JPWO2009081874A1 - Film-like resin composition for sealing filling, semiconductor package using the same, method for manufacturing semiconductor device, and semiconductor device - Google Patents

Film-like resin composition for sealing filling, semiconductor package using the same, method for manufacturing semiconductor device, and semiconductor device Download PDF

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JPWO2009081874A1
JPWO2009081874A1 JP2009528544A JP2009528544A JPWO2009081874A1 JP WO2009081874 A1 JPWO2009081874 A1 JP WO2009081874A1 JP 2009528544 A JP2009528544 A JP 2009528544A JP 2009528544 A JP2009528544 A JP 2009528544A JP WO2009081874 A1 JPWO2009081874 A1 JP WO2009081874A1
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Prior art keywords
film
resin composition
resin
compound
sealing
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JP2009528544A
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JP5299279B2 (en
Inventor
榎本　哲也
哲也 榎本
永井　朗
朗 永井
一尊 本田
一尊 本田
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Resonac Corporation
Showa Denko Materials Co Ltd
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Resonac Corporation
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
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    • H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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    • H—ELECTRICITY
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    • H—ELECTRICITY
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Abstract

（ａ）熱可塑性樹脂、（ｂ）エポキシ樹脂、（ｃ）硬化剤及び（ｄ）２個以上のフェノール性水酸基を有する化合物を含有する、封止充てん用フィルム状樹脂組成物が提供される。A film-like resin composition for sealing filling containing (a) a thermoplastic resin, (b) an epoxy resin, (c) a curing agent, and (d) a compound having two or more phenolic hydroxyl groups is provided.

Description

本発明は、封止充てん用フィルム状樹脂組成物、それを用いた半導体パッケージ及び半導体装置の製造方法、並びに半導体装置に関する。   The present invention relates to a film-like resin composition for sealing filling, a semiconductor package using the same, a method for manufacturing a semiconductor device, and a semiconductor device.

近年、電子機器の小型化、高機能化の進展に伴って、半導体装置に対して小型化、薄型化及び電気特性の向上（高周波伝送への対応など）が求められており、従来のワイヤーボンディングで半導体チップを基板に実装する方式から、半導体チップにバンプと呼ばれる導電性の突起を形成して基板電極と直接接続するフリップチップ接続方式への移行が始まっている。   In recent years, with the progress of miniaturization and high functionality of electronic devices, there has been a demand for miniaturization, thinning and improvement of electrical characteristics (corresponding to high frequency transmission, etc.) for semiconductor devices. Thus, a shift from a method of mounting a semiconductor chip on a substrate to a flip chip connection method in which conductive protrusions called bumps are formed on the semiconductor chip and directly connected to the substrate electrode has begun.

フリップチップ接続方式としては、はんだやスズなどを用いて金属接合させる方法、超音波振動を印加して金属接合させる方法、樹脂の収縮力を利用して機械的接触を保持する方法などが知られているが、中でも、生産性や接続信頼性の観点から、はんだやスズなどを用いて金属接合させる方法が広く用いられており、特にはんだを用いる方法は、高い接続信頼性を示すことからＭＰＵ（Ｍｉｃｒｏ Ｐｒｏｃｅｓｓｉｎｇ Ｕｎｉｔ）などの実装に適用されている。   Known flip-chip connection methods include metal bonding using solder, tin, etc., metal bonding by applying ultrasonic vibration, and method of maintaining mechanical contact using the shrinkage force of the resin. However, among them, from the viewpoint of productivity and connection reliability, a method of metal bonding using solder or tin is widely used. In particular, a method using solder exhibits high connection reliability and thus MPU. (Micro Processing Unit) is applied.

フリップチップ接続方式では、半導体チップと基板の熱膨張係数差に由来する熱応力が接続部に集中して接続部を破壊する恐れがあることから、この熱応力を分散して接続信頼性を高めるために、半導体チップと基板の間の空隙を樹脂で封止充てんする必要がある。樹脂の封止充てんの方式としては、一般に、半導体チップと基板をはんだなどを用いて接続した後、毛細管現象を利用して、空隙に液状封止樹脂を注入する方式が採用されている。   In the flip-chip connection method, thermal stress derived from the difference in thermal expansion coefficient between the semiconductor chip and the substrate may concentrate on the connection part and destroy the connection part. Therefore, the thermal stress is dispersed to improve connection reliability. Therefore, it is necessary to seal and fill the gap between the semiconductor chip and the substrate with resin. As a method for sealing and filling the resin, generally, a method in which a liquid sealing resin is injected into the gap using a capillary phenomenon after the semiconductor chip and the substrate are connected using solder or the like is employed.

この方式では、チップと基板を接続する際には、はんだなどの表面の酸化膜を還元除去して金属接合を容易にするために、ロジンや有機酸などからなるフラックスを用いているが、フラックスの残渣が残ると、液状樹脂を注入した場合にボイドと呼ばれる気泡発生の原因になったり、酸成分によって配線の腐食が発生し、接続信頼性が低下することから、残渣を洗浄する工程が必須であった。   In this method, when the chip and the substrate are connected, a flux composed of rosin or organic acid is used to reduce and remove the oxide film on the surface of the solder to facilitate metal bonding. If the residue remains, it may cause bubbles called voids when liquid resin is injected, or the corrosion of the wiring may occur due to acid components, reducing the connection reliability. Met.

しかし、近年、接続ピッチの狭ピッチ化に伴い、半導体チップと基板の間の空隙が狭くなっているため、フラックス残渣の洗浄が困難になる場合が生じる。さらに、半導体チップと基板の間の狭い空隙に液状樹脂を注入するのに長時間を要して生産性が低下してしまう。   However, in recent years, with the narrowing of the connection pitch, the gap between the semiconductor chip and the substrate is narrowed, so that it may be difficult to clean the flux residue. Furthermore, it takes a long time to inject the liquid resin into the narrow gap between the semiconductor chip and the substrate, resulting in a decrease in productivity.

そこで、はんだなどの金属の表面に存在する酸化膜を還元除去する性質（以下、フラックス活性と記す）を示す封止樹脂が求められる。このような封止樹脂を使用することにより、封止樹脂を基板に供給した後、半導体チップと基板を接続すると同時に、半導体チップと基板の間の空隙を樹脂で封止充てんし、フラックス残渣の洗浄を省略することが可能になると考えられる。なお、フラックス活性に関連するものとして、以下の公開公報が知られている。
特開２００１−２２３２２７号公報 特開２００５−２７２５４７号公報 特開２００６−１６９４０７号公報 Therefore, there is a need for a sealing resin that exhibits the property of reducing and removing an oxide film present on the surface of a metal such as solder (hereinafter referred to as flux activity). By using such a sealing resin, after supplying the sealing resin to the substrate, the semiconductor chip and the substrate are connected, and at the same time, the gap between the semiconductor chip and the substrate is sealed and filled with the resin. It may be possible to dispense with cleaning. The following publications are known as related to flux activity.
JP 2001-223227 A JP 2005-272547 A JP 2006-169407 A

フラックス活性を示す封止樹脂として、カルボン酸などの有機酸を配合したものが検討されているが、有機酸は、封止樹脂に広く用いられているエポキシ樹脂の硬化剤として作用することから、反応性の制御や保存安定性の確保が困難であったり、酸成分によって配線の腐食が発生し、絶縁信頼性が低下する場合があった。また、封止樹脂が液状の場合、ディスペンスなどで基板に樹脂を塗布する際に、樹脂粘度の経時変化によって、供給量を安定的に制御することが困難になる場合があった。   As a sealing resin exhibiting flux activity, what is blended with an organic acid such as a carboxylic acid has been studied, but the organic acid acts as a curing agent for epoxy resins widely used in sealing resins, In some cases, it was difficult to control the reactivity and ensure storage stability, or the corrosion of the wiring was caused by the acid component, resulting in a decrease in insulation reliability. Further, when the sealing resin is in a liquid state, it may be difficult to stably control the supply amount due to a change in the viscosity of the resin when the resin is applied to the substrate by dispensing or the like.

本発明の目的は、良好な保存安定性とフラックス活性を示し、接続信頼性に優れた半導体製品（半導体パーケージや半導体装置等）を製造可能な封止充てん用フィルム状樹脂組成物を提供することにある。本発明の目的はまた、そのような樹脂組成物を用いた半導体製品及びその製造方法を提供することにある。   An object of the present invention is to provide a film-like resin composition for sealing filling that can produce a semiconductor product (semiconductor package, semiconductor device, etc.) exhibiting good storage stability and flux activity and excellent connection reliability. It is in. Another object of the present invention is to provide a semiconductor product using such a resin composition and a method for producing the same.

本発明は、（ａ）熱可塑性樹脂、（ｂ）エポキシ樹脂、（ｃ）硬化剤及び（ｄ）２個以上のフェノール性水酸基を有する化合物を含有する、封止充てん用フィルム状樹脂組成物を提供する。   The present invention provides a film-like resin composition for sealing filling containing (a) a thermoplastic resin, (b) an epoxy resin, (c) a curing agent, and (d) a compound having two or more phenolic hydroxyl groups. provide.

本発明の封止充てん用フィルム状樹脂組成物は、良好な保存安定性とフラックス活性を示し、この組成物を用いることにより、接続信頼性に優れた半導体製品（半導体パーケージや半導体装置等）が製造可能となる。なお、上記組成物はフィルム状であることから、液状封止樹脂に比較して格段に取扱性、作業性が優れている。また、本発明者らは特定の理論に拘束されるものではないが、フラックス活性が向上し接続信頼性低下を防止できる主要因は、本発明の封止充てん用フィルム状樹脂組成物が、２個以上のフェノール性水酸基を有する化合物を含有することによるものと考えられる。   The film-like resin composition for sealing and filling of the present invention exhibits good storage stability and flux activity. By using this composition, a semiconductor product (semiconductor package, semiconductor device, etc.) having excellent connection reliability can be obtained. Manufacturable. In addition, since the said composition is a film form, handling property and workability | operativity are remarkably excellent compared with liquid sealing resin. In addition, although the present inventors are not bound by a specific theory, the main factor that can improve the flux activity and prevent the decrease in connection reliability is that the film-like resin composition for sealing and filling of the present invention has 2 This is considered to be due to containing a compound having one or more phenolic hydroxyl groups.

なお、本発明の封止充てん用フィルム状樹脂組成物は、（ａ）熱可塑性樹脂、（ｂ）エポキシ樹脂、（ｃ）硬化剤及び（ｄ）２個以上のフェノール性水酸基を有する化合物を含有するフィルム状封止充てん材（フィルム状封止材又はフィルム状充てん材）として把握することもできる。   The film-like resin composition for sealing filling of the present invention contains (a) a thermoplastic resin, (b) an epoxy resin, (c) a curing agent, and (d) a compound having two or more phenolic hydroxyl groups. It can also be grasped as a film-like sealing filler (film-like sealing material or film-like filler).

（ｄ）２個以上のフェノール性水酸基を有する化合物は、フェノール性水酸基を１個以上有する化合物と、ハロメチル基、アルコキシメチル基又はヒドロキシルメチル基を２個有する芳香族化合物、ジビニルベンゼン及びアルデヒド化合物から選ばれる少なくとも１種類以上の化合物との重縮合物であることが好ましい。重縮合物としては、例えば、フェノールノボラック樹脂、クレゾールノボラック樹脂、ナフトールノボラック樹脂、フェノールアラルキル樹脂等である。   (D) The compound having two or more phenolic hydroxyl groups is composed of a compound having one or more phenolic hydroxyl groups, an aromatic compound having two halomethyl groups, alkoxymethyl groups or hydroxylmethyl groups, divinylbenzene and an aldehyde compound. It is preferably a polycondensate with at least one selected compound. Examples of the polycondensate include phenol novolak resins, cresol novolak resins, naphthol novolak resins, phenol aralkyl resins, and the like.

（ｄ）２個以上のフェノール性水酸基を有する化合物は、１２０〜３００℃（好ましくは１２０〜２２０℃、更には１８０〜２２０℃）で液状を呈する化合物であることが好ましい。すなわち、本化合物は、低融点はんだの溶融温度に対応する１２０℃から、高融点はんだの溶融温度に対応する３００℃において、液体状態で存在する化合物であることが好ましい（当該温度範囲以下で液状であってもよい）。このような構成により、はんだ表面の酸化膜をより均一に除去できるようになる。   (D) The compound having two or more phenolic hydroxyl groups is preferably a compound that exhibits a liquid state at 120 to 300 ° C. (preferably 120 to 220 ° C., more preferably 180 to 220 ° C.). That is, the present compound is preferably a compound that exists in a liquid state from 120 ° C. corresponding to the melting temperature of the low-melting solder to 300 ° C. corresponding to the melting temperature of the high-melting solder (liquid in the temperature range or lower). May be). With this configuration, the oxide film on the solder surface can be removed more uniformly.

（ｃ）硬化剤は、イミダゾール化合物であることが好ましい。イミダゾール化合物を硬化剤として使用することにより、封止充てん用フィルム状樹脂組成物としての保存安定性と硬化物の耐熱性を共に向上させることができる。   (C) The curing agent is preferably an imidazole compound. By using an imidazole compound as a curing agent, both the storage stability as the film-like resin composition for sealing filling and the heat resistance of the cured product can be improved.

本発明の封止充てん用フィルム状樹脂組成物は、無機フィラーを含有することも好ましい。無機フィラーを含有することにより、例えば、封止充てん用フィルム状樹脂組成物の粘度の調整が容易になり、硬化物性の制御も可能となる。   The film-like resin composition for sealing and filling of the present invention preferably contains an inorganic filler. By containing an inorganic filler, for example, the viscosity of the film-like resin composition for sealing filling can be easily adjusted, and the cured properties can be controlled.

本発明はまた、上記の封止充てん用フィルム状樹脂組成物により、半導体チップと基板をフリップチップ接続する、半導体パッケージの製造方法を提供する。   The present invention also provides a method for manufacturing a semiconductor package, in which a semiconductor chip and a substrate are flip-chip connected with the film-like resin composition for sealing filling.

本発明はさらに、封止充てん用フィルム状樹脂組成物により、半導体パッケージと基板を接続する、半導体装置の製造方法を提供する。   The present invention further provides a method for manufacturing a semiconductor device in which a semiconductor package and a substrate are connected by a film-like resin composition for sealing filling.

これらの製造方法は、液状封止樹脂を注入する方式による、従来の製造方法に比べ、金属接合が容易であり、接続信頼性に優れる半導体パッケージや半導体装置を得ることができる。   These manufacturing methods can provide a semiconductor package or a semiconductor device that is easier to join metal than the conventional manufacturing method using a method of injecting a liquid sealing resin and has excellent connection reliability.

本発明はまた、上記の封止充てん用フィルム状樹脂組成物で接続された基板を備える半導体装置を提供する。   This invention also provides a semiconductor device provided with the board | substrate connected with said film-form resin composition for sealing filling.

上記封止充てん用フィルム状樹脂組成物で接続された基板を備える半導体装置は、液状封止樹脂を注入する方式により製造された半導体装置に比べ、接続信頼性に格段に優れる。   A semiconductor device provided with a substrate connected with the film-like resin composition for sealing filling is remarkably excellent in connection reliability as compared with a semiconductor device manufactured by a method of injecting a liquid sealing resin.

本発明によれば、良好な保存安定性とフラックス活性を示し、接続信頼性に優れた半導体製品（半導体パーケージや半導体装置等）を製造可能な封止充てん用フィルム状樹脂組成物が提供される。また、この樹脂組成物を用いた、接続信頼性に格段に優れた半導体製品及びその製造方法が提供される。   ADVANTAGE OF THE INVENTION According to this invention, the film-form resin composition for sealing filling which can manufacture semiconductor products (semiconductor package, a semiconductor device, etc.) which show favorable storage stability and flux activity, and was excellent in connection reliability is provided. . In addition, a semiconductor product using the resin composition and having excellent connection reliability and a method for manufacturing the same are provided.

封止充てん用フィルム状樹脂組成物を用いた半導体パッケージの一実施形態を示す断面図である。It is sectional drawing which shows one Embodiment of the semiconductor package using the film-form resin composition for sealing filling. 封止充てん用フィルム状樹脂組成物を用いた半導体装置の一実施形態を示す断面図である。It is sectional drawing which shows one Embodiment of the semiconductor device using the film-form resin composition for sealing filling. 封止充てん用フィルム状樹脂組成物を用いた半導体パッケージの製造方法の一実施形態を示す断面図である。It is sectional drawing which shows one Embodiment of the manufacturing method of the semiconductor package using the film-form resin composition for sealing filling.

符号の説明Explanation of symbols

１…はんだボール、２…電極パッド、３，１９…バンプ、４，１１，１４…配線、５，１８…半導体チップ、６，１２，１６…封止充てん用フィルム状樹脂組成物、７，１５…基板、８…マザーボード、９…内層配線、１０…ビア、１３…スルーホール、１７…接続ヘッド、２０…ステージ、１００・・・半導体パッケージ、２００・・・半導体装置。   DESCRIPTION OF SYMBOLS 1 ... Solder ball, 2 ... Electrode pad, 3, 19 ... Bump, 4, 11, 14 ... Wiring, 5, 18 ... Semiconductor chip, 6, 12, 16 ... Film-like resin composition for sealing filling, 7, 15 DESCRIPTION OF SYMBOLS ... Board | substrate, 8 ... Mother board, 9 ... Inner layer wiring, 10 ... Via, 13 ... Through hole, 17 ... Connection head, 20 ... Stage, 100 ... Semiconductor package, 200 ... Semiconductor device.

以下、本発明をその好適な実施形態に即して、詳細に説明する。   Hereinafter, the present invention will be described in detail with reference to preferred embodiments thereof.

本発明の封止充てん用フィルム状樹脂組成物は、（ａ）熱可塑性樹脂、（ｂ）エポキシ樹脂、（ｃ）硬化剤及び（ｄ）２個以上のフェノール性水酸基を有する化合物を含有するものである。以下、各成分について説明する。   The film-like resin composition for sealing filling of the present invention contains (a) a thermoplastic resin, (b) an epoxy resin, (c) a curing agent, and (d) a compound having two or more phenolic hydroxyl groups. It is. Hereinafter, each component will be described.

（ａ）熱可塑性樹脂
本発明で用いる（ａ）熱可塑性樹脂は、封止充てん用フィルム状樹脂組成物の保管温度（２５℃以下）で固形であり、少なくとも封止充てん用フィルム状樹脂組成物の適用温度（１００℃以上）で溶融状態となる樹脂である。(A) Thermoplastic Resin The (a) thermoplastic resin used in the present invention is solid at the storage temperature (25 ° C. or lower) of the film-like resin composition for sealing filling, and at least the film-like resin composition for sealing filling. This resin is in a molten state at an applied temperature (100 ° C. or higher).

（ａ）熱可塑性樹脂としては、フェノキシ樹脂、ポリイミド樹脂、ポリアミド樹脂、ポリカルボジイミド樹脂、シアネートエステル樹脂、アクリル樹脂、ポリエステル樹脂、ポリエチレン樹脂、ポリエーテルスルホン樹脂、ポリエーテルイミド樹脂、ポリビニルアセタール樹脂、ウレタン樹脂、アクリルゴム等が挙げられ、その中でも耐熱性及びフィルム形成性に優れるフェノキシ樹脂、ポリイミド樹脂、シアネートエステル樹脂、ポリカルボジイミド樹脂等が好ましく、フェノキシ樹脂、ポリイミド樹脂がより好ましい。特に好ましいのは、分子内にフルオレン骨格を有するフェノキシ樹脂である。このようなフェノキシ樹脂はガラス転移点温度が約９０℃であり、フルオレン骨格を有しない他のフェノキシ樹脂（約６０℃）より高いため、フィルム状封止用樹脂組成物とした場合、ガラス転移点温度が向上し、耐熱性の向上が可能となる。   (A) Thermoplastic resins include phenoxy resin, polyimide resin, polyamide resin, polycarbodiimide resin, cyanate ester resin, acrylic resin, polyester resin, polyethylene resin, polyethersulfone resin, polyetherimide resin, polyvinyl acetal resin, urethane Examples thereof include resins and acrylic rubbers, and among them, phenoxy resins, polyimide resins, cyanate ester resins, polycarbodiimide resins and the like that are excellent in heat resistance and film formability are preferable, and phenoxy resins and polyimide resins are more preferable. Particularly preferred is a phenoxy resin having a fluorene skeleton in the molecule. Such a phenoxy resin has a glass transition temperature of about 90 ° C., which is higher than other phenoxy resins not having a fluorene skeleton (about 60 ° C.). The temperature is improved and the heat resistance can be improved.

（ａ）熱可塑性樹脂の重量平均分子量は、５０００より大きいことが好ましいが、より好ましくは１００００以上であり、さらに好ましくは２００００以上である。５０００以下の場合にはフィルム形成能が低下する場合がある。なお、重量平均分子量はＧＰＣ（Ｇｅｌ Ｐｅｒｍｅａｔｉｏｎ Ｃｈｒｏｍａｔｏｇｒａｐｈｙ）を用いて、ポリスチレン換算で測定した値である。また、これらの熱可塑性樹脂は単独又は２種以上の混合体や共重合体として使用することもできる。   (A) The weight average molecular weight of the thermoplastic resin is preferably greater than 5000, more preferably 10,000 or more, and even more preferably 20,000 or more. If it is 5000 or less, the film-forming ability may decrease. The weight average molecular weight is a value measured in terms of polystyrene using GPC (Gel Permeation Chromatography). Moreover, these thermoplastic resins can be used alone or as a mixture or copolymer of two or more.

（ｂ）エポキシ樹脂
本発明において用いる（ｂ）エポキシ樹脂は、エポキシ基（オキシラン環）を２以上有する（２官能以上）の化合物である。(B) Epoxy Resin The (b) epoxy resin used in the present invention is a compound (two or more functional) having two or more epoxy groups (oxirane rings).

（ｂ）エポキシ樹脂としては、例えばビスフェノールＡ型エポキシ樹脂、ビスフェノールＦ型エポキシ樹脂、ビスフェノールＳ型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビフェニル型エポキシ樹脂、ハイドロキノン型エポキシ樹脂、ジフェニルスルフィド骨格含有エポキシ樹脂、フェノールアラルキル型多官能エポキシ樹脂、ナフタレン骨格含有多官能エポキシ樹脂、ジシクロペンタジエン骨格含有多官能エポキシ樹脂、トリフェニルメタン骨格含有多官能エポキシ樹脂、アミノフェノール型エポキシ樹脂、ジアミノジフェニルメタン型エポキシ樹脂、その他各種多官能エポキシ樹脂などを用いることができる。   (B) Examples of the epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, biphenyl type epoxy resin, hydroquinone type epoxy resin, diphenyl Sulfide skeleton-containing epoxy resin, phenol aralkyl-type polyfunctional epoxy resin, naphthalene skeleton-containing polyfunctional epoxy resin, dicyclopentadiene skeleton-containing polyfunctional epoxy resin, triphenylmethane skeleton-containing polyfunctional epoxy resin, aminophenol-type epoxy resin, diaminodiphenylmethane Type epoxy resin and other various polyfunctional epoxy resins can be used.

これらの中でも、低粘度化、低吸水率、高耐熱性の観点から、ビスフェノールＡ型エポキシ樹脂、ビスフェノールＦ型エポキシ樹脂、ナフタレン骨格含有多官能エポキシ樹脂、ジシクロペンタジエン骨格含有多官能エポキシ樹脂、トリフェニルメタン骨格含有多官能エポキシ樹脂などを用いることが好ましい。また、これらのエポキシ樹脂の性状としては、２５℃で液状でも固形でも構わないが、固形のエポキシ樹脂では、例えば、はんだを加熱溶融させて接続する場合、その融点又は軟化点がはんだの融点よりも低いものを用いることが好ましい。また、これらのエポキシ樹脂は単独又は２種以上を混合して用いてもよい。   Among these, from the viewpoint of low viscosity, low water absorption, and high heat resistance, bisphenol A type epoxy resin, bisphenol F type epoxy resin, naphthalene skeleton-containing polyfunctional epoxy resin, dicyclopentadiene skeleton-containing polyfunctional epoxy resin, tri It is preferable to use a polyfunctional epoxy resin containing a phenylmethane skeleton. In addition, the properties of these epoxy resins may be liquid or solid at 25 ° C. However, in the case of solid epoxy resins, for example, when solder is melted and connected, its melting point or softening point is higher than the melting point of the solder. It is preferable to use a low one. Moreover, you may use these epoxy resins individually or in mixture of 2 or more types.

なお、本発明の封止充てん用フィルム状樹脂組成物が適用される半導体製品（半導体パーケージや半導体装置等）に用いられるはんだは、含鉛はんだであっても、鉛フリーはんだ（例えば、ＳｎＡｇＣｕ系、ＳｎＺｎＢｉ系、ＳｎＣｕ系）でもよい。また、低融点はんだ（融点：１２０〜１５０℃程度）でも、高融点はんだ（融点：１８０〜３００℃程度）でもよい。   In addition, even if the solder used for the semiconductor product (semiconductor package, semiconductor device, etc.) to which the film-like resin composition for sealing filling of the present invention is applied is a lead-containing solder, a lead-free solder (for example, SnAgCu type) , SnZnBi-based, SnCu-based). Further, it may be a low melting point solder (melting point: about 120 to 150 ° C.) or a high melting point solder (melting point: about 180 to 300 ° C.).

（ｃ）硬化剤
本発明において使用する（ｃ）硬化剤は、（ｂ）エポキシ樹脂を硬化する硬化剤を意味し、（ｂ）エポキシ樹脂以外の成分（例えば、２個以上のフェノール性水酸基を有する化合物）の硬化反応をも生じるものであってもよい。(C) Curing agent The (c) curing agent used in the present invention means (b) a curing agent that cures the epoxy resin, and (b) a component other than the epoxy resin (for example, two or more phenolic hydroxyl groups). A compound having a curing reaction).

（ｃ）硬化剤としては、イミダゾール化合物、酸無水物類、アミン類、ヒドラジド類、ポリメルカプタン類、ルイス酸-アミン錯体などを用いることができる。その中でも、保存安定性と硬化物の耐熱性に優れるイミダゾール化合物が望ましい。硬化剤がイミダゾール化合物の場合、例えば、２ＭＺ、Ｃ１１Ｚ、２ＰＺ、２Ｅ４ＭＺ、２Ｐ４ＭＺ、１Ｂ２ＭＺ、１Ｂ２ＰＺ、２ＭＺ−ＣＮ、２Ｅ４ＭＺ−ＣＮ、２ＰＺ−ＣＮ、Ｃ１１Ｚ−ＣＮ、２ＰＺ−ＣＮＳ、Ｃ１１Ｚ−ＣＮＳ、２ＭＺ−Ａ、Ｃ１１Ｚ−Ａ、２Ｅ４ＭＺ−Ａ、２Ｐ４ＭＨＺ、２ＰＨＺ、２ＭＡ−ＯＫ、２ＰＺ−ＯＫ(四国化成工業株式会社製、製品名)などや、これらのイミダゾール化合物をエポキシ樹脂と付加させた化合物が挙げられる。また、これら硬化剤をポリウレタン系、ポリエステル系の高分子物質等で被覆してマイクロカプセル化したものは可使時間が延長されるために好ましい。これらは単独又は２種以上を混合して使用することもできる。   (C) As the curing agent, imidazole compounds, acid anhydrides, amines, hydrazides, polymercaptans, Lewis acid-amine complexes and the like can be used. Among these, an imidazole compound excellent in storage stability and heat resistance of a cured product is desirable. When the curing agent is an imidazole compound, for example, 2MZ, C11Z, 2PZ, 2E4MZ, 2P4MZ, 1B2MZ, 1B2PZ, 2MZ-CN, 2E4MZ-CN, 2PZ-CN, C11Z-CN, 2PZ-CNS, C11Z-CNS, 2MZ- A, C11Z-A, 2E4MZ-A, 2P4MHZ, 2PHZ, 2MA-OK, 2PZ-OK (manufactured by Shikoku Kasei Kogyo Co., Ltd., product name), and compounds obtained by adding these imidazole compounds to an epoxy resin are included. . In addition, those encapsulating these curing agents with a polyurethane-based or polyester-based polymer substance and making them into microcapsules are preferable because the pot life is extended. These may be used alone or in admixture of two or more.

（ｄ）２個以上のフェノール性水酸基を有する化合物
本発明において用いる（ｄ）２個以上（１分子当り２個以上を意味する）のフェノール性水酸基を有する化合物は、フェノール性水酸基、すなわちベンゼン環に結合した水酸基を２個以上有する化合物である。すなわち、（ｄ）２個以上のフェノール性水酸基を有する化合物は、ベンゼン環を少なくとも１つ有し、ベンゼン環（縮合環を形成していてもよい）に結合する水酸基を少なくとも２つ有する化合物である。(D) Compound having two or more phenolic hydroxyl groups (d) The compound having two or more (meaning two or more per molecule) phenolic hydroxyl groups used in the present invention is a phenolic hydroxyl group, that is, a benzene ring. Is a compound having two or more hydroxyl groups bonded to. That is, (d) a compound having two or more phenolic hydroxyl groups is a compound having at least one benzene ring and having at least two hydroxyl groups bonded to a benzene ring (which may form a condensed ring). is there.

このような化合物としては、例えば、カテコール、レゾルシノール、ハイドロキノン、ビフェノール、ジヒドロキシナフタレン、ヒドロキシハイドロキノン、ピロガロール、メチリデンビフェノール（ビスフェノールＦ）、イソプロピリデンビフェノール（ビスフェノールＡ）、エチリデンビフェノール（ビスフェノールＡＤ）、１，１，１−トリス（４−ヒドロキシフェニル）エタン、トリヒドロキシベンゾフェノン、トリヒドロキシアセトフェノン、ポリｐ−ビニルフェノール、トリフェノールメタン骨格含有多官能フェノール化合物などが挙げられる。   Examples of such compounds include catechol, resorcinol, hydroquinone, biphenol, dihydroxynaphthalene, hydroxyhydroquinone, pyrogallol, methylidene biphenol (bisphenol F), isopropylidene biphenol (bisphenol A), ethylidene biphenol (bisphenol AD), 1, Examples thereof include 1,1-tris (4-hydroxyphenyl) ethane, trihydroxybenzophenone, trihydroxyacetophenone, poly p-vinylphenol, a polyfunctional phenol compound containing a triphenolmethane skeleton.

さらに、２個以上のフェノール性水酸基を有する化合物として、フェノール性水酸基を１個以上有する化合物と、ハロメチル基、アルコキシメチル基又はヒドロキシルメチル基を２個有する芳香族化合物、ジビニルベンゼン及びアルデヒド化合物から選ばれる少なくとも１種類以上の化合物との重縮合物も用いることができる。   Further, the compound having two or more phenolic hydroxyl groups is selected from a compound having one or more phenolic hydroxyl groups, an aromatic compound having two halomethyl groups, alkoxymethyl groups or hydroxylmethyl groups, divinylbenzene, and an aldehyde compound. A polycondensate with at least one kind of compound can also be used.

フェノール性水酸基を１個以上有する化合物としては、例えば、フェノール、アルキルフェノール、ナフトール、クレゾール、カテコール、レゾルシノール、ハイドロキノン、ビフェノール、ジヒドロキシナフタレン、ヒドロキシハイドロキノン、ピロガロール、メチリデンビフェノール（ビスフェノールＦ）、イソプロピリデンビフェノール（ビスフェノールＡ）、エチリデンビフェノール（ビスフェノールＡＤ）、１，１，１−トリス（４−ヒドロキシフェニル）エタン、トリヒドロキシベンゾフェノン、トリヒドロキシアセトフェノン、ポリｐ−ビニルフェノールなどが挙げられる。   Examples of the compound having at least one phenolic hydroxyl group include phenol, alkylphenol, naphthol, cresol, catechol, resorcinol, hydroquinone, biphenol, dihydroxynaphthalene, hydroxyhydroquinone, pyrogallol, methylidene biphenol (bisphenol F), isopropylidene biphenol ( Bisphenol A), ethylidenebiphenol (bisphenol AD), 1,1,1-tris (4-hydroxyphenyl) ethane, trihydroxybenzophenone, trihydroxyacetophenone, poly p-vinylphenol and the like.

ハロメチル基、アルコキシメチル基又はヒドロキシルメチル基を２個有する芳香族化合物としては、例えば、１，２−ビス（クロロメチル）ベンゼン、１，３−ビス（クロロメチル）ベンゼン、１，４−ビス（クロロメチル）ベンゼン、１，２−ビス（メトキシメチル）ベンゼン、１，３−ビス（メトキシメチル）ベンゼン、１，４−ビス（メトキシメチル）ベンゼン、１，２−ビス（ヒドロキシメチル）ベンゼン、１，３−ビス（ヒドロキシメチル）ベンゼン、１，４−ビス（ヒドロキシメチル）ベンゼン、ビス（クロロメチル）ビフェニル、ビス（メトキシメチル）ビフェニルなどが挙げられる。ハロメチル基、アルコキシメチル基又はヒドロキシルメチル基を２個有する芳香族化合物及びジビニルベンゼンは、いずれをフェノール性水酸基を１個以上有する化合物と反応させても、２個以上のフェノール性水酸基を有する化合物になり、フラックス活性向上という同様の効果を発現することが可能である。   Examples of the aromatic compound having two halomethyl groups, alkoxymethyl groups or hydroxylmethyl groups include 1,2-bis (chloromethyl) benzene, 1,3-bis (chloromethyl) benzene, and 1,4-bis ( Chloromethyl) benzene, 1,2-bis (methoxymethyl) benzene, 1,3-bis (methoxymethyl) benzene, 1,4-bis (methoxymethyl) benzene, 1,2-bis (hydroxymethyl) benzene, 1 , 3-bis (hydroxymethyl) benzene, 1,4-bis (hydroxymethyl) benzene, bis (chloromethyl) biphenyl, bis (methoxymethyl) biphenyl, and the like. An aromatic compound having two halomethyl groups, an alkoxymethyl group or two hydroxylmethyl groups and divinylbenzene can be reacted with a compound having one or more phenolic hydroxyl groups to form a compound having two or more phenolic hydroxyl groups. Thus, the same effect of improving flux activity can be expressed.

アルデヒド化合物としては、ホルムアルデヒド（その水溶液としてホルマリン）、パラホルムアルデヒド、トリオキサン、ヘキサメチレンテトラミンなどが挙げられる。   Examples of the aldehyde compound include formaldehyde (formalin as an aqueous solution thereof), paraformaldehyde, trioxane, hexamethylenetetramine and the like.

上記の重縮合物としては、例えば、フェノールとホルムアルデヒドの重縮合物であるフェノールノボラック樹脂、クレゾールとホルムアルデヒドとの重縮合物であるクレゾールノボラック樹脂、ナフトール類とホルムアルデヒドとの重縮合物であるナフトールノボラック樹脂、フェノールと１，４−ビス（メトキシメチル）ベンゼンとの重縮合物であるフェノールアラルキル樹脂、ビスフェノールＡとホルムアルデヒドの重縮合物、フェノールとジビニルベンゼンとの重縮合物、クレゾールとナフトールとホルムアルデヒドの重縮合物などが挙げられ、これらの重縮合物をゴム変性したものや分子骨格内にアミノトリアジン骨格やジシクロペンタジエン骨格を導入したものでもよい。   Examples of the polycondensate include a phenol novolac resin that is a polycondensate of phenol and formaldehyde, a cresol novolac resin that is a polycondensate of cresol and formaldehyde, and a naphthol novolac that is a polycondensate of naphthols and formaldehyde. Resin, phenol aralkyl resin which is a polycondensation product of phenol and 1,4-bis (methoxymethyl) benzene, polycondensation product of bisphenol A and formaldehyde, polycondensation product of phenol and divinylbenzene, cresol, naphthol and formaldehyde Examples thereof include polycondensates, and those obtained by rubber modification of these polycondensates or those obtained by introducing an aminotriazine skeleton or dicyclopentadiene skeleton into the molecular skeleton may be used.

また、これらの化合物の性状としては、室温において固体状でも液状でも構わないが、金属表面の酸化膜を均一に還元除去し、はんだの濡れ性を阻害しないために、液状のものを用いることが好ましく、例えば、これらのフェノール性水酸基を有する化合物をアリル化することによって液状にしたものとして、アリル化フェノールノボラック樹脂、ジアリルビスフェノールＡ、ジアリルビスフェノールＦ、ジアリルビフェノールなどが挙げられる。これらの化合物は単独で用いてもよいし、２種以上を組み合わせて用いてもよい。   The properties of these compounds may be either solid or liquid at room temperature, but in order to uniformly reduce and remove the oxide film on the metal surface and not hinder the wettability of the solder, it is necessary to use a liquid one. Preferably, for example, allylated phenol novolac resin, diallyl bisphenol A, diallyl bisphenol F, diallyl biphenol and the like are exemplified as those obtained by allylating these compounds having a phenolic hydroxyl group. These compounds may be used alone or in combination of two or more.

さらに、例えば、はんだを加熱溶融させて接続する場合、フラックス活性を付与するために添加する化合物が、加熱時に分解、揮発せずに接着剤（封止充てん用フィルム状樹脂組成物）中に残っている必要がある。すなわち、フラックス活性を付与するために添加する化合物のＴＧＡ（Ｔｈｅｒｍａｌ Ｇｒａｖｉｍｅｔｏｒｙ Ａｎａｌｙｓｉｓ）法によって測定される熱重量変化率が０％となる（残存重量が０となる）最低温度が、はんだの溶融温度より高いことが好ましい。また、フラックス活性を付与するために添加する化合物として常温で固体状のものを用いる場合、化合物の溶融温度がはんだの溶融温度より低いもの、すなわち、はんだ表面の酸化膜を均一に除去するために、はんだの溶融温度において、化合物が液体状態又は溶融状態で存在するなど、流動性を有することが好ましい。   Furthermore, for example, when solder is connected by heating and melting, the compound added to impart flux activity remains in the adhesive (film-like resin composition for sealing filling) without being decomposed or volatilized during heating. Need to be. That is, the minimum temperature at which the thermogravimetric change rate measured by the TGA (Thermal Gravity Analysis) method of the compound added to impart flux activity is 0% (the remaining weight is 0) is lower than the melting temperature of the solder. High is preferred. In addition, when a compound that is solid at room temperature is used as a compound to be added to impart flux activity, in order to uniformly remove the oxide film on the solder surface, that is, a compound whose melting temperature is lower than the melting temperature of the solder It is preferable that the compound has fluidity such that the compound exists in a liquid state or a molten state at the melting temperature of the solder.

なお、本発明におけるフラックス活性とは、金属表面の酸化膜を還元除去して、金属が容易に溶融できるようにし、溶融した金属が濡れ広がるのを阻害せず、金属接合部が形成される状態を達成できる性能を意味し、例えば、はんだボールを銅板上などで加熱溶融させて接続する場合、はんだボールが初期径よりも大きくなって銅表面に濡れ広がり、溶融後のはんだボールをシェア試験した際に、はんだと銅の界面で破断するのではなく、はんだボールのバルク破壊となる状態を達成できることを意味している。   The flux activity in the present invention refers to a state in which the metal film is formed by reducing and removing the oxide film on the metal surface so that the metal can be easily melted and the molten metal is not hindered from spreading. For example, when solder balls are heated and melted on a copper plate, etc., the solder balls become larger than the initial diameter and spread on the copper surface. In this case, it means that it is possible to achieve a state in which the solder ball is not broken at the interface between the solder and the copper but becomes a bulk breakage of the solder ball.

また、溶融後のはんだボールの初期径に対する変化率を、後述するはんだ濡れ広がり率として定義すると、良好なフラックス活性を実現するには、はんだ濡れ広がり率が２０％以上となることが好ましく、３０％以上となることがより好ましく、４０％以上となることがさらに好ましい。   Further, when the rate of change with respect to the initial diameter of the solder ball after melting is defined as a solder wet spread rate described later, the solder wet spread rate is preferably 20% or more in order to achieve good flux activity. % Or more is more preferable, and 40% or more is more preferable.

（ａ）熱可塑性樹脂の配合量は、（ａ）熱可塑性樹脂及び（ｂ）エポキシ樹脂の総量１００重量部に対して、５〜５０重量部とすることが好ましく、５〜４０重量部とすることがより好ましく、１０〜３５重量部とすることが特に好ましい。この配合量が５重量部未満ではフィルム形成が困難となる傾向があり、５０重量部を超えると粘度が高くなって接続不良が発生する恐れがある。   The blending amount of the (a) thermoplastic resin is preferably 5 to 50 parts by weight, preferably 5 to 40 parts by weight with respect to 100 parts by weight of the total amount of the (a) thermoplastic resin and (b) the epoxy resin. It is more preferable that the content be 10 to 35 parts by weight. If the blending amount is less than 5 parts by weight, film formation tends to be difficult, and if it exceeds 50 parts by weight, the viscosity becomes high and connection failure may occur.

（ｂ）エポキシ樹脂の配合量は、（ａ）熱可塑性樹脂及び（ｂ）エポキシ樹脂の総量１００重量部に対して、１０〜９０重量部とすることが好ましく、１５〜９０重量部とすることがより好ましい、さらに好ましくは２０〜８０重量部である。この配合量が１０重量部未満では硬化物の耐熱性が低下する傾向があり、９０重量部を超えるとフィルム形成性が低下する恐れがある。   The blending amount of the (b) epoxy resin is preferably 10 to 90 parts by weight and preferably 15 to 90 parts by weight with respect to 100 parts by weight of the total amount of the (a) thermoplastic resin and (b) the epoxy resin. Is more preferably 20 to 80 parts by weight. If the blending amount is less than 10 parts by weight, the heat resistance of the cured product tends to decrease, and if it exceeds 90 parts by weight, the film formability may decrease.

（ｃ）硬化剤の配合量は、硬化剤の種類によって異なるが、一般には、（ｂ）エポキシ樹脂１００重量部に対して０．０５〜３０重量部である。硬化剤がイミダゾール化合物の場合には、（ｂ）エポキシ樹脂１００重量部に対して０．１〜２０重量部とすることが好ましく、１〜１０重量部とすることがより好ましい。この配合量が０．１重量部未満では、硬化が不充分となる。また２０重量部より多いと硬化物の耐熱性が低下する場合がある。   (C) Although the compounding quantity of a hardening | curing agent changes with kinds of hardening | curing agent, generally it is 0.05-30 weight part with respect to 100 weight part of (b) epoxy resins. When a hardening | curing agent is an imidazole compound, it is preferable to set it as 0.1-20 weight part with respect to 100 weight part of (b) epoxy resins, and it is more preferable to set it as 1-10 weight part. If this amount is less than 0.1 parts by weight, curing will be insufficient. On the other hand, if it exceeds 20 parts by weight, the heat resistance of the cured product may be lowered.

（ｄ）２個以上のフェノール性水酸基を有する化合物の配合量は、（ａ）熱可塑性樹脂及び（ｂ）エポキシ樹脂の総量１００重量部に対して、０．５〜２０重量部が好ましく、１〜１５重量部がより好ましい。この配合量が０．５重量部未満では、フラックス活性が不充分となる場合があり、２０重量部を超えると、エポキシ樹脂単独の硬化系ではなく、エポキシ樹脂とフェノール類との硬化系になるため（硬化物のネットワークにフェノール類が組み込まれる）、使用するフェノール性水酸基を有する化合物によっては、エポキシ樹脂の特性が充分に発現せず、硬化物の耐熱性が低下する恐れがある。   (D) The compounding amount of the compound having two or more phenolic hydroxyl groups is preferably 0.5 to 20 parts by weight with respect to 100 parts by weight of the total amount of (a) thermoplastic resin and (b) epoxy resin. More preferred is ˜15 parts by weight. If the blending amount is less than 0.5 parts by weight, the flux activity may be insufficient, and if it exceeds 20 parts by weight, it is not a curing system of an epoxy resin alone but a curing system of an epoxy resin and phenols. Therefore, depending on the compound having a phenolic hydroxyl group to be used (the phenol is incorporated in the network of the cured product), the properties of the epoxy resin are not sufficiently exhibited, and the heat resistance of the cured product may be reduced.

なお、（ｄ）２個以上のフェノール性水酸基を有する化合物の種類及び最適配合量は、フラックス活性の有無だけでなく、フィルム形成性、フィルム製造時の作業性（ワニスの粘度変化など）、フィルムの取扱性（タック性、打ち抜きやスリットなどの加工性など）などを考慮して設定される。   In addition, (d) The kind and the optimal compounding quantity of the compound which has 2 or more phenolic hydroxyl groups are not only the presence or absence of a flux activity, but film formability, workability | operativity at the time of film manufacture (viscosity viscosity change etc.), film It is set in consideration of the ease of handling (tackiness, workability such as punching and slitting).

本発明の封止充てん用フィルム状樹脂組成物には、無機フィラーを含有させることも好ましい。無機フィラーを含有させることにより、例えば、封止充てん用フィルム状樹脂組成物の粘度の調整が容易となり、硬化物性の制御も可能となる。また、半導体チップと基板を接続する際のボイド発生や吸湿率抑制も可能となる。   It is also preferable to contain an inorganic filler in the film-like resin composition for sealing filling of the present invention. By containing an inorganic filler, for example, the viscosity of the film-like resin composition for sealing filling can be easily adjusted, and the cured properties can be controlled. In addition, it is possible to generate voids and suppress moisture absorption when connecting the semiconductor chip and the substrate.

無機フィラーとしては、特に限定されないが、例えば、ガラス、二酸化ケイ素（シリカ）、酸化アルミニウム（アルミナ）、酸化チタン（チタニア）、酸化マグネシウム（マグネシア）、カーボンブラック、マイカ、硫酸バリウムなどが挙げられる。これらは単独又は２種以上を混合して使用してもよい。また、２種類以上の金属酸化物を含む複合酸化物（２種類以上の金属酸化物が単に混合されてなるものではなく、金属酸化物同士が化学的に結合して分離不能な状態となっているもの）であってもよく、例えば、二酸化ケイ素と酸化チタン、二酸化ケイ素と酸化アルミニウム、酸化ホウ素と酸化アルミニウム、二酸化ケイ素と酸化アルミニウムと酸化マグネシウムなどからなる複合酸化物が挙げられる。また、フィラーの粒径は、フリップチップ接続時にフィラーが接続部に捕捉されて電気的な接続を阻害することを防止するため、平均粒径は１０μｍ以下であることが好ましい。さらに、粘度や硬化物の物性を調整するために、粒径の異なるものを２種以上組み合わせて用いてもよい。   Although it does not specifically limit as an inorganic filler, For example, glass, silicon dioxide (silica), aluminum oxide (alumina), titanium oxide (titania), magnesium oxide (magnesia), carbon black, mica, barium sulfate etc. are mentioned. You may use these individually or in mixture of 2 or more types. In addition, a composite oxide containing two or more types of metal oxides (not just a mixture of two or more types of metal oxides, but the metal oxides are chemically bonded to each other and cannot be separated) For example, a composite oxide composed of silicon dioxide and titanium oxide, silicon dioxide and aluminum oxide, boron oxide and aluminum oxide, silicon dioxide, aluminum oxide and magnesium oxide, and the like can be given. In addition, the average particle size of the filler is preferably 10 μm or less in order to prevent the filler from being captured by the connection portion during the flip chip connection and inhibiting electrical connection. Furthermore, in order to adjust the viscosity and the physical properties of the cured product, two or more types having different particle sizes may be used in combination.

本発明におけるフィラーの配合量は、（ａ）熱可塑性樹脂及び（ｂ）エポキシ樹脂の総量１００重量部に対して、２００重量部以下とすることが好ましく、１５０重量部以下とすることがより好ましい。この配合量が２００重量部より多いと、接着剤の粘度が高くなり、接続不良が起きる恐れがあり、また、フィルムの可とう性が低下して脆くなる傾向がある。   The blending amount of the filler in the present invention is preferably 200 parts by weight or less, more preferably 150 parts by weight or less with respect to 100 parts by weight of the total amount of (a) thermoplastic resin and (b) epoxy resin. . When the blending amount is more than 200 parts by weight, the viscosity of the adhesive is increased and connection failure may occur, and the flexibility of the film tends to decrease and become brittle.

また、無機フィラーを含有している場合、無機フィラーと樹脂の屈折率をほぼ同一にすることによって、波長５５５ｎｍの光に対して、少なくとも１０％以上の透過率を達成できる。このような透過率を有することにより、封止充てん用フィルム状樹脂組成物を基板又は半導体チップに貼り付けた後、個片化する方法において、個片化する位置や基板と半導体チップの位置合わせを行うための位置合わせマークを封止充てん用フィルム状樹脂組成物を通して認識することが容易になる。   Moreover, when the inorganic filler is contained, the transmittance of at least 10% or more can be achieved with respect to light having a wavelength of 555 nm by making the refractive indexes of the inorganic filler and the resin substantially the same. By having such a transmittance, after the film-like resin composition for sealing filling is attached to a substrate or a semiconductor chip, in the method of dividing into pieces, the position of dividing into pieces and the alignment of the substrate and the semiconductor chip It becomes easy to recognize the alignment mark for performing through the film-like resin composition for sealing filling.

樹脂としてエポキシ樹脂を用いる場合、無機フィラーの屈折率はエポキシ樹脂の屈折率約１．６に対して、１．５３〜１．６５であることが好ましい。このような屈折率を示す無機フィラーとしては、硫酸バリウム、酸化マグネシウム、二酸化ケイ素と酸化チタンからなる複合酸化物、二酸化ケイ素と酸化アルミニウムからなる複合酸化物、酸化ホウ素と酸化アルミニウムからなる複合酸化物、二酸化ケイ素と酸化アルミニウムと酸化マグネシウムからなる複合酸化物などが挙げられる。   When using an epoxy resin as resin, it is preferable that the refractive index of an inorganic filler is 1.53-1.65 with respect to the refractive index of about 1.6 of an epoxy resin. Examples of the inorganic filler exhibiting such a refractive index include barium sulfate, magnesium oxide, composite oxide composed of silicon dioxide and titanium oxide, composite oxide composed of silicon dioxide and aluminum oxide, and composite oxide composed of boron oxide and aluminum oxide. And composite oxides composed of silicon dioxide, aluminum oxide, and magnesium oxide.

なお、本発明の封止充てん用フィルム状樹脂組成物を用いて、半導体チップと基板を接続する場合、個片に切り出した封止充てん用フィルム状樹脂組成物を基板に貼り付けてもよいし、半導体チップのバンプが形成された面に貼り付けてもよい。また、基板を個片化する前に、複数の基板がつながった状態において、基板全体に封止充てん用フィルム状樹脂組成物を貼り付け、半導体チップを接続した後、個片化してもよい。また、半導体チップに個片化する前の半導体ウエハに封止充てん用フィルム状樹脂組成物を貼り付け、ダイシングによって半導体チップに個片化してもよい。   In addition, when connecting a semiconductor chip and a board | substrate using the film-like resin composition for sealing filling of this invention, you may affix the film-like resin composition for sealing filling cut out to the board | substrate to a board | substrate. Alternatively, it may be attached to the surface of the semiconductor chip where the bumps are formed. In addition, before the substrate is separated into pieces, in a state where a plurality of substrates are connected, the film-like resin composition for sealing and filling may be attached to the entire substrate, and the semiconductor chips may be connected and then separated into pieces. Moreover, the film-like resin composition for sealing filling may be affixed to the semiconductor wafer before being separated into semiconductor chips, and the semiconductor chips may be separated into pieces by dicing.

さらに、本発明の封止充てん用フィルム状樹脂組成物には、硬化促進剤、シランカップリング剤、チタンカップリング剤、酸化防止剤、レベリング剤、イオントラップ剤などの添加剤を配合してもよい。これらは単独で用いてもよいし、２種以上を組み合わせてもよい。配合量については、各添加剤の効果が発現するように調整すればよい。   Furthermore, the film-like resin composition for sealing filling of the present invention may contain additives such as a curing accelerator, a silane coupling agent, a titanium coupling agent, an antioxidant, a leveling agent, and an ion trapping agent. Good. These may be used alone or in combination of two or more. What is necessary is just to adjust about a compounding quantity so that the effect of each additive may express.

本発明の封止充てん用フィルム状樹脂組成物の粘度は、１５０℃において５０Ｐａ・s以下であることが好ましく、より好ましくは４０Ｐａ・ｓ以下であり、さらに好ましくは３０Ｐａ・ｓ以下である。粘度が５０Ｐａ・ｓより高いと、接続不良が発生する場合がある。粘度の測定方法は、ずり粘弾性測定装置（例えば、ティーエーインスツルメント株式会社製 ＡＲＥＳ）を用いて、直径８〜２５ｍｍの平行円板間にフィルムを挟んで、所定の温度において、周波数１〜１０Ｈｚの条件下で測定可能であり、測定は全自動で行われる。   The viscosity of the film-like resin composition for sealing filling of the present invention is preferably 50 Pa · s or less at 150 ° C., more preferably 40 Pa · s or less, and further preferably 30 Pa · s or less. If the viscosity is higher than 50 Pa · s, connection failure may occur. The viscosity is measured using a shear viscoelasticity measuring device (for example, ARES manufactured by TA Instruments Co., Ltd.), with a film sandwiched between parallel disks having a diameter of 8 to 25 mm, and a frequency of 1 at a predetermined temperature. Measurement is possible under the condition of 10 Hz, and the measurement is performed fully automatically.

また、円形に打ち抜いた封止充てん用フィルム状樹脂組成物をガラス板間に挟み、所定の温度において、所定の圧力で所定の時間加圧した際の加圧前後の樹脂厚みの変化から計算する方法を用いることができる。すなわち、次式（１）（平行板間の１軸圧縮流動に関するヒーリーの式）によって、算出できる。
η＝８πＦｔＺ４Ｚ０ ４／３Ｖ２（Ｚ０ ４−Ｚ４）…（１）
η：粘度（Ｐａ・ｓ）
Ｆ：荷重（Ｎ）
ｔ：加圧時間（ｓ）
Ｚ：加圧後の樹脂厚み（ｍ）
Ｚ０：加圧前の樹脂厚み（ｍ）
Ｖ：樹脂の体積（ｍ３）In addition, the film-like resin composition for sealing filling punched out in a circle is sandwiched between glass plates, and calculated from the change in resin thickness before and after pressurization at a predetermined temperature and at a predetermined pressure for a predetermined time. The method can be used. That is, it is computable by following Formula (1) (Healey's formula regarding the uniaxial compression flow between parallel plates).
η = 8πFtZ 4 Z 0 4 / 3V 2 (Z 0 4 −Z 4 ) (1)
η: Viscosity (Pa · s)
F: Load (N)
t: Pressurization time (s)
Z: Resin thickness after pressurization (m)
Z 0 : resin thickness before pressure (m)
V: Volume of resin (m 3 )

本発明の封止充てん用フィルム状樹脂組成物の２６０℃におけるゲル化時間は、１〜６０ｓであることが好ましく、より好ましくは３〜４０ｓであり、さらに好ましくは５〜３０ｓである。１ｓより短いと、はんだなどが溶融する前に硬化してしまい、接続不良が発生する恐れがあり、６０ｓより長いと生産性が低下したり、硬化が不充分になって信頼性が低下したりする恐れがある。なお、ゲル化時間とは、本発明の封止充てん用フィルム状樹脂組成物を２６０℃に設定した熱板上に置き、スパチュラなどで攪拌し、攪拌不能になるまでの時間をいう。   The gelling time at 260 ° C. of the film-like resin composition for sealing and filling of the present invention is preferably 1 to 60 s, more preferably 3 to 40 s, and further preferably 5 to 30 s. If it is shorter than 1 s, it may be hardened before the solder melts, resulting in poor connection. If it is longer than 60 s, productivity may be lowered, or curing may be insufficient and reliability may be lowered. There is a fear. The gelation time refers to the time until the film-like resin composition for sealing filling of the present invention is placed on a hot plate set at 260 ° C. and stirred with a spatula or the like until stirring becomes impossible.

本発明の封止充てん用フィルム状樹脂組成物は、例えば以下のようにして製造することができる。すなわち、（ａ）熱可塑性樹脂、（ｂ）エポキシ樹脂、（ｃ）硬化剤、（ｄ）２個以上のフェノール性水酸基を有する化合物、無機フィラー及びその他添加剤をトルエン、酢酸エチル、メチルエチルケトンなどの有機溶媒中で混合することによってワニスを作製し、そのワニスを、ナイフコーターやロールコーターを用いて、離型処理が施されたポリエチレンテレフタレート樹脂などのフィルム基材上に塗布した後、有機溶媒を乾燥除去することによって、製造することができる。   The film-like resin composition for sealing and filling of the present invention can be produced, for example, as follows. That is, (a) a thermoplastic resin, (b) an epoxy resin, (c) a curing agent, (d) a compound having two or more phenolic hydroxyl groups, an inorganic filler and other additives such as toluene, ethyl acetate, methyl ethyl ketone, etc. A varnish is prepared by mixing in an organic solvent, and the varnish is applied onto a film substrate such as a polyethylene terephthalate resin subjected to a release treatment using a knife coater or a roll coater. It can be manufactured by removing it by drying.

図１は、本発明の封止充てん用フィルム状樹脂組成物を用いて製造される、半導体パッケージの一実施形態を示す断面図である。図１に示す半導体パッケージ１００は、一方面にバンプ３（はんだバンプ等）を備える半導体チップ５と、一方面に配線４を、他方面にはんだボール１が形成された電極パッド２を備える基板７とが、バンプ３と配線４が電気的に接続されるように、封止充てん用フィルム状樹脂組成物６で接合された構成を有している。半導体パッケージ１００においては、半導体チップ５と基板７との間の間隙及び半導体チップ５の周囲が封止充てん用フィルム状樹脂組成物６により封止又は充てんされている。   FIG. 1: is sectional drawing which shows one Embodiment of the semiconductor package manufactured using the film-form resin composition for sealing filling of this invention. A semiconductor package 100 shown in FIG. 1 includes a semiconductor chip 5 provided with bumps 3 (solder bumps or the like) on one side, a substrate 7 provided with electrode pads 2 formed with wiring 4 on one side and solder balls 1 on the other side. However, it has the structure joined by the film-form resin composition 6 for sealing filling so that the bump 3 and the wiring 4 may be electrically connected. In the semiconductor package 100, the gap between the semiconductor chip 5 and the substrate 7 and the periphery of the semiconductor chip 5 are sealed or filled with the film-like resin composition 6 for sealing and filling.

半導体チップ５としては、特に限定はなく、シリコン、ゲルマニウムなどの元素半導体、ガリウムヒ素、インジウムリンなどの化合物半導体等、各種半導体を用いることができる。   The semiconductor chip 5 is not particularly limited, and various semiconductors such as elemental semiconductors such as silicon and germanium, and compound semiconductors such as gallium arsenide and indium phosphide can be used.

基板７としては、通常の回路基板でもよく、また、半導体チップでもよい。回路基板の場合、ガラスエポキシ、ポリイミド、ポリエステル、セラミックなどの絶縁基板表面に形成された銅などの金属層の不要な個所をエッチング除去して配線パターンが形成されたもの、絶縁基板表面に銅めっきなどによって配線パターンを形成したもの、絶縁基板表面に導電性物質を印刷して配線パターンを形成したものなどを用いることができる。配線パターン（配線４）の表面には、低融点はんだ、高融点はんだ、スズ、インジウム、金、ニッケル、銀、銅、パラジウムなどからなる金属層が形成されていてもよく、この金属層は単一の成分のみで構成されていても、複数の成分から構成されていてもよい。また、複数の金属層が積層された構造をしていてもよい。   The substrate 7 may be a normal circuit board or a semiconductor chip. In the case of a circuit board, an unnecessary part of a metal layer such as copper formed on the surface of an insulating substrate such as glass epoxy, polyimide, polyester, or ceramic is removed by etching to form a wiring pattern, or the surface of the insulating substrate is plated with copper. For example, a wiring pattern formed by printing a conductive material on the surface of an insulating substrate, or the like can be used. A metal layer made of low melting point solder, high melting point solder, tin, indium, gold, nickel, silver, copper, palladium, or the like may be formed on the surface of the wiring pattern (wiring 4). It may be composed of only one component or may be composed of a plurality of components. Moreover, you may have the structure where the some metal layer was laminated | stacked.

バンプ３と呼ばれる導電性突起の材質としては、低融点はんだ、高融点はんだ、スズ、インジウム、金、銀、銅などからなるものが用いられ、単一の成分のみで構成されていても、複数の成分から構成されていてもよい。また、これらの金属が積層された構造をなすように形成されていてもよい。バンプは半導体チップ５に形成されていてもよいし、基板７に形成されていてもよいし、半導体チップ５と基板７の両方に形成されていてもよい。   As the material of the conductive protrusions called the bumps 3, those made of low melting point solder, high melting point solder, tin, indium, gold, silver, copper, etc. are used. You may be comprised from these components. Moreover, you may form so that the structure where these metals were laminated | stacked may be made | formed. The bumps may be formed on the semiconductor chip 5, may be formed on the substrate 7, or may be formed on both the semiconductor chip 5 and the substrate 7.

半導体パッケージとしては、インターポーザーと呼ばれる基板上に半導体チップが搭載され、樹脂封止されたものとして、例えばＣＳＰ（チップサイズパッケージ）やＢＧＡ（ボールグリッドアレイ）などが挙げられる。また、半導体チップの電極部を半導体チップ表面上で再配線することによって、インターポーザーを用いないで基板に搭載可能とした半導体パッケージとして、例えば、ウエハーレベルパッケージと呼ばれるものが挙げられる。半導体パッケージを搭載する基板としては、通常の回路基板でよく、インターポーザーに対して、マザーボードと呼ばれる。   Examples of the semiconductor package include a semiconductor chip mounted on a substrate called an interposer and resin-sealed, such as CSP (chip size package) and BGA (ball grid array). Further, as a semiconductor package that can be mounted on a substrate without using an interposer by rewiring the electrode portion of the semiconductor chip on the surface of the semiconductor chip, for example, a so-called wafer level package can be cited. The substrate on which the semiconductor package is mounted may be a normal circuit board, and is called a mother board for the interposer.

図２は、本発明の封止充てん用フィルム状樹脂組成物を用いて製造される、半導体装置の一実施形態を示す断面図である。図２に示す半導体装置２００は、内層配線９、ビア１０及びスルーホール１３が形成され一方面に配線１１を有するマザーボード８と、半導体パッケージ１００（図１参照）とが、はんだボール１と配線１１が電気的に接続されるように、封止充てん用フィルム状樹脂組成物１２で接合された構成を有している。半導体装置２００においては、基板７とマザーボード８との間の間隙及び半導体パッケージ１００の周囲が封止充てん用フィルム状樹脂組成物１２により封止又は充てんされている。   FIG. 2 is a cross-sectional view showing an embodiment of a semiconductor device manufactured using the film-like resin composition for sealing and filling of the present invention. A semiconductor device 200 shown in FIG. 2 includes an inner layer wiring 9, a via 10 and a through hole 13 and a mother board 8 having a wiring 11 on one surface, and a semiconductor package 100 (see FIG. 1). Are joined by the film-like resin composition 12 for sealing and filling so that they are electrically connected. In the semiconductor device 200, the gap between the substrate 7 and the motherboard 8 and the periphery of the semiconductor package 100 are sealed or filled with the film-like resin composition 12 for sealing and filling.

次に、本発明における半導体パッケージの製造方法について説明する。図３は、本発明の封止充てん用フィルム状樹脂組成物を用いた、半導体チップの製造方法の一実施形態を示す断面図である。   Next, the manufacturing method of the semiconductor package in this invention is demonstrated. FIG. 3: is sectional drawing which shows one Embodiment of the manufacturing method of a semiconductor chip using the film-form resin composition for sealing filling of this invention.

（１）まず、図３（ａ）に示すように、配線１４が形成された基板１５を準備する。そして、図３（ｂ）のとおり、配線１４を覆うように基板１５上に封止充てん用フィルム状樹脂組成物１６を積層し、貼り付ける。貼り付けは加熱プレス、ロールラミネート、真空ラミネートなどによって行うことができる。封止充てん用フィルム状樹脂組成物１６の供給量は貼付面積とフィルム厚みによって設定され、半導体チップ１８の大きさ、バンプ高さ（バンプ１９の半導体チップ１８表面からの高さ）などによって規定され、粘度等の経時変化が起きても、供給量を容易に制御することができる。   (1) First, as shown in FIG. 3A, a substrate 15 on which wirings 14 are formed is prepared. Then, as shown in FIG. 3B, the film-like resin composition 16 for sealing and filling is laminated and pasted on the substrate 15 so as to cover the wiring 14. Affixing can be performed by a hot press, roll lamination, vacuum lamination, or the like. The supply amount of the film-like resin composition 16 for sealing filling is set by the pasting area and the film thickness, and is defined by the size of the semiconductor chip 18 and the bump height (the height of the bump 19 from the surface of the semiconductor chip 18). Even if a change with time such as viscosity occurs, the supply amount can be easily controlled.

なお、封止充てん用フィルム状樹脂組成物１６は半導体チップ１８に貼り付けられてもよく、半導体ウエハに封止充てん用フィルム状樹脂組成物１６を貼り付けた後、ダイシングして、半導体チップ１８に個片化することによって、封止充てん用フィルム状樹脂組成物１６を貼り付けた半導体チップ１８を作製することができる。   In addition, the film-like resin composition 16 for sealing filling may be affixed to the semiconductor chip 18, and after the film-like resin composition 16 for sealing filling is affixed to a semiconductor wafer, the semiconductor chip 18 is diced. By dividing into pieces, the semiconductor chip 18 to which the film-like resin composition 16 for sealing filling is attached can be produced.

（２）続いて、図３（ｃ）のとおり、バンプ１９（はんだバンプ）を備える半導体チップ１８をフリップチップボンダーなどの接続装置の接続ヘッド１７に取り付け、一方で、封止充てん用フィルム状樹脂組成物１６が貼り付けられた配線１４付き基板１５を同接続装置のステージ２０に取り付けて、位置合わせを行なった後、半導体チップ１８と基板１５をバンプ１９の融点以上の温度で加熱しながら押し付ける。そして、図３（ｄ）に示すように、バンプ１９と配線１４を接合することで半導体チップ１８と基板１５を電気的に接続するとともに、溶融した封止充てん用フィルム状樹脂組成物１６によって半導体チップ１８と基板１５の間の空隙を封止充てんする。この際、封止充てん用フィルム状樹脂組成物１６のフラックス活性によって、バンプ１９の表面の酸化膜が還元除去され、バンプ１９が溶融し、金属接合による接続部が形成される。   (2) Subsequently, as shown in FIG. 3C, the semiconductor chip 18 provided with the bumps 19 (solder bumps) is attached to the connection head 17 of a connection device such as a flip chip bonder, while the film-like resin for sealing filling. The substrate 15 with the wiring 14 to which the composition 16 is attached is attached to the stage 20 of the connection device, aligned, and then pressed while heating the semiconductor chip 18 and the substrate 15 at a temperature equal to or higher than the melting point of the bump 19. . And as shown in FIG.3 (d), while connecting the bump 19 and the wiring 14, the semiconductor chip 18 and the board | substrate 15 are electrically connected, and it is semiconductor by the film-form resin composition 16 for sealing filling which was fuse | melted. The gap between the chip 18 and the substrate 15 is sealed and filled. At this time, the oxide film on the surface of the bump 19 is reduced and removed by the flux activity of the film-like resin composition 16 for sealing filling, and the bump 19 is melted to form a connection portion by metal bonding.

また、図３には記載していないが、半導体チップと基板を位置合わせして、バンプ（はんだバンプ）が溶融しない温度で加熱しながら押し付けることによって封止充てん用フィルム状樹脂組成物を溶融させて、半導体チップのバンプと基板電極の間の樹脂を除去するとともに、半導体チップと基板間の空隙を封止充てんして、半導体チップと基板を仮固定した後、リフロー炉で加熱処理することによってバンプを溶融させて半導体チップと基板を接続することによって半導体パッケージを製造してもよい。   Although not shown in FIG. 3, the film-shaped resin composition for sealing filling is melted by aligning the semiconductor chip and the substrate and pressing them while heating at a temperature at which the bumps (solder bumps) do not melt. By removing the resin between the bumps of the semiconductor chip and the substrate electrode, sealing the gap between the semiconductor chip and the substrate, temporarily fixing the semiconductor chip and the substrate, and then heat-treating in a reflow furnace The semiconductor package may be manufactured by melting the bump and connecting the semiconductor chip and the substrate.

（３）さらに、接続信頼性を高めるために、上記半導体パッケージを加熱オーブンなどで加熱処理し、封止充てん用フィルム状樹脂組成物の硬化をさらに進行させてもよい。   (3) Furthermore, in order to improve connection reliability, the semiconductor package may be heat-treated in a heating oven or the like to further cure the film-like resin composition for sealing filling.

本発明の封止充てん用フィルム状樹脂組成物を用いた、半導体装置の製造方法は、上記半導体チップの製造方法とほぼ同様に実施できる。すなわち、図３における、バンプ１９を備える半導体チップ１８に代えて、図１の半導体パッケージ１００を用い、図３における、配線１４が形成された基板１５に代えて、図２における、内層配線９、ビア１０及びスルーホール１３が形成され一方面に配線１１を有するマザーボード８を適用し、封止充てん用フィルム状樹脂組成物１６を介在させて、半導体パッケージ１００及びマザーボード８をはんだボール１の融点以上に加熱しながら、両者を加圧接合すればよい。   The manufacturing method of a semiconductor device using the film-like resin composition for sealing filling of the present invention can be carried out in substantially the same manner as the manufacturing method of the semiconductor chip. That is, instead of the semiconductor chip 18 having the bumps 19 in FIG. 3, the semiconductor package 100 in FIG. 1 is used, and instead of the substrate 15 in which the wiring 14 is formed in FIG. The motherboard 8 having the vias 10 and the through holes 13 formed thereon and having the wiring 11 on one side is applied, and the film-like resin composition 16 for sealing filling is interposed, so that the semiconductor package 100 and the motherboard 8 are made higher than the melting point of the solder balls 1. Both of them may be pressure bonded while heating.

以下、参考例、実施例及び比較例によって本発明を説明するが、本発明の範囲はこれらによって限定されるものではない。   Hereinafter, although a reference example, an example, and a comparative example explain the present invention, the range of the present invention is not limited by these.

（参考例）
（ａ）熱可塑性樹脂として、フェノキシ樹脂ＦＸ２９３（東都化成株式会社製、製品名）２５重量部、（ｂ）エポキシ樹脂として、固形多官能エポキシ樹脂ＥＰ１０３２Ｈ６０（ジャパンエポキシレジン製、製品名）３０重量部、及び液状ビスフェノールＡ型エポキシ樹脂ＥＰ８２８（ジャパンエポキシレジン製、製品名）４５重量部、（ｄ）２個以上のフェノール性水酸基を有する化合物として、表１に示す化合物を５重量部、球状シリカフィラーとしてＳＥ６０５０（株式会社アドマテックス製、製品名、平均粒径２μｍ）１００重量部、をトルエン−酢酸エチル溶媒中に固形分濃度が６０〜７０％になるように溶解混合してワニスを作製した。このワニスをセパレータフィルム（ＰＥＴフィルム）上にナイフコーターを用いて塗布した後、７０℃のオーブンで１０分間乾燥させることによって、厚さ４０〜４５μｍの参考例１〜７のフィルム状樹脂組成物を作製した。使用する際には、ホットロールラミネータにて２枚重ね合わせて、厚さを８０〜９０μｍに調整して使用した。(Reference example)
(A) 25 parts by weight of a phenoxy resin FX293 (manufactured by Toto Kasei Co., Ltd., product name) as a thermoplastic resin, (b) 30 parts by weight of a solid polyfunctional epoxy resin EP1032H60 (manufactured by Japan Epoxy Resin, product name) as an epoxy resin And 45 parts by weight of liquid bisphenol A type epoxy resin EP828 (manufactured by Japan Epoxy Resin, product name), (d) 5 parts by weight of the compound shown in Table 1 as a compound having two or more phenolic hydroxyl groups, spherical silica filler As a varnish, 100 parts by weight of SE6050 (manufactured by Admatechs Co., Ltd., product name, average particle size 2 μm) was dissolved and mixed in a toluene-ethyl acetate solvent so that the solid content concentration was 60 to 70%. After apply | coating this varnish on a separator film (PET film) using a knife coater, by drying for 10 minutes in 70 degreeC oven, the film-form resin composition of Reference Examples 1-7 of thickness 40-45 micrometers is obtained. Produced. When used, two sheets were overlapped with a hot roll laminator, and the thickness was adjusted to 80 to 90 μm.

（フラックス活性評価方法）
参考例のフラックス活性を以下の手順で評価した。
２５ｍｍ角に切断した両面銅はく付きガラスエポキシ基板（日立化成工業株式会社製、製品名：ＭＣＬ−Ｅ−６７９Ｆ、厚み０．３ｍｍ、脱脂及び酸洗処理済み）の銅表面に１０ｍｍ角に切り出したフィルム状樹脂組成物を貼り付け、セパレータフィルムをはく離した後、フィルム状樹脂組成物の上に、はんだボール（千住金属工業株式会社製、製品名：Ｍ７０５（Ｓｎ−３Ａｇ−０．５Ｃｕ）、ボール径０．４ｍｍ、融点２１７〜２２０℃）を５個配置し、さらに、カバーガラス（サイズ１８ｍｍ角、厚み０．１７ｍｍ）を置いて評価用サンプルを作製し、各フィルム状樹脂組成物について評価用サンプルを２個ずつ用いて評価することとした。(Flux activity evaluation method)
The flux activity of the reference example was evaluated by the following procedure.
Cut into 10mm square on the copper surface of glass epoxy board (made by Hitachi Chemical Co., Ltd., product name: MCL-E-679F, thickness 0.3mm, degreased and pickled), cut into 25mm square. After attaching the film-shaped resin composition and peeling off the separator film, on the film-shaped resin composition, solder balls (product name: M705 (Sn-3Ag-0.5Cu), manufactured by Senju Metal Industry Co., Ltd.), Five ball diameters of 0.4 mm and a melting point of 217 to 220 ° C. are arranged, and further a cover glass (size 18 mm square, thickness 0.17 mm) is placed to prepare a sample for evaluation, and each film-like resin composition is evaluated. It was decided to evaluate using two samples.

この評価用サンプルを１６０℃に加熱した熱板上に３０秒置き、引き続いて２６０℃に加熱した熱板上に３０秒置いて、室温に戻した後、評価用サンプルをメチルエチルケトン中に浸漬して、フィルム状樹脂組成物を溶解除去し、ガラスエポキシ基板の表面に残ったはんだボールの数及び直径を計測した。はんだ濡れ広がり率は次式（２）に従って算出した。
はんだ濡れ広がり率（％）＝（基板表面に残ったはんだボールの直径−初期はんだボール直径）／初期はんだボール直径×１００…（２）This evaluation sample was placed on a hot plate heated to 160 ° C. for 30 seconds, and then placed on a hot plate heated to 260 ° C. for 30 seconds. After returning to room temperature, the evaluation sample was immersed in methyl ethyl ketone. The film-shaped resin composition was dissolved and removed, and the number and diameter of solder balls remaining on the surface of the glass epoxy substrate were measured. The solder wetting spread rate was calculated according to the following formula (2).
Solder wetting spread rate (%) = (diameter of solder ball remaining on substrate surface−initial solder ball diameter) / initial solder ball diameter × 100 (2)

さらに、ガラスエポキシ基板の表面に残ったはんだボールについて、シェア試験を実施し、その結果、はんだボールと銅はくの界面で破断したものを「Ｂ」、はんだボールのバルク破壊となったものをフラックス活性が充分なものとして「Ａ」とした。なお、シェア試験はボンドテスターシリーズ４０００（デイジ社製、製品名）を用いて、室温において、シェア高さ５０μｍ、シェア速度１００μｍ／ｓの条件で行った。   Furthermore, a shear test was carried out on the solder balls remaining on the surface of the glass epoxy substrate, and as a result, "B" was broken at the interface between the solder balls and the copper foil, and the solder balls were broken in bulk. “A” was given as having sufficient flux activity. The shear test was performed using a Bond Tester Series 4000 (manufactured by Daisy, product name) at room temperature under conditions of a shear height of 50 μm and a shear rate of 100 μm / s.

（揮発終了温度の測定）
化合物の揮発終了温度（熱重量変化率が０％となる最低温度）の測定は、ＴＧ／ＤＴＡ６３００（セイコーインスツルメント社製、製品名）を用いて、昇温速度１０℃／ｍｉｎ、エア流量２００ｍｌ／ｍｉｎ、測定温度範囲３０〜３００℃、サンプル重量５〜１０ｍｇで行った。(Measurement of volatilization end temperature)
The measurement of the volatilization end temperature of the compound (the lowest temperature at which the thermogravimetric change rate becomes 0%) was measured using TG / DTA6300 (manufactured by Seiko Instruments Inc., product name), the heating rate was 10 ° C./min, and the air flow rate The measurement was performed at 200 ml / min, a measurement temperature range of 30 to 300 ° C., and a sample weight of 5 to 10 mg.

フラックス活性の評価結果を表１に示す。（なお、表１内における「≧」は「以上」を、「＜」は「未満」を意味する。）

Figure 2009081874
The evaluation results of the flux activity are shown in Table 1. (In Table 1, “≧” means “above” and “<” means “less than”.)
Figure 2009081874

参考例１では、フェノキシ樹脂やエポキシ樹脂に存在するアルコール性水酸基に起因すると思われるフラックス活性が見られるが、その効果は不充分であり、参考例２においても、充分なフラックス活性は示していない。参考例３〜６のように、フェノール性水酸基を２個以上有する化合物を用いることによって、参考例１、２と比較して、はんだボール残存率又ははんだ濡れ広がり率が向上し、シェア試験において、はんだボールと銅はくの界面で破断せずにバルク破壊し、有機酸である２，５−ジヒドロキシ安息香酸（参考例７）と同等のフラックス活性を示すことが分かる。   In Reference Example 1, the flux activity that seems to be caused by the alcoholic hydroxyl group present in the phenoxy resin or epoxy resin is observed, but the effect is insufficient, and Reference Example 2 does not show sufficient flux activity. . By using a compound having two or more phenolic hydroxyl groups as in Reference Examples 3 to 6, compared to Reference Examples 1 and 2, the solder ball residual rate or solder wetting spread rate is improved. It can be seen that bulk fracture does not occur at the interface between the solder ball and the copper foil, and the flux activity is equivalent to that of 2,5-dihydroxybenzoic acid (Reference Example 7) which is an organic acid.

（実施例１〜４、及び比較例１、２）
（ａ）熱可塑性樹脂として、フェノキシ樹脂ＦＸ２９３（東都化成株式会社製、製品名）２５重量部、（ｂ）エポキシ樹脂として、固形多官能エポキシ樹脂ＥＰ１０３２Ｈ６０（ジャパンエポキシレジン製、製品名）３０重量部、及び液状ビスフェノールＡ型エポキシ樹脂ＥＰ８２８（ジャパンエポキシレジン製、製品名）４５重量部、（ｃ）硬化剤として、２，４−ジヒドロキシメチル−５−フェニルイミダゾール２ＰＨＺ（四国化成株式会社製、製品名）３重量部、（ｄ）２個以上のフェノール性水酸基を有する化合物として、表２に示す化合物を５重量部、さらに無機フィラーとして、球状シリカフィラーであるＳＥ６０５０（株式会社アドマテックス製、製品名）１００重量部、をトルエン−酢酸エチル溶媒中に固形分濃度が６０〜７０％になるように溶解混合してワニスを作製した。このワニスをセパレータフィルム（ＰＥＴフィルム）上にナイフコーターを用いて塗布した後、７０℃のオーブンで１０分間乾燥させることによって、厚さ４０〜４５μｍの実施例１〜４及び比較例１〜３に示す封止充てん用フィルム状樹脂組成物を作製した。使用する際には、ホットロールラミネータにて２枚重ね合わせて、厚さを８０〜９０μｍに調整して使用した。(Examples 1-4 and Comparative Examples 1 and 2)
(A) 25 parts by weight of a phenoxy resin FX293 (manufactured by Toto Kasei Co., Ltd., product name) as a thermoplastic resin, (b) 30 parts by weight of a solid polyfunctional epoxy resin EP1032H60 (manufactured by Japan Epoxy Resin, product name) as an epoxy resin And 45 parts by weight of liquid bisphenol A type epoxy resin EP828 (product name, manufactured by Japan Epoxy Resin), (c) 2,4-dihydroxymethyl-5-phenylimidazole 2PHZ (product name, manufactured by Shikoku Kasei Co., Ltd.) ) 3 parts by weight, (d) 5 parts by weight of the compound shown in Table 2 as a compound having two or more phenolic hydroxyl groups, and SE6050 (manufactured by Admatechs Co., Ltd., product name) which is a spherical silica filler. ) 100 parts by weight in a toluene-ethyl acetate solvent with a solids concentration of 60- And then dissolved and mixed together so that the 0% to prepare a varnish. After apply | coating this varnish on a separator film (PET film) using a knife coater, by drying for 10 minutes in 70 degreeC oven, it is 40-45 micrometers in Examples 1-4 and Comparative Examples 1-3. The film-like resin composition for sealing filling shown was produced. When used, two sheets were overlapped with a hot roll laminator, and the thickness was adjusted to 80 to 90 μm.

(比較例３)
無機フィラーの配合量を２２０重量部にした以外は、実施例１〜４及び比較例１、２と同様に作製した。(Comparative Example 3)
It produced similarly to Examples 1-4 and Comparative Examples 1 and 2 except having made the compounding quantity of the inorganic filler into 220 weight part.

封止充てん用フィルム状樹脂組成物の硬化物の物性は、以下のとおり測定した。
（平均線膨張係数の測定）
２００℃／１ｈの加熱条件で処理したサンプルを３．０ｍｍ×２５ｍｍの大きさに切り出したものを準備し、ＴＭＡ／ＳＳ６０００（セイコーインスツルメント社製、製品名）を用いて、チャック間距離１５ｍｍ、測定温度範囲２０〜３００℃、昇温速度５℃／ｍｉｎ、フィルム断面積に対して０．５ＭＰａとなる引っ張り荷重の条件で行ない、４０〜１００℃の温度範囲における平均線膨張係数を算出した。The physical properties of the cured product of the film-like resin composition for sealing filling were measured as follows.
(Measurement of average linear expansion coefficient)
A sample obtained by cutting a sample processed under heating conditions of 200 ° C./1 h into a size of 3.0 mm × 25 mm was prepared, and the distance between chucks was 15 mm using TMA / SS6000 (product name, manufactured by Seiko Instruments Inc.). The measurement was performed under the conditions of a measurement temperature range of 20 to 300 ° C., a heating rate of 5 ° C./min, and a tensile load of 0.5 MPa with respect to the film cross-sectional area, and an average linear expansion coefficient in a temperature range of 40 to 100 ° C. was calculated. .

（弾性率及びガラス転移温度（Ｔｇ）の測定）
２００℃／１ｈの加熱条件で処理したサンプルを５．０ｍｍ×４５ｍｍの大きさに切り出したものを準備し、ＤＭＳ６１００（セイコーインスツルメント社製、製品名）を用いて、チャック間距離２０ｍｍ、周波数１Ｈｚ、測定温度範囲２０〜３００℃、昇温速度５．０℃／ｍｉｎの条件で、貯蔵弾性率、損失弾性率、及びｔａｎδの測定を行い、４０℃の貯蔵弾性率及びガラス転移温度（Ｔｇ）としてｔａｎδのピーク温度を読み取った。(Measurement of elastic modulus and glass transition temperature (Tg))
A sample obtained by cutting a sample processed under a heating condition of 200 ° C./1 h into a size of 5.0 mm × 45 mm was prepared, and a distance between chucks of 20 mm and a frequency was measured using DMS6100 (product name, manufactured by Seiko Instruments Inc.). Storage elastic modulus, loss elastic modulus, and tan δ were measured under the conditions of 1 Hz, measurement temperature range of 20 to 300 ° C., and heating rate of 5.0 ° C./min. Storage elastic modulus and glass transition temperature (Tg) of 40 ° C. ) And the peak temperature of tan δ was read.

（粘度測定）
１５ｍｍ角（厚さ０．７ｍｍ）のガラス板の上に直径４ｍｍの円形に打ち抜いた封止充てん用フィルム状樹脂組成物を貼り付け、セパレーターフィルムをはく離した後、カバーガラス（サイズ１８ｍｍ角、厚さ０．１７ｍｍ）を封止充てん用フィルム状樹脂組成物を覆うように載せたものを準備した。これを、フリップチップボンダーＦＣＢ３（パナソニックファクトリーソリューションズ製、製品名）に配置し、ヘッド温度１８５℃、ステージ温度５０℃、荷重１２．６Ｎ、加圧時間１ｓ（到達１５０℃）の条件で加熱、加圧した。樹脂体積を一定と仮定すると次式（３）の関係が成立することから、加圧後の半径を顕微鏡で測定し、前述した式（１）に従い、１５０℃での粘度を算出した。
Ｚ／Ｚ０＝（ｒ０／ｒ）２…（３）
Ｚ０：加圧前の樹脂厚み
Ｚ：加圧後の樹脂厚み
ｒ０：加圧前の樹脂の半径（直径４ｍｍで打ち抜いているので、２ｍｍ）
ｒ：加圧後の樹脂の半径(Viscosity measurement)
A sealing resin film-like resin composition punched into a 4 mm diameter circle was pasted on a 15 mm square (0.7 mm thick) glass plate, and the separator film was peeled off, and then a cover glass (size 18 mm square, thickness 0.17 mm) was prepared so as to cover the film-like resin composition for sealing and filling. This is placed on a flip chip bonder FCB3 (product name, manufactured by Panasonic Factory Solutions) and heated and heated under the conditions of a head temperature of 185 ° C., a stage temperature of 50 ° C., a load of 12.6 N, and a pressurization time of 1 s (reaching 150 ° C.). Pressed. Assuming that the resin volume is constant, the relationship of the following formula (3) is established. Therefore, the radius after pressurization was measured with a microscope, and the viscosity at 150 ° C. was calculated according to the formula (1) described above.
Z / Z 0 = (r 0 / r) 2 (3)
Z 0 : Resin thickness before pressurization Z: Resin thickness after pressurization r 0 : Radius of resin before pressurization (2 mm because punching is performed with a diameter of 4 mm)
r: radius of the resin after pressurization

（保存安定性）
４０℃の恒温槽に封止充てん用フィルム状樹脂組成物を放置し、６日後の粘度が初期粘度の２倍以下であるものを保存安定性があるとして「Ａ」とし、２倍より大きいものを保存安定性がないとして「Ｂ」とした。粘度測定は前述の方法で測定した。(Storage stability)
A film-like resin composition for sealing and filling is allowed to stand in a constant temperature bath at 40 ° C., and the one whose viscosity after 6 days is 2 times or less of the initial viscosity is designated as “A” as having storage stability and is more than 2 times Was designated as “B” because of no storage stability. The viscosity was measured by the method described above.

（ゲル化時間測定）
２６０℃の熱板上にセパレーターをはく離した封止充てん用フィルム状樹脂組成物を配置し、スパチュラで攪拌不能になるまでの時間をゲル化時間とした。(Measurement of gelation time)
The film-like resin composition for sealing filling with the separator peeled off was placed on a hot plate at 260 ° C., and the time until stirring with a spatula became impossible was defined as the gel time.

（接続サンプル作製）
銅配線表面にＳｎ−３．０Ａｇ−０．５Ｃｕの受けはんだ層が形成されたプリント基板ＪＫＩＴ ＴＹＰＥ ＩＩＩ（日立超ＬＳＩシステムズ製、製品名）のチップ搭載領域に、１０ｍｍ角に切り出した封止充てん用フィルム状樹脂組成物を８０℃／５０Ｎ／５ｓの条件で貼り付けた後、セパレータフィルムをはく離し、高融点はんだバンプ（９５Ｐｂ−５Ｓｎ）が形成されたチップＰｈａｓｅ２Ｅ１７５（日立超ＬＳＩシステムズ製、製品名、サイズ１０ｍｍ角、厚み５５０μｍ、バンプ数８３２、バンプピッチ１７５μｍ）とプリント基板をフリップチップボンダーＦＣＢ３（パナソニックファクトリーソリューションズ製、製品名）を用いて位置合わせを行い、荷重５Ｎで加圧しながら、１８０℃／５〜３０ｓ＋２３０〜２８０℃／５ｓの温度プロファイルで加熱してチップと基板を接続した。その後、１６５℃のオーブンで２時間加熱処理を行い、接続サンプルを作製した。(Connection sample preparation)
Sealing filling cut into 10mm square in the chip mounting area of printed circuit board JKIT TYPE III (product name, manufactured by Hitachi Ultra LSI Systems) with Sn-3.0Ag-0.5Cu receiving solder layer formed on the surface of copper wiring Chip phase 2E175 (manufactured by Hitachi Ultra LSI Systems, product with high melting point solder bumps (95Pb-5Sn) formed after the film-like resin composition for application was pasted at 80 ° C./50 N / 5 s, and then the separator film was peeled off Name, size 10mm square, thickness 550μm, number of bumps 832, bump pitch 175μm) and printed circuit board are aligned using flip chip bonder FCB3 (manufactured by Panasonic Factory Solutions, product name). ° C / 5-30s + 230-280 ° C / 5s And connecting the chip and the substrate is heated in degrees profile. Thereafter, a heat treatment was performed in an oven at 165 ° C. for 2 hours to produce a connection sample.

（はんだ接合性）
接続サンプルの導通検査を行い、導通がとれたものについて「Ａ」とした。そして、接続部の断面を観察し、バンプと受けはんだが均一に濡れて接合されているものを「Ａ」とし、均一に濡れていないものを「Ｂ」とした。(Solderability)
The connection sample was subjected to a continuity test, and “A” was assigned to the continuity test. Then, the cross section of the connecting portion was observed, and “A” was obtained when the bump and the receiving solder were uniformly wetted and joined, and “B” was obtained when the solder was not uniformly wetted.

（耐湿信頼性）
接続サンプルを温度１３０℃／相対湿度８５％に設定した試験槽内に１００時間放置した後、導通検査を行い、放置前の接続抵抗と比較して、抵抗変化率が±１０％以内であるものを耐湿信頼性があるとして「Ａ」とした。(Moisture resistance reliability)
The connection sample is left for 100 hours in a test tank set at a temperature of 130 ° C and a relative humidity of 85%, and then a continuity test is performed. The resistance change rate is within ± 10% compared to the connection resistance before leaving. Was designated as “A” as having moisture resistance reliability.

（絶縁信頼性）
配線幅２０μｍ、配線間距離４０μｍで形成された銅配線の櫛型パターンを有するポリイミド基板に、封止充てん用フィルム状樹脂組成物を８０℃／１００Ｎ／５ｓの条件で櫛型パターンを覆うように貼り付けて、セパレータフィルムをはがした後、１６５℃のオーブンで２時間加熱処理を行い、評価用サンプルを作製した。このサンプルを温度１３０℃／相対湿度８５％に設定した試験槽内に５Ｖの直流電圧を印加しながら放置し、マイグレーションテスターＭＩＧ−８６００（ＩＭＶ社製、製品名）にて試験槽内における絶縁抵抗を連続測定した。１００時間の測定中に１０６Ω以上の絶縁抵抗を保持しているものを「Ａ」とし、絶縁抵抗が１０６Ω未満となったものを「Ｂ」とした。(Insulation reliability)
A polyimide substrate having a comb-shaped pattern of copper wiring formed with a wiring width of 20 μm and an inter-wiring distance of 40 μm is covered with a film-like resin composition for sealing filling under conditions of 80 ° C./100 N / 5 s. After pasting and peeling off the separator film, a heat treatment was performed in an oven at 165 ° C. for 2 hours to prepare a sample for evaluation. This sample was left in a test tank set at a temperature of 130 ° C./relative humidity of 85% while applying a DC voltage of 5 V, and the insulation resistance in the test tank was measured with a migration tester MIG-8600 (product name, manufactured by IMV). Was continuously measured. A sample having an insulation resistance of 10 6 Ω or more during 100 hours of measurement was designated as “A”, and a sample having an insulation resistance of less than 10 6 Ω was designated as “B”.

（総合判定）
上記の各評価指標を踏まえた総合的な評価として、封止充てん用フィルム状樹脂組成物として接続信頼性を有するものを「Ａ」、接続信頼性を有さないものを「Ｂ」とした。
評価結果を表２に示す。

Figure 2009081874
(Comprehensive judgment)
As a comprehensive evaluation based on each evaluation index, a film-like resin composition for sealing filling having “A” for connection reliability and “B” for having no connection reliability.
The evaluation results are shown in Table 2.
Figure 2009081874

表２に示す結果から分かるように、実施例１〜４では良好な保存安定性、はんだ接合性、耐湿信頼性及び絶縁信頼性を示した。一方、比較例１では断面観察において、バンプと受けはんだが均一に濡れておらず、フラックス活性が不充分であった。比較例２では、はんだ接合性は良好であったが、保存安定性が悪く、絶縁信頼性評価において、８０時間測定後に不良が発生した。比較例３では、保存安定性が悪く、また、バンプと受けはんだが均一に濡れておらず、フィルム状樹脂組成物の粘度が高いために、溶融したはんだが濡れ広がるのを阻害したと考えられる。   As can be seen from the results shown in Table 2, Examples 1 to 4 showed good storage stability, solderability, moisture resistance reliability, and insulation reliability. On the other hand, in Comparative Example 1, in the cross-sectional observation, the bump and the receiving solder were not uniformly wetted, and the flux activity was insufficient. In Comparative Example 2, the solderability was good, but the storage stability was poor, and a defect occurred after 80 hours measurement in the insulation reliability evaluation. In Comparative Example 3, the storage stability is poor, and the bump and the receiving solder are not uniformly wetted, and the viscosity of the film-like resin composition is high, which is considered to inhibit the molten solder from spreading. .

以上に説明したとおり、本発明によって、良好な保存安定性とフラックス活性を示し、接続信頼性に優れた封止充てん用フィルム状樹脂組成物を得ることができる。また、本発明の封止充てん用フィルム状樹脂組成物を用いることによって、金属接合が容易となり、接続信頼性に優れた半導体装置を製造することが可能となる。さらに、良好な生産性を実現することが可能となる。   As described above, according to the present invention, it is possible to obtain a film-like resin composition for sealing filling that exhibits good storage stability and flux activity and is excellent in connection reliability. Moreover, by using the film-like resin composition for sealing and filling of the present invention, metal bonding becomes easy and a semiconductor device having excellent connection reliability can be manufactured. Furthermore, good productivity can be realized.

本発明によれば、良好な保存安定性とフラックス活性を示し、接続信頼性に優れた封止充てん用フィルム状樹脂組成物を提供することができる。また、本発明の封止充てん用フィルム状樹脂組成物を用いることによって、金属接合が容易となり、接続信頼性に優れた製造方法及び半導体装置をも提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the film-like resin composition for sealing filling which shows favorable storage stability and flux activity, and was excellent in connection reliability can be provided. Moreover, by using the film-shaped resin composition for sealing and filling of the present invention, metal bonding becomes easy, and a manufacturing method and a semiconductor device excellent in connection reliability can be provided.

Claims (8)

（ａ）熱可塑性樹脂、（ｂ）エポキシ樹脂、（ｃ）硬化剤及び（ｄ）２個以上のフェノール性水酸基を有する化合物を含有する、封止充てん用フィルム状樹脂組成物。   A film-like resin composition for sealing filling containing (a) a thermoplastic resin, (b) an epoxy resin, (c) a curing agent and (d) a compound having two or more phenolic hydroxyl groups. （ｄ）２個以上のフェノール性水酸基を有する化合物は、
フェノール性水酸基を１個以上有する化合物と、
ハロメチル基、アルコキシメチル基又はヒドロキシルメチル基を２個有する芳香族化合物、ジビニルベンゼン及びアルデヒド化合物からなる群より選ばれる少なくとも１種類の化合物と、の重縮合物である、請求項１に記載の封止充てん用フィルム状樹脂組成物。(D) The compound having two or more phenolic hydroxyl groups is
A compound having at least one phenolic hydroxyl group;
The sealing according to claim 1, which is a polycondensation product of at least one compound selected from the group consisting of an aromatic compound having two halomethyl groups, alkoxymethyl groups or hydroxylmethyl groups, divinylbenzene and an aldehyde compound. A film-like resin composition for stopping filling. （ｄ）２個以上のフェノール性水酸基を有する化合物は、１２０〜３００℃で液状を呈する化合物である、請求項１又は２に記載の封止充てん用フィルム状樹脂組成物。   (D) The film-like resin composition for sealing filling according to claim 1 or 2, wherein the compound having two or more phenolic hydroxyl groups is a compound that exhibits a liquid state at 120 to 300 ° C. （ｃ）硬化剤はイミダゾール化合物である、請求項１〜３のいずれか一項に記載の封止充てん用フィルム状樹脂組成物。   (C) The film-shaped resin composition for sealing filling according to any one of claims 1 to 3, wherein the curing agent is an imidazole compound. さらに無機フィラーを含有する、請求項１〜４のいずれか一項に記載の封止充てん用フィルム状樹脂組成物。   Furthermore, the film-form resin composition for sealing filling as described in any one of Claims 1-4 containing an inorganic filler. 請求項１〜５のいずれか一項に記載の封止充てん用フィルム状樹脂組成物により、半導体チップと基板をフリップチップ接続する、半導体パッケージの製造方法。   A manufacturing method of a semiconductor package, wherein the semiconductor chip and the substrate are flip-chip connected by the film-like resin composition for sealing filling according to any one of claims 1 to 5. 請求項１〜５のいずれか一項に記載の封止充てん用フィルム状樹脂組成物により、半導体パッケージと基板を接続する、半導体装置の製造方法。   The manufacturing method of a semiconductor device which connects a semiconductor package and a board | substrate with the film-form resin composition for sealing filling as described in any one of Claims 1-5. 請求項１〜５のいずれか一項に記載の封止充てん用フィルム状樹脂組成物で、接続された基板を備える半導体装置。


A semiconductor device comprising a substrate connected by the film-like resin composition for sealing filling according to any one of claims 1 to 5.


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