006-03-23 | Shin Etsu Chem Co Ltd | Liquid epoxy resin composition and semiconductor device |
JP2008111106A (en) * | 2006-10-06 | 2008-05-15 | Hitachi Chem Co Ltd | Liquid resin composition for sealing electronic parts and electronic component device using the same |
WO2010073559A1 (en) * | 2008-12-25 | 2010-07-01 | 住友ベークライト株式会社 | Liquid resin composition and semiconductor device |
JP2011190440A (en) * | 2010-02-18 | 2011-09-29 | Hitachi Chem Co Ltd | Liquid resin composition for electronic part, and electronic part device |
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JP2014237837A (en) | 2014-12-18 |
TWI553032B (en) | 2016-10-11 |
WO2012147874A1 (en) | 2012-11-01 |
JP5783248B2 (en) | 2015-09-24 |
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