JPS649231A - Production of siloxane polymer for forming insulation film - Google Patents

Production of siloxane polymer for forming insulation film

Info

Publication number
JPS649231A
JPS649231A JP16480687A JP16480687A JPS649231A JP S649231 A JPS649231 A JP S649231A JP 16480687 A JP16480687 A JP 16480687A JP 16480687 A JP16480687 A JP 16480687A JP S649231 A JPS649231 A JP S649231A
Authority
JP
Japan
Prior art keywords
polymer
insulation film
formula
siloxane polymer
adhesion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16480687A
Other languages
Japanese (ja)
Inventor
Kenji Niwa
Haruo Inoue
Takashi Nakada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP16480687A priority Critical patent/JPS649231A/en
Publication of JPS649231A publication Critical patent/JPS649231A/en
Pending legal-status Critical Current

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  • Silicon Polymers (AREA)

Abstract

PURPOSE:To produce a polymer which can give an insulation film improved in heat resistance, adhesion and cracking resistance, by hydrolyzing and polycondensing an alkoxysilane and making the polymer three-dimensional by distilling off a by-product alcohol below a specified temperature. CONSTITUTION:An alkoxysilane mixture comprising a tetraalkoxysilane of formula I, a trialkoxysilane of formula II and a dialkoxysilane of formula III (wherein R<1>-R<6> are each a 1-6C alkyl or a 6-10C alkyl) are polycondensed at preferably about 0-100 deg.C in the presence of water and a catalyst and, optionally, a solvent. A by-product alcohol and the solvent optionally added are distilled off at 60 deg.C or below at normal or diminished pressure to form a highly concentrated solution of a siloxane polymer, whereby a three-dimensional polymer can be formed within a short time. In this way, the weight loss upon baking of a film can be decreased so that the formation of a crack-free thick film and the level-off of a wafer can be made, and the formation of an insulation film improved in heat resistance, adhesion and cracking resistance is also possible.
JP16480687A 1987-06-30 1987-06-30 Production of siloxane polymer for forming insulation film Pending JPS649231A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16480687A JPS649231A (en) 1987-06-30 1987-06-30 Production of siloxane polymer for forming insulation film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16480687A JPS649231A (en) 1987-06-30 1987-06-30 Production of siloxane polymer for forming insulation film

Publications (1)

Publication Number Publication Date
JPS649231A true JPS649231A (en) 1989-01-12

Family

ID=15800273

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16480687A Pending JPS649231A (en) 1987-06-30 1987-06-30 Production of siloxane polymer for forming insulation film

Country Status (1)

Country Link
JP (1) JPS649231A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992007042A1 (en) * 1990-10-16 1992-04-30 Nitto Denko Corporation Structure of release part
US5378788A (en) * 1992-07-16 1995-01-03 Shin-Etsu Chemical Co., Ltd. Process for preparation of linear organo-polysiloxane having hydroxyl group at its molecular ends
USRE37880E1 (en) 1995-03-01 2002-10-15 Seiko Epson Corporation Projector
US6589644B1 (en) 1997-05-28 2003-07-08 Nippon Steel Corporation Low dielectric constant materials and their production and use
KR20040018710A (en) * 2002-08-26 2004-03-04 주식회사 엘지화학 Method for preparing organic silicate polymer
US6737118B2 (en) 1997-05-28 2004-05-18 Nippon Steel Corporation Low dielectric constant materials and their production and use
JP2011181563A (en) * 2010-02-26 2011-09-15 Fujifilm Corp Trench embedding composition
JP2013047293A (en) * 2011-08-29 2013-03-07 Tokyo Ohka Kogyo Co Ltd Composition for transparent film, method for forming transparent film, and transparent film
JP2013119626A (en) * 2011-12-07 2013-06-17 Wacker Chemie Ag Production of high molecular weight silicone resin

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992007042A1 (en) * 1990-10-16 1992-04-30 Nitto Denko Corporation Structure of release part
US5378788A (en) * 1992-07-16 1995-01-03 Shin-Etsu Chemical Co., Ltd. Process for preparation of linear organo-polysiloxane having hydroxyl group at its molecular ends
USRE37880E1 (en) 1995-03-01 2002-10-15 Seiko Epson Corporation Projector
US6589644B1 (en) 1997-05-28 2003-07-08 Nippon Steel Corporation Low dielectric constant materials and their production and use
US6737118B2 (en) 1997-05-28 2004-05-18 Nippon Steel Corporation Low dielectric constant materials and their production and use
WO2004074355A1 (en) * 1997-05-28 2004-09-02 Noriko Yamada Low-permittivity material, and production and use thereof
KR20040018710A (en) * 2002-08-26 2004-03-04 주식회사 엘지화학 Method for preparing organic silicate polymer
JP2011181563A (en) * 2010-02-26 2011-09-15 Fujifilm Corp Trench embedding composition
JP2013047293A (en) * 2011-08-29 2013-03-07 Tokyo Ohka Kogyo Co Ltd Composition for transparent film, method for forming transparent film, and transparent film
JP2013119626A (en) * 2011-12-07 2013-06-17 Wacker Chemie Ag Production of high molecular weight silicone resin
KR101469330B1 (en) * 2011-12-07 2014-12-04 와커 헤미 아게 Production of high-molecular-weight silicone resins

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