JPWO2009136597A1 - Structure, structure forming method, and laser beam irradiation apparatus - Google Patents
Structure, structure forming method, and laser beam irradiation apparatus Download PDFInfo
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Abstract
感光性を有しない材料であっても、基材内部に周期構造を形成可能とするとともに、より低廉なレーザ装置でその周期構造を形成可能とする。微小な空洞部12が、光回折を起こすように基材11の内部に三次元的に周期配列して形成された。Even if it is a material which does not have photosensitivity, while being able to form a periodic structure inside a base material, the periodic structure can be formed with a cheaper laser apparatus. Minute cavities 12 were formed in a three-dimensional periodic arrangement inside the substrate 11 so as to cause light diffraction.
Description
本発明は、回折や干渉などの光学現象を用いた光制御機能を有する構造体、この構造体の形成方法、及び、その構造体を形成するためのレーザ光照射装置に関し、特に、レーザ光の照射により内部に形成された周期構造が構造色を発現する構造体、構造体形成方法及びレーザ光照射装置に関する。 The present invention relates to a structure having a light control function using an optical phenomenon such as diffraction and interference, a method for forming the structure, and a laser beam irradiation apparatus for forming the structure, and more particularly, a laser beam irradiation apparatus. The present invention relates to a structure in which a periodic structure formed inside by irradiation exhibits a structural color, a structure forming method, and a laser beam irradiation apparatus.
近年、リサイクル性や環境適性の観点から、顔料物質を用いる化学的発色が受け入れられなくなりつつある。微細周期構造形成により光の回折・干渉などの現象を用いて発色する構造色が、それに替わる技術として重要となる。
ところが、物質表面に形成された二次元周期構造は、発色を弱める原因となる傷つきや汚れへの耐性が無い。In recent years, chemical coloring using pigment substances is becoming unacceptable from the viewpoints of recyclability and environmental suitability. A structural color that develops by using phenomena such as light diffraction and interference by forming a fine periodic structure is important as an alternative technique.
However, the two-dimensional periodic structure formed on the surface of the material does not have resistance to scratches and dirt that cause color development to be weakened.
これら傷つきや汚れへの耐性を持たせるためには、微細周期構造を物質内部に形成する必要がある。
また、物質内部に三次元微細周期構造を形成することで、発色効率の向上や発色選択性を付与することができる。
この三次元微細周期構造を形成する方法として、次の技術が提案されている。
例えば、屈折率周期構造を含む複数の層を周期的に積層した3次元フォトニック結晶であって、長方格子,所定の媒質により成る孔,柱状構造などにより形成された複数の層を順に周期的に積層したものが提案されている(例えば、特許文献1参照。)。In order to provide resistance to scratches and dirt, it is necessary to form a fine periodic structure inside the substance.
In addition, by forming a three-dimensional fine periodic structure inside the substance, it is possible to improve the coloring efficiency and provide coloring selectivity.
The following technique has been proposed as a method of forming this three-dimensional fine periodic structure.
For example, a three-dimensional photonic crystal in which a plurality of layers including a refractive index periodic structure are periodically stacked, and a plurality of layers formed by a rectangular lattice, a hole made of a predetermined medium, a columnar structure, etc. are sequentially cycled. Laminated layers have been proposed (see, for example, Patent Document 1).
ところが、この提案技術は、蒸着やエッチング処理により形成するため、工程が複雑であるうえに時間がかかっていた。
そこで、レーザ照射により三次元微細周期構造を形成する技術が提案されている(例えば、特許文献2、3参照)。
この提案技術によれば、工程を簡易にでき、加工時間を短くできる。However, since this proposed technique is formed by vapor deposition or etching, the process is complicated and takes time.
Therefore, a technique for forming a three-dimensional fine periodic structure by laser irradiation has been proposed (see, for example, Patent Documents 2 and 3).
According to this proposed technique, the process can be simplified and the processing time can be shortened.
しかしながら、上述した特許文献2、3に記載の技術においては、次のような問題があった。
たとえば、特許文献2に記載の技術の対象物は、光レジスト材料(光硬化樹脂)であり、特許文献3に記載の技術の対象物は、多光子露光が可能な感光性材料(光熱屈折率変化を生じるガラス)であった。このため、感光性を有しない材料に用いることができなかった。However, the techniques described in Patent Documents 2 and 3 described above have the following problems.
For example, the object of the technique described in Patent Document 2 is a photoresist material (photo-curing resin), and the object of the technique described in Patent Document 3 is a photosensitive material (photothermal refractive index capable of multiphoton exposure). Glass that causes a change). For this reason, it could not be used for a material having no photosensitivity.
また、レーザ装置に超短パルス(フェムト秒)レーザを用いているので、照射光学系の調整が難しいうえに、レーザ装置が高価であるなど問題があった。 In addition, since an ultrashort pulse (femtosecond) laser is used for the laser device, there are problems such as difficulty in adjusting the irradiation optical system and an expensive laser device.
本発明は、上記の問題を解決すべくなされたものであり、感光性を有しない材料であっても、基材内部に周期構造を形成可能とするとともに、より低廉なレーザ装置でその周期構造を形成可能とする構造体、構造体形成方法及びレーザ光照射装置の提供を目的とする。 The present invention has been made to solve the above-described problem. Even if the material does not have photosensitivity, the periodic structure can be formed inside the base material, and the periodic structure can be formed with a less expensive laser device. An object of the present invention is to provide a structure, a structure forming method, and a laser beam irradiation apparatus that can form the structure.
この目的を達成するため、本発明の構造体は、微小な空洞部が、光回折を起こすように基材の内部に三次元的に周期配列して形成された構成としてある。 In order to achieve this object, the structure of the present invention has a configuration in which minute cavities are periodically arranged in a three-dimensional manner inside the substrate so as to cause light diffraction.
また、本発明の構造体形成方法は、基材に光を照射して、微小な空洞部を基材の内部に三次元的に周期配列して形成する方法としてある。 The structure forming method of the present invention is a method of irradiating a base material with light and forming microscopic cavities three-dimensionally and periodically inside the base material.
また、本発明のレーザ光照射装置は、基材に光を照射するレーザ光照射装置であって、基材の内部に、光回折を起こす周期配列で空洞部を形成するように、照射パルス数及び/又はレーザ出力を調整する機能を有するレーザ発振器を備えた構成としてある。 The laser light irradiation apparatus of the present invention is a laser light irradiation apparatus that irradiates a substrate with light, and the number of irradiation pulses so that a cavity is formed in the substrate in a periodic array that causes light diffraction. And / or a laser oscillator having a function of adjusting the laser output.
本発明の構造体、構造体形成方法及びレーザ光照射装置によれば、基材の内部に周期構造が形成されるため、発色を弱める原因となる、傷つきや汚れへの耐性を持つことができる。
また、周期構造の形成が光の照射によってなされるため、大気圧下で行うことができる。しかも、前処理や後処理を行うことなく、その周期構造を形成できる。
さらに、基材が透過性を示す光を照射して周期構造を形成するため、基材が感光性を有していなくてもよい。According to the structure, the structure forming method, and the laser beam irradiation apparatus of the present invention, since the periodic structure is formed inside the base material, it can have resistance to scratches and dirt, which cause weakening of color development. .
In addition, since the periodic structure is formed by light irradiation, it can be performed under atmospheric pressure. Moreover, the periodic structure can be formed without performing pre-processing or post-processing.
Furthermore, since the base material is irradiated with light showing transparency to form a periodic structure, the base material may not have photosensitivity.
また、レーザ装置の機能として、照射パルス数やレーザ出力の調整ができればよいことから、低廉で照射光学系の調整が簡易であるレーザ装置を用いて構造体を作製できる。
さらに、三次元的な周期配列で多数の空洞部が形成されるため、奥行き方向の周期を増やすことで、発色効率を向上させることができる。In addition, since the number of irradiation pulses and the laser output need only be adjusted as the function of the laser device, a structure can be manufactured using a laser device that is inexpensive and easy to adjust the irradiation optical system.
Furthermore, since a large number of cavities are formed in a three-dimensional periodic arrangement, the coloring efficiency can be improved by increasing the period in the depth direction.
以下、本発明に係る構造体、構造体形成方法及びレーザ光照射装置の好ましい実施形態について、図面を参照して説明する。 Hereinafter, preferred embodiments of a structure, a structure forming method, and a laser beam irradiation apparatus according to the present invention will be described with reference to the drawings.
[構造体]
まず、本発明の構造体の実施形態について、図1〜図4を参照して説明する。
図1は、本実施形態の構造体の構造を模式的に表した断面図である。図2は、構造体を上面(図1のA方向)から見たときの透過顕微観察像である。図3は、構造体を上面から見たときの奥行き約5μmにおける透過顕微観察像である。図4は、構造体の断面を拡大して見たときのSEM観察像である。[Structure]
First, an embodiment of a structure of the present invention will be described with reference to FIGS.
FIG. 1 is a cross-sectional view schematically showing the structure of the structure according to this embodiment. FIG. 2 is a transmission microscope observation image when the structure is viewed from the top surface (direction A in FIG. 1). FIG. 3 is a transmission microscope observation image at a depth of about 5 μm when the structure is viewed from above. FIG. 4 is an SEM observation image when the cross section of the structure is enlarged.
図1〜図4に示すように、構造体10の基材11の内部には、微小な空洞部12が多数形成してある。
一つの空洞部12は、球形又はカプセル型に近似した形状をなし、直径は長いもので1μm程度となっている。As shown in FIGS. 1 to 4, a large number of minute cavities 12 are formed inside the base material 11 of the structure 10.
One cavity portion 12 has a shape approximate to a spherical shape or a capsule shape, and has a long diameter of about 1 μm.
この空洞部12は、構造体10のうち光が照射された部分に形成される。
その照射範囲内(同一の面内)では、図1〜図4に示すように、空洞部12が複数形成される。
それら複数の空洞部12は、光の照射範囲内で、面方向と奥行き方向のそれぞれにほぼ等間隔で形成される。つまり、複数の空洞部12は、三次元的な周期配列で形成される。
また、奥行き方向におけるある深さに形成された複数の空洞部12のそれぞれと、次の深さに形成された複数の空洞部12のそれぞれとは、光の照射範囲の直上(図1のA方向)から見たときに、重ならない位置に形成される。The cavity 12 is formed in a portion of the structure 10 that is irradiated with light.
Within the irradiation range (in the same plane), a plurality of hollow portions 12 are formed as shown in FIGS.
The plurality of cavities 12 are formed at substantially equal intervals in the surface direction and the depth direction within the light irradiation range. That is, the plurality of hollow portions 12 are formed in a three-dimensional periodic array.
Each of the plurality of cavities 12 formed at a certain depth in the depth direction and each of the plurality of cavities 12 formed at the next depth are directly above the light irradiation range (A in FIG. 1). It is formed at a position that does not overlap when viewed from the direction.
ここで、三次元周期構造は、面内の二次元周期構造とその二次元周期構造形成面が奥行き方向に周期的に配列した多層構造と考えられる(図5参照)。二次元周期構造形成面(回折面という)では回折現象が起こり、光の入射角度や観察する角度によって異なる色で発色する。ここで、奥行きの異なる位置に存在するそれぞれの回折面でも回折現象が起きている。このとき、各面からの回折光の位相が揃わないと発色は弱くなるが、位相が揃うと発色は強くなる。つまり、多層構造に由来する干渉現象が起きる。具体的には、下記のブラッグ反射式(式1)に則った波長の光で発色が強くなる。 Here, the three-dimensional periodic structure is considered to be a multilayer structure in which the in-plane two-dimensional periodic structure and the two-dimensional periodic structure forming surface are periodically arranged in the depth direction (see FIG. 5). A diffraction phenomenon occurs on the two-dimensional periodic structure forming surface (referred to as a diffraction surface), and colors are generated in different colors depending on the incident angle of light and the observation angle. Here, the diffraction phenomenon also occurs in each diffraction surface existing at a position having a different depth. At this time, if the phase of the diffracted light from each surface is not aligned, the color development becomes weak, but if the phases are aligned, the color development becomes strong. That is, an interference phenomenon derived from the multilayer structure occurs. Specifically, color development becomes stronger with light having a wavelength in accordance with the Bragg reflection equation (Equation 1) below.
mλ=2D(n2−sin2θ)1/2 ・・・(式1)mλ = 2D (n 2 −sin 2 θ) 1/2 (Expression 1)
この式1において、mは回折次数、λは波長、Dは回折面の間隔、nは物質の屈折率、θは試料面の法線角度を0°とする観察角度を表す。
微小な空洞部12が三次元に周期配列した構造は、光照射時の三次元周期的強度分布に一致するように形成される。その三次元周期強度分布は、5光束干渉によって生成される。このとき、光束の交差角度によって、周期的強度分布の面方向と奥行き方向の周期が異なる。
つまり、5光束干渉時の交差角を異ならせることで、周期の異なる三次元周期構造を形成することができる。これにより、三次元周期構造によって起こる回折現象と干渉現象が成立する光の波長を異ならせること、つまりは発色を制御することができる。In Equation 1, m is the diffraction order, λ is the wavelength, D is the distance between the diffraction surfaces, n is the refractive index of the substance, and θ is the observation angle with the normal angle of the sample surface being 0 °.
The structure in which the minute cavities 12 are periodically arranged in three dimensions is formed to match the three-dimensional periodic intensity distribution during light irradiation. The three-dimensional periodic intensity distribution is generated by five-beam interference. At this time, the period in the surface direction and the depth direction of the periodic intensity distribution is different depending on the intersection angle of the light beams.
That is, a three-dimensional periodic structure with a different period can be formed by varying the crossing angle at the time of five-beam interference. As a result, the wavelength of the light at which the diffraction phenomenon caused by the three-dimensional periodic structure and the interference phenomenon are established, that is, the color development can be controlled.
なお、本発明でいう「構造色を発現する規則的配列」とは、格子周期が可視光波長(約400nm〜700nm)に近いときのことであり、およそ2.0μm以下のことである。このとき、可視光が強く回折するので、構造色が観察される。 The “regular arrangement that expresses structural color” in the present invention means that the grating period is close to the visible light wavelength (about 400 nm to 700 nm), and is about 2.0 μm or less. At this time, since visible light is strongly diffracted, structural colors are observed.
また、図2及び図3の透過顕微観察像や図4の断面SEM観察像は、構造体10としてPET延伸シートを用いたものである。ただし、構造体10は、これに限るものではなく、光の照射により内部に空洞部12が形成される物質であればよい。 2 and FIG. 3 and the cross-sectional SEM observation image of FIG. 4 are obtained by using a PET stretched sheet as the structure 10. However, the structure 10 is not limited to this, and may be a substance in which the cavity 12 is formed inside by light irradiation.
(基材)
基材11とは、構造体10のベースとなる部材をいう。
基材11には、例えば、ポリスチレン、ポリエチレン、ポリプロピレン、ポリカーボネート、ナイロン樹脂、アクリル樹脂、塩化ビニル樹脂、フェノール樹脂などの高分子化合物、BK7、石英などの光学ガラスやソーダガラスなどを材料として用いることができる。特には、ポリエチレンテレフタレート(PET)やポリエチレンナフタレート(PEN)、ポリブチレンテレフタレート(PBT)、ポリトリメチレンテレフタレート(PTT)などのポリエステル化合物等を好適な材料として用いることもできる。また、基材11には、例えば、複数種類を混練した高分子化合物や共重合させた高分子化合物、適切な添加剤を加えた高分子化合物を用いることができる。
なお、基材11は、上述の材料に限るものではなく、従来公知の任意好適な材料を用いることができる。ただし、光の照射により空洞部12が形成されることを要する。(Base material)
The base material 11 refers to a member that serves as a base of the structure 10.
For the base material 11, for example, a polymer compound such as polystyrene, polyethylene, polypropylene, polycarbonate, nylon resin, acrylic resin, vinyl chloride resin, phenol resin, BK7, optical glass such as quartz, soda glass, or the like is used as a material. Can do. In particular, a polyester compound such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), and polytrimethylene terephthalate (PTT) can be used as a suitable material. Moreover, for the base material 11, for example, a polymer compound obtained by kneading a plurality of types, a copolymerized polymer compound, or a polymer compound to which an appropriate additive is added can be used.
In addition, the base material 11 is not restricted to the above-mentioned material, A conventionally well-known arbitrary suitable material can be used. However, it is necessary to form the cavity 12 by light irradiation.
[レーザ光照射装置]
次に、レーザ光照射装置について、図6を参照して説明する。
同図は、該レーザ光照射装置の構成を示す概略斜視図である。[Laser irradiation equipment]
Next, a laser beam irradiation apparatus will be described with reference to FIG.
FIG. 2 is a schematic perspective view showing the configuration of the laser beam irradiation apparatus.
レーザ光照射装置20は、構造体10(基材11)に空洞部12を形成するための装置であって、同図に示すように、レーザ発振器21と、ビームスプリッタ22と、コリメータ素子23と、光束選択素子24と、集光素子25とを備えている。 The laser beam irradiation device 20 is a device for forming the cavity 12 in the structure 10 (base material 11). As shown in the figure, a laser oscillator 21, a beam splitter 22, a collimator element 23, , A light beam selecting element 24 and a light collecting element 25 are provided.
ここで、レーザ発振器21は、レーザ光を出力する装置であって、例えば、YAGレーザ、YVO4レーザ、YLFレーザなどのナノ秒レーザ又はピコ秒レーザを用いることができる。これらパルスレーザは、数Hz〜数十MHzの繰り返し周波数を有するが、この繰り返し周期の間蓄えられたエネルギーを数ps〜数十nsという極めて短い時間幅で放出する。そのため、少ない入力エネルギーから高いピークパワーを効率的に得ることができる。なお、照射光学系の調整が難しいうえに、装置が高価という問題点があるが、Ti:サファイアレーザなどのフェムト秒レーザを用いることもできる。また、レーザ光照射にあたって空洞部が形成されるのに好適な時間幅だけ照射することができることから、特には、ナノ秒パルスレーザが望ましい。Here, the laser oscillator 21 is a device that outputs laser light. For example, a nanosecond laser or a picosecond laser such as a YAG laser, a YVO 4 laser, or a YLF laser can be used. These pulse lasers have a repetition frequency of several Hz to several tens of MHz, and emit energy stored during this repetition period in a very short time width of several ps to several tens ns. Therefore, a high peak power can be efficiently obtained from a small input energy. It is difficult to adjust the irradiation optical system and the apparatus is expensive, but a femtosecond laser such as a Ti: sapphire laser can also be used. In addition, a nanosecond pulse laser is particularly desirable because irradiation can be performed for a time width suitable for forming a cavity in laser light irradiation.
このレーザ発振器21は、照射パルス数を調整する機能を有している。また、レーザ発振器21は、レーザの出力を調整することで、エネルギー密度(フルエンス:1パルスの照射面積あたりのエネルギー)をコントロールすることもできる。
なお、エネルギー密度のコントロールは、レーザ発振器21におけるレーザ出力の調整の他、例えば、レーザ出力が同じで照射ビーム径を変化させることによっても実現できる。
また、被照射材内部への周期構造の形成のためには、照射する光が材料内部へ進入する必要がある。照射光が極表面で吸収されないよう、被照射材において適度な透過率を有する波長の光を用いることが望ましい。The laser oscillator 21 has a function of adjusting the number of irradiation pulses. The laser oscillator 21 can also control the energy density (fluence: energy per irradiation area of one pulse) by adjusting the output of the laser.
The energy density can be controlled not only by adjusting the laser output in the laser oscillator 21, but also by changing the irradiation beam diameter with the same laser output.
In addition, in order to form a periodic structure inside the irradiated material, it is necessary for light to be irradiated to enter the material. It is desirable to use light of a wavelength having an appropriate transmittance in the irradiated material so that the irradiated light is not absorbed at the extreme surface.
ビームスプリッタ22は、表面に微細な凹部又は凸部が周期的に刻まれているために回折を起こす、透過型の光学素子であって、レーザ光を複数の光束に分割する。
特に、ビームスプリッタ22は、図6及び図7に示すように、レーザ光を、少なくとも、中心光束(0次光)が1光束と、周辺光束(1次光)が4光束の計5光束以上に分割する。The beam splitter 22 is a transmissive optical element that diffracts because fine concave portions or convex portions are periodically carved on the surface, and divides the laser light into a plurality of light beams.
In particular, as shown in FIGS. 6 and 7, the beam splitter 22 divides laser light into at least 5 light fluxes including at least a central light beam (zero-order light) and a peripheral light beam (primary light) of four light beams. Divide into
コリメータ素子23は、例えば、焦点距離が200mmの合成石英平凸レンズを用いることができ、この場合はビームスプリッタ22から200mmの位置に置かれる。そして、コリメータ素子23は、ビームスプリッタ22で分割された複数の光束を通す。
光束選択素子24は、コリメータ素子23を通過した光束が焦点を結ぶ位置に置かれ、複数の光束のうち干渉に不必要な光束を遮り、必要な光束のみを通過させるマスクを用いることができる。この必要な光束は、中心光束(0次光)と周辺光束(1次光)の5光束である。As the collimator element 23, for example, a synthetic quartz plano-convex lens having a focal length of 200 mm can be used. In this case, the collimator element 23 is placed at a position 200 mm from the beam splitter 22. The collimator element 23 passes a plurality of light beams divided by the beam splitter 22.
The light beam selection element 24 can be a mask that is placed at a position where the light beam that has passed through the collimator element 23 is focused, blocks a light beam that is unnecessary for interference among a plurality of light beams, and allows only the necessary light beam to pass. The necessary light beams are five light beams of a central light beam (0th order light) and a peripheral light beam (primary light).
集光素子25は、例えば、焦点距離が100mmの合成石英平凸レンズを用いることができ、光束選択素子24を通過した5光束を集光し、それら5光束を交差させ干渉させる。この干渉した領域は、図8に示すように高強度域の分布となり、この領域で基材11に光照射する。
また、その干渉領域では、三次元的な周期強度分布を有する光が基材11に照射される。これは、中心光束(0次光)と周辺光束(1次光)の5光束干渉で照射することにより実現される。As the condensing element 25, for example, a synthetic quartz plano-convex lens having a focal length of 100 mm can be used, and the five light beams that have passed through the light beam selecting element 24 are condensed, and the five light beams intersect and interfere with each other. As shown in FIG. 8, the interfering region has a high intensity region distribution, and the substrate 11 is irradiated with light in this region.
In the interference region, the substrate 11 is irradiated with light having a three-dimensional periodic intensity distribution. This is realized by irradiating with the five-beam interference of the central light beam (zero-order light) and the peripheral light beam (primary light).
このとき、中心の光束(0次光)の強度と周囲の光束(1次光)の強度とを近づけておくことが重要である。ただし、等しくする必要はない。これは、例えば0次光の強度が強すぎると単光束のレーザ照射に等しくなり、また、1次光の強度が強すぎると4光束の干渉に等しくなり、必要とする3次元的な周期強度分布が発生できないからである。
なお、ビームスプリッタに透過型回折格子を用いた場合、各光束の強度の配分は、透過型回折格子の微細パターンと用いるレーザ波長の組み合わせによって異なる。このようにして、各光束の強度を調節することができる。ただし、ビームスプリッタとして用いられるのは、透過型回折格子に限らない。
また、コリメータ素子23や集光素子25としては、凸レンズの他、フレネルレンズやGRIN(Graded-Index)レンズなどの光学素子を用いることができる。At this time, it is important that the intensity of the central light beam (zero-order light) and the intensity of the surrounding light beam (primary light) are close to each other. However, they need not be equal. For example, if the intensity of the zero-order light is too strong, it is equivalent to laser irradiation of a single light beam, and if the intensity of the primary light is too strong, it becomes equal to interference of four light beams, and the required three-dimensional periodic intensity is required. This is because no distribution can occur.
When a transmission type diffraction grating is used for the beam splitter, the distribution of the intensity of each light beam varies depending on the combination of the fine pattern of the transmission type diffraction grating and the laser wavelength used. In this way, the intensity of each light beam can be adjusted. However, what is used as a beam splitter is not limited to a transmissive diffraction grating.
As the collimator element 23 and the condensing element 25, an optical element such as a Fresnel lens or a GRIN (Graded-Index) lens can be used in addition to a convex lens.
また、基材11の内部に周期構造を形成するためには、照射する光が材料内部へ進入する必要がある。照射光が極表面で吸収されないよう、基材11において適度な透過率を有する波長の光を用いる。
ここで、波長に対して基材11が透過性の性質を有しているか否かは、次のように判断される。
特定の波長に対して、その基材11における光の透過率が70%以上を「透過性」、透過率が10%以上70%未満を「半透過性」、透過率が10%未満を「不透過性」とする。
ある波長に対して基材11が透過性を示す場合、光は基材内部まで進入する。一方、不透過性を示す場合、光は基材11の表面近傍にしか進入しない。Moreover, in order to form a periodic structure inside the base material 11, it is necessary for the light to irradiate to enter the material. In order to prevent the irradiation light from being absorbed at the extreme surface, light having a wavelength having an appropriate transmittance in the base material 11 is used.
Here, whether or not the substrate 11 has a transmissive property with respect to the wavelength is determined as follows.
For a specific wavelength, the light transmittance of the base material 11 is “transmittance” of 70% or more, the transmissivity is 10% or more and less than 70% “semi-transparent”, and the transmittance is less than 10%. Impermeability ".
When the base material 11 shows transparency with respect to a certain wavelength, the light enters the base material. On the other hand, in the case of showing impermeability, light only enters the vicinity of the surface of the substrate 11.
具体的には、図9に示すように、基材11がPETシートの場合、この基材11が透過性を示す波長領域に含まれる光として、およそ330nm以上の波長の光(例えば、YAGレーザ第3高調波:355nm)を照射して空洞部12を形成する。 Specifically, as shown in FIG. 9, when the substrate 11 is a PET sheet, light having a wavelength of about 330 nm or more (for example, a YAG laser) is included as light included in the wavelength region where the substrate 11 exhibits transparency. The third harmonic (355 nm) is irradiated to form the cavity 12.
[構造体の形成方法]
次に、本実施形態の構造体の形成方法について説明する。
三次元的な周期的強度分布を有した光を照射することで、基材11の内部に空洞部12を形成する。
その光は、基材11が透過性を示す波長領域に含まれる波長の光である。[Method of forming structure]
Next, a method for forming the structure according to this embodiment will be described.
By irradiating light having a three-dimensional periodic intensity distribution, the cavity 12 is formed inside the substrate 11.
The light is light having a wavelength included in a wavelength region in which the substrate 11 exhibits transparency.
また、図6及び図8に示すように、光束選択素子24を通過した5光束を集光素子25で集光し、それら5光束を交差させ干渉させた領域で、基材11に光照射する。
その干渉領域では、レーザ光照射装置20の光学系において中心の光束を加えた5光束が干渉しているため、三次元的な周期強度分布を有する光を照射できる。これにより、基材11の内部に周期配列で空洞部12を形成できる。
このとき、空洞部12を形成するには基材11に対して十分に高い照射エネルギー密度でもって照射する必要がある。照射エネルギー密度が低い場合、光は単に透過するのみで空洞部12は形成されない。また、照射エネルギー密度は高すぎても好ましくない。照射エネルギー密度が高すぎる場合、形成される周期構造が崩れたり基材11に焦げが発生したりしてしまう。なお、基材11によって、空洞部12の形成に要する照射エネルギー密度は異なる。また、透過性を示す波長領域に含まれる光であっても、用いる波長が異なると、その透過率の差異に応じて、空洞部12の形成に要する照射エネルギー密度が異なる。Further, as shown in FIGS. 6 and 8, the five light beams that have passed through the light beam selecting element 24 are collected by the light collecting element 25, and the base material 11 is irradiated with light in a region where these five light beams intersect and interfere with each other. .
In the interference region, since five light beams including the central light beam interfere with each other in the optical system of the laser light irradiation apparatus 20, light having a three-dimensional periodic intensity distribution can be irradiated. Thereby, the cavity part 12 can be formed in the base material 11 by a periodic arrangement.
At this time, it is necessary to irradiate the substrate 11 with a sufficiently high irradiation energy density to form the cavity 12. When the irradiation energy density is low, light is simply transmitted and the cavity 12 is not formed. Moreover, it is not preferable that the irradiation energy density is too high. If the irradiation energy density is too high, the periodic structure to be formed is destroyed or the base material 11 is burnt. The irradiation energy density required for forming the cavity 12 varies depending on the base material 11. Moreover, even if it is the light contained in the wavelength range which shows transparency, if the wavelength to be used differs, the irradiation energy density required for formation of the cavity part 12 will differ according to the difference in the transmittance | permeability.
ここで、基材11にPETを用いたときを例にして説明する。
不透過性を示す波長266nmの光を用いる通常の加工での照射エネルギー密度は20mJ/cm2である。透過性を示す波長355nmの光を用いたときに、同じ照射エネルギー密度20mJ/cm2で照射しても空洞部12は形成されない。空洞部12を形成するには、照射エネルギー密度は300mJ/cm2以上1000mJ/cm2以下が必要である。空洞部12をより良好に形成するには、特には、500mJ/cm2以上850mJ/cm2以下が好適である。
このように、基材11がPETで透過性を示す波長355nmの光を照射する場合、通常の不透過性を示す波長266nmの光を用いるときのおよそ15〜50倍の照射エネルギー密度でもって照射すると空洞部12を形成できることが発明者の実験でわかった。Here, the case where PET is used for the substrate 11 will be described as an example.
The irradiation energy density in normal processing using light having a wavelength of 266 nm showing impermeability is 20 mJ / cm 2 . When light having a wavelength of 355 nm showing transparency is used, the cavity 12 is not formed even if irradiation is performed with the same irradiation energy density of 20 mJ / cm 2 . In order to form the cavity 12, the irradiation energy density needs to be 300 mJ / cm 2 or more and 1000 mJ / cm 2 or less. To better form a cavity 12, in particular, 500 mJ / cm 2 or more 850mJ / cm 2 or less is preferable.
Thus, when the substrate 11 irradiates light with a wavelength of 355 nm showing transparency with PET, irradiation is performed with an irradiation energy density of about 15 to 50 times that when using light with a wavelength of 266 nm showing normal impermeability. Then, the inventor's experiment revealed that the cavity 12 can be formed.
[構造体形成の実施例]
次に、構造体形成の実施例について説明する。
Q−スイッチパルスYAGレーザ第3高調波(波長355nm)の光束を、ビームスプリッタ22を通過させることで、複数の光束に分割した。このとき、0次光の強度を1とすると、1次光の強度は3.6であった。
各々の光束をコリメータ素子23に通過させ、焦点を結ぶ位置においた光束選択素子24により干渉に不必要な光束を遮り、必要な光束のみ(5光束)を通過させた。通過した光束を集光素子25を用いて集光し、光束を交差させ干渉させた。このとき、0次光と1次光の交差角は12.6°であった。干渉した領域で2軸延伸したPETシート(透過率82.3%@355nm)に照射する。
パルスYAGレーザの仕様は、パルス幅5ns、繰り返し周波数10Hzであった。
照射エネルギー密度が500mJ/cm2でパルス1発を照射した結果、延伸PETシート内部に微小な空洞部12が三次元周期配列した構造が観察された。このとき観察された構造は、面方向の周期は約1.5μm、奥行き方向の周期は約3.7μmであった。[Example of structure formation]
Next, examples of structure formation will be described.
The light beam of the Q-switch pulse YAG laser third harmonic (wavelength 355 nm) was split into a plurality of light beams by passing through the beam splitter 22. At this time, when the intensity of the 0th-order light is 1, the intensity of the 1st-order light is 3.6.
Each luminous flux was allowed to pass through the collimator element 23, and the luminous flux selection element 24 placed at the focal point blocked the luminous flux unnecessary for interference, and only the necessary luminous flux (five luminous flux) was allowed to pass. The light beam that passed through was condensed using the condensing element 25, and the light beams crossed and caused interference. At this time, the crossing angle between the 0th order light and the 1st order light was 12.6 °. Irradiate to a biaxially stretched PET sheet (transmittance 82.3% @ 355 nm) in the interfering region.
The specifications of the pulse YAG laser were a pulse width of 5 ns and a repetition frequency of 10 Hz.
As a result of irradiating one pulse at an irradiation energy density of 500 mJ / cm 2 , a structure in which minute cavities 12 were three-dimensionally arranged inside the stretched PET sheet was observed. The structure observed at this time had a period in the plane direction of about 1.5 μm and a period in the depth direction of about 3.7 μm.
以上説明したように、本実施形態の構造体、構造体形成方法及びレーザ光照射装置によれば、三次元的な周期的強度分布を有した光を照射することで、基材11の内部に三次元的周期配列で空洞部12を形成することができる。
この空洞部12は、基材11の内部に形成されるため、発色を弱める原因となる、傷つきや汚れへの耐性を有することができる。As described above, according to the structure, the structure forming method, and the laser beam irradiation apparatus of the present embodiment, by irradiating light having a three-dimensional periodic intensity distribution, The cavity 12 can be formed in a three-dimensional periodic arrangement.
Since the hollow portion 12 is formed inside the base material 11, it can have resistance to scratches and dirt that cause weakening of color development.
また、周期構造の形成が光の照射によってなされるため、大気圧下で行うことができる。しかも、前処理や後処理を行うことなく、その周期構造を形成できる。
さらに、基材11が透過性を示す光を照射して周期構造を形成するため、基材11が感光性を有していなくてもよい。In addition, since the periodic structure is formed by light irradiation, it can be performed under atmospheric pressure. Moreover, the periodic structure can be formed without performing pre-processing or post-processing.
Furthermore, since the base material 11 is irradiated with light having transparency to form a periodic structure, the base material 11 may not have photosensitivity.
また、レーザ光照射装置20の機能として、照射パルス数やレーザ出力の調整ができればよいことから、低廉で照射光学系の調整が簡易であるレーザ光照射装置20を用いて構造体を作製できる。
さらに、三次元的な周期配列で多数の空洞部12が形成されるため、奥行き方向の周期を増やすことで、発色効率を向上させることができる。Further, as the function of the laser beam irradiation apparatus 20, it is only necessary to be able to adjust the number of irradiation pulses and the laser output. Therefore, a structure can be manufactured using the laser beam irradiation apparatus 20 that is inexpensive and easy to adjust the irradiation optical system.
Furthermore, since a large number of cavities 12 are formed in a three-dimensional periodic arrangement, the coloring efficiency can be improved by increasing the period in the depth direction.
以上、本発明の構造体、構造体形成方法及びレーザ光照射装置の好ましい実施形態について説明したが、本発明に係る構造体、構造体形成方法及びレーザ光照射装置は上述した実施形態にのみ限定されるものではなく、本発明の範囲で種々の変更実施が可能であることは言うまでもない。
例えば、上述した実施形態では、基材の具体例として延伸PETシートを挙げたが、基材は延伸PETシートに限るものではなく、様々な材質や形状で形成された基材を採用することができる。The preferred embodiments of the structure, the structure forming method, and the laser beam irradiation apparatus of the present invention have been described above. However, the structure, the structure forming method, and the laser beam irradiation apparatus according to the present invention are limited to the above-described embodiments. It goes without saying that various modifications can be made within the scope of the present invention.
For example, in the above-described embodiment, the stretched PET sheet is given as a specific example of the base material, but the base material is not limited to the stretched PET sheet, and base materials formed of various materials and shapes may be adopted. it can.
本発明は、基材内部に周期構造を有する構造体に関する発明であるため、その周期構造を形成可能な材料で形成された製品などに利用可能である。 Since the present invention relates to a structure having a periodic structure inside the substrate, the present invention can be used for products formed of a material capable of forming the periodic structure.
10 構造体
11 基材
12 空洞部
20 レーザ光照射装置
21 レーザ発振器
22 ビームスプリッタDESCRIPTION OF SYMBOLS 10 Structure 11 Base material 12 Cavity part 20 Laser beam irradiation apparatus 21 Laser oscillator 22 Beam splitter
Claims (19)
ことを特徴とする構造体。A structure characterized in that minute cavities are periodically arranged in a three-dimensional manner inside a substrate so as to cause light diffraction.
ことを特徴とする請求項1記載の構造体。The structure according to claim 1, wherein the periodic arrangement of the hollow portions has a regular arrangement that expresses a structural color.
ことを特徴とする請求項1又は2記載の構造体。The said base material is a polyester compound. The structure of Claim 1 or 2 characterized by the above-mentioned.
ことを特徴と請求項1〜3のいずれかに記載の構造体。The structure according to any one of claims 1 to 3, wherein the periodic array of the hollow portions is formed by light irradiation.
ことを特徴とする請求項4記載の構造体。The structure according to claim 4, wherein the light is light included in a wavelength region in which the base material exhibits transparency.
ことを特徴とする請求項4又は5記載の構造体。The structure according to claim 4 or 5, wherein the light is irradiated so as to generate a three-dimensional periodic intensity distribution.
ことを特徴とする請求項4〜6のいずれかに記載の構造体。The structure according to any one of claims 4 to 6, wherein the light is nanosecond pulse laser light.
ことを特徴とする構造体形成方法。A structure forming method, comprising: irradiating a base material with light to form microscopic cavities in a three-dimensional periodic array inside the base material.
ことを特徴とする請求項8記載の構造体形成方法。The structure forming method according to claim 8, wherein the base material is a polyester compound.
ことを特徴とする請求項8又は9記載の構造体形成方法。The structure forming method according to claim 8 or 9, wherein the light is light included in a wavelength region in which the base material exhibits transparency.
ことを特徴とする請求項8〜10のいずれかに記載の構造体形成方法。The structure forming method according to claim 8, wherein the light is irradiated so as to generate a three-dimensional periodic intensity distribution.
ことを特徴とする請求項11記載の構造体形成方法。The structure forming method according to claim 11, wherein the light is nanosecond pulse laser light.
前記基材の内部に、光回折を起こす周期配列で空洞部を形成するように、照射パルス数及び/又はレーザ出力を調整する機能を有するレーザ発振器を備えた
ことを特徴とするレーザ光照射装置。A laser light irradiation device for irradiating a substrate with light,
A laser light irradiation apparatus comprising a laser oscillator having a function of adjusting the number of irradiation pulses and / or the laser output so that a cavity is formed in a periodic arrangement that causes light diffraction inside the base material. .
ことを特徴とする請求項13記載のレーザ光照射装置。The laser light irradiation apparatus according to claim 13, wherein the laser oscillator is a nanosecond pulse laser.
ことを特徴とする請求項13又は14記載のレーザ光照射装置。The laser beam irradiation apparatus according to claim 13 or 14, further comprising an optical system that generates light having a three-dimensional periodic intensity distribution and irradiates the substrate.
ことを特徴とする請求項15記載のレーザ光照射装置。The optical system is configured to divide the light output from the laser oscillator into five light beams and irradiate light so that a region where the five light beams interfere becomes the base material. 15. The laser beam irradiation apparatus according to 15.
ことを特徴とする請求項15又は16記載のレーザ光照射装置。The laser beam irradiation apparatus according to claim 15 or 16, wherein the optical system includes a beam splitter, a collimator element, a light beam selection element, and a condensing element.
ことを特徴とする請求項16又は17記載のレーザ光照射装置。The laser light irradiation apparatus according to claim 16 or 17, wherein the optical system has a mechanism for adjusting the intensity of each of the divided light beams.
ことを特徴とする請求項17又は18記載のレーザ光照射装置。The laser beam irradiation apparatus according to claim 17 or 18, wherein the intensity of each light beam divided by changing the beam splitter can be adjusted.
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